JPH03218914A - Production of high purity silica and ammonium fluorosilicate - Google Patents

Production of high purity silica and ammonium fluorosilicate

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Publication number
JPH03218914A
JPH03218914A JP31007590A JP31007590A JPH03218914A JP H03218914 A JPH03218914 A JP H03218914A JP 31007590 A JP31007590 A JP 31007590A JP 31007590 A JP31007590 A JP 31007590A JP H03218914 A JPH03218914 A JP H03218914A
Authority
JP
Japan
Prior art keywords
silica
ammonium
ammonium fluoride
ammonia
purity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31007590A
Other languages
Japanese (ja)
Inventor
Makoto Tsugeno
誠 柘植野
Kenji Tanimoto
健二 谷本
Masao Kubo
正雄 久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to JP31007590A priority Critical patent/JPH03218914A/en
Publication of JPH03218914A publication Critical patent/JPH03218914A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain high purity silica in a clean industrial process without requiring treatments on the reaction product by separating impurities from ammonium fluorosilicate obtained from clude silica and (acid) ammonium fluoride by used of the difference in solubilities, and then effecting the reaction of ammonium fluorosilicate with ammonia in a water-base medium. CONSTITUTION:Ammonium fluorosilicate is obtained by bringing clude silica into reaction with ammonium fluoride or acid ammonium fluoride in a water- based medium. The unreacted silica and impurities in the reaction mixture are separated from ammonium fluorosilicate solution by solid-liquid separation method, and the obtd. ammonia fluorosilicate is made to react with ammonia in a water-base medium. By this method, high purity silica can be obtained from a cheap source material without requiring treatments on the expensive reaction product and without causing byproduct of waste acid. It is preferable to recycle the ammonium fluoride obtained as the byproduct in the separation process of silica by the reaction with ammonia.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はシリカ源として利用可能な化合物または、混合
物からなる粗シリカを原料として、弗化アンモニウム及
び/又は酸性弗化アンモニウムを水性媒体中で反応させ
珪弗化アンモニウムを得、これを水性媒体中でアンモニ
アと反応することを特徴とする高純度シリカの製造方法
に関する。また、粗ンリ力を原料として、弗化アンモニ
ウム及び/又は酸性弗化アンモニウムと酸成分とを水性
媒体中で反応させ珪弗化アンモニウムを得、これを水性
媒体中でアンモニアと反応することを特徴とする高純度
シリカの製造方法に関する。また更に、粗シリカを原料
として、弗化アンモニウムを反応させ高純度の珪弗化ア
ンモニウムを得ることを特徴とする高純度珪弗化アンモ
ニウムの製造方法に関する。
Detailed Description of the Invention [Industrial Application Field] The present invention uses crude silica consisting of a compound or mixture that can be used as a silica source as a raw material, and produces ammonium fluoride and/or acidic ammonium fluoride in an aqueous medium. The present invention relates to a method for producing high-purity silica, which comprises reacting to obtain ammonium fluorosilicate, and reacting this with ammonia in an aqueous medium. In addition, ammonium fluoride is obtained by reacting ammonium fluoride and/or acidic ammonium fluoride with an acid component in an aqueous medium using crude acid as a raw material, and this is then reacted with ammonia in an aqueous medium. The present invention relates to a method for producing high-purity silica. Furthermore, the present invention relates to a method for producing high-purity ammonium silicofluoride, which is characterized in that crude silica is used as a raw material and ammonium fluoride is reacted to obtain high-purity ammonium fluorosilicate.

高純度シリカは、石英原料、セラミックス原料、充填材
等の機能性材料としての需要が高まっている。高純度珪
弗化アンモニウムは高純度シリカ製造の中間体として有
用である。
Demand for high-purity silica is increasing as a functional material for quartz raw materials, ceramic raw materials, fillers, etc. High purity ammonium silicofluoride is useful as an intermediate in the production of high purity silica.

〔従来の技術〕[Conventional technology]

従来、シリカの製造方法としては、珪酸ソーダを酸やイ
オン交換樹脂を用いて中和する方法(珪酸ソーダを原料
とする湿式法)か一般的であるが、この方法は低コスト
である反面、ナトリウム、アルミニウム、鉄等の金属性
不純物か混入する為、高純度を要求される分野には供し
得ない。
Traditionally, silica has been produced by neutralizing sodium silicate with acid or ion exchange resin (wet method using sodium silicate as a raw material), but while this method is low cost, Because it is contaminated with metallic impurities such as sodium, aluminum, and iron, it cannot be used in fields that require high purity.

また、乾式法として四塩化珪素を酸素と水素の存在下、
高温燃焼させる方法かあるが、コストか高いため用途が
限定され得られるシリカの物性も湿式法シリカとは異な
り、物性制御が制限される。
In addition, as a dry method, silicon tetrachloride is mixed in the presence of oxygen and hydrogen.
Although there is a method of high-temperature combustion, its use is limited due to the high cost, and the physical properties of the resulting silica are different from those of wet-process silica, which limits the control of physical properties.

更に、珪弗化物よりシリカを得る方法として、シリカや
ケイ酸塩を灼熱処理後、弗化アンモニウムと反応させ、
珪弗化物、珪弗化アンモニウム及び/又はジアミノ四弗
化珪素を生成させ、これらを揮発させ、回収して該回収
物をアンモニアと反応させ、シリカと弗化アンモニウム
を得る方法(米国特許1,859.988号公報、米国
特許l,959.749号公報)、シリカ源として利用
可能な化合物または混合物を、弗化水素酸と硫酸の混合
液に溶解させて得られた溶液を蒸留して珪素の弗化物を
回収し、これよりシリカを得る方法(特開昭62−15
3111号公報)、燐鉱石等の弗素含有燐源を酸で処理
し、4弗化ケイ素含有ガスを得、このガスを水、又は弗
化アンモニウム水溶液に吸収させ、硅弗化水素酸又は珪
弗化アンモニウムを得、珪弗化水素酸の場合は珪弗化ア
ンモニウムとし、珪弗化アンモニウムとアンモニアより
シリカと弗化アンモニウムを得る方法(ヨーロッパ特許
337.712号公報)の方法か等が知られている。
Furthermore, as a method to obtain silica from silicofluoride, silica or silicate is treated with scorching heat and then reacted with ammonium fluoride.
A method of producing silica fluoride, ammonium silicofluoride, and/or silicon diaminotetrafluoride, volatilizing them, recovering them, and reacting the recovered product with ammonia to obtain silica and ammonium fluoride (US Pat. No. 1, No. 859.988, U.S. Pat. No. 1,959.749), a compound or mixture that can be used as a silica source is dissolved in a mixture of hydrofluoric acid and sulfuric acid, and the resulting solution is distilled to produce silicon. A method of recovering fluoride and obtaining silica from it (JP-A-62-15
No. 3111), a fluorine-containing phosphorus source such as phosphate rock is treated with an acid to obtain a silicon tetrafluoride-containing gas, and this gas is absorbed in water or an aqueous ammonium fluoride solution to produce a A known method is to obtain ammonium fluoride, use ammonium fluorosilicide in the case of hydrofluorosilicic acid, and obtain silica and ammonium fluoride from ammonium fluorosilicide and ammonia (European Patent No. 337.712). ing.

米国特許1,859,988及び同1,959,749
号公報に記載の方法は、反応工程長く、反応温度も30
0゜C以上と高く装置の材質等で問題かある。
U.S. Patent Nos. 1,859,988 and 1,959,749
The method described in the publication has a long reaction process and a reaction temperature of 30°C.
The temperature is high, above 0°C, and there may be a problem with the material of the equipment.

特開昭62−153111号公報に記載の方法は、高価
な弗化水素酸を用い、かつ相当量の硫酸の使用により廃
酸か副生じ、工業的なプロセスとは言えない。
The method described in JP-A-62-153111 uses expensive hydrofluoric acid and produces waste acid as a by-product due to the use of a considerable amount of sulfuric acid, so it cannot be called an industrial process.

ヨーロッパ特許337.712号公報記載の方法は湿式
燐酸の製造プラントに組み込まなければ工業的なメリッ
トは無く、またガス化精製法は、ガス吸収工程での四弗
化珪素及び弗化水素のロスとシリカのスケーリングによ
る操業トラブルか問題となり、更に装置コストも大きい
The method described in European Patent No. 337.712 has no industrial merit unless it is incorporated into a wet phosphoric acid production plant, and the gasification purification method has problems with the loss of silicon tetrafluoride and hydrogen fluoride in the gas absorption process. Scaling of silica may cause operational problems, and equipment costs are also high.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記のように、従来のシリカ粉末の製造方法には種々の
問題かある。そこで、本発明者等は、この問題を解決す
る目的で鋭意研究を行い本発明を完成した。即ち、本発
明者等は粗シリカと弗化アンモニウム及び/又は酸性弗
化アンモニウムより珪弗化アンモニウムを生成させ、こ
の反応生成物中の不純分を、溶解度差を利用して分離し
た後、得られた珪弗化アンモニウムを水性媒体中でアン
モニアと反応することにより高純度シリカを得ることを
見出した。
As mentioned above, conventional methods for producing silica powder have various problems. Therefore, the present inventors conducted extensive research and completed the present invention in order to solve this problem. That is, the present inventors produced ammonium silicofluoride from crude silica and ammonium fluoride and/or acidic ammonium fluoride, separated the impurities in this reaction product by utilizing the solubility difference, and then produced the resulting product. We have found that high purity silica can be obtained by reacting the ammonium fluorosilicate with ammonia in an aqueous medium.

また、本発明方法において用いる弗化アンモニウムは、
珪弗化アンモニウムとアンモニアとを、水性媒体中で反
応することにより生成する弗化アンモニウムを、最初の
反応に循環使用することかできる。従って本発明の方法
によれば、従来法のように高価な製造原料や反応副生成
物の処理を要せず、安価な製造原料と、副生物の循環使
用により経済的かつクリーンな工業的プロセスとなる。
Furthermore, the ammonium fluoride used in the method of the present invention is
Ammonium fluoride produced by reacting ammonium fluorosilicate and ammonia in an aqueous medium can be recycled to the first reaction. Therefore, according to the method of the present invention, there is no need to treat expensive production raw materials or reaction by-products as in the conventional method, and the process is economical and clean due to the recycling use of inexpensive production raw materials and by-products. becomes.

本発明の目的は、粗シリカより高純度かつ各種物性のシ
リカを、低コストで製造する方法を提供することにある
An object of the present invention is to provide a method for producing silica with higher purity and various physical properties than crude silica at low cost.

本発明の他の目的は高純度の珪弗化アンモニムの製造方
法を提供することにある。
Another object of the present invention is to provide a method for producing ammonium silicofluoride with high purity.

〔発明を解決する手段〕[Means for solving the invention]

本発明は、粗シリカと弗化アンモニウム及び/又は酸性
弗化アンモニウムを水性媒体中で反応させて珪弗化アン
モニウムを得、該反応混合物中の珪弗化アンモニウム溶
液と未反応シリカ及び不純分を固液分離後、珪弗化アン
モニウムを水性媒体中で、アンモニアと反応させシリカ
を生成させることを特徴とする高純度シリカの製造方法
に関する。また、本発明は、粗シリカと弗化アンモニウ
ム及び/又は酸性弗化アンモニウムと酸成分とを水性媒
体中で反応させて珪弗化アンモニウムを得、該反応混合
物中の珪弗化アンモニウム溶液と未反応シリカ及び不純
分を固液分離後、珪弗化アンモニウムを水性媒体中で、
アンモニアと反応させシリカを生成させることを特徴と
する高純度シリカの製造方法に関する。更に本発明は、
この高純度シリカ製造工程の初めの反応工程で得た珪弗
化アンモニウムを分離精製し高純凍珪弗化アンモニウム
を製造する方法に関する。
The present invention involves reacting crude silica with ammonium fluoride and/or acidic ammonium fluoride in an aqueous medium to obtain ammonium fluorosilicate, and removing unreacted silica and impurities from the ammonium fluorosilicate solution in the reaction mixture. The present invention relates to a method for producing high-purity silica, which comprises reacting ammonium silicofluoride with ammonia in an aqueous medium to produce silica after solid-liquid separation. The present invention also provides ammonium fluorosilicate by reacting crude silica and ammonium fluoride and/or acidic ammonium fluoride and an acid component in an aqueous medium, and the ammonium fluorosilicate solution in the reaction mixture and the untreated ammonium fluoride silicate. After solid-liquid separation of the reacted silica and impurities, ammonium silicofluoride was added in an aqueous medium.
The present invention relates to a method for producing high-purity silica, which is characterized by producing silica by reacting with ammonia. Furthermore, the present invention
The present invention relates to a method for separating and refining ammonium fluorosilicate obtained in the first reaction step of this high-purity silica production process to produce high-purity frozen ammonium fluorosilicate.

本発明で使用する原料の粗シリカとは、不純分を含有す
るシリカ(無水珪酸、含水珪酸、珪酸質鉱物、シリカガ
ラス等)、シリカを含有する化合物(珪酸塩等)、また
はシリカを含有する混合物である。例えば、天然物とし
て得られる珪藻土、珪石、珪砂、籾殻灰、珪酸塩含有鉱
物等が挙げられる。更に、フエ口シリコン製造時に発生
する廃ガスの集塵により得られるシリカフユーム、石炭
火力発電所からの副産物であるフライアッシュ、高炉ス
ラグ、更にまた合成シリカとして知られれている珪曹法
シリカ、金属珪素、四塩化珪素の高温燃焼法シリカ等か
挙げられる。粗シリカとしてはシリカ含量か高い程望ま
しいが、通常20%以上、好ましくは50%以上、更に
好ましくは80%以上である。
The raw material crude silica used in the present invention refers to silica containing impurities (anhydrous silicic acid, hydrated silicic acid, silicic minerals, silica glass, etc.), compounds containing silica (silicates, etc.), or silica containing silica. It is a mixture. Examples include diatomaceous earth, silica stone, silica sand, rice husk ash, and silicate-containing minerals obtained as natural products. In addition, silica fuyum obtained by collecting dust from waste gas generated during the production of Huekou silicon, fly ash which is a byproduct from coal-fired power plants, blast furnace slag, silica process silica known as synthetic silica, and metallic silicon. , high-temperature combustion method silica of silicon tetrachloride, etc. The higher the silica content of crude silica, the more desirable it is, but it is usually 20% or more, preferably 50% or more, and more preferably 80% or more.

本発明て使用する弗化アンモニウムは、試薬、工業薬品
として入手可能な粉末、水溶液てもよいが、後に述べる
珪弗化アンモニウムを水性媒体中でアンモニアと反応さ
せシリカを分離する際に副生ずる弗化アンモニウムを循
環使用するのか好ましい。水性媒体としては、水、また
は、原料及び生成物と反応しない不活性な有機溶媒も使
用可能である。水溶液が取扱上好ましい。
The ammonium fluoride used in the present invention may be a reagent, a powder available as an industrial chemical, or an aqueous solution. It is preferable to use ammonium chloride cyclically. As the aqueous medium, water or an inert organic solvent that does not react with the raw materials and products can also be used. An aqueous solution is preferred for handling.

上述した粗シリカと弗化アンモニウムの反応は通常水性
媒体中で加熱下反応させる。
The above-mentioned reaction between crude silica and ammonium fluoride is usually carried out under heating in an aqueous medium.

シリカと弗化アンモニウムの水性媒体中ての反応は以下
の反応式で示される。
The reaction between silica and ammonium fluoride in an aqueous medium is shown by the following reaction formula.

Sio2+6NH4F (NH4)2S i F 6 +2 H20 +4 N
H3↑使用する弗化アンモニウムの量は、用いる粗シリ
カの反応性にもよるが、原料に含まれるシリカを珪弗化
物にさせるにたる量を用いれば良い。通常粗シリカ中の
Singに対して、モル比で0.5〜20、好ましくは
1〜15、更に好ましくは2〜12である。弗化アンモ
ニウムか過剰な程、粗シリカとの反応率を上げることか
出来る。
Sio2+6NH4F (NH4)2S i F 6 +2 H20 +4 N
H3↑The amount of ammonium fluoride to be used depends on the reactivity of the crude silica used, but it is sufficient to use an amount sufficient to convert the silica contained in the raw material into silicofluoride. Usually, the molar ratio is 0.5 to 20, preferably 1 to 15, more preferably 2 to 12, relative to Sing in the crude silica. An excess of ammonium fluoride can increase the reaction rate with crude silica.

反応温度は、反応時の圧力により異なり、特に限定しな
いが、通常50゜C以上好まし・(は70゜C以上てあ
る。常圧または減圧下では、50〜1lO゜Cか好まし
い。反応圧力は通常、常圧または減圧下て行うが、副生
アンモニアを抜きつつ加圧条件下で行うことも可能であ
る。通常は、副生アンモニアは系外に導き、冷却器をと
うして回収し、必要に応じて水溶液等に吸収させ、アン
モニア水として回収可能である。この回収アンモニア水
は、次の反応工程の原料として使用可能である。また、
反応系に不活性ガスをパブリングさせて、副生アンモニ
アガスを系外に出す方法も適用可能である。
The reaction temperature varies depending on the pressure during the reaction and is not particularly limited, but is usually 50°C or higher, preferably 70°C or higher. Under normal pressure or reduced pressure, 50 to 110°C is preferable. Reaction pressure This is usually carried out under normal pressure or reduced pressure, but it is also possible to carry out under pressurized conditions while removing by-product ammonia.Normally, by-product ammonia is led out of the system and recovered through a cooler. If necessary, it can be absorbed into an aqueous solution or the like and recovered as ammonia water.This recovered ammonia water can be used as a raw material for the next reaction step.Also,
A method in which by-product ammonia gas is discharged from the reaction system by bubbling an inert gas into the reaction system is also applicable.

反応方式は回分式、連続式いずれも可能であり、反応時
間は反応方式、反応条件により異なり、特に限定しない
が、通常10分〜50時間以内で、より好ましくは1〜
20時間である。
The reaction method can be either a batch method or a continuous method, and the reaction time varies depending on the reaction method and reaction conditions, and is not particularly limited, but is usually within 10 minutes to 50 hours, more preferably 1 to 50 hours.
It is 20 hours.

更に、弗化アンモニウムの代わりに、酸性弗化アンモニ
ウムも使用可能である。
Furthermore, acidic ammonium fluoride can also be used instead of ammonium fluoride.

シリカと酸性弗化アンモニウムの水性媒体中での反応式
は、以下の反応式で示される。
The reaction formula of silica and acidic ammonium fluoride in an aqueous medium is shown by the following reaction formula.

S102+3NH4・}{ l:’ 2−〉(NH4)
2S iF 6+2H20 +3NH3↑S102+4
NH4・H F 2   −〉(NH4)2S i F
6 +2H20+2N84F酸性弗化アンモニウムとし
て工業薬品等を用いても良いかシリカ製造における弗化
アンモニウム母液を加熱濃縮せしめた脱アンモニア反応
生成物(以下の反応式参照)を使用することも可能であ
る。
S102+3NH4・}{l:'2->(NH4)
2S iF 6+2H20 +3NH3↑S102+4
NH4・HF 2 −> (NH4)2S i F
6 +2H20+2N84F Can an industrial chemical be used as the acidic ammonium fluoride? It is also possible to use a deammoniation reaction product (see reaction formula below) obtained by heating and concentrating ammonium fluoride mother liquor in silica production.

2NH.F  −一→NH.・HF2+  NH2↑上
記反応は反応率を高めるには100゜C以上の高温条件
を要するので、通常は20〜80%程度の脱アンモニア
反応率にとどめ弗化アンモニウムと酸性弗化アンモニウ
ムとの混合液または混合スラリーとして粗シリカとの反
応に供せば良い。
2NH. F-1→NH.・HF2+ NH2↑The above reaction requires high-temperature conditions of 100°C or higher to increase the reaction rate, so usually the deammonation reaction rate is kept at about 20 to 80% and the mixture of ammonium fluoride and acidic ammonium fluoride is used. Alternatively, it may be used as a mixed slurry for reaction with crude silica.

また、酸性弗化アンモニウムを得る他の方法として、弗
化アンモニウムを陽イオン交換樹脂を用いて脱アンモニ
アする方法が挙げられる。即ち、下記に示す如く、スル
ホン酸型やカルボン酸型のイオン交換樹脂を用いて酸性
弗化アンモニウムもしくは酸性弗化アンモニウムと弗化
アンモニウムとの混合物か得られ、これらを粗シリカと
の反応に供することかできる。
Another method for obtaining acidic ammonium fluoride is a method in which ammonium fluoride is deammoniated using a cation exchange resin. That is, as shown below, acidic ammonium fluoride or a mixture of acidic ammonium fluoride and ammonium fluoride is obtained using a sulfonic acid type or carboxylic acid type ion exchange resin, and these are subjected to a reaction with crude silica. I can do it.

2 NH.F +R − S 03H NH4・HF2+R−SO3NH. 3NH.F+R−SO3H NH.・HF,十NH4F+R−SOzNHn(R−S
O.H,陽イオン交換樹脂) 粗シリカと弗化アンモニウムを反応させる系に酸成分を
添加しても良い。酸成分としては弗化水素、弗化水素酸
、珪弗化水素、珪弗化水素酸、硫酸、塩化水素、塩酸、
硝酸、陽イオン交換樹脂等か挙げられる。弗化水素、弗
化水素酸、珪弗化水素、珪弗化水素酸、陽イオン交換樹
脂か好ましい。
2NH. F +R - S 03H NH4・HF2+R-SO3NH. 3NH. F+R-SO3H NH.・HF, 10NH4F+R-SOzNHn (R-S
O. H, cation exchange resin) An acid component may be added to the system in which crude silica and ammonium fluoride are reacted. Acid components include hydrogen fluoride, hydrofluoric acid, hydrogen silicofluoride, hydrosilicic acid, sulfuric acid, hydrogen chloride, hydrochloric acid,
Examples include nitric acid and cation exchange resins. Preferred are hydrogen fluoride, hydrofluoric acid, hydrogen silicofluoride, hydrofluorosilicic acid, and cation exchange resins.

弗化水素酸は、後に述へる副生弗化アンモニウム溶液を
陽イオン交換樹脂等で処理して以下の反応式て示すよう
に脱アンモニアして弗化水素酸か得られるので、副生弗
化アンモニウムか循環使用可能であり特に好ましい。
Hydrofluoric acid can be obtained by treating the by-product ammonium fluoride solution, which will be described later, with a cation exchange resin and deammonizing it as shown in the reaction formula below. Ammonium chloride can be recycled and is particularly preferred.

NH4F+R−SO.H HF+R−SO3NH. (R−SO3H ;陽イオン交換樹脂)粗シリカと弗化
アンモニウム及び酸の水性媒体中ての反応式は、以下の
反応式て示される。
NH4F+R-SO. H HF+R-SO3NH. (R-SO3H; cation exchange resin) The reaction formula of crude silica, ammonium fluoride, and acid in an aqueous medium is shown by the following reaction formula.

酸として弗化水素酸の場合、 S iO 2 + 5 N H 4 F + H F(
NH4)2S iFg +2H20+3NH2↑S i
0 2 +2 N 8 4 F + 4 8 F(NH
4)2S i Fa +2 H20酸として珪弗化水素
酸の場合 SiO2+6NH4F+H2SiFs −一→2(NH
4)2S iF@+2H20+2NH3↑酸として陽イ
オン交換樹脂の場合 Si02+6NH4F+4R−SOsH  −一→(N
H4)2S iFa +4 R  SOaNH.+2H
20酸として硫酸の場合 S i02+6NH4F+2H2sO4(NH4)2S
 i F s + 2 (NH4)2S o4+ 2 
H20粗シリカと酸性弗化アンモニウム及び弗イし水素
酸との反応は以下の式で示される。
In the case of hydrofluoric acid as the acid, S iO 2 + 5 NH 4 F + HF (
NH4)2S iFg +2H20+3NH2↑S i
0 2 + 2 N 8 4 F + 4 8 F (NH
4) 2S i Fa +2 H20When hydrosilicic acid is used as the acid, SiO2+6NH4F+H2SiFs -1→2(NH
4) 2S iF@+2H20+2NH3↑ In case of cation exchange resin as acid Si02+6NH4F+4R-SOsH -1→(N
H4) 2S iFa +4 R SOaNH. +2H
20 In case of sulfuric acid as acid S i02+6NH4F+2H2sO4(NH4)2S
i F s + 2 (NH4)2S o4+ 2
The reaction of H20 crude silica with acidic ammonium fluoride and fluorinated hydric acid is shown by the following formula.

S i02+2NH4・HF2+2HF −−→(NH
.)2S i F6+2H20 酸の量は、酸の種類により若干異なる力1、シlJ力に
対してモル比て0. 1〜6、好まし< +−s 0.
 5〜2てある。また、アンモニアを生成しない上記の
反応の場合、反応温度は、通常100゜C以下て、粗シ
リカ、或いは反応条件によっては50〜80゜Cで行う
S i02+2NH4・HF2+2HF −-→(NH
.. ) 2S i F6 + 2H20 The amount of acid varies slightly depending on the type of acid, with a molar ratio of 0. 1-6, preferably < +-s 0.
There are 5 to 2. Further, in the case of the above-mentioned reaction which does not produce ammonia, the reaction temperature is usually 100°C or less, and is carried out at 50 to 80°C depending on the crude silica or reaction conditions.

以上述べた、粗シリカより珪弗化アンモニウムを得る方
法は、他に、上記反応方式を組み合わせて行うことも可
能である。
The method of obtaining ammonium fluorosilicate from crude silica described above can also be carried out by combining the above reaction methods.

次に、本発明方法は、上記の方法で得られた、珪弗化ア
ンモニウムを水性媒体中でアンモニアと反応させるが、
この反応の前に、珪弗化アンモニウムの分離精製を行う
こともてきる。
Next, in the method of the present invention, ammonium silicofluoride obtained by the above method is reacted with ammonia in an aqueous medium,
Before this reaction, ammonium silicofluoride may be separated and purified.

分離精製法は、熱時または常温で、生成した珪弗化アン
モニウムか溶解している水性媒体に不溶性の不純分が有
る場合は、これを固液分離する。
In the separation and purification method, if there is an insoluble impurity in the aqueous medium in which ammonium fluorosilicate is dissolved under heat or at room temperature, this is separated into solid and liquid.

この分離液に、アンモニアを加え、シリカを得る反応を
行っても良いが、更に、珪弗化アンモニウムか溶解して
いる母液を冷却、或いは必要に応じて濃縮することによ
り珪弗化アンモニウムを、白色結晶として析出させ、ろ
過する方法で行う二とにより純度良好な珪弗化アンモニ
ウムか得られる更に高純度なシリカを得るためには、上
記方法で得られた珪弗化アンモニウムの白色結晶を再結
晶等により精製することもてきる。再結晶方法は熱水に
溶解し、熱時ろ過して、ろ滓を取り除き、母液から固形
分を晶析する通常の方法か適用される。この際に、珪弗
化アンモニウムの晶析は酸性条件下で行うと精製効果か
大きい傾向にある。
Ammonia may be added to this separated liquid to perform a reaction to obtain silica, but ammonium silifluoride can be further obtained by cooling the mother liquor in which ammonium silifluoride is dissolved or concentrating as necessary. Ammonium silicofluoride with good purity can be obtained by precipitating it as white crystals and filtering it.In order to obtain even higher purity silica, the white crystals of ammonium silicofluoride obtained by the above method are It can also be purified by crystallization, etc. The recrystallization method is the usual method of dissolving it in hot water, filtering it while hot, removing the filter residue, and crystallizing the solid content from the mother liquor. At this time, crystallization of ammonium silicofluoride tends to be more effective in purifying the crystallization under acidic conditions.

得られた珪弗化アンモニムの純度は、原料粗シリカ或い
は反応条件により異なるが、通常、金属不純分が10重
量?6以下である粗シリカを用し)だ場合は、金属不純
分か100〜1000ppm以下、場合により10pp
m以下の珪弗化アンモニウムの結晶が得られる。特に、
金属不純分か1000ppm以下である粗シリカの場合
は、金属不純分がlO〜100ppm以下、場合により
1ppm以下の珪弗化アンモニウムの結晶が得られる。
The purity of the obtained ammonium silicofluoride varies depending on the crude silica raw material or the reaction conditions, but it usually contains 10% by weight of metal impurities. 6 or less), the metal impurity is 100 to 1000 ppm or less, and in some cases 10 ppm.
Ammonium silicofluoride crystals with a diameter of less than m are obtained. especially,
In the case of crude silica having a metal impurity of 1000 ppm or less, ammonium fluorosilicate crystals having a metal impurity of lO to 100 ppm or less, and in some cases 1 ppm or less can be obtained.

次に、このようにして得られた珪弗化アンモニウムを、
水性媒体中てアンモニアと反応させ、ノノカを得る。
Next, the ammonium silicofluoride obtained in this way is
React with ammonia in an aqueous medium to obtain nonoka.

珪弗化アンモニウムとアンモニアの反応は以下?反応式
で示される。
What is the reaction between ammonium silicofluoride and ammonia? It is shown by the reaction formula.

(NH4)2S i Fa+4NHz+2H20−〉S
 i O■+6 NH.F この反応の際、アンモニアは、ガスでも良いし、水溶液
を用いても良い。いずれの場合も高純度なアンモニアガ
ス、アンモニア水溶液を使用する。
(NH4)2S i Fa+4NHz+2H20-〉S
i O■+6 NH. F In this reaction, ammonia may be a gas or an aqueous solution. In either case, high purity ammonia gas or ammonia aqueous solution is used.

反応温度は特に限定されないか通常0゜C〜100゜C
、好ましくは室温〜80゜Cの範囲でである。
The reaction temperature is not particularly limited or is usually 0°C to 100°C.
, preferably within the range of room temperature to 80°C.

加圧下で行うなら100゜Cを越えても構わない。If it is carried out under pressure, the temperature may exceed 100°C.

珪弗化アンモニウムに対するアンモニアの量は、化学量
論的にはモル比4だが、通常はモル比3〜lO、好まし
くは4〜6でアンモニアか過剰の方か好ましい。アンモ
ニア成分を添加する場合は、反応系に連続または分割供
給するのか好ましい。
The amount of ammonia to ammonium silicofluoride is stoichiometrically 4, but usually the molar ratio is 3 to 10, preferably 4 to 6, and either ammonia or excess is preferred. When adding an ammonia component, it is preferable to feed it continuously or in portions to the reaction system.

その添加時間は特に限定しないが、通常5分から10時
間の範囲内て、より好ましくは10分〜5時間である。
The addition time is not particularly limited, but is usually within the range of 5 minutes to 10 hours, more preferably 10 minutes to 5 hours.

また、アンモニア成分を予め仕込んて珪弗化アンモニウ
ムを添加したり、アンモニア成分と珪弗化アンモニウム
を同時に添加する方法も可能である。アンモニアの添加
終了後に、15分から5時間熟成反応をさせても良い。
It is also possible to prepare the ammonia component in advance and add ammonium silicate, or to add the ammonia component and ammonium silicate at the same time. After the addition of ammonia is completed, an aging reaction may be carried out for 15 minutes to 5 hours.

生成したシリカは、通常行われる固液分離手段である、
ろ過、遠心分離等により分離し、洗浄、乾燥するとによ
り本発明の高純度シリカを得ることができる。この固液
分離の際に副生ずる弗化アンモニウムは、シリカを分離
した母液中に溶解しているので、この母液を、最初の工
程に循環させて使用することか好ましい。
The produced silica is separated by a conventional solid-liquid separation method.
The high-purity silica of the present invention can be obtained by separating by filtration, centrifugation, etc., washing, and drying. Since the ammonium fluoride produced as a by-product during this solid-liquid separation is dissolved in the mother liquor from which the silica is separated, it is preferable to circulate this mother liquor to the first step for use.

一方、分離したシリカのウェットケーキは、純水で洗浄
する。アンモニア等がウエットケーキに残存している場
合は、必要により酸成分を添加して洗浄し、純水で洗浄
する。この酸成分としては、塩酸、硫酸、硝酸、燐酸、
弗化水素酸、珪弗化水素酸、炭酸等の無機酸、各種有機
酸、イオン交換樹脂等が挙げられる。なかでも無機酸か
好ましい。
Meanwhile, the separated silica wet cake is washed with pure water. If ammonia or the like remains in the wet cake, add an acid component if necessary to wash it, and then wash it with pure water. This acid component includes hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid,
Examples include inorganic acids such as hydrofluoric acid, hydrofluorosilicic acid, and carbonic acid, various organic acids, and ion exchange resins. Among these, inorganic acids are preferred.

洗浄に用いる水、酸は実質的に不純分(特に金属成分)
を含有してないものを使用する。尚、酸成分による洗浄
は、シリカのウエットケーキを得る前のシリカスラリー
に酸を添加して洗浄しても良い。
The water and acid used for cleaning are substantially free of impurities (especially metal components)
Use one that does not contain. Note that cleaning with an acid component may be performed by adding an acid to the silica slurry before obtaining the silica wet cake.

洗浄後の乾燥方法は、温度50〜200℃程度の範囲で
、通常良く用いられる熱風乾燥、真空乾燥、噴霧乾燥、
気流乾燥、流動乾燥等か適用できる。必要により、20
0゜C以上での乾燥、焼成も適用できる。
Drying methods after washing include hot air drying, vacuum drying, spray drying, and
Applicable to flash drying, fluidized drying, etc. 20 as necessary
Drying and baking at 0°C or higher can also be applied.

本発明の製造方法において、粗シリカを弗化アンモニウ
ムと加熱させることにより脱アンモニア反応か進行し、
珪弗化アンモニウムか生成する。
In the production method of the present invention, a deammonification reaction proceeds by heating crude silica with ammonium fluoride,
Produces ammonium silicofluoride.

粗シリカ中の不純分は水性媒体中での珪弗化アンモニウ
ムとの溶解度差等を利用して除去され、精製珪弗化アン
モニウムを、水性媒体中てアンモニアと反応することに
より、高純度シリカを得ることかできる。得られるシリ
カの純度は、原料粗シリカ或いは反応条件により異なる
が、通常、金属不純分か10重量%以下てある粗シリカ
を用いた場合は、金属不純分か100〜1000ppm
以下、場合により10ppm以下のシリカか得られる。
Impurities in crude silica are removed by utilizing the solubility difference between ammonium silicate and ammonium fluorosilicate in an aqueous medium, and high-purity silica is produced by reacting purified ammonium silica fluoride with ammonia in an aqueous medium. You can get it. The purity of the obtained silica varies depending on the raw material crude silica or the reaction conditions, but when crude silica is used, which usually has a metal impurity content of 10% by weight or less, the metal impurity content is 100 to 1000 ppm.
Hereinafter, silica of 10 ppm or less can be obtained depending on the case.

特に、金属不純分か1000ppm以下である粗シリカ
の場合は、金属不純分か10〜100ppm以下、場合
によりippm以下のシリカか得られる。
In particular, in the case of crude silica having metal impurities of 1000 ppm or less, silica with metal impurities of 10 to 100 ppm or less, and in some cases ippm or less, can be obtained.

更に、本発明方法により、シリカの物性を改質できる効
果かある。シリカ物性の改質は、例えは粒径、粒子形状
、比表面積、強熱原料、表面シラノール基量を変えるこ
とにより高活性で分散性良好なシリカを得ることか出来
る。
Furthermore, the method of the present invention has the effect of modifying the physical properties of silica. The physical properties of silica can be modified to obtain silica with high activity and good dispersibility, for example, by changing the particle size, particle shape, specific surface area, ignition raw material, and amount of surface silanol groups.

本発明方法では、水性媒体中での珪弗化アンモニウムと
アンモニアの反応で副生ずる弗化アンモニウムを、最初
の反応の原料として再循環できるので、従来技術より原
料費及び副生物の処理費用等が削減てきる。即ち、本発
明の方法は、従来法のように高価な製造原料や反応副生
成物の処理を要せず、安価な製造原料と、副生物の循環
使用により経済的かつクリーンな工業的プロセスを提供
する。尚、前記した反応式は本発明の説明に使用したも
のてあり、本発明はこれらの反応式に限定されるもので
はない。
In the method of the present invention, ammonium fluoride, which is produced as a by-product in the reaction of ammonium fluorosilicate and ammonia in an aqueous medium, can be recycled as a raw material for the first reaction, so the cost of raw materials and the cost of processing by-products are lower than in the prior art. It can be reduced. In other words, the method of the present invention does not require the treatment of expensive production raw materials and reaction by-products as in conventional methods, and enables an economical and clean industrial process by using inexpensive production raw materials and recycling by-products. provide. The reaction formulas described above are used to explain the present invention, and the present invention is not limited to these reaction formulas.

〔実施例〕〔Example〕

以下、実施例と比較例により更に詳細に本発明を説明す
る。尚、実施例中の06は重量%を示す。
Hereinafter, the present invention will be explained in more detail with reference to Examples and Comparative Examples. Note that 06 in the examples indicates weight %.

シリカの金属不純分含量、物性は以下のようにして測定
した。
The metal impurity content and physical properties of silica were measured as follows.

fil  金属不純物含!二弗化水素酸で分解後、少量
の酸添加溶液として、ICP発光分析を行った。
fil Contains metal impurities! After decomposition with dihydrofluoric acid, a small amount of acid-added solution was subjected to ICP emission analysis.

(2)比表面積:窒素ガスによるBET法によった。(2) Specific surface area: Based on the BET method using nitrogen gas.

(3)平均粒子径:レーザー回折式粒度分布計で測定し
た。
(3) Average particle diameter: Measured using a laser diffraction particle size distribution analyzer.

(4)強熱減量:105゜C加熱乾燥品について、95
0゜Cで1時間処理した後の重量減を測定した。
(4) Ignition loss: 95 for products heated and dried at 105°C
Weight loss was measured after treatment at 0°C for 1 hour.

(5)水への分散性.IO%シリカの水スラリーを振ど
う後肉眼で観察した。
(5) Dispersibility in water. The water slurry of IO% silica was shaken and then visually observed.

水分散性か良いという事は、水に分散してすぐには沈降
しないことてあり、不可は水に直ぐ沈降することてある
Good water dispersibility means that it does not settle out immediately after being dispersed in water, whereas poor water dispersibility means that it settles immediately in water.

また、珪弗化アンモニウム中の金属不純物は、水溶液に
ついて上記(1)のICP発光分析により測定した。
Further, metal impurities in ammonium silicofluoride were measured by ICP emission spectrometry as described in (1) above for an aqueous solution.

実施例1 攪拌翼と温度計を付した1lのテフロン容器に、粗シリ
カとしてシリカ・フユーム(日本重化学社製 商品名 
SFパウダー、SiO2含量92.4%)60gと30
%弗化アンモニウム水溶液740gを添加し、120゜
Cの油洛中で加熱攪拌した。
Example 1 Silica fuyum (manufactured by Nippon Heavy Chemical Co., Ltd., trade name) was added as crude silica to a 1 liter Teflon container equipped with a stirring blade and a thermometer.
SF powder, SiO2 content 92.4%) 60g and 30
% ammonium fluoride aqueous solution was added thereto, and the mixture was heated and stirred in an oil bath at 120°C.

反応液温の上昇と共に、アンモニアを含む水分の留出か
始まり、留出液を塩酸水に吸収させながら反応液の温度
が98゜Cになるまで7時間加熱攪拌を続けた。この間
反応系外には60gのアンモニアか回収された。
As the temperature of the reaction solution rose, distillation of water containing ammonia began, and while the distillate was absorbed into hydrochloric acid water, heating and stirring were continued for 7 hours until the temperature of the reaction solution reached 98°C. During this time, 60 g of ammonia was recovered outside the reaction system.

室温放冷後、析出物をろ別乾燥し、150gを得た。こ
の固形分中の熱水可溶分を熱時ろ過してろ滓を取り除き
、母液からの再結晶により珪弗化アンモニウムの結晶5
0gを得た。
After cooling to room temperature, the precipitate was filtered and dried to obtain 150 g. The hot water soluble content in this solid content is filtered while hot to remove the filtrate, and recrystallized from the mother liquor to form crystals of ammonium silifluoride.
Obtained 0g.

二の珪弗化アンモニウム結晶36gを純水384gに溶
解し、高純度アンモニア水(日産化学社製 28%濃度
)60gを室温で添加し、30分間反応させシリカを生
成させた。これをろ過、水洗、105゜Cて乾燥するこ
とによりllgのシリカ粉を得た。
36 g of ammonium fluorosilicate crystals were dissolved in 384 g of pure water, and 60 g of high-purity ammonia water (manufactured by Nissan Chemical Co., Ltd., 28% concentration) was added at room temperature, and the mixture was allowed to react for 30 minutes to produce silica. This was filtered, washed with water, and dried at 105°C to obtain 11g of silica powder.

原料のシリカ・フユームおよび得られたシリカ粉の不純
物分析値(%)を以下に示す。
The impurity analysis values (%) of the raw material silica fume and the obtained silica powder are shown below.

A1203  Fe203 原料   1.5   3.9 生成物 <0.01  <0.01 実施例2 実施例1と同様の方法により、10I!のテフロン容器
に、粗シリカとして珪藻±(東亜化成社製商品名 トー
アライト SiO2含量77.4%)600gと24%
弗化アンモニウム水溶液7400gを添加し、120゜
Cの油浴中て反応液の温度か98゜Cになるまで9.5
時間加熱攪拌を続けた。
A1203 Fe203 Raw material 1.5 3.9 Product <0.01 <0.01 Example 2 By the same method as in Example 1, 10I! In a Teflon container, 600 g of diatom ± (trade name, Toa Kasei Co., Ltd., Toa Light, SiO2 content 77.4%) as crude silica and 24%
Add 7,400 g of ammonium fluoride aqueous solution and heat in a 120°C oil bath until the temperature of the reaction solution reaches 98°C.
Heating and stirring were continued for an hour.

この間反応系外に400gのアンモニアを回収した。熱
時ろ過により、ろ滓を取り除き、母液からの固形分を再
結晶により精製することにより珪弗化アンモニウムの1
次結晶550gを得た。更に2次結晶200gを得た。
During this time, 400 g of ammonia was collected outside the reaction system. The filtrate is removed by hot filtration, and the solid content from the mother liquor is purified by recrystallization to obtain ammonium silifluoride.
550 g of secondary crystals were obtained. Furthermore, 200 g of secondary crystals were obtained.

1次結晶360gを純水2020gに溶解し、室温で気
体アンモニア170gを3時間で導入し、シリカを生成
させた。
360 g of primary crystals were dissolved in 2020 g of pure water, and 170 g of gaseous ammonia was introduced over 3 hours at room temperature to generate silica.

得られたスラリーを加圧ろ過により母液を回収?、ケー
キは水洗、105゜Cて乾燥することにより110gの
シリカ粉を得た。
Collect the mother liquor by filtering the resulting slurry under pressure? The cake was washed with water and dried at 105°C to obtain 110 g of silica powder.

原料の珪藻土および得られたシリカ粉の不純物分析値(
%)を以下に示す。
Impurity analysis values of the raw material diatomaceous earth and the obtained silica powder (
%) is shown below.

A1203  Fe2e3CaO  MgO  Na2
0原料   1.42  1.30  0.07  0
.25  0.42生成物 <0.01  <0.1 
 <0.01  <0.01  <0.01実施例3 攪拌翼と温度計を付した2lのテフロン容器に、粗シリ
カとして珪素土(東亜化成社製 商品名トーアライト 
SiO■含量83.6%)120gと弗化アンモニウム
水溶液として、実施例2て得たシリカ生成反応スラリー
の加圧ろ過母液(弗化アンモニウム濃度 約18%)1
600gを用い、実施例1と同様の方法により珪弗化ア
ンモニウムを主成分とする結晶100gを得た。
A1203 Fe2e3CaO MgO Na2
0 raw materials 1.42 1.30 0.07 0
.. 25 0.42 Product <0.01 <0.1
<0.01 <0.01 <0.01 Example 3 Silica earth (manufactured by Toa Kasei Co., Ltd., trade name: Torlite) was added as crude silica to a 2L Teflon container equipped with a stirring blade and a thermometer.
Pressure filtration mother liquor of the silica production reaction slurry obtained in Example 2 (ammonium fluoride concentration about 18%) 1
Using 600 g, 100 g of crystals containing ammonium fluorosilicate as a main component were obtained in the same manner as in Example 1.

この結晶36gを純水に溶解し、室温でアンモニアガス
17gを25分て導入しシリカを生成させた。得られた
反応スラリーは減圧ろ過、ケーキの水洗、105゜Cて
の乾燥により純度良好なシリカ粉10gを得た。原料の
珪藻士および得られたシリカ粉の不純物分析値を以下に
示す。
36 g of this crystal was dissolved in pure water, and 17 g of ammonia gas was introduced at room temperature for 25 minutes to generate silica. The resulting reaction slurry was filtered under reduced pressure, the cake was washed with water, and dried at 105°C to obtain 10 g of silica powder with good purity. The impurity analysis values of the raw material diatom and the obtained silica powder are shown below.

A120s  FexOs   CaO  MgO原料
   1.42  1.30  0.07  0.25
生成物 <0.01  <0.1  <0.01  <
0.01実施例4 攪拌機と温度計を付した1lのテフロン容器に、粗シリ
カとして珪曹法シリカ(塩野義製薬製、商品名 カープ
レックス80  Si○2含量87.5%)65gと3
0%弗化アンモニウム水溶液735gを添加し、140
゜Cの油浴中て加熱攪拌した。
A120s FexOs CaO MgO raw material 1.42 1.30 0.07 0.25
Product <0.01 <0.1 <0.01 <
0.01 Example 4 In a 1-liter Teflon container equipped with a stirrer and a thermometer, 65 g of silica silica (manufactured by Shionogi & Co., Ltd., trade name: Carplex 80 Si○2 content 87.5%) and 3
Add 735 g of 0% ammonium fluoride aqueous solution,
The mixture was heated and stirred in an oil bath at °C.

反応液温の上昇と共に、アンモニアを含む水分の留出か
始まり、反応液の温度が98゜Cになるまで9時間加熱
攪拌を続けた。留出液の分析により反応系外に57gの
アンモニアか回収された。
As the temperature of the reaction solution increased, distillation of water containing ammonia began, and heating and stirring were continued for 9 hours until the temperature of the reaction solution reached 98°C. Analysis of the distillate revealed that 57 g of ammonia was recovered outside the reaction system.

得られた反応スラリ−264gに熱水354gを加え8
0゜Cて熱時ろ過してろ滓を取り除き、ろ液611gを
室温まで放冷し、遠心分離により湿った珪弗化アンモニ
ウムの結晶115gを得た。
Add 354 g of hot water to 264 g of the obtained reaction slurry and add 8
The filter cake was removed by filtration while hot at 0°C, 611 g of the filtrate was allowed to cool to room temperature, and 115 g of moist ammonium fluorosilicate crystals were obtained by centrifugation.

この結晶を純水565gに溶解し、25%アンモニア水
192gを室温にて添加後、30分間反応させてシリカ
を生成させた。これを、ろ過、水洗、105℃で乾燥す
ることにより36gのシリカ粉を得た。原料の粗シリカ
及び得られたシリカ粉の不純物分析値を次に示す。
The crystals were dissolved in 565 g of pure water, 192 g of 25% aqueous ammonia was added at room temperature, and the mixture was reacted for 30 minutes to produce silica. This was filtered, washed with water, and dried at 105°C to obtain 36 g of silica powder. The impurity analysis values of the raw material crude silica and the obtained silica powder are shown below.

金属不純分(ppm) AI   Fe    Ca   Na原料  143
7  146    50   2324生成物 14
.2  6.7    0.7   4.0同様の方法
で得たシリカ反応スラリーを2%硝酸を添加しpHを1
.2とし、ろ過、乾燥して得たシリカの不純分含量は、
AI, Fe. Ca. Na共に5ppm以下であっ
た。
Metal impurities (ppm) AI Fe Ca Na raw material 143
7 146 50 2324 products 14
.. 2 6.7 0.7 4.0 2% nitric acid was added to the silica reaction slurry obtained in the same manner to adjust the pH to 1.
.. 2, and the impurity content of the silica obtained by filtering and drying is:
AI, Fe. Ca. Both Na contents were 5 ppm or less.

実施例5 攪拌機と温度計を付した5lのテフロン容器に、粗シリ
カとして珪石粉(森村商事製、商品名 M20Si02
含量99.8%)60gと2 1 045弗化アンモニ
ウム水溶液2680gを添加し、140℃の油浴中て加
熱攪拌した。
Example 5 In a 5L Teflon container equipped with a stirrer and a thermometer, silica powder (manufactured by Morimura Shoji, trade name: M20Si02) was added as crude silica.
60 g (content 99.8%) and 2680 g of 21045 ammonium fluoride aqueous solution were added, and the mixture was heated and stirred in an oil bath at 140°C.

反応液温の上昇と共に、アンモニアを含む水分の留出が
始まり、反応液の温度100゜Cて6時間加熱攪拌した
。留出液の分析により反応系外に41gのアンモニアか
回収された。
As the temperature of the reaction solution increased, distillation of water containing ammonia began, and the reaction solution was heated and stirred for 6 hours at a temperature of 100°C. Analysis of the distillate revealed that 41 g of ammonia was recovered outside the reaction system.

得られた反応スラリーを室温まで放冷後、減圧ろ過し不
溶分をろ滓として取り除き(乾燥品として20g回収)
ろ液1964gを得た。この溶液に25%アンモニア水
102gを室温にて添加後、1時間反応させてシリカを
生成させた。これを、ろ過、水洗、105゜Cて乾燥す
ることにより33gのシリカ粉を得た。原料の粗シリカ
及び得られたシリカ粉の不純物分析値及び、比表面積と
平均粒子径及び強熱減量を示す。
After cooling the obtained reaction slurry to room temperature, it was filtered under reduced pressure to remove insoluble matter as a filtrate (20 g recovered as a dry product).
1964 g of filtrate was obtained. After adding 102 g of 25% ammonia water to this solution at room temperature, the mixture was reacted for 1 hour to produce silica. This was filtered, washed with water, and dried at 105°C to obtain 33 g of silica powder. The impurity analysis values, specific surface area, average particle diameter, and ignition loss of the raw material crude silica and the obtained silica powder are shown.

金属不純分(ppm) AI   Fe    Ca   Na原料   50
.8  19.9   24.7  <1.0生成物 
<10.0 <10.0   <5.0 <1.0比表
面積 平均粒子径 強熱減量 (m”/g)  (μm)    (!%)原料   
< 1    23.0    <0.2生成物  1
80    11.0    7.0実施例6 攪拌機と温度計を付した10j?のテフロン容器に、粗
シリカとして珪砂(共立窯業原料社製 商品名 MKシ
リカ Sin2含量99.8%)420gと30%弗化
アンモニウム水溶液6480g及び46%弗化水素酸3
04gを添加し、140℃の油浴中で加熱攪拌した。
Metal impurities (ppm) AI Fe Ca Na raw material 50
.. 8 19.9 24.7 <1.0 product
<10.0 <10.0 <5.0 <1.0 Specific surface area Average particle size Loss on ignition (m”/g) (μm) (!%) Raw material
< 1 23.0 < 0.2 Product 1
80 11.0 7.0 Example 6 10j with a stirrer and thermometer? In a Teflon container, 420 g of silica sand (manufactured by Kyoritsu Ceramic Materials Co., Ltd., trade name MK Silica, Sin2 content 99.8%) as crude silica, 6480 g of 30% ammonium fluoride aqueous solution, and 46% hydrofluoric acid 3 were placed in a Teflon container.
04g was added thereto, and the mixture was heated and stirred in an oil bath at 140°C.

反応液温の上昇と共に、アンモニアを含む水分の留出が
始まり、反応液の温度101℃で10時間加熱攪拌した
。留出液の分析により反応系外に272gのアンモニア
か回収された。
As the temperature of the reaction solution increased, distillation of water containing ammonia began, and the reaction solution was heated and stirred at a temperature of 101° C. for 10 hours. Analysis of the distillate revealed that 272 g of ammonia was recovered outside the reaction system.

得られた反応スラリ−4000gに熱水2000gを加
え80゜Cて熱時ろ過してろ滓68gを取り除いた。得
られたろ液5830gを室温まて放冷後析出した結晶を
ろ別し、914g(湿った状態)の珪弗化アンモニウム
を得た。この湿った結晶14gの熱風乾燥品11gはX
線回折により珪弗化アンモニウムと同定された。金属不
純分含量はAI..FeXCa1Naいずれも30pp
mJJ下であった。珪弗化アンモニウムの結晶900g
を純水2136gに溶解し、50゜Cにてアンモニアガ
スを1時間かけて312g導入しシリカを生成させた。
2000 g of hot water was added to 4000 g of the obtained reaction slurry, and filtered while hot at 80° C. to remove 68 g of filtrate. After 5830 g of the obtained filtrate was allowed to cool to room temperature, the precipitated crystals were filtered off to obtain 914 g (wet) of ammonium fluorosilicate. 11g of hot air dried product of 14g of this wet crystal is
It was identified as ammonium silicofluoride by line diffraction. The metal impurity content is AI. .. FeXCa1Na both 30pp
It was under mJJ. Ammonium silicofluoride crystals 900g
was dissolved in 2136 g of pure water, and 312 g of ammonia gas was introduced over 1 hour at 50°C to produce silica.

得られたスラリーを減圧ろ過してろ液1920gを回収
し、ろ過ケーキは水洗、希硫酸で酸洗浄、水洗、乾燥す
ることにより239gのシリカ粉を得た。原料の粗シリ
カ及び得られたシリカ粉の不純物分析値及び、物性値を
以下に示す。
The obtained slurry was filtered under reduced pressure to collect 1920 g of filtrate, and the filter cake was washed with water, acid washed with dilute sulfuric acid, washed with water, and dried to obtain 239 g of silica powder. The impurity analysis values and physical property values of the raw material crude silica and the obtained silica powder are shown below.

金属不純分(ppm)  水分散性 AI   Fe    Ca 原料   11   11    107   不可生
成物  7   5   4  良 比表面積 平均粒子径 強熱減量 (m2/g)    (μm)    (%)原料  
<1    95     <0.2生成物 48  
   14      7.2原料の珪砂では、水に直
ぐ沈降するが、本発明方法で改質したシリカは、水に分
散してすぐには沈降しなかった。
Metal impurities (ppm) Water-dispersible AI FeCa Raw material 11 11 107 Unproducts 7 5 4 Good specific surface area Average particle size Loss on ignition (m2/g) (μm) (%) Raw material
<1 95 <0.2 product 48
14 7.2 The raw material silica sand immediately precipitates in water, but the silica modified by the method of the present invention did not immediately precipitate after being dispersed in water.

また、減圧ろ過により得たろ液中のアンモニア及び弗素
成分の含量は、それぞれNH.換算て15.0%、F換
算で15.5%であった。
In addition, the contents of ammonia and fluorine components in the filtrate obtained by vacuum filtration are NH. It was 15.0% in terms of F and 15.5% in terms of F.

実施例7 攪拌機と温度計を付した1lのテフロン容器に、粗シリ
カとして珪砂(共立窯業原料社製 商品名MKシリカ 
Si02含量99.8%)60gと30%弗化アンモニ
ウム水溶液740gを添加し、140゜Cの油浴中で加
熱攪拌した。
Example 7 In a 1 liter Teflon container equipped with a stirrer and a thermometer, silica sand (manufactured by Kyoritsu Ceramic Materials Co., Ltd., trade name: MK Silica) was added as crude silica.
60 g (Si02 content: 99.8%) and 740 g of a 30% ammonium fluoride aqueous solution were added, and the mixture was heated and stirred in an oil bath at 140°C.

反応液温の上昇と共に、アンモニアを含む水分の留出か
始まり、途中純水541gを補給しつつ反応液の温度が
90〜104゜Cで18時間加熱攪拌した。留出液の分
析により反応系外に57gのアンモニアか回収された。
As the temperature of the reaction solution rose, distillation of water containing ammonia began, and while 541 g of pure water was replenished midway through, the reaction solution was heated and stirred for 18 hours at a temperature of 90 to 104°C. Analysis of the distillate revealed that 57 g of ammonia was recovered outside the reaction system.

得られた反応スラリ−273gに熱水327gを加え8
0゜Cて熱時ろ過してろ滓1 0. 2 gを取り除い
た。得られた熱溶液513gに純水487gを加え、こ
の溶液に水冷下、アンモニアガスを2時間かけて68g
導入しシリカを生成させた。これをろ過、水洗、105
゜Cて乾燥することにより50gのシリカ粉を得た。原
料の粗シリカ及び得られたシリカ粉の不純物分析値及び
、物性値を以下に示す。
327 g of hot water was added to 273 g of the obtained reaction slurry.
Filter while hot at 0°C and filter dregs 1 0. 2 g was removed. 487 g of pure water was added to 513 g of the obtained hot solution, and 68 g of ammonia gas was added to this solution over 2 hours under water cooling.
was introduced to produce silica. Filter this, wash with water, 105
By drying at °C, 50 g of silica powder was obtained. The impurity analysis values and physical property values of the raw material crude silica and the obtained silica powder are shown below.

金属不純分(ppm) AI   Fe    Ca    Na原料   1
1   11    107   4生成物  5.4
   8.1    1.0  0.3比表面積 平均
粒子径 水分散性 強熱減量(m2/g)   .  
(μm)       (%)原料  〈l   95
   不可  <0.2生成物 150     15
    良   6.8実施例8 攪拌機と温度計を付した5 0 0mfの反応器に、粗
シリカとして珪曹法シリカ(塩野義製薬社製、商品名 
カーブレックス80SiO2含量87.5a6)13g
と30%弗化アンモニウム水溶液(関東化学社製 試薬
1級弗化アンモニウム45gと純水IO2gより調製)
147g及び70%硫酸84gを水冷下混合した。混合
液の温度は22゜Cから52゜Cに上昇した。この混合
液を130゜Cの油浴中て加熱攪拌した。原料の粗シリ
カは80゜Cて全部溶解した。更に加熱を続け2時間反
応かけて留出成分を100gの純水中に吸収させながら
反応液を濃縮すると結晶か析出した。これを室温まで冷
却し、濃縮スラリ−150gを得た。留出成分の吸収液
量は192gとなり、該液のpHは3〜4、弗素成分は
F換算でll7ppmで、25%アンモニア水を加えて
もシリカは生成しなかった。濃縮スラリー中の結晶を減
圧ろ過して湿った結晶分69gを得た。これを熱水を用
いて再結晶精製して、湿った状態で、珪弗化アンモニウ
ム30gを得た。105゜Cで一夜乾燥し、乾燥品25
gを得た。この乾燥品を純水102gに溶解し、水冷下
30分間かけて25%アンモニア水97gを添加しシリ
カを生成させた。これを減圧ろ過、純水で洗浄し、得ら
れたシリカケーキを105゜Cて加熱乾燥し、シリカ粉
末8gを得た。得られたシリカ粉の不純物分析値は、A
 I,Fe,Ca,Naいずれも10ppm以下てあっ
た。
Metal impurities (ppm) AI Fe Ca Na raw material 1
1 11 107 4 products 5.4
8.1 1.0 0.3 Specific surface area Average particle size Water dispersibility Loss on ignition (m2/g) .
(μm) (%) Raw material <l 95
Not possible <0.2 product 150 15
Good 6.8 Example 8 In a 500 mf reactor equipped with a stirrer and a thermometer, silica silica (manufactured by Shionogi & Co., trade name:
Carbrex 80SiO2 content 87.5a6) 13g
and 30% ammonium fluoride aqueous solution (prepared from 45 g of reagent primary ammonium fluoride manufactured by Kanto Kagaku Co., Ltd. and 2 g of pure water IO)
147 g and 84 g of 70% sulfuric acid were mixed under water cooling. The temperature of the mixture rose from 22°C to 52°C. This mixed solution was heated and stirred in an oil bath at 130°C. The crude silica as a raw material was completely dissolved at 80°C. Heating was continued for 2 hours, and the reaction solution was concentrated while the distillate components were absorbed into 100 g of pure water, and crystals were precipitated. This was cooled to room temperature to obtain 150 g of concentrated slurry. The amount of absorbed liquid of the distillate component was 192 g, the pH of the liquid was 3 to 4, the fluorine component was 7 ppm in terms of F, and no silica was produced even when 25% aqueous ammonia was added. The crystals in the concentrated slurry were filtered under reduced pressure to obtain 69 g of wet crystals. This was purified by recrystallization using hot water to obtain 30 g of ammonium fluorosilicate in a wet state. Dry overnight at 105°C, dry product 25
I got g. This dried product was dissolved in 102 g of pure water, and 97 g of 25% ammonia water was added over 30 minutes under water cooling to generate silica. This was filtered under reduced pressure and washed with pure water, and the obtained silica cake was dried by heating at 105°C to obtain 8 g of silica powder. The impurity analysis value of the obtained silica powder is A
I, Fe, Ca, and Na were all 10 ppm or less.

実施例9 攪拌機と温度計を付した1lのテフロン容器に、酸性弗
化アンモニウム(関東化学社製 試薬特級)127g,
純水319g,46%弗化水素酸87gを加え、NH.
換算で37.9g(7.1重量%) F換算で122.
7g(23.0重量%)を含有する溶液を調製した。
Example 9 In a 1 liter Teflon container equipped with a stirrer and a thermometer, 127 g of acidic ammonium fluoride (reagent special grade, manufactured by Kanto Kagaku Co., Ltd.),
Add 319 g of pure water and 87 g of 46% hydrofluoric acid, and add NH.
37.9g (7.1% by weight) in terms of F. 122.
A solution containing 7g (23.0% by weight) was prepared.

この溶液に粗シリカとして珪砂(共立窯業原料社製 商
品名 MKシリカ SiO2含量99.8%)60gを
室温で添加した。(発熱は認められなかった。)この混
合スラリー溶液を油浴中て1時間72〜84°Cに加熱
した。この反応物を75゜Cて、熱時ろ過し、湿ったろ
滓として55gを回収した。ろ液は室温まで放冷し、析
出した結晶を減圧ろ過し、珪弗化アンモニウムの湿った
結晶75gを得た。この湿った結晶を105゜Cて乾燥
した後X線回折により珪弗化アンモニウムと同定した。
To this solution, 60 g of silica sand (manufactured by Kyoritsu Ceramic Materials Co., Ltd., trade name: MK Silica, SiO2 content 99.8%) was added as crude silica at room temperature. (No exotherm was observed.) The mixed slurry solution was heated to 72-84°C in an oil bath for 1 hour. The reaction was filtered hot at 75° C. and 55 g was collected as a wet filter cake. The filtrate was allowed to cool to room temperature, and the precipitated crystals were filtered under reduced pressure to obtain 75 g of wet crystals of ammonium fluorosilicate. After drying the wet crystals at 105°C, they were identified as ammonium fluorosilicate by X-ray diffraction.

また、金属不純分を分析したところ、10ppm以下て
あった。
Further, when metal impurities were analyzed, they were found to be 10 ppm or less.

得られた結晶45gを水に溶解し、10%水溶液とし、
これに25%アンモニア水170gを室温にてlO分間
で添加、更に10分間反応させシリカを生成させた。こ
れを減圧ろ過、水洗、105℃で乾燥し1次シリカ粉末
15gを得た。原料の粗シリカ及び得られたシリカ粉の
不純物分析値及び物性値を以下に示す。
45 g of the obtained crystals were dissolved in water to make a 10% aqueous solution,
To this was added 170 g of 25% aqueous ammonia at room temperature over 10 minutes, and the mixture was allowed to react for an additional 10 minutes to produce silica. This was filtered under reduced pressure, washed with water, and dried at 105°C to obtain 15 g of primary silica powder. The impurity analysis values and physical property values of the raw material crude silica and the obtained silica powder are shown below.

金属不純分(ppm) A120+  Fe20*   CaO  NaO原料
  11    11    107   4生成物 
 1.0   3.0   2.10.3比表面積 平
均粒子径 水分散性 強熱減量(m2/g)    (
μm)       (%)原料  〈l   95 
  不可  <0.2生成物 185     14.
5   良    7.2また、ろ滓を200gの純水
で洗浄した溶液からも純度良好なシリカ14gか回収さ
れた。
Metal impurities (ppm) A120+ Fe20* CaO NaO raw material 11 11 107 4 products
1.0 3.0 2.10.3 Specific surface area Average particle size Water dispersibility Loss on ignition (m2/g) (
μm) (%) Raw material <l 95
Not allowed <0.2 product 185 14.
5 Good 7.2 Furthermore, 14 g of silica with good purity was recovered from the solution obtained by washing the filter cake with 200 g of pure water.

実施例10 実施例6て回収したシリカ合成時の減圧ろ過して得だろ
液1500g(NH3換算15.0重量%F換算15.
5重量%、弗化アンモニウム約3096の溶液)を陽イ
オン交換樹脂(オルガノ社製 商品名 アンバーライト
120B)を用いて脱アンモニアし、lO%の弗化水素
酸溶液として120?gを得た。
Example 10 1500 g of the filtrate obtained by vacuum filtration during silica synthesis recovered in Example 6 (15.0% by weight in terms of NH3, 15% in terms of F)
A 5% by weight solution of ammonium fluoride (approximately 3096%) was deammoniated using a cation exchange resin (trade name Amberlite 120B, manufactured by Organo), and a 10% solution of ammonium fluoride was prepared as a 10% hydrofluoric acid solution. I got g.

このlO%弗化水素酸溶液800gと、実施例6で回収
した減圧ろ液(弗化アンモニウム約30%の溶液)24
7gを攪拌機と温度計を付した10lのテフロン容器に
仕込み、粗シリカとして珪石粉(森村商事製 商品名 
M−20  3iO■含量99.8%)60gを室温で
添加した。室温では発熱が認められなかった。これを油
浴中て1時間80〜95゜Cで加熱攪拌した。得られた
反応スラリーを80゜Cて熱時ろ過し、ろ滓を取り除い
た(乾燥後重量9g)回収した。ろ液は室温まて放冷後
、析出した結晶を減圧ろ過し、105゜Cて乾燥し珪弗
化アンモニウムを主成分とする結晶90gを得た。
800 g of this 1O% hydrofluoric acid solution and the vacuum filtrate (approximately 30% ammonium fluoride solution) collected in Example 6 24
7g was placed in a 10L Teflon container equipped with a stirrer and a thermometer, and silica powder (trade name, manufactured by Morimura Shoji Co., Ltd.) was used as the crude silica.
60 g of M-20 (3iO■ content 99.8%) was added at room temperature. No fever was observed at room temperature. This was heated and stirred at 80-95°C for 1 hour in an oil bath. The resulting reaction slurry was filtered while hot at 80°C, and the filter residue was removed (9 g in weight after drying) and collected. After the filtrate was allowed to cool to room temperature, the precipitated crystals were filtered under reduced pressure and dried at 105°C to obtain 90 g of crystals containing ammonium fluorosilicate as the main component.

得られた結晶45gを純水355gに溶解し、これに水
冷下アンモニアガス34gを1時間かけて導入し、シリ
カを生成させた。これをろ過、水洗、105゜Cて乾燥
しシリカ粉末14gを得た。
45 g of the obtained crystals were dissolved in 355 g of pure water, and 34 g of ammonia gas was introduced thereto over 1 hour while cooling with water to generate silica. This was filtered, washed with water, and dried at 105°C to obtain 14 g of silica powder.

原料の粗シリカの不純物分析値はAC Fe,Ca,N
aいずれも5ppm以下てあった。
The impurity analysis values of raw material crude silica are AC Fe, Ca, N
a All of them were below 5 ppm.

実施例11 攪拌機と温度計を付した1lのテフロン容器に、粗シリ
カとして珪砂(共立窯業原料社製 商品名MKシリカ 
S i0 2含量99.8%)26gと実施例6て回収
した減圧ろ液(30%弗化アンモニウム水溶液に相当す
る組成)397gと8%珪弗化水素酸129gを添加し
(橋本化成社製 40%試薬より調製)、140″Cの
油浴中て加熱攪拌した。
Example 11 In a 1 liter Teflon container equipped with a stirrer and a thermometer, silica sand (manufactured by Kyoritsu Ceramic Materials Co., Ltd., trade name: MK Silica) was added as crude silica.
26 g of S i0 2 content 99.8%), 397 g of the vacuum filtrate collected in Example 6 (composition equivalent to 30% ammonium fluoride aqueous solution) and 129 g of 8% hydrosilicofluoride acid (manufactured by Hashimoto Kasei Co., Ltd.) were added. (prepared from 40% reagent) and heated and stirred in an oil bath at 140''C.

反応液温の上昇と共に、アンモニアを含む水分の留出か
始まり、反応液の温度95〜101゜Cて8時間加熱攪
拌した。留出液の分析により反応系外に1 3. 5 
gのアンモニアか回収された。
As the temperature of the reaction solution increased, distillation of water containing ammonia began, and the reaction solution was heated and stirred for 8 hours at a temperature of 95 to 101°C. By analyzing the distillate, 1 3. was removed from the reaction system. 5
g of ammonia was recovered.

得られた反応スラリ−266gを実施例6と同様に処理
しシリカ粉9gを得た。原料粗シリカの不純分及び物性
値は実施例6と同してあり、得られたシリカの金属不純
分,l、Fe,Caはいずれも10ppm以下で、比表
面積60m2/g、平均粒子径13μm、強熱減量7.
 0%であった。
266 g of the obtained reaction slurry was treated in the same manner as in Example 6 to obtain 9 g of silica powder. The impurities and physical properties of the raw material crude silica are the same as in Example 6, and the metal impurities, l, Fe, and Ca of the obtained silica are all 10 ppm or less, the specific surface area is 60 m2/g, and the average particle size is 13 μm. , ignition loss7.
It was 0%.

実施例12 攪拌機と温度計を付した0.51のテフロン容器に、粗
シリカとして珪砂(共立窯業原料社製 商品名 MKシ
リカ Si02含量99.8%)30gと30%弗化ア
ンモニウム水溶液463gを添加し、油浴で加熱しつつ
ハンディーアスピレー夕で反応系を減圧にした。
Example 12 In a 0.51 Teflon container equipped with a stirrer and a thermometer, 30 g of silica sand (manufactured by Kyoritsu Ceramic Materials Co., Ltd., trade name: MK Silica, Si02 content 99.8%) as crude silica and 463 g of a 30% ammonium fluoride aqueous solution were added. Then, while heating in an oil bath, the pressure of the reaction system was reduced using a handy aspirator.

反応液温80゜C、絶対圧32 0mmHgで液の沸騰
か始まり、冷却器を通して系外へ留出液として回収し、
更に10%硫酸にてガス成分を捕集し液温77〜82゜
Cて4時間加熱濃縮し、NH2として17gを含有する
留出液279gを回収した。反応スラリーは206g得
られ、これに純水294gを加えて60゜Cて熱時ろ過
し、未反応シリカ及び不溶性不純分をろ別した。
The reaction liquid temperature was 80°C and the absolute pressure was 320 mmHg, and the liquid began to boil, and was collected as a distillate from the system through a cooler.
Further, gas components were collected with 10% sulfuric acid, and the mixture was heated and concentrated at a liquid temperature of 77 to 82°C for 4 hours to recover 279 g of a distillate containing 17 g of NH2. 206g of reaction slurry was obtained, to which 294g of pure water was added and filtered while hot at 60°C to filter out unreacted silica and insoluble impurities.

得られたろ液478gに50゜Cて25%アンモニア水
170gを30分かけて添加し、シリカを生成させた。
170 g of 25% ammonia water was added to 478 g of the obtained filtrate at 50° C. over 30 minutes to generate silica.

生成スラリーはろ過、水洗し、105゜Cて乾燥後シリ
カ粉末14gを得た。得られたシリカの金属不純分は、
原料シリカより良好てあり、 比表面積反応35m2 /g、 平均粒子径1 4 μmであり、 原料珪砂の物性とは異なるシリカが 得られた。
The resulting slurry was filtered, washed with water, and dried at 105°C to obtain 14 g of silica powder. The metal impurities of the obtained silica are
The obtained silica had better physical properties than the raw material silica, with a specific surface area reaction of 35 m2/g and an average particle size of 14 μm, which were different from those of the raw material silica sand.

Claims (16)

【特許請求の範囲】[Claims] (1)粗シリカと弗化アンモニウム及び/又は酸性弗化
アンモニウムを水性媒体中で反応させて珪弗化アンモニ
ウムを得、該反応混合物中の珪弗化アンモニウム溶液と
未反応シリカ及び不純分を固液分離後、珪弗化アンモニ
ウムを水性媒体中で、アンモニアと反応させシリカを生
成させることを特徴とする高純度シリカの製造方法。
(1) Ammonium fluorosilicate is obtained by reacting crude silica with ammonium fluoride and/or acidic ammonium fluoride in an aqueous medium, and the ammonium fluorosilicate solution, unreacted silica, and impurities in the reaction mixture are solidified. A method for producing high-purity silica, which comprises, after liquid separation, reacting ammonium silicofluoride with ammonia in an aqueous medium to produce silica.
(2)粗シリカと弗化アンモニウム及び/又は酸性弗化
アンモニウムを水性媒体中で50℃以上の温度で反応さ
せる請求項1記載の高純度シリカの製造方法。
(2) The method for producing high-purity silica according to claim 1, wherein crude silica and ammonium fluoride and/or acidic ammonium fluoride are reacted in an aqueous medium at a temperature of 50° C. or higher.
(3)反応混合物中の珪弗化アンモニウムと未反応シリ
カ及び不純分の分離が珪弗化アンモニウムを水性媒体に
溶解した状態で、固液分離した後、珪弗化アンモニウム
を析出させ分離する請求項1記載の高純度シリカの製造
方法。
(3) A claim in which ammonium silifluoride, unreacted silica, and impurities in the reaction mixture are separated by solid-liquid separation in a state in which ammonium fluorosilicate is dissolved in an aqueous medium, and then ammonium fluorosilicate is precipitated and separated. Item 1. The method for producing high-purity silica according to item 1.
(4)反応混合物中の珪弗化アンモニウムと未反応シリ
カ及び不純分の分離が珪弗化アンモニウムを水性媒体に
溶解した状態で、固液分離した後、珪弗化アンモニウム
を析出させ分離し、再結晶する請求項1記載の高純度シ
リカの製造方法。
(4) Separation of ammonium silifluoride from unreacted silica and impurities in the reaction mixture is performed by solid-liquid separation in a state where ammonium silifluoride is dissolved in an aqueous medium, and then ammonium silifluoride is precipitated and separated; The method for producing high-purity silica according to claim 1, which comprises recrystallizing.
(5)酸性弗化アンモニウム又は酸性弗化アンモニウム
と弗化アンモニウムの混合物が、弗化アンモニウムを陽
イオン交換樹脂で脱アンモニア反応させて得たものであ
る請求項1記載の高純度シリカの製造方法。
(5) The method for producing high-purity silica according to claim 1, wherein the acidic ammonium fluoride or the mixture of acidic ammonium fluoride and ammonium fluoride is obtained by deammonizing ammonium fluoride with a cation exchange resin. .
(6)生成したシリカのスラリーまたは、該スラリーよ
り得たシリカケーキに酸成分を添加し、金属不純分及び
アンモニア成分を除去する請求項1記載の高純度シリカ
の製造方法。
(6) The method for producing high-purity silica according to claim 1, wherein an acid component is added to the produced silica slurry or a silica cake obtained from the slurry to remove metal impurities and ammonia components.
(7)珪弗化アンモニウムとアンモニアを反応させてシ
リカを得る際に生成する弗化アンモニウムを水性媒体中
で粗シリカと弗化アンモニウムを反応させる工程に循環
する請求項1記載の高純度シリカの製造方法。
(7) The high-purity silica according to claim 1, wherein the ammonium fluoride produced when silica is obtained by reacting ammonium silicofluoride with ammonia is recycled to the step of reacting crude silica and ammonium fluoride in an aqueous medium. Production method.
(8)粗シリカと弗化アンモニウム及び/又は酸性弗化
アンモニウムと酸成分とを水性媒体中で反応させて珪弗
化アンモニウムを得、該反応混合物中の珪弗化アンモニ
ウム溶液と未反応シリカ及び不純分を固液分離後、珪弗
化アンモニウムを水性媒体中で、アンモニアと反応させ
シリカを生成させることを特徴とする高純度シリカの製
造方法。
(8) Ammonium silicofluoride is obtained by reacting crude silica and ammonium fluoride and/or acidic ammonium fluoride and an acid component in an aqueous medium, and the ammonium silicofluoride solution in the reaction mixture and unreacted silica and A method for producing high-purity silica, which comprises, after solid-liquid separation of impurities, reacting ammonium silicofluoride with ammonia in an aqueous medium to produce silica.
(9)酸成分が弗化水素、弗化水素酸、珪弗化水素、珪
弗化水素酸、硫酸及び陽イオン交換樹脂より選ばれた少
なくとも1種のものである請求項8記載の高純度シリカ
の製造方法。
(9) High purity according to claim 8, wherein the acid component is at least one selected from hydrogen fluoride, hydrofluoric acid, hydrogen silicofluoride, hydrosilicic acid, sulfuric acid, and cation exchange resin. Method for producing silica.
(10)酸成分が弗化アンモニウム及び/又は酸性弗化
アンモニウム水溶液を陽イオン交換樹脂で脱アンモニア
して得た水溶液である請求項8記載の高純度シリカの製
造方法。
(10) The method for producing high-purity silica according to claim 8, wherein the acid component is an aqueous solution obtained by deammonizing ammonium fluoride and/or an acidic ammonium fluoride aqueous solution with a cation exchange resin.
(11)反応混合物中の珪弗化アンモニウムと未反応シ
リカ及び不純分の分離が珪弗化アンモニウムを水性媒体
に溶解した状態で、固液分離した後、珪弗化アンモニウ
ムを析出させ分離する請求項8記載の高純度シリカの製
造方法。
(11) A claim in which ammonium silifluoride, unreacted silica, and impurities in the reaction mixture are separated by solid-liquid separation in a state in which ammonium fluorosilicate is dissolved in an aqueous medium, and then ammonium fluorosilicate is precipitated and separated. Item 8. The method for producing high-purity silica according to item 8.
(12)反応混合物中の珪弗化アンモニウムと未反応シ
リカ及び不純分の分離が珪弗化アンモニウムを水性媒体
に溶解した状態で、固液分離した後、珪弗化アンモニウ
ムを析出させ分離し、再結晶する請求項8記載の高純度
シリカの製造方法。
(12) Separation of ammonium silifluoride from unreacted silica and impurities in the reaction mixture is performed by solid-liquid separation in a state where ammonium silifluoride is dissolved in an aqueous medium, and then ammonium silifluoride is precipitated and separated; The method for producing high-purity silica according to claim 8, which comprises recrystallizing.
(13)酸性弗化アンモニウム又は酸性弗化アンモニウ
ムと弗化アンモニウムの混合物が、弗化アンモニウムを
陽イオン交換樹脂で脱アンモニア反応させて得たもので
ある請求項8記載の高純度シリカの製造方法。
(13) The method for producing high-purity silica according to claim 8, wherein the acidic ammonium fluoride or the mixture of acidic ammonium fluoride and ammonium fluoride is obtained by deammonizing ammonium fluoride with a cation exchange resin. .
(14)生成したシリカのスラリーまたは、該スラリー
より得たシリカケーキに酸成分を添加し、金属不純分及
びアンモニア成分を除去する請求項8記載の高純度シリ
カの製造方法。
(14) The method for producing high-purity silica according to claim 8, wherein an acid component is added to the produced silica slurry or a silica cake obtained from the slurry to remove metal impurities and ammonia components.
(15)珪弗化アンモニウムとアンモニアを反応させて
シリカを得る際に生成する弗化アンモニウムを水性媒体
中で粗シリカと弗化アンモニウムを反応させる工程に循
環する請求項8記載の高純度シリカの製造方法。
(15) The high-purity silica according to claim 8, wherein ammonium fluoride produced when silica is obtained by reacting ammonium silicofluoride and ammonia is recycled to the step of reacting crude silica and ammonium fluoride in an aqueous medium. Production method.
(16)粗シリカと弗化アンモニウム及び/又は酸性弗
化アンモニウムを水性媒体中で反応させて珪弗化アンモ
ニウムを得、該反応混合物中の珪弗化アンモニウム溶液
と未反応シリカ及び不純分を固液分離することを特徴と
する高純度珪弗化アンモニウムの製造方法。(17)粗
シリカと弗化アンモニウム及び/又は酸性弗化アンモニ
ウムと酸成分とを水性媒体中で反応させて珪弗化アンモ
ニウムを得、該反応混合物中の珪弗化アンモニウムと未
反応シリカ及び不純分を固液分離することを特徴とする
高純度珪弗化アンモニウムの製造方法。
(16) Ammonium fluorosilicate is obtained by reacting crude silica with ammonium fluoride and/or acidic ammonium fluoride in an aqueous medium, and the ammonium fluorosilicate solution, unreacted silica, and impurities in the reaction mixture are solidified. A method for producing high-purity ammonium silicofluoride, which is characterized by liquid separation. (17) Ammonium silicofluoride is obtained by reacting crude silica and ammonium fluoride and/or acidic ammonium fluoride and an acid component in an aqueous medium, and the ammonium silicofluoride in the reaction mixture is combined with unreacted silica and impurities. A method for producing high-purity ammonium silicofluoride, characterized by solid-liquid separation of the components.
JP31007590A 1989-11-16 1990-11-15 Production of high purity silica and ammonium fluorosilicate Pending JPH03218914A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31007590A JPH03218914A (en) 1989-11-16 1990-11-15 Production of high purity silica and ammonium fluorosilicate

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP1-298443 1989-11-16
JP29844389 1989-11-16
JP31007590A JPH03218914A (en) 1989-11-16 1990-11-15 Production of high purity silica and ammonium fluorosilicate

Publications (1)

Publication Number Publication Date
JPH03218914A true JPH03218914A (en) 1991-09-26

Family

ID=26561523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31007590A Pending JPH03218914A (en) 1989-11-16 1990-11-15 Production of high purity silica and ammonium fluorosilicate

Country Status (1)

Country Link
JP (1) JPH03218914A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011241113A (en) * 2010-05-18 2011-12-01 Taiheiyo Cement Corp Method for producing high purity silica
JP2012193074A (en) * 2011-03-16 2012-10-11 Seiko Epson Corp Separation method and separation apparatus
JP2012201554A (en) * 2011-03-25 2012-10-22 Seiko Epson Corp Method and apparatus for separation

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011241113A (en) * 2010-05-18 2011-12-01 Taiheiyo Cement Corp Method for producing high purity silica
JP2012193074A (en) * 2011-03-16 2012-10-11 Seiko Epson Corp Separation method and separation apparatus
JP2012201554A (en) * 2011-03-25 2012-10-22 Seiko Epson Corp Method and apparatus for separation

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