JPH0357898B2 - - Google Patents
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- Publication number
- JPH0357898B2 JPH0357898B2 JP7779282A JP7779282A JPH0357898B2 JP H0357898 B2 JPH0357898 B2 JP H0357898B2 JP 7779282 A JP7779282 A JP 7779282A JP 7779282 A JP7779282 A JP 7779282A JP H0357898 B2 JPH0357898 B2 JP H0357898B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- compound
- solvent
- substituent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 125000001424 substituent group Chemical group 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims description 6
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 125000004434 sulfur atom Chemical group 0.000 claims description 5
- 125000000304 alkynyl group Chemical group 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 150000004820 halides Chemical class 0.000 claims description 2
- JHORPQHCYZWKIA-UHFFFAOYSA-N 1,2-oxazol-5-ylmethyl carbamimidothioate Chemical class NC(=N)SCC1=CC=NO1 JHORPQHCYZWKIA-UHFFFAOYSA-N 0.000 claims 1
- 150000002545 isoxazoles Chemical class 0.000 claims 1
- 150000003469 sulfuric acid diesters Chemical class 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 description 35
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 27
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 20
- 239000002904 solvent Substances 0.000 description 18
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 241000209094 Oryza Species 0.000 description 9
- 235000007164 Oryza sativa Nutrition 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 235000009566 rice Nutrition 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000013078 crystal Substances 0.000 description 8
- -1 ethyl n -propyl Chemical group 0.000 description 8
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000000741 silica gel Substances 0.000 description 7
- 229910002027 silica gel Inorganic materials 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 5
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000002689 soil Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 4
- VWMXCDZIQNBDDZ-UHFFFAOYSA-N 5-(methylsulfanylmethyl)-1,2-oxazol-3-one Chemical compound CSCC1=CC(=O)NO1 VWMXCDZIQNBDDZ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 239000007810 chemical reaction solvent Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000010828 elution Methods 0.000 description 3
- 239000012259 ether extract Substances 0.000 description 3
- 239000000543 intermediate Substances 0.000 description 3
- 239000010446 mirabilite Substances 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- RSIJVJUOQBWMIM-UHFFFAOYSA-L sodium sulfate decahydrate Chemical compound O.O.O.O.O.O.O.O.O.O.[Na+].[Na+].[O-]S([O-])(=O)=O RSIJVJUOQBWMIM-UHFFFAOYSA-L 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- FUOSTELFLYZQCW-UHFFFAOYSA-N 1,2-oxazol-3-one Chemical class OC=1C=CON=1 FUOSTELFLYZQCW-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000004480 active ingredient Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000002917 insecticide Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000009331 sowing Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 1
- YUKUDJRCHPSDGC-UHFFFAOYSA-N 1,2-oxazole;hydrochloride Chemical compound Cl.C=1C=NOC=1 YUKUDJRCHPSDGC-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 125000000530 1-propynyl group Chemical group [H]C([H])([H])C#C* 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- OHXAOPZTJOUYKM-UHFFFAOYSA-N 3-Chloro-2-methylpropene Chemical compound CC(=C)CCl OHXAOPZTJOUYKM-UHFFFAOYSA-N 0.000 description 1
- WJHVLYYBABXTPA-UHFFFAOYSA-N 5-(bromomethyl)-4-chloro-1,2-oxazol-3-one Chemical compound ClC1=C(CBr)ONC1=O WJHVLYYBABXTPA-UHFFFAOYSA-N 0.000 description 1
- DZYGNTRDQYBNTF-UHFFFAOYSA-N 5-(chloromethyl)-1,2-oxazol-3-one Chemical compound ClCC1=CC(=O)NO1 DZYGNTRDQYBNTF-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 241001124076 Aphididae Species 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- YIIMEMSDCNDGTB-UHFFFAOYSA-N Dimethylcarbamoyl chloride Chemical compound CN(C)C(Cl)=O YIIMEMSDCNDGTB-UHFFFAOYSA-N 0.000 description 1
- 206010053759 Growth retardation Diseases 0.000 description 1
- 235000007688 Lycopersicon esculentum Nutrition 0.000 description 1
- 244000000231 Sesamum indicum Species 0.000 description 1
- 235000003434 Sesamum indicum Nutrition 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 240000003768 Solanum lycopersicum Species 0.000 description 1
- 241001454293 Tetranychus urticae Species 0.000 description 1
- NAPCEKFOFGSJEK-UHFFFAOYSA-N [4-chloro-5-(methylsulfanylmethyl)-1,2-oxazol-3-yl] n,n-dimethylcarbamate Chemical compound CSCC=1ON=C(OC(=O)N(C)C)C=1Cl NAPCEKFOFGSJEK-UHFFFAOYSA-N 0.000 description 1
- 230000000895 acaricidal effect Effects 0.000 description 1
- 239000000642 acaricide Substances 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000012230 colorless oil Substances 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000003337 fertilizer Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005394 methallyl group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000005648 plant growth regulator Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000003260 vortexing Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Description
本発明は新規な3−ヒドロオキシイソオキサゾ
ール誘導体およびその製法に関する。
本発明の化合物は
式
(式中、R1は水素原子またはハロゲン原子を示
し、R2は水素原子、アルキル基、低級アルケニ
ル基、低級アルキニル基、シクロアルキル基、置
換基を有してもよいアラルキル基または置換基を
有してもよいアリール基を示し、Aは硫黄原子、
スルフイニル基またはスルホニル基を示す。)を
有する3−ヒドロオキシイソオキサゾール誘導体
である。
上記式()中、R1のハロゲン原子としては、
塩素、臭素、沃素または弗素原子があげられる
が、好ましくは塩素および臭素原子である。
R2のアルキル基は直鎖状でも有枝鎖状でもよ
く、C1-8のアルキル基、例えばメチル、エチルn
−プロピル、イソプロピル、n−ブチル、t−ブ
チル、n−ペンチル、n−オクチルがあげられ
る。R2の低級アルケニル基としては、例えばア
リルまたはメタリルがあげられる。R2の低級ア
ルキニル基としては、例えば1−プロピニルまた
は2−プロピニルがあげられる。R2のシクロア
ルキル基としては、例えばシクロヘキシルがあげ
られる。R2の置換基を有してもよいアラルキル
基としては、例えばハロゲン、低級アルキル、低
級アルコキシ、トリフルオロメチル、ニトロまた
はカルボキシルのような置換基を有するか有しな
いベンジルまたはフエネチルがあげられる。R2
の置換基を有してもよいアリール基としては、例
えばハロゲン、低級アルキル、低級アルコキシ、
トリフルオロメチルまたはカルボキシルのような
置換基を有するか有しないフエニルまたはナフチ
ルがあげられる。
式()の化合物の塩としては、アルカリ金属
塩、アルカリ土類金属塩等があげられる。
式()の化合物は、イネムレ苗の防除に有効
であり、好ましい化合物はR1が水素原子または
塩素原子、特に水素原子であり、R2は直鎖状低
級アルキル基または低級アルケニル基であり、A
は硫黄原子である化合物である。
式()の化合物はまた、次に示す方法により
殺虫、殺ダニ剤としてナミハダニ、アブラムシ類
の防除に有用な式()及び式()の化合物の
合成中間体として有用である。
(式中、R1,R2及びAは前述したものと同じ。
Yはハロゲン原子を示す。)このような合成中間
体として好ましい化合物は、R1は水素原子、塩
素原子または臭素原子であり、R2が直鎖状低級
アルキル基または低級アルケニル基であり、Aは
硫黄原子、スルフイニル基またはスルホニル基で
ある化合物である。
本発明の式()の化合物を次表に例示する。
なお化合物番号は以下の記載において参照され
る。
The present invention relates to a novel 3-hydroxyisoxazole derivative and a method for producing the same. The compounds of the invention have the formula (In the formula, R 1 represents a hydrogen atom or a halogen atom, and R 2 represents a hydrogen atom, an alkyl group, a lower alkenyl group, a lower alkynyl group, a cycloalkyl group, an aralkyl group that may have a substituent, or a substituent. Indicates an optional aryl group, A is a sulfur atom,
Indicates a sulfinyl group or a sulfonyl group. ) is a 3-hydroxyisoxazole derivative. In the above formula (), the halogen atom of R 1 is:
Examples include chlorine, bromine, iodine or fluorine atoms, with chlorine and bromine atoms being preferred. The alkyl group of R 2 may be linear or branched, and may be a C 1-8 alkyl group, such as methyl, ethyl n
-propyl, isopropyl, n-butyl, t-butyl, n-pentyl, and n-octyl. Examples of the lower alkenyl group for R 2 include allyl and methallyl. Examples of the lower alkynyl group for R 2 include 1-propynyl and 2-propynyl. Examples of the cycloalkyl group for R 2 include cyclohexyl. The optionally substituted aralkyl group for R 2 includes, for example, benzyl or phenethyl with or without substituents such as halogen, lower alkyl, lower alkoxy, trifluoromethyl, nitro or carboxyl. R2
Examples of the aryl group which may have a substituent include halogen, lower alkyl, lower alkoxy,
Mention may be made of phenyl or naphthyl with or without substituents such as trifluoromethyl or carboxyl. Examples of the salt of the compound of formula () include alkali metal salts and alkaline earth metal salts. The compound of formula () is effective for controlling rice seedlings, and preferred compounds are those in which R 1 is a hydrogen atom or a chlorine atom, particularly a hydrogen atom, and R 2 is a linear lower alkyl group or a lower alkenyl group, A
is a compound that is a sulfur atom. The compound of formula () is also useful as an intermediate for the synthesis of compounds of formula () and formula (), which are useful as insecticides and acaricides for controlling two-spotted spider mites and aphids, by the method shown below. (In the formula, R 1 , R 2 and A are the same as described above.
Y represents a halogen atom. ) Preferred compounds as such synthetic intermediates include R 1 being a hydrogen atom, chlorine atom, or bromine atom, R 2 being a linear lower alkyl group or lower alkenyl group, and A being a sulfur atom, a sulfinyl group, or a sulfinyl group. This is a compound that is a sulfonyl group. The compounds of formula () of the present invention are illustrated in the following table.
Note that compound numbers are referred to in the following description.
【表】【table】
【表】【table】
【表】【table】
【表】【table】
【表】
本発明はまた、式()の化合物の製法に関す
るものであり、次の種々の方法で製造される。
(式中、R1およびR2は前述したものと同じ、X
およびYはハロゲン原子を示し、Mはアルカリ金
属を示し、nは1または2を示す。)
(1) 式()中、Aが硫黄原子である式(−
1)の化合物は、(a)式()の化合物にメルカ
プチド(R2SM)を反応させるか、(b)式()
の化合物にチオ尿素を反応させて得られる式
()の化合物にハライド(R2Y)を反応させ
るか、または(c)式()の化合物に硫酸ジエス
テル((R2)2SO4)を反応させることにより得
られる。
(a)の方法において、メルカプチドはあらかじ
め製造されたものを用いるか、あるいは反応溶
媒中において生成せしめることができる。
上記の(a),(b)及び(c)の方法は、塩基例えば水
酸化アルカリまたは炭酸アルカリの存在下、
水;メタノール エタノールのようなアルコー
ル類;テトラヒドロフラン、ジオキサン、ジグ
ライムのようなエーテル類;アセトン、メチル
エチルケトン、メチルイソブチルケトンのよう
なケトン類;ジメチルホルムアミド;ジメチル
スルホキシド;ヘキサメチルホスホルアミドお
よびこれらの混合溶媒中で行われるが、特に好
適な溶媒は水およびメタノールである。反応温
度は0℃以上溶媒の還流下に行われるが、好ま
しくは0℃以上室温である。
式(−1)の化合物はアルカリ金属塩とし
て生成するので、塩酸または硫酸などの酸で中
和することによつて目的物が得られる。
(2) 式()中、Aがスルフイニル基またはスル
ホニル基である式(−2)の化合物は、式
(−1)の化合物を過酸化物と反応させるこ
とによつて得られる。過酸化物としては過酸化
水素、過酸化ベンゾイル、メタクロル過安息香
酸等があげられるが、とくにメタクロル過安息
香酸が好ましい。過酸化水素は等モル量使用す
ることが好ましく、反応温度は5〜25℃の範囲
が好ましい。メタクロル過安息香酸は通常当モ
ル以上使用することが好ましく、反応温度は0
℃ないし室温以下で数時間で反応は完結する
が、必要に応じて溶媒還流下に行うこともでき
る。
反応溶媒としては、過酸化水素を用いる場合
には脂肪族カルボン酸、とくに酢酸が、メタク
ロル過安息香酸を用いる場合には実質的に不活
性な有機溶剤が使用されるが、とくにハロゲン
化炭化水素類、例えば塩化メチレン、四塩化炭
素、クロロホルム、クロルベンゼンまたはo−
ジクロルベンゼンが好ましい。
(3) 前記式()を有する原料化合物は新規であ
り、式()の5−ハロゲノメチルイソオキサ
ゾール誘導体とチオ尿素とを反応させることに
より製造される。
反応溶媒としてはアセトン、メチルエチルケ
トン、メチルイソブチルケトンのようなケトン
類;メタノール、エタノール、プロパノールの
ようなアルコール類;があげられるが、とくに
アセトンおよびエタノールが好ましい。チオ尿
素は等モル使用することが好ましい。反応温度
は0℃以上溶媒の還流下に行なわれるが、好ま
しくは室温以上溶媒の還流温度である。反応終
了後反応混合物を室温以下に冷却して渦し、
結晶をアセトン、メタノールまたはエタノール
で洗浄した後乾燥すれば式()の化合物のほ
ぼ純品が得られる。
なお、原料化合物である式()の化合物
中、R1が水素原子であり、Xがハロゲン原子
である化合物はテトラヘドロン・レタースNo.25
2077頁(1965)に記載の方法で、R1及びXが
ハロゲン原子である化合物は特開昭55−64576
号公報に記載の方法に準じて製造される。
なお、式()の化合物は合成中間体として
有用であるほか、イネムレ苗の防除剤として用
いられ、イネいもち病、ごまはがれ病、トマト
りんもん病にも有効である。
式()の化合物をイネムレ苗防除剤として
使用するには、育苗箱(縦60cm、横30cm、深さ
3cmの木箱)あたり、有効成分として0.01ない
し1gを土壌に潅注もしくは混和する方法、イ
ネ種子に粉衣もしくはイネ種子を浸漬する方法
等があげられ、そのいずれの方法でも効果を奏
しうる。
イネムレ苗防除剤を調製するには、式()
の化合物を担体と混合して、粉剤、水和剤、錠
剤、粉衣剤、乳剤等に製剤することができる。
もちろん、他の植物生長調節剤、殺菌剤、殺虫
剤、肥料等を混合して使用することもできる。
実施例 1
苛性ソーダ3.2gを16mlの水に溶解した溶液に
メチルメルカプタンのナトリウム塩の15%水溶液
32mlを加え、この混合溶液に室温で撹拌下に3−
ヒドロオキシ−5−クロルメチルイソオキサゾー
ル10.6gを加え、室温で更に30分間撹拌した。反
応混液に2N硫酸約50mlを加えて酸性とした後、
析出した結晶を渦、これを約100mlの水で洗浄
した後風乾すると、融点90〜91℃の3−ヒドロオ
キシ−5−メチルチオメチルイソオキサゾール
7.05g(収率61.1%)が得られた。更に液およ
び洗液を合せたものを50mlずつのジエチルエーテ
ルで3回抽出し、抽出液を合せて芒硝で乾燥した
後溶媒を留去し、残渣をシリカゲルクロマトグラ
フイーにより、ヘキサン:ジエチルエーテル=
1:1で溶出して精製し、溶出液より溶媒を留去
して、純品の目的化合物を得た。
実施例 2
3−ヒドロオキシ−4−クロル−5−アミジノ
チオメチルイソオキサゾール・臭化水素酸塩2.88
gに水30mlおよび苛性ソーダ1.7gを10mlの水に
溶解した溶液を加えて撹拌し、結晶が溶解した後
硫酸ジエチルエステル1.44mlを加えて室温で更に
1時間15分撹拌した。反応混液に2N硫酸を加え
てPHを3付近に調整した後、20mlずつのジエチル
エーテルで2回抽出し、エーテル抽出液を合せて
芒硝で乾燥後、溶媒を留去して、残留物をシリカ
ゲルカラムクロマトグラフイーにより、ヘキサ
ン:ジエチルエーテル=1:1で溶出して精製
し、溶出液より溶媒を留去し、残留物をヘキサン
より再結晶すると、融点49〜51℃の3−ヒドロキ
シ−4−クロル−5−エチルチオメチルイソオキ
サゾールの結晶1.70g(収率 87.6%)が得られ
た。
実施例 3
苛性ソーダ1.2gを10mlの水に溶解し、この溶
液に5−アミジノチオメチル−4−クロル3−ヒ
ドロオキシイソオキサゾール・臭化水素酸塩1.44
gを加え、60℃に加温して溶解した。室温に冷却
後2N硫酸にて酸性とし、10mlずつのジエチルエ
ーテルで5回抽出し、エーテル抽出液を合せて芒
硝にて乾燥後、溶媒を留去し、残留物をシリカゲ
ルクロマトグラフイーによりヘキサン:ジエチル
エーテル=1:1で溶出し、溶出液より溶媒を留
去すると、融点104〜105℃の3−ヒドロキシ−4
−クロル−5−メルカプトメチルイソオキサゾー
ルの結晶が0.71g(収率 85.5%)得られた。
実施例 4
荷性ソーダ0.36gをメタノール20mlに溶解し、
この溶液に5−アミジノチオメチル−3−ヒドロ
オキシ)イソオキサゾール・塩酸塩419mgを加え
て溶解後、メタリルクロリド190mgを加えて室温
で1時間撹拌した。溶媒を留去して残留物を30ml
の水に溶解した後、2N硫酸にてPHを約2に調整
後、10mlずつのジエチルエーテルで2回抽出し、
エーテル抽出液を合せ、芒硝で乾燥後、溶媒を留
去し、残留物をシリカゲルカラムによりヘキサ
ン:ジエチルエーテル=1:1で溶出して精製
し、溶出液より溶媒を留去すると融点88〜89℃の
3−ヒドロキシ−5−メタリルチオメチルイソオ
キサゾールの結晶332mg(収率 89.7%)が得ら
れた。
実施例 5
3−ヒドロオキシ−5−メチルチオメチルイソ
オキサゾール0.73gを15mlの塩化メチレンに溶解
した液に、氷冷撹拌下に85%メタクロル過安息香
酸1.02gの10ml塩化メチレン溶液を10分間かけて
加え、更に室温で3時間撹拌した。反応混合物に
クロマトグラフ用シリカゲル5gを加えて溶媒を
留去、残留物をシリカゲルカラム上に載せて最初
にジエチルエーテルで溶出してメタクロル安息香
酸を除去し、次いでアセトンで溶出し、溶出液よ
り溶媒を留去すると、褐色油状物が得られ、この
油状物にベンゼン:アセトン=10:1の混合溶媒
を加えて結晶化させ、更に同混合溶媒から再結晶
すると融点96〜97℃の微黄色針状の3−ヒドロキ
シ−5−メチルスルフイニルメチルイソオキサゾ
ールの結晶0.66g(収率 81.9%)が得られた。
参考例 1
チオ尿素0.8gを30mlのアセトンに溶解し、こ
の溶液に5−ブロモメチル−4−クロル−3−ヒ
ドロオキシイソオキサゾール1.96gを加えて室温
で4.5時間撹拌した。析出した結晶を渦し、結
晶を30mlのアセトンで洗浄した後乾燥すると、融
点171℃(分解)の目的物の結晶2.66g(収率
100%)が得られた。
参考例1の方法に準じて、次の化合物を製造し
た。
[Table] The present invention also relates to a method for producing the compound of formula (), which is produced by the following various methods. (In the formula, R 1 and R 2 are the same as above,
and Y represents a halogen atom, M represents an alkali metal, and n represents 1 or 2. ) (1) In the formula (), A is a sulfur atom (-
The compound of 1) can be prepared by reacting the compound of formula (a) with mercaptide (R 2 SM) or by reacting the compound of formula (b) with formula ().
The compound of formula () obtained by reacting the compound with thiourea is reacted with a halide (R 2 Y), or the compound of formula (c) is reacted with sulfuric diester ((R 2 ) 2 SO 4 ). Obtained by reaction. In the method (a), the mercaptide can be used as a previously produced mercaptide, or can be generated in the reaction solvent. The above methods (a), (b) and (c) are carried out in the presence of a base such as an alkali hydroxide or an alkali carbonate.
Water; alcohols such as methanol and ethanol; ethers such as tetrahydrofuran, dioxane, and diglyme; ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; dimethylformamide; dimethyl sulfoxide; hexamethylphosphoramide and mixed solvents thereof Particularly suitable solvents are water and methanol. The reaction temperature is 0° C. or higher and the reaction is carried out under reflux of the solvent, preferably 0° C. or higher and room temperature. Since the compound of formula (-1) is produced as an alkali metal salt, the desired product can be obtained by neutralizing it with an acid such as hydrochloric acid or sulfuric acid. (2) A compound of formula (-2) in which A is a sulfinyl group or a sulfonyl group can be obtained by reacting a compound of formula (-1) with a peroxide. Examples of the peroxide include hydrogen peroxide, benzoyl peroxide, and methachloroperbenzoic acid, with methachloroperbenzoic acid being particularly preferred. It is preferable to use hydrogen peroxide in an equimolar amount, and the reaction temperature is preferably in the range of 5 to 25°C. It is usually preferable to use molar or more of methachloroperbenzoic acid, and the reaction temperature is 0.
The reaction is completed in several hours at a temperature ranging from .degree. C. to room temperature or lower, but it can also be carried out under reflux of the solvent if necessary. As reaction solvents, aliphatic carboxylic acids, especially acetic acid, are used when hydrogen peroxide is used, and substantially inert organic solvents are used when methachloroperbenzoic acid is used, but in particular halogenated hydrocarbons are used. such as methylene chloride, carbon tetrachloride, chloroform, chlorobenzene or o-
Dichlorobenzene is preferred. (3) The raw material compound having the formula () is new and is produced by reacting the 5-halogenomethylisoxazole derivative of the formula () with thiourea. Examples of the reaction solvent include ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; and alcohols such as methanol, ethanol, and propanol, with acetone and ethanol being particularly preferred. It is preferable to use equimolar amounts of thiourea. The reaction temperature is 0° C. or higher and the solvent is refluxed, preferably room temperature or higher than the reflux temperature of the solvent. After the reaction is complete, the reaction mixture is cooled to below room temperature and vortexed.
If the crystals are washed with acetone, methanol or ethanol and then dried, a substantially pure compound of formula () can be obtained. In addition, among the compounds of formula () which are raw material compounds, the compound in which R 1 is a hydrogen atom and X is a halogen atom is Tetrahedron Letters No. 25.
2077 (1965), the compound in which R 1 and
It is manufactured according to the method described in the publication. In addition, the compound of formula () is useful as a synthetic intermediate, and is also used as a control agent for rice seedlings, and is also effective against rice blast, sesame flaking disease, and tomato leaf blight. In order to use the compound of formula () as a rice seedling control agent, 0.01 to 1 g of the active ingredient is sprinkled or mixed into the soil per seedling raising box (wooden box 60 cm long, 30 cm wide, 3 cm deep). Methods include coating seeds with powder or soaking rice seeds, and any of these methods can be effective. To prepare rice seedling control agent, formula ()
The compound can be mixed with a carrier and formulated into powders, wettable powders, tablets, powder coatings, emulsions, etc.
Of course, other plant growth regulators, fungicides, insecticides, fertilizers, etc. can also be used in combination. Example 1 A 15% aqueous solution of the sodium salt of methyl mercaptan in a solution of 3.2 g of caustic soda dissolved in 16 ml of water.
32 ml was added to this mixed solution at room temperature with stirring.
10.6 g of hydroxy-5-chloromethylisoxazole was added, and the mixture was further stirred at room temperature for 30 minutes. After adding about 50 ml of 2N sulfuric acid to the reaction mixture to make it acidic,
The precipitated crystals were vortexed, washed with about 100 ml of water, and air-dried to form 3-hydroxy-5-methylthiomethylisoxazole with a melting point of 90-91°C.
7.05g (yield 61.1%) was obtained. Furthermore, the combined solution and washing solution was extracted three times with 50 ml of diethyl ether, the extracts were combined and dried with sodium sulfate, the solvent was distilled off, and the residue was chromatographed on silica gel to obtain hexane:diethyl ether=
Purification was carried out by elution at a ratio of 1:1, and the solvent was distilled off from the eluate to obtain a pure target compound. Example 2 3-Hydroxy-4-chloro-5-amidinothiomethylisoxazole hydrobromide 2.88
30 ml of water and a solution of 1.7 g of caustic soda dissolved in 10 ml of water were added to the mixture and stirred. After the crystals were dissolved, 1.44 ml of diethyl sulfate was added and the mixture was further stirred at room temperature for 1 hour and 15 minutes. After adjusting the pH to around 3 by adding 2N sulfuric acid to the reaction mixture, it was extracted twice with 20 ml of diethyl ether, the ether extracts were combined and dried over Glauber's salt, the solvent was distilled off, and the residue was purified with silica gel. It was purified by column chromatography by elution with hexane:diethyl ether = 1:1, the solvent was distilled off from the eluate, and the residue was recrystallized from hexane to give 3-hydroxy-4 with a melting point of 49-51°C. 1.70 g (yield: 87.6%) of crystals of -chloro-5-ethylthiomethylisoxazole were obtained. Example 3 Dissolve 1.2 g of caustic soda in 10 ml of water, and add 1.44 g of 5-amidinothiomethyl-4-chloro 3-hydroxyisoxazole hydrobromide to this solution.
g was added and heated to 60°C to dissolve. After cooling to room temperature, it was made acidic with 2N sulfuric acid, extracted five times with 10 ml of diethyl ether, the ether extracts were combined and dried over Glauber's salt, the solvent was distilled off, and the residue was chromatographed on silica gel using hexane: Elution was carried out with diethyl ether = 1:1, and the solvent was distilled off from the eluate to obtain 3-hydroxy-4 with a melting point of 104-105°C.
0.71 g (yield: 85.5%) of crystals of -chloro-5-mercaptomethylisoxazole was obtained. Example 4 Dissolve 0.36g of carbonated soda in 20ml of methanol,
To this solution, 419 mg of 5-amidinothiomethyl-3-hydroxy)isoxazole hydrochloride was added and dissolved, and then 190 mg of methallyl chloride was added and stirred at room temperature for 1 hour. Distill the solvent and collect 30ml of the residue.
After dissolving in water, adjusting the pH to about 2 with 2N sulfuric acid, extracting twice with 10 ml of diethyl ether,
The ether extracts were combined, dried over Glauber's salt, the solvent was distilled off, and the residue was purified through a silica gel column eluting with hexane:diethyl ether = 1:1. When the solvent was distilled off from the eluate, the melting point was 88-89. 332 mg (yield: 89.7%) of crystals of 3-hydroxy-5-methallylthiomethylisoxazole were obtained. Example 5 To a solution of 0.73 g of 3-hydroxy-5-methylthiomethylisoxazole in 15 ml of methylene chloride, a solution of 1.02 g of 85% methachloroperbenzoic acid in 10 ml of methylene chloride was added over 10 minutes while stirring on ice, and the mixture was further heated to room temperature. The mixture was stirred for 3 hours. 5 g of chromatographic silica gel was added to the reaction mixture, the solvent was distilled off, and the residue was loaded onto a silica gel column and first eluted with diethyl ether to remove methachlorobenzoic acid, then acetone, and the solvent was removed from the eluate. is distilled off, a brown oil is obtained, which is crystallized by adding a mixed solvent of benzene:acetone = 10:1, and then recrystallized from the same mixed solvent to give a slightly yellow needle with a melting point of 96-97℃. 0.66 g (yield: 81.9%) of 3-hydroxy-5-methylsulfinylmethylisoxazole crystals were obtained. Reference example 1 0.8 g of thiourea was dissolved in 30 ml of acetone, and 1.96 g of 5-bromomethyl-4-chloro-3-hydroxyisoxazole was added to this solution, followed by stirring at room temperature for 4.5 hours. The precipitated crystals were vortexed, washed with 30 ml of acetone, and dried to give 2.66 g (yield) of the desired product with a melting point of 171°C (decomposition).
100%) was obtained. According to the method of Reference Example 1, the following compound was produced.
【表】
参考例 2
3−ヒドロオキシ−5−メチルチオメチルイソ
オキサゾール3.59gとジメチルカルバモイルクロ
リド2.2gを55mlのベンゼンに溶解し、この溶液
に室温で撹拌下に2.5gのトリエチレンジアミン
の40mlベンゼン溶液を3分間かけて滴下し、更に
室温で1時間撹拌した。渦してトリエチレンジ
アミン・塩酸塩を除き、液より溶媒を留去して
残留物をシリカゲルカラムにより、ベンゼン:ア
セトン=10:1で溶出して精製し、溶出液より溶
媒を留去すると、n21 D1.5221の3−ジメチルカル
バモイルオキシ−4−クロル−5−メチルチオメ
チルイソオキサゾールの無色油状物4.67g(収率
93.2%)が得られた。
参考例2の方法に準じて、次の化合物を製造し
た。
[Table] Reference example 2 3.59 g of 3-hydroxy-5-methylthiomethylisoxazole and 2.2 g of dimethylcarbamoyl chloride were dissolved in 55 ml of benzene, and a solution of 2.5 g of triethylenediamine in 40 ml of benzene was added dropwise to this solution over 3 minutes while stirring at room temperature. The mixture was further stirred at room temperature for 1 hour. The triethylenediamine hydrochloride was removed by vortexing, the solvent was distilled off from the solution, the residue was purified by eluting with benzene:acetone=10:1 through a silica gel column, and the solvent was distilled off from the eluate. 21 D 1.5221 3-dimethylcarbamoyloxy-4-chloro-5-methylthiomethylisoxazole 4.67 g colorless oil (yield
93.2%) was obtained. According to the method of Reference Example 2, the following compound was produced.
【表】【table】
【表】【table】
【表】【table】
【表】
試験例
イネムレ苗防除試験
供試化合物を2%粉剤に調製し、PH6.0の洪積
火山灰土壌(黒ボク)に有効成分として、対土
40ppmとなるように混和した。別にイネ種子(品
種ニホンバレ)を流水中に5日間浸漬した後、30
℃に一夜置いて催芽させた。前記の供試化合物混
和土壌を育苗箱(タテ60cm、ヨコ30cm、深さ3
cm)に入れ、催芽種子を1箱当り120g(乾燥種
子換算)播種した。播種覆土後2日間32℃室に置
いて出芽させた後10°〜25℃温室内で5日間、つ
づいて0°(夜間)〜35℃(昼間)のビニールハウ
ス内で28日間育苗し、経時的にムレ苗の発生面積
を調査した。また、イネ苗の生育抑制制度は播種
後3週目に調査した。[Table] Test example Rice seedling control test The test compound was prepared as a 2% powder and applied as an active ingredient to diluvial volcanic ash soil (Kuroboku) with a pH of 6.0.
It was mixed to a concentration of 40 ppm. Separately, rice seeds (variety Nihonbare) were soaked in running water for 5 days, and then
The seeds were left at ℃ overnight to germinate. The soil mixed with the above test compound was placed in a seedling box (60 cm vertically, 30 cm horizontally, 3 cm deep).
cm), and 120 g (in terms of dry seeds) of germinated seeds were sown per box. After sowing and covering with soil, seedlings were placed in a room at 32℃ for 2 days to allow them to germinate, then raised in a greenhouse at 10℃ to 25℃ for 5 days, then in a plastic greenhouse at 0℃ (nighttime) to 35℃ (daytime) for 28 days. The area where stuffy seedlings appeared was investigated. In addition, the growth suppression system for rice seedlings was investigated 3 weeks after sowing.
Claims (1)
し、R2は水素原子、アルキル基、低級アルケニ
ル基、低級アルキニル基、シクロアルキル基、置
換基を有してもよいアラルキル基または置換基を
有してもよいアリール基を示し、Aは硫黄原子、
スルフイニル基またはスルホニル基を示す。)を
有する3−ヒドロオキシイソオキサゾール誘導体
またはその塩。 2 式 (式中、R1は水素原子またはハロゲン原子を示
す。)を有する5−アミジノチオメチルイソオキ
サゾール誘導体の酸付加塩に、塩基の存在下、 式 R2Y または(R2)2SO4 (式中、R2は水素原子、アルキル基、低級アル
ケニル基、低級アルキニル基、シクロアルキル
基、置換基を有してもよいアラルキル基または置
換基を有してもよいアリール基を示し、Yはハロ
ゲン原子を示す。)を有するハライドまたは硫酸
ジエステルを反応させることを特徴とする、 式 (式中、R1およびR2は前述したものと同じ。)を
有するイソオキサゾール誘導体またはその塩の製
法。[Claims] 1 formula (In the formula, R 1 represents a hydrogen atom or a halogen atom, and R 2 represents a hydrogen atom, an alkyl group, a lower alkenyl group, a lower alkynyl group, a cycloalkyl group, an aralkyl group that may have a substituent, or a substituent. Indicates an optional aryl group, A is a sulfur atom,
Indicates a sulfinyl group or a sulfonyl group. ) or a salt thereof. 2 formulas (In the formula, R 1 represents a hydrogen atom or a halogen atom.) In the presence of a base, an acid addition salt of a 5-amidinothiomethylisoxazole derivative having the formula R 2 Y or (R 2 ) 2 SO 4 ( In the formula, R2 represents a hydrogen atom, an alkyl group, a lower alkenyl group, a lower alkynyl group, a cycloalkyl group, an aralkyl group that may have a substituent or an aryl group that may have a substituent, and Y is (representing a halogen atom), characterized by reacting a halide or sulfuric acid diester with (In the formula, R 1 and R 2 are the same as those described above.) A method for producing an isoxazole derivative or a salt thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7779282A JPS58194868A (en) | 1982-05-10 | 1982-05-10 | Isoxazole derivative and preparation thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7779282A JPS58194868A (en) | 1982-05-10 | 1982-05-10 | Isoxazole derivative and preparation thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58194868A JPS58194868A (en) | 1983-11-12 |
| JPH0357898B2 true JPH0357898B2 (en) | 1991-09-03 |
Family
ID=13643832
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7779282A Granted JPS58194868A (en) | 1982-05-10 | 1982-05-10 | Isoxazole derivative and preparation thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58194868A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5592309A (en) * | 1986-05-02 | 1997-01-07 | Scitex Corporation Ltd. | Multiple lens separation scanner |
-
1982
- 1982-05-10 JP JP7779282A patent/JPS58194868A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58194868A (en) | 1983-11-12 |
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