JPH0347356B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention aims to solve the following problems.

(Industrial Application Field) This invention relates to ancient Chinese Shantou embroidery cloth.

(Prior art) Shantou embroidery cloth has a large number of small holes scattered in the base fabric, and also has embroidery threads sewn around the edges and edges of the large number of small holes. The embroidery pattern was exposed. The fabric constructed in this manner has the problem of being easily torn due to the presence of a large number of small holes and lacking in mechanical strength.

Furthermore, if the Shantou embroidery is applied over the entire surface of the base fabric, the above-mentioned degree of durability becomes worse. Then,
If we wanted to maintain its durability, we would have to leave the base fabric as it is (without applying the Shantou embroidery cloth). In this case, the pattern occupancy rate on the surface of the base fabric becomes low, resulting in a problem that the commercial value decreases.

(Problems to be Solved by the Invention) This invention aims to eliminate the above-mentioned conventional problems and provide a durable Shantou embroidery cloth that can express a pattern even if it occupies a large area on the base fabric surface. It is something.

The configuration of the present invention is as follows.

(Means for Solving the Problems) The present invention takes the measures as described in the claims above, and compensates for the weakening of the Shantou embroidery without impeding the three-dimensional effect of the Shantou embroidery. It has a pattern added to it so that it can be used.

(Example) Below, drawings showing examples of the present application will be described. In FIGS. 1 to 3, items designated by numerals 1 to 7 are conventionally known as Shantou embroidery cloth. For example, 1 is a base fabric made of silk or any other thread, and 2 is a portion where the Shantou embroidery is exposed. 3 shows the many small holes peculiar to Shantou embroidery, and 4 shows the embroidery thread threaded around the edges of the holes. 5 is a decorative embroidery thread sewn across a plurality of holes, and 6 is a convex embroidery thread that serves to clarify the pattern, and is sewn to draw the outline of the pattern on the cloth. 7 shows an embroidery thread with a large number of convex loops.

Next, numerals 8 to 10 indicate drawings made by known techniques on the above-mentioned base fabric, and 8 indicates a drawing part.
Reference numerals 9 and 10 indicate a large number of peaks and valleys formed by the aperture, and the peaks or valleys, or both, are colored by any known method. As the tie-dyeing method, it is good to selectively use various methods such as Hikita, Hitome, Makijime, and Kanko. The drawing is performed at an inner position surrounded by the embroidery pattern, for example, at a portion indicated by reference numeral 8'. Further, it is applied to a position close to the periphery of the embroidery pattern, for example, at a portion indicated by reference numeral 8''.

(Effects of the Invention) As described above, in the present invention, a large number of small through holes are provided in a part of the base fabric, and sewing is performed on or around the hole edges of the many small through holes. In addition to exposing the embroidery pattern using the embroidery thread, etc., a tie-dyeing method is applied to the base fabric in a relatively wide area at the inner position surrounded by the embroidery pattern or at a position close to the embroidery pattern and in a relatively wide area. Because the tie-dye pattern is exposed, you can enjoy the beauty of ancient Chinese Shantou embroidery.In addition, the tie-dye pattern is displayed around the Shantou embroidery or in large spaces in the Shantou embroidery. Both luxurious patterns are displayed harmoniously, creating a uniquely beautiful cloth.

Moreover, in the above case, the Shantou embroidery is a pattern that expresses a three-dimensional effect, and the tie-dye is also a pattern that expresses a three-dimensional effect, so there is no difference in placing both of them close to each other on one side of a piece of cloth. There is no risk of creating a sense of harmony, and both patterns have the effect of blending harmoniously together as described above.

Moreover, the present invention addresses the mechanical weakness (weakness with many through holes), which can be said to be the biggest drawback of beautiful Shantou embroidery.
can be reinforced by arranging the above-mentioned non-porous tie-dye patterns in close proximity, and has the great advantage of reducing the substantial area occupied by Shantou embroidery in the total pattern area of the base fabric. .
Reducing the occupation rate of Shantou embroidery is extremely beneficial in reducing the degree of weakness of Shantou embroidery cloth (making it stronger).

[Brief explanation of drawings]

The drawings show examples of the present application, and FIG. 1 is a partial plan view of a Shantou embroidered cloth, FIG. 2 is a partial plan view of a different pattern of the Shantou embroidered cloth, and FIG. 3 is a partial plan view of a different pattern of the Shantou embroidered cloth. Enlarged view. 1... Base cloth, 2... Shantou embroidery part, 3... Open hole, 4... Embroidery thread, 8... Tie-dyed part.

Claims (1)

[Claims] 1. A large number of small holes are scattered in a part of the base fabric, and the embroidery pattern is exposed by using embroidery thread, etc. sewn on or around the edges of the large number of small holes. , Shantou characterized in that the base fabric has a tie pattern created by a tie-dyeing method on the base fabric in a relatively wide area at an inner position surrounded by the embroidery pattern or a position close to the embroidery pattern. embroidered cloth.