JPH0363578U - - Google Patents
Info
- Publication number
- JPH0363578U JPH0363578U JP12062589U JP12062589U JPH0363578U JP H0363578 U JPH0363578 U JP H0363578U JP 12062589 U JP12062589 U JP 12062589U JP 12062589 U JP12062589 U JP 12062589U JP H0363578 U JPH0363578 U JP H0363578U
- Authority
- JP
- Japan
- Prior art keywords
- plating liquid
- return pipe
- temporarily retained
- discharge port
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 22
- 238000007747 plating Methods 0.000 claims description 19
- 230000000717 retained effect Effects 0.000 claims description 5
- 230000014759 maintenance of location Effects 0.000 claims description 2
- 238000009713 electroplating Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Details Of Reciprocating Pumps (AREA)
- Electroplating Methods And Accessories (AREA)
Description
第1図は本考案のメツキ液循環タンクの戻り管
構造の縦断面図、第2図は第1図の−断面図
である。第3図は電気メツキラインにおけるメツ
キ液の循環系の全体説明図、第4図は従来のメツ
キ液循環タンクの戻り管構造の縦断面図、第5図
は第4図のY−Y断面図である。
1……メツキ循環タンク、2……吸引管、3…
…ポンプ、4……メツキセル、5……受けパン、
6……戻り管、7……滞留メツキ液、8……タン
ク側壁、9……タンク側壁、10……タンク底壁
、11……タンク側壁、12……タンク側壁、1
3……吸引口、14……吐出口、15……メツキ
液面、16……衝突板、17……支持棒、18…
…筒体、19……支持棒、20……吐出口、21
……滞留室。
FIG. 1 is a vertical cross-sectional view of the return pipe structure of the plating liquid circulation tank of the present invention, and FIG. 2 is a cross-sectional view taken from FIG. Fig. 3 is an overall explanatory diagram of the plating liquid circulation system in the electric plating line, Fig. 4 is a vertical cross-sectional view of the return pipe structure of a conventional plating liquid circulation tank, and Fig. 5 is a Y-Y cross-sectional view of Fig. 4. be. 1...Metsuki circulation tank, 2...Suction pipe, 3...
...Pump, 4...Metsukicell, 5...Ukepan,
6... Return pipe, 7... Retained plating liquid, 8... Tank side wall, 9... Tank side wall, 10... Tank bottom wall, 11... Tank side wall, 12... Tank side wall, 1
3... Suction port, 14... Discharge port, 15... Metering liquid level, 16... Collision plate, 17... Support rod, 18...
... Cylindrical body, 19 ... Support rod, 20 ... Discharge port, 21
...Retention room.
Claims (1)
の一端部の側壁の底面近傍に一時滞留メツキ液の
吸引管の吸引口が配設され、他端部の側壁近傍に
気泡を含むメツキ液の吐出口が一時滞留メツキ液
の液面と間隙を存して位置するように上記メツキ
液の戻り管が垂直に配設されてなる電気メツキ液
循環系のメツキ液循環タンクのメツキ液戻り管構
造において、 上記戻り管の吐出口と一時滞留メツキ液の液面
との間に戻り管より吐出するメツキ液が衝突する
衝突板を配置すると共に上端部内周面がメツキ液
の戻り管の下端部の外周面並びに上記衝突板の外
周面と間隙を存して位置し、下端部が一時滞留メ
ツキ液面下に位置するように筒体を配置して衝突
板外周面と筒体内周面との間に戻り管の吐出口断
面積よりも大きな吐出断面積の吐出口を形成する
と共に衝突板上方の筒体内周と戻り管外周との間
にメツキ液の一時滞留室を形成したことを特徴と
する電気メツキ液循環系のメツキ液循環タンクの
メツキ液戻り管構造。[Scope of Claim for Utility Model Registration] A suction port of a suction pipe for the temporarily retained plating liquid is provided near the bottom of the side wall at one end in the horizontal direction of a horizontally arranged plating liquid circulation tank, and near the side wall at the other end. A plating liquid circulation tank of an electroplating liquid circulation system in which a return pipe for the plating liquid is arranged vertically so that the discharge port of the plating liquid containing air bubbles is located with a gap from the surface of the temporarily retained plating liquid. In this plating liquid return pipe structure, a collision plate with which the plating liquid discharged from the return pipe collides is arranged between the discharge port of the return pipe and the liquid level of the temporarily retained plating liquid, and the inner circumferential surface of the upper end is arranged so that the plating liquid collides with it. The cylindrical body is positioned with a gap between the outer circumferential surface of the lower end of the return pipe and the outer circumferential surface of the above-mentioned collision plate, and the cylindrical body is arranged so that the lower end is located below the surface of the temporarily retained plating liquid. A discharge port with a discharge cross-sectional area larger than the discharge cross-sectional area of the return pipe is formed between the inner circumference of the body and a temporary retention chamber for the plating liquid between the inner circumference of the cylinder above the collision plate and the outer circumference of the return pipe. The plating liquid return pipe structure of the plating liquid circulation tank of the electroplating liquid circulation system is characterized by the following.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12062589U JPH0638115Y2 (en) | 1989-10-17 | 1989-10-17 | Electrolytic plating liquid circulation system plating liquid circulation tank plating liquid return pipe structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12062589U JPH0638115Y2 (en) | 1989-10-17 | 1989-10-17 | Electrolytic plating liquid circulation system plating liquid circulation tank plating liquid return pipe structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0363578U true JPH0363578U (en) | 1991-06-20 |
| JPH0638115Y2 JPH0638115Y2 (en) | 1994-10-05 |
Family
ID=31668695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12062589U Expired - Lifetime JPH0638115Y2 (en) | 1989-10-17 | 1989-10-17 | Electrolytic plating liquid circulation system plating liquid circulation tank plating liquid return pipe structure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0638115Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024537957A (en) * | 2022-10-18 | 2024-10-18 | 深▲セン▼金美新材料科技有限公司 | Electroplating tank and electroplating production line having side walls for guiding plating solution |
-
1989
- 1989-10-17 JP JP12062589U patent/JPH0638115Y2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024537957A (en) * | 2022-10-18 | 2024-10-18 | 深▲セン▼金美新材料科技有限公司 | Electroplating tank and electroplating production line having side walls for guiding plating solution |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0638115Y2 (en) | 1994-10-05 |