JPH0338205A - Rapid filtration device - Google Patents
Rapid filtration deviceInfo
- Publication number
- JPH0338205A JPH0338205A JP1171455A JP17145589A JPH0338205A JP H0338205 A JPH0338205 A JP H0338205A JP 1171455 A JP1171455 A JP 1171455A JP 17145589 A JP17145589 A JP 17145589A JP H0338205 A JPH0338205 A JP H0338205A
- Authority
- JP
- Japan
- Prior art keywords
- water
- pit
- filtration
- layer
- backwashing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001914 filtration Methods 0.000 title claims abstract description 70
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 148
- 238000011001 backwashing Methods 0.000 claims description 37
- 239000000706 filtrate Substances 0.000 claims description 7
- 101150054854 POU1F1 gene Proteins 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 238000000746 purification Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 230000004907 flux Effects 0.000 description 4
- 239000008213 purified water Substances 0.000 description 4
- 239000004576 sand Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- RHZUVFJBSILHOK-UHFFFAOYSA-N anthracen-1-ylmethanolate Chemical compound C1=CC=C2C=C3C(C[O-])=CC=CC3=CC2=C1 RHZUVFJBSILHOK-UHFFFAOYSA-N 0.000 description 2
- 239000003830 anthracite Substances 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Filtration Of Liquid (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、水中の懸濁物質あるいは浮遊物質(以下SS
と称する)を比較的迅速に除去する急速濾過装置に間す
るものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention is directed to the treatment of suspended solids or suspended solids (hereinafter referred to as SS) in water.
It is used in a rapid filtration device that relatively quickly removes filtrate.
急速濾過は水中のSSを迅速かつ短時間に除去する有効
な手段として知られ、現在広く用いられている水処理方
法の一つである。この方法では処理の継続と共に、珪砂
その他で構成した濾過層において目詰まりが進行するの
で、処理のための通水が不可能となる時点で、処理すべ
き対象水(以下原水と称する)の通水を中断し、濾過水
を用いて、濾過層を下部より上向きに洗浄する(逆流洗
浄あるいは逆洗と称す)操作もしくは工程が必要である
。この逆洗には濾過層を水流で膨張させ、目詰まりの原
因である88分を処理装置外へ排出するので、圧力と水
量と時間を必要とする。Rapid filtration is known as an effective means for quickly and quickly removing SS from water, and is one of the water treatment methods currently widely used. In this method, as the treatment continues, the filter layer made of silica sand and other materials becomes clogged, so the water to be treated (hereinafter referred to as raw water) is passed through until it becomes impossible to pass water through for treatment. An operation or process is required in which the water is interrupted and filtered water is used to wash the filtration layer upward from the bottom (referred to as backwashing or backwashing). This backwashing involves expanding the filtration layer with water flow and discharging 88 minutes, which is the cause of clogging, out of the processing device, which requires pressure, water volume, and time.
この逆洗の最も一般的な方法は、濾過水を1回の逆洗に
必要なだけ貯留しておき、逆洗用のポンプで濾過水を送
水する場合である。これに対して、濾過II置を8以上
から成る複数で構成し、任意のIM置を逆洗する際、残
余の濾過装置の濾過水の水量と水圧を利用して逆洗を行
なう方法があり、 「自己水逆洗型」と通称されている
。The most common method for backwashing is to store filtrated water in an amount necessary for one time of backwashing, and to supply the filtrated water with a pump for backwashing. On the other hand, there is a method in which a plurality of 8 or more filtration units are configured and when backwashing any IM unit, backwashing is performed using the amount and water pressure of the filtrated water of the remaining filtration units. It is commonly known as the "self-water backwashing type."
従来の急速濾過装置では、上記逆洗操作において、ポン
プを必要とするか、あるいは、いわゆる「自己水逆洗型
」では、逆洗操作に人っている装置以外の装置の濾過水
の水圧と水量を利用して逆洗するので、他装置の濾過水
量が変動した場合、逆洗流速が不安定となる。また逆洗
流速が大きすぎると濾過層の膨張率が大きくなり、濾材
が装置外へ逆洗排水とともに排出され、反対に逆洗流速
が小さすぎると、濾過層の膨張が不十分となり、また濾
材粒子相互の衝突が不十分となり、濾過の継続により濾
過層中に抑留された濁質粒子をV&装置外排出するとい
う逆洗操作本来の目的が達せられない、逆洗流速は過去
の経験から通常0.8m/分〜0.9m/分程度に設定
する。 (水温20℃の場合)。Conventional rapid filtration equipment requires a pump for the backwashing operation, or, in the so-called "self-water backwashing type", the water pressure of the filtrate water of a device other than the one in which the backwashing operation is carried out requires a pump. Since backwashing is performed using the amount of water, if the amount of filtrated water in other devices fluctuates, the backwashing flow rate becomes unstable. In addition, if the backwash flow rate is too high, the expansion rate of the filtration layer will increase, and the filter material will be discharged out of the device along with the backwash wastewater.On the other hand, if the backwash flow rate is too low, the expansion of the filtration layer will be insufficient, and the filter material Collision between particles becomes insufficient, and the original purpose of the backwashing operation, which is to discharge the suspended particles trapped in the filtration layer out of the V & device due to continued filtration, cannot be achieved. Based on past experience, the backwashing flow rate is normal. Set to about 0.8 m/min to 0.9 m/min. (When water temperature is 20℃).
さらに、冬期に水温が低下すると、水の粘性が増加する
ので、同一逆洗流速では濾過層の膨張率が大きくなり、
濾材が流出する悪念があり、その場合は逆洗流速を下げ
る必要がある。Furthermore, when the water temperature drops in winter, the viscosity of the water increases, so the expansion rate of the filtration layer increases at the same backwash flow rate.
There is a fear that the filter media will flow out, and in that case, it is necessary to reduce the backwash flow rate.
従来の「自己水逆洗型」の急速濾過装置においては濾過
水量の変動や水温に対する41が不十分なため、ややも
すると逆洗流速が不足し、逆洗不十分となり、&l過水
の濁質の流出等の現象がみられた。In the conventional "self-water backwashing type" rapid filtration equipment, 41 is insufficient for fluctuations in the amount of filtrated water and water temperature, so the backwashing flow rate becomes insufficient and backwashing becomes insufficient, resulting in cloudy filtrate water. Phenomena such as a loss of quality were observed.
本発明はこれに鑑みてなしたものである。The present invention has been made in view of this.
複数の急速濾過装置の濾過水を集合する共通。 Common for collecting filtrate water from multiple rapid filtration devices.
の渠を設け、そのうちの一つの濾過装置の逆洗を他の濾
過装置の濾過水の水量と圧力を用いて行なう装置におい
て、
濾過水を貯留する共通の渠の一端に電動もしくはその他
の駆動力により上下する可動堰を設け、前記渠の水位を
自動的に検出する検出器と可動堰を制御するコントロー
ラーにより可動堰を上下させ、渠の水位を制御し、一つ
の急速濾過装置の逆洗流速を制御するようになす。In a device in which one of the filtration devices is backwashed using the volume and pressure of filtrated water from the other filtration device, an electric or other driving force is installed at one end of the common culvert that stores the filtrate water. A movable weir that moves up and down is installed, and a detector that automatically detects the water level in the drain and a controller that controls the movable weir move the movable weir up and down, controlling the water level in the drain, and controlling the backwash flow rate of one rapid filtration device. be controlled.
最小濾過水量においても、所要の逆洗流速が下式により
確保できるよう急速濾過装置の数nを決定する。The number n of rapid filtration devices is determined so that the required backwash flow rate can be ensured using the following formula even at the minimum amount of filtration water.
ここで n:
急速m過装置数
va: 所要逆洗流速(m/分)
vr:最小濾過流速(m/分〉
装置の配置上、急速濾過lI置の数nは偶数とする。n
個の各急速濾過H置の濾過水が集合し、同一の水面水位
を形成する渠を設け、この渠の水位を決定する可動堰を
渠の任意の箇所に設け、この渠は電動その他人力を要せ
ず、上下に全体が可動できる構造とする。静電容量式あ
るいは超音波式等、この渠の水位を連続的かつ自動的に
検出できる水位計からの信号により、この自動堰を上下
して、水温、濾過水量の変化に対して常に適正な逆洗効
果が得られるように設定した渠の水位が保てるようにす
る。Where, n: Number of rapid filtration devices va: Required backwash flow rate (m/min) vr: Minimum filtration flow rate (m/min) Due to the arrangement of the device, the number n of rapid filtration units is an even number.n
A channel is provided in which the filtrated water from each rapid filtration location gathers to form the same water surface water level, and a movable weir is installed at any location on the channel to determine the water level of this channel. The structure is such that the entire structure can be moved up and down. The automatic weir is raised and lowered by signals from a water level meter, such as a capacitance type or an ultrasonic type, that can continuously and automatically detect the water level in the culvert, and is constantly adjusted to the appropriate level in response to changes in water temperature and filtration water volume. Ensure that the water level in the drain is maintained at a level that provides a backwashing effect.
急速濾過装置の逆洗操作に必要な圧力は次式%式%
h: 逆洗に必要な圧力(水頭m)
h、: 第1層の濾過層の圧力損失
hb: 第2層の濾過層の圧力損失
h0: 砂利層の圧力損失(水頭m)h4: 集水
装置の圧力損失(水ff m )h、: 流出側の配
管圧力損失(水頭m)(水頭m〉
(水頭m)
下表に、第1層にアンスラサイトから成る濾過層を、第
2711に珪砂から成る濾過層から成る急速1134装
置において、各逆洗速度に対する必要逆洗圧力(水温2
0℃)の計算例を掲げる。The pressure required for backwashing of a rapid filtration device is expressed by the following formula: % h: Pressure required for backwashing (water head m) h: Pressure loss of the first filtration layer hb: Pressure loss of the second filtration layer Pressure loss h0: Pressure loss in the gravel layer (water head m) h4: Pressure loss in the water collection device (water ff m) h,: Piping pressure loss on the outflow side (water head m) (water head m〉 (water head m) In the table below , in a rapid 1134 device consisting of a filtration layer made of anthracite as the first layer and a filtration layer made of silica sand as the 2711th layer, the required backwash pressure for each backwash speed (water temperature 2
An example of calculation for 0°C) is shown below.
上表の(6)の欄の数値が逆洗速度0.5〜0.9m/
分に対する必要圧力であり、実施例第3図に示す浄水!
11と逆洗排水排出トラフ9の天端との水位差に相当す
る。The numbers in column (6) of the table above indicate the backwash speed of 0.5 to 0.9 m/
Required pressure for minutes, water purification shown in Example Figure 3!
11 and the top of the backwash drainage discharge trough 9.
水温20℃における逆洗速度は0.6m/分が標準であ
るが、前記のように水温の変動によって、最適逆洗速度
は変化するので第1図に示す間係を用いて逆洗速度を補
正し、常に一定の逆洗効果を得るようにする。The standard backwashing speed at a water temperature of 20°C is 0.6 m/min, but as mentioned above, the optimal backwashing speed changes depending on the fluctuation of the water temperature, so use the interval shown in Figure 1 to determine the backwashing speed. Correct it to always obtain a constant backwashing effect.
上記計算で得られる圧力(水位差)を、濾過水量、水温
に応じて保てるように浄水渠流出儒可動堰天端の位置を
決定する。The position of the top of the water purification channel outflow movable weir is determined so that the pressure (water level difference) obtained by the above calculation can be maintained according to the amount of filtered water and the water temperature.
第2図は逆洗流速0.6m/分を設定した時の、濾過時
と逆洗時の可動堰の天端の位置を示したものである。Figure 2 shows the position of the top of the movable weir during filtration and backwashing when the backwash flow rate was set at 0.6 m/min.
以下本発明急速w1過装置を図示の一実施例にもとづい
て説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The rapid W1 passing device of the present invention will be explained below based on an embodiment shown in the drawings.
図においてAは原水渠本体、Bはこの原水渠本体Aに対
し、1乃至2以上の必要数を隣接する急速濾過装置であ
る。In the figure, A is the main body of the raw water conduit, and B is the necessary number of rapid filtration devices adjacent to the main body A of the raw water conduit, one to two or more.
原水渠零体Aはその上部と下部とを仕切壁21にて完全
に上下に分割し、上部側を原水渠1、下部側を浄水束1
2とする。また原水J!!1内には縦方向の仕切壁22
を介して原水流入!I!3を設けると共に、この原水渠
1と原水流入渠3間にしかも上記仕切!!22を跨ぐよ
うにしてサイフオン管2を設けて原水渠lより原水流入
束3へ原水が流入するようになす。The raw water conduit zero body A is completely divided into upper and lower parts by a partition wall 21, and the upper side is the raw water conduit 1 and the lower side is the purified water bundle 1.
Set it to 2. Gensui J again! ! 1 has a vertical partition wall 22
Raw water flows in through! I! 3 is installed, and there is also the above-mentioned partition between raw water conduit 1 and raw water inflow conduit 3! ! A siphon pipe 2 is provided so as to straddle the raw water conduit 1 so that raw water flows into the raw water inflow flux 3 from the raw water conduit 1.
またこの原水流入束3と急速濾過MIIBとは原水流入
管4を配設し、これにより原水渠lの原水を複数隣接さ
れた急速濾過装置Bへ均等に逆流水する。また共通の原
水渠lより各急速濾過装置Bには原水流入サイフオン管
2より原水流入束3、原水流入管4を介して一定流量で
流入せしめる。Further, a raw water inflow pipe 4 is arranged between the raw water inflow flux 3 and the rapid filtration MIIB, whereby the raw water in the raw water conduit 1 is evenly backflowed to a plurality of adjacent rapid filtration devices B. Further, the raw water is allowed to flow into each rapid filtration device B from a common raw water conduit 1 at a constant flow rate through a raw water inflow siphon pipe 2, a raw water inflow flux 3, and a raw water inflow pipe 4.
急速濾過装置Bは上部より第1tjE過層5、第211
過N6、砂利I!17及び集水層8を順次配設してなり
、この第1m過層5としてアンスラサイトを、第2濾過
層6として珪砂を用いるが、この第1、第2の濾過層を
珪砂のみで構成することも可能である。この第1、第2
濾過層5゜6の下部に構成される砂利N7は上記濾過層
5゜6を物理的に支持するためのものであり、また濾過
層5,6、砂利層7を濾過透水された濾過水を集水層8
にて均等に集めるものである。The rapid filtration device B has the 1st tjE filtration layer 5 and the 211th filtration layer from the top.
Over N6, gravel I! 17 and a water collection layer 8 are arranged in sequence, and anthracite is used as the first filter layer 5 and silica sand is used as the second filter layer 6, but the first and second filter layers are composed only of silica sand. It is also possible to do so. This first and second
The gravel N7 formed at the bottom of the filtration layer 5゜6 is for physically supporting the filtration layer 5゜6, and also for filtering water that has passed through the filtration layers 5, 6 and the gravel layer 7. Water catchment layer 8
It will be collected equally at
浄水束12は各急速濾過装置1Bからの濾過水を貯留す
るためのもので、このため各急速濾過装置Bの下部と浄
水束12とは流水孔23または流水管にて接続されると
共に、各急速濾過装置Bの水位を共通とするため、該渠
12内に制御可動堰13が設けられる。14は浄水束1
2内の水位を検出するための水位検出器で、この水位検
出器14によって浄水束12の水位を自動的かつ連続的
に検出し、あらかじめ設定した水位になるようにコント
ローラー16を介して堰駆動モータ15を制御し、制御
可動堰13を上下させる。The water purification bundle 12 is for storing the filtered water from each rapid filtration device 1B, and for this reason, the lower part of each rapid filtration device B and the water purification bundle 12 are connected by a water hole 23 or a water pipe, and each In order to make the water level of the rapid filtration device B common, a controllable movable weir 13 is provided within the drain 12. 14 is water purification bundle 1
The water level detector 14 automatically and continuously detects the water level in the purified water bundle 12, and the weir is driven via the controller 16 to reach a preset water level. The motor 15 is controlled to move the control movable weir 13 up and down.
従って原水を急速濾過する場合、原水IJ!lからサイ
フオン管2、原水流入束3、流入管4を経て急速濾過袋
+11B内へ原水が流入され、この装置の上部層から順
次第1濾過層5、第211過層6、砂利層7を経て濾過
される。そして濾過された水は集水層8にて集水され、
流入孔23を経て浄水束12内に貯留される。このよう
に原水の濾過により急速濾過装置内の水位が濾過の継続
につれて、濁質外の濾過層内抑留のため上昇し、許容限
度を超えたときは、原水流入サイフオン2を閉とし、排
水サイフオン10を閏として濾j!!1装置内の水を排
水渠11に排出する。Therefore, when rapidly filtering raw water, raw water IJ! 1, raw water flows into the rapid filtration bag +11B through the siphon pipe 2, raw water inflow flux 3, and inflow pipe 4, and passes through the first filtration layer 5, the 211th filtration layer 6, and the gravel layer 7 in order from the upper layer of this device. It is then filtered. The filtered water is collected in a water collection layer 8,
The water is stored in the purified water bundle 12 through the inflow hole 23 . In this way, as the filtration of raw water continues, the water level in the rapid filtration device rises due to the retention of turbidity in the filtration layer, and when it exceeds the permissible limit, the raw water inflow siphon 2 is closed and the drainage siphon 2 is closed. Filter by using 10 as a leap! ! 1 The water in the device is discharged to the drain 11.
濾過装置B内の水位が逆洗排水トラフ9の天端まで低下
すると、浄水vJ!12との水位差Hにより浄水渠12
の水は逆流し、濾過層の逆洗が開始される。この水位差
H(圧力)で一定時間逆洗を行なうものである。When the water level in the filtration device B drops to the top of the backwash drainage trough 9, the purified water vJ! Due to the water level difference H between 12 and 12, water purification culvert 12
The water flows back, and backwashing of the filtration layer begins. Backwashing is performed for a certain period of time with this water level difference H (pressure).
本発明は水位差Hを制御可動堰13を自動的に上下させ
、このm過水量、水温、その他の条件に応じて常に適正
に保持できるようにしたものである。逆洗操作を終了す
る際は排水サイフオン管10を閉じ、原水流入サイフオ
ン2を間けることにより、濾過装置内の水位が上昇し、
浄水渠に向かう方向に流れ、濾過操作が再開される。な
お、サイフオン管2,10の開閉は真空ポンプに連結し
た真空配管の開閉により自動的に行なうものである。In the present invention, the water level difference H is controlled by automatically raising and lowering the movable weir 13, so that the water level difference H can be maintained properly at all times depending on the excess water amount, water temperature, and other conditions. When finishing the backwashing operation, the water level in the filtration device rises by closing the drain siphon pipe 10 and opening the raw water inflow siphon 2.
The water flows in the direction towards the water purification culvert and the filtration operation is restarted. The opening and closing of the siphon tubes 2 and 10 is automatically performed by opening and closing vacuum piping connected to a vacuum pump.
本発明によるときは次の如き効果がある。 The present invention has the following effects.
■ 複数の濾過装置から成る本発明装置において、一つ
の濾過装置の逆洗は他の装置のw1過水量と圧力を利用
して行なうので、逆洗ポンプ等の機器を必要としない、
■ 濾過水量、水温の変動等の条件に対応して、常に安
定した逆洗を行なうことが可能となり、逆洗不良によX
I濾過層内でのマッドボールの形成、あるいは逆洗過剰
による濾材の流出の障害を防止できる。■ In the device of the present invention consisting of a plurality of filtration devices, backwashing of one filtration device is performed using the w1 filtration water volume and pressure of other devices, so equipment such as a backwash pump is not required. ■ Filtration water volume , it is possible to always perform stable backwashing in response to conditions such as fluctuations in water temperature, and there is no problem due to poor backwashing.
I. Formation of mud balls within the filtration layer or obstruction of outflow of the filter medium due to excessive backwashing can be prevented.
■ 逆洗操作中においても、従来の固定堰を用いる方法
と比較すると、常に一定の逆洗梳速を自動的に保持でき
る。■ Even during backwashing operations, a constant backwashing speed can be automatically maintained at all times compared to the conventional method using a fixed weir.
■ 必要に応じて任意の逆洗流速を設定することが、可
動堰天端の位置を設定するのみという簡単な操作で行な
える。■ Setting any backwash flow rate as needed can be done simply by setting the position of the movable weir top.
第1図は最適逆洗流速の水温による補正を示す説明図、
第2図は本発明における可動堰の位置の例を示す説明図
、第3図は本発明装置の実施例を示す断面図、第4図は
本発明の効果の1例を示す説明図である。
1・・・原水束
2・・・原水流入サイフオン
3・・・原水法入渠
4・・・原水流入管
5・・・第1Iw濾過層
6・・・第2層m過層
7・・・支持砂利層
8・・・集水装置
9・・・逆洗排水トラフ
0・・・逆洗排水サイフオン
ト・・排水渠
2・・・浄水渠
3・・・制御可動堰
4・・・水位検出器
5・・・制御可動堰駆動モーター
6・・・コントローラー
A・・・原水束本体
B・・・急速濾過装置
許
出
願
人
扶桑建設工業株式会社Figure 1 is an explanatory diagram showing the correction of the optimum backwash flow rate by water temperature;
FIG. 2 is an explanatory diagram showing an example of the position of the movable weir in the present invention, FIG. 3 is a sectional view showing an embodiment of the device of the present invention, and FIG. 4 is an explanatory diagram showing an example of the effects of the present invention. . 1... Raw water bundle 2... Raw water inflow siphon 3... Raw water method dock 4... Raw water inflow pipe 5... 1st Iw filtration layer 6... 2nd layer m filtration layer 7... Support Gravel layer 8...Water collection device 9...Backwash drainage trough 0...Backwash drainage siphont...Drainage culvert 2...Water purification culvert 3...Control movable weir 4...Water level detector 5 ... Control movable weir drive motor 6 ... Controller A ... Raw water bundle body B ... Rapid filtration device Applicant: Fuso Construction Industry Co., Ltd.
Claims (1)
、そのうちの一つの濾過装置の逆洗を他の濾過装置の濾
過水の水量と圧力を用いて行なう装置において、 濾過水を貯留する共通の渠の一端に電動もしくはその他
の駆動力により上下する可動堰を設け、前記渠の水位を
自動的に検出する検出器と可動堰を制御するコントロー
ラーにより可動堰を上下させ、渠の水位を制御し、一つ
の急速濾過装置の逆洗流速を制御することを可能とした
ことを特徴とする急速濾過装置。[Claims] In a device in which a common conduit is provided to collect filtrate water from a plurality of rapid filtration devices, and backwashing of one of the filtration devices is performed using the volume and pressure of filtrate water from other filtration devices. , A movable weir that is moved up and down by electric or other driving force is installed at one end of a common conduit that stores filtered water, and the movable weir is raised and lowered by a detector that automatically detects the water level in the conduit and a controller that controls the movable weir. A rapid filtration device characterized in that it is possible to control the water level of a culvert and the backwash flow rate of one rapid filtration device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1171455A JPH0338205A (en) | 1989-07-03 | 1989-07-03 | Rapid filtration device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1171455A JPH0338205A (en) | 1989-07-03 | 1989-07-03 | Rapid filtration device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0338205A true JPH0338205A (en) | 1991-02-19 |
Family
ID=15923425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1171455A Pending JPH0338205A (en) | 1989-07-03 | 1989-07-03 | Rapid filtration device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0338205A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015116533A (en) * | 2013-12-18 | 2015-06-25 | 水ing株式会社 | Slowdown washing filtration apparatus and filtration method of the same |
| JP2015167932A (en) * | 2014-03-10 | 2015-09-28 | 水道機工株式会社 | Filtration washing apparatus and filtration washing method |
| JP2016002489A (en) * | 2014-06-13 | 2016-01-12 | 株式会社石垣 | Washing method of filter |
| WO2018047453A1 (en) * | 2016-09-12 | 2018-03-15 | 水ing株式会社 | Filtration device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5221817A (en) * | 1975-08-13 | 1977-02-18 | Hitachi Ltd | Thin film magnetic head with mid point terminal |
| JPS5310699A (en) * | 1976-07-19 | 1978-01-31 | Miyoshi Yushi Kk | Process for preparing chelate resin |
| JPS5725683B2 (en) * | 1977-08-29 | 1982-05-31 |
-
1989
- 1989-07-03 JP JP1171455A patent/JPH0338205A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5221817A (en) * | 1975-08-13 | 1977-02-18 | Hitachi Ltd | Thin film magnetic head with mid point terminal |
| JPS5310699A (en) * | 1976-07-19 | 1978-01-31 | Miyoshi Yushi Kk | Process for preparing chelate resin |
| JPS5725683B2 (en) * | 1977-08-29 | 1982-05-31 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015116533A (en) * | 2013-12-18 | 2015-06-25 | 水ing株式会社 | Slowdown washing filtration apparatus and filtration method of the same |
| JP2015167932A (en) * | 2014-03-10 | 2015-09-28 | 水道機工株式会社 | Filtration washing apparatus and filtration washing method |
| JP2016002489A (en) * | 2014-06-13 | 2016-01-12 | 株式会社石垣 | Washing method of filter |
| WO2018047453A1 (en) * | 2016-09-12 | 2018-03-15 | 水ing株式会社 | Filtration device |
| JPWO2018047453A1 (en) * | 2016-09-12 | 2019-06-27 | 水ing株式会社 | Filtration device |
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