JPH0339320A - Epoxy resin composition - Google Patents
Epoxy resin compositionInfo
- Publication number
- JPH0339320A JPH0339320A JP17343189A JP17343189A JPH0339320A JP H0339320 A JPH0339320 A JP H0339320A JP 17343189 A JP17343189 A JP 17343189A JP 17343189 A JP17343189 A JP 17343189A JP H0339320 A JPH0339320 A JP H0339320A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- weight
- reducing agent
- parts
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 34
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 34
- 239000000203 mixture Substances 0.000 title claims abstract description 8
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 16
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 claims abstract description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 abstract description 18
- 238000013508 migration Methods 0.000 abstract description 9
- 230000005012 migration Effects 0.000 abstract description 9
- 239000002184 metal Substances 0.000 abstract description 8
- 229910052751 metal Inorganic materials 0.000 abstract description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract description 7
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 4
- 238000002156 mixing Methods 0.000 abstract description 4
- 229940079877 pyrogallol Drugs 0.000 description 8
- 238000009413 insulation Methods 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- -1 triazine compound Chemical class 0.000 description 5
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 4
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000010292 electrical insulation Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- XOUQAVYLRNOXDO-UHFFFAOYSA-N 2-tert-butyl-5-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(O)=C1 XOUQAVYLRNOXDO-UHFFFAOYSA-N 0.000 description 2
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- ZOQVDXYAPXAFRW-UHFFFAOYSA-N 2,5-diethyl-1h-imidazole Chemical compound CCC1=CNC(CC)=N1 ZOQVDXYAPXAFRW-UHFFFAOYSA-N 0.000 description 1
- DAKZLOJXUDPQIL-UHFFFAOYSA-N 2-butyl-4-ethylphenol Chemical compound CCCCC1=CC(CC)=CC=C1O DAKZLOJXUDPQIL-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- HXIQYSLFEXIOAV-UHFFFAOYSA-N 2-tert-butyl-4-(5-tert-butyl-4-hydroxy-2-methylphenyl)sulfanyl-5-methylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1SC1=CC(C(C)(C)C)=C(O)C=C1C HXIQYSLFEXIOAV-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- BQUSIXSOCHTUCV-UHFFFAOYSA-N 5-ethyl-2-phenyl-1h-imidazole Chemical compound N1C(CC)=CN=C1C1=CC=CC=C1 BQUSIXSOCHTUCV-UHFFFAOYSA-N 0.000 description 1
- BFQVZOXIVOSRJP-UHFFFAOYSA-N 6-tert-butyl-2-[1-(3-tert-butyl-2-hydroxy-6-methylphenyl)butyl]-3-methylphenol Chemical compound CC=1C=CC(C(C)(C)C)=C(O)C=1C(CCC)C1=C(C)C=CC(C(C)(C)C)=C1O BFQVZOXIVOSRJP-UHFFFAOYSA-N 0.000 description 1
- ADRNSOYXKABLGT-UHFFFAOYSA-N 8-methylnonyl diphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OCCCCCCCC(C)C)OC1=CC=CC=C1 ADRNSOYXKABLGT-UHFFFAOYSA-N 0.000 description 1
- 239000004255 Butylated hydroxyanisole Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GHKOFFNLGXMVNJ-UHFFFAOYSA-N Didodecyl thiobispropanoate Chemical compound CCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCC GHKOFFNLGXMVNJ-UHFFFAOYSA-N 0.000 description 1
- 239000003508 Dilauryl thiodipropionate Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- CZBZUDVBLSSABA-UHFFFAOYSA-N butylated hydroxyanisole Chemical compound COC1=CC=C(O)C(C(C)(C)C)=C1.COC1=CC=C(O)C=C1C(C)(C)C CZBZUDVBLSSABA-UHFFFAOYSA-N 0.000 description 1
- 235000019282 butylated hydroxyanisole Nutrition 0.000 description 1
- 229940043253 butylated hydroxyanisole Drugs 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 235000019304 dilauryl thiodipropionate Nutrition 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、絶縁特性特に金属のマイグレーションの抑制
に優れたエポキシ樹脂組成物に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an epoxy resin composition that has excellent insulation properties, particularly in suppressing metal migration.
電子機器の小型化、高性能化に伴い、その中に搭載され
る印刷配線板は高多層化、スルーホールの小径化及び穴
間隔の減少などによる高密度化が進行している。このた
め、これまであまり問題とならなかった印刷配線板の電
気絶縁特性に対する要求は厳しくなっている。BACKGROUND ART As electronic devices become smaller and more sophisticated, the printed wiring boards mounted thereon are becoming more dense due to higher multilayers, smaller diameter through holes, and shorter hole spacing. For this reason, demands on the electrical insulation properties of printed wiring boards, which have not been much of a problem in the past, have become stricter.
エポキシm11Mは、印刷配線板の絶縁材料として従来
から広く使用されてきた。しかしながら、この高密度化
に伴い、エポキシ樹脂を用いた印刷配線板は金属マイグ
レーションによる絶縁不良や導通破壊が発生しやすいと
言う問題が生じてきた。Epoxy m11M has been widely used as an insulating material for printed wiring boards. However, with this increase in density, a problem has arisen in that printed wiring boards using epoxy resin are susceptible to insulation failure and conduction breakdown due to metal migration.
金属マイグレーションとは、絶縁材料上または絶縁材料
内の配線や回路パターンあるいは電極などを構成する金
属が、高湿度環境下、電位差の作用によって絶縁材料上
または絶縁材料内を移行する現象である。Metal migration is a phenomenon in which metal constituting wiring, circuit patterns, electrodes, etc. on or within an insulating material migrates on or within the insulating material due to the action of a potential difference in a high humidity environment.
従来から広く使われているジシアンジアミド硬化系エポ
キシ樹脂は印刷配線板にした場合、w4Fi等との接着
性は向上するが、吸湿性は高く、金属マイグレーション
が発生し易いという問題がある。Dicyandiamide curing epoxy resin, which has been widely used in the past, has improved adhesion to w4Fi etc. when used in printed wiring boards, but has a problem in that it has high hygroscopicity and is susceptible to metal migration.
(発明が解決しようとする31題)
マイグレーション防止に優れた樹脂としては、トリアジ
ン樹脂が挙げられるが、成形時の硬化収縮が大きいこと
、接着性が低いこと、硬くもろいことなどの欠点を有し
ている。また、特開昭6354300号公報に示される
ようなエポキシ樹脂にマイグレーシラン防止剤としてト
リアジン化合物を添加する方法では、トリアジン化合物
を均一に分散させることが難しく、特性に大きなばらつ
きが生じる。(31 problems to be solved by the invention) Triazine resins are examples of resins that are excellent in preventing migration, but they have drawbacks such as large curing shrinkage during molding, low adhesiveness, and being hard and brittle. ing. Furthermore, in the method of adding a triazine compound as a migration silane inhibitor to an epoxy resin as disclosed in JP-A-6354300, it is difficult to uniformly disperse the triazine compound, resulting in large variations in properties.
本発明は、かかる状況に鑑みなされたもので、印刷配線
板の材料に適用した場合に優れた電気絶縁特性を与える
エポキシ樹脂組成物を提供するものである。The present invention was made in view of this situation, and provides an epoxy resin composition that provides excellent electrical insulation properties when applied to materials for printed wiring boards.
すなわち、本発明のエポキシ樹脂&fl威物は、(a)
エポキシ樹脂
(b)ジシアンジアミド
(c)硬化促進剤
(d)還元剤
を必須成分として配合することを特長とする。That is, the epoxy resin of the present invention is (a)
It is characterized by containing an epoxy resin (b) dicyandiamide (c) a curing accelerator (d) a reducing agent as essential components.
以下本発明の詳細な説明する
(a)のエポキシ樹脂としては、多官能であればどのよ
うなものでもよく、例えばビスフェノールA型エポキシ
樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノー
ルS型エポキシ樹脂、フェノールノボラック型エポキシ
樹脂、タレゾールノボラック型エポキシ樹脂、ビスフェ
ノールAノボラック型エポキシ樹脂、ビスフェノールF
ノボラック型エポキシ樹脂、脂環式エポキシ樹脂、グリ
シジルエステル型エポキシ樹脂、グリシジルアミン型エ
ポキシ樹脂、ヒダントイン型エポキシ樹脂、イソシアヌ
レート型エポキシ樹脂、脂肪族鎖状エポキシ樹脂および
それらのハロゲン化物、水素添加物などがあり、分子量
はどのようなものでもよく、また何種類かを併用するこ
ともできる。The epoxy resin (a) used in the detailed explanation of the present invention may be any polyfunctional epoxy resin, such as bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, phenol novolak. Type epoxy resin, Talesol novolac type epoxy resin, Bisphenol A novolac type epoxy resin, Bisphenol F
Novolac type epoxy resin, alicyclic epoxy resin, glycidyl ester type epoxy resin, glycidylamine type epoxy resin, hydantoin type epoxy resin, isocyanurate type epoxy resin, aliphatic chain epoxy resin and their halides, hydrogenated substances, etc. They can have any molecular weight, and several types can be used in combination.
(b)のジシアンジアミドは、エポキシ樹脂1当量に対
して、好ましくは0.3〜1.0当量(ジシアンシア【
ドの官能基数を4とした場合)の範囲で配合する。Dicyandiamide (b) is preferably used in an amount of 0.3 to 1.0 equivalent (dicyandiamide) per equivalent of epoxy resin.
(If the number of functional groups in the compound is 4).
(C)の硬化促進剤としては、イミダゾール化合物、有
機リン化合物、第3級アミン、第4級アンモニウム塩な
どが用いられるが、イミノ基をアクリロニトリル、イソ
シアネート、メラミンアクリレートなどでマスク化され
たイミダゾール化合物を用いると、従来の2倍以上の保
存安定性を持つプリプレグを得ることができる。As the curing accelerator (C), imidazole compounds, organic phosphorus compounds, tertiary amines, quaternary ammonium salts, etc. are used, but imidazole compounds whose imino groups are masked with acrylonitrile, isocyanate, melamine acrylate, etc. By using this method, it is possible to obtain a prepreg that has storage stability that is more than twice that of conventional prepregs.
ここで用いられるイミダゾール化合物としては、イミダ
ゾール、2−エチルイミダゾール、2−エチル−4−エ
チルイミダゾール、2−フェニルイミダゾール、2−ウ
ンデシルイミダゾール、1−ベンジル−2−メチルイミ
ダゾール、2−ヘブタデシルイくダゾール、4.5−ジ
フェニルイミダゾール、2−メチルイミダシリン、2−
フェニルイミダシリン、2−ウンデシルイごダシリン、
2ヘブタデシルイξダシリン、2−イソプロピルイミダ
ゾール、2.4−ジメチルイミダゾール、2−フェニル
−4−エチルイミダゾール、2−エチルイミダシリン、
2−イソプロビルイミダシリン、2.4−ジメチルイミ
ダシリン、2−フェニル−4−メチルイミダシリンなど
があり、マスク化剤としては、アクリロニトリル、フェ
ニレンジイソシアネート、トルエンジイソシアネート、
ナフタレンジイソシアネート、ヘキサメメチレンジイソ
シアネート、メチレンビスフェニルイソシアネート、メ
ラミンアクリレートなどがある。The imidazole compounds used here include imidazole, 2-ethylimidazole, 2-ethyl-4-ethylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methylimidazole, and 2-hebutadecylimidazole. , 4.5-diphenylimidazole, 2-methylimidacillin, 2-
Phenylimidacillin, 2-undecyl imidacillin,
2-hebutadecy-ξdacillin, 2-isopropylimidazole, 2,4-dimethylimidazole, 2-phenyl-4-ethylimidazole, 2-ethylimidacilline,
Examples include 2-isoprobylimidacyline, 2.4-dimethylimidacyline, 2-phenyl-4-methylimidacyline, and masking agents include acrylonitrile, phenylene diisocyanate, toluene diisocyanate,
Examples include naphthalene diisocyanate, hexamethylene diisocyanate, methylene bisphenyl isocyanate, and melamine acrylate.
これらの硬化促進剤は何種類かを併用してもよく、配合
量はエポキシ樹脂100重量部に対して0.01〜5重
量部が好ましい、0.01重量部より少ないと促進効果
が小さく、5重量部より多いと保存安定性が悪くなる。Several types of these curing accelerators may be used in combination, and the blending amount is preferably 0.01 to 5 parts by weight per 100 parts by weight of the epoxy resin.If it is less than 0.01 parts by weight, the accelerating effect will be small; If the amount exceeds 5 parts by weight, storage stability will deteriorate.
(d)の還元剤としては、フェノール系、硫黄系、リン
系還元剤などが用いられるが、フェノール系還元剤を用
いると、ドリル加工性などの他の特性を低下させること
なく電気絶縁特性を向上させることができる。フェノー
ル系還元剤としては、12.3−トリヒドロキシベンゼ
ン、ブチル化ヒドロキシアニソール、2.4−ジ−t−
ブチル−4−エチルフェノールなどのモノフェノール系
や2゜2′−メチレン−ビス−(4−メチル−6−第三
−ブチルフェノール)、4.4’−チオビス−(3−メ
チル−6−第三−ブチルフェノール)などのビスフェノ
ール系及び1,3.5−)リフチル−2,4,6−1−
リス(3,5−ジー第三−ブチル−4−ヒドロキシベン
ジル)ベンゼン、テトラキス−〔メチレン−3−(3’
、5’−ジー第三−ブチル−4′−ヒドロキシフェニル
)プロピオネートコメタンなどの高分子型フェノール系
がある。硫黄系還元剤としては、ジラウリルチオジプロ
ピオネート、ジステアリルチオジブロピネートなどがあ
る。リン系還元剤としては、トリフェニルホスファイト
、ジフェニルイソデシルホスファイトなどがある。これ
らの還元剤は何種類かを併用してもよく、配合量はエポ
キシ樹脂100重量部に対して0.1〜20重量部が好
ましい、0.1重量部以下では絶縁特性の向上はみられ
ず、20重量部以上では逆に2絶縁特性は低下する傾向
を示す。Phenol-based, sulfur-based, phosphorus-based reducing agents, etc. are used as the reducing agent in (d), but using a phenolic reducing agent improves electrical insulation properties without degrading other properties such as drill workability. can be improved. As the phenolic reducing agent, 12.3-trihydroxybenzene, butylated hydroxyanisole, 2.4-di-t-
Monophenols such as butyl-4-ethylphenol, 2゜2'-methylene-bis-(4-methyl-6-tert-butylphenol), 4,4'-thiobis-(3-methyl-6-tert -butylphenol) and 1,3.5-)rifthyl-2,4,6-1-
Lis(3,5-di-tert-butyl-4-hydroxybenzyl)benzene, tetrakis-[methylene-3-(3'
, 5'-di-tert-butyl-4'-hydroxyphenyl) propionate comethane and other polymeric phenols. Examples of the sulfur-based reducing agent include dilaurylthiodipropionate and distearylthiodipropinate. Examples of the phosphorus reducing agent include triphenyl phosphite and diphenylisodecyl phosphite. Several types of these reducing agents may be used in combination, and the blending amount is preferably 0.1 to 20 parts by weight per 100 parts by weight of the epoxy resin.If it is less than 0.1 part by weight, no improvement in insulation properties is observed. On the other hand, if the amount exceeds 20 parts by weight, the 2 insulation properties tend to deteriorate.
本発明に係るエポキシ樹脂&Il戒物は各種の形態で利
用に供されるが基材に塗布、含浸する際にはしばしば溶
剤が用いられる。それらの溶剤としては、アセトン、メ
チルエチルケトン、トルエン、キシレン、メチルイソブ
チルケトン、酢酸エチル、エチレングリコールモノメチ
ルエーテル、N、 N−ジメチルボルムアミド、N、N
−ジメチルアセトアミド、メダノール、エタノールなど
があり、これらは何種類かを混合して用いてもよい。The epoxy resin & Il compound according to the present invention can be used in various forms, but a solvent is often used when coating or impregnating a base material. These solvents include acetone, methyl ethyl ketone, toluene, xylene, methyl isobutyl ketone, ethyl acetate, ethylene glycol monomethyl ether, N, N-dimethylbormamide, N, N
-Dimethylacetamide, medanol, ethanol, etc., and some of these may be used in combination.
前記(a)、(b)、(c)、(d)を配合して得たワ
ニスはガラス布、ガラス不織布または紙、ガラス以外を
成分とする布等の基材に含有機、乾燥炉中で80〜20
0°Cの範囲で乾燥させることにより、印刷配線板用プ
リプレグを得る。プリプレグは150〜190℃、20
〜80 kgf/cdの範囲で加熱加圧して印刷配線板
または金属張積層板(以下MCLと称する)を製造する
ことに用いられる。The varnish obtained by blending the above (a), (b), (c), and (d) can be applied to base materials such as glass cloth, glass nonwoven fabric, paper, and cloth containing components other than glass in a machine or a drying oven. 80-20
A prepreg for printed wiring boards is obtained by drying at a temperature of 0°C. Prepreg is 150-190℃, 20
It is used for manufacturing printed wiring boards or metal clad laminates (hereinafter referred to as MCL) by heating and pressurizing in the range of ~80 kgf/cd.
ここでの乾燥とは、溶剤を使用した場合には溶剤を除去
すること、溶剤を使用しない場合には室温で流動性がな
くなるようにすることをいう。Drying here means removing the solvent if a solvent is used, or making it lose fluidity at room temperature if no solvent is used.
以下、実施例に基づき更に本発明を説明する。 The present invention will be further explained below based on Examples.
実施例1
臭素化ビスフェノールA型エポキシ樹脂100重量部
(エポキシ当量530)
ジシアンジアミド 4重量部へキサメチ
レンジイソシアネートでマスクした2−エチル−4−メ
チルイミダゾール
0.2重量部
ピロガロール 0.5重量部上記化合
物をメチルエチルケトン及びエチレングリコールモノメ
チルエーテルに溶解し、不揮発分70%のワニスを作製
した。Example 1 Brominated bisphenol A type epoxy resin 100 parts by weight (epoxy equivalent: 530) Dicyandiamide 4 parts by weight 2-ethyl-4-methylimidazole masked with hexamethylene diisocyanate 0.2 parts by weight Pyrogallol 0.5 parts by weight The above compound was dissolved in methyl ethyl ketone and ethylene glycol monomethyl ether to prepare a varnish with a nonvolatile content of 70%.
実施例2
実施例1における臭素化ビスフェノールA型エポキシ樹
脂のかわりにビスフェノールA型エポキシ樹脂(エポキ
シ当量450)を100重量部配合した。Example 2 Instead of the brominated bisphenol A epoxy resin in Example 1, 100 parts by weight of bisphenol A epoxy resin (epoxy equivalent: 450) was blended.
実施例3
実施例1における臭素化ビスフェノールA型エポキシ樹
脂のかわりにビスフェノールA型エポキシ樹脂(エポキ
シ当量450)80重量部とクレゾールノボラック型エ
ポキシ樹脂(エポキシ当量220)20重量部とし、ジ
シアンジアミドを5重量部とテトラブロモビスフェノー
ルA(水酸基当量272)を5重量部配合した。Example 3 Instead of the brominated bisphenol A epoxy resin in Example 1, 80 parts by weight of a bisphenol A epoxy resin (epoxy equivalent: 450) and 20 parts by weight of a cresol novolak epoxy resin (epoxy equivalent: 220) were used, and 5 parts by weight of dicyandiamide were used. and 5 parts by weight of tetrabromobisphenol A (hydroxyl equivalent: 272).
実施例4
実施例1におけるヘキサメメチレンジイソシアネートで
マスクした、2−エチル−4−メチルイミダゾールのか
わりにマスクされていない2−エチル−4メチルイごダ
ゾールを0.2重量部配合した。Example 4 Instead of 2-ethyl-4-methylimidazole masked with hexamethylene diisocyanate in Example 1, 0.2 parts by weight of 2-ethyl-4-methyligodazole, which was not masked, was blended.
実施例5
実施例1におけるヘキサメメチレンジイソシアネートで
マスクした、2−エチル−4−メチルイミダゾールのか
わりに、2−ウンデシルイミダゾールを0.2重量部配
合した。Example 5 Instead of 2-ethyl-4-methylimidazole masked with hexamethylene diisocyanate in Example 1, 0.2 parts by weight of 2-undecylimidazole was blended.
実施例6
実施例1におけるピロガロールのかわりに4゜4′−ブ
チ1!デンビス(3−メチル−6−ターシャリブチルフ
ェノール)を0.5重量部配合した。Example 6 Instead of pyrogallol in Example 1, 4°4'-buty1! 0.5 parts by weight of Denbis (3-methyl-6-tert-butylphenol) was blended.
実施例7 実施例1におけるピロガロールのかわりに、l。Example 7 l in place of pyrogallol in Example 1.
l 3−トリス(2−メチル−4−ヒドロキシー5−t
−ブチルフェニル)ブタンを0.5重量部配合した。l 3-tris(2-methyl-4-hydroxy-5-t
-butylphenyl)butane was blended in an amount of 0.5 part by weight.
実施例日
実施例1におけるピロガロールのかわりに、テトラキス
〔メチレン−3−(3’ 5’−ジーし一ブチルー4
′−ヒドロキシフェニル〉プロピオネートコメタンを0
.5重量部配合した。Example Day Instead of pyrogallol in Example 1, tetrakis[methylene-3-(3'5'-di-butyl-4
'-Hydroxyphenyl〉propionate comethane 0
.. 5 parts by weight was blended.
実施例9
実施例1におけるピロガロールのかわりに、ジラウリル
チオプロピオネートを0.5重量部配合した。Example 9 Instead of pyrogallol in Example 1, 0.5 parts by weight of dilaurylthiopropionate was blended.
実施例10
実施例1におけるピロガロールのかわりに、トリフェニ
ルホスファイトを0.5重量部配合した。Example 10 Instead of pyrogallol in Example 1, 0.5 parts by weight of triphenyl phosphite was blended.
実施例11
実施例1におけるピロガロールのかわりに、4゜4′−
ブチリデンビス(3−メチル−6−ターシャリブチルフ
ェノール)を0.25重量部と、ジラウリルチオプロピ
オネートを0.255重量部配した。Example 11 Instead of pyrogallol in Example 1, 4°4'-
0.25 parts by weight of butylidene bis(3-methyl-6-tert-butylphenol) and 0.255 parts by weight of dilaurylthiopropionate were placed.
比較例1 実施例1におけるピロガロールを配合しなかった。Comparative example 1 Pyrogallol in Example 1 was not blended.
実施例1〜11.比較例1で得たワニスを0.2閣厚の
ガラス布に含浸後、140°Cで5〜IO分間加熱して
プリプレグを得た。Examples 1-11. A glass cloth having a thickness of 0.2 mm was impregnated with the varnish obtained in Comparative Example 1, and then heated at 140°C for 5 to 10 minutes to obtain a prepreg.
このようにして得られたプリプレグ8枚の両側に18μ
曽厚の銅箔を配置し、170°C190分50kg/c
dのプレス条件で両面銅張槽N板を作製した。このMC
Lに回路加工を施し、マイグレーション試験を行った。18 μm on both sides of the 8 sheets of prepreg obtained in this way.
Lay out thick copper foil and heat at 170°C for 190 minutes at 50kg/c.
A double-sided copper-clad tank N plate was produced under the pressing conditions of d. This MC
Circuit processing was performed on L, and a migration test was conducted.
スルーホール穴あけは0.9閣径のドリルを用いて回転
数60.00Orpm。Through-hole drilling was performed using a 0.9 mm diameter drill at a rotation speed of 60.00 rpm.
送り速度1. 800+m/m i nの条件で行った
。Feed rate 1. The test was carried out under the conditions of 800+m/min.
穴壁間隔は350μ糟とし、各試料について400穴(
スルーホール/スルーホール間200ケ所)のt@縁低
抵抗経時的に測定した。試験条件は、85’C/90%
RH雰囲気中100v印加して行い、スルーホール/ス
ルーホール間に導通破壊が発生するまでの日数を測定し
た。また、絶縁抵抗の測定は100V/1mfnで行っ
た。The hole wall spacing was 350μ, and 400 holes were prepared for each sample (
200 locations between through holes) t@edge low resistance was measured over time. Test conditions are 85'C/90%
The test was performed by applying 100V in an RH atmosphere, and the number of days until continuity breakdown occurred between the through holes was measured. Further, the insulation resistance was measured at 100V/1mfn.
はんだ耐熱試験は、両面エツチングを施したMCLを2
60“Cのはんだに 20秒間浸漬後、外観を目視によ
り評価し、ふくれのないものをOK。The solder heat resistance test was conducted using MCL with double-sided etching.
After dipping in 60"C solder for 20 seconds, visually evaluate the appearance. If there is no blistering, it is OK.
ふくれのあるものをNGとした。Items with swelling were rejected.
プリプレグのゲルタイムは160°Cで測定し、塗工直
後のプリプレグと、20°C/40%RHで60日間保
管後のプリプレグのゲルタイムを測定することによりプ
リプレグの保存安定性を評価した。結果を表1に示す。The gel time of the prepreg was measured at 160°C, and the storage stability of the prepreg was evaluated by measuring the gel time of the prepreg immediately after coating and after storage for 60 days at 20°C/40% RH. The results are shown in Table 1.
還元剤を配合した実施例1〜11は導通破壊までの日数
が長くなり、特にフェノール系還元剤を用いた実施例1
〜8で絶縁特性は高くなる傾向を示した。In Examples 1 to 11 in which a reducing agent was added, the number of days until continuity failure was longer, especially in Example 1 in which a phenolic reducing agent was used.
~8, the insulation properties tended to become higher.
表
■
特性評価結果
〔発明の効果〕
以上の説明から明らかなように本発明のエポキシ樹脂組
成物は、従来技術に比べて印刷配線板の材料に応用した
場合、金属マイグレーションの発生を抑え、電気絶縁特
性を向上させるものである。Table ■ Characteristic evaluation results [Effects of the invention] As is clear from the above explanation, the epoxy resin composition of the present invention suppresses the occurrence of metal migration and improves electrical This improves insulation properties.
Claims (2)
のエポキシ樹脂組成物。2. The epoxy resin composition according to claim 1, wherein the reducing agent is a phenolic reducing agent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1173431A JPH0753793B2 (en) | 1989-07-05 | 1989-07-05 | Epoxy resin composition for wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1173431A JPH0753793B2 (en) | 1989-07-05 | 1989-07-05 | Epoxy resin composition for wiring board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0339320A true JPH0339320A (en) | 1991-02-20 |
| JPH0753793B2 JPH0753793B2 (en) | 1995-06-07 |
Family
ID=15960330
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1173431A Expired - Fee Related JPH0753793B2 (en) | 1989-07-05 | 1989-07-05 | Epoxy resin composition for wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0753793B2 (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6053524A (en) * | 1983-09-01 | 1985-03-27 | Asahi Chem Ind Co Ltd | Flame-retardant epoxy resin composition |
| JPS61272245A (en) * | 1985-05-28 | 1986-12-02 | Hitachi Chem Co Ltd | Production of prepreg for printed circuit board |
| JPS61272246A (en) * | 1985-05-28 | 1986-12-02 | Hitachi Chem Co Ltd | Production of prepreg for printed circuit board |
| JPS61278537A (en) * | 1985-06-05 | 1986-12-09 | Hitachi Chem Co Ltd | Production of prepreg for printed wiring board |
-
1989
- 1989-07-05 JP JP1173431A patent/JPH0753793B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6053524A (en) * | 1983-09-01 | 1985-03-27 | Asahi Chem Ind Co Ltd | Flame-retardant epoxy resin composition |
| JPS61272245A (en) * | 1985-05-28 | 1986-12-02 | Hitachi Chem Co Ltd | Production of prepreg for printed circuit board |
| JPS61272246A (en) * | 1985-05-28 | 1986-12-02 | Hitachi Chem Co Ltd | Production of prepreg for printed circuit board |
| JPS61278537A (en) * | 1985-06-05 | 1986-12-09 | Hitachi Chem Co Ltd | Production of prepreg for printed wiring board |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0753793B2 (en) | 1995-06-07 |
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