JPH03279212A - Production of target material for forming oxide superconducting thin film - Google Patents

Production of target material for forming oxide superconducting thin film

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Publication number
JPH03279212A
JPH03279212A JP2080054A JP8005490A JPH03279212A JP H03279212 A JPH03279212 A JP H03279212A JP 2080054 A JP2080054 A JP 2080054A JP 8005490 A JP8005490 A JP 8005490A JP H03279212 A JPH03279212 A JP H03279212A
Authority
JP
Japan
Prior art keywords
powder
oxide
carbon mold
mold
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2080054A
Other languages
Japanese (ja)
Inventor
Satotaka Tanimoto
谷本 聡香
Saburo Nagano
三郎 永野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2080054A priority Critical patent/JPH03279212A/en
Publication of JPH03279212A publication Critical patent/JPH03279212A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

PURPOSE:To inhibit formation of cracks by interposing oxide or carbonate powder other than Cu in constituent metallic elements of an oxide superconductor as a mold release agent between a carbon mold and raw material powder. CONSTITUTION:Y2O3 powder, BaCO3 powder and CuO powder are mixed at a prescribed molar ratio and the resultant mixture is calcined and then pulverized to prepare an RE-Ba-Cu-O-based oxide superconductor powder (RE is rare earth element) such as YBa2Cu3O7-delta. On the other hand, oxide or carbonate powder of an element such as Y2O3 powder other than Cu is kneaded with an aqueous solution of an acrylic acid ester copolymer, etc., to produce a slurry, which is subsequently applied to the contact surface of a carbon mold with a sample to a prescribed thickness and dried. The prepared oxide superconductor powder is then filled in the carbon mold, pressurized and heated to afford a target material for forming an oxide superconducting thin film without fixing to the carbon mold and forming cracks.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、Y−Ba−Cu−0系等の銅を含有する酸化
物超電導薄膜をスパッタリング法により形成する場合に
用いられるターゲット材の製造方法に関する。
Detailed Description of the Invention (Industrial Application Field) The present invention is directed to the production of a target material used when forming a copper-containing oxide superconducting thin film such as a Y-Ba-Cu-0 system by a sputtering method. Regarding the method.

(従来技術) 酸化物超電導薄膜の形成には、CVD法、レーザービー
ム蒸着法、反応性蒸着法、スパッタリング法等が採用さ
れている。これらのうちスパッタリング法は大面積化等
が可能であることからその形成方法の確立が進められて
いる。
(Prior Art) CVD methods, laser beam evaporation methods, reactive evaporation methods, sputtering methods, and the like are used to form oxide superconducting thin films. Among these methods, the sputtering method enables the formation of a large area, and therefore efforts are being made to establish a method for forming the same.

このスパッタリング法は、ターゲット材に対してイオン
等を照射し、ターゲット材を構成する原子又は分子をた
たき出し所定の基板上に薄膜を形成させんとするもので
ある。上記酸化物超電導体のように複数の酸化物からな
る薄膜を得る場合、例えば得ようとする薄膜組成と同一
組成からなる焼結体をターゲット材として用いるか、或
いは上記ターゲットの他に補正用ターゲットを設置し、
これらのターゲットから発生する原子または分子の量を
調整しながら形成させる方法が一般に用いられている。
In this sputtering method, a target material is irradiated with ions or the like to knock out atoms or molecules constituting the target material to form a thin film on a predetermined substrate. When obtaining a thin film made of multiple oxides like the above-mentioned oxide superconductor, for example, a sintered body having the same composition as the thin film to be obtained is used as the target material, or a correction target is used in addition to the above target. set up,
A method is generally used in which the target is formed while controlling the amount of atoms or molecules generated from the target.

従来、この種のターゲット材の製造方法としては、6酸
化物超電導体構成元素の酸化物或いは炭酸塩や硝酸塩等
の酸化物形成化合物の粉末を所望により仮焼粉砕した後
にホットプレス焼成や普通焼成する方法が採用されてい
る。
Conventionally, this type of target material has been produced by calcining and pulverizing powders of oxides of hexoxide superconductor constituent elements or oxide-forming compounds such as carbonates and nitrates as desired, followed by hot press firing or ordinary firing. The method is adopted.

(発明が解決しようとする問題点) このようなターゲットに要求される特性としては、成膜
速度を高めるためにそれ自体の密度が高いこと(理論密
度に対する相対密度が約60%以上)、寸法的に同一形
状のものが生産できることが要求されることから、特に
ホットプレス焼成が採用されている。
(Problem to be solved by the invention) The characteristics required of such a target include high density itself (relative density of about 60% or more to the theoretical density) in order to increase the film formation rate, and dimensions. Since it is required to be able to produce products with the same shape, hot press firing is particularly used.

しかしながら、−船釣なカーボン型を用いたホットプレ
スで高温焼成する場合、試料中に銅あるいは銅の酸化物
が存在するとカーボンの存在により還元され、試料とカ
ーボン型と固着するという致命的問題があった。そこで
この固着を避けるために焼成温度を下げることが考えら
れるが、焼結体の密度が低下しターゲット自体の強度が
低下するために支持体とのボンディングの際の割れ等が
生じる恐れがある。
However, when firing at high temperatures in a hot press using a carbon mold, if copper or copper oxides are present in the sample, they will be reduced by the presence of carbon, causing the fatal problem that the sample will stick to the carbon mold. there were. Therefore, in order to avoid this sticking, it is considered to lower the firing temperature, but since the density of the sintered body decreases and the strength of the target itself decreases, there is a risk that cracks may occur during bonding with the support.

また、カーボン型の変わりに固着しにくいアルミナや炭
化珪素等からなる型を用いることも考えられるが、焼結
体中に型の成分が拡散し混入するため、これをターゲッ
トとして用いた場合に得られる膜に悪影響を及ぼす。
It is also possible to use a mold made of alumina, silicon carbide, etc., which is difficult to stick, instead of a carbon mold, but since the components of the mold will diffuse and mix into the sintered body, it will be difficult to obtain a good result if this is used as a target. It has a negative effect on the film.

(発明の目的) 本発明は、上記の問題点を解決し、カーボン型との固着
を防止し、高密度で寸法安定性に優れた超電導体薄膜用
ターゲット材を製造するための方法を提供するにある。
(Object of the Invention) The present invention solves the above-mentioned problems, and provides a method for producing a target material for a superconductor thin film that prevents adhesion to a carbon mold and has high density and excellent dimensional stability. It is in.

(問題点を解決するための手段) 本発明者等は上記の問題点に対して検討を重ねた結果、
ホットプレス焼成に際して、銅を含有する試料粉末とカ
ーボン型との間に酸化物超電導体形成元素のうち銅以外
の元素の酸化物あるいは酸化物形成化合物粉末を介在さ
せて焼成を行うことにより焼結体のカーボン型への固着
もなく、また、ターゲット材への不純物の混入もなく、
高温焼成ができることから高密度のターゲットを安定し
て製造できることを知見し、本発明に至った。
(Means for solving the problems) As a result of repeated studies on the above problems, the inventors have found that
Sintering is achieved by interposing an oxide or oxide-forming compound powder of an element other than copper among the oxide superconductor-forming elements between the copper-containing sample powder and the carbon mold during hot press firing. There is no adhesion of the body to the carbon mold, and there is no contamination of impurities into the target material.
It was discovered that high-density targets can be stably manufactured because high-temperature firing is possible, leading to the present invention.

本発明により作成する酸化物超電導薄膜形成用ターゲッ
トは、主としてRE−Ba−Cu−0系(RE:希土類
元素)酸化物超電導薄膜の形成に有用であり、よって本
発明における酸化物超電導体形成元素とは、希土類元素
、アルカリ土類元素および銅元素を指称する。
The target for forming an oxide superconducting thin film produced according to the present invention is mainly useful for forming RE-Ba-Cu-0-based (RE: rare earth element) oxide superconducting thin films, and therefore the oxide superconductor-forming element in the present invention refers to rare earth elements, alkaline earth elements, and copper elements.

本発明の製造方法を詳述すると、まずターゲット形成用
の混合粉末として前記酸化物超電導薄膜形成元素の酸化
物粉末あるいは焼成により酸化物を形成する炭酸塩や硝
酸塩等の粉末を得ようとする薄膜と同一の組成からなる
ように混合するか、または、薄膜形成時の補助的ターゲ
ット材として銅酸化物、あるいは銅と他の薄膜構成元素
の1種またはそれ以上の酸化物との組合せで所定の割合
で適宜混合する。
To explain the manufacturing method of the present invention in detail, first, as a mixed powder for target formation, an oxide powder of the above-mentioned oxide superconducting thin film-forming element or a powder of carbonate, nitrate, etc. that forms an oxide by firing is obtained. Copper oxide or a combination of copper and one or more oxides of other thin film constituent elements can be used as an auxiliary target material during thin film formation. Mix in appropriate proportions.

次に、この混合粉末を直接ホットプレスするか、または
−旦成形後にホットプレスする。
This mixed powder is then hot-pressed directly or after being molded.

また、混合粉末は焼成に付される前に仮焼、粉砕し、得
ようとする複合酸化物焼結体と同一組成の粉末を作成す
ることが望ましい。
Further, it is preferable that the mixed powder is calcined and pulverized before being subjected to firing to create a powder having the same composition as the composite oxide sintered body to be obtained.

次に、本発明のホットプレス焼成について第1図を参照
して説明する。図中、1はダイ、2はプレスパンチ、3
は試料であり、ダイ1およびプレスパンチ2はカーボン
型である。本発明によれば、焼成に際し、ダイ1と粉末
試料3ならびにパンチ2と試料3との間に離型材4とし
て酸化物超電導体の構成元素のうち銅を除く他の元素の
酸化物あるいは炭酸塩を介在させて焼成する。具体的に
は、焼成に先立ち各カーボン型の表面に上記の粉末をハ
ケやローラー等で0.1〜1mm程度塗布すればよい。
Next, hot press firing of the present invention will be explained with reference to FIG. In the figure, 1 is a die, 2 is a press punch, 3
is a sample, and die 1 and press punch 2 are carbon molds. According to the present invention, during firing, an oxide or carbonate of another element other than copper among the constituent elements of the oxide superconductor is used as a mold release material 4 between the die 1 and the powder sample 3 and the punch 2 and the sample 3. Fired with the help of Specifically, prior to firing, the above powder may be applied to the surface of each carbon mold to a thickness of about 0.1 to 1 mm using a brush, roller, or the like.

例えばY−Ba−Cu−○組成や、Ba−Cu−〇組成
からなるターゲットを作成する場合は、離型材としては
Y2O3やBaC0z粉末等を使用し、300〜100
0°Cの温度でホットプレス焼成すればよい。
For example, when creating a target with a Y-Ba-Cu-○ composition or a Ba-Cu-○ composition, use Y2O3 or BaC0z powder as a mold release material, and
Hot press firing may be performed at a temperature of 0°C.

上記の方法によれば、従来法により離型材を全く用いず
に焼成すると焼結体とカーボン型が固着してほとんど取
り出すことができないのに対して、本発明の上記方法に
従えば、カーボン型との固着は殆ど見られず、一部焼結
体の表面に離型材が付着するものの軽く研磨することに
より簡単に除去することができる。
According to the above method, when the sintered body and the carbon mold are baked without using any mold release material in the conventional method, the sintered body and the carbon mold stick together and can hardly be taken out, whereas according to the above method of the present invention, the carbon mold There is hardly any adhesion to the sintered body, and although some mold release material adheres to the surface of the sintered body, it can be easily removed by light polishing.

以下、本発明を詳述する。The present invention will be explained in detail below.

(実施例1) CuO粉末とBaC0z粉末をモル比で1=1になるよ
うに秤量混合した後、大気中、900°Cで5時間仮焼
し粉砕した後、再度同条件で仮焼し、ジェットミル粉砕
して平均粒径3μ閣のBaCu○3粉末を得た。
(Example 1) CuO powder and BaC0z powder were weighed and mixed so that the molar ratio was 1=1, and then calcined and crushed in the air at 900°C for 5 hours, and then calcined again under the same conditions. It was pulverized with a jet mill to obtain BaCu○3 powder with an average particle size of 3 μm.

一方、B a CO3粉末10gを乳鉢に取り、アクリ
ル酸エステル共重合体の4%濃度の水溶液を5cc添加
し混練して均一なスラリーを作成した。
On the other hand, 10 g of Ba CO3 powder was placed in a mortar, and 5 cc of a 4% aqueous solution of an acrylic acid ester copolymer was added and kneaded to prepare a uniform slurry.

得られたスラリーを直径105mmのカーボン型の試料
接触面に厚み0.2 m mでうずく塗布し乾燥した。
The obtained slurry was applied to a sample contacting surface of a carbon mold having a diameter of 105 mm to a thickness of 0.2 mm and dried.

先に作成したBaCuO3仮焼粉末を前述のカーボン型
に充填し、圧力50kg/cm2をかけ、誘導加熱によ
り昇温速度20°C/ m i nで昇温し、400°
Cで20分間ホットプレス焼成した後、室温まで冷却し
カーボン型より焼結体を取り出した。
The previously prepared BaCuO3 calcined powder was filled into the carbon mold described above, a pressure of 50 kg/cm2 was applied, and the temperature was raised by induction heating at a temperature increase rate of 20 °C/min to 400 °C.
After hot press firing at C for 20 minutes, the sintered body was cooled to room temperature and taken out from the carbon mold.

その結果、カーボン型と焼結体の固着や焼結体へのクラ
ックはなく、対理論密度比83%のBaCuO3焼結体
が得られた。
As a result, a BaCuO3 sintered body with a theoretical density ratio of 83% was obtained without any adhesion between the carbon mold and the sintered body or cracks in the sintered body.

また、焼結体の表面には離型材のBaCuO3が付着し
ていたが、表面を軽く研磨することにより簡単に除去で
きた。
Furthermore, although BaCuO3, a mold release agent, was attached to the surface of the sintered body, it could be easily removed by lightly polishing the surface.

(比較例1) 実施例1において、離型材を全く塗布しない以外は全く
同様にして焼成を行った。その結果、焼結体はカーボン
型と強固に固着し取り出すことが出来なかった。
(Comparative Example 1) Firing was performed in exactly the same manner as in Example 1 except that no mold release material was applied. As a result, the sintered body was firmly attached to the carbon mold and could not be taken out.

(比較例2) ホットプレス焼成温度を330℃とした以外は全く比較
例1と同様にして焼成を行った。その結果、焼成温度が
低いにもかかわらず、焼結体が固着しており、カーボン
型を割り焼結体の密度を測定したところ63%であった
(Comparative Example 2) Firing was performed in the same manner as Comparative Example 1 except that the hot press firing temperature was 330°C. As a result, the sintered body was found to be solid despite the low firing temperature, and when the carbon mold was broken and the density of the sintered body was measured, it was 63%.

(実施例2) yz 03粉末、B a CO3粉末、CuO粉末が0
.5:2:3のモル比になるように秤量混合し大気中で
900“Cで10時間仮焼後粉砕し、これを3回繰り返
し平均粒径3gtnのY B a zCu zc)t−
6粉末を得た。
(Example 2) yz 03 powder, B a CO3 powder, CuO powder was 0
.. The mixture was weighed and mixed to have a molar ratio of 5:2:3, calcined in the air at 900"C for 10 hours, and then crushed. This was repeated three times to produce YBa zCu zc)t- with an average particle size of 3 gtn.
6 powder was obtained.

一方、平均粒径5μmのY2O3粉末10gを乳鉢に取
り、アクリル酸エステル共重合体の4%濃度の水溶液を
6cc添加し、且つアンモニア水0、2 c c添加し
、混練して均一なスラリーを作成した。得られたスラリ
ーを直径105mmのカーボン型の試料接触面に厚み0
.2 m mでうずく塗布し乾燥した。
On the other hand, take 10 g of Y2O3 powder with an average particle size of 5 μm in a mortar, add 6 cc of a 4% concentration aqueous solution of acrylic acid ester copolymer, and 0.2 cc of ammonia water, and knead to form a uniform slurry. Created. The obtained slurry was applied to the sample contact surface of a carbon mold with a diameter of 0.
.. It was coated in a layer of 2 mm and dried.

先に作成したY B a 2Cu 307−/粉末を前
記のカーボン型に充填し、圧力50kg/cm2をかけ
、誘導加熱により昇温速度2o″C/minで昇温シ、
600°Cで20分間ホットプレス焼成した後、室温ま
で冷却しカーボン型より焼結体を取り出した。その結果
、カーボン型と焼結体の固着や焼結体へのクラックはな
く、対理論密度比65%のYBazCuzC)r−i焼
結体が得られた。
The previously prepared YB a 2Cu 307-/powder was filled into the carbon mold, a pressure of 50 kg/cm2 was applied, and the temperature was raised by induction heating at a heating rate of 2 o''C/min.
After hot press firing at 600°C for 20 minutes, the sintered body was cooled to room temperature and taken out from the carbon mold. As a result, a YBazCuzC)ri sintered body with a theoretical density ratio of 65% was obtained without adhesion between the carbon mold and the sintered body or cracks in the sintered body.

焼結体表面には離型材のY2O3粉末が付着していたが
、表面を軽く研磨することにより簡単に除去できた。
Y2O3 powder as a mold release agent was attached to the surface of the sintered body, but it could be easily removed by lightly polishing the surface.

(比較例3) 実施例2において、離型材を全く塗布せず、焼成温度を
400°Cに設定する以外は全く同様にして焼成を行っ
た。その結果、焼結体はカーボン型と強固に固着し取り
出すことが出来ず、カーボン型を割り、焼結体を取り出
し密度を測定したところ、42%であった。
(Comparative Example 3) Firing was performed in exactly the same manner as in Example 2, except that no mold release material was applied and the firing temperature was set to 400°C. As a result, the sintered body was firmly attached to the carbon mold and could not be taken out. When the carbon mold was broken and the sintered body was taken out and its density was measured, it was found to be 42%.

(発明の効果) 以上、詳述した通り、本発明によれば、酸化物超電導の
薄膜形成用に用いられるターゲットとして、特に銅を含
有するターゲットをポットプレス法により作成するに際
して、ホットプレスのカーボン型と試料との間に酸化物
超電導体の構成元素のうち銅基外の元素の酸化物や炭酸
塩等からなる粉末を介在することにより、これらの粉末
が離型材として作用し、試料とカーボン型との固着なく
、また不純物の混入なしに高密度のターゲット焼結体を
得ることができる。
(Effects of the Invention) As described in detail above, according to the present invention, hot-press carbon By interposing powders consisting of oxides and carbonates of elements other than copper among the constituent elements of the oxide superconductor between the mold and the sample, these powders act as a mold release agent, and the sample and carbon are bonded together. A high-density target sintered body can be obtained without sticking to the mold and without contaminating impurities.

これにより、酸化物起電導薄膜をスパッタリング法によ
り形成する場合、成膜速度を向上するとともに高純度な
膜を形成することができる。
Thereby, when an oxide conductive thin film is formed by a sputtering method, it is possible to improve the film formation rate and form a highly pure film.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の製造方法を説明するための概略図で
あり、図中、1はダイ、2はブレスノ々ンチ、3は試料
、4は離型材をそれぞれ示す。
FIG. 1 is a schematic diagram for explaining the manufacturing method of the present invention, and in the figure, 1 is a die, 2 is a punch, 3 is a sample, and 4 is a mold release material.

Claims (1)

【特許請求の範囲】[Claims] 酸化物超電導体を構成する金属元素のうち少なくとも銅
元素を含有する酸化物粉末あるいは酸化物形成化合物粉
末からなる試料をカーボン型に充填してホットプレス焼
成するターゲット材の製造方法において、前記カーボン
型と前記粉末との間に離型材として前記超電導構成金属
元素のうち銅元素以外の元素の酸化物もしくは炭酸塩粉
末を介在したことを特徴とする酸化物超電導薄膜形成用
ターゲット材の製造方法。
A method for producing a target material in which a carbon mold is filled with a sample made of an oxide powder or an oxide-forming compound powder containing at least a copper element among the metal elements constituting the oxide superconductor and then hot-press fired. A method for producing a target material for forming an oxide superconducting thin film, characterized in that an oxide or carbonate powder of an element other than copper among the metal elements constituting the superconductor is interposed between the superconducting metal elements and the powder as a mold release agent.
JP2080054A 1990-03-28 1990-03-28 Production of target material for forming oxide superconducting thin film Pending JPH03279212A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2080054A JPH03279212A (en) 1990-03-28 1990-03-28 Production of target material for forming oxide superconducting thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2080054A JPH03279212A (en) 1990-03-28 1990-03-28 Production of target material for forming oxide superconducting thin film

Publications (1)

Publication Number Publication Date
JPH03279212A true JPH03279212A (en) 1991-12-10

Family

ID=13707525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2080054A Pending JPH03279212A (en) 1990-03-28 1990-03-28 Production of target material for forming oxide superconducting thin film

Country Status (1)

Country Link
JP (1) JPH03279212A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013155425A (en) * 2012-01-31 2013-08-15 Fujikura Ltd Target for making superconductive thin film, method of manufacturing the same, and method of manufacturing oxide superconductive wire rod
US8573651B2 (en) 2005-07-12 2013-11-05 Toppan Printing Co., Ltd. Thread and method of manufacturing the same, counterfeit preventive paper using thread, counterfeit preventive printed material, and method of judging authenticity utilizing them
JP2014162973A (en) * 2013-02-27 2014-09-08 Fujikura Ltd Target for forming oxide superconductive thin film, production method thereof, and production method of oxide superconductive wire rod

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8573651B2 (en) 2005-07-12 2013-11-05 Toppan Printing Co., Ltd. Thread and method of manufacturing the same, counterfeit preventive paper using thread, counterfeit preventive printed material, and method of judging authenticity utilizing them
JP2013155425A (en) * 2012-01-31 2013-08-15 Fujikura Ltd Target for making superconductive thin film, method of manufacturing the same, and method of manufacturing oxide superconductive wire rod
JP2014162973A (en) * 2013-02-27 2014-09-08 Fujikura Ltd Target for forming oxide superconductive thin film, production method thereof, and production method of oxide superconductive wire rod

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