JPH0347579B2 - - Google Patents
Info
- Publication number
- JPH0347579B2 JPH0347579B2 JP58203879A JP20387983A JPH0347579B2 JP H0347579 B2 JPH0347579 B2 JP H0347579B2 JP 58203879 A JP58203879 A JP 58203879A JP 20387983 A JP20387983 A JP 20387983A JP H0347579 B2 JPH0347579 B2 JP H0347579B2
- Authority
- JP
- Japan
- Prior art keywords
- bonding
- added
- wire
- elements
- strength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
- C22C21/06—Alloys based on aluminium with magnesium as the next major constituent
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/015—Manufacture or treatment of bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/015—Manufacture or treatment of bond wires
- H10W72/01551—Changing the shapes of bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/551—Materials of bond wires
- H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
- H10W72/5524—Materials of bond wires comprising metals or metalloids, e.g. silver comprising aluminium [Al]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Wire Bonding (AREA)
Abstract
Description
本発明は半導体素子のチツプ電極と基板あるい
はリードフレームとの接続に使用するワイヤボン
デイング用の0.02〜0.5mmφAl線に関する。
一般にボンデイング用線は線引き加工時および
ボンデイング作業時における断線を防ぐために所
定の引張りの強度を必要とするとともにボンデイ
ング時における高温軟化を防止してボール形状の
安定、ネツク切れの防止、潰れ巾の一定化及びボ
ンデイング後の接着強度(ボンデイング強度)を
維持することを要件とされ、また樹脂モールドす
る場合のように腐食性雰囲気に線がさらされる場
合には耐食性も重要な条件となる。
しかるに高純度Alは軟かすぎて所定の引張り
強度が得られないために、高純度Alに各種の元
素を添加することにより機械的強度を改善するこ
とが考えられているが、添加元素の種類、添加量
によつては、所定の引張り強度が得られず、引張
り強度が得られたとしても硬すぎてチツプ割れの
原因となつたり、添加元素の偏折により引張り強
度、ボンデイング強度が均一化せず、品質にバラ
ツキがでる結果となる。
本発明は斯る事情に鑑み案内されたもので、実
験結果より添加元素の種類とその添加量によつて
ボンデイング性に優れた適正な引張り強度及びボ
ンデイング強度を確保するとともに耐食性改善
し、しかも品質を均一化するボンデイング用Al
線を提供せんとするもので、斯る本発明Al線は、
高純度Al(99.9%以上)に、0.5〜2.0wt%Mgを含
有させるとともに白金族元素(Pd、Pt、Rh、
Ru、Os、Ir)より選択された少なくとも一元素
を0.001〜0.3wt%含有せしめたことを要旨とす
る。
上記Alは99.9%以上の高純度のものを用い、マ
グネシウム(Mg)はAlの引張り強度を高める。
白金族元素(Pd、Pt、Rh、Ru、Os、Ir)は、
その添加によつてAlの引張り強度を高めるとと
もに、耐食性の改善に有用である。
上記白金族元素はその一種又は二種以上を添加
するが、二種以上を添加する場合でも含有量を
0.001〜0.3wt%とする。
Mgが0.5wt%未満、白金族元素の一種又は二
種以上が0.001wt%未満であつては所定の引張り
強度が得られず線引き加工が不可能であるととも
に耐食性に劣る。
とくに白金族元素が不足の場合は所定の耐食性
が得られない。
又、Mgが2.0wt%、白金族元素が0.3wt%を超
える場合は硬くなりすぎてもろくなり、チツプ割
れを起したり、あるいは組成に偏折を生じて機械
的強度がバラ付いて品質の安定化を図れない。
以下に実施例を示す。
各試料はAl合金を溶解鋳造し、線引き加工に
より直径0.03mmφの極細線ボンデイング用Al線と
したものである。
各試料の添加元素及びその添加量は次表(1)に示
す通りであつて、白金族元素として、Pd、Pt、
Rh、Ru、Os、Ifを添加した。
試料No.33は何れの白金族元素をも添加させない
比較品である。
尚、本発明において、残部に不可避なる不純物
を含むものである。
The present invention relates to a 0.02 to 0.5 mmφ Al wire for wire bonding used to connect chip electrodes of semiconductor devices to substrates or lead frames. In general, wire for bonding requires a certain tensile strength to prevent breakage during wire drawing and bonding work, and also prevents high temperature softening during bonding to stabilize the ball shape, prevent neck breakage, and maintain a constant crush width. It is required to maintain adhesive strength (bonding strength) after bonding and bonding, and corrosion resistance is also an important condition when the wire is exposed to a corrosive atmosphere as in the case of resin molding. However, since high-purity Al is too soft to achieve the desired tensile strength, it has been considered to improve the mechanical strength by adding various elements to high-purity Al, but the types of added elements Depending on the amount added, the specified tensile strength may not be obtained, and even if tensile strength is obtained, it may be too hard and cause chip cracking, or the tensile strength and bonding strength may become uniform due to polarization of the added element. This results in variations in quality. The present invention was developed in view of the above circumstances, and it has been found from experimental results that it is possible to ensure proper tensile strength and bonding strength with excellent bonding properties, improve corrosion resistance, and improve quality by changing the type and amount of added elements. Al for bonding to uniformize
The Al wire of the present invention is
High purity Al (99.9% or more) contains 0.5 to 2.0 wt% Mg and platinum group elements (Pd, Pt, Rh,
The gist is that at least one element selected from Ru, Os, and Ir is contained in an amount of 0.001 to 0.3 wt%. The above-mentioned Al has a high purity of 99.9% or more, and magnesium (Mg) increases the tensile strength of Al. Platinum group elements (Pd, Pt, Rh, Ru, Os, Ir) are
Its addition increases the tensile strength of Al and is useful for improving corrosion resistance. One or more of the above platinum group elements may be added, but even if two or more are added, the content should be controlled.
The content should be 0.001-0.3wt%. If Mg is less than 0.5 wt% and one or more platinum group elements are less than 0.001 wt%, the desired tensile strength cannot be obtained, making wire drawing impossible and poor corrosion resistance. In particular, when platinum group elements are insufficient, the desired corrosion resistance cannot be obtained. Furthermore, if Mg exceeds 2.0wt% and platinum group elements exceed 0.3wt%, the chip becomes too hard and brittle, leading to chip cracking or uneven composition, resulting in variations in mechanical strength and poor quality. Unable to stabilize. Examples are shown below. Each sample was made by melting and casting an Al alloy and drawing it into an ultra-fine Al wire for bonding with a diameter of 0.03 mmφ. The added elements and their amounts added to each sample are as shown in the following table (1).As platinum group elements, Pd, Pt,
Rh, Ru, Os, and If were added. Sample No. 33 is a comparative product in which no platinum group element is added. In the present invention, the remainder contains unavoidable impurities.
【表】【table】
【表】
上記各試料をもつて機械的性質、及び、耐食性
を測定した結果を表(2)に示す。[Table] Table (2) shows the results of measuring the mechanical properties and corrosion resistance of each of the above samples.
【表】【table】
【表】
試料No.11〜14及び28〜32は、ボンデイング強度
が必要強度に達しないとともに偏折が大きく同種
の試料であつてもボンデイング強度にバラツキが
みられた。
尚、熱処理は350℃×30分である。
又、耐食性は高温、高湿度下(120℃、2気圧、
湿度90%以上、100時間)における腐食の度合を
三ランクに区別し腐食度合いの大きいものから少
ないものへ順に×、〇、◎とした。
上記表(2)から知れるように、本発明実施品の範
囲(試料No.1〜10及び15〜27)にあつて、熱処理
後の硬さが適正状態(25〜50Hv)にあり、且つ
引張り強度が確保できるとともにボンデイング強
度が必要強度(3g以上)を確保され、しかも耐
食性に優れることが確認できた。
従つて、本発明実施品は線引き加工中に断線し
たり、ボンデイング作業中に断線を起したりする
ことがないとともにチツプ割れを防ぎ、しかも品
質を高品質安定に維持することができ、ボールボ
ンデイング熱圧着法、超音波接合法の何れに使用
してもボンデイング特性大なるAl線を提供し得
る。[Table] Samples Nos. 11 to 14 and 28 to 32 had bonding strengths that did not reach the required strength and had large polarization, and variations in bonding strength were observed even for samples of the same type. Note that the heat treatment was performed at 350°C for 30 minutes. In addition, corrosion resistance is high under high temperature and high humidity conditions (120℃, 2 atm,
The degree of corrosion under conditions of humidity of 90% or higher for 100 hours was classified into three ranks, and ranked as ×, 〇, and ◎ in descending order from the highest degree of corrosion to the lowest. As can be seen from Table (2) above, in the range of the products implementing the present invention (Samples Nos. 1 to 10 and 15 to 27), the hardness after heat treatment is in an appropriate state (25 to 50 Hv), and the tensile strength is It was confirmed that the strength was ensured, the required bonding strength (3 g or more) was ensured, and the corrosion resistance was excellent. Therefore, the product of the present invention does not break during wire drawing or bonding, prevents chip cracking, and maintains high quality and stable quality, making it suitable for ball bonding. Al wires with excellent bonding properties can be provided by either thermocompression bonding or ultrasonic bonding.
Claims (1)
(Mg)を含有させるとともに白金族元素(Pd、
Pt、Rh、Ru、Os、Ir)より選択された少くとも
−元素を0.001〜0.3wt%含有せしめた半導体素子
のボンデイング用Al線。1 High purity Al contains 0.5 to 2.0 wt% magnesium (Mg) and platinum group elements (Pd,
An Al wire for bonding semiconductor devices containing at least 0.001 to 0.3 wt% of - elements selected from Pt, Rh, Ru, Os, Ir).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58203879A JPS6095954A (en) | 1983-10-31 | 1983-10-31 | Al wire for bonding semiconductor element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58203879A JPS6095954A (en) | 1983-10-31 | 1983-10-31 | Al wire for bonding semiconductor element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6095954A JPS6095954A (en) | 1985-05-29 |
| JPH0347579B2 true JPH0347579B2 (en) | 1991-07-19 |
Family
ID=16481225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58203879A Granted JPS6095954A (en) | 1983-10-31 | 1983-10-31 | Al wire for bonding semiconductor element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6095954A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60198851A (en) * | 1984-03-23 | 1985-10-08 | Hitachi Ltd | High corrosion resistant high hardness aluminum alloy wire for semiconductor |
| US5711858A (en) * | 1994-04-12 | 1998-01-27 | International Business Machines Corporation | Process for depositing a conductive thin film upon an integrated circuit substrate |
| WO2022168789A1 (en) * | 2021-02-05 | 2022-08-11 | 日鉄マイクロメタル株式会社 | Al wiring material |
-
1983
- 1983-10-31 JP JP58203879A patent/JPS6095954A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6095954A (en) | 1985-05-29 |
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