JPH03266209A - Thin-film magnetic head - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed Description of the Invention] [Summary] The present invention relates to a thin-film magnetic head used in a magnetic disk, and provides a thin-film magnetic head that can be manufactured easily and at reduced costs by easily controlling the core width. In a thin film magnetic head in which an insulating layer, a magnetic pole, and a coil are formed on a substrate, the tip of the magnetic pole is formed into a wedge shape such that the core width gradually becomes smaller toward the tip. It was configured as follows.

[Industrial Field of Application] The present invention relates to a thin film magnetic head used in a magnetic disk.

As a method for forming the magnetic pole of a thin film magnetic head, for example, an electrodeposition method using an Fe-Ni alloy, which is excellent in mass production, is used. The magnetic pole pattern is formed by applying photoresist, drying it, exposing it to ultraviolet light, and then developing it.

In this case, if the core width is changed, the mask must be designed accordingly, which is time consuming. therefore,
It is desirable to be able to easily control the core width.

[Prior Art] Conventional thin film magnetic heads include, for example, those shown in FIG.
There is something like the one shown in (B).

In FIGS. 5(A) and (B), 1 is a slider,
Electromagnetic transducers 3 and 4 are formed on the inner and outer sides of the slider 1 with an insulating layer 2 interposed therebetween, respectively.

6 and 7 show the magnetic poles 5 of these electromagnetic conversion elements 3°4, and the gap length GL of the magnetic poles 5 is, for example, 0.5.
μm1 ball length PL is 3 μm1 core width CW is, for example,
For example, one gap depth GD of 12 μm is formed to be, for example, 1 μm. 6 is a coil, and the coil 6 is formed so as to wind the magnetic pole 5. The planar shape of the magnetic pole 5 is shown in FIG. 8(A).

It is shown in (B), and its tip 5A has a parallel shape,
The core widths CW are formed to have the same dimension.

Next, the formation process will be explained based on FIG. 9.

First, a 5in2 or Al2O3 insulating film 12 is deposited on a mirror-polished clean Al2O3-TiC ceramic substrate 11. Next, the lower magnetic layer 13 is formed, but since an electrodeposition method is used, an electrode film is first deposited, and then,
A positive photoresist is applied, dried, exposed to ultraviolet light, and developed to form a pattern. A film is deposited by electrodeposition only on the areas where the photoresist is removed, forming a magnetic layer pattern.

Next, a nonmagnetic gap layer 14 of 5i is formed by sputtering.
Deposit using n2 or Al2O3.

Next, a first insulating layer 15 and a first coil layer 16 are formed. The first coil layer 16 is formed of Cu by electrodeposition.

After that, the second insulating layer 17, the second coil layer 18, and the third insulating layer 19 are sequentially laminated.

Next, an upper magnetic layer 20 is formed, and a protective layer 21 is formed on the upper magnetic layer 20.

Here, the lower magnetic layer 13 and the upper magnetic layer 20 are
As shown in FIGS. 8(A) and 8(B), the pattern is formed so that the core width CW is the same at the tip.

[Problems to be Solved by the Invention] However, in such a conventional thin film magnetic head, the planar shape of the tip of the magnetic pole is parallel and the core width C
Since patterns are formed so that the W dimensions are the same, if the core width dimension changes, a new mask must be designed, which takes time and increases costs. .

The present invention was made in view of such conventional problems, and by easily controlling the core width,
It is an object of the present invention to provide a thin film magnetic head that does not take much time to manufacture and can reduce costs.

[Means to solve the problem] FIG. 1 is a diagram explaining the principle of the present invention.

In FIG. 27 is an insulating layer, 23 is a magnetic pole, and 26 is a coil, and the tip of the magnetic pole 23 is formed into a wedge shape so that the core width CW becomes gradually smaller toward the tip side.

[Function] In the present invention, the tip of the magnetic pole is formed into a wedge shape, and the core width CW becomes gradually smaller toward the tip. Therefore, the core width CW can be easily controlled by cutting by polishing. can do.

Therefore, for example, the core width CW is 8μms9μm11
It is possible to form a core with a thickness of, for example, 0 μm using one mask, and there is no need to design a new mask each time the core width CW is changed, so that the manufacturing effort can be saved and costs can be reduced.

[Example code] Embodiments of the present invention will be described below based on the drawings.

FIGS. 2 to 4 are diagrams showing an embodiment of the present invention.

In FIGS. 2(A) and 2(B), 11 is a substrate, 12
13A is an insulating layer, 13A is a lower magnetic layer, 14 is a gap layer, 1
5 is a first insulating layer, 16 is a first coil layer, 17 is a second insulating layer, 18 is a second coil layer, 19 is a third insulating layer, 2OA is an upper magnetic layer, and 21 is a protective layer.

The tips of the lower magnetic layer 13A and the upper magnetic layer 2OA are
As shown in FIG. 2(A), it is formed into a wedge shape, and the core width CW becomes gradually smaller toward the tip side.

Next, a method for manufacturing a thin film magnetic head will be explained based on FIG.

In FIG. 3(A), a pattern of a plurality of thin film magnetic heads 22 is formed on a substrate 11. In FIG. The formation of individual patterns is as explained in the conventional example, but the lower magnetic layer 1
As shown in FIG. 4, the magnetic pole 23 consisting of the upper magnetic layer 3A and the upper magnetic layer 2OA has a wedge-shaped tip 23A. To develop this wedge-shaped magnetic pole 23, it is sufficient to change the development pattern.

Next, as shown in FIG. 3(B), a horizontal row of thin film magnetic heads 22 is cut out from the substrate 11.

Next, as shown in FIG. 3(C), since the core width CW of the magnetic pole 23 can be estimated from the resistance value of the monitor resistor 24, the predetermined core width CW can be estimated while monitoring the resistance value of the monitor resistor 24. Polish until .

Then, as shown in FIG. 3(D), the thin film magnetic head 2
Cut out 2 pieces one by one. In addition, in FIG. 3(D), 25 is a terminal, 26 is a coil, and 27 is an insulating layer.

Since the tip 23A of the magnetic pole 23 is formed into a wedge shape in this way, the core width CW can be easily controlled by polishing. For example, if the core width CW is 89 mz
A thickness of 9 μm, 10 pm, etc. can be formed using one mask. Therefore, it is not necessary to design a new mask every time the core width CW is changed, so that manufacturing time is not required and costs can be reduced.

[Effects of the Invention] As described above, according to the present invention, since the tip of the magnetic pole is formed into a wedge shape, the core width can be easily controlled by processing. As a result, there is no need to change the design of the mask, and the manufacturing process does not take much time, so costs can be reduced.

[Brief explanation of drawings]

Fig. 1 is an explanatory diagram of the principle of the present invention, Fig. 2 (A) and (B) are diagrams showing an embodiment of the present invention, Fig. 3 (A-D) are explanatory diagrams of the manufacturing process, and Fig. 4 5(A) and 5(B) are diagrams showing the conventional example, FIG. 6 is an enlarged view of the element portion, FIG. 7 is an enlarged cross-sectional view of the element portion, and FIG. 8(A) , (B) is a diagram showing conventional magnetic poles, No. 9
The figure is an explanatory diagram of the forming process. 5... First insulating layer, 6... First coil layer, 7... Second insulating layer, 8... Second coil layer, 9... Third insulating layer, 0... Upper part Magnetic layer, 1... Protective layer, 2... Thin film magnetic head, 3... Magnetic pole, 3A... Tip, 4... Monitor resistor, 5... Terminal, 6... Coil, 7...Insulating layer. In the figure, 11...Substrate, 12...Insulating layer, 13...Lower magnetic layer, 14...Gap layer,

Claims (1)

[Claims] An insulating layer (27) and a magnetic pole (23) on the substrate (11),
In the thin film magnetic head in which the coil (26) is formed, the tip (23A) of the magnetic pole (23) is set to the core width (CW).
A thin film magnetic head characterized in that it is formed into a wedge shape so that it gradually becomes smaller toward the tip side.