JPH03214580A - Micro-gap type surge absorbing element - Google Patents
Micro-gap type surge absorbing elementInfo
- Publication number
- JPH03214580A JPH03214580A JP457290A JP457290A JPH03214580A JP H03214580 A JPH03214580 A JP H03214580A JP 457290 A JP457290 A JP 457290A JP 457290 A JP457290 A JP 457290A JP H03214580 A JPH03214580 A JP H03214580A
- Authority
- JP
- Japan
- Prior art keywords
- micro
- diameter
- brim
- gap
- cap electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、マイクロギャップ式サージ吸収素子の製造方
法に関し、特に、従来品に比べて、ガスシールの方法を
変えて特性向上をもたらすものである.
[従来の技術]
従来のマイクロギャップ式サージ吸収素子は、特公昭6
3−57918号に示されているように、絶縁体の表面
に、導電性セラミックス薄膜を付着させ、該導竃性薄膜
を複数個に分割し、その両端に電気電導度の高い金属又
は合金を固定し、電極を形成させた後、該電極にリード
線を溶接で取り付けている.
ノード線としては、ジュメット線を用いている.これは
電極間にガスを封入するための気密性から絶縁性被覆材
としてガラスを用いるため、ガラス封入線としてジュメ
ット線を用いている.つまり、従来技術では、第2図に
示すように、両端電極部にリード線を溶接させ、該リー
ド線にガラスを封着させ、気密性を保持させているもの
である.
以−E述べたように、従来技術は、リード線とガラスと
を封着させて気密性を保持しているものである.然し乍
ら、サージ保護特性の一つに、サージ耐量の増加である
.このサージ耐量特性は、どれだけのサージエネルギー
にサージ吸収素子が耐えられるかを示すものである.こ
のサージ耐量を増加させるための一つの手法として、ガ
ラス内部の空間を大きくすれば良い.このときに、従来
技術では、ガラスの径を大きくすればする程、ガラスの
加工が困難になり、また同時に、ガラスへの歪み等の熱
の影響も大きくなる欠点を有している.
[発明が解決しようとする問題点]
本発明は、従来技術のように、ガラスへの熱影響を大き
く与えることなく、サージ耐量を増加きせることを目的
としたマイクロギャップ式サージ吸収素子を提供するこ
とを目的とする.[発明の構成]
[問題点を解決するための手段]
本発明は、円柱状セラミックス絶縁体の表面に、マイク
ロギャップを有する導竃性薄膜を形成したセラミックス
素子の両端に、該円柱状セラミックス素子の外形とほぼ
同じ内径の凹部と更にその径より大きく、ツバ状になっ
た部分と、更に、ツバ外周が適当な幅で折り曲げられた
構造のキャンプ電極を機械的に圧入若しくは圧接し、該
折り曲げ部分の外周径よりやや大きい円筒形絶縁性外装
体と、折り曲げ部分とをンールtることにより、該マイ
クI1ギャップ周囲に一定ガスを封じ込めた構造を有す
るマイクロギャップ式サージ吸収素fである.そのソバ
状キャンプ電極を有した−7イクロギャ/ブ式サージ吸
収素子のキャ/ブ電極部分に、適当な径のリード線を取
り付けた構造を有するマイクロギャップ式サージ吸収素
子が好適である.また、そのツバ状キャップ電極の一部
から適当な幅、長さのリード部を有した構造のツバ状キ
ャップ電極を用いたマイクロギャップ式サージ吸収素子
が好適である.
〔作用]
本発明によると、マイクロギャップ導電性薄膜の両堝の
電極の形状が、セラミック円筒形絶縁体の径よりやや小
きく、該Je縁体に圧大した場合、該絶縁体との固定強
度が十分に保たれるようにされた四郡部分と、更に、そ
の径より大きく、ツバ状構造になっており、そのツバ構
造の外周部分は、適当な幅を折り曲げられた部分を有し
たキャップ電極を用いることを特長とする.従って、こ
のツバ状構造のキャップ電極の径は、ガスシールのため
に用いられる絶縁性外装体の径より、ややJ\さく、ツ
バ状構造のキャップ電極の外周部の折り曲げられた部分
と、該絶縁性外装体とを熱的に封着させ、ガスの気密性
を保つように、考慮されている.
マイクロギャップ式サージ吸収素子は、初期の放電を微
少なマイクロギャップ部で生じさせ、更に、サージのエ
ネルギーが大きな場合には、マイクロギャップ部の放電
は、電極間のアーク放電に移行する二重放寛機構を有し
ていることを特徴としている.このため、マイクロギャ
ップによる速い応答特性を有したまま大きなサージに対
しては、電極間放竃に移行するため、マイクロギャップ
素子への損傷が少ないという特長を有していた.然し乍
ら、電極の面積が小さいため、アーク放竃が、導電性薄
膜表面で生じ、このために、アーク放電による導電性薄
膜への損傷は相当なものがあった.
本発明のマイクロギャップ式サージ吸収素子では、キャ
ップ1l極としてツバ状構造のものを使用しているため
に、電極の面積は、従来技術のものに比べ、格段に大き
くなっている.このことからアーク放竃の電流密度を分
散させ、且つ導竃性薄膜表面から遠ざけることを可能に
したものである.つまり、本発明は、ツバ状構造のキャ
ップ電極を用いることにより、アーク放電のときの導竃
性被膜への損傷を減少きせ、サージ耐量を増加きせるこ
とを可能にした.
次に、本発明のマイクロギャップ式サージ吸収素子を具
体的な実施例により、説明するが、本発明は、その説明
により限定されるものではない.[実施例1]
本実施例を第1図A,Bに示す.
第1図Aに示されるように、径1.7mΦ、長さ5,5
園の円筒形ムライト素子21の全表面に、スパッタリン
グで、TiN薄膜22を蒸着形成し、次に、該ムライト
素子21の両端に内周径1.681111でツバ状外周
径10.0■Φのコバール金属で作製されたキャップ電
極24a、24bを各々機械的に圧大した後、YAGレ
ーザを用いて、該ムライト素子21の表面上に形成され
た該TiNM膜22を円周方向に幅約30μmでカット
し、マイクロギャップ1本(23)を形成させたものを
、内径10.5■Φ、外径12,5■Φ、長g6.01
111の円筒形鉛ガラス25を用いて、アルゴンガス雰
囲気中で、高周波加熱により、該フバール金属製のツバ
状構造のキヤ・yプ電極24a,24bの外周と、該円
筒形鉛ガラス25の両端部とを、26で封着させ、マイ
クロギャップ23の周囲にアルゴンガス27を密封させ
たものである.このツバ状構造のキャップ電極24aの
折り曲げ外周部分と円筒形鉛ガラス25との間の封入の
状態は、第1図Bに示すように、繰り込まれている.
本実施例によって、作製されたものと、従来技術によっ
て作製されたものとの、サージ耐量を測定し、比較した
結果を、第1表に示す.尚、サージ耐量の測定は、JE
C−212(t気学会、電気規格調査会標準規格)に示
されている(8×20)μ秒の電流サージを用いて測定
した.第1表に示されているように、従来技術では、サ
ージ耐量は、3000A程度が限界であったが、本発明
のサージ吸収素子では、容易に400OAまで耐えるこ
とが可能である.
第1表
従来品A 更困苗1 実施例1
セラミック1体 ムライト ムライト ムライト皮膜
TiN TiN TiNノード線径
0.411m 0.6■本体外被体径
6,0■ 6,0■本体外被体長さ 21.0■
2l,0■サージ耐量 1500A 300
0A放竃開始電圧 300V 300V[実施
例2]
第3図A,Bに、本実施例を示す.
第3図Aに示すように、先ず、径1.7■×長さ5.5
111のムライト素子31の全表面に、吹き付け法を用
いて、SnO.薄膜32を蒸着し、該ムライト素子31
の両端に、内周径1.681111,外周部分の径12
.0■のツバ状構造の42合金で作製されたキャップ電
極34a,34bを各々機械的に圧入固定した後、YA
Gレーザを用いて、該S n O x薄膜32を円周方
向に幅約50μ12.5■
6.0■
4000A
300■
mでカットし、マイクロギャップ33を1本形成させた
ものを、内径12.5閣、外径14.5閣、長き6.0
■の円筒形鉛ガラス35を用いて、Arガス37の雰囲
気中で高周波加熱により、該ッパ状構造キャップ電極3
4a,34bの外周部に、該円筒形鉛ガラス35を封着
させ、マイクロギャップ33の周囲に、Arガス37を
密封させたものである.
このツバ状構造のキャップ電極34aの折り曲げ外周部
分と円筒形船ガラス35との間の封入の状態は、第3図
Bに示すように、繰り込まれている.
更に、ガス封止された該本体の電極部34a中心に、径
0.5■のハンダメッキ軟鋼線38を電気溶接許せ、リ
ード線38として、取り付けたものである.
本実施例によって作製きれたものと、従来技術によって
作製されたもののサージ耐量の比較結果を第2表に示す
.尚、サージ耐量の測定は、実施例1と同様に、行なっ
た。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a micro-gap type surge absorption element, and in particular, to a method for producing a micro-gap type surge absorption element, which improves characteristics by changing the gas sealing method compared to conventional products. be. [Prior art] The conventional micro-gap type surge absorption element was
As shown in No. 3-57918, a conductive ceramic thin film is attached to the surface of an insulator, the conductive thin film is divided into a plurality of parts, and a metal or alloy with high electrical conductivity is coated on both ends of the conductive ceramic thin film. After fixing and forming electrodes, lead wires are attached to the electrodes by welding. Dumet lines are used as node lines. Since glass is used as the insulating coating material for airtightness to seal gas between the electrodes, Dumet wire is used as the glass-filled wire. That is, in the prior art, as shown in FIG. 2, lead wires are welded to the electrodes at both ends, and glass is sealed to the lead wires to maintain airtightness. As mentioned above, the conventional technology maintains airtightness by sealing the lead wire and glass. However, one of the surge protection characteristics is increased surge resistance. This surge resistance characteristic indicates how much surge energy the surge absorption element can withstand. One way to increase this surge resistance is to increase the space inside the glass. In this case, the conventional technology has the disadvantage that the larger the diameter of the glass, the more difficult it becomes to process the glass, and at the same time, the influence of heat such as distortion on the glass increases. [Problems to be Solved by the Invention] The present invention provides a micro-gap type surge absorbing element that aims to increase the surge resistance without significantly affecting the heat on glass unlike the prior art. The purpose is to [Structure of the Invention] [Means for Solving the Problems] The present invention provides a ceramic element in which a conductive thin film having a micro gap is formed on the surface of a cylindrical ceramic insulator, and a cylindrical ceramic insulator is provided at both ends of the ceramic element. A camp electrode having an inner diameter approximately the same as the outer diameter of the recess, a brim-shaped portion larger than that diameter, and a camp electrode having a structure in which the outer periphery of the brim is bent to an appropriate width is mechanically press-fitted or pressure-welded, and the bending is performed. This is a micro-gap type surge absorbing element f which has a structure in which a certain amount of gas is confined around the microphone I1 gap by rolling a cylindrical insulating exterior body that is slightly larger than the outer circumferential diameter of the part and a bent part. A micro-gap type surge absorbing element having a structure in which a lead wire of an appropriate diameter is attached to the cab/cab electrode part of the -7 microgap type surge absorbing element having a buckwheat-shaped camp electrode is suitable. Further, a micro-gap type surge absorbing element using a brim-shaped cap electrode having a structure having a lead portion of an appropriate width and length from a part of the brim-shaped cap electrode is suitable. [Function] According to the present invention, the shape of the electrodes in both chambers of the microgap conductive thin film is slightly smaller than the diameter of the ceramic cylindrical insulator, and when it is compressed to the Je edge body, it is difficult to fix the microgap conductive thin film with the insulator. It has a four-gun part that maintains sufficient strength, and a brim-like structure that is larger than its diameter, and the outer peripheral part of the brim structure has a part that is bent to an appropriate width. The feature is that it uses a cap electrode. Therefore, the diameter of the cap electrode with the brim-like structure is slightly smaller than the diameter of the insulating exterior body used for gas sealing, and the bent part of the outer periphery of the cap electrode with the brim-like structure and the It is designed to thermally seal the insulating exterior body and maintain gas tightness. A microgap type surge absorption element generates an initial discharge in a minute microgap area, and furthermore, when the energy of the surge is large, the discharge in the microgap area becomes a double discharge that transitions to an arc discharge between electrodes. It is characterized by having a relaxation mechanism. For this reason, while retaining the fast response characteristics of the microgap, in response to large surges, the device shifts to an interelectrode opening, resulting in less damage to the microgap element. However, because the area of the electrode was small, arcing occurred on the surface of the conductive thin film, and therefore the damage to the conductive thin film caused by the arc discharge was considerable. In the micro-gap type surge absorbing element of the present invention, since a flange-like structure is used as the cap 1l electrode, the area of the electrode is significantly larger than that of the conventional technology. This makes it possible to disperse the current density of the arc furnace and keep it away from the surface of the conductive thin film. In other words, the present invention makes it possible to reduce damage to the conductive coating during arc discharge and increase surge resistance by using a cap electrode with a brim-like structure. Next, the microgap type surge absorbing element of the present invention will be explained using specific examples, but the present invention is not limited by the explanation. [Example 1] This example is shown in Figures 1A and B. As shown in Figure 1A, diameter 1.7mΦ, length 5.5
A TiN thin film 22 is deposited on the entire surface of the cylindrical mullite element 21 by sputtering, and then a flange-shaped film with an inner diameter of 1.681111 mm and an outer diameter of 10.0 Φ is formed on both ends of the mullite element 21. After mechanically enlarging the cap electrodes 24a and 24b made of Kovar metal, a YAG laser is used to spread the TiNM film 22 formed on the surface of the mullite element 21 to a width of about 30 μm in the circumferential direction. The inner diameter 10.5 Φ, the outer diameter 12.5 Φ, and the length g 6.01 are cut with 1 microgap (23).
Using a No. 111 cylindrical lead glass 25, the outer periphery of the cap electrodes 24a, 24b having a collar-like structure made of Fvar metal and both ends of the cylindrical lead glass 25 are heated by high frequency heating in an argon gas atmosphere. The micro gap 23 is sealed with argon gas 27 around the micro gap 23. The state of sealing between the bent outer peripheral portion of the cap electrode 24a having a brim-like structure and the cylindrical lead glass 25 is retracted as shown in FIG. 1B. Table 1 shows the results of measuring and comparing the surge resistance of the product manufactured according to this example and the product manufactured using the conventional technique. In addition, the surge resistance is measured by JE
Measurement was performed using a current surge of (8 x 20) microseconds as specified in C-212 (Tekki Gakkai, Electrical Standards Committee Standard). As shown in Table 1, in the conventional technology, the surge withstand capacity was limited to about 3000A, but the surge absorption element of the present invention can easily withstand up to 400OA. Table 1 Conventional product A 1 raw seedling Example 1 1 ceramic body Mullite Mullite Mullite film
TiN TiN TiN node wire diameter 0.411m 0.6 ■Main body outer cover diameter
6,0■ 6,0■ Body outer cover length 21.0■
2l,0■Surge resistance 1500A 300
0A firing starting voltage 300V 300V [Example 2] This example is shown in Fig. 3A and B. As shown in Figure 3A, first, diameter 1.7cm x length 5.5mm
The entire surface of the mullite element 31 of No. 111 is coated with SnO. A thin film 32 is deposited and the mullite element 31
At both ends, the inner diameter is 1.681111, and the outer diameter is 12.
.. After mechanically press-fitting and fixing cap electrodes 34a and 34b made of 42 alloy with a brim-like structure of 0.0 mm, YA
Using a G laser, the S n O .5 cabinets, outer diameter 14.5 cabinets, length 6.0
Using the cylindrical lead glass 35 of (3), the cap-like structure cap electrode 3 is heated by high frequency heating in an atmosphere of Ar gas 37.
The cylindrical lead glass 35 is sealed around the outer peripheries of the 4a and 34b, and the periphery of the micro gap 33 is sealed with Ar gas 37. The state of enclosing between the bent outer peripheral portion of the cap electrode 34a having a brim-like structure and the cylindrical ship glass 35 is retracted as shown in FIG. 3B. Furthermore, a solder-plated mild steel wire 38 with a diameter of 0.5 cm is electrically welded and attached as a lead wire 38 to the center of the electrode portion 34a of the gas-sealed main body. Table 2 shows the comparison results of the surge resistance of the device manufactured by this example and the device manufactured by the conventional technology. Note that the surge resistance was measured in the same manner as in Example 1.
本実施例に示すように、ツバ状構造キ〜ツブ電極の径を
大きくすることによって、実施例1のサージ耐量400
OAより更に大きなサージ耐量5000Aのものを得る
ことが可能である.第2表
従来品C 更困苗工 衷農遭ユ
セラミック素体 ムライト ムライト ムライト皮膜
S n O t S n O * S
n O *ノード線径 0.4111 0
.6ml O.5一本体外被体径 5,Qm
6.0■ 14.5■本体外被体長さ 21.0
■ 21.0■ 6. Olllサージ耐量
1500A 3000A 5000A放電開始
寛圧 300V 300V 300V[
実施例3]
第4図に、本実施例を示す.
第4図に示すように、径1.7aox長さ5.51のl
、ライ1一素子41の全表面に吹き付け法を用いて、S
nO.薄膜42を蒸着し、該ムライト素子の両端にSU
SキA・ツブ43a,bを機械的に圧大固定した後、Y
AGレーザーを用いて、該SnQ.薄膜42を円周方向
に幅約50μmでカントし、マイクロギャップ44を1
本形成させた後、該SUSキャップ43a,bの両端に
該SUSキャップの外径より、やや大きな内径を有した
42合金で作製きれたツバ状構造キャップ電極45a,
bを密接させたものの外側に、該ツバ状キャップ電極の
外径よりやや大きな内径を有する円筒状鉛ガラス46を
設置させ、Arガス47雰囲気で高周波加熱を用いて、
該円筒状鉛ガラス46を該ツバ状構造キャップ電極45
a,bの折り曲げ外周部分48a、48bで封着させ、
マイクロギャップ44の周囲にAtガスを密封させたも
のである.
本実施例によって作製されたものと、従来技術によって
作製きれたもののサージ耐量の比較結果を第3表に示す
。As shown in this example, the surge resistance of Example 1 can be increased to 400 by increasing the diameter of the rib-shaped structure key electrode.
It is possible to obtain a surge withstand capacity of 5000A, which is even greater than that of OA. Table 2 Conventional product C
S n O t S n O * S
n O *Node wire diameter 0.4111 0
.. 6ml O. 5-Main body outer cover diameter 5,Qm
6.0 ■ 14.5 ■ Body outer cover length 21.0
■ 21.0 ■ 6. Olll surge resistance
1500A 3000A 5000A Discharge start tolerance 300V 300V 300V [
Example 3] Figure 4 shows this example. As shown in Figure 4, the diameter is 1.7aox, the length is 5.51
, S is applied to the entire surface of the lie 1 and element 41 using a spraying method.
nO. A thin film 42 is deposited and SU is applied to both ends of the mullite element.
After mechanically compressing and fixing S-kiss A and knobs 43a and b, Y
Using an AG laser, the SnQ. The thin film 42 is canted in the circumferential direction with a width of about 50 μm, and the micro gap 44 is
After the final formation, cap electrodes 45a with a flange-like structure made of 42 alloy having an inner diameter slightly larger than the outer diameter of the SUS caps are attached to both ends of the SUS caps 43a and 43b.
A cylindrical lead glass 46 having an inner diameter slightly larger than the outer diameter of the flange-shaped cap electrode is installed on the outside of the b-shaped cap electrode, and using high frequency heating in an Ar gas 47 atmosphere,
The cylindrical lead glass 46 is connected to the brim-like structured cap electrode 45.
Sealing the bent outer peripheral portions 48a and 48b of a and b,
In this case, At gas is sealed around the micro gap 44. Table 3 shows the comparison results of the surge resistance of the device manufactured by this example and the device manufactured by the conventional technique.
尚、サーン耐掖の測定は、実施例1と同様に行なった.
本実施例に示すように、従来技術では、量1−ン耐祉は
、3000A程度が限界であったが、本発明のサーシ吸
収素子では、実施例1と同様に、容易に4 0 0 0
Aまで耐えることが可能である.
匙エ1
更産呈A 更米菫1 実施例3
セラミック素体 ムライト ムライト ムライト皮膜
S n O * S n O tリード線
径 0.4■ 0. 6111本体外被体径
6.0■ 6.0■本体外被体長さ 21.0■
21.0■サージ耐量 1500A 3000
A放寛開始電圧 300V 300V[実施例
4]
第5図に、本実施例を示す.
第5図に示すように、径1.7■×長さ5.5■のムラ
イト素子51の全表面に吹き付け法を用いて、SnO.
薄膜52を蒸着し、該ムライト素子の両端に、SUSキ
ャップ53a.bを機械的に圧人固定した後、YAGレ
ーザーを用いて、該SnO,薄膜52を円周方向に幅約
50μmでカットし、マイク[Iギャップ54を1本形
成許せた12.5■
6.5■
4000A
300v
SnO.
後、該SUSキャップ53a,b及びマイクロギャップ
54を有したムライト素子51と、内径10.5■Φ、
外径12.5閣Φ、長き6.01の円筒状鉛ガラス56
を機械的に圧着きせるよう設計された42合金で作製さ
れたツバ状構造キャップ電極55@、bを、該ムライト
素子51及び該円筒状鉛ガラス56の両端より圧接させ
、Arガス雰囲気中で高周波加熱を用いて、該円筒状鉛
ガラス56の端面58a,bと該ツバ状構造キャップ電
極の外周部とを封着許せ、マイクロギャップ54の周囲
にArガス57を密封させたものである.
尚、本実施例では、円筒状鉛ガラス56の端面が、ツバ
状構造キャップ電極55aXbで覆われているため、円
筒状鉛ガラス56への機械的損傷を防止しているもので
ある.
本実施例によって作製されたものと、従来技術によって
作製されたもののサージ耐量の比較結果を第4表に示す
.
尚、サージ耐量の測定は、実施例1と同様に行なった.
本実施例に示すように、従来技術では、サージ耐量は、
3000A程度が限界であったが、本発明のサージ吸収
素子では、実施例1と同様に、容易に4000Aまで耐
えることが可能である.
第4表
従来品A 従来品BIu邑」,
セラミック素体 ムライト ムライト ムライト皮膜
S n O * S n O *リード線
径 Q,4m 0.6■本体外被体径 6.
0+111 6.0園本体外被体長さ 21. 0
m 21. 0■サージ耐量 1500A
3000A放電開始竃圧 300V 300
V[発明の効果]
本発明のマイクロギャップ式サージ吸収素子は、絶縁性
セラミックス素体の径より大きなツバ状のアーク放電部
を有し、更に、そのツバ状構造の外周部分は、適当な幅
で折り曲げられた構造を有するキャップ電極を用いたマ
イクロギャップ式SnO.
12.5■
6.5■
4000A
300v
サージ吸収素子であり、そのために、
第1に、アーク放電部が従来技術のものに比べて、その
面積を大きくすることが可能であり、従って、アーク放
電時の竃流密度を分散させ、且つ、導電性被膜表面から
遠ざけることを可能にすることによって、サージ耐量を
増加許せたマイクロギャップ式サージ吸収素子を提供で
きた.第2に、更に、ツバ状構造の電極の外周部分を適
当な幅で折り曲げ、この部分を用いて、ガラス等の絶縁
性被覆材とシールさせ、内部に一定のガスを封じ込める
ことを可能にし、従来技術のものに比べて、絶縁性被覆
材に歪み等の熱影響を与えることなく、該サージ吸収素
子の内部空間を容易に大きくすることを可能にしたマイ
クロギャップ式サージ吸収素子を提供する.
従って、本発明は、従来のマイクロギャップ式サージ吸
収素子の有している二重放電機構を損なうことなく、サ
ージ耐量を増加させることが可能であり、その特性を著
しく向旧させたことなどのごとき顕著な技術的な効果が
得られた.Incidentally, the measurement of Cern resistance was carried out in the same manner as in Example 1.
As shown in this example, in the conventional technology, the limit of the load bearing resistance was about 3000A, but in the sash absorbing element of the present invention, as in Example 1, the load resistance can easily be 4000A.
It is possible to withstand up to A. Spoon E 1 Saramai Violet 1 Example 3 Ceramic body Mullite Mullite Mullite film
S n O * S n O t Lead wire diameter 0.4■ 0. 6111 Main body outer cover diameter
6.0 ■ 6.0 ■ Body outer cover length 21.0 ■
21.0■Surge resistance 1500A 3000
A release start voltage 300V 300V [Example 4] Figure 5 shows this example. As shown in FIG. 5, SnO.
A thin film 52 is deposited, and SUS caps 53a. After fixing b mechanically, the SnO thin film 52 was cut in the circumferential direction to a width of about 50 μm using a YAG laser to form one microphone [I gap 54]. .5 ■ 4000A 300v SnO. After that, the SUS caps 53a, b and the mullite element 51 having the micro gap 54, an inner diameter of 10.5 Φ,
Cylindrical lead glass 56 with outer diameter 12.5mm and length 6.01mm
A cap electrode 55@,b with a flange-like structure made of 42 alloy designed to mechanically press the mullite element 51 and the cylindrical lead glass 56 is pressed against both ends of the mullite element 51 and the cylindrical lead glass 56, and a high-frequency wave is applied in an Ar gas atmosphere. Using heating, the end surfaces 58a, b of the cylindrical lead glass 56 and the outer periphery of the brim-shaped structure cap electrode are sealed, and the periphery of the micro gap 54 is sealed with Ar gas 57. In this embodiment, the end face of the cylindrical lead glass 56 is covered with the brim-shaped cap electrode 55aXb, thereby preventing mechanical damage to the cylindrical lead glass 56. Table 4 shows the comparison results of the surge resistance of the product manufactured by this example and the product manufactured by the conventional technology. The surge resistance was measured in the same manner as in Example 1.
As shown in this example, in the conventional technology, the surge withstand capacity is
Although the limit was about 3000A, the surge absorbing element of the present invention can easily withstand up to 4000A as in Example 1. Table 4 Conventional product A Conventional product BIu ``Ceramic body Mullite Mullite Mullite film
S n O * S n O * Lead wire diameter Q, 4m 0.6■Main body outer cover diameter 6.
0+111 6.0 Garden body outer cover length 21. 0
m21. 0■Surge resistance 1500A
3000A discharge starting pressure 300V 300
V [Effects of the Invention] The microgap surge absorbing element of the present invention has a brim-shaped arc discharge portion larger than the diameter of the insulating ceramic element, and furthermore, the outer peripheral portion of the brim-like structure has an appropriate width. Microgap type SnO. using a cap electrode with a bent structure. 12.5 ■ 6.5 ■ It is a 4000A 300v surge absorption element, and for this reason, firstly, it is possible to increase the area of the arc discharge part compared to the conventional technology, and therefore, the arc discharge By dispersing the current density and moving it away from the surface of the conductive film, we were able to provide a micro-gap type surge absorption element with increased surge resistance. Secondly, the outer peripheral part of the electrode with a brim-like structure is bent to an appropriate width, and this part is used to seal it with an insulating covering material such as glass, making it possible to confine a certain amount of gas inside, To provide a micro-gap type surge absorbing element which makes it possible to easily enlarge the internal space of the surge absorbing element without causing thermal effects such as distortion on an insulating covering material, as compared to conventional ones. Therefore, the present invention makes it possible to increase the surge withstand capacity without impairing the double discharge mechanism of the conventional micro-gap type surge absorption element, and significantly improves its characteristics. Remarkable technical effects were obtained.
第1図A,Bは、本発明のマイクロギャップ式サージ吸
収素子の構造を示す断面図と、そのツバ状構造電極の構
造を示す斜視図である.第2図は、従来のマイクロギャ
ップ式サージ吸収素子を示す断面図である.
第3図A%Bは、本発明のマイクロギャップ式サージ吸
収素子の他の例の構造を示す断面図と、そのためのツバ
状構造電極の構造を示す斜視図である.
第4図及び第5図は、本発明のマイクロギャップ式サー
ジ吸収素子の他の例の構造を示す断面図である。
[主要部分の符号の説明コ
21、31、4 1 ........ムライト素子2
2、3 2........T i N薄膜又はS n
O z薄膜23、33、4 3 .......マイ
クロギャップ24a,b,31a,b,45a,b,5
5a,b ........ソバ状キャップ電極2 5
、 3 5、
4 6、
5 6.....
..鉛ガラス
3 6 a5
b .......
ハンダメッキ軟鋼線FIGS. 1A and 1B are a cross-sectional view showing the structure of the micro-gap type surge absorbing element of the present invention, and a perspective view showing the structure of the brim-like structure electrode. Figure 2 is a cross-sectional view of a conventional micro-gap surge absorption element. FIG. 3A%B is a cross-sectional view showing the structure of another example of the micro-gap type surge absorbing element of the present invention, and a perspective view showing the structure of the brim-like structured electrode therefor. 4 and 5 are cross-sectional views showing the structure of other examples of the micro-gap type surge absorbing element of the present invention. [Explanation of symbols of main parts 21, 31, 4 1. .. .. .. .. .. .. .. Mullite element 2
2, 3 2. .. .. .. .. .. .. .. T i N thin film or S n
Oz thin film 23, 33, 4 3. .. .. .. .. .. .. Micro gap 24a, b, 31a, b, 45a, b, 5
5a,b. .. .. .. .. .. .. .. Buckwheat cap electrode 2 5
, 3 5, 4 6, 5 6. .. .. .. .. .. .. Lead glass 3 6 a5 b. .. .. .. .. .. .. Solder plated mild steel wire
Claims (1)
を形成した円柱状セラミックス絶縁体素子の両端に、該
円柱状セラミックス素子の外形とほぼ同じ内径の凹部と
更にその径より大きく、ツバ状になった部分と、更に、
該ツバ状部分の外周が適当な幅で折り曲げられた構造を
有するキャップ電極を、各々機械的に圧入若しくは圧接
し、該キャップ電極の折り曲げ構造の外周部分の径より
やや大きい絶縁性外装体を備え、該絶縁性外装体と、該
折り曲げ構造の外周部分とを封着することにより、該マ
イクロギャップを有する円柱状セラミックス絶縁体の周
囲に一定ガスを封じ込めた構造を有するマイクロギャッ
プ式サージ吸収素子。 2、請求項1の記載において、該ツバ状構造のキャップ
電極部に、適当な径のリード線を取り付けた構造を有す
るマイクロギャップ式サージ吸収素子。 3、請求項1の記載において、該ツバ状構造のキャップ
電極の一部から適当な幅、長さのリード部を有すること
を特徴とする請求項1に記載のマイクロギャップ式サー
ジ吸収素子。[Claims] 1. At both ends of a cylindrical ceramic insulator element having a conductive thin film with a micro gap formed on its surface, a recess with an inner diameter approximately the same as the outer diameter of the cylindrical ceramic element, and a recess with an inner diameter that is larger than the outer diameter of the cylindrical ceramic insulator element. A large, brim-shaped part, and furthermore,
A cap electrode having a structure in which the outer periphery of the brim portion is bent to an appropriate width is mechanically press-fitted or pressed into contact with each other, and an insulating exterior body is provided with a diameter slightly larger than the diameter of the outer periphery of the bent structure of the cap electrode. A micro-gap type surge absorption element having a structure in which a certain amount of gas is sealed around the cylindrical ceramic insulator having the micro-gap by sealing the insulating exterior body and the outer peripheral portion of the folded structure. 2. The micro-gap surge absorbing element according to claim 1, having a structure in which a lead wire of an appropriate diameter is attached to the cap electrode portion of the brim-like structure. 3. The microgap type surge absorbing element according to claim 1, further comprising a lead portion having an appropriate width and length from a part of the cap electrode having the brim-like structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004572A JPH0724234B2 (en) | 1990-01-16 | 1990-01-16 | Micro gap type surge absorber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004572A JPH0724234B2 (en) | 1990-01-16 | 1990-01-16 | Micro gap type surge absorber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03214580A true JPH03214580A (en) | 1991-09-19 |
| JPH0724234B2 JPH0724234B2 (en) | 1995-03-15 |
Family
ID=11587751
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004572A Expired - Lifetime JPH0724234B2 (en) | 1990-01-16 | 1990-01-16 | Micro gap type surge absorber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0724234B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05242950A (en) * | 1992-02-27 | 1993-09-21 | Mitsubishi Materials Corp | Sealing electrode and surge absorber using the same |
| JPH05242951A (en) * | 1992-02-27 | 1993-09-21 | Mitsubishi Materials Corp | Sealed electrode and surge absorber therewith |
| JPH05283140A (en) * | 1992-03-31 | 1993-10-29 | Mitsubishi Materials Corp | Surge absorber |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5182566A (en) * | 1975-01-17 | 1976-07-20 | Meguro Denki Seizo Kk | |
| JPS53123851A (en) * | 1977-04-05 | 1978-10-28 | Shiroyama Seisakusho Kk | Protector circuit having time lag fuse and equivalent effect |
| JPS5774984A (en) * | 1980-10-28 | 1982-05-11 | Meguro Denki Seizou Kk | Hermetic arrester |
-
1990
- 1990-01-16 JP JP2004572A patent/JPH0724234B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5182566A (en) * | 1975-01-17 | 1976-07-20 | Meguro Denki Seizo Kk | |
| JPS53123851A (en) * | 1977-04-05 | 1978-10-28 | Shiroyama Seisakusho Kk | Protector circuit having time lag fuse and equivalent effect |
| JPS5774984A (en) * | 1980-10-28 | 1982-05-11 | Meguro Denki Seizou Kk | Hermetic arrester |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05242950A (en) * | 1992-02-27 | 1993-09-21 | Mitsubishi Materials Corp | Sealing electrode and surge absorber using the same |
| JPH05242951A (en) * | 1992-02-27 | 1993-09-21 | Mitsubishi Materials Corp | Sealed electrode and surge absorber therewith |
| JPH05283140A (en) * | 1992-03-31 | 1993-10-29 | Mitsubishi Materials Corp | Surge absorber |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0724234B2 (en) | 1995-03-15 |
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