JPH03228389A - Thick film conductor paste - Google Patents
Thick film conductor pasteInfo
- Publication number
- JPH03228389A JPH03228389A JP2411890A JP2411890A JPH03228389A JP H03228389 A JPH03228389 A JP H03228389A JP 2411890 A JP2411890 A JP 2411890A JP 2411890 A JP2411890 A JP 2411890A JP H03228389 A JPH03228389 A JP H03228389A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- conductor
- thick film
- organic vehicle
- paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004020 conductor Substances 0.000 title claims abstract description 39
- 239000000945 filler Substances 0.000 claims abstract description 13
- 238000005245 sintering Methods 0.000 claims description 17
- 239000000843 powder Substances 0.000 abstract description 18
- 239000010453 quartz Substances 0.000 abstract description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 13
- 239000002241 glass-ceramic Substances 0.000 abstract description 12
- 239000000463 material Substances 0.000 abstract description 9
- 239000001856 Ethyl cellulose Substances 0.000 abstract description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 abstract description 2
- 235000014113 dietary fatty acids Nutrition 0.000 abstract description 2
- 229920001249 ethyl cellulose Polymers 0.000 abstract description 2
- 235000019325 ethyl cellulose Nutrition 0.000 abstract description 2
- 239000000194 fatty acid Substances 0.000 abstract description 2
- 229930195729 fatty acid Natural products 0.000 abstract description 2
- 150000004665 fatty acids Chemical class 0.000 abstract description 2
- 238000002156 mixing Methods 0.000 abstract description 2
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 239000010931 gold Substances 0.000 description 23
- 239000011521 glass Substances 0.000 description 11
- 239000002245 particle Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- 239000000919 ceramic Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は厚膜導体ペーストに関し、特にセラミック多層
基板のビアフィル導体に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field] The present invention relates to thick film conductor pastes, and more particularly to via fill conductors for ceramic multilayer substrates.
従来セラばツク多層基板のビアフィル導体は、パターン
形成用の厚膜導体ペーストを使用することが多く、セラ
ミ、り多層基板のメタルシステムに応じて使い分けが行
われている。Conventionally, via fill conductors for ceramic multilayer boards often use thick film conductor paste for pattern formation, and are used differently depending on the metal system of the ceramic or multilayer board.
一般的な使用例としてはアルミナセラミアク系の多層基
板に於ては、アルミナセラミックの焼結温度より高融点
金属であるタングステン(W)。As a general example of use, in alumina ceramic multilayer substrates, tungsten (W), which is a metal with a higher melting point than the sintering temperature of alumina ceramic, is used.
モリブデン(MO)を主材とし、他に添加剤として焼結
助剤を添加し有機ビヒクルで混合したものが用いられて
いる。The main material used is molybdenum (MO), with a sintering aid added as an additive and mixed with an organic vehicle.
厚膜多層基板に於ては、導体に銀(Ag)w銀パラジー
−ム(AgPd ) 、白金(Pt)金(Au)。In thick film multilayer substrates, the conductors are silver (Ag), silver palladium (AgPd), platinum (Pt), and gold (Au).
金(Au)、銅(Cu)を使用することによシ、ビアフ
ィル導体に於ても導体と同じ金属を使用するケースが多
く、これらの金属を主材とし他に添加剤として焼結助剤
、酸化金属、非晶質ニブラスフリット等を有機ビヒクル
で混練したペーストを使用している。又最近の低温焼結
多層基板に於ては、グリーンシートへの印刷導体に銀パ
ラジーーム。Due to the use of gold (Au) and copper (Cu), the same metals as the conductors are often used in via-fill conductors, and these metals are used as the main material and sintering aids are added as additives. A paste made by kneading , metal oxide, amorphous Niblas frit, etc. with an organic vehicle is used. Also, in recent low-temperature sintered multilayer substrates, silver palladium is used as the printed conductor on the green sheet.
金、銅の金属を主材とし他に添加剤として焼結助剤酸化
金属及び非晶質ガラスを添加し、グリーンシートの焼成
特性に応じて添加剤の添加量をコントロールしグリーン
シートの焼結時の収縮率に合ったビアフィル導体を得て
いる。The main materials are gold and copper, and sintering aids such as metal oxide and amorphous glass are added as additives, and the amount of additives added is controlled according to the firing characteristics of the green sheet to sinter the green sheet. We have obtained a via-fill conductor that matches the shrinkage rate.
しかし、上述した従来の技術に於ては、ビアフィル導体
は一般的に回路の導体抵抗を低くすることよシ前述の如
く導電性の高い金属が用いられている。Ag、及びAg
/Pd系導体を使用した例はよく知られている。しかし
良導電性金属の熱膨張率としては、Ag#190X10
/1?:、銅約165XIO/℃でアルミナセラミッ
クの60〜80X10/C,ガラスセラばツクの30〜
s o x i o−’/℃に対して大きく、このため
骨材であるセラミ、り及びガラスセラばツクとの接合に
於て問題を生じている。−例として厚膜多層基板のビア
フィル形成について紹介する。However, in the above-mentioned conventional technology, the via-fill conductor is generally made of a highly conductive metal, as described above, in order to lower the conductor resistance of the circuit. Ag, and Ag
/Pd-based conductors are well known. However, the thermal expansion coefficient of a highly conductive metal is Ag#190X10
/1? :, copper about 165XIO/℃, alumina ceramic 60~80X10/C, glass ceramic 30~
It is large compared to s o x io-'/°C, which causes problems in bonding with aggregates such as ceramic, glue, and glass ceramic blocks. -As an example, we will introduce via fill formation for thick film multilayer substrates.
先ずアルミナ基板上に厚膜誘電体ペーストを印刷しピア
ホールを形成し、次に厚膜誘電体を乾燥後このピアホー
ル内にAg/Pd系導体ペーストを充填し乾燥しビアフ
ィルを形成する。この状態で厚膜誘電体とビアフィルを
同時に焼成する。この時誘電体とビアフィルの焼結時の
収縮率、膨張率の違いにより、ピアホールとビアフィル
の間に空隙を作ることがある。このことは低温焼結多層
基板でも同様に発生し、しばしば品質上の問題となって
いる。First, a thick film dielectric paste is printed on an alumina substrate to form a pier hole, and then, after drying the thick film dielectric, an Ag/Pd based conductor paste is filled into the pier hole and dried to form a via fill. In this state, the thick film dielectric and via fill are fired simultaneously. At this time, a gap may be created between the peer hole and the via fill due to the difference in contraction rate and expansion rate during sintering of the dielectric and the via fill. This problem also occurs in low-temperature sintered multilayer substrates, and often poses a quality problem.
これらを解決すべ〈従来技術に於ては、ペースト組成物
を調合し収縮率に関しては導体ペーストの無機/有機比
率の制御をしている。しかし無機比率を上げるとペース
トの粘度特性に問題を生じビアフィルの充填率が問題と
なる。又膨張率に関してはグリーンンート及び厚膜誘電
体の無機成分を導体ペースト内にフィラーとして添加し
、セラミック及びガラスセラミックと導体ペーストと合
せる努力がなされているがフィラーの熱膨張率が大きい
ことにより目的の熱膨張率を得るためにはフィラーの配
合が多くなカ、導電性が低下しビアフィルの導体抵抗が
上がってしまうという問題があった。To solve these problems, in the prior art, a paste composition is prepared and the shrinkage rate is controlled by controlling the inorganic/organic ratio of the conductive paste. However, increasing the inorganic ratio causes problems in the viscosity characteristics of the paste, and the filling rate of via fill becomes a problem. Regarding the expansion coefficient, efforts have been made to add inorganic components of green roots and thick film dielectrics as fillers into the conductor paste, and to combine ceramics and glass-ceramics with the conductor paste, but the high coefficient of thermal expansion of the filler makes it difficult to achieve the intended purpose. In order to obtain a coefficient of thermal expansion of , a large amount of filler must be added, but there is a problem in that the conductivity decreases and the conductor resistance of the via fill increases.
本発明の厚膜導体ペーストは、導電性主材と低熱膨張率
フィラーと焼結助剤を有機ビヒクルで分散させたもので
ある。The thick film conductor paste of the present invention is made by dispersing a conductive main material, a low coefficient of thermal expansion filler, and a sintering aid in an organic vehicle.
特に熱膨張率に関しては、結晶化石英を添加することに
より実施し、焼結時の収縮率に関しては、低熱膨張フィ
ラーの粒度分布を制御することにより実施しており、導
体抵抗については導電性主材と低熱膨張率フィラーの粉
末粒度分布を制御することにより解決している。In particular, the coefficient of thermal expansion is controlled by adding crystallized quartz, the shrinkage rate during sintering is controlled by controlling the particle size distribution of low thermal expansion filler, and the conductor resistance is controlled mainly by conductive material. This problem is solved by controlling the powder particle size distribution of the material and the low thermal expansion filler.
次に本発明について詳細に説明する。 Next, the present invention will be explained in detail.
表1は本発明の第1の実施例を説明するための基本組成
配合割合である。Table 1 shows basic composition ratios for explaining the first embodiment of the present invention.
表1に於て、導電性主材としてのAu粉末は球形粉末で
、平均粒径1μmで結晶化している。低熱膨張率フィラ
ーとしての石英はボールミルにより粉砕され平均粒径2
.5μmになっている。これらの無機粉末に焼結助剤を
添加し、エチルセルロースを主剤とし他にターピネオー
ル、脂肪酸を含んだ有機ビヒクルにて混練しペースト化
する。In Table 1, the Au powder as the conductive main material is a spherical powder, and is crystallized with an average particle size of 1 μm. Quartz as a low coefficient of thermal expansion filler is crushed by a ball mill and has an average particle size of 2.
.. The thickness is 5 μm. A sintering aid is added to these inorganic powders, and the mixture is kneaded with an organic vehicle containing ethyl cellulose as a main ingredient and terpineol and fatty acids to form a paste.
本実施例に於てはペースト焼結時の収縮率を、有機ビヒ
クルと無機成分のAu粉末と結晶化石英粉末の配合比率
と結晶化石英の粉末粒度に実施しており、表1の基本構
成に於ては無機915wt%に対し有機6.5Wt’1
6の比率に於てペースト焼成時の体積収縮は35%程度
(乾燥状態と焼結状態との比較)であり、結晶化石英の
粉末粒度を変化させることにより結晶化石英の比表面積
が変化し収縮率をコントロール出来る。つまり結晶化石
英を微細化することにより容積が増加する。結晶化石英
は本厚膜導体ペーストの焼結温度的900℃に於ては軟
化しないため体積収縮が少なく、本発明者の実験では結
晶化石英の粉末粒度を5μm〜0.5μmまで微粉化す
ることにより収縮率を40%〜28%まで変化すること
が出来た。In this example, the shrinkage rate during paste sintering was determined based on the blending ratio of the organic vehicle, the inorganic component Au powder, and the crystalline quartz powder, and the powder particle size of the crystalline quartz. Inorganic 915wt% and organic 6.5Wt'1
At a ratio of 6, the volume shrinkage during paste firing is about 35% (comparison between dry state and sintered state), and the specific surface area of crystallized quartz changes by changing the powder particle size of crystalline quartz. You can control the shrinkage rate. In other words, the volume increases by making the crystalline quartz finer. Crystallized quartz does not soften at the sintering temperature of 900°C for this thick-film conductor paste, so its volumetric shrinkage is small, and in the inventor's experiments, the crystallized quartz powder particle size was finely pulverized to 5 μm to 0.5 μm. This made it possible to vary the shrinkage rate from 40% to 28%.
次にAu粉末粒度を変化させることによりAu粉末の凝
集力を変えることが出来、焼結時の粒成長が可変に出来
る。このことにより厚膜導体ペーストの焼結時の導体抵
抗が可変に出来る。つまりAu粉末を微粉末化すること
によりAuの凝集力が増大し焼結過程に於てAuの結晶
化が進み粒成長し電気抵抗が下る。Next, by changing the Au powder particle size, the cohesive force of the Au powder can be changed, and the grain growth during sintering can be made variable. This allows the conductor resistance during sintering of the thick film conductor paste to be made variable. That is, by pulverizing the Au powder, the cohesive force of Au increases, and in the sintering process, the crystallization of Au progresses, grains grow, and the electrical resistance decreases.
熱膨張率に関しては低温焼結グリーン7−トヘのビアフ
ィル形成を例に取って説明する。The coefficient of thermal expansion will be explained by taking the formation of a via fill in low temperature sintered green 7-toe as an example.
第1図に於てグリーンシートlはガラスセラミック系の
低温焼結形であり、主之る組成はB、 03−PbO−
8i0鵞系ガラスと入lx’sで他にアルカリ金属酸化
物を小量添加した無機物を有機バインダーで混練しシー
ト化したものである。ビアフィル導体2は前述の表1の
組成により構成されている。In Fig. 1, the green sheet l is a low-temperature sintered glass ceramic type, and its main composition is B, 03-PbO-
It is made into a sheet by kneading 8i0 glass and an inorganic material with a small amount of alkali metal oxide added with an organic binder. The via fill conductor 2 has the composition shown in Table 1 above.
今グリーンシートlにはピアホール3が形成されビアフ
ィル導体がスクリーン印刷技術により充填されている。Pier holes 3 are now formed in the green sheet 1 and filled with via fill conductors by screen printing technology.
これらの7−トを複数枚積層し加圧抜脱バインダー工程
を経て焼結される。本実施例に於てはグリーンシートの
収縮率が約35チであり厚膜導体ペーストも前述の説明
の如く約35チに設計されており合っている。A plurality of these 7-sheets are laminated and sintered through a pressure release and binder removal process. In this embodiment, the shrinkage rate of the green sheet is approximately 35 inches, and the thick film conductor paste is also designed to have a shrinkage ratio of approximately 35 inches as explained above.
この状態で焼結されると、先ず焼結の前半はグリーンシ
ート及びビアフィル導体の有機成分が分解し、脱バイン
ダーが行なわれる。この時の温度はグリーンシートの材
質により異なるが、約400〜480℃の範囲である。When sintered in this state, first, in the first half of sintering, the organic components of the green sheet and via fill conductor are decomposed and the binder is removed. The temperature at this time varies depending on the material of the green sheet, but is in the range of about 400 to 480°C.
次にグリーンシートのガラスの軟化が開始され、次にビ
アフィル導体のAuの結晶化が進み粒成長が開始する。Next, the glass of the green sheet begins to soften, and then the Au of the via fill conductor progresses to crystallization and grain growth begins.
この時の温度はガラスのアルカリ金属酸物の添加量によ
り異なるが650〜750℃であり、Auの結晶化開始
温度はAu粉末の粒度によシ異なるが700℃〜800
℃である。このAu結晶化が開始されることによりAu
とガラス・セラミ、りの膨張率の差によりピアホールに
対しAuの膨張による加圧が加わる。この時ガラスセラ
ミックのガラスは軟化しており、この加圧力はガラスセ
ラミックで吸収される。The temperature at this time varies depending on the amount of alkali metal oxide added to the glass, but is 650 to 750°C, and the temperature at which Au crystallization starts varies depending on the particle size of the Au powder, but is 700 to 800°C.
It is ℃. By starting this Au crystallization, Au
Due to the difference in the expansion coefficients of Au and glass/ceramic, pressure is applied to the pier hole due to the expansion of Au. At this time, the glass of the glass ceramic is softened, and this pressing force is absorbed by the glass ceramic.
一般的にAuはガラスセラミックと比較し熱膨張率が大
きく、ガラスセラミック60×lO7℃に対しAuは1
70XlO7℃800にである。このためAuとガラス
セラきツクの熱膨張率の差による不具合は冷却工程に於
て発生する。従来のAu系厚膜導体ペーストの場合、ガ
ラスフリットに非晶質ガラスを使用するケースが多く、
熱膨張率としては約148XIO/’C800にであり
、冷却時点でガラスセラミ、りとビアフィル導体間で約
9μm(片側4.5μm)の空隙が発生する計算になる
。又フリットが非晶質ガラスであるために焼結時に熔融
するため、ガラスの比表面積が少なくなり充填密度が向
上する反面、ガラスセラミックとビアフィル導体の空隙
は先程の計算値より大きなものとな9、発明者の評価で
は約30〜50μmの空隙が発生する。In general, Au has a higher coefficient of thermal expansion than glass ceramics, with Au having a coefficient of thermal expansion of 1
70XlO at 7°C and 800°C. Therefore, problems due to the difference in thermal expansion coefficient between Au and glass ceramics occur during the cooling process. In the case of conventional Au-based thick film conductor pastes, amorphous glass is often used for the glass frit.
The coefficient of thermal expansion is about 148XIO/'C800, and it is calculated that a gap of about 9 μm (4.5 μm on one side) is generated between the glass ceramic and the via fill conductor at the time of cooling. Also, since the frit is amorphous glass, it melts during sintering, so the specific surface area of the glass decreases and the packing density improves, but on the other hand, the void between the glass ceramic and the via fill conductor is larger than the calculated value 9 According to the inventor's evaluation, voids of about 30 to 50 μm are generated.
本実施例に於てはフィラーに結晶化石英を使用している
ため、低熱膨張であることとガラスセラミ、り焼結温度
に於て熔融しないことにより、ガラスセラミ、りとビア
フィル導体との空隙は計算値では約8μm(片側4μm
)であり、フィラーの収縮がないためほぼこの数値にな
ることが確認出来た。In this example, since crystalline quartz is used as the filler, it has low thermal expansion and does not melt at the sintering temperature of glass-ceramic. The calculated value is approximately 8 μm (4 μm on one side)
), and it was confirmed that this value was almost the same because there was no shrinkage of the filler.
以上説明した通シ本発明は、厚膜導体ペーストに低熱膨
張率フィラーを添加することにより、ガラスセラi7り
とビアフィル導体との空隙が小さく出来、品質の良好な
ビアフィル導体が形成出来るという効果がある。Overall, the present invention as described above has the effect that by adding a low coefficient of thermal expansion filler to the thick film conductor paste, the gap between the glass cellar i7 and the via-fill conductor can be made small, and a high-quality via-fill conductor can be formed. .
第1図は本発明の厚膜導体ペーストの特性を説明するた
めの低温焼結多層基板の断面図である。
l・・・・・・グリーンシート、2・・・・・・ビアフ
ィル導体、3・・・・・・ピアホール。FIG. 1 is a sectional view of a low-temperature sintered multilayer substrate for explaining the characteristics of the thick film conductor paste of the present invention. l... Green sheet, 2... Via fill conductor, 3... Pier hole.
Claims (1)
ヒクルで分散させたことを特徴とした厚膜導体ペースト
。Thick film conductor paste featuring conductive coverage, low thermal expansion filler, and sintering aid dispersed in an organic vehicle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2411890A JPH03228389A (en) | 1990-02-01 | 1990-02-01 | Thick film conductor paste |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2411890A JPH03228389A (en) | 1990-02-01 | 1990-02-01 | Thick film conductor paste |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03228389A true JPH03228389A (en) | 1991-10-09 |
Family
ID=12129403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2411890A Pending JPH03228389A (en) | 1990-02-01 | 1990-02-01 | Thick film conductor paste |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03228389A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005317933A (en) * | 2004-03-31 | 2005-11-10 | Ngk Spark Plug Co Ltd | Component support substrate, optical device |
-
1990
- 1990-02-01 JP JP2411890A patent/JPH03228389A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005317933A (en) * | 2004-03-31 | 2005-11-10 | Ngk Spark Plug Co Ltd | Component support substrate, optical device |
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