JPH0363573U - - Google Patents
Info
- Publication number
- JPH0363573U JPH0363573U JP12338189U JP12338189U JPH0363573U JP H0363573 U JPH0363573 U JP H0363573U JP 12338189 U JP12338189 U JP 12338189U JP 12338189 U JP12338189 U JP 12338189U JP H0363573 U JPH0363573 U JP H0363573U
- Authority
- JP
- Japan
- Prior art keywords
- shutter
- reaction chamber
- entrance
- exit
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案の一実施例である膜形成用反応
装置の垂直断面図、第２図はその反応装置のシヤ
ツタ系付近の拡大図である。
１……反応室、５……基板、７……基板出入口
、８……シヤツタ、９……Ｏリング、１６……シ
ヤツタークリーナ。
FIG. 1 is a vertical sectional view of a film-forming reaction apparatus according to an embodiment of the present invention, and FIG. 2 is an enlarged view of the vicinity of the shutter system of the reaction apparatus. 1... Reaction chamber, 5... Substrate, 7... Substrate entrance/exit, 8... Shutter, 9... O-ring, 16... Shutter cleaner.
Claims (1)
応室、前記反応室内に設けられた放電電極、前記
反応室の基板出入口に設けられ、出入口を開閉す
るシヤツタ、前記シヤツタの開閉作動範囲内に設
けられ、シヤツタの開閉動作時にシヤツタの出入
口側の面をクリーニングするシヤツタークリーナ
、を備えたことを特徴とする膜形成用反応室。 A reaction chamber having a gas inlet, an exhaust port, and a substrate entrance/exit, a discharge electrode provided in the reaction chamber, a shutter provided at the substrate entrance/exit of the reaction chamber to open and close the entrance, and a shutter provided within the opening/closing operation range of the shutter. A reaction chamber for film formation, characterized in that it is equipped with a shutter cleaner that cleans the entrance/exit side surface of the shutter during opening/closing operations of the shutter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12338189U JPH0627651Y2 (en) | 1989-10-20 | 1989-10-20 | Film forming reactor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12338189U JPH0627651Y2 (en) | 1989-10-20 | 1989-10-20 | Film forming reactor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0363573U true JPH0363573U (en) | 1991-06-20 |
| JPH0627651Y2 JPH0627651Y2 (en) | 1994-07-27 |
Family
ID=31671362
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12338189U Expired - Lifetime JPH0627651Y2 (en) | 1989-10-20 | 1989-10-20 | Film forming reactor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0627651Y2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013539209A (en) * | 2010-08-02 | 2013-10-17 | ビーコ・インストゥルメンツ・インコーポレイテッド | Exhaust system for CVD reactor |
| US9388493B2 (en) | 2013-01-08 | 2016-07-12 | Veeco Instruments Inc. | Self-cleaning shutter for CVD reactor |
| US9938621B2 (en) | 2010-12-30 | 2018-04-10 | Veeco Instruments Inc. | Methods of wafer processing with carrier extension |
-
1989
- 1989-10-20 JP JP12338189U patent/JPH0627651Y2/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013539209A (en) * | 2010-08-02 | 2013-10-17 | ビーコ・インストゥルメンツ・インコーポレイテッド | Exhaust system for CVD reactor |
| US9938621B2 (en) | 2010-12-30 | 2018-04-10 | Veeco Instruments Inc. | Methods of wafer processing with carrier extension |
| US10167554B2 (en) | 2010-12-30 | 2019-01-01 | Veeco Instruments Inc. | Wafer processing with carrier extension |
| US9388493B2 (en) | 2013-01-08 | 2016-07-12 | Veeco Instruments Inc. | Self-cleaning shutter for CVD reactor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0627651Y2 (en) | 1994-07-27 |
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