JPH03199130A - Mold for molding optical element - Google Patents
Mold for molding optical elementInfo
- Publication number
- JPH03199130A JPH03199130A JP34258389A JP34258389A JPH03199130A JP H03199130 A JPH03199130 A JP H03199130A JP 34258389 A JP34258389 A JP 34258389A JP 34258389 A JP34258389 A JP 34258389A JP H03199130 A JPH03199130 A JP H03199130A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- molding
- optical element
- intermediate layer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000465 moulding Methods 0.000 title claims abstract description 33
- 230000003287 optical effect Effects 0.000 title claims description 26
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 4
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 3
- 239000000463 material Substances 0.000 claims description 16
- 230000003746 surface roughness Effects 0.000 abstract description 12
- 238000000034 method Methods 0.000 abstract description 4
- 238000001659 ion-beam spectroscopy Methods 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 229910052750 molybdenum Inorganic materials 0.000 abstract description 2
- 238000007740 vapor deposition Methods 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 2
- 229910052593 corundum Inorganic materials 0.000 abstract 2
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 2
- 230000004913 activation Effects 0.000 abstract 1
- 238000005336 cracking Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 30
- 239000011521 glass Substances 0.000 description 12
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 8
- 230000003647 oxidation Effects 0.000 description 7
- 238000007254 oxidation reaction Methods 0.000 description 7
- 229910017263 Mo—C Inorganic materials 0.000 description 6
- 238000001556 precipitation Methods 0.000 description 6
- 239000011247 coating layer Substances 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/20—Oxide ceramics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/34—Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、光学素子成形用型に係り、特に成形面にＡ
１ ｚ（ｈを被覆した光学素子成形用型に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a mold for molding an optical element, and in particular, the present invention relates to a mold for molding an optical element.
1.Relating to a mold for molding an optical element coated with z(h).
−ａに、レンズ、プリズム、フィルタ等の光学素子の製
造方法として、研削、研摩等を行わずに高い精度の成形
用型間に加熱軟化したガラス素材を挿入配置し、これを
加圧するだけで光学素子を得るプレス成形が行われてい
る。このプレス成形で用いる光学素子成形用型の成形面
は、第一に高温に加熱されたガラスが付着しないこと、
第二に高精度に加工された面を傷つけないために硬いこ
と、第三に万一ガラスが付着したときにガラスだけを除
去できるように除去の時に使用するフッ酸に侵されない
ことなどが要求される。-a, as a manufacturing method for optical elements such as lenses, prisms, filters, etc., a heated and softened glass material is inserted between high-precision molds without any grinding or polishing, and the glass material is simply pressurized. Press molding is performed to obtain optical elements. The molding surface of the optical element mold used in this press molding must first be protected from the adhesion of glass heated to a high temperature;
Secondly, it must be hard so as not to damage the highly precisely machined surface, and thirdly, it must not be attacked by the hydrofluoric acid used during removal so that if glass gets stuck, only the glass can be removed. be done.
従来、上記要求に対応するものとしては、例えば特公昭
６１−１０４０７号公報に開示されたものがある。この
光学素子成形用型は、成形面にＡ ｆｆｉ ｚｏｓを被
覆し、その被覆層と型基材との間にＴｉＣ，ＴｉＮ、Ｔ
１ＣＮのうちの１種の単層または２種以上の複層からな
る中間層を介在させたものである。ここに、表層のＡ
ｊ！ ｚＯｘは耐酸化性や耐ガラス反応性に優れ、かつ
高硬度を有する。Conventionally, there is a device disclosed in Japanese Patent Publication No. 61-10407, for example, which meets the above requirements. This mold for molding optical elements coats the molding surface with Affizos, and between the coating layer and the mold base material, TiC, TiN, T
An intermediate layer consisting of a single layer of one type of 1CN or a multilayer of two or more types is interposed. Here, the surface A
j! zOx has excellent oxidation resistance and glass reactivity resistance, and high hardness.
また、中間層のＴｉｃ、ＴｉＮ、Ｔ１ＣＮ層は、型基材
およびＡｌｔｏｓ被覆層のどちらにも大きな付着力を有
するので、Ａｌ１ｔＯｘ被覆層は強固に型基材に付着す
るようになり、成形に使用しても剥離が発生しないとい
うものであった。In addition, the intermediate Tic, TiN, and T1CN layers have strong adhesion to both the mold base material and the Altos coating layer, so the Al1tOx coating layer firmly adheres to the mold base material and is used for molding. However, no peeling occurred.
ところで、カメラや顕微鏡あるいは光ピツクアップに用
いられるレンズは非常に高い精度を要求される０例えば
表面粗さでＲ−ａＸが０．０５μ−以下、面形状では設
計値からのずれ量が０．１１Ｉｍ以下という厳しいもの
である。このようなレンズをガラスブレス成形により安
価に得ようとすれば、成形用型の成形性は高い精度を長
期間に亘って保持しなければならない。By the way, lenses used for cameras, microscopes, or optical pickups require extremely high precision.For example, the surface roughness R-aX is 0.05μ or less, and the surface shape deviation from the design value is 0.11Im. The following are severe. If such lenses are to be obtained at low cost by glass press molding, the molding mold must maintain high moldability over a long period of time.
しかし、従来の成形用型のように、ＴｉＣ。However, like traditional molds, TiC.
ＴｉＮ、Ｔ１ＣＮを中間層とする場合には、成形数が増
えるにつれてＴｉＣ，ＴｉＮ、Ｔ１ＣＮの酸化による再
結晶化が進行して体積が膨張し、Ａｌｔｏｓ被覆層にク
ラックを生じさせ、表層への析出が発生してしまった。When using TiN or T1CN as an intermediate layer, as the number of moldings increases, recrystallization due to oxidation of TiC, TiN, and T1CN progresses and the volume expands, causing cracks in the Altos coating layer and precipitation on the surface layer. has occurred.
したがって、面形状や表面粗さが悪化して高精度のレン
ズを成形することができなくなってしまった。Therefore, the surface shape and surface roughness deteriorate, making it impossible to mold lenses with high precision.
このような現象は、Ｔｉの化学的に活性という特有の性
質による０例えば、ＴｉＮは大気中においては約５００
°Ｃから急速に酸化が進行する。レンズとして成形され
るガラスには種々のものがあり、中には５００°Ｃ以上
に成形用型を加熱して使用することも少なくないのであ
る。This phenomenon is due to the unique property of Ti, which is chemically active.For example, TiN has about 500
Oxidation proceeds rapidly from °C. There are various types of glass that can be molded into lenses, and some of them are often used by heating the mold to 500°C or higher.
本発明は、かかる従来の問題点に鑑みてなされたもので
、高温で使用してもクランクが発生せず、面形状や表面
粗さを悪化させないａｚｚｏｉ被覆の光学素子成形用型
を提供することを目的とする。The present invention has been made in view of such conventional problems, and an object of the present invention is to provide an azzoi-coated mold for molding optical elements that does not cause cranking even when used at high temperatures and does not deteriorate the surface shape or surface roughness. With the goal.
上記目的を達成するために、本発明は、少なくとも成形
性をＡ１．ｔ’ｓで被覆した光学素子成形用型において
、型基材とＡ ｆｆｉ １０３層との間にＣｒ。In order to achieve the above object, the present invention provides at least moldability of A1. In a mold for molding an optical element coated with T's, there is Cr between the mold base material and the Affi 103 layer.
Ｚ ｒ ＋ Ｈｆ ＋ またはＭｏの炭化物からなる膜
を少なくとも１層設けて中間層を形成した。At least one layer of a film made of carbide of Z r + Hf + or Mo was provided to form an intermediate layer.
Ｃｒ、Ｚｒ、Ｈｒ、ＭｏはＴｉに比べて融点が高く、そ
の炭化物であるＣｒ −Ｃ，Ｚｒ −Ｃ。Cr, Zr, Hr, and Mo have higher melting points than Ti, and their carbides are Cr-C and Zr-C.
Ｈｒ −Ｃ，Ｍｏ−ＣはＴｉＣ，ＴｉＮ、Ｔ１ＣＮより
高温における耐酸化性に優れている。したがって、成形
用型を高温に加熱して使用しても酸化による再結晶化が
抑えられる。また、Ｃｒ−Ｃ。Hr-C and Mo-C have better oxidation resistance at high temperatures than TiC, TiN, and T1CN. Therefore, even if the mold is heated to a high temperature and used, recrystallization due to oxidation can be suppressed. Also, Cr-C.
Ｚｒ −Ｃ，Ｈｆ −Ｃ，Ｍｏ −Ｃは分極しやすい
物質であるため、型基材やＡ ｆ ！Ｏ，と強固に付着
する。Since Zr-C, Hf-C, and Mo-C are substances that are easily polarized, they can be used as mold base materials and A f ! O, adheres firmly.
このため、上記本発明の成形用型のように、Ｃｒ −Ｃ
，Ｚｒ −Ｃ，ＨＥ −Ｃ，Ｍｏ −ＣをＡｌｌ１０３
層と型基材との間に中間層として用いれば、Ａ ｊ！
ｇｏｓ層を型基材に強固に付着させ、しかも高温下で長
期間使用にもクラック等による面形状や表面粗さの悪化
を抑えることができる。Therefore, like the mold of the present invention, Cr-C
, Zr-C, HE-C, Mo-C All103
If used as an intermediate layer between the layer and the mold substrate, A j!
The Gos layer can be firmly attached to the mold base material, and furthermore, deterioration of the surface shape and surface roughness due to cracks etc. can be suppressed even during long-term use at high temperatures.
（第１〜４実施例）
図に示すように、ＷＣの焼結体からなる型基材１の端面
を所定形状に鏡面加工して成形基礎面１ａを形成し、そ
の成形基礎面ｌａ上にＣｒ’−Ｃからなる膜を中間層２
として形成した。そして、この中間層２の上にＡｊ２ｔ
Ｏｓ膜３を形成した。(Embodiments 1 to 4) As shown in the figure, the end face of a mold base material 1 made of a sintered body of WC is mirror-finished into a predetermined shape to form a molding base surface 1a, and a molding base surface 1a is formed on the molding base surface la. A film made of Cr'-C is used as the intermediate layer 2.
Formed as. Then, on this middle layer 2, Aj2t
An Os film 3 was formed.
中間Ｎ２は、Ｃｒをターゲットとし、真空チャンバ内に
ＣＩ＋４ガスを導入してＡｒのイオンビームスパッタに
より形成した。中間層２の膜厚は約５０００Åとした。The intermediate N2 was formed by Ar ion beam sputtering using Cr as a target and introducing CI+4 gas into a vacuum chamber. The thickness of the intermediate layer 2 was approximately 5000 Å.
また、Ａ ｆｆｉ 、０．膜３は、Ａｌ単体を蒸発材料
とし、０．ガスを反応ガスとする活性化反応蒸着法によ
り形成した。ｉ、ｏ、膜３の膜厚は約５０００Åとした
。Also, Affi, 0. The film 3 uses Al alone as an evaporation material and has a 0. It was formed by an activated reaction vapor deposition method using a gas as a reaction gas. The thickness of the i, o and film 3 was approximately 5000 Å.
本実施例で得た光学素子成形用型を用いて実際に光学ガ
ラス素子を形成した。この成形は、型温６５０°Ｃ，ガ
ラスの温度は８００°Ｃで、ＮＺガス雰囲気中で行った
。１００００ 、３００００ 、５００００シラット時
点での光学素子成形用型の成形性を光学顕微鏡で観察し
、その変化を調べた。その結果を次表に示す。An optical glass element was actually formed using the mold for molding an optical element obtained in this example. This molding was performed at a mold temperature of 650°C, a glass temperature of 800°C, and an NZ gas atmosphere. The moldability of the mold for molding an optical element at 10,000, 30,000, and 50,000 siraats was observed using an optical microscope, and its changes were investigated. The results are shown in the table below.
なお、中間層をＺｒ −Ｃ，Ｈｆ −Ｃ，Ｍｏ −Ｃ
とした実施例２〜４の光学素子成形用型および中間層を
膜厚ｌＩ１．のＴｉＮ、ＴｉＣ，Ｔ１ＣＮとした比較例
１〜３の光学素子成形用型についても第１実施例のもの
と同様の条件下で評価を行い、その結果を同表中に併記
した。Note that the intermediate layer is Zr-C, Hf-C, Mo-C
The optical element molds and intermediate layers of Examples 2 to 4 were made to have a film thickness of lI1. The optical element molds of Comparative Examples 1 to 3 made of TiN, TiC, and T1CN were also evaluated under the same conditions as those of the first example, and the results are also listed in the table.
（以下余白）
○：変化なし
Δ：クランクあり（面形状、表面粗さ変化なし）×：ク
ランク、析出あり（面形状、表面粗さ変化）上記表から
判るように、第１〜４実施例の光学素子成形用型は、５
００００シぢット後であってもＡｌｚ（ｈｒｌＡにガラ
スの付着はなく、硬さおよび耐食性は良好であり、クラ
ンクや中間層からの析出もなく、良好な面形状および表
面粗さを保持していた。これに対し、中間層をＴｉＮ、
Ｔｉｃ。(Space below) ○: No change Δ: Crank (no change in surface shape, surface roughness) ×: Crank, precipitation (change in surface shape, surface roughness) As can be seen from the table above, Examples 1 to 4 The mold for molding optical elements is 5
Even after 0,000 seats, there is no glass adhesion to Alz(hrlA, the hardness and corrosion resistance are good, and there is no precipitation from the crank or intermediate layer, and it maintains a good surface shape and surface roughness. On the other hand, the intermediate layer was made of TiN,
Tic.
Ｔ１ＣＮで形成した比較例１〜３では、Ｔｉの酸化によ
るＡＺ、Ｏ，膜のクラックおよび析出が発生し、面形状
および表面粗さが悪化した。In Comparative Examples 1 to 3 formed of T1CN, cracks and precipitation of AZ, O, and films due to Ti oxidation occurred, and the surface shape and surface roughness deteriorated.
（第５〜８実施例）
ＳｉＣの焼結体にまり型基材を形成し、第１実施例と同
様にしてＣｒ−Ｃの中間層とＡｊ！ｇｏｓ膜とを形成し
て光学素子成形用型を得た。(Fifth to Eighth Examples) A sintered SiC body is formed into a molded base material, and a Cr-C intermediate layer and Aj! are formed in the same manner as in the first example. A mold for molding an optical element was obtained by forming a Gos film.
本実施例の光学素子成形用型についても第１実施例の成
形用型と同様の底形を行った。その結果、第１〜４実施
例のものと同様に、５００００シヨント後においても、
Ａｊ！ｚ（ｈ膜にガラスの付着はなく、硬さおよび耐食
性は良好であり、クラックや中間層からの析出もなく、
良好な面形状および表面粗さを保持していた。The bottom shape of the mold for molding an optical element of this example was similar to that of the mold for molding of the first example. As a result, as in the first to fourth embodiments, even after 50,000 shots,
Aj! z(h) There is no glass adhesion to the film, the hardness and corrosion resistance are good, there are no cracks or precipitation from the intermediate layer,
Good surface shape and surface roughness were maintained.
また、ＳｉＣの焼結体により型基材を形成しζ中間層を
Ｚｒ−Ｃ，Ｈｆ−Ｃ，Ｍｏ −Ｃとした実施例６〜８の
光学素子成形用型も第５実施例と同様の効果が得られた
。In addition, the optical element molds of Examples 6 to 8, in which the mold base material was formed of a sintered body of SiC and the ζ intermediate layer was Zr-C, Hf-C, or Mo-C, were similar to those in the fifth example. It worked.
（第９実施例）
ＷＣの焼結体にまり型基材を形成し、中間層をＣｒ−Ｃ
膜とＺｒ−Ｃ膜とからとからなる多層膜で形成し、Ｚｒ
−Ｃの上にＡｊ２ｚＯｓ膜を形成して光学素子成形用型
を得た。中間層の膜厚等の条件は第１実施例と同様であ
る。(Ninth Example) A ball-shaped base material is formed on a sintered body of WC, and the intermediate layer is made of Cr-C.
It is formed of a multilayer film consisting of a Zr-C film and a Zr-C film.
An Aj2zOs film was formed on -C to obtain a mold for molding an optical element. Conditions such as the thickness of the intermediate layer are the same as in the first embodiment.
中間層を多層膜で形成した本実施例の光学素子成形用型
も第１実施例のものと同様に、底形によるＡ１．ｚＯｓ
Ｗｌへのガラスの付着はなく、硬さおよび耐食性は良好
であり、クラックや中間層からの析出もなく、良好な面
形状および表面粗さを保持していた。The mold for molding an optical element according to this embodiment, in which the intermediate layer is formed of a multilayer film, has a bottom shape of A1. zOs
There was no adhesion of glass to Wl, the hardness and corrosion resistance were good, there were no cracks or precipitation from the intermediate layer, and good surface shape and surface roughness were maintained.
なお、中間層を多層膜とする組合わせは、本実施例に限
定されるものではなく、Ｃｒ −Ｃ。Note that the combination in which the intermediate layer is a multilayer film is not limited to this example, and may be Cr-C.
Ｚｒ −Ｃ，Ｈｆ −Ｃ，Ｍｏ −Ｃの中から任意の組
合わせを選択することができる。Any combination can be selected from Zr-C, Hf-C, and Mo-C.
また、上記各実施例では中間層を形成する各炭化物はイ
オンビームスパッタで形成し、中間層の膜厚は５０００
λ程度としたが、本発明は上記各実施例に限定されるも
のではなく、中間層の形成方法、膜厚等は適宜変更して
もよい。Further, in each of the above embodiments, each carbide forming the intermediate layer was formed by ion beam sputtering, and the thickness of the intermediate layer was 5000 mm.
Although approximately λ, the present invention is not limited to the above embodiments, and the method of forming the intermediate layer, the film thickness, etc. may be changed as appropriate.
Ｃ発明の効果〕
以上のように、本発明の光学素子成形用型によれば、Ａ
ｆ ｔｏ、膜を表層として型基材との間に中間層とし
てＣｒ、Ｚｒ、ＨｆまたはＭｏの炭化物からなる膜を形
成しているので、ガラスが付着しに＜＜、硬さおよび耐
酸化性に優れ、しかもＡｆｆｉｘ（ｈｌｌｌは剥離しに
くく、クランクも発生せず、中間層が析出してくること
もないため、長期間に亘って良好な面形状や表面粗さを
保持することができる。C Effect of the invention] As described above, according to the optical element molding mold of the present invention, A
f to, since a film made of carbide of Cr, Zr, Hf or Mo is formed as an intermediate layer between the film as a surface layer and the mold base material, it has excellent hardness and oxidation resistance. Furthermore, since Affix (hlll) does not easily peel off, does not cause cranking, and does not cause the intermediate layer to precipitate, it is possible to maintain a good surface shape and surface roughness for a long period of time.
図は本発明の光学素子成形用型の第１実施例を示す縦断
面図である。
■・・・型基材
１ａ・・・酸形基礎面
２・・・中間層
３・・・ＡＩ！、２（ｈ膜The figure is a longitudinal sectional view showing a first embodiment of the mold for molding an optical element of the present invention. ■...Mold base material 1a...Acid type basic surface 2...Intermediate layer 3...AI! , 2(h membrane
Claims (1)
学素子成形用型において、型基材とＡｌ＿２Ｏ＿３層と
の間にＣｒ、Ｚｒ、Ｈｆ、またはＭｏの炭化物からなる
膜を少なくとも一層設けて中間層を形成したことを特徴
とする光学素子成形用型。(1) In an optical element mold in which at least the molding surface is coated with Al_2O_3, at least one film made of a carbide of Cr, Zr, Hf, or Mo is provided between the mold base material and the Al_2O_3 layer to form an intermediate layer. A mold for molding optical elements characterized by the following.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34258389A JPH03199130A (en) | 1989-12-27 | 1989-12-27 | Mold for molding optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34258389A JPH03199130A (en) | 1989-12-27 | 1989-12-27 | Mold for molding optical element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03199130A true JPH03199130A (en) | 1991-08-30 |
Family
ID=18354890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34258389A Pending JPH03199130A (en) | 1989-12-27 | 1989-12-27 | Mold for molding optical element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03199130A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007254234A (en) * | 2006-03-24 | 2007-10-04 | Olympus Corp | Method for producing molding die for optical element |
-
1989
- 1989-12-27 JP JP34258389A patent/JPH03199130A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007254234A (en) * | 2006-03-24 | 2007-10-04 | Olympus Corp | Method for producing molding die for optical element |
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