JPH03290301A - Apparatus and method for controlling hydrogen concentration - Google Patents
Apparatus and method for controlling hydrogen concentrationInfo
- Publication number
- JPH03290301A JPH03290301A JP2088930A JP8893090A JPH03290301A JP H03290301 A JPH03290301 A JP H03290301A JP 2088930 A JP2088930 A JP 2088930A JP 8893090 A JP8893090 A JP 8893090A JP H03290301 A JPH03290301 A JP H03290301A
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen
- pressure
- concentration
- hydrogen storage
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/32—Hydrogen storage
Landscapes
- Hydrogen, Water And Hydrids (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、水素混合ガスから希望する濃度の水素混合ガ
スを得る水素−實調整装置及び水素濃度調整方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a hydrogen-accurate adjustment device and a hydrogen concentration adjustment method for obtaining a hydrogen mixed gas of a desired concentration from a hydrogen mixed gas.
(従来の技術)
半導体裏造過程等のように過剰水素を利用する装置にお
いては、余剰水素を燃暁させ、又は触媒を用いて酸素と
結合させて水として捨てられていた。(Prior Art) In equipment that utilizes excess hydrogen, such as in semiconductor fabrication processes, the excess hydrogen is burnt off or combined with oxygen using a catalyst and discarded as water.
(発明が解決しようとする課題)
不純ガスを含む比較的高濃度水素混合ガスが、従来無駄
に捨てられていた。このような水素混合ガスを希望する
低濃度水素混合ガスとして利用を図り、或は爆発の危険
のない濃度として放出する点が本発明の課題の一つであ
り、もう一つのill!は、無駄に捨てられている比較
的低濃度水素混合ガスを高濃度水素混合ガスとして第1
」用を図ることである。(Problem to be Solved by the Invention) Conventionally, relatively high concentration hydrogen mixed gas containing impure gas was wasted. One of the problems of the present invention is to utilize such a hydrogen mixed gas as a desired low concentration hydrogen mixed gas, or to release it at a concentration that does not pose the risk of explosion, and another ill! The first method is to convert the relatively low-concentration hydrogen mixed gas that is wasted into a high-concentration hydrogen mixed gas.
” It is to plan for the purpose.
(課題を解決するための手段)
本発明は、第4図に示す水素貯蔵合金の圧力−組成等温
[!に基づいてなされたものである。水素貯蔵合金が水
素を吸蔵する際に、固溶体相が水素化物相に変る間は、
プラトー圧(水素平衡圧)として圧力がほぼ一定で水素
濃度は増加する。(Means for Solving the Problems) The present invention provides a pressure-composition isotherm [!] of a hydrogen storage alloy shown in FIG. This was done based on. When a hydrogen storage alloy absorbs hydrogen, while the solid solution phase changes to the hydride phase,
The pressure is approximately constant as a plateau pressure (hydrogen equilibrium pressure), and the hydrogen concentration increases.
万、水素貯蔵合金が、水素を放出する際も、水素化物相
において、プラトー圧として圧力がほぼ一定で水素濃度
は低下する。同図より知られるように、温度Td、圧力
Pdにて水素を放出するように処理された水素貯蔵合金
は、温度を低下させればさせる程低圧力にて吸蔵水素濃
度が増加する。すなわち、温度T、(Tdに低下すれば
、プラトー圧力P工(Pdとなり、水素貯蔵合金の水素
吸蔵装置が高まり、ガス状態で存在し得る水素ガスの圧
力はPlとiるため、供給する水素混合ガス中の水素の
分圧をPlまでに低下でき、製品ガスとして得られる水
素]工:り、製品ガス圧力をFbとするとP工/Pbに
応じて低下する。従って、プラトー圧力の設定及び製品
ガスの圧力設定イ直をX9することによって、所望する
水素& vCoを、P工/ Pbに応じて低下した水素
混合ガスが得られるっ
一万、温1jTd、圧力Pdにて水素を吸蔵するように
処理された水素貯蔵合金は、温度を上昇させればさせる
程、高圧力にて吸蔵水素濃度が低下する。すなわち温度
をT、 ) Tdに上昇すCば、プラトー圧ばP3)
Pctとなジ、水素貯蔵合金の水素放出圧力が高ま9、
ガス状態で存在し得る水素ガスの圧力はP、となるため
、供給する水素混合ガス中の水素分圧はP3迄上昇し得
る。得らCる製品ガスの水素濃度は、製品ガス圧力をP
oとすると、P1/P0に応じて上昇する。従って、プ
ラトー圧力の設定値及び製品ガス圧力設定値を調整する
ことによって、所望する水素11度C0をP、 / P
oに応じて向上した水素混合ガスが得られる。Even when the hydrogen storage alloy releases hydrogen, the pressure in the hydride phase remains almost constant as the plateau pressure, and the hydrogen concentration decreases. As is known from the figure, in a hydrogen storage alloy treated to release hydrogen at a temperature Td and a pressure Pd, the concentration of occluded hydrogen increases at lower pressures as the temperature is lowered. That is, when the temperature T, (Td) decreases, the plateau pressure P (Pd) increases, and the hydrogen storage device of the hydrogen storage alloy increases, and the pressure of hydrogen gas that can exist in a gaseous state is Pl, so the supplied hydrogen The partial pressure of hydrogen in the mixed gas can be reduced to Pl, and the hydrogen obtained as a product gas is reduced according to P/Pb, and the product gas pressure is Fb. By adjusting the product gas pressure settings directly, a hydrogen mixed gas with the desired hydrogen & vCo reduced according to P/Pb can be obtained.Hydrogen is occluded at a temperature of 1JTd and a pressure of Pd. In the hydrogen storage alloy treated as above, the higher the temperature is raised, the lower the occluded hydrogen concentration becomes at high pressure.In other words, when the temperature is raised to T, ) Td, and the plateau pressure is P3).
As Pct increases, the hydrogen release pressure of the hydrogen storage alloy increases9.
Since the pressure of hydrogen gas that can exist in a gaseous state is P, the hydrogen partial pressure in the supplied hydrogen mixed gas can rise up to P3. The hydrogen concentration of the product gas obtained is determined by the product gas pressure P
o, it increases according to P1/P0. Therefore, by adjusting the plateau pressure set value and the product gas pressure set value, the desired hydrogen 11 degrees C0 can be adjusted to P, / P
An improved hydrogen mixed gas can be obtained depending on o.
上記の理由によって第1発明は、水素含有ガスタンクに
、水素貯蔵合金を内観し、加熱・冷却装置及び温度計を
具えた水素吸蔵装置を第1圧力制御弁を介して連絡し、
該水素吸蔵装置に、第2圧力制御弁、及び流量計又は水
素濃度計を具えた製品ガスライン、韮び九ノ々ルブを具
えた放出ラインを、それぞれ襞続した水素″!Ik変調
整装置である。For the above reasons, the first invention connects a hydrogen storage device including a hydrogen storage alloy, a heating/cooling device, and a thermometer to a hydrogen-containing gas tank via a first pressure control valve;
A hydrogen"!Ik variable adjustment device, in which a second pressure control valve, a product gas line equipped with a flow meter or a hydrogen concentration meter, and a discharge line equipped with a nine-hole valve are respectively connected to the hydrogen storage device. It is.
第2発明は、低濃賞への水素濃度調整方法に関し、その
構成は、次の通りである。The second invention relates to a method for adjusting hydrogen concentration to a low concentration prize, and its configuration is as follows.
水素含有ガスタンクK、所定温度(Td)、圧力(Pd
)にて水素ガスを放出する水素貯蔵合金を内蔵し、加熱
・冷却装置及び温度計金具えた水素吸蔵装置を第1圧力
制御弁を介して連絡し、該水素吸蔵装置に、第2圧力制
御弁、及び流量計又は水素濃度計を具えた製品ガスライ
ン並びに・々ルプを具えた放出ラインを、それぞれ接続
し、水素含有ガスタンクから前記水素吸蔵装置へ、比較
的高い水素濃度(Cs)の水素混合ガスを供給し、前記
温度(Td)よりも低い温度に水素貯蔵合金を冷却し、
水素貯蔵合金のプラトー圧を低下させ、第2圧力制御弁
の設定圧を第1圧力制御弁の設定圧よりも若干低い圧力
に設定して、プラトー圧に応じて、水素濃度(Cs)よ
り低い所定の低水素濃度の水素混合ガスを製品ガスライ
ンへ送出する水素濃度調整方法である。Hydrogen-containing gas tank K, predetermined temperature (Td), pressure (Pd
) A hydrogen storage device containing a hydrogen storage alloy that releases hydrogen gas and equipped with a heating/cooling device and a thermometer is connected via a first pressure control valve, and a second pressure control valve is connected to the hydrogen storage device. , a product gas line equipped with a flow meter or a hydrogen concentration meter, and a discharge line equipped with a gas pipe, respectively, to mix hydrogen at a relatively high hydrogen concentration (Cs) from the hydrogen-containing gas tank to the hydrogen storage device. supplying a gas and cooling the hydrogen storage alloy to a temperature lower than the temperature (Td);
The plateau pressure of the hydrogen storage alloy is lowered, and the set pressure of the second pressure control valve is set to a pressure slightly lower than the set pressure of the first pressure control valve, so that the pressure is lower than the hydrogen concentration (Cs) according to the plateau pressure. This is a hydrogen concentration adjustment method in which a hydrogen mixed gas with a predetermined low hydrogen concentration is sent to a product gas line.
第3発明は、高11度水素混合ガスへの水素濃度調整方
法に関し、その構成は次の通りである。The third invention relates to a method for adjusting hydrogen concentration to a high 11 degree hydrogen mixed gas, and the configuration thereof is as follows.
水素含有ガスタンクに、所定温度(Td)、圧力(Pd
)にて水素ガスを吸蔵する水素貯蔵合金を内蔵し、加熱
・冷却装置及び温度計を具えた水素吸蔵装置を第1圧力
制御弁を介して連絡し、該水素吸蔵装置に1第2圧力制
御弁、及び流量計又は水素濃度計を具えた製品ガスライ
ン並びにパルプを具えた放出ラインを接続し、水素含有
ガスタンクから前記水素吸蔵装置へ比較的低い水素濃度
(Ct)の水素混合ガスを供給し、予め、所定温度(T
d)、圧力(Pd )で水素貯蔵合金に水素を吸蔵させ
た後K、前記温度(Td)よりも高い温度に水素貯蔵合
金を加熱し、水素貯蔵合金のプラトー圧を水素濃度(C
t)の水素分圧よりも高い圧力に上昇させ、第2圧力制
御弁の設定圧を第1圧力制御弁の設定圧よやも若干低い
圧力に設定して、プラトー圧に応じて、水素濃It(C
t)より高い所定の高濃度の水素混合ガスを製品ガスラ
インへ送出する水素濃度調整方法である。A hydrogen-containing gas tank is heated to a predetermined temperature (Td) and pressure (Pd).
), which has a built-in hydrogen storage alloy that stores hydrogen gas and is equipped with a heating/cooling device and a thermometer, is connected to the hydrogen storage device via a first pressure control valve, and a second pressure control valve is connected to the hydrogen storage device. A product gas line equipped with a valve and a flow meter or hydrogen concentration meter and a discharge line equipped with pulp are connected to supply a hydrogen mixed gas with a relatively low hydrogen concentration (Ct) from a hydrogen-containing gas tank to the hydrogen storage device. , in advance at a predetermined temperature (T
d) After storing hydrogen in the hydrogen storage alloy at a pressure (Pd), the hydrogen storage alloy is heated to a temperature higher than the above temperature (Td), and the plateau pressure of the hydrogen storage alloy is adjusted to a hydrogen concentration (C).
t), and the set pressure of the second pressure control valve is set to a pressure slightly lower than the set pressure of the first pressure control valve, and the hydrogen concentration is increased according to the plateau pressure. It(C
t) A hydrogen concentration adjustment method in which a predetermined high concentration hydrogen mixed gas is sent to the product gas line.
(作用)
水X濃f調整装置は、前記のように構成されており、水
素吸蔵装置には、高#に度水素混合ガスから低11度水
素混合ガスを得る場合には、所定温度(Td)、圧力(
Pd)Kて水素ガスを放出するように処理された水素貯
蔵合金を内蔵し、低濃度水素混合ガスから高濃度水素混
合ガスを得る場合には、所定温度(Td)、圧力(Pd
)にて水素ガスを吸蔵する水素貯蔵合金を内蔵している
。(Function) The water ),pressure(
When obtaining a high-concentration hydrogen mixed gas from a low-concentration hydrogen mixed gas by incorporating a hydrogen storage alloy that has been treated to release hydrogen gas using Pd)K, the predetermined temperature (Td) and pressure (Pd
) has a built-in hydrogen storage alloy that absorbs hydrogen gas.
そして、水素含有ガスタンクから第1圧力制御弁を介し
て、水素混合ガスを水素吸蔵装置へ送り、温度計の温度
を参照して、加熱・冷却装置にて水素吸蔵装置内の水素
貯蔵合金を所望温度に加熱又は冷却することによってプ
ラトー圧を所望圧とし、水素混合ガス中の水素を、該プ
ラトー圧に応じて水素貯蔵合金に吸蔵又は放出させて、
高濃度水素混合ガスは、その濃度を所望値に低下した水
素混合ガスとなり、低濃度水素混合ガスの場合は、既に
水素貯蔵合金に吸蔵されてい九水素を放出させて、低濃
度水素混合ガスに加えることに二って、その濃度を向上
した水素混合ガスとなって、いずれの混合ガスも第2圧
力制薗升を介して製品ガスラインへ送られる。Then, the hydrogen mixed gas is sent from the hydrogen-containing gas tank to the hydrogen storage device through the first pressure control valve, and the hydrogen storage alloy in the hydrogen storage device is heated to the desired temperature using the heating/cooling device, referring to the temperature of the thermometer. By heating or cooling to a desired temperature, the plateau pressure is set to a desired pressure, and hydrogen in the hydrogen mixed gas is stored or released in the hydrogen storage alloy according to the plateau pressure,
A high-concentration hydrogen mixed gas becomes a hydrogen mixed gas whose concentration has been reduced to the desired value, and in the case of a low-concentration hydrogen mixed gas, the hydrogen already stored in the hydrogen storage alloy is released to become a low-concentration hydrogen mixed gas. In addition, both gas mixtures are sent to the product gas line via the second pressure regulator, resulting in an enriched hydrogen gas mixture.
流量計又は水素濃度計は、水素貯蔵合金が水素を充分に
吸蔵した状態又は光分に放出した状態を流量変化又は水
素濃度変化として検知する。A flow meter or a hydrogen concentration meter detects a state in which a hydrogen storage alloy has sufficiently occluded hydrogen or released it into light as a change in flow rate or a change in hydrogen concentration.
放出ラインは、高濃度水素混合ガスから水素貯蔵合金に
吸蔵されて回収された水素を主とする水素混合ガスを放
出し、双は、低濃度水素混合ガスから水素貯蔵合金が水
素を吸蔵した際に、水素吸蔵装置内に残存する不純ガス
を主とする水素混合ガスを放出する等に使用される。The release line releases a hydrogen mixed gas consisting mainly of hydrogen stored and recovered in a hydrogen storage alloy from a high concentration hydrogen mixed gas, and the two discharge lines release a hydrogen mixed gas that is mainly composed of hydrogen stored and recovered from a hydrogen storage alloy from a high concentration hydrogen mixed gas. In addition, it is used to release hydrogen mixed gas mainly consisting of impure gas remaining in the hydrogen storage device.
次に、本装置を便用して高濃度水素混合ガスを低濃度水
素混合ガスへ濃度調整をする場合を説明する。Next, a case will be described in which the concentration of a high concentration hydrogen mixed gas is adjusted to a low concentration hydrogen mixed gas using this device.
所定温度(Td)、圧力(Pd)にて水素を放出するよ
って処理された水素貯蔵合金を内蔵する水素吸菫装・産
内を、温度計を参照して冷却し、水素貯蔵合金の温vi
l−前記温度(Td)以下に冷却し、該温度に対応する
プラトー圧とし、男1王力、う1曳升の設定圧を水素含
有ガスタンクの圧力変動の影響を受けない二つな圧力に
設定し、第2圧力制御弁の設定圧を水素混合ガスを水素
吸峨裟蓋内へ導入でき、かつ第1王力制@升の設定王二
りも若干低く設定する。そして、水素含有ガスタンクか
ら水素濃度(C=)の水素混合ガスを;!?C素&蔵装
童へ送れば、水素a度(Cs)の水素分圧が前記プラト
ー圧二カ高い場合・ま、水素混合ガス中の水素は水素貯
蔵合金に、プラトー圧の低下に応じて多1に吸蔵されて
、水素濃度を、水ボ濃夏(Cs)よりも低下させた水素
混合ガスが製品ガスとして製品ガスラインへ送出される
っ
そして、水素貯蔵合金が光分に水素を吸蔵すると吸蔵さ
れない水素り増加によって、製品ガスラインへの流量及
び水素fIk度が急激に増加する。この現象上、流量計
又は水素濃度計で検知して水素吸JI!装置の冷却を停
止し、両圧力制御弁を閉塞する。なお、水素濃度計は、
第2圧力制御弁の設定圧を設定することにも使用される
。The hydrogen absorption system/indoor containing the treated hydrogen storage alloy by releasing hydrogen at a predetermined temperature (Td) and pressure (Pd) is cooled with reference to a thermometer, and the temperature of the hydrogen storage alloy is measured.
- Cool to below the above temperature (Td), set the plateau pressure corresponding to the temperature, and set the set pressures of 1 pressure and 1 pressure to two pressures that are not affected by pressure fluctuations in the hydrogen-containing gas tank. The setting pressure of the second pressure control valve is set so that the hydrogen mixed gas can be introduced into the hydrogen absorbing lid, and the setting pressure of the first pressure system is also set slightly low. Then, a hydrogen mixed gas with a hydrogen concentration (C=) is supplied from the hydrogen-containing gas tank;! ? If the hydrogen partial pressure of hydrogen a degree (Cs) is higher than the above plateau pressure, the hydrogen in the hydrogen mixed gas will be transferred to the hydrogen storage alloy as the plateau pressure decreases. The hydrogen mixed gas, which is stored in the hydrogen gas and has a hydrogen concentration lower than that of the water bottle concentrated summer (Cs), is sent to the product gas line as a product gas.Then, the hydrogen storage alloy absorbs hydrogen into light components. Then, due to the increase in unoccluded hydrogen, the flow rate to the product gas line and the hydrogen fIk degree rapidly increase. Due to this phenomenon, it can be detected with a flow meter or hydrogen concentration meter and hydrogen absorption JI! Stop cooling the device and close both pressure control valves. In addition, the hydrogen concentration meter is
It is also used to set the set pressure of the second pressure control valve.
水素貯蔵合金による水素吸蔵を終了させた後は、水素吸
蔵装置を加熱状態に切替え所定温度(Td)、圧力(P
d )にて水素を主とした水素混合ガスを放出ラインへ
流して水素を回収する。After completing hydrogen storage by the hydrogen storage alloy, the hydrogen storage device is switched to the heating state and the predetermined temperature (Td) and pressure (P
In step d), a hydrogen mixed gas containing mainly hydrogen is passed through the discharge line to recover hydrogen.
次に1本装置を使用して、低濃度水素混合ガスを高濃度
水素混合ガスへ濃度調整をする場合を説明する。Next, a case will be described in which one device is used to adjust the concentration of a low concentration hydrogen mixed gas to a high concentration hydrogen mixed gas.
所定温度(Td)、圧力(Pd)にて水素を吸蔵するよ
うに処理された水素貯蔵合金を内蔵する水素吸蔵装置内
の水素貯蔵合金に、後記するように予め水素を吸蔵させ
ておき、水素吸蔵装置内を温度計の温度を参照して加熱
し、水素貯蔵合金の温度を前記温度(Td)以上に上昇
させ、該温度に対応するプラトー圧とし、第1圧力制御
弁の設定圧を、水素含有ガスタンクの圧力変動の影響を
受けない圧力に設定し、第2圧力制御弁のれ定圧を、水
素混合ガスを水素吸蔵装置内へ導入でき、かつ第1圧力
制御弁ニジも若干低い圧力に設定して、水素含有ガスタ
ンクから水素!#度(Ct)の水素混合カスを水素吸蔵
装置へ送れば、水素貯蔵合金の水素放出圧力がプラトー
圧に応じて高まって水素を放出し、該放出された水素が
、前記水素混合ガスに混合されて、水素Ik度(Ct)
よりも所定値上昇させた水素混合ガスが、製品ガスとし
て製品ガスラインへ送出される。The hydrogen storage alloy in the hydrogen storage device, which contains a hydrogen storage alloy treated to store hydrogen at a predetermined temperature (Td) and pressure (Pd), is preliminarily stored with hydrogen as described later. The inside of the storage device is heated with reference to the temperature of the thermometer, the temperature of the hydrogen storage alloy is raised to the temperature (Td) or higher, the plateau pressure corresponding to the temperature is set, and the set pressure of the first pressure control valve is set to The pressure is set to a level that is not affected by pressure fluctuations in the hydrogen-containing gas tank, the second pressure control valve is set at a constant pressure that allows hydrogen mixed gas to be introduced into the hydrogen storage device, and the first pressure control valve is also set at a slightly lower pressure. Set up and hydrogen from hydrogen-containing gas tank! # degree (Ct) of hydrogen mixed gas is sent to the hydrogen storage device, the hydrogen release pressure of the hydrogen storage alloy increases according to the plateau pressure and releases hydrogen, and the released hydrogen is mixed with the hydrogen mixed gas. hydrogen Ik degree (Ct)
The hydrogen mixed gas increased by a predetermined value is sent to the product gas line as a product gas.
そして、水素貯蔵合金が充分に水素を放出すると、水素
貯蔵合金より水素が放出されなくなり、製品ガスライン
への流量及び水素濃度が急激に減少する。この現警を流
量計又は水素濃度計で検知して、水素吸蔵装置の加熱を
停止し、かつ肉圧カ制御弁を閉塞する。When the hydrogen storage alloy releases enough hydrogen, hydrogen is no longer released from the hydrogen storage alloy, and the flow rate and hydrogen concentration to the product gas line rapidly decrease. This detection is detected by a flow meter or a hydrogen concentration meter, the heating of the hydrogen storage device is stopped, and the meat pressure control valve is closed.
なお、水素濃度計は、第2圧力制御弁の設定圧を設定す
るのKも使用される。Note that the hydrogen concentration meter is also used to set the set pressure of the second pressure control valve.
水素貯蔵合金による水素の放出を終了させた後は、加熱
・冷却装置を冷却に切替えて、水素吸蔵装置内を冷却し
、水素貯蔵合金を所定温度(Td)、圧力(Pd)とし
、水素含有ガスタンクから水素混合ガスを送って水素貯
蔵合金に水素を吸蔵させる。After the hydrogen storage alloy has finished releasing hydrogen, the heating/cooling device is switched to cooling to cool the inside of the hydrogen storage device, and the hydrogen storage alloy is brought to a predetermined temperature (Td) and pressure (Pd), and the hydrogen-containing A hydrogen mixture gas is sent from the gas tank to cause the hydrogen storage alloy to absorb hydrogen.
吸彼終了後に、水素貯蔵合金に′&、畝されなく、水素
吸蔵装菫内に残存する不純ガスを主として含む水素混合
ガスを放出ラインへ送出する。After the suction is completed, a hydrogen mixed gas containing mainly impurity gas that is not ridged by the hydrogen storage alloy and remains in the hydrogen storage device is sent to the discharge line.
上記りようにして水素貯蔵合金に吸蔵された水素は、前
記のよって、水素貯蔵合金の温室を所定温度(Td)以
上に上昇させて、低IIi度水素混合ガスに混合され、
或は高圧・高純度水素ガスとしても利用される。The hydrogen stored in the hydrogen storage alloy as described above is mixed into a low IIi hydrogen mixed gas by raising the greenhouse of the hydrogen storage alloy to a predetermined temperature (Td) or higher, as described above,
It can also be used as high-pressure, high-purity hydrogen gas.
(実施例)
本発明に係る水素濃皇:A節装置の実施例を第1図に基
づいて説明する。(Example) An example of the hydrogen enrichment device according to the present invention will be described based on FIG. 1.
1ば、第1圧力計1a、第1水素濃度計15を具えた水
素含有ガスタンクであり、比較的高い水素濃度C3の高
濃度水素混合ガス又は比較的低い水素濃度C1の低濃度
水素混合ガスを外部へ供給する。1 is a hydrogen-containing gas tank equipped with a first pressure gauge 1a and a first hydrogen concentration meter 15, and is capable of storing a high-concentration hydrogen mixed gas with a relatively high hydrogen concentration C3 or a low-concentration hydrogen mixed gas with a relatively low hydrogen concentration C1. Supply to outside.
21−1、温度計2Cを具えた水素吸蔵装置であり、第
1圧力制御92dを介して水素含有ガスタンク1に連絡
する。そして、高濃度水素混合ガスを処理する場合には
、所定温度Td、プラトー圧Pd (水素平衡圧)で水
素を放出するように処理された水素貯蔵合金を内蔵して
いる。又低りIk夏水素混合ガスを処理する場合は、所
定の@夏T」、プラトー圧Pdで水素を吸蔵すSように
処理され洗水素貯蔵合金を内蔵しているう
3ば、水素吸蔵装置2内の水素貯蔵合金を水素吸蔵時シ
て冷却し、水素放出時に加熱する77II熱・冷却装置
である。21-1 is a hydrogen storage device equipped with a thermometer 2C, and is connected to the hydrogen-containing gas tank 1 via a first pressure control 92d. When processing a high-concentration hydrogen mixed gas, a hydrogen storage alloy that is processed to release hydrogen at a predetermined temperature Td and plateau pressure Pd (hydrogen equilibrium pressure) is incorporated. In addition, when processing a low Ik summer hydrogen mixed gas, a hydrogen storage device that is treated to store hydrogen at a predetermined @summer T and plateau pressure Pd and has a built-in washed hydrogen storage alloy is used. This is a 77II heat/cooling device that cools the hydrogen storage alloy in the hydrogen storage alloy when storing hydrogen and heats it when releasing hydrogen.
4は、製品ガスラインでちゃ、第2圧力制却升4d、流
量計4e及び第2水素濃夏計4bを具えて水素吸蔵装置
2に連絡する。4 is connected to the hydrogen storage device 2 with a product gas line, a second pressure control tank 4d, a flow meter 4e, and a second hydrogen concentration meter 4b.
5は、高濃度水素混合ガスを処理し之後の水素を放出す
る放出ライン、又は低濃度水素混合ガスを処理した後の
不純ガスを放出する放出ラインであり1,5ルブ5fを
介して水素吸蔵装置2と第2圧力制御弁4dとの間から
分岐して水素吸蔵装置2に接続している。5 is a discharge line that processes high concentration hydrogen mixed gas and releases hydrogen after processing, or a discharge line that releases impure gas after processing low concentration hydrogen mixed gas, and hydrogen is absorbed through 1.5 lube 5f. It branches from between the device 2 and the second pressure control valve 4d and is connected to the hydrogen storage device 2.
6は、制御盤であシ、各機器を制御する。6 is a control panel that controls each device.
次に作用を説明する。Next, the action will be explained.
先ず、高濃度水素混合ガスから低#度混合ガスを得る場
合を、第1,2図に基づいて説明する。First, the case of obtaining a low-degree mixed gas from a high-concentration hydrogen mixed gas will be explained based on FIGS. 1 and 2.
水素吸蔵装置2を、温度計2Cを参照して加熱・冷却装
置3にて冷却し、水素貯蔵合金の温度を水素放出時の所
定温度Tdよりも低い温vTよ、プラトー王P工とし、
水素含有ガスタンク1内の水素濃度CsO高濃度水素混
合ガスを、水素含有ガスタンク1内の圧力度動による影
響を受けない圧力Paに設定した第1圧力制御弁2dt
−介して水素g&麓装置2へ供給する。そして、第2圧
力制御弁4dの設定圧力を、水素吸蔵装置2に水素含有
ガスタンク1内の高a度混合ガスが導入できる程度にし
て圧力Paより若干低い圧力Pbに設定して水素吸蔵装
置2からの水素混合ガスを製品ガスライン4へ流す。す
ると、水素濃度(Cs)の水素分圧が前記プラトー圧P
1より高い場合は、高濃度水素混合ガス中の水素は、水
素貯蔵合金に吸蔵され、水素濃度C1(第5図参照)と
してP1/ Pbに応じて濃度を低下させた水素混合ガ
スが、製品ガスとして製品ガスライン4へ流れる。The hydrogen storage device 2 is cooled by the heating/cooling device 3 with reference to the thermometer 2C, and the temperature of the hydrogen storage alloy is set to a temperature vT lower than the predetermined temperature Td at the time of hydrogen release.
The first pressure control valve 2dt sets the CsO high hydrogen concentration hydrogen mixed gas in the hydrogen-containing gas tank 1 to a pressure Pa that is not affected by pressure fluctuations in the hydrogen-containing gas tank 1.
- Hydrogen is supplied to the g & fumoto equipment 2 via. Then, the set pressure of the second pressure control valve 4d is set to a pressure Pb slightly lower than the pressure Pa to such an extent that the high degree mixed gas in the hydrogen-containing gas tank 1 can be introduced into the hydrogen storage device 2. The hydrogen mixed gas from is passed to the product gas line 4. Then, the hydrogen partial pressure of the hydrogen concentration (Cs) becomes the plateau pressure P
If it is higher than 1, the hydrogen in the high-concentration hydrogen mixed gas is stored in the hydrogen storage alloy, and the hydrogen mixed gas whose concentration is reduced according to P1/Pb as the hydrogen concentration C1 (see Figure 5) becomes the product. It flows as a gas to the product gas line 4.
更忙、水素濃度の低い水X混合ガスを得たい場合KFi
、水素吸R妄!2を更に冷却し、水素貯蔵合金の温度を
温度T1よゆも低い温度Tい プラトー圧をPlよ)も
低いP!の状態とし、第1圧力制御弁2d及び第2圧力
制御3P4clの設定圧を特に変えることなく、水素含
有ガスタンク1から水素濃度CsO高濃買水素ガスを水
素吸蔵債112へ導入すれば、プラトー圧P、′/て応
じて水素貯蔵合金の水素吸j絽が高まり、更に多量の水
素が、水素貯蔵合金て吸蔵され、水素濃度C1としてP
、 / Pbに応じて濃度を低下させ之水素混合ガスが
製品ガスとして製品ガスライン4へ流れる。If you are busy and want to obtain water x mixed gas with low hydrogen concentration, use KFi
, Hydrogen absorption R delusion! 2 is further cooled, and the temperature of the hydrogen storage alloy is lowered to a temperature T1 which is much lower.The plateau pressure is Pl) which is also lower P! If the purchased hydrogen gas with a high hydrogen concentration of CsO is introduced into the hydrogen storage bond 112 from the hydrogen-containing gas tank 1 without changing the set pressures of the first pressure control valve 2d and the second pressure control 3P4cl, the plateau pressure P,'/, the hydrogen absorption of the hydrogen storage alloy increases, and a large amount of hydrogen is stored in the hydrogen storage alloy, and the hydrogen concentration C1 becomes P
, /Pb, and the hydrogen mixed gas flows to the product gas line 4 as a product gas.
第5図に示すように時間1.を経過し、水素貯蔵合金が
水素を充分に吸蔵して、水素が吸蔵され難くなると、製
品ガスライン4に流れる水素混合ガスの濃度が高まると
共に流tが急激に増、vaするので、これ金流菫計4e
にて検矧して第2圧力制御弁4d及び第1圧力制御弁2
dを閉じるつ又第2水素濃度計4bにより製品ガスライ
ン4の水素濃度の上昇を検矧して行ってもよい。その後
、第2図に示すように水素吸蔵装f2内の水素貯蔵合金
を、加熱・冷却装置3を使用して、所定温、i TdK
加熱し、プラトー圧Pdに上昇させて水素貯蔵合金を水
素放出状態とし、主として水素ガスを含む水素混合ガス
を放出ライン5へ放出して水素の再利用に供する。そし
て、水素吸蔵装置2′が低濃度水素混合ガスを製品ガス
ライン4へ流している間、第2図に示すように1別の水
素吸蔵装置2は水素放出工程に供されている。なお、第
2図に於て、黒色とした弁(2d、4d、5f)は閉じ
、白色とした弁(2d、 4d、 5f )は開いてい
る状態を示す。As shown in FIG. 5, time 1. When the hydrogen storage alloy has sufficiently occluded hydrogen and becomes difficult to occlude, the concentration of the hydrogen mixed gas flowing into the product gas line 4 increases and the flow t rapidly increases, va. Nagare violet meter 4e
The second pressure control valve 4d and the first pressure control valve 2 are inspected at
The increase in the hydrogen concentration in the product gas line 4 may be monitored using the second hydrogen concentration meter 4b while closing the gas line d. Thereafter, as shown in FIG. 2, the hydrogen storage alloy in the hydrogen storage device f2 is heated to a predetermined temperature using the heating/cooling device 3.
The hydrogen storage alloy is heated and raised to a plateau pressure Pd to put it in a hydrogen release state, and a hydrogen mixed gas containing mainly hydrogen gas is released to the release line 5 for hydrogen reuse. While the hydrogen storage device 2' is flowing the low-concentration hydrogen mixed gas to the product gas line 4, another hydrogen storage device 2 is being subjected to a hydrogen release process as shown in FIG. In addition, in FIG. 2, the valves shown in black (2d, 4d, 5f) are closed, and the valves shown in white (2d, 4d, 5f) are shown in an open state.
次に、低1!に度水素混合ガスから高濃度水素混合ガス
を得る場合を第1,3図に基づいて説明する。Next, low 1! The case of obtaining a highly concentrated hydrogen mixed gas from a highly concentrated hydrogen mixed gas will be explained based on FIGS. 1 and 3.
水素吸蔵装置2を、加熱・冷却装置3にて加熱し、水素
貯蔵合金を、水素吸蔵時の所定温度Tdよりも高い温度
T1、プラトー圧P3(第4図参照)とし、水素含有ガ
スタンク1内の水素濃度Ctの低濃度水素混合ガスを、
水素含有ガスタンク1内の圧力変動の影響を受けない圧
力Piに設定した第1圧力制御弁2dを介して、水素吸
蔵装置2へ供給する。そして、第2圧力制御弁4dの設
定圧を、水素吸蔵装置2に水素含有ガスタンク1内の低
濃度水素混合ガスが導入でする種変に圧力Piより若干
低い圧力P0に設定して、水素吸蔵装置2から水素混合
ガスを製品ガスライン4へ流す、す6と、水素貯蔵合金
の水素放出圧力がプラトー圧P、に応じて高まっている
ので、後記するよって、予め、水素含有ガスタンク1内
の低′Ji工水素混合ガスから所定温度Td、プラトー
圧Pdにて水素貯蔵合金に吸蔵されていた水素が、前記
水素混合ガス中へ放出されることとなり、水素−4ge
tよりも高い水素濃度Cs C第6図参照ンとしてP、
/ P、llに応じて上昇させた水素混合ガスが製品
ガスとして製品ガスライン4へ流れる。The hydrogen storage device 2 is heated by the heating/cooling device 3, and the hydrogen storage alloy is heated to a temperature T1 higher than the predetermined temperature Td during hydrogen storage and a plateau pressure P3 (see Fig. 4), and the hydrogen storage alloy is heated in the hydrogen-containing gas tank 1. A low concentration hydrogen mixed gas with a hydrogen concentration Ct of
It is supplied to the hydrogen storage device 2 via the first pressure control valve 2d, which is set to a pressure Pi that is not affected by pressure fluctuations in the hydrogen-containing gas tank 1. Then, the set pressure of the second pressure control valve 4d is set to a pressure P0 that is slightly lower than the pressure Pi when the low concentration hydrogen mixed gas in the hydrogen-containing gas tank 1 is introduced into the hydrogen storage device 2, and hydrogen storage is performed. When the hydrogen mixed gas is flowed from the device 2 to the product gas line 4, the hydrogen release pressure of the hydrogen storage alloy is increasing in accordance with the plateau pressure P. The hydrogen stored in the hydrogen storage alloy from the low-JI hydrogen mixed gas at a predetermined temperature Td and plateau pressure Pd is released into the hydrogen mixed gas, and hydrogen-4ge
As the hydrogen concentration Cs C is higher than t (see Figure 6), P,
The hydrogen mixed gas raised according to /P, ll flows to the product gas line 4 as a product gas.
更に水素濃度の高い水素混合ガスを得たい場合には、水
素貯蔵合金を、温度T、よりも更に高い温iT4、’ラ
ドー圧P、よりも高いプラトー圧P、の状態とし、第1
圧力制御弁2d及び第2圧カ利御yP4dの設定圧を特
に変えることなく、水素含有ガスタンク1から水素@Z
Ctの低濃度水素混合ガスを水素吸蔵装置2へ導入すれ
ば、更に水素貯蔵合金の水素放出圧力がプラトー圧P4
に応じて高まっているので、水素貯蔵合金から更に速や
かに水素が放出されて、低水素混合ガスに混合し、水素
濃度C4としてP4/P0に応じて濃度を向上させた混
合ガスが製品ガスとして製品ガスライン4へ流れる。If it is desired to obtain a hydrogen mixed gas with an even higher hydrogen concentration, the hydrogen storage alloy is brought into a state of a temperature iT4 higher than the temperature T, a plateau pressure P higher than the Rado pressure P, and the first
Hydrogen @Z is supplied from the hydrogen-containing gas tank 1 without particularly changing the set pressures of the pressure control valve 2d and the second pressure control yP4d.
If a low concentration hydrogen mixed gas of Ct is introduced into the hydrogen storage device 2, the hydrogen release pressure of the hydrogen storage alloy will further increase to the plateau pressure P4.
As the hydrogen concentration increases according to P4/P0, hydrogen is released from the hydrogen storage alloy more quickly and mixed with the low hydrogen mixed gas, and the mixed gas with increased concentration according to P4/P0 becomes the product gas as hydrogen concentration C4. Flows to product gas line 4.
そして、第6図に示すように、時間1e?経過し、水素
貯蔵合金が水素を充分に放出して、水素が放出され難く
なると製品ガスライン4へ流れる水素混合ガスの濃度が
低下すると共に、流量が急激に減少するので、これを流
量計4eにて検知して第2圧力制御fP4d及び第1圧
力制御弁2dを閉じる。又第2水累1#度計4bにより
水累濃度の低下を検知して行ってもよいっ
その後、第3図に示すように、水素吸蔵装置2内の水素
貯蔵合金を、加熱・冷却装置3を使用して、温度を所定
温度Tdに冷却してプラトー圧をPdに下降させて、水
素貯蔵合金を水素吸蔵状態とし、水素含有ガスタンク1
より低濃度水素況合ガスを水素吸蔵装量2へ送り、第2
圧力制御弁4d及び・々ルプ5fを閉として水素を充分
に吸蔵させた後に、残溜している不純ガスを主とし九水
素混合ガスをパルプ5ft−瞬時開いて、放出ライン5
へ放出しておく、そして、前記した水素濃度向上手段て
用いられる。この間、別の水素吸蔵状態2′は低!I!
度水素混合ガスの高濃度水素混合ガスへの濃度調整に使
用されている。Then, as shown in FIG. 6, time 1e? As time passes, the hydrogen storage alloy releases enough hydrogen and hydrogen becomes difficult to release, the concentration of the hydrogen mixed gas flowing to the product gas line 4 decreases and the flow rate decreases rapidly. is detected and the second pressure control fP4d and first pressure control valve 2d are closed. Alternatively, the decrease in water concentration may be detected by the second water accumulation 1# degree meter 4b.After that, as shown in FIG. 3, the hydrogen storage alloy in the hydrogen storage device 2 is heated and cooled 3, the temperature is cooled to a predetermined temperature Td, the plateau pressure is lowered to Pd, the hydrogen storage alloy is brought into a hydrogen storage state, and the hydrogen-containing gas tank 1 is
The lower concentration hydrogen gas is sent to the hydrogen storage capacity 2, and
After closing the pressure control valve 4d and the gas valve 5f to sufficiently store hydrogen, the pulp 5ft is momentarily opened to release a hydrogen mixed gas mainly containing the remaining impure gas to the discharge line 5.
Then, the hydrogen concentration increasing means described above is used. During this time, another hydrogen storage state 2' is low! I!
It is used to adjust the concentration of high-concentration hydrogen mixed gas to high-concentration hydrogen mixed gas.
又上記のように、水素吸蔵装置2内の水素貯蔵合金に水
素を充分に吸蔵させた状態にて、第1圧力制御弁2d、
第2圧力制却升4d及びパルプ5fを閉じ、水素貯蔵合
金の温度をT、に上昇させた後に、製品ガスライン4よ
り放出させると、水素濃度及び製品ガス圧力も上昇させ
ることができる。Further, as described above, in a state where the hydrogen storage alloy in the hydrogen storage device 2 has sufficiently stored hydrogen, the first pressure control valve 2d,
If the second pressure control cell 4d and the pulp 5f are closed and the temperature of the hydrogen storage alloy is raised to T, then it is released from the product gas line 4, the hydrogen concentration and product gas pressure can also be increased.
第7図(al、(bl、(C1及びfdlに本発明に係
る装置を、一対の水素含有ガスタンク1,1′と一対の
水素吸蔵装置2,2′に適用して、両水素含有ガスタン
ク1.1′から各水素吸蔵装置2,2′へ低濃度水素混
合ガスを供給して、高濃度水素混合ガスを得る数例の場
合の各弁の取扱を示しである。第3図と同符号は、同部
分を示し、各2 d/は第1圧カ制御弁2dに該当する
。なお、黒色とした弁は閉じて、白色とした弁・は開い
ている状傾を示している。ここで両パルプ5fは、各水
素吸蔵装置2,2′が水素を充分に吸蔵した後に、不純
ガスを多量に含む水素混合ガスをガス放出ライン5へ流
す場合に瞬時開けられる。なお(Td)、(T、)は、
加熱・冷却装置3.3’てよる水素吸菫装−12,2’
内の温度を示す。FIG. 7 (al, (bl, (C1 and fdl)) The device according to the present invention is applied to a pair of hydrogen-containing gas tanks 1, 1' and a pair of hydrogen storage devices 2, 2', and both hydrogen-containing gas tanks 1 and 2' are This figure shows the handling of each valve in several cases in which a high concentration hydrogen mixed gas is obtained by supplying a low concentration hydrogen mixed gas from .1' to each of the hydrogen storage devices 2 and 2'. indicates the same part, and each 2d/ corresponds to the first pressure control valve 2d.The valves shown in black are closed, and the valves shown in white are open. Both pulps 5f are opened instantaneously when hydrogen mixed gas containing a large amount of impure gas is flowed to the gas discharge line 5 after each hydrogen storage device 2, 2' has sufficiently stored hydrogen. (T,) is
Heating/cooling device 3.3' Hydrogen absorption device-12,2'
Indicates the temperature inside.
図(alは、水素&lE装置2が、水素含有ガスタンク
1′ニジ7に累吸蔵中にして、水素吸蔵装置2′が、水
素含有ガスタンク1より導入した低壜度水素混合ガスに
、予め吸蔵されていた水素を放出して水素濃度全向上さ
せて製品ガスライン4へ送っている場合を示す。Figure (al) shows that the hydrogen &lE device 2 is accumulatively occluding in the hydrogen-containing gas tank 1'nig 7, and the hydrogen storage device 2' is pre-occluding the low-strength hydrogen mixed gas introduced from the hydrogen-containing gas tank 1. This shows a case in which the hydrogen that had been stored is released, the hydrogen concentration is completely increased, and the hydrogen is sent to the product gas line 4.
図(b)は、水素吸蔵装置2が、水素含有ガスタンク1
′より吸蔵した水素を製品ガスライン4へ送って、水素
吸蔵装置2′が水素含有ガスタンク1より水素を吸蔵し
ている場合を示す。Figure (b) shows that the hydrogen storage device 2 is connected to the hydrogen-containing gas tank 1.
A case is shown in which the hydrogen stored from the hydrogen storage device 2' is stored from the hydrogen-containing gas tank 1 by sending the stored hydrogen to the product gas line 4.
図(Clは、水素吸蔵装:IL2が水素含有ガスタンク
1′より水素を吸蔵して、水素吸菫榛f 2’が吸蔵し
た水素を製品ガスライン4へ送っている場合を示す。The figure (Cl) shows a case where the hydrogen storage device: IL2 stores hydrogen from the hydrogen-containing gas tank 1', and the hydrogen absorber f2' sends the stored hydrogen to the product gas line 4.
図(a)は、水素吸蔵状態2が水素含有ガスタンク1か
ら水素を吸蔵し、水素吸蔵11′が水素含有ガスタンク
1′から水素と吸、複している場合を示す。Figure (a) shows a case where the hydrogen storage state 2 stores hydrogen from the hydrogen-containing gas tank 1, and the hydrogen storage 11' absorbs hydrogen from the hydrogen-containing gas tank 1'.
(発明の効果)
以上の説明に二って理解ぢれる:うに、不発明によれば
、高濃度水素上官む水素混合ガスから所望する低濃度水
素混合ガスが優られ、又低濃度水素を含む水X混合ガス
から所望する。a 1度、かつ高圧力の水素混合ガスが
得らCる。従って、水素放出系に本装崖を組込むことに
二って、水素濃lを安全な濃度に低下させて大気に放出
させることができ、又水素貯蔵合金が吸蔵した水素を回
収することができるっ
又、低濃度、低圧の水素混合ガスを高濃度、高圧の水素
混合ガスとして再利用することができる。(Effects of the Invention) Two things can be understood from the above explanation: According to the invention, a desired low-concentration hydrogen mixed gas is superior to a high-concentration hydrogen-superior hydrogen mixed gas, and also contains low-concentration hydrogen. Desired from water x mixed gas. a Hydrogen mixed gas at 1 degree C and high pressure is obtained. Therefore, by incorporating this cliff into the hydrogen release system, the hydrogen concentration can be reduced to a safe concentration and released into the atmosphere, and the hydrogen stored in the hydrogen storage alloy can be recovered. Moreover, a low concentration, low pressure hydrogen mixed gas can be reused as a high concentration, high pressure hydrogen mixed gas.
具体列として、雰囲気焼成炉用雰囲気ガスの供給装置と
して水素濃度全調整して供給でき、或いは、雰囲気焼成
炉からの放出ガスの水素回収用としても利用され得る。Specifically, it can be used as an atmospheric gas supply device for an atmosphere firing furnace to supply hydrogen with its concentration fully adjusted, or it can be used to recover hydrogen from the gas released from the atmosphere firing furnace.
第1図は、本発明に係る水素濃度調整装置の実施例を示
す機器配置図、第2図は、高濃度水素混合ガスを低濃度
水素混合ガスに調整する場合の作用説明図、第3図は、
低濃度水素混合ガスを高濃度水素混合ガスに調整する場
合の作用説明図、第4図は、水素貯蔵合金の圧力−組成
等温曲線図、第5図は、実施例による高濃度水素混合ガ
スより低濃度水素混合ガスに調整した場合の時間経過と
製品ガス水素濃度との関係を示す線図、第6図は、実施
例による低濃度水素混合ガスより高濃度水素ガスに調整
した場合の時間経過と製品ガス水素濃度との関係を示す
線図、第7図(al、(bl、(C)、(d)は、それ
ぞれ、低濃度水素混合ガスを高濃度水素ガスに調整する
場合の各・々ルブの取扱を示した図である。
1 、1’ :水素含有ガスタンク、1a:圧力計、1
b:第1水素濃度計、2 、2’ :水素吸菫装置、2
d、2a’:第1圧力制御弁、2C:@置針、3′:加
熱・冷却装置、4:製品ガスライン、:第2水素濃度計
、4d:第2圧力制嘴弁、二流1計、5:放出ライン、
5f:ノ々ルブ。Fig. 1 is an equipment layout diagram showing an embodiment of the hydrogen concentration adjusting device according to the present invention, Fig. 2 is an explanatory diagram of the operation when adjusting a high concentration hydrogen mixed gas to a low concentration hydrogen mixed gas, and Fig. 3 teeth,
An explanatory diagram of the effect when adjusting a low concentration hydrogen mixed gas to a high concentration hydrogen mixed gas, Fig. 4 is a pressure-composition isothermal curve diagram of a hydrogen storage alloy, and Fig. 5 is a diagram from a high concentration hydrogen mixed gas according to an example. A diagram showing the relationship between the elapse of time and the hydrogen concentration of the product gas when adjusting to a low concentration hydrogen mixed gas, Figure 6 shows the time elapse when adjusting to a higher concentration hydrogen gas than the low concentration hydrogen mixed gas according to the example Figure 7 (al, (bl, (C), (d)) shows the relationship between hydrogen concentration and product gas hydrogen concentration, respectively. 1, 1': Hydrogen-containing gas tank, 1a: Pressure gauge, 1
b: First hydrogen concentration meter, 2, 2': Hydrogen absorption device, 2
d, 2a': first pressure control valve, 2C: @ positioning needle, 3': heating/cooling device, 4: product gas line, : second hydrogen concentration meter, 4d: second pressure control beak valve, second flow 1 meter, 5: Release line,
5f: Nonorubu.
Claims (3)
加熱・冷却装置及び温度計を具えた水素吸蔵装置を第1
圧力制御弁を介して連絡し、該水素吸蔵装置に、第2圧
力制御弁、及び流量計又は水素濃度計を具えた製品ガス
ライン、並びにパルプを具えた放出ラインを、それぞれ
接続したことを特徴とする水素濃度調整装置。(1) A hydrogen storage alloy is built into the hydrogen-containing gas tank,
The first hydrogen storage device is equipped with a heating/cooling device and a thermometer.
A second pressure control valve and a product gas line with a flow meter or a hydrogen concentration meter and a discharge line with pulp are connected to the hydrogen storage device through a pressure control valve, respectively. Hydrogen concentration adjustment device.
(Pd)にて水素ガスを放出する水素貯蔵合金を内蔵し
、加熱・冷却装置及び温度計を具えた水素吸蔵装置を第
1圧力制御弁を介して連絡し、該水素吸蔵装置に、第2
圧力制御弁、及び流量計又は水素濃度計を具えた製品ガ
スライン並びにパルプを具えた放出ラインを、それぞれ
接続し、水素含有ガスタンクから前記水素吸蔵装置へ、
比較的高い水素濃度(Cs)の水素混合ガスを供給し、
前記温度(Td)よりも低い温度に水素貯蔵合金を冷却
し、水素貯蔵合金のプラトー圧を低下させ、第2圧力制
御弁の設定圧を第1圧力制御弁の設定圧よりも若干低い
圧力に設定して、プラトー圧に応じて、水素濃度(Cs
)より低い所定の低水素濃度の水素混合ガスを製品ガス
ラインへ送出することを特徴とする水素濃度調整方法。(2) A hydrogen storage alloy that releases hydrogen gas at a predetermined temperature (Td) and pressure (Pd) is built into the hydrogen-containing gas tank, and the hydrogen storage device equipped with a heating/cooling device and a thermometer is controlled by the first pressure control. A second valve is connected to the hydrogen storage device via a valve.
connecting a product gas line with a pressure control valve and a flow meter or a hydrogen concentration meter and a discharge line with a pulp, respectively, from the hydrogen-containing gas tank to the hydrogen storage device;
Supplying a hydrogen mixed gas with a relatively high hydrogen concentration (Cs),
Cooling the hydrogen storage alloy to a temperature lower than the temperature (Td), reducing the plateau pressure of the hydrogen storage alloy, and setting the set pressure of the second pressure control valve to a pressure slightly lower than the set pressure of the first pressure control valve. The hydrogen concentration (Cs
) A hydrogen concentration adjustment method characterized by sending a hydrogen mixed gas having a lower predetermined low hydrogen concentration to a product gas line.
(Pd)にて水素ガスを吸蔵する水素貯蔵合金を内蔵し
、加熱・冷却装置及び温度計を具えた水素吸蔵装置を第
1圧力制御弁を介して連絡し、該水素吸蔵装置に第2圧
力制御弁、及び流量計又は水素濃度計を具えた製品ガス
ライン並びにパルプを具えた放出ラインを接続し、水素
含有ガスタンクから前記水素吸蔵装置へ比較的低い水素
濃度(Ct)の水素混合ガスを供給し、予め、所定温度
(Td)、圧力(Pd)で水素貯蔵合金に水素を吸蔵さ
せた後に、前記温度(Td)よりも高い温度に水素貯蔵
合金を加熱し、水素貯蔵合金のプラトー圧を水素濃度(
Ct)の水素分圧よりも高い圧力に上昇させ、第2圧力
制御弁の設定圧を第1圧力制御弁の設定圧よりも若干低
い圧力に設定して、プラトー圧に応じて水素濃度(Ct
)より高い所定の高濃度の水素混合ガスを製品ガスライ
ンへ送出することを特徴とする水素濃度調査方法。(3) A hydrogen storage alloy that stores hydrogen gas at a predetermined temperature (Td) and pressure (Pd) is built into the hydrogen-containing gas tank, and the hydrogen storage device equipped with a heating/cooling device and a thermometer is controlled by the first pressure. A second pressure control valve and a product gas line with a flow meter or a hydrogen concentration meter and a discharge line with pulp are connected to the hydrogen storage device through a valve, and a discharge line with a pulp is connected to the hydrogen storage device from a hydrogen-containing gas tank. After supplying a hydrogen mixed gas with a relatively low hydrogen concentration (Ct) to the hydrogen storage alloy and storing hydrogen in advance at a predetermined temperature (Td) and pressure (Pd), the hydrogen storage alloy is heated to a temperature higher than the temperature (Td). The hydrogen storage alloy is heated to , and the hydrogen concentration (
The set pressure of the second pressure control valve is set to a pressure slightly lower than the set pressure of the first pressure control valve, and the hydrogen concentration (Ct) is increased according to the plateau pressure.
) A hydrogen concentration investigation method characterized by sending a hydrogen mixed gas with a predetermined high concentration to a product gas line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2088930A JP2813830B2 (en) | 1990-04-03 | 1990-04-03 | Hydrogen concentration adjusting device and hydrogen concentration adjusting method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2088930A JP2813830B2 (en) | 1990-04-03 | 1990-04-03 | Hydrogen concentration adjusting device and hydrogen concentration adjusting method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03290301A true JPH03290301A (en) | 1991-12-20 |
| JP2813830B2 JP2813830B2 (en) | 1998-10-22 |
Family
ID=13956620
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2088930A Expired - Fee Related JP2813830B2 (en) | 1990-04-03 | 1990-04-03 | Hydrogen concentration adjusting device and hydrogen concentration adjusting method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2813830B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008053681A1 (en) * | 2006-10-31 | 2008-05-08 | Gas And Power Investment Co., Ltd. | Flammable gas concentration system |
| US8932387B2 (en) | 2010-01-26 | 2015-01-13 | Osaka Gas Co., Ltd. | Enrichment system for combustible gas |
| US8940081B2 (en) | 2010-01-26 | 2015-01-27 | Osaka Gas Co., Ltd. | Combustible gas enrichment apparatus |
| CN113377135A (en) * | 2020-02-25 | 2021-09-10 | Kc股份有限公司 | Gas mixing and supplying device, gas mixing and supplying system and gas mixing and supplying method |
-
1990
- 1990-04-03 JP JP2088930A patent/JP2813830B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008053681A1 (en) * | 2006-10-31 | 2008-05-08 | Gas And Power Investment Co., Ltd. | Flammable gas concentration system |
| US8328913B2 (en) | 2006-10-31 | 2012-12-11 | Osaka Gas Co., Ltd. | Flammable gas concentration system |
| US8932387B2 (en) | 2010-01-26 | 2015-01-13 | Osaka Gas Co., Ltd. | Enrichment system for combustible gas |
| US8940081B2 (en) | 2010-01-26 | 2015-01-27 | Osaka Gas Co., Ltd. | Combustible gas enrichment apparatus |
| CN113377135A (en) * | 2020-02-25 | 2021-09-10 | Kc股份有限公司 | Gas mixing and supplying device, gas mixing and supplying system and gas mixing and supplying method |
| CN113377135B (en) * | 2020-02-25 | 2024-05-24 | Kc股份有限公司 | Gas mixing and supplying device, gas mixing and supplying system and gas mixing and supplying method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2813830B2 (en) | 1998-10-22 |
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