JPH0349956A - Liquid jet recording head and manufacture thereof - Google Patents
Liquid jet recording head and manufacture thereofInfo
- Publication number
- JPH0349956A JPH0349956A JP18537489A JP18537489A JPH0349956A JP H0349956 A JPH0349956 A JP H0349956A JP 18537489 A JP18537489 A JP 18537489A JP 18537489 A JP18537489 A JP 18537489A JP H0349956 A JPH0349956 A JP H0349956A
- Authority
- JP
- Japan
- Prior art keywords
- recording head
- liquid
- jet recording
- liquid jet
- flow path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims description 54
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000000758 substrate Substances 0.000 claims description 29
- 239000011521 glass Substances 0.000 claims description 17
- 238000002844 melting Methods 0.000 claims description 12
- 230000008018 melting Effects 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 239000006121 base glass Substances 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
[産業上の利用分野]
本発明は、液体噴射式プリンター(通称インクジェット
プリンター)に用いられる記録ヘッドの製造方法に関す
るものである。[Industrial Field of Application] The present invention relates to a method of manufacturing a recording head used in a liquid jet printer (commonly known as an inkjet printer).
従来の液体噴射記録ヘッドは流路形成のための基盤材と
して例えばガラスを用いている。そしてこのガラスの接
合方法は、第4図(a)に示す様に予めフォトリソ技術
により液体流路となる溝1を形成した基盤ガラス11と
第4図(b)に示す、その基盤がラス11に対向して接
合する薄板ガラス12を第4図(C)に示す様に重ね合
わせ、所定の荷重にて治具に挟持して、基盤ガラス11
及び薄板ガラス12の融点近くまで加熱し溶融圧着して
いる。
[発明が解決しようとする課題及び目的]しかし、前述
の従来技術では加熱温度がガラスの融点近くになる事お
よび治具の挟持荷重が大きい事により第5図の流路断面
図に示す様に液体流路6の形状が変形してしまったり、
薄板ガラス3が割れてしまう。この液体流路の深さは1
00μm程度であり変形量が25μm程度までばらつい
てしまうので個々の液体噴射口からの飛翔する液体の体
積のばらつきが大きく、個々の液体噴射口からの飛翔時
間がばらついてしまい印字ずれを生じ易く印字品質が落
ちる。また、その影響は印字速度を上げると大きくなる
ので高速印字化が図れないという課題を有する。また、
600°C程度までの加熱冷却工程を経るので製造のリ
ードタイムが長くなる。さらに、挟持治具の精度管理を
厳しくしなければならないとともに治具へのセットも時
間を費やしてしまうという課題を有する。そこで本発明
はこのような課題を解決するもので、その目的とすると
ころは液体噴射記録ヘッドの基盤の接合時の液体流路の
変形をなくし印字品質の向上を図るとともに高速印字化
を可能とするところにある。また、製造時の基盤の割れ
欠けをなくし高歩留りで、製造のリードタイムが短く作
業も簡単な液体噴射記録ヘッド及びその製造方法を提供
するところにある。
[課題を解決するための手段]
本発明の液体噴射記録ヘッドは二枚又は三枚の基盤を接
合し液体流路を形成し該液体流路に圧縮力を加え、該圧
縮力により液体を飛翔させて記録する液体噴射記録ヘッ
ドにおいて、前記基盤材としてシリコン基盤を用いる事
を特徴とする。また本発明の液体噴射記録ヘッドの製造
方法は、二枚又は三枚のシリコン基盤の接合面の一方に
低融点ガラスをスパッタあるいは蒸着により形成した後
、接合面を重ね合わせ前記低融点ガラスを形成したシリ
コン基盤側に負電圧を印加し、接合することを特徴とす
る。
[実施例]
第1図は本発明の実施例における液体噴射記録ヘッドの
製造工程を示す斜視図である。第1図(a)に示す様に
シリコン基盤よりなりフォトリソ技術により液体流路と
なる溝1を形成した第一基盤2と第1図(b)に示すシ
リコン基盤よりなる第二基盤3を接合する前に、第一基
盤2または第二基盤3の接合面4のどちらか一方の面に
低融点ガラス5をスパッタ法又は蒸着法によって100
0人〜10000人の厚みで形成する。本実施例の場合
、低融点ガラス5としてはその融点が350°C程度の
ものを用いスパッタ法により第二基盤側に形成した。こ
の第一基盤2と第二基盤3を第1図(C)に示す様に対
向させ120℃の雰囲気の中で第二基盤3側に70Vの
負電圧を印加する。この様にする事によって、斉温での
接合工程を経ずに短時間で接合が出来る。この様にして
一体として液体流路6を形成した液体噴射部の一部を切
断して第1図(d)に示す様に液体噴射面7を形成する
。その後、第1図(e)に示す様に各液体流路上に位置
する第二基盤上に圧電素子8を貼り付は液体噴射記録ヘ
ッド9を得る。この圧電素子8の圧力により液体が液体
噴射口1oより飛翔し記録紙に印字する。この様にして
得られた液体噴射記録ヘッドの液体流路部の断面は第2
図に示すように、接合前の第一基盤に形成された溝形状
そのままで変形はない。また、加える荷重も従来の方法
の1/10程度ですみ第二基盤の割れ、欠けの発生も皆
無になった。第3図は他の実施例を示すもので第一基盤
2と第二基盤3を二枚用いた液体噴射記録ヘッドの実施
例である。この場合は一度第一基盤2と第二基盤3の一
方を上述した接合方法で接合した後もう一度もう一方の
第二基盤3を接合し三枚の基盤を一体とする。これらの
様に、上述した接合方法を取ると、接合後の流路断面積
のばらつきを小さくすることが出来るので個々の液体噴
射口から飛翔する液体の印字面までの到達時間のばらつ
きが小さくなり印字ずれがなくなり高品質の印字が可能
となる。また、印字速度を上げるためにはこの液体噴射
記録ヘッドの走査速度をさらに上げるため個々の液体噴
射口から飛翔する液体の印字面までの到達時間のばらつ
きは一層印字品質に影響を与える。従って、このばらつ
きが小さくなるということは、インクジェットプリンタ
ーの高速印字化を可能にするものである。なお、高温下
に長時間に渡って保持されることがないので、第一基盤
と第二基盤を重ね合わせ負電圧を印加する治具において
は導電体であれば特に制約を受けない。
[発明の効果]
以上述べたように本発明によれば、液体噴射記録ヘッド
において第一基盤と第二基盤を接合する際に接合面の一
方に低融点ガラスを形成し、重ね合わせ、この低融点ガ
ラスを形成した側に負電圧を印加することによって接合
することが出来るので、液体流路の大きさのばら、つき
による印字品質劣化のない優れた印字品質の液体噴射記
録ヘッドが得られるとともに印字速度の高速化が図れる
という効果を有する。また、ガラスの割れ、欠けがなく
貰歩留りであり、製造リードタイムも短く接合時の作業
も簡単になるなど製造コストの削減が図れるという効果
を有する。Conventional liquid jet recording heads use, for example, glass as a base material for forming flow channels. This method of bonding glasses is as follows: As shown in FIG. 4(a), the base glass 11 has grooves 1 formed as liquid flow paths in advance by photolithography, and the base glass 11 as shown in FIG. 4(b) The thin glass sheets 12 to be bonded facing each other are stacked as shown in FIG.
The sheet glass 12 is then heated to near the melting point of the glass sheet 12 to be melted and pressed. [Problems and Objectives to be Solved by the Invention] However, in the above-mentioned conventional technology, the heating temperature is close to the melting point of glass and the clamping load of the jig is large, resulting in problems as shown in the cross-sectional view of the flow path in Fig. 5. The shape of the liquid flow path 6 may be deformed,
The thin glass 3 breaks. The depth of this liquid channel is 1
00 μm, and the amount of deformation varies up to about 25 μm, so there is a large variation in the volume of liquid flying from each liquid jet port, and the flight time from each liquid jet port also varies, which tends to cause printing misalignment. Quality deteriorates. Furthermore, since the influence increases as the printing speed increases, there is a problem that high-speed printing cannot be achieved. Also,
Since it goes through a heating and cooling process up to about 600°C, the manufacturing lead time becomes long. Furthermore, there is a problem in that precision control of the clamping jig must be strictly controlled, and setting the clamping jig on the jig also takes time. The present invention is intended to solve these problems, and its purpose is to eliminate deformation of the liquid flow path when bonding the base of a liquid jet recording head, improve printing quality, and enable high-speed printing. It's there. Another object of the present invention is to provide a liquid jet recording head that eliminates cracking and chipping of the substrate during manufacture, has a high yield, has a short manufacturing lead time, and is easy to work with, and a method for manufacturing the same. [Means for Solving the Problems] The liquid jet recording head of the present invention joins two or three substrates to form a liquid channel, applies compressive force to the liquid channel, and uses the compressive force to eject the liquid. The liquid jet recording head that performs recording is characterized in that a silicon substrate is used as the base material. Further, the method for manufacturing a liquid jet recording head of the present invention includes forming a low melting point glass on one of the bonding surfaces of two or three silicon substrates by sputtering or vapor deposition, and then overlapping the bonding surfaces to form the low melting point glass. It is characterized by applying a negative voltage to the silicon substrate side and bonding. [Example] FIG. 1 is a perspective view showing the manufacturing process of a liquid jet recording head in an example of the present invention. As shown in FIG. 1(a), a first substrate 2 made of a silicon substrate with a groove 1 formed as a liquid flow path formed therein by photolithography is bonded to a second substrate 3 made of a silicon substrate shown in FIG. 1(b). Before the bonding surface 4 of the first substrate 2 or the second substrate 3 is coated with a low melting point glass 5 of 100% by sputtering or vapor deposition.
Formed with a thickness of 0 to 10,000 people. In the case of this embodiment, the low melting point glass 5 having a melting point of about 350° C. was formed on the second substrate side by sputtering. The first substrate 2 and the second substrate 3 are placed facing each other as shown in FIG. 1(C), and a negative voltage of 70 V is applied to the second substrate 3 in an atmosphere of 120° C. By doing this, it is possible to bond in a short time without going through a bonding process at a uniform temperature. A part of the liquid ejecting section that integrally forms the liquid flow path 6 in this way is cut to form a liquid ejecting surface 7 as shown in FIG. 1(d). Thereafter, as shown in FIG. 1(e), a piezoelectric element 8 is attached to a second substrate located on each liquid flow path to obtain a liquid jet recording head 9. Due to the pressure of the piezoelectric element 8, liquid is ejected from the liquid jet port 1o and printed on the recording paper. The cross section of the liquid flow path portion of the liquid jet recording head obtained in this way is
As shown in the figure, the groove shape formed on the first substrate before bonding remains unchanged and is not deformed. In addition, the applied load was only about 1/10 that of the conventional method, and there was no cracking or chipping of the second base. FIG. 3 shows another embodiment, which is an embodiment of a liquid jet recording head using two first substrates 2 and second substrates 3. In FIG. In this case, one of the first base plate 2 and the second base plate 3 is once bonded by the above-described bonding method, and then the other second base plate 3 is bonded once again to make the three base plates into one body. As mentioned above, by using the bonding method described above, it is possible to reduce the variation in the cross-sectional area of the flow path after bonding, which reduces the variation in the time it takes for the liquid flying from each liquid jet port to reach the printing surface. This eliminates printing misalignment and enables high-quality printing. Furthermore, in order to increase the printing speed, the scanning speed of the liquid jet recording head is further increased, so variations in the time it takes for the liquid flying from the individual liquid jet ports to reach the printing surface further affects the print quality. Therefore, reducing this variation enables high-speed printing with an inkjet printer. Note that, since it is not held at high temperatures for a long period of time, there are no particular restrictions on the jig for stacking the first substrate and the second substrate and applying a negative voltage as long as it is a conductor. [Effects of the Invention] As described above, according to the present invention, when a first substrate and a second substrate are bonded together in a liquid jet recording head, a low melting point glass is formed on one of the bonding surfaces, and the glass is overlaid. Since bonding can be achieved by applying a negative voltage to the side on which the melting point glass is formed, it is possible to obtain a liquid jet recording head with excellent printing quality without deterioration of printing quality due to variations in the size of the liquid flow path or sticking. This has the effect of increasing printing speed. In addition, there is no cracking or chipping of the glass, and the yield is high, and the manufacturing lead time is short, and the work at the time of bonding is simplified, resulting in a reduction in manufacturing costs.
第1図は本発明の液体噴射記録ヘッド及びその製造方法
の一実施例を示す斜視図。
第2図は第1図の液体流路部の断面図。
第3図は本発明の他の実施例による液体噴射記録ヘッド
の斜視図。
第4図は従来の液体噴射記録ヘッド及びその製造方法を
示す斜視図。
第5図は第4図の液体流路部の断面図。
1・・・液体流路となる溝
2・・・第一基盤
3・・・第二基盤
4・・・接合面
5・・・低融点ガラス
6・・・液体流路
7・・・液体噴射面
8・・・圧電素子
9・・・液体噴射記録ヘラ
0・・・液体噴射口
1・・・基盤ガラス
2・・・薄板ガラス
ト
以上FIG. 1 is a perspective view showing an embodiment of a liquid jet recording head and a method for manufacturing the same according to the present invention. FIG. 2 is a sectional view of the liquid flow path section of FIG. 1. FIG. 3 is a perspective view of a liquid jet recording head according to another embodiment of the present invention. FIG. 4 is a perspective view showing a conventional liquid jet recording head and its manufacturing method. FIG. 5 is a sectional view of the liquid flow path section of FIG. 4. 1...Groove serving as a liquid flow path 2...First substrate 3...Second substrate 4...Joint surface 5...Low melting point glass 6...Liquid flow path 7...Liquid injection Surface 8...Piezoelectric element 9...Liquid injection recording spatula 0...Liquid injection port 1...Base glass 2...Thin plate glass or higher
Claims (2)
液体流路に圧縮力を加え、該圧縮力により液体を飛翔さ
せて記録する液体噴射記録ヘッドにおいて、前記基盤材
としてシリコン基盤を用いる事を特徴とする液体噴射記
録ヘッド。(1) In a liquid jet recording head that connects two or three substrates to form a liquid flow path, applies compressive force to the liquid flow path, and records by causing the liquid to fly due to the compressive force, the base material is A liquid jet recording head characterized by using a silicon substrate.
融点ガラスをスパッタあるいは蒸着により形成した後、
接合面を重ね合わせ前記低融点ガラスを形成したシリコ
ン基盤側に負電圧を印加し、接合することを特徴とする
液体噴射記 録ヘッドの製造方法。(2) After forming low melting point glass on one of the joint surfaces of two or three silicon substrates by sputtering or vapor deposition,
A method for manufacturing a liquid jet recording head, characterized in that bonding is performed by applying a negative voltage to the silicon substrate side on which the low melting point glass is formed by overlapping bonding surfaces.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18537489A JPH0349956A (en) | 1989-07-18 | 1989-07-18 | Liquid jet recording head and manufacture thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18537489A JPH0349956A (en) | 1989-07-18 | 1989-07-18 | Liquid jet recording head and manufacture thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0349956A true JPH0349956A (en) | 1991-03-04 |
Family
ID=16169685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18537489A Pending JPH0349956A (en) | 1989-07-18 | 1989-07-18 | Liquid jet recording head and manufacture thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0349956A (en) |
-
1989
- 1989-07-18 JP JP18537489A patent/JPH0349956A/en active Pending
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