JPH03219095A - Plating method for rare earth-barium-copper alloy - Google Patents
Plating method for rare earth-barium-copper alloyInfo
- Publication number
- JPH03219095A JPH03219095A JP1264790A JP1264790A JPH03219095A JP H03219095 A JPH03219095 A JP H03219095A JP 1264790 A JP1264790 A JP 1264790A JP 1264790 A JP1264790 A JP 1264790A JP H03219095 A JPH03219095 A JP H03219095A
- Authority
- JP
- Japan
- Prior art keywords
- rare earth
- barium
- pyridine
- halides
- dimethyl sulfoxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 title claims abstract description 15
- 229910000881 Cu alloy Inorganic materials 0.000 title claims abstract description 9
- 238000000034 method Methods 0.000 title claims description 10
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims abstract description 28
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052788 barium Inorganic materials 0.000 claims abstract description 15
- 239000010949 copper Substances 0.000 claims abstract description 14
- 229910052802 copper Inorganic materials 0.000 claims abstract description 13
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 11
- HPYNZHMRTTWQTB-UHFFFAOYSA-N dimethylpyridine Natural products CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 8
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims abstract description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 5
- -1 rare earth halides Chemical class 0.000 claims description 11
- 239000012046 mixed solvent Substances 0.000 claims description 3
- 239000002904 solvent Substances 0.000 abstract description 8
- 150000002910 rare earth metals Chemical class 0.000 abstract description 7
- 239000002243 precursor Substances 0.000 abstract description 4
- 239000003792 electrolyte Substances 0.000 abstract description 3
- 150000004820 halides Chemical class 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- XVMSFILGAMDHEY-UHFFFAOYSA-N 6-(4-aminophenyl)sulfonylpyridin-3-amine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=N1 XVMSFILGAMDHEY-UHFFFAOYSA-N 0.000 abstract 1
- 239000002244 precipitate Substances 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 150000002739 metals Chemical class 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 239000008151 electrolyte solution Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000001637 plasma atomic emission spectroscopy Methods 0.000 description 3
- 229910052727 yttrium Inorganic materials 0.000 description 3
- 229910052769 Ytterbium Inorganic materials 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910000600 Ba alloy Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910001638 barium iodide Inorganic materials 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910000982 rare earth metal group alloy Inorganic materials 0.000 description 1
- 238000007614 solvation Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- CKLHRQNQYIJFFX-UHFFFAOYSA-K ytterbium(III) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Yb+3] CKLHRQNQYIJFFX-UHFFFAOYSA-K 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は希土類−バリウム−銅合金めっきを生成させる
方法に関し、特に適切な熱処理を施すことによって酸化
物高温超伝導物質RBa2Cu30、、(R−希土類)
の膜を得るための前駆体となり得る合金膜を生成させる
方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for producing rare earth-barium-copper alloy plating. rare earth)
The present invention relates to a method for producing an alloy film that can be used as a precursor for obtaining a film.
高温超伝導物質の薄膜あるいは、厚膜の形成法としては
、蒸着法、スパッタリング法、CVD法、塗布法、溶射
法、電気泳動法、分散複合めっき法等、様々な方法が試
みられている。Various methods have been tried to form thin or thick films of high-temperature superconducting materials, including vapor deposition, sputtering, CVD, coating, thermal spraying, electrophoresis, and dispersion composite plating.
高温超伝導物質の膜形成法として従来より試みられてい
る方法は、いずれも一長一短があり、現状ではまだ開発
途上にあると言える。例えば蒸着法やスパッタリング法
については良好な特性の超伝導膜が得られたとの報告が
多くなされているが、これらの方法には高価な装置を必
要とし、また膜の形成速度が遅いといった問題点を有し
ていた。All of the methods that have been tried to form films of high-temperature superconducting materials have their advantages and disadvantages, and it can be said that they are still in the development stage at present. For example, there are many reports that superconducting films with good characteristics can be obtained using vapor deposition and sputtering methods, but these methods require expensive equipment and have problems such as slow film formation speed. It had
本発明は上記技術水準に鑑み、合金めっき法により高価
な装置を必要としないで、高温超伝導物質ともなり得る
均一な希土類−バリウム銅合金膜を得る方法を提供しよ
うとするものである。In view of the above-mentioned state of the art, the present invention seeks to provide a method for obtaining a uniform rare earth-barium copper alloy film, which can also be a high-temperature superconducting material, using an alloy plating method without requiring expensive equipment.
希土類金属、バリウム及び銅の非晶質合金が高温超伝導
物質の前駆体となり得ることは既に公知であり、これら
金属の融液を混合した後、急冷して得た合金を適切な条
件で熱処理した結果、90に付近の温度で超伝導を示し
たという報告がいくつかなされている。(例えば、G、
J。It is already known that amorphous alloys of rare earth metals, barium, and copper can serve as precursors for high-temperature superconducting materials, and after mixing melts of these metals, the alloy obtained by rapid cooling is heat-treated under appropriate conditions. As a result, there have been several reports showing superconductivity at temperatures around 90°C. (For example, G,
J.
Yurek 、 J、B、Vander 5ande
、 iv、−X、Wang 、 D、A。Yurek, J., B., Vander 5ande.
,iv,-X,Wang, D.A.
Rudman 、 Y、Xhang 、 and M、
M、Matthiesen ;MBTALLIIRGI
CAL TRANSACTIONS A 、 Vol、
18A 。Rudman, Y., Xhang, and M.
M, Matthiesen ;MBTALLIIRGI
CAL TRANSACTIONS A, Vol.
18A.
p、 1813〜1817)
合金めっき法によれば、こうした前駆体を安価な装置で
膜として得ることができ、膜の形成速度が速く、またあ
る程度複雑な形状の母材の上にも均一な膜を形成させ易
いと考えられる。p., 1813-1817) According to the alloy plating method, such a precursor can be obtained as a film using inexpensive equipment, the film formation speed is fast, and a uniform film can be formed even on a base material with a somewhat complex shape. It is thought that it is easy to form.
ここで、希土類金属やバリウムは水溶液からのめっきが
不可能な金属として知られている。Here, rare earth metals and barium are known as metals that cannot be plated from an aqueous solution.
このような金属をめっきしようとする場合、めっき液の
溶媒として水の代わりに有機溶媒を用いるのは一般によ
く試みられる方法であるが、この際、用いる有機溶媒の
選定はめっきの可否を決定する重要な要素の一つである
。特に合金めっきの場合には目的とする成分金属の塩を
共通に溶解させ、かつ、目的とする成分金属のイオンが
いずれも同一の電解条件の下で陰極上に金属として還元
される必要があることから適切な溶媒の選定には困難が
伴う。When attempting to plate such metals, it is generally a common practice to use an organic solvent instead of water as the solvent for the plating solution, but in this case, the selection of the organic solvent used determines whether or not plating is possible. This is one of the important factors. In particular, in the case of alloy plating, it is necessary to commonly dissolve the salts of the target component metals, and to reduce the ions of the target component metals as metals on the cathode under the same electrolytic conditions. Therefore, it is difficult to select an appropriate solvent.
本発明者は希土類−バリウム−銅合金をめっきにより生
成させるに当っての溶媒の選択について鋭意研究の結果
、溶媒としてジメチルスルホキシドとピリジンの混合物
が希土類、バリウム及び銅のハロゲン化物をよく溶解し
、電解によって、陰極上に希土類、バリウム及び銅を含
む合金めっき層を生成することを発見した。As a result of extensive research into the selection of solvents for producing rare earth-barium-copper alloys by plating, the present inventor found that a mixture of dimethyl sulfoxide and pyridine dissolves rare earth, barium, and copper halides well. It was discovered that an alloy plating layer containing rare earths, barium, and copper is formed on the cathode by electrolysis.
本発明は上記知見に基いて完成されたものであって、ジ
メチルスルホキシドとピリジンを混合した溶媒中に、希
土類のハロゲン化物、バリウムのハロゲン化物及び銅の
ハロゲン化物を溶解させた液を用いて電解を行い、陰極
上に希土類、バリウム及び銅を含むめっき層を形成させ
る方法である。The present invention was completed based on the above knowledge, and electrolysis is carried out using a solution in which rare earth halides, barium halides, and copper halides are dissolved in a mixed solvent of dimethyl sulfoxide and pyridine. In this method, a plating layer containing rare earth elements, barium, and copper is formed on the cathode.
希土類としてはイツトリウム(Y)、イッテルビウム(
Yb)などが用いられるが、特にこれらのものに限定さ
れるものではない。Rare earths include yttrium (Y) and ytterbium (
Yb) and the like are used, but are not particularly limited to these.
また、各金属のハロゲン化物としては塩化物、ヨウ化物
などが用いられるが、これまた、これらのものに限定さ
れるものではない。Further, as the halides of each metal, chlorides, iodides, etc. are used, but these are also not limited to these.
更に、また本発明において使用する溶媒はジメチルスル
ホキシドとピリジンの混合液であるが、これに少量の水
が存在していてもさしつかえない。Furthermore, although the solvent used in the present invention is a mixture of dimethyl sulfoxide and pyridine, a small amount of water may also be present.
ジメチルスルホキシドは希土類のハロゲン化物、バリウ
ムのハロゲン化物及び銅のハロゲン化物を共通に溶解さ
せることのできる溶媒である。例えば、ジメチルスルホ
キシドに、YCI、 。Dimethyl sulfoxide is a solvent that can commonly dissolve rare earth halides, barium halides, and copper halides. For example, dimethyl sulfoxide, YCI.
BaC1z及びCLICI2を溶解させた液は黄色を呈
し、YCI3. Ba12及び[:uCI□を溶解させ
た液は褐色を呈する。しかしながら、これらの液を電解
した場合は、陰極上に絶縁性の皮膜を生じて電流を流す
ことが困難になり、めっきを成長させることができない
ことが判明した。The solution in which BaC1z and CLICI2 were dissolved had a yellow color, and YCI3. The solution in which Ba12 and [:uCI□ were dissolved has a brown color. However, it has been found that when these solutions are electrolyzed, an insulating film is formed on the cathode, making it difficult to pass current and making it impossible to grow plating.
ここで、この液にピリジンを加えると金属イオンの溶媒
和状態が変化して、液は緑色がかった色調となり、この
ジメチルスルホキシドとピリジンの混合溶媒を用いると
、定電流電解により陰極上に合金めっき層を形成させる
ことが可能になる。また、合金組成は液中の金属塩の組
成と電解条件(電流密度及び液温)を変えることによっ
て調整できる。When pyridine is added to this solution, the solvation state of the metal ions changes, giving the solution a greenish color.If this mixed solvent of dimethyl sulfoxide and pyridine is used, alloy plating can be achieved on the cathode by constant current electrolysis. It becomes possible to form layers. Further, the alloy composition can be adjusted by changing the composition of the metal salt in the liquid and the electrolytic conditions (current density and liquid temperature).
なお、ピリジンの量が多いと沈殿を生じるので、ピリジ
ンを加える際は沈殿を生じない程度の量にする必要があ
る。Note that if the amount of pyridine is too large, precipitation will occur, so when adding pyridine, it is necessary to use an amount that does not cause precipitation.
〔実施例1〕 まず、以下の組成の電解液を調製した。[Example 1] First, an electrolytic solution having the following composition was prepared.
この時、ジメチルスルホキシド及びピリジンは市販の試
薬を脱水・精製等は行わずにそのまま使用し、金属塩に
ついても市販の含水塩をそのまま用いた。また、調製の
手順としてはまずジメチルスルホキシドにYCl、・6
H20、Ba12・2820及びCLIC12・2H3
0を溶解させた褐色の液を作り、これにピリジンを加え
た。この電解液は室温では緑色を呈し液温を上げると褐
色に変化した。この液を第1図に示すような密閉容器に
入れ窒素ガスを流通させながら、以下の条件なお、第1
図において、1は電解液、2は陽極、3は陰極、4は窒
素ガス導入口、5は窒素ガス排出口、6は電源、7は恒
温水槽である。At this time, commercially available reagents for dimethyl sulfoxide and pyridine were used as they were without dehydration or purification, and as for the metal salt, commercially available hydrated salts were used as they were. In addition, as a preparation procedure, first add YCl to dimethyl sulfoxide, ・6
H20, Ba12・2820 and CLIC12・2H3
A brown liquid was prepared by dissolving 0, and pyridine was added to this. This electrolyte was green at room temperature and turned brown as the temperature was increased. This liquid was placed in a closed container as shown in Figure 1, and nitrogen gas was passed through it under the following conditions.
In the figure, 1 is an electrolytic solution, 2 is an anode, 3 is a cathode, 4 is a nitrogen gas inlet, 5 is a nitrogen gas outlet, 6 is a power source, and 7 is a constant temperature water bath.
〔実施例2〕
〔実施例1〕で用いた電解液(200cm3)に、2
cm’ (1vo1%)の水を加え、〔実施例1〕と
同様に窒素ガス雰囲気下で、以下の条件で電解したとこ
ろ、陰極上に黒色ないしは濃紫色の電析物(皮膜)が得
られた。この電析物を削り取りプラズマ発光分光分析に
より調べたところ、Y、 Ba及びCuの各元素が2:
1:5 (原子比)の割合で共存していることが確認
された。[Example 2] In the electrolyte solution (200 cm3) used in [Example 1], 2
cm' (1vo1%) of water was added and electrolysis was carried out under the following conditions in a nitrogen gas atmosphere in the same manner as in [Example 1], and a black or deep purple electrodeposited substance (film) was obtained on the cathode. Ta. When this deposit was scraped off and examined by plasma emission spectrometry, it was found that each of the elements Y, Ba, and Cu was 2:
It was confirmed that they coexisted at a ratio of 1:5 (atomic ratio).
で電解したところ、陰極上に黒色ないしは濃紫色の電析
物(皮膜)が得られた。この電析物を削り取りプラズマ
発光分光分析により調べたところ、Y、 Ba及びCu
の各元素が3:1:6 (原子比)の割合で共存してい
ることが確認された。When electrolysis was carried out, a black or deep purple electrodeposited substance (film) was obtained on the cathode. When this deposit was scraped off and examined by plasma emission spectrometry, it was found that Y, Ba, and Cu
It was confirmed that each element coexisted in the ratio of 3:1:6 (atomic ratio).
〔実施例3〕 まず、以下の組成の電解液を調製した。[Example 3] First, an electrolytic solution having the following composition was prepared.
この時、ジメチルスルホキシド及びピリジンは市販の試
薬を脱水・精製等は行わずにそのまま使用し、金属塩に
ついても市販の含水塩をそのまま用いた。また、調製の
手順としてはまずジメチルスルホキシドにYbCl3・
6H20、BaI2・2H20及びCuC’l□・2H
20を溶解させた褐色の液を作り、これにピリジンを加
えた。この電解液は室温では緑色を呈し液温を上げると
褐色に変化した。この電解液を用い、〔実施例1〕と同
様、窒素ガス雰囲気下で以下の条件、
で電解したところ、陰極上に黒色の電析物(皮膜)が得
られた。この電析物を削り取りプラズマ発光分光分析に
より調べたところ、Yb、 Ba及びCuの各元素が1
2:1ニア2 (原子比)の割合で共存していることが
確認された。At this time, commercially available reagents for dimethyl sulfoxide and pyridine were used as they were without dehydration or purification, and as for the metal salt, commercially available hydrated salts were used as they were. In addition, as a preparation procedure, first add YbCl3 to dimethyl sulfoxide.
6H20, BaI2・2H20 and CuC'l□・2H
A brown liquid was prepared by dissolving 20, and pyridine was added to this. This electrolyte was green at room temperature and turned brown as the temperature was increased. Using this electrolytic solution, electrolysis was carried out under the following conditions in a nitrogen gas atmosphere as in [Example 1], and a black deposit (film) was obtained on the cathode. When this deposit was scraped off and examined by plasma emission spectrometry, it was found that each element of Yb, Ba, and Cu was present at 1%.
It was confirmed that they coexisted at a ratio of 2:1 near 2 (atomic ratio).
本発明によれば、高温超伝導物質の前駆体となり得る希
土類−Ba−Cu合金を、高価な装置を必要とせず、簡
便に、均一な膜状として得ることができる。According to the present invention, a rare earth-Ba-Cu alloy that can be a precursor of a high-temperature superconducting material can be easily obtained in the form of a uniform film without requiring expensive equipment.
第1図は本発明を実施するに際して採用した電気めっき
装置の概略図である。FIG. 1 is a schematic diagram of an electroplating apparatus employed in carrying out the present invention.
Claims (1)
中に、希土類のハロゲン化物、バリウムのハロゲン化物
及び銅のハロゲン化物を溶解させた液を用いて電解を行
い、陰極上に希土類、バリウム及び銅を含むめっき層を
形成させることを特徴とする希土類−バリウム−銅合金
めっき方法。(1) Electrolysis is performed using a solution in which rare earth halides, barium halides, and copper halides are dissolved in a mixed solvent of dimethyl sulfoxide and pyridine, and rare earths, barium, and copper are contained on the cathode. A rare earth-barium-copper alloy plating method characterized by forming a plating layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1264790A JPH03219095A (en) | 1990-01-24 | 1990-01-24 | Plating method for rare earth-barium-copper alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1264790A JPH03219095A (en) | 1990-01-24 | 1990-01-24 | Plating method for rare earth-barium-copper alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03219095A true JPH03219095A (en) | 1991-09-26 |
Family
ID=11811159
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1264790A Pending JPH03219095A (en) | 1990-01-24 | 1990-01-24 | Plating method for rare earth-barium-copper alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03219095A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995007550A1 (en) * | 1992-06-02 | 1995-03-16 | Hauser Chemical Research, Inc. | Electroplating of superconductor elements |
-
1990
- 1990-01-24 JP JP1264790A patent/JPH03219095A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995007550A1 (en) * | 1992-06-02 | 1995-03-16 | Hauser Chemical Research, Inc. | Electroplating of superconductor elements |
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