JPH03290940A - Wafer table of probing machine - Google Patents

Wafer table of probing machine

Info

Publication number
JPH03290940A
JPH03290940A JP2091848A JP9184890A JPH03290940A JP H03290940 A JPH03290940 A JP H03290940A JP 2091848 A JP2091848 A JP 2091848A JP 9184890 A JP9184890 A JP 9184890A JP H03290940 A JPH03290940 A JP H03290940A
Authority
JP
Japan
Prior art keywords
wafer
probe card
probe
contact
inclination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2091848A
Other languages
Japanese (ja)
Inventor
Tsutomu Mizumura
勉 水村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Seimitsu Co Ltd
Original Assignee
Tokyo Seimitsu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Seimitsu Co Ltd filed Critical Tokyo Seimitsu Co Ltd
Priority to JP2091848A priority Critical patent/JPH03290940A/en
Publication of JPH03290940A publication Critical patent/JPH03290940A/en
Pending legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To bring the probes of a probe card into contact with the electrodes of IC's on a wafer accurately by a method wherein the inclination of a wafer table can be corrected in accordance with the inclination of the probe card. CONSTITUTION:After a probe card 28 is connected to a probe socket, a wafer chuck 10 is moved to a position B and receives a wafer 22 which is an object to be tested and moved to a position C and then to a position D. The wafer is positioned at the position C. Further, at the position D, the probes 28A of the probe card 28 are aligned with the electrodes of the wafer and the various electrical characteristics of the wafer are tested while the probes 28A are brought into contact with the respective electrodes of the wafer. If the probe card 28 is inclined and the contact between the probe 28A end the electrode is not satisfactory at that time, some of the vertical rods 64 of an inclination correcting mechanism 52 are moved vertically to align the mounting surface of a wafer table 12 with the inclined surface of the probe card 28 to bring the probe 28A into contact with the electrode securely.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はウェハ上のICの電気的特性を検査するプロー
ビングマシンに係り、特にウェハの種類に応じて交換さ
れるプローブカードを備えたプロービングマシンに関ス
ル。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a probing machine for inspecting the electrical characteristics of ICs on a wafer, and particularly to a probing machine equipped with a probe card that is replaced depending on the type of wafer. Regarding this.

〔従来の技術〕[Conventional technology]

プロービングマシンには、絶縁基板に触針を備えたプロ
ーブカードを使用するものがあり、このプローブカード
は予め数種類用意され、検査されるウェハに合ったプロ
ーブカードが測定部に取付けられて用いられる。
Some probing machines use a probe card that has a stylus on an insulating substrate. Several types of probe cards are prepared in advance, and the probe card that matches the wafer to be inspected is attached to the measuring section.

プローブカードは、触針がウェハ上のICのボンディン
グパッドに接触し、ICテスタにその測定信号を送るよ
うになっている。従って、プローブカードの触針は測定
時にはウェハ上のICのボンディングパッドに正確に且
つ所定の接触圧で接触していることが必要である。
The probe card has a stylus that contacts the bonding pad of an IC on the wafer and sends a measurement signal to the IC tester. Therefore, the stylus of the probe card must be in accurate contact with the bonding pad of the IC on the wafer with a predetermined contact pressure during measurement.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

方、ICの高性能化に伴い、ウェハの径も大きくなり、
これに応じてプローブカードの寸法も大きくなる。プロ
ーブカードの寸法が大きくなると、プローブカードがわ
ずかに傾いても傾斜量は大きくなり、触針に十分な接触
圧が得られず、測定不良となる場合がある。この為、従
来のプロービングマシンでは、プローブカードの傾斜補
正をプローブカードの取付部を操作して行っているが、
調整に手間取る欠点があった。
On the other hand, as the performance of ICs increases, the diameter of wafers also increases.
Correspondingly, the dimensions of the probe card also increase. When the dimensions of the probe card become large, even if the probe card is slightly tilted, the amount of tilt becomes large, and sufficient contact pressure cannot be obtained with the stylus, which may result in poor measurement. For this reason, in conventional probing machines, the inclination of the probe card is corrected by operating the mounting part of the probe card.
There was a drawback that it took time to adjust.

本発明は、このような事情に鑑みてなされたもので、プ
ローブカードの触針とウエノ\のIC上のボンディング
パッドとの接触が容易に確実に得られるプロービングマ
シンを提案することを目的としている。
The present invention was made in view of the above circumstances, and an object of the present invention is to propose a probing machine that can easily and reliably establish contact between the stylus of the probe card and the bonding pad on the Ueno IC. .

〔課題を解決する為の手段〕[Means to solve problems]

本発明は、前記目的を達成する為に、X方向、Y方向及
び2方向(上下方向〉に移動自在でウェハを載置して測
定部に移送するウェハ載置台と、ウェハの種類に応じて
予め備えられウニ/%上のICのボンディングパッドと
接触する触針を有し、プロービングマシン本体に取付け
られると共にICテスタと接続されたプローブカードと
、を有するプロービングマシンに於いて、前記載置台は
、プローブカードの傾斜量に応じて傾斜補正可能である
ことを特徴としている。
In order to achieve the above object, the present invention provides a wafer mounting table that is movable in the X direction, Y direction, and two directions (up and down directions), and on which a wafer is placed and transferred to a measuring section, and a In a probing machine having a probe card which is provided in advance and has a stylus that comes into contact with the bonding pad of the IC on the probing machine, which is attached to the probing machine body and is connected to the IC tester, the above-mentioned mounting stand is , the tilt can be corrected according to the amount of tilt of the probe card.

〔作用〕 本発明は、ウェハ載置台が傾斜補正機能を有しているの
で、プローブカードの傾斜に対しては簡単にウェハ載置
台を傾斜補正することにより対応でき、プローブカード
の触針とウエノ\上のICのボンディングパッドとの接
触は確実になされる。
[Function] In the present invention, since the wafer mounting table has an inclination correction function, it is possible to easily cope with the inclination of the probe card by correcting the inclination of the wafer mounting table. \Contact with the bonding pads of the upper IC is ensured.

〔実施例〕〔Example〕

以下、添付図面に従って本発明に係るプロービングマシ
ンの好ましい実施例を詳説する。
Hereinafter, preferred embodiments of the probing machine according to the present invention will be described in detail with reference to the accompanying drawings.

第1図は本発明が適用されるプロービングマシンの平面
図である。第1図に示すように、プロービングマシンは
、ウェハを吸引固着するウエノ翫チャック10、ウェハ
載置台12、ウエノ\の位置決めを行うプリアライメン
ト装置14、プローブカード28が取付けられてウエノ
\の電気的特性の検査を行う測定部16等から構成され
ている。
FIG. 1 is a plan view of a probing machine to which the present invention is applied. As shown in FIG. 1, the probing machine is equipped with a wafer chuck 10 that suctions and fixes the wafer, a wafer mounting table 12, a pre-alignment device 14 that positions the wafer, and a probe card 28. It is composed of a measuring section 16 and the like that performs characteristic inspection.

第1図に示すカセット18に収納されたウエノ飄22は
、搬送ベルト20で矢印方向に1枚ずつ導かれ、プリア
ライメント装置14によって一定方向に揃えた状態でA
位置に位置決めされる。位置決めされたウェハ22は搬
送アーム24により、A位置からB位置へと搬送される
。更に、B位置へ移動されたウェハ22はウエノ\チャ
ック10に真空吸着され、ウェハ載置台12によって測
定部16に移送される。
The bags 22 stored in the cassette 18 shown in FIG.
positioned in position. The positioned wafer 22 is transported from position A to position B by the transport arm 24. Further, the wafer 22 moved to the B position is vacuum-adsorbed by the wafer chuck 10 and transferred to the measuring section 16 by the wafer mounting table 12.

第2図(A)、(B)はウェハ載置台12の構造が示さ
れている。ウェハ載置台12は、下からX−Yステージ
50、傾斜補正機構52、Zステージ54、Zステージ
の上面に形成されたウエノ\チャックlOから構成され
ている。X−Yステージ50はねじ送り機構等の公知の
構造によりX−Y方向に移動し、Zステージ54はカム
機構等の公知の構造により上下方向に移動する。
FIGS. 2A and 2B show the structure of the wafer mounting table 12. FIG. The wafer mounting table 12 includes, from the bottom, an XY stage 50, a tilt correction mechanism 52, a Z stage 54, and a wafer chuck 10 formed on the top surface of the Z stage. The X-Y stage 50 is moved in the X-Y direction by a known structure such as a screw feed mechanism, and the Z stage 54 is moved in the vertical direction by a known structure such as a cam mechanism.

傾斜補正機構の支持板56の下面中央には半球58が形
成され、この半球58はZ−Yステージ50上に植立さ
れたポスト60の球面座62で支持され、従って支持板
56は半球部58を中心に任意の方向に傾斜可能である
。ポスト60の周りには、上下棒64.64.64が設
けられ、この上下棒64はモータ等の上下送り機構66
により駆動される。尚、68.68.68はばねである
A hemisphere 58 is formed at the center of the lower surface of the support plate 56 of the tilt correction mechanism, and this hemisphere 58 is supported by a spherical seat 62 of a post 60 set on the Z-Y stage 50. Therefore, the support plate 56 is a hemispherical portion. It can be tilted in any direction around 58. Vertical bars 64, 64, 64 are provided around the post 60, and this vertical bar 64 is connected to a vertical feed mechanism 66 such as a motor.
Driven by. Note that 68.68.68 is a spring.

前記の如く構成した本発明に係るプロービングマシンの
作用を説明する。
The operation of the probing machine according to the present invention configured as described above will be explained.

プローブカード28がプローブソケットに接続された後
、第1図に示すようにウェハチャックlOはB位置に移
動し、被検査品であるウェハ22を受けとり、C位置、
D位置の順に移動する。C位置では、ウェハの位置決め
が行われ、更に、D位置において、図示しない顕微鏡で
ウエノ\の電極と触針28Aとが位置合わせされ、触針
28Aをウェハの各電極に接触させなからウェハの電気
的緒特性の検査が実施される。この時プローブカード2
8が傾斜し、触針28Aの接触が充分でない時は、傾斜
機構52のいずれかの上下棒64を上下動し、プローブ
カード28の傾斜面にウェハ載置台12の載置面を合わ
せ、触針28Aを確実に接触させる。
After the probe card 28 is connected to the probe socket, the wafer chuck lO moves to the B position, receives the wafer 22 as the product to be inspected, and moves to the C position, as shown in FIG.
Move in order of D position. At position C, the wafer is positioned, and at position D, the electrode of the wafer and the stylus 28A are aligned using a microscope (not shown), and the stylus 28A is not brought into contact with each electrode of the wafer. Testing of electrical characteristics is carried out. At this time probe card 2
8 is tilted and the probe 28A is not making sufficient contact, move one of the vertical bars 64 of the tilting mechanism 52 up and down to align the mounting surface of the wafer mounting table 12 with the inclined surface of the probe card 28, and then touch the probe card 28. Make sure the needle 28A makes contact.

プローブカードをプローブソケットに取付けるのには、
マニュアル操作でも、自動装置でもよいが、本発明では
マニュアル操作に特に有効である。
To install the probe card into the probe socket,
Although manual operation or automatic device may be used, the present invention is particularly effective for manual operation.

またウェハの搬送を行うウェハチャック10を利用して
プローブカード28を測定部16に搬送及び接続するよ
うにしてもよい。これにより、プローブカードの搬送手
段を別個に設ける必要がなくなり、装置の簡略化を図る
ことができる。
Further, the probe card 28 may be transported and connected to the measuring section 16 using the wafer chuck 10 that transports the wafer. Thereby, there is no need to separately provide a means for transporting the probe card, and the apparatus can be simplified.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明に係るプロービングマシンに
よれば、ウェハ載置台に傾斜補正機構を設けたので、プ
ローブカードの傾斜量に応じてウェハ載置面を傾けるこ
とが出来、プローブカードの触針を正確にウェハ上のI
Cに接触させることが出来る。
As explained above, according to the probing machine according to the present invention, since the wafer mounting table is provided with the tilt correction mechanism, the wafer mounting surface can be tilted according to the amount of inclination of the probe card, and the stylus of the probe card can be tilted. exactly on the wafer
It can be brought into contact with C.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係るプロービングマシンの平面図、第
2図(A)、(B)は本発明の要部を示す説明図である
。 10・・・ウェハチャック、  12・・・ウェハ載置
台、16・・・測定部、      22・・・ウェハ
28・・・プローブカード、52・・・傾斜補正機構、
58・・・半球部、62・・・球面座、64・・・上下
棒。
FIG. 1 is a plan view of a probing machine according to the present invention, and FIGS. 2(A) and 2(B) are explanatory views showing essential parts of the present invention. DESCRIPTION OF SYMBOLS 10... Wafer chuck, 12... Wafer mounting table, 16... Measurement part, 22... Wafer 28... Probe card, 52... Tilt correction mechanism,
58... Hemispherical part, 62... Spherical seat, 64... Upper and lower bars.

Claims (1)

【特許請求の範囲】[Claims]  X方向、Y方向及びZ方向(上下方向)に移動自在で
ウェハを載置して測定部に移送するウェハ載置台と、ウ
ェハの種類に応じて予め備えられウェハ上のICのボン
ディングパッドと接触する触針を有し、プロービングマ
シン本体に取付けられると共にICテスタと接続された
プローブカードと、を有するプロービングマシンに於い
て、前記載置台は、プローブカードの傾斜量に応じて傾
斜補正可能であることを特徴とするプロービングマシン
のウェハ載置台。
A wafer mounting table that is movable in the X direction, Y direction, and Z direction (up and down direction) and that places the wafer on it and transfers it to the measurement unit, and a wafer mounting table that is prepared in advance according to the type of wafer and that makes contact with the bonding pad of the IC on the wafer. In a probing machine that has a probe card that has a stylus that is attached to the probing machine main body and is connected to an IC tester, the mounting table is capable of inclination correction according to the amount of inclination of the probe card. A wafer mounting stand for a probing machine, which is characterized by:
JP2091848A 1990-04-06 1990-04-06 Wafer table of probing machine Pending JPH03290940A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2091848A JPH03290940A (en) 1990-04-06 1990-04-06 Wafer table of probing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2091848A JPH03290940A (en) 1990-04-06 1990-04-06 Wafer table of probing machine

Publications (1)

Publication Number Publication Date
JPH03290940A true JPH03290940A (en) 1991-12-20

Family

ID=14037993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2091848A Pending JPH03290940A (en) 1990-04-06 1990-04-06 Wafer table of probing machine

Country Status (1)

Country Link
JP (1) JPH03290940A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009135502A (en) * 2008-12-03 2009-06-18 Yokogawa Electric Corp Stage lifting device
JP2009164245A (en) * 2007-12-28 2009-07-23 Sumitomo Heavy Ind Ltd Tilt stage
JP2012512529A (en) * 2008-12-12 2012-05-31 セネカ マージャー サブ,インコーポレイテッド How to improve stage travel time
JP2017005070A (en) * 2015-06-09 2017-01-05 株式会社ディスコ Transport device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009164245A (en) * 2007-12-28 2009-07-23 Sumitomo Heavy Ind Ltd Tilt stage
JP2009135502A (en) * 2008-12-03 2009-06-18 Yokogawa Electric Corp Stage lifting device
JP2012512529A (en) * 2008-12-12 2012-05-31 セネカ マージャー サブ,インコーポレイテッド How to improve stage travel time
JP2017005070A (en) * 2015-06-09 2017-01-05 株式会社ディスコ Transport device

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