JPH0321389A - Method and apparatus for treating photographic waste solution - Google Patents
Method and apparatus for treating photographic waste solutionInfo
- Publication number
- JPH0321389A JPH0321389A JP15658789A JP15658789A JPH0321389A JP H0321389 A JPH0321389 A JP H0321389A JP 15658789 A JP15658789 A JP 15658789A JP 15658789 A JP15658789 A JP 15658789A JP H0321389 A JPH0321389 A JP H0321389A
- Authority
- JP
- Japan
- Prior art keywords
- waste liquid
- processing
- photographic
- waste solution
- rotating body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002699 waste material Substances 0.000 title claims abstract description 86
- 238000000034 method Methods 0.000 title claims abstract description 26
- 239000007788 liquid Substances 0.000 claims abstract description 90
- 238000001816 cooling Methods 0.000 claims abstract description 7
- 238000012545 processing Methods 0.000 claims description 44
- 238000011161 development Methods 0.000 claims description 9
- 238000003672 processing method Methods 0.000 claims description 3
- 239000012809 cooling fluid Substances 0.000 claims 1
- 238000005406 washing Methods 0.000 abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000000126 substance Substances 0.000 description 8
- 239000013078 crystal Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 230000002528 anti-freeze Effects 0.000 description 4
- 238000005192 partition Methods 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 239000002351 wastewater Substances 0.000 description 4
- 238000004065 wastewater treatment Methods 0.000 description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000012452 mother liquor Substances 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- -1 silver halide Chemical class 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 241000218691 Cupressaceae Species 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Landscapes
- Physical Water Treatments (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は写真処理廃液を良好に処理する方法及び装置に
関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method and apparatus for effectively treating photographic processing waste liquid.
(従来の技術)
近年銀塩写真の現像処理時間は短くなり30分以内の処
理が可能となっている。またユーザーの撮影済みフイル
ムなDPE取り次ぎ店に出してからプリントを手にする
までの所用時間の大半はDPE取り次ぎ店とラボと称す
る現像処理を行う所の往復時間となる。このためこれを
スピードアップする必要から小型で、自動制御による取
扱の容易な自動現像機が開発され集配時間が短縮できる
よう各所に事務所の片隅に設置する感覚で自動現像機(
以下ミニラポと称する)が設置できるようになった。と
ころが一般にこのような場所には廃水処理設備はないた
め、疲労した現像液や定着液、水洗液は廃液タンクに貯
めて処理業者が定期的に収集するシステムを採用してい
る。ところが交通混雉の都会では収集に時間がかかり意
外と大変であり、また逆に過疎地区では収集効率が悪く
、ややもすると不法に廃棄されたりして河川、海水の汚
染汚濁の原因になりかねない。このためミニラボ側では
廃液の発生量の少ない機械の開発が7つのテーマであり
、現状では写真の品質に影響することもあってある程度
の量以下にはなかなか少なくできないのが現状である。(Prior Art) In recent years, the development processing time for silver halide photography has become shorter, and it has become possible to process within 30 minutes. Furthermore, most of the time it takes from the time a user sends their photographed film to a DPE agency until they receive a print is the round-trip time between the DPE agency and a development processing facility called a laboratory. For this reason, it was necessary to speed up this process, so a small automatic developing machine that was automatically controlled and easy to handle was developed.
(hereinafter referred to as Mini Lapo) can now be installed. However, such places generally do not have wastewater treatment facilities, so they use a system in which exhausted developer, fixer, and washing fluids are stored in wastewater tanks and periodically collected by wastewater treatment companies. However, in urban areas with heavy traffic, collection takes time and is surprisingly difficult, and in sparsely populated areas, collection efficiency is poor, leading to illegal disposal, which can lead to river and seawater contamination. . For this reason, the minilab has seven themes to develop machines that generate less waste liquid, and the current situation is that it is difficult to reduce the amount below a certain level because it may affect the quality of the photographs.
一般的なミニラボ(時間3!曙ロールフイルム3θ本処
理)で廃液の発生量は7日当りおよそ現像廃液が3リッ
トル、漂白定着廃液が,1リットル、水洗液が/θリッ
トル、合計/!リットル程度である。In a typical mini-lab (time 3! Akebono roll film 3θ main processing), the amount of waste liquid generated is approximately 3 liters of developing waste solution, 1 liter of bleach-fixing waste solution, and /θ liter of washing solution per 7 days, total /! It is about liter.
梁/表は代表的な写真処理薬品の或分を示すものである
。一般に写真の処理廃液は汚濁度が高く、BOD(生物
化学的酸素要求量)やCOD(化学的酸素要求量)は数
万PPMもある。The beams/tables indicate some of the typical photographic processing chemicals. In general, the wastewater from photographic processing is highly polluted, with BOD (biochemical oxygen demand) and COD (chemical oxygen demand) in the tens of thousands of ppm.
従来廃水処理に対する一般的な方法としては、活性汚泥
法、活性炭を使用する方法、オゾンのような酸化剤を使
用する方法、分離膜で処理する方法、廃液を焼却する方
法、廃液を蒸発または蒸留する方法、温度による溶解度
の差により液体から固体を析出さ゛せる方法としては晶
析による方法が知られている。Conventional methods for wastewater treatment include activated sludge, activated carbon, oxidizing agents such as ozone, separation membrane treatment, incineration of wastewater, and evaporation or distillation of wastewater. A method of crystallization is known as a method of precipitating a solid from a liquid due to the difference in solubility due to temperature.
(発明が解決しようとする課題)
写真処理廃液を上記活性汚泥法のような一般的な廃水処
理で浄化することは非常におおきな設備を必要としまた
生物分解できない成分も多く、ミニラポに併設すること
は現実的でない。また活性炭を使用するにしても吸着容
量の制約から多量の活性炭を必要とし、交換の頻度およ
びコストで同じく現実的でない。オゾンのような酸化剤
を使用することは写真処理薬品にはオゾンで分肺できな
い或分が多く不十分である。分離膜で処理する方法にお
いては写真処理薬品は多量の無機塩を含むと同時に有機
物の分子量も数/Oから/θOθ程度まで分布しこれら
を効率よく分離する膜は現状では見あたらない。廃液を
焼却する方法はCOD或分を分解することはできるが薬
品中のイオウ戊分のため多量の亜硫酸ガスや鉄分や塩類
のダストが発生しこれの処理を要するなど少量の廃液を
処理するにもかなり大変な設備となりミニラポに併設す
ることは現実的でない。廃液を蒸発または蒸留する方法
は留出液に薬液戊分が留出しCOD除去率はせいぜい!
θ俤程度と悪く且つ成分が熱により分解し悪臭ガスが発
生しかえってこれを除くために大変な処理が必要となり
実用化できていない。また晶析操作で用いられる攪拌槽
型晶析装置及び連続式運搬槽型晶析装置は、母液の管理
が厳密であるため例えば銀塩写真処理廃液のように母液
の管理がむずかしく、又大きな結晶をつくる制御が容易
でない場合には使用できない。又微細な氷の結晶を析出
する場合は、その表面に付着する液体によって分離効率
は高くならず実用的でもない。このように写真処理廃液
は種々の検討がなされてきているが、いまだ《二簡便な
処理方式は見いだせず、この結果ミニラポにおいては処
理業者が廃戚を収集する方式を採用している。(Problems to be Solved by the Invention) Purifying photographic processing waste liquid using general wastewater treatment such as the activated sludge method described above requires extremely large equipment and contains many components that cannot be biodegraded. is not realistic. Furthermore, even if activated carbon is used, a large amount of activated carbon is required due to adsorption capacity limitations, and it is also impractical due to the frequency and cost of replacement. The use of oxidizing agents such as ozone is often insufficient for photographic processing chemicals because ozone cannot be used to oxidize the chemicals. In the method of processing using a separation membrane, photographic processing chemicals contain a large amount of inorganic salts, and at the same time, the molecular weight of organic substances ranges from several O to about /θOθ, and there is currently no membrane that can efficiently separate these. The method of incinerating waste liquid can decompose a certain amount of COD, but due to the sulfur content in the chemicals, a large amount of sulfur dioxide gas, iron, and salt dust are generated, which must be disposed of, making it difficult to treat small amounts of waste liquid. However, it would be quite a complex piece of equipment, and it would be impractical to install it alongside a mini-rapport. In the method of evaporating or distilling the waste liquid, the chemical solution is distilled into the distillate and the COD removal rate is at best!
It is not practical because it has a low level of θ, and the components decompose due to heat, producing foul-smelling gas, which requires extensive treatment to remove. In addition, in the stirred tank type crystallizer and continuous transport tank type crystallizer used in crystallization operations, the control of the mother liquor is strict, so it is difficult to control the mother liquor, such as in the case of silver salt photographic processing waste solution, and large crystals are produced. It cannot be used if the control to create it is not easy. Furthermore, when fine ice crystals are precipitated, the separation efficiency is not increased due to the liquid adhering to the surface of the crystals, which is not practical. Although various studies have been conducted on photographic processing waste liquid, no simple and easy processing method has yet been found, and as a result, Mini Lapo has adopted a method in which processing companies collect the waste.
本発明は、これを解決するものであって写真処理廃液を
効率よくかつ簡便に処理することができる新規な写真廃
液処理方法及び装置を提供する。The present invention solves this problem by providing a novel photographic waste liquid processing method and apparatus that can efficiently and simply process photographic processing waste liquid.
(課題を解決するための手段)
本発明は、冷却した回転体の表面部に写真廃液(現像廃
液、定着廃液、水院廃液)を接触させて氷結し、これよ
り得た処理液を写真現像処理機の処理槽(現像処理槽、
定着処理槽、水洗処理槽)に戻す。廃液を上記回転体の
表面部に接触させる手段として、該表面部を廃液に浸す
方法と表面部に発液な流下させる方法を有する。又該表
面部を冷却する方法は、表面部内に冷却疏体を通したり
、ベルチェ効果を利用して表面部を冷却したりする。(Means for Solving the Problems) The present invention involves bringing photographic waste liquids (developing waste liquid, fixing waste liquid, aqueduct waste liquid) into contact with the surface of a cooled rotary body to freeze them, and then using the processing liquid obtained from this for photographic development. Processing machine processing tank (development processing tank,
Return to fixing treatment tank, washing treatment tank). The means for bringing the waste liquid into contact with the surface of the rotating body include a method of immersing the surface in the waste liquid and a method of causing the liquid to flow down onto the surface. Further, the method of cooling the surface portion includes passing a cooling tube through the surface portion or cooling the surface portion using the Bertier effect.
(作用及び実施例)
第/図は写真自動現像機ミニラポ(1)からの溌液な処
理する場合を示す。該ミニラボから発生する現像処理槽
(2)の廃液、漂白定着処理僧(3)の洗液は、各々配
管(4)、(5)を介してそれぞれタンク16)、(7
)に入れられると共に多@に発生する水洗処理僧(8)
の溌戚α力は、配管(9)を介して廃液処理装置00の
I58液収容体αDに入れられる。該収容体に入れられ
た廃液は後記の冷却された回転体Oによって冷却され廃
液に氷(氷結物)を析出する。該析出した氷は回転体の
表面に付着し、該付着した氷はその取り出し手段即ち図
示のものにおいては温熱器a3で解かされながらスクレ
ーパー兼集液装置a◆で掻き落し集液される。解かされ
た処理液は次の廃液処理装置(図面中右側)の収容体に
送られ同様の処理が行われる。これによって処理された
液は精製液としてボンプα0により配管aOを介し上記
ミニラポの水洗処理槽(8)に送られる。(Function and Examples) Figure 1 shows the case of liquid-repellent processing from the automatic photographic processor Mini Lapo (1). The waste liquid from the developing tank (2) and the washing liquid from the bleach-fixing tank (3) generated from the minilab are transferred to tanks 16) and (7) via piping (4) and (5), respectively.
) A monk who is washed with water and occurs in a large number of places (8)
The flowing α force is introduced into the I58 liquid container αD of the waste liquid treatment device 00 through the pipe (9). The waste liquid placed in the container is cooled by a cooled rotating body O, which will be described later, and ice (frozen matter) is deposited on the waste liquid. The precipitated ice adheres to the surface of the rotating body, and the adhering ice is melted by a means for removing it, that is, a heater a3 in the illustrated example, and scraped off and collected by a scraper/liquid collecting device a◆. The thawed treatment liquid is sent to the container of the next waste liquid treatment device (on the right side in the drawing) and subjected to the same treatment. The thus treated liquid is sent as a purified liquid to the washing treatment tank (8) of the minilapo via the pipe aO by the pump α0.
一方濃縮された液は、手前側の廃液処理装置(図面中左
側)に順次送られ,更に濃縮され上記漂白定着廃液タン
ク(7)に配管α8を介して送られる。On the other hand, the concentrated liquid is sequentially sent to the waste liquid treatment device on the front side (on the left side in the drawing), further concentrated, and sent to the bleach-fixing waste liquid tank (7) via the pipe α8.
なお図示のものでは廃液処理装置は!段になっているが
、その他の複数段あるいは単段(バッチ式を含む)にす
ることができる。該各廃液処理装置間には連結管a9が
設けられ、処理廃液の一部を前段の処理装置へ戻してい
る。この戻す量は各段の廃液濃度を一定に保ち、精製度
や濃縮度をきめる要素となっている。In addition, the one shown is not a waste liquid treatment device! Although it is a stage, it can be made into other multiple stages or a single stage (including a batch type). A connecting pipe a9 is provided between each of the waste liquid processing apparatuses, and a part of the treated waste liquid is returned to the preceding processing apparatus. The amount returned is a factor that keeps the concentration of waste liquid at each stage constant and determines the degree of purification and concentration.
次に第λ図及び第3図{=おいて、廃液処理装置の回転
体Oは、できるだけ広い表面積(氷の析出面積)をもち
ゆっくりした氷の生或速度で運転を行う。又種晶なしで
安定した水の結晶を得る手段として冷却用の伝熱面に氷
を付着させる方式を採用する。この方式は結晶の付着に
より伝熱係数が低下することおよびよい結晶が得られな
いことから既存の晶析装置ではもちいられない方式であ
るが、廃液処理装置としては操作性、安定性から最適で
ある。これらを実現する手段として中空の多数の円盤(
至)をその間に空隙のを形成するよう《ニスペーサー(
自)を介存して並列し、円盤の中空部空間・(自)に冷
却媒体である不凍液等の冷却液、冷却ガス等を通し、円
盤の表面に氷を析出させるようにすることでコンパクト
で大きな表面積を得る。Next, in Figures λ and 3 {=, the rotating body O of the waste liquid treatment device is operated at a slow ice production speed with as large a surface area (ice precipitation area) as possible. In addition, as a means of obtaining stable water crystals without seed crystals, a method is adopted in which ice is attached to the heat transfer surface for cooling. This method cannot be used in existing crystallizers because the heat transfer coefficient decreases due to the adhesion of crystals and good crystals cannot be obtained, but it is the most suitable method for waste liquid treatment equipment due to its operability and stability. be. As a means of realizing these, a large number of hollow disks (
Use a varnish spacer (
It is made compact by passing the cooling liquid such as antifreeze, cooling gas, etc. through the hollow space of the disk (self) and depositing ice on the surface of the disk. to obtain a large surface area.
上記円盤(至)とスペーサ一〇は、廃液収容体Qn I
’:−ベアリイグ(財)によって回転可能に支持される
中空の回転軸(至)にボルト(至)をもって締結され、
回転体Oを形威している。該回転体の支持部の内側には
?記廃液をシールするシール部材@が設けられている。The above disk (to) and spacer 10 are the waste liquid container Qn I
':-It is fastened with a bolt to a hollow rotating shaft rotatably supported by BEARIG,
It resembles a rotating body O. What is inside the support part of the rotating body? A sealing member @ for sealing the waste liquid is provided.
該回転体は、支持台(至)に取り付けられたギャードモ
ーター翰より、該ギャードモーターの出力軸■にキー0
υ止めされるギヤ■■■と、上記回転軸(至)端部にキ
ー(至)と止めナット一により固定されるギヤ■■■を
介して回転される。該回転体の軸中心部(1)には、冷
却された不凍液を送る管■■■が挿入され、該管は上記
支持台(至)に保定具働によって固定されている。該管
内の不凍液は、止栓働手前に流入し、該管に設けられた
ノズル構或体(財)にあけられたノズル四を通って上記
内盤の中空部(至)に流出する。The rotating body is connected to the output shaft of the geared motor from the geared motor holder attached to the support base (to) with the key 0.
It is rotated via the gear ■■■ which is fixed to υ and the gear ■■■ which is fixed to the end of the rotating shaft (to) by a key (to) and a locking nut. A pipe for feeding cooled antifreeze is inserted into the axial center (1) of the rotating body, and the pipe is fixed to the support base (to) by a retainer. The antifreeze in the pipe flows in before the stopper works, and flows out into the hollow part of the inner plate through the nozzle 4 formed in the nozzle structure provided in the pipe.
流出した液は該円盤の中空部に放射状《二配列された仕
切板(41)に仕切られて流れ、円盤の表面部(6)を
冷却する。冷却後の不凍液は上記管(9)上部の空間を
通り集戒されその後該管の流入口一を通って該管に戻り
流出される。The liquid that flows out flows into the hollow part of the disc, partitioned by two radially arranged partition plates (41), and cools the surface part (6) of the disc. The cooled antifreeze liquid passes through the space above the pipe (9) and is collected, then returns to the pipe through the inlet port 1 of the pipe and is discharged.
上記円盤(至)は、その一部が収容体Qll内の廃液に
没入しており、これによって該廃液を冷却し円盤表面部
に水を析出付着させる。析出した氷は該円盤の凹転に伴
って上方に運ばれる。付着した氷(至)は上記円盤間の
空隙に設けられた上記スクレーパーα4ε二よって掻収
られ、その氷は自然溶解または下部に上記スクレーパー
をねじ一等で固定した温水器α3(第グ図)や電気ヒー
ター等《:よって溶解され、これを精製された処理水と
し、又は図示のように該処理水を次の廃液処理装置の収
容体に送り込んで更に処理水を精製する。なお、上記円
盤の厚みが大きい場合等はその外周面にも上記スクレー
パーを設けるようにしてもよい。A portion of the disk (to) is immersed in the waste liquid in the container Qll, thereby cooling the waste liquid and causing water to precipitate and adhere to the disk surface. The precipitated ice is carried upward as the disk rotates concavely. The adhering ice is scraped off by the scraper α4ε2 installed in the gap between the discs, and the ice melts naturally or is removed by a water heater α3 with the scraper fixed at the bottom with screws (Fig. or an electric heater, etc.: Therefore, it is dissolved and used as purified treated water, or as shown in the figure, the treated water is sent to the container of the next waste liquid treatment device to further purify the treated water. In addition, when the thickness of the disk is large, the scraper may be provided also on its outer peripheral surface.
上記温水器には、上記収容体上部に形成された支持部(
L47)に支持されたパイプ(ニ)、晴によって温水が
それぞれ流入、流出される。該温水は弟!図のように蒸
発器一、圧縮機(5l)、開放弁(52)、凝縮器(5
3)等からなる冷凍機システムの該凝縮器(53)から
発生する熱を利用して作り出す。The water heater has a support portion (
Hot water flows into and out of the pipe (d) supported by L47), respectively. The hot water is my brother! As shown in the figure, evaporator 1, compressor (5l), release valve (52), condenser (5l),
3), etc., using the heat generated from the condenser (53) of the refrigerator system.
上記円盤は6角形や♂角形その他の多角形{二したりあ
るいは円盤の表面にフィン状の凹凸を設け/
たりして作ることができる。The disk can be made into a hexagonal, male-gonal or other polygonal shape, or by providing fin-like irregularities on the surface of the disk.
上記廃液処理装置は、適宜上記廃戚を各円盤間に強制的
に流出させ円盤面の氷結物表面を攪拌することかでき、
この場合濃縮廃液とこれより分離する処理液間の分離効
率は一層向上する。即ち、第6図及び第7図において、
上記収容体αDの両側にそれぞれ仕切板(54)、(5
5)を設け、その一方の仕切板(54)にノズル(56
)を形威し、他方の仕切板(55)に流通孔(57)を
形或している。廃液は、ボンブ(58)によって配管(
59)を介して前方の流出側室(60)へ送られ、その
ノズルから各円盤間へ流出され、後方の流入側室(6l
)を通って上記ポンプに戻るようになっている。The waste liquid treatment device is capable of forcibly discharging the waste liquid between the disks as appropriate and agitating the surface of the frozen matter on the disk surface.
In this case, the separation efficiency between the concentrated waste liquid and the treated liquid separated therefrom is further improved. That is, in FIGS. 6 and 7,
Partition plates (54) and (5) are provided on both sides of the container αD, respectively.
5), and a nozzle (56) is provided on one of the partition plates (54).
), and the other partition plate (55) has a communication hole (57). The waste liquid is transferred to the pipe (
59) to the front outflow side chamber (60), flows out from the nozzle between each disc, and flows into the rear inflow side chamber (6l).
) and return to the above pump.
弟♂図〜第//図に、上記廃液を円盤表面に流下して氷
結物表面を攪拌する場合を示す。上記収容体に流入した
廃液は、ポンプ(62)により配管(63)、(64)
、ヘッダー(65)、上記回転体の外周に形威された複
数の円盤ωの空隙(ハ)に設けた配管(66)を介して
、該配管(66)のノズル(67)へ送られ、該ノズル
より上記円盤の表面部にかけて流下させる。該円盤表面
を流下した廃液は上記収容体0(:溜り、再び上記ポン
プによって上記ノズル(67)へ循環する。上記円盤の
表面に接した廃液は、冷却された円盤によって冷却され
廃液に氷(氷結物)を析出する。該析出した氷は円盤の
表面に付着する。こうすることにより廃液は常時円盤表
面で析出した氷の表面を攪拌しながら流下し、氷の近傍
の廃液の不純物濃度をすみやかに平均的な濃度へと低下
させる。Figures ♂♂ to ♂/// show the case where the waste liquid flows down onto the surface of the disk and the surface of the frozen matter is stirred. The waste liquid that has flowed into the container is transferred to the pipes (63) and (64) by the pump (62).
, a header (65), and a pipe (66) provided in the gap (c) of a plurality of discs ω formed on the outer periphery of the rotating body, to a nozzle (67) of the pipe (66), It is caused to flow down from the nozzle onto the surface of the disk. The waste liquid that has flown down the surface of the disk is collected in the container 0 (:) and is circulated again to the nozzle (67) by the pump.The waste liquid that has come into contact with the surface of the disk is cooled by the cooled disk, and ice ( The precipitated ice adheres to the surface of the disk. By doing this, the waste liquid flows down while constantly stirring the surface of the ice precipitated on the disk surface, reducing the impurity concentration of the waste liquid near the ice. Promptly reduce the concentration to average.
第73図は第/図と同じくミニラボ(1)からの廃液を
処理する場合を示すがこの場合は現像液を処理し、現像
廃液の発生量を少なくする例を示すものである。現像処
理槽(2)から排出される現像廃液は、配管(4)を介
して廃液処理装置αOの廃液収容体a1)に入れられ、
第7図のときと同様《二精製、濃縮される。精製された
液はポンプαeにより配管08を介して現像処理檜(2
)に戻される。濃縮された廃液は現像廃液としてタンク
(6)に入れられる。この場合精製液はさほどきれいに
する必要がないため廃液処理装置の段数は2〜3段(図
は3段)と少なくできる。こうすること《=より、現像
廃液をより濃厚な状態で排出できるため廃液量はずっと
少なくできる。またこの方式の変形としてより濃厚な現
像液を用い現像処理槽(2)と漂白定着処理槽(8》の
間に現像水洗槽を設け、そこから発生する現像水洗液に
対して廃液処理装置を適用し、処理水を現像水洗槽に戻
し、濃縮液は現像廃液として排出する方法もトータルな
現像廃液の量を減らす手段として可能である。FIG. 73 shows a case in which waste liquid from the minilab (1) is treated as in FIG. 7, but in this case, the developer is treated to reduce the amount of developer waste generated. The developer waste liquid discharged from the development processing tank (2) is put into the waste liquid container a1) of the waste liquid treatment device αO via the pipe (4),
Same as in Figure 7 (second purification and concentration). The purified liquid is sent to the developing processing cypress (2) via piping 08 by pump αe.
). The concentrated waste liquid is put into a tank (6) as a developer waste liquid. In this case, since the purified liquid does not need to be cleaned so much, the number of stages in the waste liquid treatment device can be reduced to 2 to 3 stages (3 stages in the figure). By doing this, the developer waste liquid can be discharged in a more concentrated state, so the amount of waste liquid can be much reduced. In addition, as a modification of this method, a more concentrated developer is used, a developer washing tank is installed between the development processing tank (2) and the bleach-fixing processing tank (8), and a waste liquid treatment device is installed for the development washing solution generated from there. Another possible method for reducing the total amount of developer waste is to return the treated water to the developer washing tank and discharge the concentrated solution as developer waste.
上記廃液はその他定着液としたり、現像液、定着液、水
洗液の数種または全部をまとめて廃液とすることができ
、又その処理液を上記のように現像処理槽、水洗処理槽
に戻したり、その他定着処理槽やその数種またはそれら
全部の処理檜へ戻すようI二したりする。なお、上記回
転体の表面部に生成した氷結物を取り出す手段や該氷結
物を融解した処理液を写真現像処理機の処理槽C:戻す
手段等はその他種々のものを用いることができる。父上
記回転体の表面部を廃液に浸す方法と該表面部に廃戚を
流下させる方法は併用することができる。The waste liquid mentioned above can be used as another fixing liquid, or several or all of the developer, fixer, and washing liquid can be used as waste liquid, and the processing liquid can be returned to the development processing tank and washing processing tank as described above. or return it to the fixing treatment tank or some or all of them. It should be noted that various other methods can be used as means for taking out the frozen matter formed on the surface of the rotating body, means for returning the processing liquid obtained by melting the frozen matter to the processing tank C of the photographic processing machine, and the like. The method of immersing the surface of the rotating body in waste liquid and the method of letting waste flow down onto the surface can be used in combination.
(発明の効果)
本発明は上記のよう《二構成され、写真廃液を処理しこ
れを写真処理槽に戻して使用することができると共に処
理水を河川や下水道等にも流出させることができ、又該
廃液を効率よく簡便に処理することができる。(Effects of the Invention) The present invention has two configurations as described above, in which photographic waste liquid can be treated and returned to the photographic processing tank for use, and the treated water can also be discharged into rivers, sewers, etc. Moreover, the waste liquid can be efficiently and easily treated.
図面は本発明の実施例を示し、第7図は概略図、第λ図
は一部省略した拡大縦断面図、第3図は第2図の1−1
線断面図、第グ図はスクレーパ一部の拡大断面図、第!
図は温水を作り出す手段を示す概略図、第6図は拡大横
断面図、第7図は一部省略した中央水平断面図、弟♂図
は他の例の一部省略した拡大縦断面図、第9図は他の例
の拡大横断面図、第7θ図は一部省略した他の例の中央
水平断血図、弟//図はノズル部の拡大断向図、弟72
図は第♂図における山一n線断面図、@73図は他の例
の概略図である。
1・・・写真現像処理機、2、3、8・・・処理槽、1
2・・・回転体、l3・・・温水器、l4・・・スクレ
ーパ− 15・・・ポンプ、16・・・配管、21・・
・空隙、23・・・空間、42・・・表面部、45・・
・氷結物、5!5,67・・・ノズル
第
4
図
第5
図
第6区
13−.
第
7
図
第9図
第10図
第13
図The drawings show an embodiment of the present invention, and FIG. 7 is a schematic diagram, FIG. λ is a partially omitted enlarged longitudinal sectional view, and FIG.
A line sectional view, Figure 1 is an enlarged sectional view of a part of the scraper, and Figure 1 is an enlarged sectional view of a part of the scraper.
The figure is a schematic diagram showing a means for producing hot water, Figure 6 is an enlarged cross-sectional view, Figure 7 is a partially omitted central horizontal cross-sectional view, and the younger brother figure is an enlarged vertical cross-sectional view of another example with partially omitted. FIG. 9 is an enlarged cross-sectional view of another example, and FIG.
The figure is a sectional view taken along the line n in Figure ♂, and Figure @73 is a schematic diagram of another example. 1...Photographic processing machine, 2, 3, 8...Processing tank, 1
2... Rotating body, l3... Water heater, l4... Scraper 15... Pump, 16... Piping, 21...
・Void, 23...Space, 42...Surface, 45...
・Frozen matter, 5!5,67...Nozzle 4th figure 5th figure 6th section 13-. Figure 7 Figure 9 Figure 10 Figure 13
Claims (1)
を冷却し、該表面部に写真現像処理機より発生する廃液
を接触させて氷結し、これより得た処理液を上記写真現
像処理機の処理槽に戻すようにした写真廃液処理方法。 2、上記廃液を上記回転体の表面部に撹拌状態で接触す
るようにした請求項1記載の写真廃液処理方法。 3、回転体の外周に沿つて複数の空隙を形成した表面部
を有し該表面部内に形成した空間に冷却流体を通して該
表面部を冷却する回転体、該回転体の表面部に写真現像
処理機より発生する廃液を接触させる手段、上記回転体
の表面部に生成した氷結物を取り出す手段、該氷結物よ
り得た処理液を上記写真現像処理機の処理槽に戻すポン
プ機構を備えた写真廃液処理装置。 4、上記廃液を上記回転体の表面部に攪拌状態で接触さ
せるノズル機構を備えた写真廃液処理装置。[Scope of Claims] 1. Cooling a surface portion with a plurality of voids formed along the outer periphery of a rotating body, and bringing waste liquid generated from a photographic processing machine into contact with the surface portion to freeze it. A method for processing photographic waste liquid in which the processing liquid is returned to the processing tank of the photographic processing machine. 2. The photographic waste liquid processing method according to claim 1, wherein the waste liquid is brought into contact with the surface of the rotating body in an agitated state. 3. A rotating body that has a surface portion with a plurality of voids formed along the outer periphery of the rotating body and cools the surface portion by passing a cooling fluid into the spaces formed within the surface portion, and a photographic development process is applied to the surface portion of the rotating body. A photographic device comprising a means for contacting waste liquid generated from the photographic processing machine, a means for taking out frozen matter formed on the surface of the rotating body, and a pump mechanism for returning the processing liquid obtained from the frozen matter to the processing tank of the photographic processing machine. Waste liquid treatment equipment. 4. A photographic waste liquid processing device comprising a nozzle mechanism that brings the waste liquid into contact with the surface of the rotating body in an agitated state.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15658789A JPH0321389A (en) | 1989-06-19 | 1989-06-19 | Method and apparatus for treating photographic waste solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15658789A JPH0321389A (en) | 1989-06-19 | 1989-06-19 | Method and apparatus for treating photographic waste solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0321389A true JPH0321389A (en) | 1991-01-30 |
Family
ID=15631027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15658789A Pending JPH0321389A (en) | 1989-06-19 | 1989-06-19 | Method and apparatus for treating photographic waste solution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0321389A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5705471A (en) * | 1994-09-29 | 1998-01-06 | E. I. Du Pont De Nemours And Company | 1,1,2,2,3,3,4,4-octaflourobutane compositions |
| US5772911A (en) * | 1994-09-29 | 1998-06-30 | E. I. Du Pont De Nemours And Company | 1,1,2,2,3,3,4,4-Octafluorobutane compositions |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5079166A (en) * | 1973-11-07 | 1975-06-27 |
-
1989
- 1989-06-19 JP JP15658789A patent/JPH0321389A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5079166A (en) * | 1973-11-07 | 1975-06-27 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5705471A (en) * | 1994-09-29 | 1998-01-06 | E. I. Du Pont De Nemours And Company | 1,1,2,2,3,3,4,4-octaflourobutane compositions |
| US5772911A (en) * | 1994-09-29 | 1998-06-30 | E. I. Du Pont De Nemours And Company | 1,1,2,2,3,3,4,4-Octafluorobutane compositions |
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