JPH0355541A - Development processing method for silver halide photosensitive material - Google Patents
Development processing method for silver halide photosensitive materialInfo
- Publication number
- JPH0355541A JPH0355541A JP19163089A JP19163089A JPH0355541A JP H0355541 A JPH0355541 A JP H0355541A JP 19163089 A JP19163089 A JP 19163089A JP 19163089 A JP19163089 A JP 19163089A JP H0355541 A JPH0355541 A JP H0355541A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver
- developing
- formula
- silver halide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 70
- 239000004332 silver Substances 0.000 title claims abstract description 70
- -1 silver halide Chemical class 0.000 title claims abstract description 66
- 239000000463 material Substances 0.000 title claims abstract description 39
- 238000011161 development Methods 0.000 title description 17
- 238000003672 processing method Methods 0.000 title 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 23
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000012545 processing Methods 0.000 claims abstract description 14
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 7
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims abstract description 5
- 150000001768 cations Chemical class 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 41
- 239000000839 emulsion Substances 0.000 claims description 36
- 150000001875 compounds Chemical class 0.000 claims description 35
- 239000002245 particle Substances 0.000 claims description 19
- 239000002253 acid Substances 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 7
- 229910052783 alkali metal Inorganic materials 0.000 claims description 5
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 4
- 125000000623 heterocyclic group Chemical group 0.000 claims description 3
- 150000001340 alkali metals Chemical group 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical group OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims 1
- 125000002843 carboxylic acid group Chemical group 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 claims 1
- 125000000542 sulfonic acid group Chemical group 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 229910052740 iodine Inorganic materials 0.000 abstract description 2
- 125000002723 alicyclic group Chemical group 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 28
- 239000000975 dye Substances 0.000 description 17
- 239000000243 solution Substances 0.000 description 15
- 150000003839 salts Chemical class 0.000 description 14
- 230000035945 sensitivity Effects 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 206010070834 Sensitisation Diseases 0.000 description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 9
- 230000008313 sensitization Effects 0.000 description 9
- 239000000084 colloidal system Substances 0.000 description 8
- 108010010803 Gelatin Proteins 0.000 description 7
- 239000002738 chelating agent Substances 0.000 description 7
- 239000008273 gelatin Substances 0.000 description 7
- 229920000159 gelatin Polymers 0.000 description 7
- 235000019322 gelatine Nutrition 0.000 description 7
- 235000011852 gelatine desserts Nutrition 0.000 description 7
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 7
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 5
- RPACBEVZENYWOL-XFULWGLBSA-M sodium;(2r)-2-[6-(4-chlorophenoxy)hexyl]oxirane-2-carboxylate Chemical compound [Na+].C=1C=C(Cl)C=CC=1OCCCCCC[C@]1(C(=O)[O-])CO1 RPACBEVZENYWOL-XFULWGLBSA-M 0.000 description 5
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000013522 chelant Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000004816 latex Substances 0.000 description 4
- 229920000126 latex Polymers 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 230000001235 sensitizing effect Effects 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 150000003378 silver Chemical class 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 230000008961 swelling Effects 0.000 description 3
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 2
- 208000002109 Argyria Diseases 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 229910021612 Silver iodide Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910001447 ferric ion Inorganic materials 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002391 heterocyclic compounds Chemical class 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000003449 preventive effect Effects 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- 229940045105 silver iodide Drugs 0.000 description 2
- 229910001961 silver nitrate Inorganic materials 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- 150000003585 thioureas Chemical class 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- QNRATNLHPGXHMA-XZHTYLCXSA-N (r)-(6-ethoxyquinolin-4-yl)-[(2s,4s,5r)-5-ethyl-1-azabicyclo[2.2.2]octan-2-yl]methanol;hydrochloride Chemical compound Cl.C([C@H]([C@H](C1)CC)C2)CN1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OCC)C=C21 QNRATNLHPGXHMA-XZHTYLCXSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- YLVACWCCJCZITJ-UHFFFAOYSA-N 1,4-dioxane-2,3-diol Chemical compound OC1OCCOC1O YLVACWCCJCZITJ-UHFFFAOYSA-N 0.000 description 1
- XIWRQEFBSZWJTH-UHFFFAOYSA-N 2,3-dibromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1Br XIWRQEFBSZWJTH-UHFFFAOYSA-N 0.000 description 1
- DBCKMJVEAUXWJJ-UHFFFAOYSA-N 2,3-dichlorobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Cl)=C1Cl DBCKMJVEAUXWJJ-UHFFFAOYSA-N 0.000 description 1
- AYNPIRVEWMUJDE-UHFFFAOYSA-N 2,5-dichlorohydroquinone Chemical compound OC1=CC(Cl)=C(O)C=C1Cl AYNPIRVEWMUJDE-UHFFFAOYSA-N 0.000 description 1
- IKQCSJBQLWJEPU-UHFFFAOYSA-N 2,5-dihydroxybenzenesulfonic acid Chemical compound OC1=CC=C(O)C(S(O)(=O)=O)=C1 IKQCSJBQLWJEPU-UHFFFAOYSA-N 0.000 description 1
- GPASWZHHWPVSRG-UHFFFAOYSA-N 2,5-dimethylbenzene-1,4-diol Chemical compound CC1=CC(O)=C(C)C=C1O GPASWZHHWPVSRG-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 1
- CBHTTYDJRXOHHL-UHFFFAOYSA-N 2h-triazolo[4,5-c]pyridazine Chemical compound N1=NC=CC2=C1N=NN2 CBHTTYDJRXOHHL-UHFFFAOYSA-N 0.000 description 1
- GODCLGCOHHTLHX-UHFFFAOYSA-N 3,3-diphosphonopropanoic acid Chemical compound OC(=O)CC(P(O)(O)=O)P(O)(O)=O GODCLGCOHHTLHX-UHFFFAOYSA-N 0.000 description 1
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- 150000003431 steroids Chemical class 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000005156 substituted alkylene group Chemical group 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 1
- SHWIJIJNPFXOFS-UHFFFAOYSA-N thiotaurine Chemical compound NCCS(O)(=O)=S SHWIJIJNPFXOFS-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- NZKWZUOYGAKOQC-UHFFFAOYSA-H tripotassium;hexachloroiridium(3-) Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[K+].[K+].[K+].[Ir+3] NZKWZUOYGAKOQC-UHFFFAOYSA-H 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
く産業用の利用分野〉
本発明はハロゲン化銀写真感光材料の処理方法に関し、
更に詳しくは写真感光材料を現像処理するときに現像タ
ンクや現像ラック、ローラーに付着する銀汚れ(銀スラ
ッヂともいう)を少なくし、日常の器具、器機のメンテ
ナンスを容易にする方法に関するものである。[Detailed description of the invention] Industrial application field> The present invention relates to a method for processing silver halide photographic materials,
More specifically, it relates to a method for reducing the amount of silver stain (also referred to as silver sludge) that adheres to developing tanks, developing racks, and rollers during the processing of photographic materials, thereby facilitating the daily maintenance of tools and equipment. .
く従来技術〉
一般にハロゲン化銀写真感光材料を現像処理すると、処
理量に応じて次第に現像タンクやバット、自動現像機(
以下自現機という)の現像タンクの壁、現像タンク、現
像ローラーに銀が付着、蓄積することは古くから知られ
ている。これは銀汚れ又は銀スラッヂとも言われ、処理
される感材に付着して画像を汚したりするので、定期的
に機器の洗浄、メンテナンスを必要としている。Conventional technology> Generally, when silver halide photographic light-sensitive materials are developed, depending on the amount of processing, the development tank, vat, automatic developing machine (
It has been known for a long time that silver adheres and accumulates on the walls, developing tanks, and developing rollers of developing machines (hereinafter referred to as automatic processors). This is also called silver stain or silver sludge, and it adheres to the photosensitive material being processed and stains the image, so it is necessary to regularly clean and maintain the equipment.
また、特に工業用Xレイ感材は、粒子サイズを極端に大
きくせずに塗布銀量を多くして高感度と微細粒状を確保
し、塗布銀量が多いがために、その現像処理時間も長時
間が必要となっている。このような感材の処理では、■
ハロゲン化銀粒子が微粒子である。■塗布銀量が多い
■現像時間が長い。という特徴すべてが、現像中でのハ
ロゲン化銀の溶解量を大きくする要因であり、銀汚れも
非常におこりやすくなっている。In addition, especially for industrial X-ray sensitive materials, high sensitivity and fine grains are ensured by increasing the amount of silver coated without extremely increasing the grain size. It requires a long time. In processing such sensitive materials, ■
The silver halide grains are fine grains. ■Large amount of silver coated
■Developing time is long. All of these characteristics are factors that increase the amount of silver halide dissolved during development, making silver stains extremely likely to occur.
さらに、その工業用Xレイ感材の検出しようとしている
欠陥の画像はほんの少しの濃度変化しか与えない場合が
多く、この銀汚れに起因する濃度変化でも画像の識別と
いう点からは非常に大きな障害となる。Furthermore, the image of the defect to be detected in the industrial X-ray sensitive material often shows only a slight change in density, and even the change in density caused by this silver stain is a huge hindrance in terms of image identification. becomes.
この銀汚れを落とすための洗浄には、その都度、現像液
を現像タンクから抜き、例えば硫酸セリウムの如き、非
常に強い酸化剤溶液をタンクに満たし、短かくても十数
分から長くは三十分間以上も攪拌しながら放置しなけれ
ばならない。更にこの後、この酸化剤の痕跡が現像タン
ク中に残っては、現像液を酸化劣化させるので、よく水
洗いせねばならない。この洗浄作業は特に、自現機の、
日常のメンテナンスとして最大の負荷の一つとなってお
り、作業の安全性という点、更に洗浄剤の公害負荷とい
う観点からも改良が切に望まれているものである。To remove this silver stain each time, drain the developer from the developer tank and fill the tank with a very strong oxidizer solution such as cerium sulfate. It must be left stirring for more than a minute. Furthermore, if traces of this oxidizing agent remain in the developing tank after this, the developing solution will be oxidized and deteriorated, so it must be thoroughly washed with water. This cleaning work is especially important for automatic processors.
This is one of the biggest burdens of daily maintenance, and improvements are desperately needed from the standpoint of work safety and the pollution burden of cleaning agents.
一方、この銀汚れを少なくする方法として、特開昭5
6−2 4 3 4 7号のように現像液中に溶出する
銀イオンを少なくする及び/又は銀イオンの銀への還元
を抑制するような化合物を添加する方法が知られている
。しかしこの方法は現像そのものを抑制する作用も避け
られず感度の低下を伴なうという欠点を有する。しかも
感光材料の特性により、この化合物に対する感受性が異
なるので、一率に使って効果が期待できるものではない
。また、少しでも感度を高く出して使おうとする感光材
料/現像処理システムとしては、感度の低下は重大な欠
点である。On the other hand, as a method to reduce this silver stain,
A method of adding a compound that reduces the amount of silver ions eluted into the developer and/or suppresses the reduction of silver ions to silver is known, as in No. 6-2 4 3 4 7. However, this method has the disadvantage that it also inevitably inhibits the development itself, which is accompanied by a decrease in sensitivity. Moreover, since the sensitivity to this compound varies depending on the characteristics of the photosensitive material, no effect can be expected from using it all at once. In addition, a decrease in sensitivity is a serious drawback for a photosensitive material/development processing system that is intended to be used with as high a sensitivity as possible.
く発明が解決しようとする課題〉
従って本発明の目的はハロゲン化銀写真感光材料を現像
処理するとき、第一に、現像タンク中、及び/又は現像
ラック、ローラー中に発生する銀汚れを軽減すること、
第二に、自現機や現像の機器のメンテナンスを容易にす
ること、第三に写真特性に全く影響を与えないで銀汚れ
を軽減すること、第四に現像液の安定性を損なうことな
く、銀汚れを軽減することである。OBJECTS TO BE SOLVED BY THE INVENTION Therefore, the purpose of the present invention is, first, to reduce the silver stains that occur in the developing tank and/or the developing rack and rollers when developing silver halide photographic materials. to do,
Second, it facilitates the maintenance of automatic processors and developing equipment; third, it reduces silver contamination without affecting photographic properties; and fourth, it does not compromise the stability of the developer. , to reduce silver stains.
本発明の別の目的は、工業用Xレイ感材のような感材の
自現機による処理時に、高感度、微細粒状を確保し、か
つ銀汚れの全くない現像処理方法を提供することにある
。Another object of the present invention is to provide a developing method that ensures high sensitivity, fine grain, and no silver stain when processing a photosensitive material such as an industrial X-ray photosensitive material using an automatic processor. be.
く問題を解決するための手段〉
本発明の目的は塗布銀量が合計1 0 g/n−r以上
であるハロゲン化銀写真感光材料を画像露光後、少なく
とも下記(a)、(b)、(c)成分を有する現像液で
現像処理することによって達成することができた。Means for Solving Problems> The object of the present invention is to apply at least the following (a), (b), This could be achieved by developing with a developer containing component (c).
(a)ハイドロキノン系現像主薬、
(b)0、lモル71以上の亜硫酸塩および(C)下記
(X)または下記(Y)の少なくとも1つ
を含有する現像液で処理することを特徴とするハロゲン
化銀感光材料の現像処理方法。It is characterized by processing with a developer containing (a) a hydroquinone-based developing agent, (b) a sulfite of 0.1 mole or more and (C) at least one of the following (X) or the following (Y): A method for developing silver halide photosensitive materials.
(X)下記一般式(I)で表される化合物(I)(S)
, D. (−Et)、S −B.(
一At)ゎ
(Y)下記(y1)および(y2)
(yl)下記一般式(I!)で表される化合物SH
R−CHCH.−COOH
〔式中Rはフエニル基または低級アルキル基を表す。〕
(y2)下記一般式(III)で表される化合物または
アミノ(低級)アルカンチオスルホン酸もしくはそのア
ルカリ金属塩の少なくとも1つ。(X) Compound (I) (S) represented by the following general formula (I)
, D. (-Et), S-B. (
-At)ゎ(Y) The following (y1) and (y2) (yl) Compounds represented by the following general formula (I!) SH R-CHCH. -COOH [In the formula, R represents a phenyl group or a lower alkyl group. ] (y2) At least one of the compound represented by the following general formula (III), amino(lower)alkanethiosulfonic acid, or an alkali metal salt thereof.
s−sow M
R’−CHCH.−COOH
〔式中R゛ はフエニル基または低級アルキル基を、M
は水素原子またはアルカリ金属を表す。〕一般式(I)
で表わされる化合物のうち好ましいものは一般式(I’
/)、(V)で表すことができる。s-sow M R'-CHCH. -COOH [In the formula, R' is a phenyl group or a lower alkyl group, M
represents a hydrogen atom or an alkali metal. ]General formula (I)
Preferred compounds among the compounds represented by the general formula (I'
/), (V).
一般式(N)
一般式(V)
S
S−C−COOM
ハ
R.R,
一般式(■)中、R+、R−は水素原子、置換されても
よい炭素原子l〜6個のアルキル基、アルケニル基、ア
ラルキル基、シクロアルキル基、置換されてもよいフエ
ニル基、窒素原子1〜3個または酸素原子1個または硫
黄原子1個を含有している5員または6員複素環または
カルポン酸基を表わし、R2は直接結合を表わすかまた
は置換されてもよいアルキレン基、アルキリデン基、フ
工二レン基、アラルキレン基、または一CONHCH.
−を表わし、A.は−COOMまたは−SO.M(M
は一般式(1)と同義である)msは1又は2である。General formula (N) General formula (V) S S-C-COOM HaR. R, in the general formula (■), R+ and R- are a hydrogen atom, an optionally substituted alkyl group having 1 to 6 carbon atoms, an alkenyl group, an aralkyl group, a cycloalkyl group, an optionally substituted phenyl group, Represents a 5- or 6-membered heterocycle containing 1 to 3 nitrogen atoms, 1 oxygen atom or 1 sulfur atom, or a carboxyl group, and R2 represents a direct bond or an optionally substituted alkylene group , an alkylidene group, a phenylene group, an aralkylene group, or one CONHCH.
- represents A. is -COOM or -SO. M(M
is synonymous with general formula (1)) ms is 1 or 2.
一般式(V)中、R. 、R.は水素原子またはメチル
基を表わす。In general formula (V), R. , R. represents a hydrogen atom or a methyl group.
Mは好ましくは水素陽イオンまたはアルカリ金属陽イオ
ン(例えばNa@またはKΦなど)である。M is preferably a hydrogen cation or an alkali metal cation (such as Na@ or KΦ).
一般式(■)で表わされる化合物のうち、一般式(VI
)のものはさらに好ましい。Among the compounds represented by the general formula (■), the general formula (VI
) is even more preferred.
一般式(VI)
一般式(Vl)中、R. 、Rtは水素原子、置換され
てもよいアルキル基(例えば−CH.、−C.Hl 、
−CH! OH, 一CH.COOHなど)、シクロア
ルキル基(例えばシクロペンチル基、シクロヘキシル基
など)置換されてもよいフ工二ル基(例えばフエニル基
、トリル基、p−クロロフエニル基、p−アミノフエニ
ル基、p−スルホフエニル基、p−スルホンアミドフエ
ニル基など)窒素原子1〜3個、または酸素原子1個ま
たは硫黄原子l個を含有している5員または6員複素環
(例えば、フリル基、チェニル基など)、またはカルポ
ン酸基を表わし、Ra、Reは同じでも異ってもよい。General formula (VI) In general formula (Vl), R. , Rt is a hydrogen atom, an optionally substituted alkyl group (e.g. -CH., -C.Hl,
-CH! OH, 1CH. COOH, etc.), cycloalkyl groups (e.g., cyclopentyl group, cyclohexyl group, etc.), optionally substituted phenyl groups (e.g., phenyl group, tolyl group, p-chlorophenyl group, p-aminophenyl group, p-sulfophenyl group, p-sulfophenyl group, - sulfonamidophenyl group, etc.), or a 5- or 6-membered heterocycle containing 1 to 3 nitrogen atoms, 1 oxygen atom or 1 sulfur atom (such as furyl group, chenyl group, etc.), or carpon It represents an acid group, and Ra and Re may be the same or different.
lはl、2、3、または4である。1 is 1, 2, 3, or 4.
次に一般式(I)、(■)中、RSR’で表わされる低
級アルキル基としてはメチル基、エチル基、プロビル基
などであり、またアミノ(低級)アルカンチオスルホン
酸としてアミノエチルチオスルホン酸などである。Next, in general formulas (I) and (■), the lower alkyl group represented by RSR' includes methyl group, ethyl group, probyl group, etc., and amino(lower)alkanethiosulfonic acid includes aminoethylthiosulfonic acid. etc.
一般式(I)の化合物の具体例を以下に挙げる。Specific examples of the compound of general formula (I) are listed below.
HOOC−H.C−S−S−CH.−COOHH.C−
HC−S−S−CH−CH.
HOOC
COOH
H.C−HC−S−S−CH−CH.
HOOC−HC−S−S−CH−COOH1
HOOC−H.C CH.−COOHチ
オ乳酸
α−メルカブトイソ酪酸
HOOC (CH^一S S (CH*)g CO
OHHOOC (CHI)$ S S− (CH!
)3 COOHCH.
CH.
KODC−CH.−NH−Co−CH−S−S−CH−
CO−NH−CH2−(3)KCHs
CH.
HOOC−CH.−S−S−S−CH.−COOH一般
式(n)
又は
(II[)
の化合物の具体例を以
下に挙げる。HOOC-H. C-S-S-CH. -COOHH. C-
HC-S-S-CH-CH. HOOC COOH H. C-HC-S-S-CH-CH. HOOC-HC-S-S-CH-COOH1 HOOC-H. C CH. -COOH thiolactic acid α-mercabutoisobutyric acid HOOC (CH^1S S (CH*)g CO
OHHOOC (CHI) $ S S- (CH!
)3 COOHCH. CH. KODC-CH. -NH-Co-CH-S-S-CH-
CO-NH-CH2-(3)KCHs CH. HOOC-CH. -S-S-S-CH. Specific examples of compounds represented by the -COOH general formula (n) or (II[) are listed below.
SH CH* −CHCH. −COOH SSO.K l CH.−CHCH.−COOH 一般式(I) (n) (I[) で表わされる化 合物の合成法は特公昭56−46, 585号、同 62−28,459号等に記載されている。S.H. CH* -CHCH. -COOH SSO. K l CH. -CHCH. -COOH General formula (I) (n) (I[) represented by The method for synthesizing the compound was published in Japanese Patent Publication No. 56-46, No. 585, same No. 62-28,459, etc.
上記X, Yの化合物の添加量は、各々現像液1l当り
、・好ましくは0.01〜50g1より好ましくは0.
05〜20gである。Yの場合、(yl): (y2
)のモル比は100:1〜I:100,特に5:1〜1
:20が好ましい。The amounts of the compounds X and Y added are preferably 0.01 to 50 g, more preferably 0.01 to 50 g, respectively, per liter of developer.
05-20g. For Y, (yl): (y2
) molar ratio of 100:1 to I:100, especially 5:1 to 1
:20 is preferable.
本発明の現像液に用いる現像主薬にはハイドロキノン類
を主体とするのが、良好な性能を得やすい点で、ハイド
ロキノン類と1−フエニルー3一ビラゾリドン類の組合
せ、またはハイドロキノン類とp−アミノフェノール類
との組合せがよい。The developing agent used in the developer of the present invention is mainly composed of hydroquinones because it is easy to obtain good performance. Good combination with other types.
本発明に用いるハイドロキノン系現像主薬としてはハイ
ドロキノン、クロロハイドロキノン、プロムハイドロキ
ノン、イソプロビルハイドロキノン、メチルハイドロキ
ノン、2,3−ジクロロハイドロキノン、2.5−ジク
ロロハイドロキノン、2,3−ジブロムハイドロキノン
、2,5−ジメチルハイドロキノン、ハイドロキノンモ
ノスルホン酸塩などがあるが特にハイドロキノンが好ま
しい。Hydroquinone-based developing agents used in the present invention include hydroquinone, chlorohydroquinone, promhydroquinone, isopropylhydroquinone, methylhydroquinone, 2,3-dichlorohydroquinone, 2,5-dichlorohydroquinone, 2,3-dibromhydroquinone, 2,5 -Dimethylhydroquinone, hydroquinone monosulfonate, etc., and hydroquinone is particularly preferred.
本発明に用いるp−アミノフェノール系現像主薬として
は、N−メチルーp−アミノフェノール、p−アミノフ
ェノール、N一(β−ヒドロキシエチル) −p−アミ
ノフェノール、N一(4−ヒドロキシフエニル)グリシ
ン、2−メチルーp−アミノフェノール、p−ペンジル
アミノフェノール等があるが、なかでもN−メチルーp
−アミノフェノールが好ましい。Examples of the p-aminophenol developing agent used in the present invention include N-methyl-p-aminophenol, p-aminophenol, N-(β-hydroxyethyl)-p-aminophenol, and N-(4-hydroxyphenyl). There are glycine, 2-methyl-p-aminophenol, p-pendylaminophenol, among others, N-methyl-p
-Aminophenol is preferred.
本発明に用いる3−ビラゾリドン系現像主薬とシテはl
−フエニルー3−ビラゾリドン、l−フ工二ルー4.4
−ジメチル−3−ビラゾリドン、1−フエニルー4−メ
チル−4−ヒドロキシメチル−3−ビラゾリドン、1−
フエニル−4,4ージヒドロキシメチル−3−ビラゾリ
ドン、l−フエニルー5−メチル−3−ビラゾリドン、
1−p−アミノフエニル−4.4−ジメチル−3−ビラ
ゾリドン、1−p−トリル−4.4−ジメチルー3−ビ
ラゾリドン、1−p− トリル−4−メチル−4−ヒド
ロキシメチル−3−ビラゾリドン、などがある。The 3-virazolidone developing agent and shite used in the present invention are l
-phenyl-3-virazolidone, l-phenyl-3-virazolidone, l-phenyl-3-virazolidone, 4.4
-dimethyl-3-virazolidone, 1-phenyl-4-methyl-4-hydroxymethyl-3-virazolidone, 1-
Phenyl-4,4-dihydroxymethyl-3-virazolidone, l-phenyl-5-methyl-3-virazolidone,
1-p-aminophenyl-4.4-dimethyl-3-virazolidone, 1-p-tolyl-4.4-dimethyl-3-virazolidone, 1-p-tolyl-4-methyl-4-hydroxymethyl-3-virazolidone, and so on.
ハイドロキノン系現像主薬は通常0.01モル/1〜1
. 5モル/1,好ましくは0.05モル/1〜1.
2モル/1の量で用いられる。Hydroquinone-based developing agents are usually 0.01 mol/1 to 1
.. 5 mol/1, preferably 0.05 mol/1 to 1.
It is used in an amount of 2 mol/1.
これに加えて、p−アミノフェノール系現像主薬または
3−ビラゾリドン系現像主薬は通常0.0005モル/
l〜0.2モル/1、好ましくは0.001モル/l〜
0. 1モル/lの量で用いられる。In addition to this, the p-aminophenol developing agent or 3-virazolidone developing agent is usually 0.0005 mol/
l~0.2 mol/l, preferably 0.001 mol/l~
0. It is used in an amount of 1 mol/l.
本発明の現像液に用いる亜硫酸塩としては亜硫酸ナトリ
ウム、亜硫酸カリウム、亜硫酸リチウム、亜硫酸アンモ
ニウム、重亜硫酸ナトリウム、メタ重亜硫酸カリウム、
などがある。亜硫酸塩は0.3モル/1以上、特に0.
4モル/l以上が好ましい。また、上限は現像液濃
縮肢で2.5モル/′lまでとするのが好ましい。Sulfites used in the developer of the present invention include sodium sulfite, potassium sulfite, lithium sulfite, ammonium sulfite, sodium bisulfite, potassium metabisulfite,
and so on. Sulfite is 0.3 mol/1 or more, especially 0.3 mol/1 or more.
It is preferably 4 mol/l or more. Further, it is preferable that the upper limit is 2.5 mol/'l in the developer concentration section.
本発明の現像処理に用いる現像液のpHは9から13ま
での範囲のものが好ましい。更に好ましくはpH10か
ら12までの範囲である。The pH of the developer used in the development process of the present invention is preferably in the range of 9 to 13. More preferably, the pH range is from 10 to 12.
pHの設定のために用いるアルカリ剤には水酸化ナトリ
ウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム
、第三リン酸ナトリウム、第三リン酸カリウムの如きp
H調節剤を含む。Alkaline agents used to set pH include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, trisodium phosphate, and potassium triphosphate.
Contains H regulator.
特開昭62−186259号(ホウ酸塩)、特開昭6
0−9 3 4 3 3号(例えば、サツカロース、ア
セトオキシム、5−スルホサリチル酸)、リン酸塩、炭
酸塩などの緩衝剤を用いてもよい。JP-A-62-186259 (Borate), JP-A-62-186259 (Borate)
Buffers such as No. 0-9 3 4 3 3 (eg, sutucarose, acetoxime, 5-sulfosalicylic acid), phosphates, carbonates, etc. may be used.
本発明においては現像液は鉄イオンに対するキレート安
定度定数が8以上であるキレート剤を含有することが好
ましい。In the present invention, the developer preferably contains a chelating agent having a chelate stability constant of 8 or more with respect to iron ions.
ここにキレート安定度定数とは、L. G.Stlls
Sn ●A. E. Martell著,H.“Sta
billttyConstants of Metal
−ion Coaiplexes , TheChe
mical Society , London (
1 9 6 4) . S,Chaberek●A.
E. Martell著, ’OrganicS
equestering Agents , Wil
ey (1 9 5 9)。Here, the chelate stability constant is defined as L. G. Stlls
Sn●A. E. by Martell, H. “Sta.
billttyConstants of Metal
-ion Coaiplexes, TheChe
mical Society, London (
1 9 6 4). S, Chaberek●A.
E. by Martell, 'OrganicS
Equestering Agents, Will
ey (1 9 5 9).
等により一般に知られた定数を意味する。etc. means a commonly known constant.
本発明において鉄イオンに対するキレート安定度定数が
8以上であるキレート剤としては、有機カルポン酸キレ
ート剤、有機リン酸キレート剤、無機リン酸キレート剤
、ポリヒドロキシ化合物等が挙げられる。なお、上記鉄
イオンとは、第2鉄イオン(Fe’“)を意味する。In the present invention, examples of the chelating agent having a chelate stability constant of 8 or more for iron ions include organic carboxylic acid chelating agents, organic phosphoric acid chelating agents, inorganic phosphoric acid chelating agents, and polyhydroxy compounds. Note that the above-mentioned iron ion means ferric ion (Fe'").
本発明において第2鉄イオンとのキレート安定度定数が
8以上であるキレート剤の具体的化合物例としては、下
記化合物が挙げられるが、これらに限定されるものでは
ない。即ちエチレンジアミンジオルトヒドロキシフエニ
ル酢酸、トリエチレンテトラミン六酢酸、ジアミノプロ
パン四酢酸、ニトリロ三酢酸、ヒドロキシエチルエチレ
ンジアミン三酢酸、ジヒドロキシエチルグリシン、エチ
レンジアミンニ酢酸、エチレンジアミンニプロピオン酸
、イミノニ酢酸、ジエチレントリアミン五酢酸、ヒドロ
キシエチルイミノニ酢酸、l, 3−ジアミノ−2−
プロバノール四酢酸、トランスシクロヘキサンジアミン
四酢酸、エチレンジアミン四酢酸、グリコールエーテル
ジアミン四酢酸、エチレンジアミン−N,N,N’ ,
N’テトラキスメチレンホスホン酸、ニトリローN.N
.N−}リメチレンホスホン酸、l−ヒドロキシエチリ
デン−1. 1−ジホスホン酸、1,1−ジホスホノ
エタン−2−カルボン酸、2−ホスホノブタンー1,2
.4−1リカルポン酸、1−ヒドロキシ−1−ホスホノ
プロパン−1. 2,’3−トリカルボン酸、カテコ
ールー3,5−ジスルホン酸、ビロリン酸ナトリウム、
テトラポリリン酸ナトリウム、ヘキサメタリン酸ナトリ
ウムが挙げられる。In the present invention, specific examples of compounds of chelating agents having a chelate stability constant of 8 or more with ferric ions include the following compounds, but are not limited thereto. Namely, ethylenediamine diorthohydroxyphenylacetic acid, triethylenetetraminehexaacetic acid, diaminopropanetetraacetic acid, nitrilotriacetic acid, hydroxyethylethylenediaminetriacetic acid, dihydroxyethylglycine, ethylenediaminediacetic acid, ethylenediaminenipropionic acid, iminodiacetic acid, diethylenetriaminepentaacetic acid, Hydroxyethyliminodiacetic acid, l,3-diamino-2-
Probanoltetraacetic acid, transcyclohexanediaminetetraacetic acid, ethylenediaminetetraacetic acid, glycol etherdiaminetetraacetic acid, ethylenediamine-N,N,N',
N'tetrakis methylene phosphonic acid, nitrilo N. N
.. N-}rimethylenephosphonic acid, l-hydroxyethylidene-1. 1-diphosphonic acid, 1,1-diphosphonoethane-2-carboxylic acid, 2-phosphonobutane-1,2
.. 4-1 ricarponic acid, 1-hydroxy-1-phosphonopropane-1. 2,'3-tricarboxylic acid, catechol-3,5-disulfonic acid, sodium birophosphate,
Examples include sodium tetrapolyphosphate and sodium hexametaphosphate.
また上記現像液にはジアルデヒド系硬膜剤またはその重
亜硫酸塩付加物が用いられるが、その具体例を挙げれば
グルタールアルデヒド、又はこの重亜硫酸塩付加物など
がある。Further, a dialdehyde hardening agent or its bisulfite adduct is used in the developer, and specific examples thereof include glutaraldehyde and its bisulfite adduct.
上記成分以外に用いられる添加剤としては、臭化ナトリ
ウム、臭化カリウム、沃化カリウムの如き現像抑制剤:
エチレングリコール、ジエチレングリコール、トリエチ
レングリコール、ジメチルホルムアミド、メチルセロソ
ルブ、ヘキシレングリコール、エタノール、メタノール
の如き有機溶剤;l−フエニル−5−メルカプトテトラ
ゾール、2−メルカブトベンツイミダゾールー5−スル
ホン酸ナトリウム塩等のメルカプト系化合物、5一二ト
ロインダゾール等のインダゾール系化合物、5−メチル
ベンゾトリアゾール等のペンゾトリアゾール系化合物な
どのカブリ防止剤を含んでもよく、Research
Disclosure第176巻、No. l 7 6
43、第XXI項(12月号、l978年)に記載され
た現像促進剤や更に必要に応じて色調剤、界面活性剤、
消泡剤、硬水軟化剤、特開昭56−106244号記載
のアミノ化合物などを含んでもよい。Additives used in addition to the above components include development inhibitors such as sodium bromide, potassium bromide, and potassium iodide:
Organic solvents such as ethylene glycol, diethylene glycol, triethylene glycol, dimethylformamide, methyl cellosolve, hexylene glycol, ethanol, methanol; l-phenyl-5-mercaptotetrazole, 2-mercabutobenzimidazole-5-sulfonic acid sodium salt, etc. It may contain antifoggants such as mercapto compounds, indazole compounds such as 5-ditroindazole, and penzotriazole compounds such as 5-methylbenzotriazole.
Disclosure Volume 176, No. l 7 6
43, Section XXI (December issue, 1978), as well as color toners, surfactants,
It may also contain an antifoaming agent, a water softener, an amino compound described in JP-A-56-106244, and the like.
本発明の現像処理においては現像液に本発明の銀汚れ防
止剤以外の銀汚れ防止剤、例えば特開昭56−2434
7号に記載の化合物を用いることができる。In the development process of the present invention, a silver stain preventive agent other than the silver stain preventive agent of the present invention is added to the developing solution, such as JP-A-56-2434.
Compounds described in No. 7 can be used.
本発明の現像液には、ヨーロッパ特許公開136582
号、英国特許第958678号、米国特許簿32327
61号、特開昭56−106244号に記載のアルカノ
ールアミンなどのアミノ化合物を現像促進、コントラス
ト上昇その他の目的で用いることができる。The developer of the present invention includes European Patent Publication No. 136582
No. 958,678, U.S. Patent Register No. 32327
Amino compounds such as alkanolamines described in No. 61 and JP-A-56-106244 can be used for the purpose of accelerating development, increasing contrast, and other purposes.
この他L.F.Aメイソン著「フォトグラフィック●プ
ロセシング●ケミストリー」、フォーカル●プレス刊(
1966年)の226〜229頁、米国特許第2,19
3,015号、同2,592,364号、特開昭48−
64933号などに記載のものを用いてもよい。Besides this, L. F. “Photographic Processing Chemistry” by A. Mason, published by Focal Press (
1966), pp. 226-229, U.S. Patent No. 2,19
No. 3,015, No. 2,592,364, Japanese Unexamined Patent Publication No. 1973-
64933 and the like may be used.
定着液はチオ硫酸塩を含む水溶液であり、pH3.8以
上、好ましくは4.2〜7.0を有する。The fixer is an aqueous solution containing thiosulfate and has a pH of 3.8 or higher, preferably 4.2 to 7.0.
定着剤としてはチオ硫酸ナトリウム、チオ硫酸アンモニ
ウムなどがあるが、定着速度の点からチオ硫酸アンモニ
ウムが特に好ましい。定着剤の使用量は適宜変えること
ができ、一般には約0. 1〜約6モル/lである。Examples of the fixing agent include sodium thiosulfate and ammonium thiosulfate, and ammonium thiosulfate is particularly preferred from the viewpoint of fixing speed. The amount of fixing agent used can be changed as appropriate, and is generally about 0. 1 to about 6 mol/l.
定着液には硬膜剤として作用する水溶性アルミニウム塩
を含んでもよく、それらには、例えば塩化アルミニウム
、硫酸アルミニウム、カリ明ばんなどがある。The fixer may also contain water-soluble aluminum salts that act as hardeners, such as aluminum chloride, aluminum sulfate, potassium alum, and the like.
定着液には、酒石酸、クエン酸、グルコン酸あるいはそ
れらの誘導体を単独で、あるいは2種以上、併用するこ
とができる。これらの化合物は定着液llにつき0.0
05モル以上含むものが有効で、特に0.01モル/i
〜0.03モル/1が特に有効である。In the fixing solution, tartaric acid, citric acid, gluconic acid, or their derivatives can be used alone or in combination of two or more. These compounds contain 0.0 per liter of fixer.
Those containing 0.05 mol or more are effective, especially 0.01 mol/i
~0.03 mol/1 is particularly effective.
定着液には所望により保恒剤(例えば、亜硫酸塩、重亜
硫酸塩)、pH緩衝剤(例えば、酢酸、硼酸)、pH調
整剤(例えば、硫酸)、硬水軟化能のあるキレート剤や
特開昭6 2−7 8 5 5 1号記載の化合物を含
むことができる。The fixing solution may optionally contain preservatives (e.g., sulfites, bisulfites), pH buffers (e.g., acetic acid, boric acid), pH adjusters (e.g., sulfuric acid), chelating agents with water softening ability, and The compound described in No. 62-78551 may be included.
本発明において「現像工程時間」又は「現像時間」とは
、処理する感光材料の先端が自現機の現像タンク液に浸
漬してから次の定着液に浸漬するまでの時間、「定着時
間」とは定着タンク液に浸漬してから次の水洗タンク液
(安定液)に浸漬するまでの時間「水洗時間」とは、水
洗タンク液に漫潰している時間をいう。In the present invention, "developing process time" or "developing time" refers to the time from when the leading edge of the photosensitive material to be processed is immersed in the developing tank solution of the automatic processing machine until it is immersed in the next fixing solution. The period from immersion in the fixing tank solution to the next immersion in the washing tank solution (stabilizing solution) "Washing time" refers to the time spent soaking in the washing tank solution.
また「乾燥時間」とは、通常自現機には、35℃〜10
0℃好ましくは40℃〜80℃の熱風が吹きつけられる
乾燥ゾーンが設置されており、その乾燥ゾーンに入って
いる時間をいう。In addition, "drying time" is usually 35℃ to 10℃ for automatic processors.
A drying zone is installed in which hot air of 0°C, preferably 40°C to 80°C is blown, and refers to the time spent in the drying zone.
本発明の現像処理では、現像時間が10秒〜8分好まし
くは30秒〜5分、その現像温度は17℃〜40℃が好
ましく、20℃から35℃がより好ましい。In the development process of the present invention, the development time is 10 seconds to 8 minutes, preferably 30 seconds to 5 minutes, and the development temperature is preferably 17°C to 40°C, more preferably 20°C to 35°C.
定着温度及び時間は約17℃〜40℃で10秒〜5分が
好ましく、18℃〜30℃、30秒〜3分がより好まし
い。The fixing temperature and time are preferably about 17° C. to 40° C. and 10 seconds to 5 minutes, more preferably 18° C. to 30° C. and 30 seconds to 3 minutes.
水洗または安定溶温度及び時間は00〜50℃で10’
〜8分が好ましく、15℃〜30℃、30秒〜3分がよ
り好ましい。Water washing or stable dissolution temperature and time are 00-50℃ for 10'
-8 minutes is preferable, and 15 degreeC - 30 degreeC, 30 seconds - 3 minutes are more preferable.
本発明の方法によれば、現像、定着及び水洗(又は安定
化)された写真材料は水洗水をしぼり切る、すなわちス
クイズローラーを経て乾燥される。乾燥は約30℃〜約
lOO℃で行なわれ、乾燥時間は周囲の状態によって適
宜変えられるが、通常は約10秒〜3分でよく、特によ
り好ましくは40℃〜80℃で約30秒〜3分である。According to the method of the invention, the developed, fixed and washed (or stabilized) photographic material is dried by squeezing out the washing water, ie passing through a squeeze roller. Drying is carried out at about 30°C to about 100°C, and the drying time can be changed appropriately depending on the surrounding conditions, but it is usually about 10 seconds to 3 minutes, particularly preferably about 30 seconds to 80°C. It is 3 minutes.
本発明に用いられる感光性ハロゲン化銀乳剤のハロゲン
化銀としては塩臭化銀、臭化銀,、沃臭化銀、塩沃臭化
銀を用いることができるが好ましくは沃臭化銀が用いら
れる。ここで沃化銀の含量は好ましくは30モル%以下
、特にlOモル%以下の範囲であることが好ましい。沃
臭化銀粒子中の沃素の分布は均一でもよく又、内部と表
面とで異なっていてもよい。As the silver halide in the photosensitive silver halide emulsion used in the present invention, silver chlorobromide, silver bromide, silver iodobromide, and silver chloroiodobromide can be used, but silver iodobromide is preferable. used. The content of silver iodide is preferably 30 mol% or less, particularly 1O mol% or less. The distribution of iodine in the silver iodobromide grains may be uniform or may be different between the inside and the surface.
ハロゲン化銀粒子の粒子サイズは、その粒子と同体積と
なる球の径を粒子サイズ径とすると、4μm以下である
ことが好ましい。特に、2.0μm〜0.1μmが好ま
しい。粒子サイズ分布は狭くても広くてもいずれでもよ
い。特に、乳剤中の全粒子のうち50%以上100%以
下が0. 5μ以下〜0.1μmのサイズの粒子より
成っている場合が非常に好ましい。The grain size of the silver halide grains is preferably 4 μm or less, where the grain size is defined as the diameter of a sphere having the same volume as the grain. In particular, 2.0 μm to 0.1 μm is preferable. The particle size distribution may be narrow or wide. In particular, 50% or more and 100% or less of all the grains in the emulsion are 0. It is highly preferred that the particles consist of particles with a size of less than 5 .mu.m to 0.1 .mu.m.
乳剤中のハロゲン化銀粒子は立方体、8面体、14面体
、菱12面体のような規則的(regular )な結
晶形を有するものでもよく、また球状、板状、じゃがい
も状などのような変則的( irreguiar)な結
晶形を有するものでも或いはこれらの結晶形の複合形を
有するものでもよい。種々の結晶形の粒子の混合から成
ってもよい。また粒子径が粒子厚みの5倍以上の平板粒
子は、本発明に対し好ましく用いられる(詳しくは、R
ESEARCH DISCLOSURE225巻 It
em 22534 P.20 〜P.58、1月号
、1983年、及び特開昭58−127921号、同5
8−113926号公報に記載されている)。The silver halide grains in the emulsion may have regular crystal shapes such as cubic, octahedral, tetradecahedral, and rhombic dodecahedral, or may have irregular crystal shapes such as spherical, plate-like, potato-like, etc. It may have an irregular crystal form or a composite form of these crystal forms. It may also consist of a mixture of particles of various crystalline forms. Further, tabular grains having a particle diameter of 5 times or more the grain thickness are preferably used for the present invention (in detail, R
ESEARCH DISCLOSURE Volume 225 It
em 22534 P. 20 ~P. 58, January issue, 1983, and JP-A-58-127921, same 5
8-113926).
本発明において、感光性ハロゲン化銀乳剤は、2種類以
上のハロゲン化銀乳剤を混合して用いてもよい。混合す
る乳剤の粒子サイズ・ハロゲン組或・感度・等が異なっ
ていてもよい。感光性乳剤に実質的に非感光性の乳剤(
表面あるいは内部がかぶっていてもよいし、いなくても
よい)を混合して用いてもよいし、別の層に分けてもよ
い(詳しくは米国特許2,996,382号、同3,3
97,987号などに記載されている)。例えば、球状
もしくはじゃがいも状の感光性乳剤と粒子径が粒子厚み
の5倍以上の平板粒子からなる感光性ハロゲン化銀乳剤
と同一層もしくは特開昭58−127921号公報に記
載の如く異なった層に用いてもよい。異なった層に用い
る時、平板粒子からなる感光性ハロゲン化銀乳剤は支持
体に近い側にあってもよいし、逆に遠い側にあってもよ
い。In the present invention, the photosensitive silver halide emulsion may be a mixture of two or more types of silver halide emulsions. The emulsions to be mixed may differ in grain size, halogen composition, sensitivity, etc. Substantially non-light sensitive emulsion (
(The surface or interior may or may not be covered) may be mixed and used, or may be separated into separate layers (for details, see U.S. Pat. No. 2,996,382, No. 3, 3
No. 97,987, etc.). For example, a spherical or potato-shaped photosensitive emulsion and a photosensitive silver halide emulsion consisting of tabular grains with a grain size of 5 times or more than the grain thickness may be placed in the same layer or in a different layer as described in JP-A-58-127921. May be used for. When used in different layers, the photosensitive silver halide emulsion consisting of tabular grains may be located on the side closer to the support or, conversely, on the side farther away.
本発明に用いられる写真乳剤は、P. Glafkid
es著Chimie et Phisique Pho
tographique (PaulNon tel社
刊、1967年) 、G, F. Duffin著Ph
otographic Emulslon Che
mistry (The FocalPress
刊、1966年) 、V. L. Zeltk+san
etat 著 ?Iakia( and C
oting PhotographicEmuls
ion (The Focal Press刊、19
64年)、特開昭58−127921号及び同58−1
13926号公報などに記載された方法を用いて調整す
ることができる.すなわち、酸性法、中性法、アンモニ
ア法等のいずれでもよく、また可溶性銀塩と可溶性ハロ
ゲン塩を反応させる形式としては片側混合法、同時混合
法、それらの組合せなどのいずれを用いてもよい.
ハロゲン化線粒子を銀イオン過剰の下において形威させ
る方法(いわゆる逆混合法)を用いることもできる.同
時混合法の一つの形式としてハロゲン化線の生戒される
液相中のpAgを一定に保つ方法、すなわちいわゆるコ
ントロールド・ダブルジェット法を用いることもできる
.この方法によると、結晶形が規則的で粒子サイズが均
一に近いハロゲン化銀粒子よりなるハロゲン化銀乳剤が
えられる.
ハロゲン化銀粒子の結晶構造は内部まで一様なものであ
っても、また内部と外部が異質の層状構造をしたものや
、英国特許635.841号、米国特許3,622.3
18号に記載されているような、いわゆるコンバージョ
ン型のものであってもよい.又エピタキシャル接合によ
って組戒の異なるハロゲン化恨が接合されていてもよく
、また例えばロダン娘、酸化銀以外の化合物と接合され
ていてもよい.又表面H&型であっても内部潜像型であ
ってもどちらでもよい.ハロゲン化銀製造時のハロゲン
化銀粒子形戒または物理熟戒の過程において、カドミウ
ム塩、亜鉛塩、鉛塩、タリウム塩、イリジウム塩または
その錯塩、ロジウム塩またはその錯塩、鉄塩または鉄錯
塩などを共存させてもよい.
また、粒子形戒時にはアンモニア、チオエーテル化合物
、チアゾリジン−2−チオン、四置換チオ尿素、ロダン
カリ、ロダンアンモン、アミン化合物の如きいわゆるハ
ロゲン化SFAm剤を存在せしめ粒子戒長をコントロー
ルしてもよい.本発明に用いられるハロゲン化恨乳剤は
化学増感されていても、されていなくてもよい.化学増
感の方法としては硫黄増感法、還元増感法、金増感法な
どの知られている方法を用いることができ、単独または
組合せで用いられる.
貴金属増感法のうち金増感法はその代表的なもので金化
合物、主として金錯塩を用いる.金以外の貴金属、たと
えば白金、パラジウム、イリジウム等の錯塩を含有して
も差支えない.その具体例は米国特許2,448.06
0号、英国特許618.061号などに記載されている
.
硫黄場感剤としては、ゼラチン中に含まれる硫黄化合物
のほか、種々の硫黄化合物、たとえばチオM酸塩、チオ
尿素類、チアゾール類、ローダニン頻等を用いることが
できる.
還元増感剤としては第一すず塩、アミン類、ホルムアミ
ジンスルフィン酸、シラン化合物などを用いることがで
きる.
本発明に用いられる写真乳剤には、感光材料の製造工程
、保存中あるいは写真処理中のカブリを防止し、あるい
は写真性能を安定化させる目的で、種々の化合物を含有
させることができる.すなわちアゾール類{例えばペン
ゾチアゾリウム塩、ニトロイミダゾール類、ニトロベン
ズイくダゾール類、クロロベンズイ亀ダゾール類、プロ
モベンズイ竃ダゾール類、ニトロインダゾール類、ペン
ゾトリアゾール類、アξノトリアゾール類なと} :メ
ルカブト化合物類【例えばメルカブトトチアゾール類、
メルカブトベンゾチアゾール類、メルカブトベンズイミ
ダゾール類、メルカブトチアジアゾール頬、メルカブト
テトラゾールl(特に1−フエニル−5−メルカプトテ
トラゾール)、メルカブトピリミジン類、メルカブトト
リアジン類など} ;例えばオキサドリンチオンのよう
なチオケト化合物;アザインデン類(例えばトリアザイ
ンデン類、テトラアザインデンB(特に4−ヒドロキシ
置換(1.3,3a.7)テトラアザインデン類)、ペ
ンタアザインデン頬など} ;ベンゼンチオスルホン酸
、ベンゼンスルフイン酸、ペンゼンスルホン酸アミド等
のようなカブリ防止剤または安定剤として知られた、多
くの化合物を加えることができる.
具体的にはRESERCH DISCLOSURE
Iteml 7 6 43■項(1 9 7 8年l2
月号P.24〜P.25)に記載もしくは引用された文
献に記載されている.特に特開昭60−76743号、
同6 0−8 7322号公報に記載のニトロン及びそ
のmK体、特開昭60−80839号公報に記載のメル
カブト化合物、特開昭57−164735号公報に記載
のへテロ環化合物、及びヘテロ環化合物と銀の錯塩(例
えばl−フエニル−5−メルカプトテトラゾール1!)
などを好ましく用いることができる.本発明の感光性ハ
ロゲン化銀乳剤は、増感色素によって比較的長波長の青
色光、緑色光、赤色光または赤外光に分光増感されても
よい.増感色素として、シアニン色素、メロシアニン色
素、コンプレックスシアニン色素、コンプレックスメロ
シアニン色素、ホロホーラーシアニン色素、スチリル色
素、ヘミシアニン色素、オキソノール色素、ヘミオキソ
ノール色素等を用いることができる.本発明に使用され
る有用な増感色素は例えばRESERCH DISCL
OSURE Ite+g 1 7 6 4 3 [V
− A項(1 9 7 8年12月P.23)、同r
ts+sl 8 4 31X項(1 9 7 9年8月
P.437)に記載もしくは引用された文献に記載され
ている.ここで増感色素は写真乳剤の製造工程のいかな
る工程に存在させて用いることもできるし、製造後塗布
直前までのいかなる段階に存在させることもできる.前
者の例としては、ハロゲン化銀粒子形戒工程、物理P戒
工程、化学熟戒工程などである.
本発明の感光材料の写真乳剤層または他の親水性コロイ
ド層には塗布助剤、帯電防止、スベリ性改良、乳化分散
、接着防止及び写真特性改良(例えば、現像促進、硬調
化、増感〉等種々の目的で、種々の界面活性剤を含んで
もよい.
例えばサボニン(ステロイド系)、糖のアルキルエステ
ル類などの非イオン性界面活性剤;アルキルスルフオン
酸塩、アルキルベンゼンスルフオン酸塩、アルキルナフ
タレンスルフオン酸塩、アルキル硫酸エステル類、N−
アシルーN−アルキルクウリン類、スルホコハク酸エス
テル類、スルホアルキルボリオキシエチレンアルキルフ
ェニルエーテル類などのアニオン界面活性剤;アルキル
ベタイン類、アルキルスルホベタイン類などの両性界面
活性剤;脂肪族あるいは芳香族第4級アンモニウム塩類
、ビリジニウム塩類、イミダゾリウム塩類などのカチオ
ン界面活性剤を用いることができる.この内、サボニン
、ドデシルベンゼンスルホン9Na塩、ジ・2・エチル
ヘキシルα−スルホコハク酸Na塩、p−オクチルフエ
ノキシェトキシエトキシエタンスルホン酸Na塩、ドデ
シルiaNa塩、}リインプロピルナフタレンスルホ7
JNa塩、N−メチルーオレオイルクウリンNa塩、等
のア二オン、ドデシルトリメチルアンモニウムクロライ
ド、N−オレオイルーN′N’,N’−}リメチルアン
モニオジアミノプロパンブロマイド、ドデシルビリジウ
ムクロライドなどのカチオン、N−ドデシルーN.N−
ジメチルカルボキシベタイン、N−オレオイルーN,
N−ジメチルスルホブチルベタインなどのベタインを特
に好ましく用いることができる.
帯電防止剤としては、パーフルオロオクタンスルホン酸
KI、N−プロビルーN−パーフルオロオクタンスルホ
ニルグリシンNa塩、N−プロビルーN−バーフルオロ
オクタンスルホニルアξノエチルオキシボリ(n=3)
オキシエチレンブタンスルホン酸Na塩、N−パーフル
オロオクタンスルホニルーN’,N’,N’ −}リメ
チルアンモニオジア竃ノブロパンクロライド、N−バー
フルオロデカノイルアξノブロビルN’ ,N’ジメチ
ルーN′一カルボキシベタインの如き含フッ素界面活性
剤、アルカリ金属の硝酸塩、導電性酸化スズ、酸化亜鉛
、五酸化バナジウム又はこれらにアンチモン等をドーブ
した複合酸化物を好ましく用いることができる.
本発明に於ではマット剤としてポリメチルメタクリレー
トのホモポノマー又はメチルメタクリレートとメタクリ
ル酸とのポリマー、デンプンなどの有機化合物、シリカ
、二酸化チタン、硫酸、ストロンチウム、バリウム等の
無機化合物の微粒子を用いることができる.粒子サイズ
としては1.0〜10μm、特に2〜5μmであること
が好ましい.
本発明の写真感光材料の表面層には滑り剤シリコーン化
合物、特公昭56−23139号公報に記載のコロイダ
ルシリカの他に、パラフィンワックス、高級脂肪酸エス
テル、デンプン誘導体等を用いることができる.
本発明の写真感光材料の親水性コロイド層には、トリメ
チロールプロパン、ペンタンジオール、ブタンジオール
、エチレングリコール、グリセリン等のポリオール類を
可塑剤として用いることができる.さらに、本発明の写
真感光材料の親水性コロイド層には、耐圧力性改良の目
的でポリマーラテックス.を含有せしめることが好まし
い.ポリマーとしてはアクリル酸のアルキルエステルの
ホモボリマー又はアクリル酸とのコボリマー、スチレン
ーブタジエンコポリマー、活性メチレン基を有するモノ
マーからなるボリマー又はコポリマーを好ましく用いる
ことができる.
本発明の写真乳剤層および/又は他の親木性コロイド層
には特願昭62−335570に記載された複合ラテッ
クスを含有してもよい.本発明の写真乳剤及び非感光性
の親水性コロイドには無機または有機の硬膜剤を含有し
てよい.例えばクロム塩(クロム明ばん)、アルデヒド
類(ホルムアルデヒド、グリタールアルデヒドなど)N
−メチロール化合物(ジメチロール尿素、など)ジオキ
サン誘導体く2.3−ジヒドロキシジオキサンなど)、
活性ビニル化合物(1.3.5−}リアクリロイルーへ
キサヒド口−$一トリアジン、ビス(ビニルスルホニル
)メチルエーテル、N.N′−メチレンビス−(β−(
ビニルスルホニル)ブロピオンアミド〕など)、活性ハ
ロゲン化合物(2,4−ジクロル−6−ヒドロキシーs
−}リアジンなど)、ムコハロゲン酸類(ムコクロル酸
、など)イソオキサゾール類、ジアルデヒドでん粉、2
−クロルー6−ヒドロキシトリアジニル化ゼラチンなど
を単独または組合せて用いることができる。なかでも、
特開昭5 3−4 1 2 2 0、同53−5725
7、同59−162546、同60−80846に記載
の活性ビニル化合物および米国特許3,325,287
号に記載の活性ハロゲン化物が好ましい。The photographic emulsion used in the present invention is P. Glafkid
Chimie et Phisique Pho by es
tographique (Paul Nontel, 1967), G.F. Written by Duffin Ph.
otographic Emulslon Che
mistry (The Focal Press
(Published, 1966), V. L. Zeltk+san
Written by etat? Iakia (and C
oting Photographic Emuls
ion (The Focal Press, 19
1964), JP-A-58-127921 and JP-A No. 58-1
It can be adjusted using the method described in Japanese Patent No. 13926 and the like. That is, any of the acidic method, neutral method, ammonia method, etc. may be used, and the method for reacting the soluble silver salt and soluble halogen salt may be any one-sided mixing method, simultaneous mixing method, or a combination thereof. .. It is also possible to use a method in which halogenated linear particles are formed in an excess of silver ions (the so-called back-mixing method). As one type of simultaneous mixing method, a method in which the pAg in the liquid phase is kept constant under the control of halogenated radiation, that is, a so-called controlled double jet method can also be used. According to this method, a silver halide emulsion consisting of silver halide grains with a regular crystal shape and a nearly uniform grain size can be obtained. Even if the crystal structure of silver halide grains is uniform inside, there are also those with a layered structure with different inside and outside, British Patent No. 635.841, US Patent No. 3,622.3
It may also be of the so-called conversion type as described in No. 18. Further, halogenated resins having different combinations may be joined by epitaxial joining, and compounds other than Rodin's daughter and silver oxide may be joined, for example. Also, either surface H& type or internal latent image type is acceptable. Cadmium salts, zinc salts, lead salts, thallium salts, iridium salts or their complex salts, rhodium salts or their complex salts, iron salts or iron complex salts, etc. may coexist. Further, when controlling particle size, so-called halogenated SFAm agents such as ammonia, thioether compounds, thiazolidine-2-thione, tetrasubstituted thiourea, rhodanpotash, rhodanammonium, and amine compounds may be present to control particle size. The halogenated emulsion used in the present invention may or may not be chemically sensitized. Known methods such as sulfur sensitization, reduction sensitization, and gold sensitization can be used as methods for chemical sensitization, and these may be used alone or in combination. Among the noble metal sensitization methods, the gold sensitization method is a typical method and uses gold compounds, mainly gold complex salts. There is no problem in containing complex salts of noble metals other than gold, such as platinum, palladium, and iridium. A specific example is U.S. Patent 2,448.06
No. 0, British Patent No. 618.061, etc. As the sulfur field sensitizer, in addition to the sulfur compounds contained in gelatin, various sulfur compounds such as thioM salts, thioureas, thiazoles, and rhodanine compounds can be used. As the reduction sensitizer, stannous salts, amines, formamidine sulfinic acid, silane compounds, etc. can be used. The photographic emulsion used in the present invention may contain various compounds for the purpose of preventing fog during the manufacturing process, storage, or photographic processing of the light-sensitive material, or for stabilizing photographic performance. That is, azoles {e.g., penzothiazolium salts, nitroimidazoles, nitrobenzydazoles, chlorobenzicamedazoles, promobenzidazoles, nitroindazoles, penzotriazoles, aξnotriazoles}: merkabut Compounds [e.g. merkabutothiazoles,
Mercabutobenzothiazoles, merkabutobenzimidazoles, merkabutothiadiazole, merkabutotetrazole (particularly 1-phenyl-5-mercaptotetrazole), merkabutopyrimidines, merkabuttriazines, etc.; For example, oxadrinthione Thioketo compounds such as; azaindenes (e.g. triazaindenes, tetraazaindene B (especially 4-hydroxy substituted (1.3,3a.7) tetraazaindene), pentaazaindene, etc.); benzenethiosulfonic acid A number of compounds known as antifoggants or stabilizers can be added, such as benzenesulfuric acid, benzenesulfonic acid, penzenesulfonic acid amide, etc. Specifically, RESERCH DISCLOSURE
Item 7 6 43 ■ (1978 12
Monthly issue P. 24~P. 25) or in the literature cited. In particular, JP-A No. 60-76743,
Nitrones and their mK derivatives described in JP-A No. 60-87322, mercabuto compounds described in JP-A-60-80839, heterocyclic compounds and heterocyclic compounds described in JP-A-57-164735. Complex salts of compounds and silver (e.g. l-phenyl-5-mercaptotetrazole 1!)
etc. can be preferably used. The light-sensitive silver halide emulsion of the present invention may be spectrally sensitized to relatively long wavelength blue light, green light, red light or infrared light using a sensitizing dye. As the sensitizing dye, cyanine dyes, merocyanine dyes, complex cyanine dyes, complex merocyanine dyes, holophoric cyanine dyes, styryl dyes, hemicyanine dyes, oxonol dyes, hemioxonol dyes, etc. can be used. Useful sensitizing dyes for use in the present invention include, for example, RESERCH DISCL
OSURE Ite+g 1 7 6 4 3 [V
- Section A (December 1978, P.23), same r.
ts+sl 8 4 31X (August 1979, P. 437) or in the literature cited. The sensitizing dye can be used at any stage of the photographic emulsion manufacturing process, or at any stage after manufacturing until immediately before coating. Examples of the former include the silver halide particle formation process, the physical P process, and the chemical process. The photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material of the present invention contains a coating aid, antistatic agent, slippery improvement, emulsification dispersion, adhesion prevention, and improvement of photographic properties (e.g., development acceleration, high contrast, sensitization). Various surfactants may be included for various purposes such as nonionic surfactants such as sabonin (steroid type) and alkyl esters of sugars; alkyl sulfonates, alkylbenzene sulfonates, alkyl Naphthalene sulfonate, alkyl sulfate, N-
Anionic surfactants such as acyl-N-alkylcurins, sulfosuccinates, and sulfoalkylborioxyethylene alkylphenyl ethers; amphoteric surfactants such as alkylbetaines and alkylsulfobetaines; aliphatic or aromatic surfactants; Cationic surfactants such as quaternary ammonium salts, viridinium salts, and imidazolium salts can be used. Among these, sabonin, dodecylbenzenesulfone 9Na salt, di-2-ethylhexyl α-sulfosuccinic acid Na salt, p-octylphenoxethoxyethoxyethanesulfonic acid Na salt, dodecyl iaNa salt, }liinpropylnaphthalene sulfonate 7
Anions such as JNa salt, N-methyl-oleoyl curine Na salt, dodecyltrimethylammonium chloride, N-oleoyl-N'N',N'-}limethylammoniodiaminopropane bromide, dodecylpyridium chloride, etc. cation, N-dodecyl-N. N-
Dimethylcarboxybetaine, N-oleoyl-N,
Betaines such as N-dimethylsulfobutylbetaine can be particularly preferably used. As the antistatic agent, perfluorooctanesulfonic acid KI, N-probyl-N-perfluorooctanesulfonylglycine Na salt, N-probyl-N-berfluorooctanesulfonyl aξnoethyloxyboly(n=3)
Oxyethylenebutanesulfonic acid Na salt, N-perfluorooctanesulfonyl-N',N',N'-}limethylammoniodiatonopropane chloride, N-perfluorodecanoyla ξnobrovir N',N' Preferably used are fluorine-containing surfactants such as dimethyl-N'-carboxybetaine, alkali metal nitrates, conductive tin oxide, zinc oxide, vanadium pentoxide, or composite oxides doped with antimony or the like. In the present invention, as matting agents, homoponomers of polymethyl methacrylate or polymers of methyl methacrylate and methacrylic acid, organic compounds such as starch, and fine particles of inorganic compounds such as silica, titanium dioxide, sulfuric acid, strontium, and barium can be used. .. The particle size is preferably 1.0 to 10 μm, particularly 2 to 5 μm. In addition to the slip agent silicone compound and colloidal silica described in Japanese Patent Publication No. 56-23139, paraffin wax, higher fatty acid esters, starch derivatives, etc. can be used in the surface layer of the photographic material of the present invention. Polyols such as trimethylolpropane, pentanediol, butanediol, ethylene glycol, and glycerin can be used as plasticizers in the hydrophilic colloid layer of the photographic material of the present invention. Furthermore, the hydrophilic colloid layer of the photographic material of the present invention contains polymer latex for the purpose of improving pressure resistance. It is preferable to contain. As the polymer, a homopolymer or a copolymer of an alkyl ester of acrylic acid or a copolymer with acrylic acid, a styrene-butadiene copolymer, and a polymer or copolymer consisting of a monomer having an active methylene group can be preferably used. The photographic emulsion layer and/or other wood-philic colloid layer of the present invention may contain the composite latex described in Japanese Patent Application No. 62-335570. The photographic emulsions and non-photosensitive hydrophilic colloids of the present invention may contain inorganic or organic hardeners. For example, chromium salts (chromium alum), aldehydes (formaldehyde, glitaraldehyde, etc.)N
- methylol compounds (dimethylol urea, etc.) dioxane derivatives (2,3-dihydroxydioxane, etc.),
Active vinyl compound (1.3.5-}reacryloyl hexahydride-$1 triazine, bis(vinylsulfonyl) methyl ether, N.N'-methylenebis-(β-(
vinylsulfonyl) propionamide], active halogen compounds (2,4-dichloro-6-hydroxy-s
-} riazine, etc.), mucohalogen acids (mucochloric acid, etc.), isoxazoles, dialdehyde starch, 2
-Chloro-6-hydroxytriazinylated gelatin and the like can be used alone or in combination. Among them,
Unexamined Japanese Patent Publication No. 53-53-5725
7, active vinyl compounds described in 59-162546 and 60-80846 and U.S. Pat. No. 3,325,287
The active halides described in this issue are preferred.
これらの硬膜剤により親水性コロイド層の硬膜は水中で
の膨潤率が280%以下になるように硬膜されているの
が好ましい。It is preferable that the hardening layer of the hydrophilic colloid layer is hardened using these hardening agents so that the swelling ratio in water is 280% or less.
本発明の写真感光材料はハロゲン化銀乳剤層が2層以上
でもよく、この場合、2層以上のハロゲン化銀乳剤層の
感度、階調等は異っていてもよい。The photographic light-sensitive material of the present invention may have two or more silver halide emulsion layers, and in this case, the two or more silver halide emulsion layers may have different sensitivities, gradations, etc.
又、支持体の両側に1層又は2層以上のハロゲン化銀乳
剤層や非感光性層を有していてもよい。Further, one or more silver halide emulsion layers or non-photosensitive layers may be provided on both sides of the support.
本発明のハロゲン化銀乳剤層の塗布量は全乳剤の塗布銀
量として両面あわせて10.0g/rrr以上である。The coating amount of the silver halide emulsion layer of the present invention is 10.0 g/rrr or more in terms of the coating amount of silver on both sides of the entire emulsion.
これは、ハロゲン化銀乳剤層は片面に10.0g /
tri以上塗布されており、もう一方の面はハロゲン化
銀粒子を含まない層を塗布されている場合でもよいし、
また、ハロゲン化銀乳剤が5.0g/一以上づつ両面に
塗布されている場合でもよい。This means that the silver halide emulsion layer has a weight of 10.0 g per side.
tri or more, and the other side may be coated with a layer containing no silver halide particles,
Alternatively, 5.0 g or more of silver halide emulsion may be coated on each side.
一般感材用の支持体としては三酢酸セルロースフイルム
が好ましく、アンチハレーション用に着色されていても
着色されていなくてもどちらでもよい。Cellulose triacetate film is preferred as a support for general photosensitive materials, and may be colored or uncolored for antihalation purposes.
X線撮影感材用支持体としてはポリエチレンテレフタレ
ートフイルムまたは三酢酸セルロースフイルムが好まし
く、特に青色に着色されていることが好ましい。The support for the X-ray photographic material is preferably a polyethylene terephthalate film or a cellulose triacetate film, and is particularly preferably colored blue.
支持体は親水性コロイド層との密着力を向上せしめるた
めに、その表面をコロナ放電処理、あるいはクロー放電
処理あるいは紫外線照射処理する方法が好ましくあるい
は、スチレンブタジエン系ラテックス、塩化ビニリデン
系ラテックス等からなる下塗層を設けてもよくまた、そ
の上層にゼラチン層を更に設けてもよい。またポリエス
テル膨潤剤とゼラチンを含む有機溶剤を用いた下塗層を
設けてもよい。これ等の下塗層は表面処理を加えること
で更に親水性コロイド層との密着力を向上することもで
きる。In order to improve the adhesion with the hydrophilic colloid layer, the surface of the support is preferably subjected to corona discharge treatment, claw discharge treatment, or ultraviolet irradiation treatment, or is made of styrene-butadiene-based latex, vinylidene chloride-based latex, etc. An undercoat layer may be provided, and a gelatin layer may be further provided on top of the undercoat layer. Further, an undercoat layer using an organic solvent containing a polyester swelling agent and gelatin may be provided. These undercoat layers can be surface-treated to further improve their adhesion to the hydrophilic colloid layer.
本発明は、通常の現像処理をする写真感光材料であれば
どのようなものにも用いることができる。The present invention can be used with any photographic material that undergoes normal development processing.
例えば、X線用写真感光材料、黒白ネガ写真感光材料、
などに用いられる。For example, X-ray photographic materials, black and white negative photographic materials,
It is used for such things.
ここで、X線用写真感光材料として用いる場合には、R
ESEARCH DISCLOSURE Item
l 8 4 3 1(1979年8月P.433〜P.
441)安定剤、カブリ防止剤およびクニツク防止剤に
関する技術(P.433〜P.436)、に記載された
保護層に関する技術(P. 436, IV項)、ク
ロスオーバーコントロール技術(P.436,V項)等
を用いることが好ましい。Here, when used as an X-ray photographic material, R
ESEARCH DISCLOSURE Item
l 8 4 3 1 (August 1979 P.433-P.
441) Technologies related to stabilizers, antifoggants and antifogging agents (P.433 to P.436), technologies related to protective layers described in (P.436, Section IV), crossover control technologies (P.436, It is preferable to use Section V) or the like.
X線写真像を得るためには、露光は通常の方法を用いて
行なえばよい。すなわち、直接X線を照射するかまたは
両側に感光層のある感光材料を2枚の鉛はく増感紙また
は螢光増感紙でサンドイツチしてX線露光する方法であ
る。To obtain an X-ray photographic image, exposure may be carried out using conventional methods. That is, the method involves directly irradiating X-rays or exposing a photosensitive material having photosensitive layers on both sides by sandwiching it between two lead intensifying screens or fluorescent intensifying screens.
または片側に感光層のある感光材料の場合はX線を螢光
増感紙に照射し、発光した光を感光材料に記録する方法
を用いる。勿論感光材料と螢光増感紙をコンタクトさせ
てX線照射してもよい。Alternatively, in the case of a photosensitive material having a photosensitive layer on one side, a method is used in which a fluorescent intensifying screen is irradiated with X-rays and the emitted light is recorded on the photosensitive material. Of course, the X-rays may be irradiated by bringing the photosensitive material into contact with the fluorescent screen.
ここで螢光体としては青発光のタングステン酸カルシウ
ム、硫酸バリウムなどの螢光体、緑発光の希土類螢光体
が用いられる。また、X線露光したものを螢光体に蓄積
した後、陰極線管フライングスポット、発行ダイオード
、レーザー光(例えばガスレーザー、YAGレーザー、
色素レーザー半導体レーザーなど)など赤外光を含む種
々の光源で露光することもできる。Here, as the phosphor, a blue-emitting phosphor such as calcium tungstate or barium sulfate, or a green-emitting rare earth phosphor is used. In addition, after X-ray exposure is accumulated in a phosphor, a cathode ray tube flying spot, an emitting diode, a laser beam (e.g. gas laser, YAG laser,
Exposure can also be performed with a variety of light sources including infrared light, such as dye lasers (semiconductor lasers, etc.).
く実施例〉 次に本発明の効果を具体的に説明する。Example Next, the effects of the present invention will be specifically explained.
(実施例一l)
コントロールダブルジェット法で0.35μの粒子サイ
ズのへキサクロロイリジウム(III)酸カリウムを添
加し、ほぼ立方体の沃臭化銀粒子を調製した。この乳剤
に1−フエニルー5−メルカブトーテトラゾールを加え
、金・イオウ増感を併用した化学増感をほどこし、安定
剤として4−ヒドロキシ−6−メチル−1. 3.
3a, ?−テトラザインデン、また防腐剤として
1.2−ベンツイソチアゾリンー3−オンとβ−オキシ
エチルフエニルエーテルとを加え、さらに硬膜剤として
2,4−ジクロル−6−ヒドロキシーs−4リアジンを
添加してポリエチレンテレフタレート支持体に両面塗布
した。さらにこの上にゼラチンを結合剤として、マット
剤、アニオン界面活性剤、含フッ素化合物、オルガノポ
リシロキサンポリエチレンオキサイド系ノニオン界面活
性剤、特願昭62−3 3 5 5 7 0 ニ記載さ
れたDV−’759を含む表面保護層を塗布した。この
サンプルの塗布銀量は、両面とも同量づつ塗布し、表.
lに示すような銀量となるようにした。(試料No.a
− d )表1.
2 b 8.0
”3 c 10.0
4 d l4.0
5 a 6.0
例示化合物■を現像液
1lあたりに0.5g添加
6
b
8.0
7
C
10.0
8
d
l6.0
例示化合物
■
現
像
25°C
3分
90cc/(35.6an x 43.2cm )あた
り定
着1
23℃
3分300cc/(
)あたり
水
洗
20°C
3分
3171分
次に現像濃縮液パートA,パートB1パートCおよびス
ターターの処方を示す。(Example 1l) Potassium hexachloroiridate(III) having a grain size of 0.35 μm was added by a controlled double jet method to prepare approximately cubic silver iodobromide grains. 1-Phenyl-5-mercabutotetetrazole was added to this emulsion, chemical sensitization was performed using gold/sulfur sensitization, and 4-hydroxy-6-methyl-1. 3.
3a, ? -tetrazaindene, 1,2-benzisothiazolin-3-one and β-oxyethyl phenyl ether are added as preservatives, and 2,4-dichloro-6-hydroxy-s-4 lyazine is added as a hardening agent. and coated on both sides of a polyethylene terephthalate support. Furthermore, using gelatin as a binder, a matting agent, an anionic surfactant, a fluorine-containing compound, an organopolysiloxane polyethylene oxide type nonionic surfactant, and the DV- A surface protective layer containing '759 was applied. The amount of silver coated on this sample was determined by applying the same amount on both sides.
The amount of silver was set as shown in 1. (Sample No.a
-d) Table 1. 2 b 8.0
3 c 10.0 4 d l4.0 5 a 6.0 Add 0.5g of exemplified compound ■ per 1 liter of developer 6 b 8.0 7 C 10.0 8 d l6.0 Exemplary compound ■ Developed at 25° C 3 minutes 90cc/(35.6an x 43.2cm) fixing 1 23°C 3 minutes 300cc/( ) washing with water 20°C 3 minutes 3171 minutes Next developer concentrate part A, part B1 part C and starter formulation shows.
バートA
バートB
パートC
10J用
10j7用
lOl用
1水を加えて
スターター
2 5 0ml
使用液の調製法は、水を約61にパートA2.5Cパー
トB 4 0 0ml,パートC250mj7を順次攪
拌しながら添加溶解して最後に水で102とし、pHを
10.40に調整した。この使用液を現像補充液とする
。この補充液llに対して前記スターターを20mAの
割合で添加した。この液が現像タンク液であり、ランニ
ングスタート時に使用するものである。Bart A Bart B Part C For 10J For 10j7 For 1Ol Add water to make starter 2 50 ml To prepare the liquid, add approximately 61 liters of water to Part A 2.5 C Part B 40 0 ml and Part C 250 mj7 in order while stirring. The solution was added and dissolved, and finally the pH was adjusted to 10.40 by adding water. This used solution is used as a developer replenisher. The starter was added at a rate of 20 mA to every liter of this replenisher. This liquid is the developer tank liquid and is used at the start of running.
次に表1に示すように、各種現像液を使用してローラー
搬送型自現機により以下に示すような現像処理を行った
。Next, as shown in Table 1, the following development processing was performed using a roller conveyance type automatic processor using various developing solutions.
自現機は1回の試験に3日間稼動させ、稼動日には1日
当りハーフ露光(工学濃度が約2.0になるように)し
た半切(35. 6an X 43. 2cm )サイ
ズ100枚を処理した。The automatic developing machine was operated for 3 days for one test, and on the operating days, 100 sheets of half-exposure (so that the engineering density was approximately 2.0) and cut in half (35.6an x 43.2cm) were processed per day. Processed.
以上のようなランニング処理をくりかえし300枚処理
した後の銀汚れを、現像槽内の壁、ローラー表面の汚れ
、および感材に付着した汚れの程度とから評価した。After 300 sheets were processed by repeating the above-described running process, silver stains were evaluated based on the stains on the wall inside the developer tank, the stains on the roller surface, and the degree of stains attached to the photosensitive material.
また同時に特願昭6 2−9 4 8 7 9に示した
方法で露光し、各稼動日の2日目の最後に現像してそれ
ら感材の相対感度とした。At the same time, they were exposed to light using the method shown in Japanese Patent Application No. 62-94-879, and developed at the end of the second day of each working day to determine the relative sensitivity of the light-sensitive materials.
このような実験をして得られた結果を表.2に示す。The results obtained from such experiments are shown in the table. Shown in 2.
表,2からわかるように、塗布銀量が少いと感度が低く
、高感度を得るために塗布銀量を多くすると極端に銀汚
れが悪化することがわかる。また、銀汚れが悪化するの
は塗布銀量が10g/rr?以上であり、このような系
に本発明で示した化合物を添加すると、銀汚れが大巾に
良化し、発生が防止されることがわかる。As can be seen from Tables 2 and 2, it can be seen that when the amount of coated silver is small, the sensitivity is low, and when the amount of coated silver is increased to obtain high sensitivity, the silver stain becomes extremely worse. Also, does silver stain worsen when the applied silver amount is 10g/rr? The above shows that when the compound shown in the present invention is added to such a system, silver staining is greatly improved and its occurrence is prevented.
(実施例2)
硝酸銀水溶液と臭化カリウム水溶液をゼラチン水溶液に
添加して平均粒径0.55μの臭化銀粒子をつくった。(Example 2) A silver nitrate aqueous solution and a potassium bromide aqueous solution were added to a gelatin aqueous solution to prepare silver bromide particles having an average particle size of 0.55 μm.
この乳剤にさらに硝酸銀水溶液と臭化カリウムと沃化カ
リウムの水溶液を添加して、沃化銀を2モル%含む沃臭
化銀を前の粒子の外側に形或した。粒子の平均サイズは
0.34%であり、0.5μ以上の粒子を全体の9.5
%含むものであった。An aqueous silver nitrate solution and an aqueous solution of potassium bromide and potassium iodide were further added to this emulsion to form silver iodobromide containing 2 mol % of silver iodide on the outside of the previous grains. The average size of particles is 0.34%, and particles larger than 0.5μ account for 9.5% of the total.
%.
この乳剤を通常の方法で脱銀した後、1,2−ペンゾイ
ソチアゾリン−3−オンとβ−オキシエチルフエニルエ
ーテルとゼラチンを添加し、1ーフエニルー5−メルカ
プトーテトラゾールを添加して、金・イオウ増感をほど
こした。(乳剤A5また、アンモニア量を多くした以外
は上記乳剤Aと全く同じ方法で0.65μの粒子サイズ
の乳剤(乳剤B)も調整した。この乳剤Bは0. 5
μ以下の粒子の割合は10%以下であった。After desilvering this emulsion in a conventional manner, 1,2-penzisothiazolin-3-one, β-oxyethyl phenyl ether and gelatin were added, and 1-phenyl-5-mercaptotetrazole was added. - Sulfur sensitized. (Emulsion A5) An emulsion (emulsion B) with a grain size of 0.65 μm was also prepared in exactly the same manner as in the above emulsion A except that the amount of ammonia was increased.
The proportion of particles smaller than μ was 10% or less.
これら乳剤Aと乳剤Bを表.3に示すような割合で混合
し、4−ヒドロキシ−6−メチル−1,3.3a.7−
テトラザインデンおよび3−(5ーメルカプトテトラゾ
リル)一ベンゼンスルフオン酸ナトリウムを加え、安定
化させた。さらに、ポリアクリルアミド、レゾルシノー
ルさらに吸収吸大623nmの染料と、吸収吸大510
nmの染料を加え、さらに現像膨潤率が230%(膨潤
時全膜厚/乾膜厚)になるように硬膜剤を加えポリエチ
レンテレフタレート支持体上に塗布した。These emulsions A and B are shown in the table below. 3.4-hydroxy-6-methyl-1,3.3a. 7-
Tetrazaindene and sodium 3-(5-mercaptotetrazolyl)monobenzenesulfonate were added for stabilization. In addition, polyacrylamide, resorcinol, a dye with an absorption of 623 nm, and a dye with an absorption of 510 nm are added.
nm dye was added thereto, and a hardening agent was further added so that the development swelling ratio was 230% (total film thickness when swollen/dry film thickness), and the mixture was coated on a polyethylene terephthalate support.
このとき同時にマット剤、無機塩、含フッ素化合物、ア
ニオン界面活性剤、オルガノボリシロキサン、特願昭6
2−3 3 5 5 7 0号に記載されたDV−7
59、ポリエチレンオキサイド系ノニオン界面活性剤を
含む表面保護層を塗布した。(試料NへeA′g)
こうして得られた各試料e − gはいずれも両面とも
同じ銀量となるように塗布し、両面で12.0g/耐と
なるようにした。At the same time, matting agents, inorganic salts, fluorine-containing compounds, anionic surfactants, organoborisiloxanes,
DV-7 described in No. 2-3 3 5 5 7 0
59. A surface protective layer containing a polyethylene oxide nonionic surfactant was applied. (eA'g to sample N) Each of the samples e-g thus obtained was coated with the same amount of silver on both sides, and the resistance was 12.0 g/distance on both sides.
これら試料を用いて表.3に示すような実験を実施例1
と同様に実施した。Table using these samples. Example 1 The experiment as shown in 3.
It was carried out in the same way.
またこのとき次のような方法で粒状の評価も実施した。At this time, graininess was also evaluated using the following method.
このようにして得られた結果を表.3に示す。The results obtained in this way are shown in the table. Shown in 3.
(粒状:RMSの評価法)
(1) 相対感度を求めるために使用したX線、鉛は
く増感紙、カセツテを使用し、現像処理後の光学濃度が
2. 0になるようにX線を照射する。(Grain: RMS evaluation method) (1) Using the X-rays, lead intensifying screen, and cassette used to determine relative sensitivity, the optical density after development was 2. X-rays are irradiated so that it becomes 0.
(2)この試料を相対感度を求めるための試料の後に現
像処理する。(2) This sample is developed after the sample for determining relative sensitivity.
(3)こうして得られた試料の片面を次亜塩素酸ナトリ
ウムを使用して除去する。(3) One side of the sample thus obtained is removed using sodium hypochlorite.
(4)この片面試料を粒状を測定するマイクロデンシト
メーターで測定(測定はl2μm径の円形スリットを使
用した)
これからR.
M.
Sを求める。(4) This single-sided sample was measured using a microdensitometer that measures grain size (a circular slit with a diameter of 12 μm was used for the measurement). M. Find S.
この表からわかるように0.5μm以下のサイズの粒子
を50%以上含むと、RMSが良化するが、一方銀汚れ
が悪化する。As can be seen from this table, when 50% or more of particles with a size of 0.5 μm or less are contained, the RMS improves, but on the other hand, silver stain worsens.
そして本発明に示した化合物を現像液に含むと、このよ
うな場合でもRMSの悪化をともなわずに銀汚れが防止
されることがわかる。It can be seen that when the compound shown in the present invention is included in the developer, silver staining can be prevented even in such cases without deterioration of RMS.
Claims (1)
合は合計で)であるハロゲン化銀感光材料を画像露光後
、少なくとも、 (a)ハイドロキノン系現像主薬、 (b)0.3モル/l以上の亜硫酸塩および(c)下記
(X)または下記(Y)の少なくとも1つ を含有する現像液で処理することを特徴とするハロゲン
化銀感光材料の現像処理方法。 (X)下記一般式( I )で表される化合物 ( I ) ▲数式、化学式、表等があります▼ 〔式中、B_1およびD_1は互いに独立して脂肪族基
、脂環式基、芳香脂肪族基、芳香族基または複素環式5
員環または6員環(この環は更に縮合していてもよく、
窒素原子1〜3個および酸素原子1個またはいおう原子
1個を含有しているものとする、m_1およびn_1は
それぞれ1、2および3の数であり、pは1または2で
あり、A_2およびE_2は互いに独立してそれぞれ式
−CO−O−M、−SO_2−O−M、 ▲数式、化学式、表等があります▼、−S−Zおよび ▲数式、化学式、表等があります▼ (これらの式においてXおよびYはそれぞれ水素原子ま
たはヒドロキシル基、カルボン酸基もしくはスルホン酸
基によつて置換されていてもよい炭素原子最大8個のア
ルキル基であり、Yは更にフェニルスルホン酸基、低級
アルキルスルホニル基またはフェニルスルホニル基であ
つてもよく、Mは1価陽イオンであり、ZはXおよびY
と同じ意味であるがただし水素原子ではないものとする
)であらわされる基である。ただし−CO−O−Mであ
らわされる基であるとき、前記の相当するB_1および
D_1はα−アミノ基をもたないものとする。〕 (Y)下記(y1)および(y2) (y1)下記一般式(II)で表される化合物▲数式、化
学式、表等があります▼ 〔式中Rはフェニル基または低級アルキル 基を表す。〕 (y2)下記一般式(III)で表される化合物またはア
ミノ(低級)アルカンチオ スルホン酸もしくはそのアルカリ金 属塩の少なくとも1つ。 ▲数式、化学式、表等があります▼ 〔式中R′はフェニル基または低級アルキ ル基を、Mは水素またはアルカリ金属を表す。〕(2)
全乳剤層中のハロゲン化銀粒子のうち50%以上100
%以下が粒子径0.5μ以 下の小さな粒子から成っていることを特徴 とする第1項の現像処理方法。(1) After imagewise exposure of a silver halide photosensitive material having a coated silver amount of 10 g or more per 1 m^2 (total in the case of both sides), at least (a) a hydroquinone developing agent, (b) 0.3 mol 1. A method for developing a silver halide photosensitive material, comprising processing with a developer containing at least 1/1 sulfite and (c) at least one of the following (X) or the following (Y). (X) Compound (I) represented by the following general formula (I) ▲ Numerical formula, chemical formula, table, etc. group group, aromatic group or heterocyclic group 5
membered ring or 6-membered ring (this ring may be further fused,
m_1 and n_1 are numbers 1, 2 and 3, respectively, p is 1 or 2, A_2 and E_2 has the formulas -CO-O-M, -SO_2-O-M, ▲mathematical formulas, chemical formulas, tables, etc.▼, -S-Z and ▲mathematical formulas, chemical formulas, tables, etc.▼ (these In the formula, X and Y are each a hydrogen atom or an alkyl group having up to 8 carbon atoms which may be substituted with a hydroxyl group, a carboxylic acid group or a sulfonic acid group, and Y is further a phenylsulfonic acid group, a lower It may be an alkylsulfonyl group or a phenylsulfonyl group, M is a monovalent cation, Z is X and Y
(has the same meaning as , except that it is not a hydrogen atom). However, when it is a group represented by -CO-OM, the corresponding B_1 and D_1 mentioned above do not have an α-amino group. ] (Y) The following (y1) and (y2) (y1) Compound represented by the following general formula (II) ▲ Numerical formulas, chemical formulas, tables, etc. are available ▼ [In the formula, R represents a phenyl group or a lower alkyl group. ] (y2) At least one compound represented by the following general formula (III), amino(lower)alkanethiosulfonic acid, or an alkali metal salt thereof. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, R' represents a phenyl group or a lower alkyl group, and M represents hydrogen or an alkali metal. ](2)
50% or more of the silver halide grains in all emulsion layers100
2. The developing method according to item 1, wherein % or less consists of small particles with a particle size of 0.5 μm or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19163089A JPH0355541A (en) | 1989-07-25 | 1989-07-25 | Development processing method for silver halide photosensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19163089A JPH0355541A (en) | 1989-07-25 | 1989-07-25 | Development processing method for silver halide photosensitive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0355541A true JPH0355541A (en) | 1991-03-11 |
Family
ID=16277846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19163089A Pending JPH0355541A (en) | 1989-07-25 | 1989-07-25 | Development processing method for silver halide photosensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0355541A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04295847A (en) * | 1991-03-25 | 1992-10-20 | Fuji Photo Film Co Ltd | Development processing method for silver halide photographic sensitive material |
| JPH05249623A (en) * | 1991-03-19 | 1993-09-28 | Fuji Photo Film Co Ltd | Development processing method for silver halde photographic sensitive material |
| JPH05303179A (en) * | 1991-04-18 | 1993-11-16 | Fuji Photo Film Co Ltd | Developing method for silver halide photographic sensitive material and developer composition |
| US5506092A (en) * | 1993-12-06 | 1996-04-09 | Konica Corporation | Method of processing black and white silver halide photographic compositions with a developer containing an anti sludgant |
| US5824458A (en) * | 1994-02-28 | 1998-10-20 | Fuji Photo Film Co., Ltd. | Developer and fixing solution for silver halide photographic material and processing method using the same |
| US9320636B2 (en) | 2012-07-05 | 2016-04-26 | Panasonic Corporation | Support device, operation support device, and muscle strength training support device |
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| JPS58203439A (en) * | 1982-05-22 | 1983-11-26 | Konishiroku Photo Ind Co Ltd | Treatment of silver halide photosensitive material |
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| JPS5236029A (en) * | 1975-09-11 | 1977-03-19 | Ciba Geigy Ag | Method of developing photograph |
| JPS54133331A (en) * | 1978-03-31 | 1979-10-17 | Ciba Geigy Ag | Method of preventing dark color and sludge from occurring in photographic developer |
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|---|---|---|---|---|
| JPH05249623A (en) * | 1991-03-19 | 1993-09-28 | Fuji Photo Film Co Ltd | Development processing method for silver halde photographic sensitive material |
| JPH04295847A (en) * | 1991-03-25 | 1992-10-20 | Fuji Photo Film Co Ltd | Development processing method for silver halide photographic sensitive material |
| JPH05303179A (en) * | 1991-04-18 | 1993-11-16 | Fuji Photo Film Co Ltd | Developing method for silver halide photographic sensitive material and developer composition |
| US5506092A (en) * | 1993-12-06 | 1996-04-09 | Konica Corporation | Method of processing black and white silver halide photographic compositions with a developer containing an anti sludgant |
| US5824458A (en) * | 1994-02-28 | 1998-10-20 | Fuji Photo Film Co., Ltd. | Developer and fixing solution for silver halide photographic material and processing method using the same |
| US9320636B2 (en) | 2012-07-05 | 2016-04-26 | Panasonic Corporation | Support device, operation support device, and muscle strength training support device |
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