JPH03200027A - Radiation thermometer - Google Patents
Radiation thermometerInfo
- Publication number
- JPH03200027A JPH03200027A JP1340092A JP34009289A JPH03200027A JP H03200027 A JPH03200027 A JP H03200027A JP 1340092 A JP1340092 A JP 1340092A JP 34009289 A JP34009289 A JP 34009289A JP H03200027 A JPH03200027 A JP H03200027A
- Authority
- JP
- Japan
- Prior art keywords
- measured
- radiation
- value
- background
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005855 radiation Effects 0.000 title claims description 64
- 230000003287 optical effect Effects 0.000 claims abstract description 41
- 238000005259 measurement Methods 0.000 claims description 20
- 238000005375 photometry Methods 0.000 claims description 18
- 230000005469 synchrotron radiation Effects 0.000 claims description 11
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 238000005286 illumination Methods 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 9
- 239000000835 fiber Substances 0.000 description 8
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000014509 gene expression Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 101150045677 ACA2 gene Proteins 0.000 description 2
- 101150013375 ACA3 gene Proteins 0.000 description 2
- 101100332654 Arabidopsis thaliana ECA1 gene Proteins 0.000 description 2
- 101100377936 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CST6 gene Proteins 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 101150107995 ACA1 gene Proteins 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Radiation Pyrometers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、被測定物から放射される赤外線等の光を受光
し、その受光光量から被測定物の温度を求める放射温度
計に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a radiation thermometer that receives infrared light or other light emitted from an object to be measured and determines the temperature of the object from the amount of received light. be.
C従来の技術〕
被測定物からの放射光を測光し、その測光値に基づいて
被測定物の温度を求める放射温度計は一般に知られてい
るが、この種の放射温度計において、被測定物の温度以
外の要素が放射光の測光値に影響を及ぼす場合があり、
例えば被測定物の放射率や、被測定物以外の放射源から
の背景放射光等が放射光の測光値に影響する。そして、
被″測定物の温度を求めるためには、被測定物の温度以
外の要素の影響を調べる必要がある。C. Prior Art] Radiation thermometers that measure radiation from an object to be measured and determine the temperature of the object based on the photometric value are generally known. Factors other than object temperature may affect the photometric value of synchrotron radiation.
For example, the emissivity of the object to be measured, the background radiation from a radiation source other than the object to be measured, etc. affect the photometric value of the radiation. and,
In order to determine the temperature of the object to be measured, it is necessary to investigate the influence of factors other than the temperature of the object.
従来、このような点を考慮して被測定物の温度を求める
ようにした放射温度計として、例えば特開昭63−30
5227号公報または特開昭63−305228号公報
に示されるように、波長の異なる2以上または3以上の
参照光を被測定物に向けて照射する照射手段と、上記各
波長の参照光を側光する参照光測光手段と、上記被測定
物により反射された上記各波長の参照光の反射光を測光
する反射光測光手段と、被測定物からの放射輝度を各波
長別に測光する放射輝度測光手段と、放射率と測定反射
情報値および未知の係数との関係についての所定の仮定
に基づいて、上記各測光手段の測光値から、放射率の影
響を除いた被測定物の温度を算出する演算手段とを備え
たものが知られている。この放射温度計によると、被測
定物の放射率が未知である場合に、その影響を除去する
ことができる。さらにこれら公報には、背景放射光の値
が既知であるか、測定手段により測定された値である場
合に、背景放射の影響も除去して被測定物の温度を算出
することが開示されている。Conventionally, a radiation thermometer that takes these points into account to determine the temperature of an object to be measured is disclosed, for example, in Japanese Patent Application Laid-Open No. 63-30.
As shown in Japanese Patent Laid-open No. 5227 or Japanese Patent Application Laid-Open No. 63-305228, an irradiation means for irradiating two or more or three or more reference beams with different wavelengths toward an object to be measured, and a side beam for irradiating reference beams of each of the wavelengths. a reference light photometer that emits light, a reflected light photometer that measures the reflected light of the reference light of each wavelength reflected by the object to be measured, and a radiance photometer that measures the radiance from the object to be measured for each wavelength. Based on predetermined assumptions regarding the relationship between the means, emissivity, measured reflection information value, and unknown coefficient, the temperature of the object to be measured is calculated from the photometric values of each of the photometric means, excluding the influence of emissivity. A device equipped with a calculation means is known. According to this radiation thermometer, when the emissivity of the object to be measured is unknown, its influence can be removed. Furthermore, these publications disclose that when the value of the background radiation is known or is a value measured by a measuring means, the temperature of the object to be measured can be calculated by removing the influence of the background radiation. There is.
ところが、放射光の測光値に影響を及ぼす要素として、
上記の放射率および背景放射光のほかに、光路での光損
失が問題となる場合がある。つまり、赤外線吸収のある
雰囲気で測定する場合や測定系における視野欠けあるい
はレンズの汚れがある場合等には光損失が生じる。この
ような場合に、上記光損失が放射光の測光値に影響を及
ぼし、かつ、この光損失の程度が不明であるため、従来
の放射温度計では光損失に起因した誤差を除去すること
ができないという問題が残されていた。However, as factors that affect the photometric value of synchrotron radiation,
In addition to the emissivity and background radiation mentioned above, optical loss in the optical path may be a problem. In other words, optical loss occurs when measuring in an atmosphere that absorbs infrared rays, when there is a field of view missing in the measurement system, or when the lens is dirty. In such cases, the above-mentioned optical loss affects the photometric value of synchrotron radiation, and the extent of this optical loss is unknown, so conventional radiation thermometers cannot eliminate errors caused by optical loss. The problem remained that it could not be done.
本発明は、上記に鑑みてなされたもので、放射率および
背景放射の影響の除去に加え、上記光損失の影響をも除
去し、被測定物の温度を精度良く求めることができる放
射温度計を提供することを目的とする。The present invention has been made in view of the above, and is a radiation thermometer that can eliminate the effects of emissivity and background radiation as well as the effects of optical loss, and can accurately determine the temperature of a measured object. The purpose is to provide
本発明は上記の目的を達成するため、光路での光損失が
生じる状況下で被測定物からの放射光の測定に基づいて
被測定物の温度を測定する放射温度計であって、異なる
3以上の波長を含む参照光を上記被測定物に向けて照射
する照光手段と、上記参照光を上記各波長別に測光する
参照光測光手段と、上記被測定物により反射された上記
参照光の反射光を上記各波長別に測光する反射光測光手
段と、上記被測定物からの放射光を上記各波長別に測光
する放射光測光手段と、上記被測定物に周囲から入射す
る背景放射光の値を供給する背景放射光値供給手段と、
上記各測光手段によって得られる各測光値および上記背
景放射光値供給手段によって得られる背景放射光値を入
力し、これらの値と未知数である上記被測定物の温度、
放射率および上記光損失との間の関係に基づいて未知数
を解き、被測定物の温度を算出する演算手段とを備えた
ものである。In order to achieve the above object, the present invention provides a radiation thermometer that measures the temperature of a measured object based on the measurement of emitted light from the measured object under conditions where optical loss occurs in the optical path. illumination means for irradiating reference light including the above wavelengths toward the object to be measured; reference light metering means for measuring the reference light for each of the wavelengths; and reflection of the reference light reflected by the object to be measured. reflected light photometry means for measuring light according to each of the wavelengths; synchrotron radiation photometry means for measuring the emitted light from the object to be measured according to each wavelength; Background radiation value supply means for supplying;
Each photometric value obtained by each of the photometric means and the background radiation value obtained by the background radiation value supplying means are input, and these values and the temperature of the object to be measured, which is an unknown quantity, are input.
The apparatus is equipped with calculation means for calculating the temperature of the object to be measured by solving the unknown quantity based on the relationship between the emissivity and the above-mentioned optical loss.
この構成において、上記背景放射光値供給手段は、例え
ば被測定物の周囲の物体からの放射光を上記各波長別に
測光する背景放射光測光手段で構成され、あるいは、被
測定物の周囲の物体からの放射光の上記各波長別の値が
既知である場合にその値を入力する背景放射光値入力手
段で構成される。In this configuration, the background emitted light value supplying means may include background emitted light photometry means for measuring emitted light from objects around the object to be measured for each of the wavelengths, or The background radiation value input means is configured to input the value of the radiation light for each wavelength when the value is known.
上記構成によると、背景放射値は上記背景放射光値供給
手段によって与えられ、また上記放射率および光損失は
被測定物の温度とともに未知数として、これらと上記各
測光値と背景放射光値との間の関係から上記演算手段で
解かれ、こうして背景放射光値、放射率および光損失の
影響を除いた被測定物の正しい温度が算出されることと
なる。According to the above configuration, the background radiation value is given by the background radiation value supply means, and the emissivity and optical loss are unknown together with the temperature of the object to be measured, and these, each of the photometric values, and the background radiation value are combined. The calculation means calculates the correct temperature of the object to be measured, excluding the influence of the background radiation value, emissivity, and optical loss.
第1図は本発明の第1実施例についての放射温度計の全
体構成を示している。この放射温度計における後記の各
測光手段は異なる3以上のn種の波長の光を測光し、図
ではn==3の場合を示している。FIG. 1 shows the overall configuration of a radiation thermometer according to a first embodiment of the present invention. Each of the photometric means described later in this radiation thermometer measures light of three or more different n types of wavelengths, and the figure shows the case where n==3.
この図において、照光手段は、異なるn種の波長λi
(i=1.2.・・・、n)の光を含む参照光を発生
する光源部LSと、射出ファイバーFBaおよび射出ヘ
ッドOHaで構成され、上記光源部LSにおいて後述の
ように周波数fで断続させた参照光を、射出ファイバー
FBa、射出ヘッドOHaを通して被測定物TGの測定
箇所に照射するようになっている。また、反射率を計算
するために、光源部LSから各波長λ1の参照光に応じ
た信号がモニターラインに出力され、それぞれ増幅器A
1で増幅されてA/D変換器ADCでA/D変換される
ことにより、各波長の参照光測光値M(A1)が得られ
るようにし、図に示す例では3波長についての参照光測
光値M(A1 ) 、 M (A2)、M(A3)が得
られるように3つの増幅器Al 、A2.A3が設けら
れている。これらの増幅器Aiを含むモニターラインに
より参照光測光手段が構成されている。In this figure, the illumination means has n different wavelengths λi
It is composed of a light source section LS that generates a reference light including light of (i=1.2...,n), an injection fiber FBa, and an injection head OHa. The intermittent reference light is irradiated to the measurement location of the object to be measured TG through the injection fiber FBa and the injection head OHa. In addition, in order to calculate the reflectance, a signal corresponding to the reference light of each wavelength λ1 is output from the light source section LS to the monitor line,
1 and A/D conversion by the A/D converter ADC to obtain the reference light photometry value M(A1) for each wavelength. In the example shown in the figure, the reference light photometry value M (A1) for each wavelength is obtained. Three amplifiers Al, A2 . A3 is provided. A monitor line including these amplifiers Ai constitutes a reference light photometry means.
一方、上記射出ヘッドOHaより被測定物TGに照射さ
れた参照光の反射光と、背景放射光と、被測定物TG自
身からの放射光とを含む光は、被測定物TGの測定箇所
に向けて配置された測定ヘッドOHbで集光され、測定
ファイバーFBbを通って、光分岐部BRに送られる。On the other hand, the light including the reflected light of the reference light irradiated onto the object to be measured TG from the injection head OHa, the background radiation light, and the emitted light from the object to be measured TG itself is transmitted to the measurement point of the object to be measured TG. The light is focused by a measurement head OHb arranged toward the light beam, and is sent to the optical branch BR through a measurement fiber FBb.
そしてこの光が光分岐部BR□で各波長λ□、λ2.λ
3に分光され、各々後述の光検出器S、、S2.S3に
より電気信号に変換される。この信号は、参照光の反射
光に対応する周波数fの交流成分と、背景放射光と被測
定物TG自身からの放射光との和に対応する直流成分と
からなっている。このうちの交流成分は、各波長別にそ
れぞれ、直流カットコンデンサC工、C2,C3と、増
幅器ACA1゜ACA2.ACA3と、整流回路RC1
,RC2゜RC3とで構成された交流成分抽出用回路を
経て、A/D変換器ADCによりΔ/D変換され、反射
光測光値R(λt)、R(A2)、R(A3)とされる
。また直流成分は、各波長別にそれぞれ、増幅器DCA
1.DCA2 、DCA3 と、交流成分除去のための
サンプルアンドホールド回路SH1、S H2、S H
3とで構成される直流成分抽出用回路を経て、A/D変
換器ADCによりA/D変換され、放射光測光値E(A
1)、E(A2)。Then, this light is transmitted to the optical branching section BR□ with each wavelength λ□, λ2, . λ
3, each of which is separated by a photodetector S, , S2, which will be described later. It is converted into an electrical signal by S3. This signal consists of an alternating current component with a frequency f corresponding to the reflected light of the reference light, and a direct current component corresponding to the sum of the background emitted light and the emitted light from the object to be measured TG itself. Among these, the AC component is processed by DC cut capacitors C, C2, C3 and amplifiers ACA1, ACA2, . ACA3 and rectifier circuit RC1
, RC2゜RC3, and then Δ/D conversion by the A/D converter ADC, resulting in reflected light photometric values R(λt), R(A2), and R(A3). Ru. In addition, the DC component is processed by an amplifier DCA for each wavelength.
1. DCA2, DCA3, and sample-and-hold circuits SH1, SH2, SH for removing AC components
3, and is then A/D converted by the A/D converter ADC to obtain the synchrotron radiation photometry value E (A
1), E(A2).
E(A3)とされる。E(A3).
こうして、測定ヘッドOHbで集光された光を各波長別
に測定する系のうちで交流成分抽出用回路により反射光
測光手段が構成されるとともに、直流成分抽出用回路に
より放射光測光手段が構成されている。In this way, in the system that measures the light focused by the measurement head OHb for each wavelength, the AC component extraction circuit constitutes the reflected light photometry means, and the DC component extraction circuit constitutes the emitted light photometry means. ing.
また、被測定物TGの温度に比べて周囲の物体の温度が
充分に低ければ背景放射光を無視してもよいが、背景放
射光を無視することができない場合のために、背景放射
光の値を求めて供給する背景放射元値供給手段として、
背景放射光を上記各波長別に測光する背景放射光測光手
段BGRMと、背景放射光値入力手段BGRIとが設け
られている。背景放射光の上記各波長別の値が既知であ
る場合はその値を背景放射光値入力手段BGRIより人
力し、既知でなければ上記背景放射光測光手段BGRM
で測光すればよく、この背景放射光測光手段BGRMも
しくは背景放射光値入力手段BGRIによって各波長別
の背景放射光値Eb(λ□)、Eb(A2)、Eb(A
3)が与えられる。Also, if the temperature of the surrounding objects is sufficiently low compared to the temperature of the object to be measured TG, the background radiation can be ignored, but in case the background radiation cannot be ignored, the background radiation As a background radiation source value supply means for obtaining and supplying values,
A background radiation photometry means BGRM and a background radiation value input means BGRI are provided for measuring the background radiation for each of the wavelengths. If the values of the background radiation for each wavelength are known, input the values manually from the background radiation value input means BGRI; if not, enter the values manually from the background radiation photometry means BGRM.
The background radiation light measurement means BGRM or the background radiation value input means BGRI can be used to calculate the background radiation values Eb (λ
3) is given.
上記の参照光測光値M(λ、)〜M(A3)、反射光測
光値R(λ□)〜R(A3)、放射光測光値E(A1)
〜E(A3)および背景放射光値Eb(A1)〜Eb(
A3)は演算手段TCに入力される。そしてこの演算手
段TCにおいて、被測定物TGの温度のほかに放射率お
よび光路での光損失を未知数に含め、上記各測光値およ
び背景放射光値と各未知数との間の関係に基づき、後述
のような演算原理および解法により未知数が求められて
、被測定物TGの温度が算出される。算出された値は表
示部DSPおよび出力部oPに入力され、アナログ的ま
たはデジタル的に表示および出力が行なわれる。The above reference light photometry values M(λ,) to M(A3), reflected light photometry values R(λ□) to R(A3), and synchrotron radiation photometry values E(A1)
~E(A3) and background radiation value Eb(A1) ~Eb(
A3) is input to the calculation means TC. In addition to the temperature of the object to be measured TG, the calculation means TC also includes the emissivity and the optical loss in the optical path as unknowns, and based on the relationship between each of the above-mentioned photometric values and background emitted light values and each unknown, as will be described later. The unknown quantity is determined by the calculation principle and solution method as shown in the following, and the temperature of the object to be measured TG is calculated. The calculated value is input to the display section DSP and the output section oP, and is displayed and output in an analog or digital manner.
上記光源部LSは、例えば第2図に示すように、ハロゲ
ンランプ1から照射して反射鏡2により集光した参照光
を、モータ3で駆動されるチョッパ4により周波数fで
断続させて射出ファイバーFBaに送込む一方、ガラス
またはハーフミラ−5で反射させた参照光を分岐ファイ
バー6および光学フィルター7.8.9を通して各波長
に分光し、光検出器s11 s21 s3で光電変
換してモニターラインに出力するような構造とされる。As shown in FIG. 2, for example, the light source section LS is configured to emit a reference light emitted from a halogen lamp 1 and condensed by a reflector 2 at a frequency f using a chopper 4 driven by a motor 3 to emit the reference light into an injection fiber. While sending it to FBa, the reference light reflected by glass or half mirror 5 is separated into each wavelength through branching fiber 6 and optical filter 7.8.9, photoelectrically converted by photodetectors s11 s21 s3, and sent to the monitor line. The structure is such that it can be output.
あるいは第3図もしくは第4図のように、各波長別の半
導体レーザーダイオード11.12.13を交流電源1
4に接続し、これらのダイオード11,12.13から
射出される周波数fの参照光を集合して射出ファイバー
FBaに送る一方、各ダイオード11,12.13に接
続した出力部から、参照光に応じた信号をモニターライ
ンに出力するような構造であってもよい。Alternatively, as shown in Fig. 3 or 4, the semiconductor laser diodes 11, 12, 13 for each wavelength are
4, the reference beams of frequency f emitted from these diodes 11, 12.13 are collected and sent to the injection fiber FBa, while the output section connected to each diode 11, 12.13 is connected to the reference beam. The structure may be such that a corresponding signal is output to a monitor line.
また、上記光分岐部BRは、例えば第5図のように、測
定ファイバーFBbの端部を分岐させ、その各分岐され
た光をそれぞれ所定波長の光のみを透過させる光学フィ
ルター21.22.23を通して光検出器S工、S2.
S、に受光させるような構造とされる。あるいは第6図
に示すように、測定ファイバーFBbを通った光を、レ
ンズ24および回折格子25により各波長に分けて光検
出器s1.s2.S3に受光させるような構造としても
よく、また第7図のように、測定ファイバーFBbを通
った光を、レンズ26およびグイクロイックミラー27
.28により各波長に分け、光学フィルター29.30
.31を通して光検出器S□r 82 * 33に
受光させるような構造でもよい。In addition, the optical branching unit BR includes optical filters 21, 22, and 23 that branch the end of the measurement fiber FBb and transmit only light of a predetermined wavelength of each branched light, as shown in FIG. 5, for example. Through the photodetector S, S2.
The structure is such that light is received by S. Alternatively, as shown in FIG. 6, the light passing through the measurement fiber FBb is divided into wavelengths by a lens 24 and a diffraction grating 25, and the light is divided into wavelengths by a photodetector s1. s2. Alternatively, as shown in FIG.
.. Divided into each wavelength by 28, optical filter 29.30
.. The structure may be such that the light is received by the photodetector S□r 82 * 33 through 31.
次に、本発明が適用される温度等の演算原理および解法
を説明する。Next, the calculation principle and solution method for temperature, etc. to which the present invention is applied will be explained.
温度等の演算原理
被測定物が温度Tの黒体であると仮定した場合は、被測
定物から単位面積当り、単位立体角当りに放射される波
長λの光の光束、すなわち分光放射輝度L(λ、T)は
、ブランクの公式によって与えられる。装置の光学系が
測定面積ΔA1測定立体角ΔΩをもっているとし、放射
光測光値がE。(λ、T)とすると、これと分光放射輝
度しくλ、T)との関係は極座標(r、 θ、φ)を
使って次の(11式のように表わされる。Principles of calculating temperature etc. Assuming that the object to be measured is a black body with temperature T, the luminous flux of light with wavelength λ emitted from the object per unit area and unit solid angle, that is, the spectral radiance L (λ, T) is given by Blank's formula. Assuming that the optical system of the device has a measurement area ΔA1 and a measurement solid angle ΔΩ, the photometric value of the emitted light is E. (λ, T), the relationship between this and the spectral radiance (λ, T) is expressed using polar coordinates (r, θ, φ) as shown in the following equation (11).
Eo (λ、 T) =Ce−躯f f、g J、)
、 S (λ)−L(λ、T) cosθ −s
inθ・ d λ d θ dA ・・
・(1)ここで、S(λ)は光検出器、光学フィルター
の総合的な分光感度、Ceは測定装置の直流信号に関す
る光電変換係数で、具体的には黒体の校正測定により決
められる定数である。従って、温度Tの黒体からの放射
光の測光値に相当する上記E。(λ、T)の値は予め準
備しておくことができる。Eo (λ, T) = Ce-body f f, g J,)
, S (λ) − L (λ, T) cosθ −s
inθ・d λ d θ dA ・・
・(1) Here, S (λ) is the overall spectral sensitivity of the photodetector and optical filter, and Ce is the photoelectric conversion coefficient regarding the DC signal of the measuring device, which is specifically determined by blackbody calibration measurement. It is a constant. Therefore, the above E corresponds to the photometric value of emitted light from a black body at temperature T. The values of (λ, T) can be prepared in advance.
ところで、実際の被測定物TGは黒体ではないので、放
射光測光値には放射率が関係し、また背景放射の影響も
ある。さらに、被測定物TGと測定ヘッドOHbとの間
の雰囲気中に水蒸気等のガスが存在して赤外線吸収があ
ったり、測定系における視野欠けやレンズの汚れがあっ
た場合等には、測定波長域で光損失が生じる。By the way, since the actual object to be measured TG is not a black body, the photometric value of the emitted light is related to the emissivity and is also affected by the background radiation. Furthermore, if there is gas such as water vapor in the atmosphere between the object to be measured TG and the measurement head OHb, which causes infrared absorption, or if there is a lack of field of view or dirt in the measurement system, the measurement wavelength Optical loss occurs in the area.
この場合において、各波長での被測定物TGの放射率を
と(λi)、反射率をρ(λi)とし、また上記光損失
をα(λi)とすると、放射光測光値E(λi)につい
て次の(2)式が成立つ。In this case, if the emissivity of the measured object TG at each wavelength is (λi), the reflectance is ρ (λi), and the optical loss is α (λi), then the synchrotron radiation photometric value E (λi) The following equation (2) holds true for .
E (λ i)= α (λ i)[ε (λ i)
−EO(λ i 。E (λ i) = α (λ i) [ε (λ i)
−EO(λ i .
T)+ρ(λi)・Eb(λi)]
・・・(2)
被測定物TGが測定波長域で非透過性の物体である場合
、放射率と反射率との関係は、ε(λi)+ρ(λ1)
=1 ・・・(3)となる。T)+ρ(λi)・Eb(λi)] ...(2) When the object to be measured TG is a non-transparent object in the measurement wavelength range, the relationship between emissivity and reflectance is ε(λi) +ρ(λ1)
=1...(3).
また、第8図のように単位光強度をもつ波長λの光が被
測定物TGに入射し、その光が様々な角度(θ、ψ)に
光強度Ir(θ、ψ、λ)をもって反射したとすると、
半球反射率ρ(λ)は次の(4)式で表わされる。Also, as shown in Figure 8, light of wavelength λ with unit light intensity is incident on the object to be measured TG, and the light is reflected at various angles (θ, ψ) with light intensity Ir (θ, ψ, λ). Suppose that
The hemispherical reflectance ρ(λ) is expressed by the following equation (4).
ρ(λ) = (1/2π) f” f″I r (
θ、ψ。ρ(λ) = (1/2π) f” f″I r (
θ, ψ.
λ) sinθ−dθdψ −(4)これに対し
、参照光測光手段および反射光測光手段による測光値M
(λi)、R(λi)から求められるみかけ上の反射率
r(λi)は、「 (λ 1)=Cr −R(λ i
)/M(λ i)=α2 (λ’ ) [(1/2π
) f fARI r(θ、 ψ、 λ) +
inθ−dθdψ1・・・(5)
である。ここで、Crは反射光測光手段における交流信
号と参照光測光手段におけるモニター信号の充電変換効
率に関する係数で、反射の校正測定によって決められる
定数である。半球空間への全反射光と実際に測定される
反射光との比をβ(λi)とすると、
β(λ+) = (f fARI r (θ、ψ、λ
)・tinθ−dθdψ) / (f:′cf:I r
(θψ、λ) 目ユθ・dθdψ)
r (λi)=α2 (λi)・β(λi)・ρ(λ)
・・・(6)
が成立つ。従って、放射率は次の(7)式で表わされる
。λ) sinθ−dθdψ −(4) On the other hand, the photometry value M by the reference light photometry means and the reflected light photometry means
The apparent reflectance r(λi) obtained from (λi) and R(λi) is “(λ 1)=Cr −R(λ i
)/M(λ i)=α2 (λ') [(1/2π
) f fARI r(θ, ψ, λ) +
inθ−dθdψ1 (5). Here, Cr is a coefficient related to the charging conversion efficiency of the alternating current signal in the reflected light photometric means and the monitor signal in the reference light photometric means, and is a constant determined by calibration measurement of reflection. Let β(λi) be the ratio of the total reflected light to the hemispherical space and the actually measured reflected light, then β(λ+) = (f fARI r (θ, ψ, λ
)・tinθ−dθdψ) / (f:′cf:I r
(θψ, λ) Eye θ・dθdψ) r (λi)=α2 (λi)・β(λi)・ρ(λ)
...(6) holds true. Therefore, the emissivity is expressed by the following equation (7).
ε (λ1)=1− (1/α2 (λi)) (1
/β(λi)) ・r (λi) ・・・(7)上
記(6)式、(7)式を(2)式に代入すると、次の条
件式(8)が得られる。ε (λ1)=1− (1/α2 (λi)) (1
/β(λi)) ·r(λi) (7) By substituting the above equations (6) and (7) into equation (2), the following conditional equation (8) is obtained.
E(λl)=[α(λi)−(1/α(λ1))(1/
β(λi)) ・r(λi)]”E(7(λi、T)
+ (1/α(λI))(1/β(λi)) ・r(
λi)
・Eb(λi) ・・・(8)この条件式(8
)はn波長についてそれぞれ得られるので、条件式(8
)の数はn個であり、この中に含まれる未知数はα(λ
i)、β(λi)、Tの2n+1個であるので、このま
までは未知数を解くことができない。そこで、次のよう
に、妥当な仮定をし、近似式を用いて未知数を減少させ
ることにより、温度、放射率、光損失等を求めることが
できる。E(λl)=[α(λi)−(1/α(λ1))(1/
β(λi)) ・r(λi)]”E(7(λi, T)
+ (1/α(λI))(1/β(λi)) ・r(
λi) ・Eb(λi) ... (8) This conditional expression (8
) can be obtained for each n wavelength, so conditional expression (8
) is n, and the unknowns included in this are α(λ
i), β(λi), and T, so the unknowns cannot be solved as they are. Therefore, temperature, emissivity, optical loss, etc. can be determined by making reasonable assumptions and using approximate expressions to reduce the unknowns, as described below.
α(λ1)を波長λの1次式(I≧0) 、1/β(λ
l)を波長λのm次式(m≧0)で近似すると、1次式
では未知数が0次から1次までの各係数の個数に相当す
る(/+1)個、m次式では未知数が0次からm次まで
の各係数の個数に相当する(m+1)個となるので、こ
れらと温度Tとを合せた未知数は(AI+m+3)個と
なる。α(λ1) is expressed as a linear expression of wavelength λ (I≧0), 1/β(λ
l) is approximated by an m-order equation (m≧0) with wavelength λ, the linear equation has (/+1) unknowns corresponding to the number of coefficients from the 0th to the 1st-order, and the m-order equation has unknowns. Since the number of unknowns is (m+1) corresponding to the number of coefficients from the 0th order to the mth order, the number of unknowns including these and the temperature T is (AI+m+3).
従って、n≧(l+m+3)となるようにn。Therefore, n such that n≧(l+m+3).
/、mを選定すれば、(8)式をもとにして未知数を解
くことができる。具体的な例として、m=1−〇、つま
りα(λi)および1/β(λi)が波長に対して一定
であると仮定し、
α(λ1)=3゜ (=一定) ・・・(9)1
/β(λ1)=bo (=一定) ・・・(lO)
とおく。(9)式のようにおくことは、光路での光損失
が灰色的であることを意味する。また、(lO)式のよ
うにおくことは、半球反射率に対する測定反射率の比が
波長に関して一定であることを意味し、温度演算におい
てこのような仮定が妥当であることは既に知られている
。このような仮定を導入すると、未知数は温度Tとa。/, m is selected, the unknown quantity can be solved based on equation (8). As a specific example, assuming that m=1-〇, that is, α(λi) and 1/β(λi) are constant with respect to wavelength, α(λ1)=3° (=constant)... (9)1
/β(λ1)=bo (=constant) ...(lO)
far. Equation (9) means that the optical loss in the optical path is gray. Furthermore, using the equation (lO) means that the ratio of the measured reflectance to the hemispherical reflectance is constant with respect to wavelength, and it is already known that such an assumption is valid in temperature calculations. There is. If we introduce such an assumption, the unknowns are temperature T and a.
、boの3個となり、3波長以上について測定すること
により未知数を演算することができる。具体的な解法は
種々考えられるが、2つの解法例を次に示す。, bo, and the unknowns can be calculated by measuring three or more wavelengths. Although various specific solutions can be considered, two examples of solutions are shown below.
3波長の光を測定する場合の解法例
(8)式に(9) 、 (10)式を代入して書直す
と、次の(11)式のようになる。Example of solution when measuring light of three wavelengths When formula (8) is rewritten by substituting formulas (9) and (10), the following formula (11) is obtained.
E(λi) = (a6−c、3−r (λ1))E、
(λi。E(λi) = (a6-c, 3-r (λ1))E,
(λi.
T)+c(、−r (λi)・Eb(λi)・・・(l
lま
ただし、co=bO/a。T) + c(, -r (λi)・Eb(λi)...(l
However, co=bO/a.
n=3の場合に(11)式から得られる3つの連立方程
式を解くことにより、温度T等が求められることとなる
。つまり、この連立方程式よりa。。By solving three simultaneous equations obtained from equation (11) when n=3, the temperature T, etc. can be determined. In other words, from this simultaneous equation, a. .
c(、を消去すれば、
と(λI)(Eb(入υ/E、(λt−Tノーl]−と
(λスノ(Eb(λ、)/Eo(λ21丁ノーl)・・
・(12)
となる。EO(λ1.T)は予め求めておくことができ
るので、(I2)式を満たす温度Tは、1次元探索等で
比較的簡単に求められる。さらに必要であれば、放射率
や光損失を算出すればよい。If we eliminate c(, then we get (λI)(Eb(enter υ/E, (λt-Tnorl) - and (λsno(Eb(λ,)/Eo(λ21tonorl)...
・(12) becomes. Since EO(λ1.T) can be determined in advance, the temperature T that satisfies equation (I2) can be determined relatively easily by one-dimensional search or the like. Furthermore, if necessary, emissivity and optical loss may be calculated.
4波長以上の光を測定する場合の解法例(9)式および
(10)式の仮定にはある程度の誤差を含むことが考え
られる。また、測光値にも測定誤差が含まれている。そ
こで、これらの誤差が温度等の未知数に及ぼす影響を緩
和するため、n≧4とした上で、最小二乗法を導入する
。すなわち、測光値と推定値の偏差を評価する目的関数
を考え、その関数を最小とする未知数の組を解とする。Solution example when measuring light with four or more wavelengths The assumptions in equations (9) and (10) are likely to include a certain degree of error. Furthermore, the photometric values also include measurement errors. Therefore, in order to reduce the influence of these errors on unknown variables such as temperature, the least squares method is introduced after setting n≧4. That is, an objective function for evaluating the deviation between the photometric value and the estimated value is considered, and a set of unknowns that minimizes the function is determined as a solution.
−例として、(111式に基づき、放射光の測光値と推
定値の偏差を評価する次のような目的関数F(T)を考
える。- As an example, consider the following objective function F(T) that evaluates the deviation between the photometric value and the estimated value of synchrotron radiation based on Equation 111.
F (T) =Σ[fao Co”r (A1)lE
o(λi。F (T) = Σ[fao Co”r (A1)lE
o(λi.
iコI
T) /E (λi)+Co@ r (λi)・ Eb
(λ i)/E(λ i ) −1コ 2・・・(13
)
あるTの値に対し、F (T)を最小とするa。iCoIT) /E (λi)+Co@r (λi)・Eb
(λ i)/E(λ i) −1 2...(13
) a that minimizes F (T) for a certain value of T.
とcoは、F (T)がa。とC8について下に凸の2
次関数であるので、
aF (T)/aao =0
aF (T) /δC0=0
の連立法定式を解くことにより求められる。このように
して求められるaOr COは縦行列の形式で書くと
次の(14)式のようになる。and co is F (T) is a. and 2 convex downwards about C8
Since it is a function of When aOr CO obtained in this way is written in the form of a vertical matrix, it becomes as shown in the following equation (14).
・・・(14)
ただし、X1=E(λi、T)/E(A1)Yi=r
(λ i) (Eo(λ t、 ’r)−Eb(
λ i) ) /E (λ 1)(14)式のa
oとCoを(13)式に代入し、F (T)を計算する
。この計算を、物理的制約条件(0くε≦1等)や機械
の制約条件(測温可能範囲等)のもとで、Tを種々変え
て繰返すことにより、F(T)を最小とするTの値を一
次元探索する。この値がTの解となる。...(14) However, X1=E(λi, T)/E(A1)Yi=r
(λ i) (Eo(λ t, 'r)−Eb(
λ i) ) /E (λ 1) a of equation (14)
Substitute o and Co into equation (13) to calculate F (T). Minimize F(T) by repeating this calculation while changing T variously under physical constraints (0 x ε≦1, etc.) and machine constraints (temperature measurement range, etc.) Perform a one-dimensional search for the value of T. This value becomes the solution for T.
以上のような演算原理および解法例に示すような演算が
、第1図中に示した演算手段TCにより行なわれる。The calculation principle and the calculation shown in the solution example described above are performed by the calculation means TC shown in FIG.
従って、少なくとも3つの波長についての参照光、反射
光および放射光の各測光値と背景放射光が演算手段TC
に入力されれば、背景放射光および放射率の影響だけで
なく上記光損失の影響も除去されて、被測定物TGの温
度が精度良く求められることとなる。Therefore, each photometric value of the reference light, reflected light, and radiation light for at least three wavelengths and the background radiation light are calculated by the calculation means TC.
If the temperature is inputted, not only the influence of background radiation and emissivity but also the influence of the above-mentioned optical loss are removed, and the temperature of the object to be measured TG can be determined with high accuracy.
以上のように、本発明の放射温度計によると、3以上の
波長について参照光と、参照光の反射光と、被測定物か
らの放射光とをそれぞれ測光手段で各波長別に測光し、
これらの測光値と背景放射光値供給手段によって得られ
る背景放射光値とを演算手段に入力するとともに、被測
定物の温度のほかに放射率および光路での光損失を未知
数として、未知数と上記測光値および背景放射光値との
間の関係に基づいて未知数を解き、被測定物の温度を算
出するようにしているため、放射率および背景放射光に
加えて光路での光損失の影響を除去し、被測定物の温度
を精度良く求めることができるものである。As described above, according to the radiation thermometer of the present invention, the reference light, the reflected light of the reference light, and the emitted light from the object to be measured are each measured for each wavelength by the photometric means for three or more wavelengths,
These photometric values and the background radiation value obtained by the background radiation value supply means are input to the calculation means, and the unknowns and the above are The temperature of the object to be measured is calculated by solving the unknowns based on the relationship between the photometric value and the background radiation value, so in addition to the emissivity and background radiation, the influence of optical loss in the optical path is considered. The temperature of the object to be measured can be determined with high accuracy.
第1図は本発明の第1実施例に係る放射温度計全体の概
略構成を示すブロック図、第2図乃至第4図は光源部の
各種具体例を示すブロック図、第5図乃至第7図は光分
岐部の各種具体例を示すブロック図、第8図は反射率に
ついての説明図である。
LS・・・光源部、A1.A2.A3・・・増幅器、O
Ha・・・射出ヘッド、OHb・・・測定ヘッド、BR
・・・光分岐部、cll C2) C3・・・直流
カットコンデンサ、ACA工、ACA2 、ACA3・
・・増幅器、RC□、RC2、RC3・・・整流回路、
DCA、。
DCA2 、DCA3・・・増幅器、SHl、SH2。
SH3・・・サンプルアンドホールド回路、Sl、S2
、S3・・・光検出器、TC・・・演算手段。FIG. 1 is a block diagram showing a schematic configuration of the entire radiation thermometer according to the first embodiment of the present invention, FIGS. 2 to 4 are block diagrams showing various specific examples of the light source section, and FIGS. 5 to 7 The figure is a block diagram showing various specific examples of the light branching section, and FIG. 8 is an explanatory diagram of reflectance. LS...Light source section, A1. A2. A3...Amplifier, O
Ha...Injection head, OHb...Measuring head, BR
...Optical branch, cll C2) C3...DC cut capacitor, ACA engineering, ACA2, ACA3.
...Amplifier, RC□, RC2, RC3... Rectifier circuit,
D.C.A. DCA2, DCA3...Amplifier, SHl, SH2. SH3...Sample and hold circuit, Sl, S2
, S3... photodetector, TC... calculation means.
Claims (1)
射光の測定に基づいて被測定物の温度を測定する放射温
度計であって、異なる3以上の波長を含む参照光を上記
被測定物に向けて照射する照光手段と、上記参照光を上
記各波長別に測光する参照光測光手段と、上記被測定物
により反射された上記参照光の反射光を上記各波長別に
測光する反射光測光手段と、上記被測定物からの放射光
を上記各波長別に測光する放射光測光手段と、上記被測
定物に周囲から入射する背景放射光の値を供給する背景
放射光値供給手段と、上記各測光手段によって得られる
各測光値および上記背景放射光値供給手段によって得ら
れる背景放射光値を入力し、これらの値と未知数である
上記被測定物の温度、放射率および上記光損失との間の
関係に基づいて未知数を解き、被測定物の温度を算出す
る演算手段とを備えたことを特徴とする放射温度計。 2、上記背景放射光値供給手段は、被測定物の周囲の物
体からの放射光を上記各波長別に測光する背景放射光測
光手段であることを特徴とする請求項1記載の放射温度
計。 3、上記背景放射光値供給手段は、被測定物の周囲の物
体からの放射光の上記各波長別の値が既知である場合に
その値を入力する背景放射光値入力手段であることを特
徴とする請求項1記載の放射温度計。[Scope of Claims] 1. A radiation thermometer that measures the temperature of a measured object based on the measurement of emitted light from the measured object under conditions where optical loss occurs in the optical path, the radiation thermometer having three or more different wavelengths. an illumination means for irradiating a reference light including a reference beam toward the object to be measured; a reference light metering means for measuring the reference light for each of the wavelengths; A reflected light photometer that measures light for each wavelength, a synchrotron radiation photometer that measures the emitted light from the object to be measured for each wavelength, and a background that supplies the value of background emitted light incident on the object to be measured from the surroundings. A synchrotron radiation value supplying means inputs each photometric value obtained by each of the photometric means and a background synchrotron radiation value obtained from the background radiation value supplying means, and calculates these values and the unknown temperature of the object to be measured; A radiation thermometer comprising: calculation means for calculating the temperature of an object to be measured by solving an unknown quantity based on the relationship between emissivity and the optical loss. 2. The radiation thermometer according to claim 1, wherein the background radiation value supplying means is a background radiation photometry means for measuring radiation from objects around the object for each of the wavelengths. 3. The background radiation value supplying means is a background radiation value inputting means for inputting the values for each wavelength of the radiation from objects surrounding the object when the values are already known. The radiation thermometer according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1340092A JPH03200027A (en) | 1989-12-28 | 1989-12-28 | Radiation thermometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1340092A JPH03200027A (en) | 1989-12-28 | 1989-12-28 | Radiation thermometer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03200027A true JPH03200027A (en) | 1991-09-02 |
Family
ID=18333639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1340092A Pending JPH03200027A (en) | 1989-12-28 | 1989-12-28 | Radiation thermometer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03200027A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002527769A (en) * | 1998-10-16 | 2002-08-27 | シーメンス アクチエンゲゼルシヤフト | Method and apparatus for monitoring an optical system having a front lens disposed directly in a combustion chamber |
| US6682216B1 (en) * | 1999-12-16 | 2004-01-27 | The Regents Of The University Of California | Single-fiber multi-color pyrometry |
| JP2007263583A (en) * | 2006-03-27 | 2007-10-11 | Osaka Gas Co Ltd | Measured object temperature detection device, temperature detection method, and heating cooker provided with temperature detection device |
| JP2019020370A (en) * | 2017-07-21 | 2019-02-07 | 新日鐵住金株式会社 | Temperature measurement device, temperature measurement method, and program |
| JP2023552906A (en) * | 2020-12-15 | 2023-12-19 | アルセロールミタル | Estimating the temperature of steel products |
-
1989
- 1989-12-28 JP JP1340092A patent/JPH03200027A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002527769A (en) * | 1998-10-16 | 2002-08-27 | シーメンス アクチエンゲゼルシヤフト | Method and apparatus for monitoring an optical system having a front lens disposed directly in a combustion chamber |
| US6682216B1 (en) * | 1999-12-16 | 2004-01-27 | The Regents Of The University Of California | Single-fiber multi-color pyrometry |
| JP2007263583A (en) * | 2006-03-27 | 2007-10-11 | Osaka Gas Co Ltd | Measured object temperature detection device, temperature detection method, and heating cooker provided with temperature detection device |
| JP2019020370A (en) * | 2017-07-21 | 2019-02-07 | 新日鐵住金株式会社 | Temperature measurement device, temperature measurement method, and program |
| JP2023552906A (en) * | 2020-12-15 | 2023-12-19 | アルセロールミタル | Estimating the temperature of steel products |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4979133A (en) | Pyrometer | |
| JPH0363534A (en) | Temperature measuring method | |
| EP3133380B1 (en) | Photodetector output correction method used for spectroscopic analyzer or spectroscope, spectroscopic analyzer or spectroscope using this method and program for spectroscopic analyzer or spectroscope instructing this method | |
| US20210381976A1 (en) | Microspectroscopic device and microspectroscopic method | |
| JP2001141563A (en) | Spectrometry method and device, temperature measurement device and film pressure measurement device | |
| KR102730647B1 (en) | Spectrometer device | |
| KR20140114447A (en) | Spectral characteristics measurement device and method for measuring spectral characteristics | |
| CN105938013B (en) | Spectrometer and correction method thereof | |
| TW200532164A (en) | Film thickness measuring method and apparatus | |
| US10514460B2 (en) | Optical sensor and abnormality detection method for optical sensor | |
| WO2017110853A1 (en) | Method for measuring concrete | |
| JPH03200027A (en) | Radiation thermometer | |
| JPS6114529A (en) | Measuring method of temperature using optical fiber | |
| CN111684244A (en) | Wavelength detection device and confocal measurement device | |
| JP4504298B2 (en) | Equipment for identifying surface properties | |
| JP3797476B2 (en) | Thickness / component measurement method and apparatus | |
| CN116399244B (en) | High-resolution surface measurement method and apparatus based on broadband laser and wavefront coding | |
| JPS63122906A (en) | Apparatus for measuring thickness of film | |
| JPH0373815A (en) | Radiation thermometer | |
| JPS6014132A (en) | Colorimetric device of surface of moving object | |
| JPH10122824A (en) | Film thickness measuring method | |
| JP2017072463A (en) | Spectrometer | |
| JPS6073407A (en) | Film thickness monitor | |
| KR100205532B1 (en) | Moisture Measurement Device of Powder | |
| JPS6183922A (en) | Spectrometric apparatus of colorimetry |