JPH03225879A - Gas laser tube - Google Patents

Gas laser tube

Info

Publication number
JPH03225879A
JPH03225879A JP1923790A JP1923790A JPH03225879A JP H03225879 A JPH03225879 A JP H03225879A JP 1923790 A JP1923790 A JP 1923790A JP 1923790 A JP1923790 A JP 1923790A JP H03225879 A JPH03225879 A JP H03225879A
Authority
JP
Japan
Prior art keywords
gas
laser
discharge
tube
discharge tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1923790A
Other languages
Japanese (ja)
Other versions
JP2716833B2 (en
Inventor
Akira Watanabe
亮 渡邊
Takashi Kawamura
隆 河村
Ryoji Taura
良治 田浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP2019237A priority Critical patent/JP2716833B2/en
Priority to DE19914103125 priority patent/DE4103125A1/en
Publication of JPH03225879A publication Critical patent/JPH03225879A/en
Application granted granted Critical
Publication of JP2716833B2 publication Critical patent/JP2716833B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To shorten the passage of laser gas exposed to a discharge part so as to improve laser efficiency by providing a discharge tube with plural supply ports and exhaust ports for gas laser. CONSTITUTION:A discharge tube 14 is provided with plural supply ports 32a and 32b and exhaust ports 33a and 33b for laser gas. And when performing laser oscillation, in addition to the laser gas flowing down from the side of a cathode 13, laser gas is introduced from the plural laser gas supply ports 32a and 32b provided in the discharge tube 14, and these laser gases are mixed, and some of the laser gas being heated by discharge is exhausted quickly from the plural laser gas exhaust ports 33a and 33b provided in the discharge tube 14. Hereby, the distance where the laser gas is exposed to discharge is shortened, and the average temperature of the laser gas is lowered, and the laser efficiency improves.

Description

【発明の詳細な説明】 〈産業上の利用分計〉 本発明は、ガスレーザ発生装置において放電部として使
用されるガスレーザ管に関し、特に放電部にさらされる
レーザガスの流路を短くし、レーザ効率を向上させるよ
うに工夫したものである。
Detailed Description of the Invention <Industrial Utilization> The present invention relates to a gas laser tube used as a discharge part in a gas laser generator, and in particular to shortening the flow path of laser gas exposed to the discharge part and improving laser efficiency. It has been devised to improve it.

〈従来の技術〉 軸流型ガスレーザ発振器の放電部として使用されるガス
レーザ管の一例を第2図に示す。
<Prior Art> FIG. 2 shows an example of a gas laser tube used as a discharge section of an axial flow gas laser oscillator.

同図に示すように、内部に円筒10及びスリット11を
有するガス導入部12にレーザガスを導入し、ここで該
スリット11により旋回流とした後リング状の陰極13
に導き、この陰極13から放電管14内を経て、リング
状の陽極15に至り、放電を行うようにしている。尚、
16はガス排出部を図示している。
As shown in the figure, laser gas is introduced into a gas introduction part 12 having a cylinder 10 and a slit 11 therein, where it is made into a swirling flow by the slit 11, and then a ring-shaped cathode 13 is formed.
from this cathode 13 through the discharge tube 14 to a ring-shaped anode 15, where discharge occurs. still,
Reference numeral 16 indicates a gas discharge section.

このガスレーザ管においては陰極13より放出された電
子が陰極13と陽極15間の電界によって加速され、放
電管14内を通って陽極15に到達する。ここで放電管
14内のレーザガスは両極間の放電による電子との衝突
により、上準位に励起され、下準位に緩和するときレー
ザ光が発生する。
In this gas laser tube, electrons emitted from the cathode 13 are accelerated by the electric field between the cathode 13 and the anode 15, pass through the discharge tube 14, and reach the anode 15. Here, the laser gas in the discharge tube 14 is excited to the upper level by collision with electrons caused by the discharge between the two poles, and when it relaxes to the lower level, laser light is generated.

第2図に示すガスレーザ管を用いた軸流型ガスレーザ発
振器の一例を第3図に示す。本発振器は、具体的にはC
02レーザ発振器を示すシステム構成図である。同図に
示すように、出力鏡1001折返し鏡101,102及
び終段競103により光共振話が構成される。
An example of an axial flow type gas laser oscillator using the gas laser tube shown in FIG. 2 is shown in FIG. Specifically, this oscillator is
FIG. 2 is a system configuration diagram showing a 02 laser oscillator. As shown in the figure, the output mirror 1001, the folding mirrors 101, 102, and the final stage 103 constitute an optical resonance system.

尚、104は発生したレーザ光を導く円編光装置である
。放電IfM:14内には、配管105及びガス導入部
12内の陰極13を通してヘリウム、窒素、炭酸ガスの
混合レーザガスが供給され、放電管14内のレーザガス
は、陽極15及びガス排出部16を通ってから戻り管1
06へ流れる。この混合ガス中において、陰極13と陽
極15の間で放電を行なわせてガスの励起を発生させ、
レーザ遷移による光を前記光共振晋で増幅し前記出力鏡
100よりレーザ光を出力する。
Note that 104 is a circular optical device that guides the generated laser light. A mixed laser gas of helium, nitrogen, and carbon dioxide gas is supplied into the discharge IfM 14 through a pipe 105 and a cathode 13 in a gas introduction part 12, and the laser gas in the discharge tube 14 passes through an anode 15 and a gas discharge part 16. Then return pipe 1
Flows to 06. In this mixed gas, a discharge is caused between the cathode 13 and the anode 15 to generate excitation of the gas,
The light caused by the laser transition is amplified by the optical resonance, and the laser light is output from the output mirror 100.

混合ガスは戻)+W1osから熱交換11107゜ガス
循環ポンプ108へ送られ、該ガス循環ポンプ108で
圧送されて熱交換器109゜配管105へ流れる。上述
した、配管105−陰極13−放電管14−陽極15−
戻り管106→熱交換諸107−ガス循環ポンプ108
→熱交換器109→配管105に沿うガス循環系を主循
環系という。
The mixed gas is sent from the return)+W1os to the heat exchanger 11107° gas circulation pump 108, and is pumped by the gas circulation pump 108 and flows to the heat exchanger 109° piping 105. The above-mentioned pipe 105 - cathode 13 - discharge tube 14 - anode 15 -
Return pipe 106 → heat exchanger 107 - gas circulation pump 108
→ Heat exchanger 109 → The gas circulation system along piping 105 is called the main circulation system.

一方、ヘリウムボンベ、窒素ボンベ、炭酸ガスボンベか
らなるガス供給装置110からは、流量調整弁111、
並びに配管112を通して、混合ガスとして主循環系に
供給される。主循環系に混合ガスを供給すると、主循環
系内の混合ガスが上記供給量と同量だけ流量調整弁11
3を通して真空ポンプ114により大気中に放出される
。尚115は高圧電源、116は電流制御回路を示す。
On the other hand, a flow rate adjustment valve 111,
It is also supplied to the main circulation system as a mixed gas through the pipe 112. When the mixed gas is supplied to the main circulation system, the same amount of the mixed gas in the main circulation system as the above-mentioned supply amount is supplied to the flow rate adjustment valve 11.
3 to the atmosphere by a vacuum pump 114. Note that 115 is a high voltage power supply, and 116 is a current control circuit.

上述した軸流型ガスレーザ発振器においては、レーザ光
を多(出すために反転分布(上準位〉下準位)を大きく
する必要がある。この際レーザガスの温度の上昇を抑え
るため該レーザガスの冷却が必要となる。このため従来
においては、放電管14を外部から冷却するか、あるい
は放電管14内のレーザガスの流れを高速にしてガス平
均温度が上昇しないようにしている。
In the above-mentioned axial flow type gas laser oscillator, it is necessary to increase the population inversion (upper level > lower level) in order to emit a large amount of laser light.At this time, in order to suppress the rise in the temperature of the laser gas, cooling of the laser gas is required. Therefore, conventionally, the discharge tube 14 is cooled from the outside or the laser gas flow inside the discharge tube 14 is made high speed to prevent the average gas temperature from rising.

〈発明が解決しようとする課題〉 上述したレーザガスの冷却においては、次の熱伝達によ
ゆ行われる。
<Problems to be Solved by the Invention> The cooling of the laser gas described above is performed by the following heat transfer.

(1)  レーザガスと放電管内壁との熱伝達(熱伝達
率a、) (2)放電管の熱伝導(熱伝達率a2)(3)放電管外
壁と外部流体との熱伝達(熱伝達率a、) 総合熱伝達率aTは次式で表わせる。
(1) Heat transfer between the laser gas and the inner wall of the discharge tube (heat transfer coefficient a) (2) Heat conduction of the discharge tube (heat transfer coefficient a2) (3) Heat transfer between the outer wall of the discharge tube and the external fluid (heat transfer coefficient a,) The overall heat transfer coefficient aT can be expressed by the following formula.

したがって熱伝達率aアはaI、α2.a3の最小値よ
り大きくなることはない。
Therefore, the heat transfer coefficient a is aI, α2. It never becomes larger than the minimum value of a3.

一般に熱伝達率αが最小である場合が多く、この場合放
電管14内のレーザガスの冷却を放電管14の外側から
冷却することは限度があり、ガス温度を大幅に下げるこ
とは困難であるという問題がある。
Generally, the heat transfer coefficient α is often the minimum, and in this case, there is a limit to cooling the laser gas inside the discharge tube 14 from outside the discharge tube 14, and it is difficult to significantly lower the gas temperature. There's a problem.

また、レーザガスの温度上昇により、下準位成分が増加
することとなり、反転分布が飽和し、取り出せるレーザ
出力が限界に達する。
Furthermore, as the temperature of the laser gas increases, the lower level component increases, the population inversion becomes saturated, and the laser output that can be extracted reaches its limit.

このため従来においては、レーザガス全体の温度を大幅
に下げるようにして、反転分布の飽和点を上げるように
しているが、この場合環境温度より下げてしまうと、レ
ーザ発振器の構成部分に結露を生じる。一般に放電を行
うため高電圧を使用しているので、結露によって電気絶
縁破壊の危険性を生じるという問題がある。
For this reason, in the past, the temperature of the entire laser gas was significantly lowered to raise the saturation point of population inversion, but in this case, if the temperature is lowered below the ambient temperature, dew condensation will occur on the components of the laser oscillator. . Since high voltage is generally used to generate the discharge, there is a problem in that there is a risk of electrical insulation breakdown due to condensation.

次に、レーザガスを高速に流してガス温度を上げない方
法は、ガス循環ポンプの能力を大きくする必要がありガ
ス循環ポンプ動力を増加させ、レーザ発振器全体のシス
テム効率を下げるという問題がある。
Next, the method of flowing the laser gas at high speed and not raising the gas temperature requires increasing the capacity of the gas circulation pump, which increases the power of the gas circulation pump and has the problem of lowering the overall system efficiency of the laser oscillator.

本発明は以上述べた事情に鑑み、軸流型ガスレーザ発振
器の放電管内を流れるレーザガスの温度上昇を押えると
共にレーザ効率(レーザ出力/放電力の比)を向上させ
得るガスレーザ管を提供することを目的とする。
In view of the above-mentioned circumstances, an object of the present invention is to provide a gas laser tube that can suppress the temperature rise of the laser gas flowing inside the discharge tube of an axial flow type gas laser oscillator and improve the laser efficiency (ratio of laser output/discharge power). shall be.

く課題を解決するための手段〉 前記目的を達成するための本発明のがスレ−ザ管の構成
は、放電管の両端にそれぞれリング状の陽極、陰極を配
設すると共に該放電管の内部に陰極側から陽極側へと軸
方向にレーザガスを流下させることにより放電を行う細
流型のガスレーザ管において、前記放電管にレーザガス
の供給口と排出口とを複数設けたことを特徴とする。
Means for Solving the Problems> The structure of the laser tube of the present invention to achieve the above object is that a ring-shaped anode and a cathode are respectively disposed at both ends of the discharge tube, and the inside of the discharge tube is A trickle-flow type gas laser tube that performs discharge by causing laser gas to flow down in the axial direction from the cathode side to the anode side, characterized in that the discharge tube is provided with a plurality of laser gas supply ports and discharge ports.

〈作   用〉 前記構成のガスレーザ管において、レーザ発振を行う際
、陰極側から流下するレーザガスに加えて、放電管に設
けた複数のレーザガスの供給口からレーザガスを導入し
てこれらのレーザガスが混合させ、放電で加熱されたレ
ーザガスの一部を放電管に設けた複数のレーザガス排出
口からすみやかに排出させ、レーザガスが放電にさらさ
れる距離を短くし、この結果レーザガスの平均温度を下
げる。
<Function> When performing laser oscillation in the gas laser tube configured as described above, in addition to the laser gas flowing down from the cathode side, laser gas is introduced from a plurality of laser gas supply ports provided in the discharge tube, and these laser gases are mixed. A portion of the laser gas heated by the discharge is quickly discharged from a plurality of laser gas discharge ports provided in the discharge tube, thereby shortening the distance to which the laser gas is exposed to the discharge, thereby lowering the average temperature of the laser gas.

く実 施 例〉 以下、本発明の好適な一実施例を図面を参照して詳細に
説明する。
Embodiment Hereinafter, a preferred embodiment of the present invention will be described in detail with reference to the drawings.

第1図は本実施例にかかるガスレーザ管の構造図である
。尚、前述した従来例にかかる部材と同一のものについ
ては同符号を付して重複した説明は省略する。同図に示
すように、ガス導入部12内の空洞12aには、円筒1
゜が設置されると共にこの円筒10の一端に対し、絶縁
リング20.リング状の陰極13゜絶縁リング21を介
して放電管14の一端が同軸に接続されている。該放電
管14の他端はリング状の陽極15に気密に接続される
一方、前記絶縁リング20.IJリング11jll!1
i13゜絶縁リング21を取り囲む支持筒22によりガ
ス導入部12に気密に取9付けられている。
FIG. 1 is a structural diagram of a gas laser tube according to this embodiment. Note that the same reference numerals are given to the same members as those in the conventional example described above, and redundant explanation will be omitted. As shown in the figure, a cylinder 1 is provided in the cavity 12a in the gas introduction section 12.
° is installed and an insulating ring 20. One end of the discharge tube 14 is coaxially connected via a ring-shaped cathode 13° insulating ring 21. The other end of the discharge tube 14 is hermetically connected to a ring-shaped anode 15, while the insulating ring 20. IJ ring 11jll! 1
The i13° insulation ring 21 is airtightly attached to the gas introduction part 12 by a support tube 22 surrounding the insulation ring 21.

また、このガス導入部12の空洞12aには、円筒10
と同軸方向に開口23が設けられており、この開口23
にレーザガスを導入するガス導入路24がシール25a
、シール25bを介してフランジ25により気密に接続
されている。このガス導入路24は本実施例では4本の
分岐管26a〜26dを介して放電管14を覆うように
して設けられた外v:27と連通しており、一方、この
外管27からは本実施例では3本の集合管28a〜28
cを介して陽極側のガス排出路29に連通されている。
In addition, a cylinder 10 is provided in the cavity 12a of the gas introduction part 12.
An opening 23 is provided coaxially with the opening 23.
The gas introduction path 24 for introducing the laser gas into the seal 25a
, are airtightly connected by the flange 25 via a seal 25b. In this embodiment, the gas introduction path 24 communicates with an outer tube 27 provided to cover the discharge tube 14 via four branch tubes 26a to 26d. In this embodiment, three collecting pipes 28a to 28
It communicates with a gas exhaust path 29 on the anode side via c.

このガス排出路29はフランジ30によりガス排出部1
6にシール31a、31bを介してフランジ31により
気密に保たれて取付けられている。
This gas discharge passage 29 is connected to the gas discharge section 1 by a flange 30.
6 through seals 31a and 31b by a flange 31 in an airtight manner.

また上記外管27で覆われていると共に、上記分岐管2
6a〜26dに対向する放電管14の壁面には、レーザ
ガスの供給口としての複数のガス供給用の細孔32a、
32b。
In addition, it is covered with the outer pipe 27, and the branch pipe 2
On the wall surface of the discharge tube 14 facing 6a to 26d, there are a plurality of gas supply pores 32a as laser gas supply ports,
32b.

32c、32dが、一方の上記集合管28a〜28cに
対向する放電管14の壁面には、レーザガスの排出口と
しての複数のガス排出用の細孔33 a、 33 b、
 33 cがそれぞれ設けられている。
On the wall surface of the discharge tube 14 facing one of the collecting tubes 28a to 28c, there are a plurality of gas exhaust holes 33a, 33b as laser gas exhaust ports.
33c are provided respectively.

尚、外管27の内部には該外管内部を仕切る仕切板27
a〜27fが設けられており、ガス導入部12の空間1
2aの分岐部から分岐されて、ガス導入路24.分岐管
26a〜26dを通ったレーザガスは、放電管14の壁
面に設けられたガス供給用の細孔32a〜32dへ独立
して供給するようにしている。
Note that a partition plate 27 is provided inside the outer tube 27 to partition the inside of the outer tube.
a to 27f are provided, and the space 1 of the gas introduction section 12
A gas introduction path 24. The laser gas that has passed through the branch pipes 26a to 26d is independently supplied to gas supply pores 32a to 32d provided in the wall of the discharge tube 14.

また導入されたレーザガスの一部を放電管14の壁面に
設けられたガス排出用の細孔33a〜33cから集合管
28a〜28cへ独立して排出するようにしている。
Further, a part of the introduced laser gas is independently discharged from gas discharge pores 33a to 33c provided in the wall surface of the discharge tube 14 to the collecting tubes 28a to 28c.

この外管27は一端をガス導入部12に取付けられてい
る支持筒22にシール34を介して、また他端を陽極1
5にシール35を介して気密に連結されている。またガ
ス導入部12とはシール36を介して支持筒22の気密
を保つと共に、ガス排出部16とはシール37を介して
陽極の気密を保つようにしている。
This outer tube 27 has one end connected to the support tube 22 attached to the gas introduction part 12 via a seal 34, and the other end connected to the anode 12.
5 through a seal 35 in an airtight manner. Further, the support cylinder 22 is kept airtight with the gas introduction part 12 via a seal 36, and the anode is kept airtight with the gas discharge part 16 via a seal 37.

このようにして、分岐管26a〜26dから各々導入さ
れたレーザガスは供給用の細孔33a〜33dを通って
放電管14内に導入されると共に導入されたレーザガス
の一部は再び下流側の排出用の細孔33a〜33cを通
って烏合管28a〜28cへ流出された後ガス排出部1
6に送られ、ガス循環路へ戻るようにしている。
In this way, the laser gas introduced from the branch pipes 26a to 26d is introduced into the discharge tube 14 through the supply holes 33a to 33d, and a part of the introduced laser gas is again discharged downstream. After the gas is discharged through the pores 33a to 33c to the mating tubes 28a to 28c, the gas discharge part 1
6 and return to the gas circulation path.

尚、ガス導入部12のスリット11を経て陰極13側か
ら流入するガス量と、ガス導入路24を経て細孔32a
〜32dから入るガス量との比は、円筒10のスリット
11の面積と、細孔32の穴の面積との比により決定す
ればよい。
Note that the amount of gas flowing from the cathode 13 side through the slit 11 of the gas introduction section 12 and the amount of gas flowing through the gas introduction path 24 through the pore 32a
The ratio of the amount of gas entering from ~32d may be determined by the ratio of the area of the slit 11 of the cylinder 10 and the area of the hole of the pore 32.

このような構造を有するレーザ管を採用することによっ
て、陰極13側から流入したレーザガスが、ガス供給用
の細孔32aから流入した低温のレーザガスと混合し、
放電で加熱されたガスの一部は細孔33aから流出する
。さらに細孔32bからガスが流入し細孔33bから一
部流出する。ふ下、細孔32cから流入したガスの一部
は細孔33cから流出し、細孔32dから流入したガス
は陽極15から流出する。これによりレーザガスの平均
温度を低下させることができ、レーザ効率を大幅に向上
させることとなる。
By employing a laser tube having such a structure, the laser gas flowing in from the cathode 13 side mixes with the low-temperature laser gas flowing in through the gas supply pores 32a.
A portion of the gas heated by the discharge flows out from the pores 33a. Furthermore, gas flows in through the pores 32b and partially flows out through the pores 33b. At the bottom, part of the gas that has flowed in through the pores 32c flows out from the pores 33c, and the gas that has flowed in through the pores 32d flows out from the anode 15. This allows the average temperature of the laser gas to be lowered, resulting in a significant improvement in laser efficiency.

〈発明の効果〉 以上実施例と共に詳しく述べたように本発明に係るガス
レーザ管は、放電管にレーザガスの供給口としてのガス
供給用の細孔と、レーザガスの排出口としてのガス排出
用の細孔を複数設けることにより、低温のレーザガスを
放電管の途中から流入させ、その下流で放電によって加
熱されたレーザガスの一部を流出させることで、放電管
内のレーザガスの温度上昇を抑えることができ、レーザ
効率を大幅に向上させることができる。
<Effects of the Invention> As described above in detail together with the embodiments, the gas laser tube according to the present invention has a gas supply hole in the discharge tube as a laser gas supply port, and a gas discharge hole as a laser gas discharge port. By providing multiple holes, low-temperature laser gas flows in from the middle of the discharge tube, and a portion of the laser gas heated by the discharge flows out downstream, thereby suppressing the temperature rise of the laser gas inside the discharge tube. Laser efficiency can be significantly improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例に係るガスレーザ管の断面図
、第2図は従来のガスレーザ管の断面図、第3図は従来
の軸流型ガスレーザ発振器の構造図である。 図  面  中、 10は円筒、 11はスリット、 12はガス導入部、 13は陰極、 14は放Wji管、 15は陽極、 16はガス排出部、 20.21は絶縁リング、 22は支持筒、 23は開口、 24はガス導入路、 25はフランジ、 26a 〜26dは分岐管、 27は外管、 27a 〜27fは仕切板、 28a 〜28dは集合管、 29はガス排出路、 30.31はフランジ、 32a〜32dばガス供給用の細孔、 33a〜33cはガス排出用の細孔、 34に37はシールである。
FIG. 1 is a sectional view of a gas laser tube according to an embodiment of the present invention, FIG. 2 is a sectional view of a conventional gas laser tube, and FIG. 3 is a structural diagram of a conventional axial flow gas laser oscillator. In the drawing, 10 is a cylinder, 11 is a slit, 12 is a gas introduction part, 13 is a cathode, 14 is a discharge pipe, 15 is an anode, 16 is a gas discharge part, 20, 21 is an insulating ring, 22 is a support tube, 23 is an opening, 24 is a gas introduction path, 25 is a flange, 26a to 26d are branch pipes, 27 is an outer pipe, 27a to 27f are partition plates, 28a to 28d are collecting pipes, 29 is a gas discharge path, 30.31 is A flange, 32a to 32d are gas supply holes, 33a to 33c are gas discharge holes, and 34 and 37 are seals.

Claims (1)

【特許請求の範囲】[Claims] 放電管の両端にそれぞれリング状の陽極、陰極を配設す
ると共に該放電管の内部に陰極側から陽極側へと軸方向
にレーザガスを流下させることにより放電を行う軸流型
のガスレーザ管において、前記放電管にレーザガスの供
給口と排出口とを複数設けたことを特徴とするガスレー
ザ管。
In an axial flow type gas laser tube in which a ring-shaped anode and a cathode are disposed at both ends of the discharge tube, and a laser gas is caused to flow down in the axial direction from the cathode side to the anode side inside the discharge tube to generate a discharge, A gas laser tube characterized in that the discharge tube is provided with a plurality of laser gas supply ports and a plurality of discharge ports.
JP2019237A 1990-01-31 1990-01-31 Gas laser tube Expired - Lifetime JP2716833B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2019237A JP2716833B2 (en) 1990-01-31 1990-01-31 Gas laser tube
DE19914103125 DE4103125A1 (en) 1990-01-31 1991-01-30 Axial flow gas laser tube - allows part of gas heated in tube to escape to prevent overheating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019237A JP2716833B2 (en) 1990-01-31 1990-01-31 Gas laser tube

Publications (2)

Publication Number Publication Date
JPH03225879A true JPH03225879A (en) 1991-10-04
JP2716833B2 JP2716833B2 (en) 1998-02-18

Family

ID=11993787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019237A Expired - Lifetime JP2716833B2 (en) 1990-01-31 1990-01-31 Gas laser tube

Country Status (2)

Country Link
JP (1) JP2716833B2 (en)
DE (1) DE4103125A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015107570A1 (en) * 2014-01-15 2015-07-23 パナソニックIpマネジメント株式会社 Gas laser oscillation apparatus, gas laser oscillation method, and gas laser processing machine

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331693B1 (en) * 1999-06-28 2001-12-18 Cincinnati Incorporated Beam delivery system

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4922799A (en) * 1972-05-10 1974-02-28
JPS55121691A (en) * 1979-03-14 1980-09-18 Hitachi Ltd Gas laser device
JPH01293583A (en) * 1988-05-23 1989-11-27 Mitsubishi Heavy Ind Ltd Axial-flow type gas laser pipe

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3136231C2 (en) * 1981-09-12 1983-11-24 Messer Griesheim Gmbh, 6000 Frankfurt Gas lasers, in particular CO 2 gas transport lasers
DE3305152A1 (en) * 1983-02-15 1984-08-16 Rofin-Sinar Laser GmbH, 2000 Hamburg GAS FLOW LASER

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4922799A (en) * 1972-05-10 1974-02-28
JPS55121691A (en) * 1979-03-14 1980-09-18 Hitachi Ltd Gas laser device
JPH01293583A (en) * 1988-05-23 1989-11-27 Mitsubishi Heavy Ind Ltd Axial-flow type gas laser pipe

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015107570A1 (en) * 2014-01-15 2015-07-23 パナソニックIpマネジメント株式会社 Gas laser oscillation apparatus, gas laser oscillation method, and gas laser processing machine

Also Published As

Publication number Publication date
JP2716833B2 (en) 1998-02-18
DE4103125A1 (en) 1991-08-01

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