JPH0332939U - - Google Patents
Info
- Publication number
- JPH0332939U JPH0332939U JP9011689U JP9011689U JPH0332939U JP H0332939 U JPH0332939 U JP H0332939U JP 9011689 U JP9011689 U JP 9011689U JP 9011689 U JP9011689 U JP 9011689U JP H0332939 U JPH0332939 U JP H0332939U
- Authority
- JP
- Japan
- Prior art keywords
- reforming
- chamber
- raw material
- heating
- heat transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Hydrogen, Water And Hydrids (AREA)
Description
第１図は本考案の改質装置の一実施例を示す概
略図、第２図は第１図による場合の改質温度変化
パターンを示す図、第３図及び第４図はいずれも
本考案の改質装置の変形例を示す概略断面図、第
５図は最近提案されている改質装置の概略を示す
断面図である。
１……改質室、２……改質用触媒、３……改質
原料の入口、４……改質ガスの出口、５……伝熱
隔壁、６……加熱室、７……加熱流体の入口、８
……加熱流体の取出口、Ａ……改質原料、Ｂ……
改質ガス、Ｃ……加熱流体、……自己顕熱消費
ゾーン、……加熱反応ゾーン。
Figure 1 is a schematic diagram showing an embodiment of the reforming device of the present invention, Figure 2 is a diagram showing the reforming temperature change pattern in the case of Figure 1, and Figures 3 and 4 are both of the invention FIG. 5 is a schematic sectional view showing a modified example of the reforming device, and FIG. 5 is a sectional view schematically showing a reforming device that has been proposed recently. 1... Reforming chamber, 2... Reforming catalyst, 3... Inlet of reformed raw material, 4... Outlet of reformed gas, 5... Heat transfer partition, 6... Heating chamber, 7... Heating fluid inlet, 8
... Heating fluid outlet, A ... Reforming raw material, B ...
Reformed gas, C... heated fluid,... self-sensible heat consumption zone,... heating reaction zone.
Claims (1)
質原料の入口を設けると共に他端に改質ガスの出
口を設け、上記改質室の出口側から中間部分の間
に、加熱流体を流通させるようにしてある加熱室
を伝熱隔壁を挟んで重合させ、上記改質室の入口
側から中間部分までの間を、改質原料の顕熱を消
費して改質反応を起こさせる自己顕熱消費ゾーン
とし、且つ上記改質室の加熱室と重合する中間部
分から出口側までの間を、加熱反応ゾーンとして
備えてなることを特徴とする改質装置。 An inlet for the reformed raw material is provided at one end of the reforming chamber filled with a reforming catalyst, and an outlet for the reformed gas is provided at the other end. Polymerization is carried out through a heating chamber in which a heat transfer partition is placed between the heat transfer partitions, and the sensible heat of the reforming raw material is consumed to cause a reforming reaction between the inlet side and the middle part of the reforming chamber. 1. A reforming apparatus comprising a self-sensible heat consumption zone, and a heating reaction zone between the intermediate portion of the reforming chamber where polymerization occurs in the heating chamber and the exit side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9011689U JPH0332939U (en) | 1989-07-31 | 1989-07-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9011689U JPH0332939U (en) | 1989-07-31 | 1989-07-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0332939U true JPH0332939U (en) | 1991-03-29 |
Family
ID=31639655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9011689U Pending JPH0332939U (en) | 1989-07-31 | 1989-07-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0332939U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003045459A (en) * | 2001-08-01 | 2003-02-14 | Casio Comput Co Ltd | Heating device, reformer, and fuel cell system |
-
1989
- 1989-07-31 JP JP9011689U patent/JPH0332939U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003045459A (en) * | 2001-08-01 | 2003-02-14 | Casio Comput Co Ltd | Heating device, reformer, and fuel cell system |
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