JPH03202399A - Manufacture of ic card - Google Patents

Manufacture of ic card

Info

Publication number
JPH03202399A
JPH03202399A JP1344431A JP34443189A JPH03202399A JP H03202399 A JPH03202399 A JP H03202399A JP 1344431 A JP1344431 A JP 1344431A JP 34443189 A JP34443189 A JP 34443189A JP H03202399 A JPH03202399 A JP H03202399A
Authority
JP
Japan
Prior art keywords
emboss
card
embossing
layer
embossed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1344431A
Other languages
Japanese (ja)
Inventor
Takakuni Watanabe
渡邉 孝訓
Tetsushi Wakabayashi
哲史 若林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1344431A priority Critical patent/JPH03202399A/en
Publication of JPH03202399A publication Critical patent/JPH03202399A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To shorten the processing time necessary in emboss formation by bonding a material becoming emosses to the surface of an emboss bonding layer whose emboss forming region is notched and forming recessed parts by emboss-processing to fill the recessed parts and the notch parts with a filling material from the back surface of the emboss bonding layer. CONSTITUTION:Notches are formed to the emboss forming region of the high strength reinforcing layer 1c constituting the main body of an IC card and an extremely thin material becoming embosses is bonded to the surface thereof and subsequently subjected to emboss-processing to form embosses 2a. Next, a heated and softened filling material 2c is bonded to the recessed parts 2b formed by the emboss-processing and the notch parts 1c of the reinforcing layer 1c under pressure to fill the same.

Description

【発明の詳細な説明】 〔概 要〕 多層構造のICカードの表面に設けるエンボスの構造の
改良に関し、 エンボスの形成を型加工により行い、エンボス形成に必
要な加工時間を短縮することが可能となるICカードの
製造方法の提供を目的とし、本体の内部にrcチップを
内蔵し、該本体のエンボス貼付層の表面にエンボスを設
けたICカードの製造方法であって、前記エンボスの形
成領域を切り欠いた前記エンボス貼付層の表面に前記エ
ンボスとなる材料を貼付し、該材料にエンボス加工によ
り凹部を形威し、該凹部及び前記エンボス貼付層の切り
欠き部に前記エンボス貼付層の背面側から埋め込み材料
を充填するよう構成する。
[Detailed Description of the Invention] [Summary] Regarding the improvement of the structure of the embossing provided on the surface of a multilayered IC card, it has been found that the embossing can be formed by mold processing and the processing time required for forming the embossing can be shortened. The purpose of the present invention is to provide a method for manufacturing an IC card, in which an RC chip is built into a main body, and an emboss is provided on the surface of an embossed layer of the main body, the emboss forming area being A material to be the emboss is pasted on the cutout surface of the embossed layer, a recess is formed on the material by embossing, and the recess and the cutout of the embossed layer are placed on the back side of the embossed layer. The container is configured to be filled with an embedding material.

〔産業上の利用分野〕[Industrial application field]

本発明は、ICカードに係り、特に多層構造のICカー
ドの表面に設けるエンボスの構造の改良に関するもので
ある。
The present invention relates to an IC card, and particularly to an improvement in the structure of an embossing provided on the surface of a multilayered IC card.

ICカードに対して多機能が要求されるのに伴い、構造
の多層化が促進されており、これに対応するために表面
に設けるエンボス材料の膜厚を薄くせざるを得なくなっ
ている。
As IC cards are required to have multiple functions, multi-layered structures are being promoted, and in order to accommodate this, it is necessary to reduce the thickness of the embossing material provided on the surface.

一方、本体を構威し、内部のICチップ等を保護するた
めに設けられている補強層の膜厚を厚くすることが必要
になっている。
On the other hand, it has become necessary to increase the thickness of the reinforcing layer provided to strengthen the main body and protect internal IC chips and the like.

以上のような状況からエンボスとして用いる膜厚の薄い
エンボス用材料を用いても強度の大なるエンボスを具備
することが可能なICカードが要望されている。
Under the above circumstances, there is a demand for an IC card that can provide a strong emboss even if a thin embossing material is used as the emboss.

〔従来の技術〕[Conventional technology]

従来のICカードについて第3図〜第5図により詳細に
説明する。
A conventional IC card will be explained in detail with reference to FIGS. 3 to 5.

従来のICカードには第3図(a)に示すように、表面
にエンボス2a、 を極3.磁気テープ4が設けられて
おり、背面には第3図(C1に示すように、キーボード
5と表示部6が設けられている。
As shown in FIG. 3(a), conventional IC cards have an embossment 2a on the surface and a pole 3. A magnetic tape 4 is provided, and a keyboard 5 and a display section 6 are provided on the back side as shown in FIG. 3 (C1).

その構造は第3図(blのA−A断面図に示すように内
部に電池7が内蔵されており、表面には磁気テープ4、
背面には表示部6が設けられている。
As shown in the A-A sectional view of Figure 3 (bl), its structure has a built-in battery 7, and a magnetic tape 4 on the surface.
A display section 6 is provided on the back.

第3図(d)のB−B断面図に示すように内部にICチ
ップ8が内蔵されており、その端子と表面に設けられて
いる電極3とが接続されている。第3図TelのC−C
断面図に示すように、表面にはエンボス2a、背面には
キーボード5が設けられている。
As shown in the BB sectional view of FIG. 3(d), an IC chip 8 is built inside, and its terminals are connected to the electrodes 3 provided on the surface. Figure 3 Tel C-C
As shown in the cross-sectional view, an embossing 2a is provided on the front surface and a keyboard 5 is provided on the back surface.

このエンボス2aを形成する方法の一つは、第4図(a
lに示すように背面層11b5回路形成層11a、補強
層11c及び表面層lidを積層して形成したICカー
ドの本体11の表面に塩化ビニール12等のエンボス1
2aとなる材料を貼り付け、第4図(b)に示すように
ルータ−加工によりエンボス12aとして用いる部分を
残して、他の部分を削り取る方法であり、他の方法は第
5図(a)に示すようにUV硬化樹脂22の表面にレジ
スト膜23を形成し、第5図(b)に示すようにフォト
リソグラフィー技術を用いてエンボス22aとして用い
る部分のレジスト膜23を除去し、紫外線を照射してU
V硬化樹脂22を硬化させた後、第5図(C)に示すよ
うにレジスト膜23及び他の部分のUV硬化樹脂22を
除去し、第5図(d)に示すようにエンボス22aが形
成されているこのUV硬化樹脂22をICカードの本体
21の表面層21dの表面に貼付する方法である。
One of the methods of forming this embossing 2a is shown in FIG.
As shown in FIG. 1, an embossment 1 of vinyl chloride 12 or the like is applied to the surface of the main body 11 of the IC card, which is formed by laminating a back layer 11b, a circuit forming layer 11a, a reinforcing layer 11c, and a surface layer lid.
2a is pasted, and as shown in Fig. 4(b), the part to be used as the embossing 12a is left by router processing and the other parts are scraped off.Another method is as shown in Fig. 5(a). As shown in FIG. 5(b), a resist film 23 is formed on the surface of the UV curing resin 22, and as shown in FIG. Then U
After curing the V-curing resin 22, the resist film 23 and other parts of the UV-curing resin 22 are removed as shown in FIG. 5(C), and embossments 22a are formed as shown in FIG. 5(d). In this method, this UV curing resin 22 is pasted on the surface of the surface layer 21d of the main body 21 of the IC card.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

以上説明した従来のICカードにおいては、エンボスを
形成するのに、塩化ビニールを用いて機械加工するか、
或いはUV硬化樹脂を用いてエンボスを形成するので、
エンボスを形成する加工時間が必要であり、UV硬化樹
脂を用いる場合には更に本体に貼付することが必要にな
るという問題点があった。
In the conventional IC cards described above, the embossing is formed by mechanical processing using vinyl chloride, or by mechanical processing using vinyl chloride.
Or, since the embossing is formed using UV curing resin,
There were problems in that processing time was required to form the embossing, and when UV-curable resin was used, it was necessary to further attach it to the main body.

本発明は以上のような状況からエンボスの形成を型加工
により行い、エンボス形成に必要な加工時間を短縮する
ことが可能となるICカードの製造方法の提供を目的と
したものである。
In view of the above-mentioned circumstances, the present invention aims to provide a method for manufacturing an IC card in which the embossing is formed by mold processing and the processing time required for forming the embossing can be shortened.

〔課題を解決するための手段〕[Means to solve the problem]

本発明のICカードの製造方法は、本体の内部にICチ
ップを内蔵し、この本体のエンボス貼付層の表面にエン
ボスを設けたICカードの製造方法であって、このエン
ボスの形成領域を切り欠いたエンボス貼付層の表面にこ
のエンボスとなる材料を貼付し、この材料にエンボス加
工により凹部を形成し、この凹部及びこのエンボス貼付
層の切り欠き部にエンボス貼付層の背面側から埋め込み
材料を充填するよう構成する。
The method for manufacturing an IC card of the present invention is a method for manufacturing an IC card in which an IC chip is built into a main body and an emboss is provided on the surface of an embossed layer of the main body, and the area where the emboss is formed is cut out. This embossed material is pasted on the surface of the embossed pasting layer, a recess is formed in this material by embossing, and the recess and the notch of this embossed pasting layer are filled with the embedding material from the back side of the embossed pasting layer. Configure it to do so.

〔作用〕[Effect]

即ち本発明においては、ICカードの本体を構成する強
度の大なるエンボス貼付層のエンボス形tc領域に相当
する部分を切り欠き、エンボスとなる膜厚の極めて薄い
材料をその表面に貼付し、この材料に型押し加工等を施
してエンボスを形成し、この加工により形成された凹部
及びエンボス貼付層の切り欠き部に埋め込み材料を充填
するので、膜厚の極めて薄い材料で形成したエンボスで
あるが、使用時にエンボスが変形するのを防止すること
が可能となる。
That is, in the present invention, a portion corresponding to the embossed tc region of the strong embossed adhering layer constituting the main body of the IC card is cut out, and a material with an extremely thin film thickness that will become the embossed is affixed to the surface of the embossed layer. The embossing is formed by applying embossing to the material, and the recesses and cutouts of the embossing layer formed by this process are filled with the filling material, so the embossing is made of an extremely thin material. This makes it possible to prevent the embossing from deforming during use.

〔実施例〕〔Example〕

以下第1図〜第3図について本発明の一実施例を説明す
る。
An embodiment of the present invention will be described below with reference to FIGS. 1 to 3.

まず第1図(a)に示すように、ICカードの本体を構
成する強度の大なる膜厚0.5nの塩化ビニールからな
る補強層1cのエンボス形成領域に切り欠きを設け、そ
の表面にエンボスとなる膜厚の極めて薄い材料、例えば
膜厚o、oswの塩化ビニール2を貼付し、つぎに第1
囲い)に示すようにこの材料を型押し加工してエンボス
2aを形成する。
First, as shown in FIG. 1(a), a notch is provided in the emboss formation area of the reinforcing layer 1c made of strong vinyl chloride with a thickness of 0.5 nm, which constitutes the main body of the IC card, and the surface of the reinforcing layer 1c is embossed. Apply vinyl chloride 2 with an extremely thin film thickness such as o and ow, and then
As shown in box), this material is embossed to form an embossment 2a.

つぎに第1図(C)に示すように、この型押し加工によ
り形成された凹部2b及び補強層1cの切り欠き部に加
熱されて軟化した塩化ビニールからなる埋め込み材料2
cを圧着して充填すると、膜厚の極めて薄い材料で形成
したエンボス2aであるが、加工により形成された凹部
2b及び補強層1cの切り欠き部に埋め込み材料2cを
充填しているから、使用時にエンボス2aが変形するの
を防止することが可能となる。
Next, as shown in FIG. 1(C), an embedding material 2 made of vinyl chloride softened by heating is placed in the recess 2b formed by this embossing process and the notch of the reinforcing layer 1c.
Although the embossing material 2a is made of an extremely thin material, the recess 2b formed by processing and the notch of the reinforcing layer 1c are filled with the embedding material 2c, so it cannot be used. It becomes possible to prevent the embossing 2a from deforming at times.

このようにして形成したエンボス2aを具備する補強層
1cを第2図に示すように本体lを構成する回路形成層
1a及び背面層1bに貼り付けて積層構造のICカード
の製造が完了する。
The reinforcing layer 1c provided with the embossments 2a thus formed is attached to the circuit forming layer 1a and the back layer 1b constituting the main body 1, as shown in FIG. 2, to complete the manufacture of the laminated IC card.

このようにして製造したICカードの構造は第3図に示
すようなものであり、膜厚の薄いエンボス2aと強度の
大なる補強層1cとを組み合わせ、埋め込み材料2cで
補強したICカードを製造することが可能となる。
The structure of the IC card manufactured in this way is as shown in Figure 3, and an IC card is manufactured by combining a thin embossing layer 2a with a strong reinforcing layer 1c and reinforcing it with an embedded material 2c. It becomes possible to do so.

なお、本実施例においては補強層1cにのみ切り欠き部
を設けているが、補強層1cと回路形成層1aの積層体
に切り欠き部を設けてエンボス貼付層とし、本実施例と
同様にこの切り欠き部に埋め込み材料2cを充填するこ
とも可能である。
In this example, the notch is provided only in the reinforcing layer 1c, but a notch is provided in the laminate of the reinforcing layer 1c and the circuit forming layer 1a to form an embossed adhesive layer, and the same as in this example is applied. It is also possible to fill this notch with the embedding material 2c.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように本発明によれば、膜厚の
薄い材料を用いて型押し加工によりエンボスを形成し、
このエンボス加工により形成された凹部等に埋め込み材
料を充填するので、使用時の押圧強度に耐えるエンボス
を備えたICカードを製造することが可能となる利点が
あり、著しい経済的及び、信頼性向上の効果が期待でき
るICカードの提供が可能である。
As is clear from the above description, according to the present invention, embossing is formed by embossing using a material with a thin film thickness,
Since the recesses formed by this embossing are filled with the embedding material, it has the advantage that it is possible to manufacture IC cards with embossing that can withstand the pressure strength during use, resulting in significant economic and reliability improvements. It is possible to provide an IC card that can be expected to have the following effects.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明によるエンボス形成方法の一実施例を工
程順を示す側断面図、 第2図は本発明による一実施例のICカードのエンボス
の構造を示す側断面図、 第3図はICカードの構造を示す図、 第4図は従来のICカードのエンボス形成方法の一方法
を工程順に示す側断面図、 第5図は従来のICカードのエンボス形成方法の他の方
法を工程順に示す側断面図、 である。 図において、 1は本体、 1aは回路形成層 1bは背面層、 1cは補強層、 を示す。 2は塩化ビニール、 2aはエンボス、 2bは凹部、 2cは埋め込み材料、 3は電極、 4m気テープ、 5はキーボード、 6は表示部、 7は電池、 8はICチ、ブ、 (at 塩化ビニール(2)の貼付 山) エンボス(2a)の形成 cl 埋め込み材料(2C)の充填 本発明によるエンボス形成方性の一実施例を工程順に示
す側断面図第 ■ 図 el 裏面の平面図 (dl B−B断面図 el C−C断面図 ICカードの構造を示す図 第 図(その2) 本発明による一実施例のICカードのエンボスの構造を
示す側断面図第 図 (al 表面の平面図 巾) A−A断面図 ICカードの構造を示す図 第 図(その1) al 塩化ビニール(12)の貼付 lb) エンボス(12a)の形成 第 図 731−
FIG. 1 is a side sectional view showing the process order of an embodiment of an emboss forming method according to the present invention, FIG. 2 is a side sectional view showing the structure of an emboss on an IC card according to an embodiment of the present invention, and FIG. A diagram showing the structure of an IC card. Figure 4 is a side cross-sectional view showing one method of conventional IC card emboss formation method in order of process. Figure 5 is a diagram showing another method of conventional IC card emboss formation method in order of process. A side sectional view shown in FIG. In the figure, 1 is a main body, 1a is a circuit forming layer 1b is a back layer, and 1c is a reinforcing layer. 2 is vinyl chloride, 2a is embossed, 2b is recessed part, 2c is embedded material, 3 is electrode, 4m tape, 5 is keyboard, 6 is display part, 7 is battery, 8 is IC chip, (at vinyl chloride) (2) Formation of embossing (2a) Filling of embedding material (2C) Side sectional view showing the process order of an example of embossing formation according to the present invention Fig. el Plan view of the back side (dl B -B sectional view el CC sectional view A diagram showing the structure of an IC card (Part 2) A side sectional view showing the embossed structure of an IC card according to an embodiment of the present invention ) A-A sectional view A diagram showing the structure of an IC card Figure (Part 1) al Pasting of vinyl chloride (12) lb) Formation of embossing (12a) Figure 731-

Claims (1)

【特許請求の範囲】 本体(1)の内部にICチップ(8)を内蔵し、該本体
(1)のエンボス貼付層の表面にエンボス(2a)を設
けたICカードの製造方法であって、 前記エンボス(2a)の形成領域を切り欠いた前記エン
ボス貼付層の表面に前記エンボス(2a)となる材料を
貼付し、 該材料(2)にエンボス加工により凹部(2b)を形成
し、 該凹部(2b)及び前記エンボス貼付層の切り欠き部に
前記エンボス貼付層の背面側から埋め込み材料(2c)
を充填することを特徴とするICカードの製造方法。
[Claims] A method for manufacturing an IC card, in which an IC chip (8) is built into a main body (1), and an embossment (2a) is provided on the surface of an embossed layer of the main body (1), comprising: A material to be the emboss (2a) is affixed to the surface of the emboss application layer in which the emboss (2a) formation area is cut out, a recess (2b) is formed in the material (2) by embossing, and the recess is formed in the recess. (2b) and a material (2c) embedded in the notch part of the embossed adhesive layer from the back side of the embossed adhesive layer.
A method for manufacturing an IC card, characterized by filling the IC card with:
JP1344431A 1989-12-28 1989-12-28 Manufacture of ic card Pending JPH03202399A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1344431A JPH03202399A (en) 1989-12-28 1989-12-28 Manufacture of ic card

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1344431A JPH03202399A (en) 1989-12-28 1989-12-28 Manufacture of ic card

Publications (1)

Publication Number Publication Date
JPH03202399A true JPH03202399A (en) 1991-09-04

Family

ID=18369212

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1344431A Pending JPH03202399A (en) 1989-12-28 1989-12-28 Manufacture of ic card

Country Status (1)

Country Link
JP (1) JPH03202399A (en)

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