JPH0345177Y2 - - Google Patents

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Publication number
JPH0345177Y2
JPH0345177Y2 JP1984134996U JP13499684U JPH0345177Y2 JP H0345177 Y2 JPH0345177 Y2 JP H0345177Y2 JP 1984134996 U JP1984134996 U JP 1984134996U JP 13499684 U JP13499684 U JP 13499684U JP H0345177 Y2 JPH0345177 Y2 JP H0345177Y2
Authority
JP
Japan
Prior art keywords
electrode
electrodes
substrate
noble metal
hydrogen peroxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1984134996U
Other languages
Japanese (ja)
Other versions
JPS6150263U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1984134996U priority Critical patent/JPH0345177Y2/ja
Publication of JPS6150263U publication Critical patent/JPS6150263U/ja
Application granted granted Critical
Publication of JPH0345177Y2 publication Critical patent/JPH0345177Y2/ja
Expired legal-status Critical Current

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  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Description

【考案の詳細な説明】 (産業上の利用分野) 本考案は、絶縁基板上に形成した微小アンペロ
メトリー電極に関する。
[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a microamperometry electrode formed on an insulating substrate.

(従来技術とその問題点) 従来溶液中のイオンや酸化還元物質の濃度を測
定する手段の1つとして電気化学分析が用いら
れ、これを目的とした各種電気化学デバイスが知
られている。たとえば過酸化水素測定用電気化学
デバイスは定電位装置(たとえばポテンシヨスタ
ツト)を用いて白金電極を飽和甘コウ電極に対し
て+0.6Vに設定すると、過酸化水素は電極上で
酸化され、過酸化水素濃度に依存した電流が流れ
ることを利用している(鈴木周一編「イオン電極
と酵素電極」p.80講談社サイエンテイフイク
1981)。近年、化学分析分野、特に臨床化学分析
分野においては分析件数、分析項目の増大に伴
い、各分析試料の微量化が進められ、測定電極自
体の微小化が強く要望されている。しかしながら
従来のデバイスは、内部溶液と液絡部を要する飽
和甘コウ電極などを含んだ複合電極であるため、
微小化が困難であつた。一方、飽和甘コウ電極を
用いず、2極のみで過酸化水素を定量するデバイ
スも構成されている。このデバイスは、アノード
に白金、カソードに銀−塩化銀を用い白金極を+
0.65Vに設定している(第2回「センサの基礎と
応用」シンポジウム予稿集P43)。しかしながら、
この電極は内部に白金電極を持ち、このまわりを
銀−塩化銀でとり囲んだ立体的形状を有するた
め、シリコンIC製造プロセス(レジストによる
パターン形式、真空蒸着、スパツタなど)を用い
て微小化、大量生産を行なうには不向きである。
(Prior Art and its Problems) Conventionally, electrochemical analysis is used as one of the means for measuring the concentration of ions and redox substances in a solution, and various electrochemical devices for this purpose are known. For example, in an electrochemical device for measuring hydrogen peroxide, when a platinum electrode is set at +0.6 V with respect to a saturated electrode using a potentiometer (e.g., potentiostat), hydrogen peroxide is oxidized on the electrode and It takes advantage of the fact that a current flows depending on the hydrogen oxide concentration (Shuichi Suzuki, ed., "Ion Electrodes and Enzyme Electrodes", p.80 Kodansha Scientific)
1981). In recent years, in the field of chemical analysis, particularly in the field of clinical chemistry analysis, with the increase in the number of analyzes and the number of analysis items, miniaturization of each analysis sample has been promoted, and there is a strong demand for miniaturization of the measurement electrode itself. However, conventional devices are composite electrodes that include a saturated liquid electrode that requires an internal solution and a liquid junction.
Miniaturization was difficult. On the other hand, devices have also been constructed that quantify hydrogen peroxide using only two electrodes without using a saturated electrode. This device uses platinum for the anode and silver-silver chloride for the cathode.
It is set to 0.65V (2nd "Fundamentals and Applications of Sensors" Symposium Proceedings P43). however,
This electrode has a three-dimensional shape with a platinum electrode surrounded by silver and silver chloride, so it can be miniaturized using silicon IC manufacturing processes (resist patterning, vacuum evaporation, sputtering, etc.). It is not suitable for mass production.

(考案の目的) 本考案の目的は形状が単純で大量生産に適する
微小アンペロメトリー電極を提供することにあ
る。
(Purpose of the invention) The purpose of the invention is to provide a microamperometry electrode that has a simple shape and is suitable for mass production.

(考案の構成) 絶縁基板上に、該基板の一方の端部付近から他
方の端部付近まで少なくとも2本の貴金属電極が
形成されており、該電極はその両端部付近を除い
てその中央部が絶縁膜で覆われている構造を備え
たことを特徴とする微小アンペロメトリー電極。
(Structure of the device) At least two noble metal electrodes are formed on an insulating substrate from near one end of the substrate to near the other end, and the electrodes are formed in the center of the insulating substrate except for near both ends. A microamperometry electrode characterized by having a structure in which the electrode is covered with an insulating film.

(構成に関する説明) 次に第1図から第6図を参照して本考案につい
て述べる。
(Description of Configuration) Next, the present invention will be described with reference to FIGS. 1 to 6.

第1図は本考案の一例を示す平面図で、細長い
平面形状を持つた絶縁基板の一主面上に貴金属電
極が形成されている。第2図、第3図および第4
図はそれぞれ第1図の一点鎖線A−A′,B−B′,
C−C′における断面図で、1は貴金属電極を、2
は絶縁基板を、3は絶縁膜を、4はリード線引出
金属電極を示す。
FIG. 1 is a plan view showing an example of the present invention, in which a noble metal electrode is formed on one main surface of an insulating substrate having an elongated planar shape. Figures 2, 3 and 4
The figures are the dashed-dotted lines A-A', B-B', and
In the cross-sectional view along C-C', 1 is the noble metal electrode, 2 is the noble metal electrode,
3 indicates an insulating substrate, 3 indicates an insulating film, and 4 indicates a metal electrode from which a lead wire is drawn.

絶縁基板としてたとえばサフアイア基板などの
絶縁体基板やシリコン基板などの半導体基板の表
面を絶縁膜で覆つた基板を用いることができる。
電極用貴金属としては金・白金が適当である。白
金を用いる場合には、アルミニウムボンデイング
やはんだによるリード線引出を容易にするため
に、4のリード線引出電極として金やアルミニウ
ムなどの金属を重層する。絶縁膜としてたとえば
Ta2O5などの酸化物、SI3N4などの窒化物を用い
ることができる。前記貴金属や酸化物、窒化物は
蒸着、スパツタリングなどにより形成することが
できる。電圧の設定を変化させることにより、
Zr2+,Cd2+,Pb2+,Cu+2などの陽イオンやC1-
1-などの陰イオン重クロム酸、過マンガン酸など
の酸化還元物質が測定可能となる。また溶液電導
度測定電極としても利用できる。
As the insulating substrate, for example, an insulating substrate such as a sapphire substrate or a semiconductor substrate such as a silicon substrate whose surface is covered with an insulating film can be used.
Gold and platinum are suitable as noble metals for electrodes. When platinum is used, a metal such as gold or aluminum is layered as the lead wire extraction electrode 4 in order to facilitate aluminum bonding or lead wire extraction using solder. For example, as an insulating film
Oxides such as Ta 2 O 5 and nitrides such as SI 3 N 4 can be used. The noble metal, oxide, and nitride can be formed by vapor deposition, sputtering, or the like. By changing the voltage settings,
Cations such as Zr 2+ , Cd 2+ , Pb 2+ , Cu +2 , C1 - ,
Anionic redox substances such as dichromate and permanganate such as 1- can be measured. It can also be used as an electrode for measuring solution conductivity.

(実施例) 本考案の実施例として、第1図に示した形状の
アンペロメトリー電極を作成した。チツプの大き
さは0.5mm×6mmとした。絶縁基板にはサフアイ
アを用い、電極用貴金属は金を用いた。また絶縁
膜にはTa2O5を形成した。
(Example) As an example of the present invention, an amperometric electrode having the shape shown in FIG. 1 was created. The size of the chip was 0.5 mm x 6 mm. Sapphire was used for the insulating substrate, and gold was used for the noble metal for the electrodes. Further, Ta 2 O 5 was formed as an insulating film.

なお金を用いているのでリード線引出電極は形
成していない。
Since a large amount of money was used, lead wire extraction electrodes were not formed.

第5図、第6図に該電極を用いて過酸化水素を
測定した例を示す。第5図は、過酸化水素を加え
た場合および加えない場合の両極間の電位走査に
よる電流変化を示している。過酸化水素の添加に
よつて+1.1V付近の電流値が大きく変化してい
る。そこで、両極間の電位を1.1Vに設定し、過
酸化水素濃度を変化させて電流値の変化を測定し
た結果、第6図に示すように過酸化水素濃度と電
流値の間には良い直線関係が得られた。
FIG. 5 and FIG. 6 show an example in which hydrogen peroxide was measured using the electrode. FIG. 5 shows current changes due to potential scanning between the two electrodes when hydrogen peroxide is added and when hydrogen peroxide is not added. The current value around +1.1V changes significantly due to the addition of hydrogen peroxide. Therefore, we set the potential between the two electrodes to 1.1V, changed the hydrogen peroxide concentration, and measured the changes in the current value. As a result, as shown in Figure 6, there was a good straight line between the hydrogen peroxide concentration and the current value. A relationship was obtained.

なお第1図に示した貴金属電極部の形状も本考
案の方法によれば容易に変更可能となる。第7
図、第8図に電極部形状変更の例を示す。第7
図、第8図に示す形状の電極を用いたところ、電
流−電圧特性は基本的に同様であつたが、電流値
の増大が見られた。電流値は第7図の形状のとき
第1図の形状の場合の10%増、第8図の形状のと
き第1図の形状の場合の20%増であつた。
Note that the shape of the noble metal electrode portion shown in FIG. 1 can also be easily changed according to the method of the present invention. 7th
An example of changing the shape of the electrode portion is shown in FIG. 7th
When electrodes having the shapes shown in Figs. 8 and 8 were used, the current-voltage characteristics were basically the same, but an increase in the current value was observed. The current value in the shape shown in FIG. 7 was 10% higher than in the shape shown in FIG. 1, and the current value in the shape shown in FIG. 8 was 20% higher than in the shape shown in FIG.

(考案の効果) 本考案の微小アンペロメトリー電極は絶縁基板
の一主面上に貴金属電極を平面状に形成した構成
を有するため、製造の際に半導体IC製造プロセ
スを用いることができ、微小化した電極が容易に
得られる。電極の微小化により用いる貴金属は微
量で良く、従つて安価な電極が得られる。
(Effects of the invention) Since the micro amperometric electrode of the invention has a structure in which a noble metal electrode is formed in a planar shape on one main surface of an insulating substrate, it is possible to use a semiconductor IC manufacturing process during manufacturing, and It is easy to obtain a chemically oxidized electrode. By miniaturizing the electrode, only a small amount of noble metal can be used, and therefore an inexpensive electrode can be obtained.

また、本考案の電極は、絶縁基板平面上に形成
するため表面に選択透過性膜などの機能性膜を形
成した電極が容易に得られ、さらに多数の電極を
オンチツプ化することも可能である。
In addition, since the electrode of the present invention is formed on a flat insulating substrate, it is easy to obtain an electrode with a functional film such as a permselective film formed on the surface, and it is also possible to form a large number of electrodes on-chip. .

さらに、本考案の微小アンペロメトリー電極は
半導体IC製造プロセスを用いて製造することに
より、特性のそろつた電極が容易に得られる。
Furthermore, by manufacturing the microamperometry electrode of the present invention using a semiconductor IC manufacturing process, an electrode with uniform characteristics can be easily obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一例を示す平面図、第2図、
第3図および第4図はそれぞれ第1図に示すA−
A′,B−B′,C−C′における断面図である。第
5図は本考案の電極を過酸化水素電極として用い
た場合のボルタムグラム、第6図は過酸化水素の
検量線を示す図。第7図、第8図は電極部の形状
を変えた実施例を示す図。 図において、1……貴金属電極、2……絶縁基
板、3……絶縁膜、4……リード線引出金属電
極。
Figure 1 is a plan view showing an example of the present invention; Figure 2 is a plan view showing an example of the present invention;
Figures 3 and 4 are A-A shown in Figure 1, respectively.
It is a sectional view taken along A', BB', and CC'. FIG. 5 is a voltamgram when the electrode of the present invention is used as a hydrogen peroxide electrode, and FIG. 6 is a diagram showing a calibration curve for hydrogen peroxide. FIG. 7 and FIG. 8 are diagrams showing an embodiment in which the shape of the electrode part is changed. In the figure, 1... noble metal electrode, 2... insulating substrate, 3... insulating film, 4... lead wire drawing metal electrode.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 絶縁体基板の一主面上に、該基板の一方の端部
付近から他方の端部付近まで少なくとも2本の貴
金属電極が平面状に形成されており、該電極はそ
の両端部付近を除いてその中央部が絶縁膜で覆わ
れている構造を備えたことを特徴とする微小アン
ペロメトリー電極。
At least two noble metal electrodes are formed in a planar shape on one main surface of the insulating substrate from near one end of the substrate to near the other end, and the electrodes are formed in a planar shape from near one end of the substrate to near the other end, and the electrodes are A microamperometry electrode characterized by having a structure in which the center portion is covered with an insulating film.
JP1984134996U 1984-09-05 1984-09-05 Expired JPH0345177Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1984134996U JPH0345177Y2 (en) 1984-09-05 1984-09-05

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984134996U JPH0345177Y2 (en) 1984-09-05 1984-09-05

Publications (2)

Publication Number Publication Date
JPS6150263U JPS6150263U (en) 1986-04-04
JPH0345177Y2 true JPH0345177Y2 (en) 1991-09-24

Family

ID=30693498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984134996U Expired JPH0345177Y2 (en) 1984-09-05 1984-09-05

Country Status (1)

Country Link
JP (1) JPH0345177Y2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6432160A (en) * 1987-07-29 1989-02-02 Terumo Corp Enzyme sensor and production thereof
JP2622589B2 (en) * 1988-07-08 1997-06-18 日本電信電話株式会社 Microelectrode cell for electrochemical measurement and method for producing the same
JP2566173B2 (en) * 1990-02-16 1996-12-25 日本電信電話株式会社 Electrochemical detector

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57110952A (en) * 1980-11-19 1982-07-10 Omron Tateisi Electronics Co Measuring device equipped with amperometric electrode
JPS57191539A (en) * 1981-05-21 1982-11-25 Nec Corp Semiconductor ion sensor

Also Published As

Publication number Publication date
JPS6150263U (en) 1986-04-04

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