JPH0328365Y2 - - Google Patents
Info
- Publication number
- JPH0328365Y2 JPH0328365Y2 JP6155883U JP6155883U JPH0328365Y2 JP H0328365 Y2 JPH0328365 Y2 JP H0328365Y2 JP 6155883 U JP6155883 U JP 6155883U JP 6155883 U JP6155883 U JP 6155883U JP H0328365 Y2 JPH0328365 Y2 JP H0328365Y2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- electrode
- supported
- limit position
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 107
- 239000007788 liquid Substances 0.000 claims description 31
- 239000000126 substance Substances 0.000 claims description 27
- 238000012360 testing method Methods 0.000 claims description 25
- 239000000243 solution Substances 0.000 claims description 22
- 238000005259 measurement Methods 0.000 claims description 16
- 238000007664 blowing Methods 0.000 claims description 4
- 239000012085 test solution Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 48
- 239000012535 impurity Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 3
- 230000001174 ascending effect Effects 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 230000033116 oxidation-reduction process Effects 0.000 description 2
- 230000020477 pH reduction Effects 0.000 description 2
- 239000008400 supply water Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000001139 pH measurement Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Automatic Analysis And Handling Materials Therefor (AREA)
Description
【考案の詳細な説明】
この考案は、たとえばPH電極や酸化還元電位電
極などの電極を洗浄するための電極洗浄装置に関
する。[Detailed Description of the Invention] This invention relates to an electrode cleaning device for cleaning electrodes such as PH electrodes and redox potential electrodes.
水溶液などの被検液のPHあるいは酸化還元電位
(ORP)の測定は、被検液に直接PHあるいは酸化
還元電位(ORP)電極を浸して行なわれる。と
ころで、これらの電極は常時被検液に浸されてPH
や酸化還元電位を測定するのであるが、電極表面
のガラス膜あるいはアンチモン膜に被検液中の物
質が付着して不純物皮膜を形成するため、正確な
測定をするには頻繁に電極を被検液から引揚げて
不純物皮膜を洗浄する必要がある。 The PH or oxidation-reduction potential (ORP) of a test liquid such as an aqueous solution is measured by dipping a PH or oxidation-reduction potential (ORP) electrode directly into the test liquid. By the way, these electrodes are constantly immersed in the test liquid and the pH is
However, since substances in the test solution adhere to the glass film or antimony film on the electrode surface and form an impurity film, it is necessary to test the electrode frequently for accurate measurements. It is necessary to remove it from the liquid and clean the impurity film.
そこで、この考案は以上の点に鑑み成されたも
のであつて、すなわちこの考案は、人手を介する
ことなしに、電極を被検液から引揚げて確実に洗
浄除去し、かつ洗浄後に再び被検液に浸すことが
でき、測定中の電極の洗浄作業の自動化が図れる
電極洗浄装置を提供することを目的とする。 Therefore, this invention was created in view of the above points, namely, the invention is to remove the electrode from the test liquid without any manual intervention, and to reliably wash and remove the electrode. An object of the present invention is to provide an electrode cleaning device that can be immersed in a test solution and that can automate the cleaning work of electrodes during measurement.
したがつて、この目的を達成するためにこの考
案は、被検液を収容する測定タンクの上部に設置
され、該被検液に浸された電極を引揚げて上限位
置に支持すると共に該電極を下降して洗浄タンク
内の洗浄位置に支持して洗浄用薬液に浸し、かつ
洗浄終了後に該洗浄用薬液より引揚げたのち下降
して下限位置に設定して上記被検液に再び浸すよ
うにした電極洗浄装置であつて、上記電極を被検
液から引揚げて上限位置に支持すると共に該上限
位置より下降して上記洗浄位置に支持して上記洗
浄用薬液に浸しかつ洗浄終了後に洗浄用薬液より
引揚げたのちに上記下限位置に支持する電極昇降
装置と、上記電極が上記洗浄位置に支持され前後
に上記洗浄用薬液の供給および該洗浄用薬液中に
空気の吹込みが開始されかつ電極が洗浄位置に支
持されて洗浄される際に洗浄用薬液の入れ換えが
自在とされる洗浄タンクと、上記電極が上限位置
に支持されると上記洗浄タンクを電極の真下に移
動させると共に洗浄終了後に電極が洗浄用薬液か
ら引揚げられると洗浄タンクを電極の昇降経路外
に後退させるアクチユエータと、を少くとも具備
することを特徴とする。 Therefore, in order to achieve this purpose, this invention is installed at the top of a measurement tank containing a test liquid, and lifts up an electrode immersed in the test liquid and supports it at the upper limit position, and also supports the electrode at the upper limit position. is lowered, supported at the cleaning position in the cleaning tank, and immersed in the cleaning chemical solution, and after cleaning is finished, lifted from the cleaning chemical solution, lowered, set to the lower limit position, and immersed in the test liquid again. The electrode cleaning device is characterized in that the electrode is pulled up from the test liquid and supported at the upper limit position, lowered from the upper limit position, supported at the cleaning position, immersed in the cleaning chemical solution, and cleaned after cleaning is completed. The electrode lifting device supports the electrode at the lower limit position after being lifted from the cleaning chemical, and the electrode is supported at the cleaning position and starts supplying the cleaning chemical and blowing air into the cleaning chemical. and a cleaning tank in which the cleaning chemical solution can be freely exchanged when the electrode is supported at the cleaning position and being cleaned; and when the electrode is supported at the upper limit position, the cleaning tank is moved to directly below the electrode and cleaning is performed. The present invention is characterized in that it includes at least an actuator that retreats the cleaning tank out of the electrode lifting path when the electrode is lifted from the cleaning chemical solution after completion of the cleaning.
以下、図示の一実施例に基づいてこの考案を説
明する。 This invention will be explained below based on an illustrated embodiment.
第1図は、この考案に係る電極洗浄装置を示し
ており、この電極洗浄装置は、被検液Lが収容さ
れた測定タンクTの上部に設置されていて、この
測定タンクTの上部の電極挿入口M付近に立設さ
れた支柱1と、ワイヤ2および支柱1の滑車3,
3を介して棒状のPH電極4が取り付けられ、該PH
電極4を上昇あるいは下降させる電極昇降装置と
してのモータ5と、上面が開口され測定タンクT
の上部位置に設けられたレール6上を進退操作ア
クチユエータとしての進退操作シリンダ7の伸縮
作動により進退移動自在の洗浄タンク8と、該洗
浄タンク8内に収納されるPH電極4の洗浄用薬液
としての水Wの水位を検知して所定の上限水位D
に達すると後述の給水電磁弁12aを閉成すると
共に、排水電磁弁14aを開成する液面レベルス
イツチ9と、測定タンクTの電極挿入口Mに取り
付けられて測定タンクT内の被検液Lの蒸散を防
ぐと共に中央部には上記PH電極4の挿入用切込み
10aが設けられたたとえばゴム膜などの可とう
性を有する遮閉膜10と、上記PH電極4より得ら
れる測定値を処理してPH値を表示、記録すると共
にPH電極4を測定タンクTより引揚げる直前での
測定値を処理してそのPH値を記憶する測定処理装
置11を有している。 FIG. 1 shows an electrode cleaning device according to this invention, which is installed at the top of a measurement tank T containing a test liquid L, and the electrodes at the top of the measurement tank T. A column 1 erected near the insertion port M, a wire 2 and a pulley 3 of the column 1,
A rod-shaped PH electrode 4 is attached via 3, and the PH
A motor 5 as an electrode lifting device for raising or lowering the electrode 4, and a measuring tank T with an open top surface.
A cleaning tank 8 that can freely move forward and backward on a rail 6 provided at an upper position by the telescopic operation of a forward/backward operation cylinder 7 as a forward/backward operation actuator, and a chemical solution for cleaning the PH electrode 4 stored in the cleaning tank 8. Detects the water level of water W and sets it to a predetermined upper limit water level D.
A liquid level switch 9 that closes a water supply solenoid valve 12a (described later) and opens a drain solenoid valve 14a when the water level reaches the level 1, and a liquid level switch 9 that is attached to the electrode insertion port M of the measurement tank T and controls the liquid level L in the measurement tank T. A flexible shielding film 10, such as a rubber film, which prevents evaporation of It has a measurement processing device 11 that displays and records the PH value, processes the measured value immediately before lifting the PH electrode 4 from the measurement tank T, and stores the PH value.
上記PH電極4は、被検液LのPH制御のために使
用されるものであつて、PH電極4の下端電極部4
aは、第1図に示すように金属電極4bが取り付
けられておりその周囲はガラス膜4cで被覆され
ている。また、このPH電極4の下端電極部4a
は、モータ5の巻上げ・巻降し操作によつて該下
端電極部4aの下端面が第1図および第2図A,
B,Cに示す下限位置、上限位置および洗浄位置
SL1,SL2,SL3に設定支持できるようになつて
いる。詳細には、下限位置SL1は、測定タンクT
内の被検液Lに下端電極部4aが浸せる位置とさ
れ、下限位置SL2は、上記洗浄タンク8の高さH
より上位にあり、洗浄位置SL3は、洗浄タンク8
の水位Dより下位でかつ少くともすでに被検液L
に浸された下端電極部4aが水Wに浸すことがで
きる位置に設定されている。 The PH electrode 4 is used for PH control of the test liquid L, and is the lower end electrode portion 4 of the PH electrode 4.
As shown in FIG. 1, a is attached with a metal electrode 4b and its periphery is covered with a glass film 4c. In addition, the lower end electrode part 4a of this PH electrode 4
1 and 2A, the lower end surface of the lower end electrode portion 4a is lowered by the winding/unwinding operation of the motor 5.
Lower limit position, upper limit position and cleaning position shown in B and C
It can be set to SL 1 , SL 2 , and SL 3 . In detail, the lower limit position SL 1 is the measuring tank T
The lower end electrode part 4a is immersed in the test liquid L in the tank, and the lower limit position SL 2 is the height H of the cleaning tank 8.
Washing position SL 3 , which is higher up, is washing tank 8.
is lower than the water level D of the test liquid L
The lower end electrode portion 4a immersed in water W is set at a position where it can be immersed in water W.
次に、上記洗浄タンク8は、進退操作シリンダ
7が伸長されると第2図Bに示すようにPH電極4
の真下の設定位置に進み、また同シリンダ7が収
縮されると、第1図および第2図Aに示すように
PH電極Hの上昇・下降に支障のない昇降経過外の
後退位置に後退されるようになつている。 Next, when the advancing/retracting operation cylinder 7 is extended, the cleaning tank 8 is moved to the PH electrode 4 as shown in FIG. 2B.
When the cylinder 7 is retracted, the cylinder 7 is moved to the set position directly below the cylinder 7, as shown in Figures 1 and 2A.
The PH electrode H is designed to be retracted to a retracted position outside the ascending/descending course where there is no hindrance to the ascending and descending of the PH electrode H.
この洗浄タンク8には、第3図と第4図に示す
ように水Wを洗浄タンク8内に供給する給水管系
12と、該洗浄タンク8内の水Wに空気吹込みを
する空気管系13と、洗浄タンク8内の水Wを排
水する排水管系14を有している。上記給水管系
12は、給水電磁弁12aを介して図示しない給
水源に接続されており、洗浄タンク8の四方側壁
8a,8b,8c,8dに各々設けられた給水ノ
ズル12bより給水できるようになつていて、上
記給水電磁弁12aは、洗浄タンク8の水位が所
定の上限水位Dに達するのと液面レベルスイツチ
9により閉鎖されるようになつている。また、上
記空気管系13は空気用電磁弁13aを介して図
示しない空気源に接続されており、空気ノズル1
3bは第3図に示すように洗浄タンク8の底部に
取り付けられている。さらに、上記排水管系14
は、排水電磁弁14aを経て洗浄タンク8の底部
の排出口8eに接続されており、この排水電磁弁
14aは、洗浄タンク8の水位が所定の上限水位
Dに達すると液面レベルスイツチ9により閉鎖さ
れるようになつている。 As shown in FIGS. 3 and 4, this cleaning tank 8 includes a water supply pipe system 12 that supplies water W into the cleaning tank 8, and an air pipe that blows air into the water W in the cleaning tank 8. system 13, and a drain pipe system 14 for draining water W in the cleaning tank 8. The water supply pipe system 12 is connected to a water supply source (not shown) via a water supply electromagnetic valve 12a, and is configured so that water can be supplied from water supply nozzles 12b provided on each of the four side walls 8a, 8b, 8c, and 8d of the cleaning tank 8. The water supply solenoid valve 12a is closed by the liquid level switch 9 when the water level in the cleaning tank 8 reaches a predetermined upper limit water level D. Further, the air pipe system 13 is connected to an air source (not shown) via an air solenoid valve 13a, and the air nozzle 1
3b is attached to the bottom of the cleaning tank 8 as shown in FIG. Furthermore, the drain pipe system 14
is connected to a discharge port 8e at the bottom of the cleaning tank 8 via a drainage solenoid valve 14a, and this drainage solenoid valve 14a is activated by the liquid level switch 9 when the water level in the cleaning tank 8 reaches a predetermined upper limit water level D. It's about to be closed.
尚、上記PH電極4の下端電極部4aが支持レベ
ルSL1,SL2,SL3の各レベルに停止する時間お
よび洗浄間隔の設定、換言すれば洗浄回数は、タ
イマ(図示せず)によつて設定できるようになつ
ている。 The time during which the lower end electrode portion 4a of the PH electrode 4 stops at each support level SL 1 , SL 2 , SL 3 and the cleaning interval, in other words, the number of cleanings, are determined by a timer (not shown). It is now possible to configure settings.
次に、以上の構成における作用を説明する。 Next, the operation of the above configuration will be explained.
第2図Aに示すように、被検液LにPH電極4が
浸されて被検液LのPHが測定されている状態で
は、洗浄タンク8は後退位置にある。この測定中
のPH電極4をモータ5の正回転により被検液L中
より引揚げて、下限位置SL1から第2図Bの上限
位置SL2まで上昇させる。尚この引揚の直前に、
PH電極4の測定値は測定値処理装置11に記憶さ
せておく。 As shown in FIG. 2A, when the PH electrode 4 is immersed in the test liquid L and the PH of the test liquid L is being measured, the cleaning tank 8 is in the retracted position. The PH electrode 4 under measurement is lifted out of the test liquid L by forward rotation of the motor 5 and raised from the lower limit position SL 1 to the upper limit position SL 2 in FIG. 2B. Just before this withdrawal,
The measured value of the PH electrode 4 is stored in the measured value processing device 11.
次に、第2図AからBに示すように進退操作シ
リンダ7を伸長作動させてPH電極4の真下に洗浄
タンク8を進ませて位置決めする。そして、給水
電磁弁12aおよび電気用電磁弁13aを開成す
ると共に排水電磁弁14aを閉成して、水Wと空
気を洗浄タンク8内に供給すると共に、モータ5
を逆回転してPH電極4を下降し下端電極部4aを
洗浄位置SL3まで下げる。 Next, as shown in FIGS. 2A to 2B, the advancing/retracting operation cylinder 7 is extended and the cleaning tank 8 is advanced and positioned directly below the PH electrode 4. Then, the water supply solenoid valve 12a and the electric solenoid valve 13a are opened, and the drain solenoid valve 14a is closed to supply water W and air into the cleaning tank 8, and the motor 5
is rotated in the opposite direction to lower the PH electrode 4 and lower the lower end electrode portion 4a to the cleaning position SL3 .
しかして、洗浄タンク8内の水Wに下端電極部
4aが浸され、該下端電極部4aに付着した不純
物膜は、ブラシなどの用具を用いなくとも各給水
ノズル12bからの水圧および空気ノズル13b
からの水W中への空気吹込みによるバブリング
(あわ立て)により相乗効果的に除去洗浄される。
尚、洗浄時間はタイマによつて不純物膜の付着力
程度に合わせてたとえば数分間に設定されてい
る。この洗浄作業の際に、水位が所定の上限水位
Dに達すると、液面レベルスイツチ9が作動して
給水電磁弁12aを閉成すると共に排水電磁弁1
4aを開成し、洗浄タンク8内のよごれた水Wを
排水口8eから排水管系14を経て排出する。そ
して一定時間後、すなわち、よごれた水Wが排出
されると再び給水電磁弁12bを開成すると共に
排水電磁弁14aを閉成して給水を行なう。した
がつて、この給排水を繰返すことで、洗浄中PH電
極4から除去洗浄されて水W中に出る不純物が洗
浄タンク8外に排出され、代わりに新しい水Wで
PH電極4の下端電極部4aを洗浄できるので水W
の洗浄効果の低下を生ずることなく速やかにPH電
極4の洗浄が行なえる。 Therefore, the lower end electrode part 4a is immersed in the water W in the cleaning tank 8, and the impurity film attached to the lower end electrode part 4a can be removed by the water pressure from each water supply nozzle 12b and the air nozzle 13b without using tools such as brushes.
It is removed and washed synergistically by bubbling (frothing) by blowing air into the water W.
Note that the cleaning time is set to, for example, several minutes by a timer depending on the degree of adhesion of the impurity film. During this cleaning work, when the water level reaches a predetermined upper limit water level D, the liquid level switch 9 operates to close the water supply solenoid valve 12a and drain solenoid valve 1.
4a is opened, and the dirty water W in the cleaning tank 8 is discharged from the drain port 8e through the drain pipe system 14. After a certain period of time, that is, when the dirty water W is discharged, the water supply solenoid valve 12b is opened again, and the drain solenoid valve 14a is closed to supply water. Therefore, by repeating this water supply and drainage, the impurities removed from the PH electrode 4 during cleaning and released into the water W are discharged to the outside of the cleaning tank 8, and replaced with fresh water W.
The lower end electrode part 4a of the PH electrode 4 can be washed with water.
The PH electrode 4 can be quickly cleaned without reducing the cleaning effect.
次に、PH電極4の洗浄完了後、給水電磁弁12
aと空気用電磁弁13aを閉成すると共に排水電
磁弁13aを閉成すると共に排水電磁弁14aを
開成して、洗浄タンク8内の水Wを排水し、かつ
モータ5を正回転してPH電極4を洗浄タンク8内
より上限位置SL2まで引揚げ第2図Bに示す状態
にする。そして、進退操作シリンダ7を収縮して
洗浄タンク8を後退させると共に、モータ5を回
転してPH電極4を下降させて遮閉膜10の切込み
10aより測定タンクTの被検液L中に下端電極
部4aを再び浸し下限位置SL1でPH測定再開す
る。 Next, after the cleaning of the PH electrode 4 is completed, the water supply solenoid valve 12
A and the air solenoid valve 13a are closed, the drain solenoid valve 13a is closed, and the drain solenoid valve 14a is opened to drain the water W in the cleaning tank 8, and the motor 5 is rotated forward to set the pH. The electrode 4 is pulled up from the cleaning tank 8 to the upper limit position SL 2 and placed in the state shown in FIG. 2B. Then, the forward/backward operation cylinder 7 is contracted to move the cleaning tank 8 backward, and the motor 5 is rotated to lower the PH electrode 4 so that the lower end enters the test liquid L of the measurement tank T through the notch 10a of the shielding membrane 10. The electrode part 4a is immersed again and the PH measurement is restarted at the lower limit position SL 1 .
上述したような要領で洗浄すれば、確実にPH電
極4の下端電極部4aに付着した不純物膜を取り
除くことができるが、PH電極4の引揚げ時間間隔
はタイマで設定されており、その時間間隔を変更
することにより洗浄回数をPH電極4のよごれの程
度に応じて可変できる。また、PH電極4を引揚げ
る直前に測定し、その測定値を記憶させ、洗浄開
始から終了までの間その測定値を固定保持し被検
液の薬注系および制御系をメータ表示からカツト
オフして現状維持指令を出すので、測定値処理装
置11の調節動作に悪影響を与えない。 By cleaning as described above, the impurity film attached to the lower end electrode part 4a of the PH electrode 4 can be reliably removed, but the time interval for lifting the PH electrode 4 is set by a timer, and the By changing the interval, the number of cleaning times can be varied depending on the degree of dirt on the PH electrode 4. In addition, the measurement value is memorized immediately before lifting the PH electrode 4, and the measurement value is fixedly held from the start to the end of cleaning, and the chemical injection system and control system for the test liquid are cut off from the meter display. Since the command to maintain the status quo is issued, the adjustment operation of the measured value processing device 11 is not adversely affected.
尚、上述した実施例では、PH電極の洗浄の例を
示しているが、ORP電極など他の電極を洗浄す
る際にも同様の要領で行えばよいことは勿論であ
る。また、洗浄用薬液として水に洗浄剤を添加し
たものあるいは洗浄剤のみを用いてもよい。さら
に、洗浄タンク8の給排水は、上限水位Dを検知
して給水および排水電磁弁12a,14aを開閉
操作して行なう形式のみならず、たとえば上限水
位Dの位置に排水口を設けて常に上限水位Dを越
える水は排水口より外部排出できるようにしても
洗浄タンク内の水の入れ換えができ電極の洗浄を
確実に行なうことができる。さらに、洗浄用薬液
と空気吹込みは、電極を洗浄位置SL3に支持した
後に行なつてもかまわない。 In the above embodiment, an example of cleaning the PH electrode is shown, but it goes without saying that cleaning of other electrodes such as the ORP electrode may be performed in a similar manner. Further, as the cleaning chemical solution, a solution obtained by adding a cleaning agent to water or only a cleaning agent may be used. Furthermore, the supply and drainage of the cleaning tank 8 is not only carried out by detecting the upper limit water level D and opening and closing the water supply and drain solenoid valves 12a and 14a, but also by providing a drain port at the position of the upper limit water level D so that the upper limit water level is always maintained. Even if water exceeding D can be discharged to the outside from the drain port, the water in the cleaning tank can be replaced and the electrodes can be cleaned reliably. Furthermore, the cleaning chemical solution and air blowing may be performed after the electrode is supported at the cleaning position SL3 .
以上説明したように、この考案によれば、電極
を被検液から引揚げて上限位置に支持し、電極の
真下に洗浄タンクを設置したのち、電極を洗浄位
置に下降して空気吹込みされた洗浄用薬液に浸す
と共に、洗浄中は洗浄用薬液の入れ換えを行な
い、洗浄終了後に薬液より電極を引揚げかつ洗浄
タンクを後退して下限位置まで下降し、再び被検
液に電極を浸すように構成したので、人手を介す
ることなく被検液より引揚げかつ洗浄用薬液の圧
力およびバブリングによる強い洗浄効果により電
極に強力に付着した不純物膜を確実に洗浄除去で
きると共に、洗浄用薬液の入れ換えによつて薬液
の洗浄効果の低下を防ぎ、洗浄後再び被検液に電
極を浸すことができ、測定中の電極の洗浄作業の
自動化が図れる効果がある。 As explained above, according to this invention, the electrode is lifted from the test liquid and supported at the upper limit position, a cleaning tank is installed directly below the electrode, and then the electrode is lowered to the cleaning position and air is blown into it. At the same time, the cleaning chemical solution is replaced during cleaning, and after cleaning is completed, the electrode is pulled up from the chemical solution, the cleaning tank is moved back, and the electrode is lowered to the lower limit position, and the electrode is immersed in the test liquid again. Because of this configuration, the impurity film strongly adhered to the electrode can be reliably removed by lifting it from the test liquid without manual intervention, and the strong cleaning effect of the pressure and bubbling of the cleaning chemical solution, as well as the replacement of the cleaning chemical solution. This prevents the cleaning effect of the chemical solution from deteriorating, allows the electrode to be immersed in the test liquid again after cleaning, and has the effect of automating the cleaning work of the electrode during measurement.
第1図は、この考案に係る電極洗浄装置の構成
を示す説明図、第2図は、同装置の動作説明図、
第3図は、洗浄タンクの構造を示す正面図、第4
図は、同洗浄タンクの平面図である。
L……被検液、T……測定タンク、4……電
極、5……電極昇降装置としてのモータ、W……
洗浄用薬液としての水、7……アクチユエータと
しての進退操作シリンダ、8……洗浄タンク、
SL1……下限位置、SL2……上限位置、SL3……
洗浄位置、D……上限水位、12……給水管系、
13……空気管系、14……排水管系。
FIG. 1 is an explanatory diagram showing the configuration of the electrode cleaning device according to this invention, and FIG. 2 is an explanatory diagram of the operation of the device.
Figure 3 is a front view showing the structure of the cleaning tank;
The figure is a plan view of the cleaning tank. L...Test liquid, T...Measurement tank, 4...Electrode, 5...Motor as electrode lifting device, W...
Water as a cleaning chemical solution, 7... Advance/retreat cylinder as an actuator, 8... Cleaning tank,
SL 1 ...Lower limit position, SL 2 ...Upper limit position, SL 3 ...
Cleaning position, D... Upper limit water level, 12... Water supply pipe system,
13...Air pipe system, 14...Drain pipe system.
Claims (1)
れ、該被検液に浸された電極を引揚げて上限位置
に支持すると共に該電極を下降して洗浄タンク内
の洗浄位置に支持して洗浄用薬液に浸し、かつ洗
浄終了後に該洗浄用薬液より引揚げたのち下降し
て下限位置に設定して上記被検液に再び浸すよう
にした電極洗浄装置であつて、上記電極を被検液
から引揚げて上限位置に支持すると共に該上限位
置より下降して上記洗浄位置に支持して上記洗浄
用薬液に浸しかつ洗浄終了後に洗浄用薬液より引
揚げたのちに上記下限位置に支持する電極昇降装
置と、上記電極が上記洗浄位置に支持される前後
に上記洗浄用薬液の供給および該洗浄用薬液中に
空気の吹込みが開始され、かつ電極が洗浄位置に
支持されて洗浄される際に洗浄用薬液の入れ換え
自在とされる洗浄タンクと、上記電極が上限位置
に支持されると上記洗浄タンクを電極の真下に移
動させると共に洗浄終了後に電極が洗浄用薬液か
ら引揚げられると洗浄タンクを電極の昇降経路外
に後退させるアクチユエータと、を少くとも具備
することを特徴とする電極洗浄装置。 The electrode is installed at the top of the measurement tank containing the test liquid, and the electrode immersed in the test liquid is pulled up and supported at the upper limit position, and the electrode is lowered and supported at the cleaning position in the cleaning tank for cleaning. The electrode cleaning device is configured such that the electrode is immersed in a cleaning chemical solution, and after cleaning is completed, the electrode is lifted out of the cleaning chemical solution, and then lowered, set to a lower limit position, and immersed again in the test solution. The electrode is lifted from the upper limit position and supported at the upper limit position, and is lowered from the upper limit position, supported at the cleaning position, immersed in the cleaning chemical solution, and after cleaning is lifted from the cleaning chemical solution and supported at the lower limit position. The supply of the cleaning chemical solution and the blowing of air into the cleaning chemical solution are started before and after the electrode is supported at the cleaning position, and when the electrode is supported at the cleaning position and cleaned. When the electrode is supported at the upper limit position, the cleaning tank is moved directly below the electrode, and when the electrode is lifted from the cleaning chemical after cleaning is completed, the cleaning tank is replaced with a cleaning chemical solution. An electrode cleaning device comprising at least an actuator for retracting the electrode out of the lifting path of the electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6155883U JPS59168155U (en) | 1983-04-26 | 1983-04-26 | Electrode cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6155883U JPS59168155U (en) | 1983-04-26 | 1983-04-26 | Electrode cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59168155U JPS59168155U (en) | 1984-11-10 |
| JPH0328365Y2 true JPH0328365Y2 (en) | 1991-06-18 |
Family
ID=30191773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6155883U Granted JPS59168155U (en) | 1983-04-26 | 1983-04-26 | Electrode cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59168155U (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0413645Y2 (en) * | 1985-06-06 | 1992-03-30 | ||
| JP5006957B2 (en) * | 2010-07-26 | 2012-08-22 | 明豊工業株式会社 | pH metering tank |
-
1983
- 1983-04-26 JP JP6155883U patent/JPS59168155U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59168155U (en) | 1984-11-10 |
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