JPH0363928U - - Google Patents
Info
- Publication number
- JPH0363928U JPH0363928U JP12635789U JP12635789U JPH0363928U JP H0363928 U JPH0363928 U JP H0363928U JP 12635789 U JP12635789 U JP 12635789U JP 12635789 U JP12635789 U JP 12635789U JP H0363928 U JPH0363928 U JP H0363928U
- Authority
- JP
- Japan
- Prior art keywords
- hole
- sealed space
- mask
- exposure
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Description
第１図は本考案に係る露光装置の実施例を示す
要部側断面図、第２図は従来の露光装置の一具体
例を示す要部側断面図である。
１……吸着ステージ、２……マスクホルダ、２
ｂ……排気孔、２ｄ……吹き付け孔、４……被露
光体、５……露光マスク、Ｓ……密閉空間。
FIG. 1 is a sectional side view of a main part showing an embodiment of an exposure apparatus according to the present invention, and FIG. 2 is a sectional side view of a main part showing a specific example of a conventional exposure apparatus. 1...Adsorption stage, 2...Mask holder, 2
b...exhaust hole, 2d...blow hole, 4...exposed object, 5...exposure mask, S...closed space.
Claims (1)
支持した吸着ステージと、上記被露光体より大径
の貫通穴を有し、上記貫通穴を塞ぐように露光マ
スクを保持すると共に、上記吸着ステージと貫通
穴内側壁と露光マスクとで密閉空間を形成するマ
スクホルダと、上記マスクホルダに穿設され、そ
の内側壁より密閉空間内の空気を排出させる排気
孔と、上記マスクホルダに穿設され、その内側壁
より密閉空間内に窒素を吹き付ける吹き付け孔と
を具備し、上記密閉空間内の空気を窒素と置換し
てマスクを介し被露光体を露光する露光装置にお
いて、 上記密閉空間内に吹き付けられる窒素が被露光
体に直接、当たらないように上記吹き付け孔を形
成したことを特徴とする露光装置。[Scope of claim for utility model registration] Adsorption and
The supported suction stage has a through hole larger in diameter than the exposed object, holds an exposure mask so as to close the through hole, and forms a sealed space between the suction stage, the inner wall of the through hole, and the exposure mask. a mask holder to be formed; an exhaust hole bored in the mask holder to exhaust air in the sealed space from the inner wall thereof; and a blowing hole bored in the mask holder to blow nitrogen into the sealed space from the inner wall. In an exposure apparatus that exposes an exposed object through a mask by replacing the air in the sealed space with nitrogen, the exposure apparatus is equipped with a hole, and the exposure apparatus is configured such that the nitrogen blown into the sealed space does not directly hit the exposed object. An exposure device characterized in that the above-mentioned spray holes are formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12635789U JPH0363928U (en) | 1989-10-26 | 1989-10-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12635789U JPH0363928U (en) | 1989-10-26 | 1989-10-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0363928U true JPH0363928U (en) | 1991-06-21 |
Family
ID=31674171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12635789U Pending JPH0363928U (en) | 1989-10-26 | 1989-10-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0363928U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010040831A (en) * | 2008-08-06 | 2010-02-18 | Orc Mfg Co Ltd | Exposing method for substrate in exposing device |
-
1989
- 1989-10-26 JP JP12635789U patent/JPH0363928U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010040831A (en) * | 2008-08-06 | 2010-02-18 | Orc Mfg Co Ltd | Exposing method for substrate in exposing device |
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