JPH0364062B2 - - Google Patents

Description

[Detailed description of the invention]

[Industrial Field of Application] The present invention relates to a light-receiving member that is sensitive to electromagnetic waves such as light (here, light in a broad sense refers to ultraviolet rays, visible rays, infrared rays, X-rays, γ-rays, etc.). More specifically, the present invention relates to a light receiving member suitable for using coherent light such as laser light. [Prior Art] As a method of recording digital image information as an image, an electrostatic latent image is formed by optically scanning a light-receiving member with a laser beam modulated according to the digital image information, and then the latent image is A well-known method is to record an image by performing processing such as development, transfer and fixing as necessary. In particular, in image forming methods using electrophotography, small and inexpensive He-Ne lasers or semiconductor lasers (usually with an emission wavelength of 650 to 820 nm) are used as lasers.
It is common to record images using . In particular, as a light-receiving material for electrophotography that is suitable when using a semiconductor laser, in addition to the fact that the consistency of the photosensitivity region is much better than that of other types of light-receiving materials, the Vickers hardness is is high,
In terms of being non-polluting from a social perspective, for example,
Amorphous materials containing silicon atoms (hereinafter referred to as "A
-Si") is attracting attention. However, if the photosensitive layer is a single-layer A-Si layer, in order to maintain its high photosensitivity and ensure the dark resistance of 10 ¹² Ωcm or more required for electrophotography, hydrogen atoms and halogen Since it is necessary to structurally contain atoms or boron atoms in addition to these atoms in a specific amount range in a controlled manner in the layer, it is necessary to strictly control the layer formation, etc.
There are considerable limitations on the tolerances in the design of light receiving members. Examples of systems that can expand this design tolerance and make effective use of high light sensitivity even with clogging and a certain degree of low dark resistance include JP-A-54-121743 and JP-A-Sho. As described in Japanese Patent Application Laid-open No. 57-4053 and Japanese Patent Application Laid-open No. 57-4172, the photoreceptive layer is formed into a two or more layered structure in which layers with different conductivity characteristics are laminated to form a depletion layer inside the photoreceptive layer. or JP-A-57-52178, JP-A No. 52179, JP-A No. 57-52178,
As described in Patent Publications No. 52180, No. 58159, No. 58160, and No. 58161, a photoreceptive layer is provided between the support and the photosensitive layer, or/and a barrier layer is provided on the upper surface of the photosensitive layer. A light-receiving member with increased apparent dark resistance, such as a multilayer structure, has been proposed. Through such proposals, A-Si light-receiving members have made dramatic progress in terms of commercialization design tolerances, ease of manufacturing management, and productivity, and have become commercially viable. The speed of development towards this is accelerating. When laser recording is performed using a light-receiving member with such a multilayered light-receiving layer, the thickness of each layer is uneven, and the laser light is coherent monochromatic light, so the light-receiving layer is Reflected from the free surface of the laser beam irradiation side, each layer constituting the light-receiving layer, and the layer interface between the support and the light-receiving layer (hereinafter, both the free surface and the layer interface are collectively referred to as the "interface"). There is a possibility that each of the reflected lights may cause interference. This interference phenomenon appears as a so-called interference fringe pattern in the formed visible image and becomes a cause of image defects. Particularly when forming a half-tone image with high gradation, the image becomes noticeably unsightly. Furthermore, as the wavelength range of the semiconductor laser light used becomes longer, the absorption of the laser light in the photosensitive layer decreases, so the above-mentioned interference phenomenon becomes remarkable. This point will be explained with reference to the drawings. FIG. 1 shows light I ₀ incident on a certain layer constituting the light-receiving layer of a light-receiving member, reflected light R ₁ reflected at the upper interface 102, and reflected light R ₂ reflected at the lower interface 101.
It shows. The average layer thickness of the layer is d, the refractive index is n, and the wavelength of light is λ.
If the thickness of a certain layer is uneven with a gradual thickness difference of λ/2n or more, the reflected light R ₁ and R ₂ will be 2nd =
mλ (m is an integer, reflected light strengthens each other) and 2nd=
Depending on which of the following conditions (m+1/2)λ (m is an integer, reflected light weakens each other) is met, the amount of absorbed light and transmitted light of a certain layer changes. In a light-receiving member having a multilayer structure, the interference effect shown in FIG. 1 occurs in each layer, and as shown in FIG. 2, a synergistic adverse effect occurs due to each interference. Therefore, interference fringes corresponding to the interference fringe pattern appear in the visible image transferred and fixed onto the transfer member, causing a defective image. To overcome this inconvenience, diamond cutting the surface of the support allows for
A method of forming a light-scattering surface by providing unevenness (for example, Japanese Patent Application Laid-Open No. 162975/1982), treating the surface of an aluminum support with black alumite, or dispersing carbon, coloring pigments, or dyes in a resin. (for example, Japanese Patent Laid-Open No. 57-165845), the surface of the aluminum support is treated with satin-like alumite, or the surface of the support is provided with fine roughness in the form of grains by sandblasting. A method of providing a light scattering and anti-reflection layer (for example, Japanese Patent Application Laid-open No. 1983-1999)
16554) etc. have been proposed. However, with these conventional methods, it has not been possible to completely eliminate the interference fringe pattern appearing on the image. In other words, in the first method, only a large number of irregularities of a specific size are provided on the surface of the support, so although it is true that the appearance of interference fringes due to light scattering effects is prevented, as for light scattering, Since the specularly reflected light component still exists, in addition to the remaining interference fringe pattern due to the specularly reflected light, the irradiation spot spreads due to the light scattering effect on the support surface, resulting in a substantial This was a cause of a decrease in resolution. The second method is at the level of black alumite treatment,
Complete absorption is impossible, and the light reflected on the surface of the support remains. In addition, when a colored pigment dispersed resin layer is provided, when forming an A-Si photosensitive layer, a degassing phenomenon occurs from the resin layer, and the quality of the formed photosensitive layer is significantly deteriorated. Inconveniences such as being damaged by plasma during the formation of the Si-based photosensitive layer, reducing its original absorption function, and adversely affecting the subsequent formation of the A-Si-based photosensitive layer due to deterioration of the surface condition. has. In the case of the third method in which the surface of the support is irregularly roughened, as shown in _FIG .
The _remaining light enters the light receiving layer 302 and becomes transmitted light _I1 . The transmitted light I ₁ is transmitted through the support 30
2, part of it is scattered and becomes diffused light K ₁ , K ₂ , K ₃ ..., the rest is specularly reflected and becomes reflected light R ₂ , and part of it becomes emitted light R ₃ and goes outside. Therefore, since the emitted light R ₃ that interferes with the reflected light R ₁ remains, the interference fringe pattern still cannot be completely erased. Furthermore, if the diffusivity of the surface of the support 301 is increased in order to prevent interference and multiple reflections inside the light-receiving layer, the resolution will decrease because light will diffuse within the light-receiving layer and cause halation. There was also the drawback of doing so. In particular, in a multilayered light receiving member, the fourth
As shown in the figure, even if the surface of the support 401 is irregularly roughened, the reflected light R ₂ on the first layer 402, the reflected light R ₁ on the second layer, and the regular reflection light on the surface of the support 401. _R3
interfere with each other, and an interference fringe pattern is produced depending on the thickness of each layer of the light-receiving member. Therefore, in a light-receiving member having a multilayer structure, it has been impossible to completely prevent interference fringes by irregularly roughening the surface of the support 401. Furthermore, when the surface of the support is irregularly roughened by a method such as sandblasting, the degree of roughness varies greatly between lots, and even within the same lot, the degree of roughness is uneven. , there was a problem with manufacturing management. In addition, relatively large protrusions are frequently formed randomly, and such large protrusions cause local breakdown of the photoreceptive layer. Furthermore, if the surface of the support 501 is simply roughened regularly, as shown in FIG. and photoreceptive layer 502
becomes parallel to the uneven slope surface. Therefore, in that part, the incident light 2nd ₁ =mλ or 2nd ₁ =(m+1/2)λ is established, and becomes a bright part or a dark part, respectively. In addition, there is non-uniformity in the layer thickness in the entire photoreceptive layer, such that the maximum difference between the layer thicknesses d ₁ , d ₂ , d ₃ , and d ⁴ of the photoreceptor layer is λ/2n or more. A pattern of light and dark stripes appears. Therefore, simply by regularly roughening the surface of the support 501, it is not possible to completely prevent the occurrence of interference fringes. Furthermore, even when a multi-layered light-receiving layer is deposited on a support whose surface is regularly roughened, the specularly reflected light on the surface of the support as explained for the single-layered light-receiving member in FIG. In addition to the interference with the reflected light on the surface of the light-receiving layer, interference due to the reflected light at the interface between each layer is added, so that the degree of interference fringe pattern development becomes more complicated than that of a light-receiving member with a single-layer structure. [Object of the Invention] An object of the present invention is to provide a novel support for a light-sensitive light-receiving member, which eliminates the above-mentioned drawbacks, and a light-receiving member having the support. Another object of the present invention is to provide a support for a light-receiving member that is suitable for image formation using coherent monochromatic light and is easy to control, and a light-receiving member using the support. Still another object of the present invention is to provide a light-receiving member that can simultaneously and completely eliminate the interference fringe pattern that appears during image formation and the appearance of spots during reversal development. Another object of the present invention is to provide a light-receiving member that allows digital image recording using electrophotography, especially digital image recording with halftone information, to be performed clearly and with high resolution and quality. Yet another object of the present invention is high photosensitivity,
Another object of the present invention is to provide a light-receiving member having high signal-to-noise ratio characteristics and good electrical contact with the support. [Summary of the Invention] The support for a light-receiving member of the present invention comprises periodic,
A cylindrical support having a convex portion forming a spiral structure is characterized in that the cross-sectional shape of the convex portion taken along a plane including the central axis is a convex shape in which a main peak and a sub-peak are superimposed. Further, in the light-receiving member of the present invention, the cross-sectional shape of the convex portion cut along a plane including the central axis of the cylindrical support having the convex portions forming a periodic, spiral structure has a main peak and a sub-peak superimposed. It is characterized by having a support having a convex shape, and a light-receiving layer in which at least a part of the layer region is photosensitive. The present invention will be specifically described below with reference to the drawings. FIG. 6 is an explanatory diagram for explaining the basic principle of the present invention. The present invention provides a multilayer photoreceptive layer having one or more photosensitive layers on a support (not shown) having an uneven shape smaller than the required resolution of the device, along the slope of the unevenness. As shown in the enlarged part of FIG. 6, since the layer thickness of the second layer 602 changes continuously from _d5 to _d6 , the interface 603 and the interface 604
and have a tendency toward each other. Therefore, the coherent light incident on the minute portion (short range) 1 causes interference in the minute portion 1, producing a minute interference fringe pattern. Moreover, as shown in FIG. 7, the first layer 701 and the second layer 7
02 interface 703 and the free surface 70 of the second layer 702
4 are non-parallel, as shown in A in FIG. 7, the traveling directions of the reflected light R ₁ and the emitted light R ₃ for the incident light I ₀ are different from each other, so that the interfaces 703 and 704 are parallel. (The degree of interference is reduced compared to ``B'' in Figure 7. Therefore, as shown in ``C'' in Figure 7, when a pair of interfaces are parallel, the relationship is less parallel than in ``B''. In the case of "A", even if there is interference, the difference in brightness of the interference fringe pattern will be negligible.As a result, the amount of incident light in the minute portion will be averaged.This is shown in Figure 6. , the second layer 602
The same can be said even if the layer thickness is macroscopically non-uniform (d ₇ ≠ d ₈ ), so the amount of incident light becomes uniform in the entire layer area (see "D" in Figure 6). To describe the effects of the present invention when coherent light is transmitted from the irradiation side to the second layer in a multilayer structure, as shown in _FIG. Then, the reflected light R ₁ , R ₂ , R ₃ , R ₄ ,
_R5 exists. Therefore, in each layer what has been explained above with reference to FIG. 7 occurs. Moreover, each layer interface within the micro-section acts as a kind of slit, where diffraction development occurs. Therefore, the effect of interference in each layer appears as a product of interference due to the difference in layer thickness and interference due to diffraction at the layer interface. Therefore, when considering the entire photoreceptive layer, interference is a synergistic effect in each layer, so according to the present invention, as the number of layers constituting the photoreceptive layer increases, the interference effect is further prevented. I can do it. Further, interference fringes generated within a minute portion do not appear in the image because the size of the minute portion is smaller than the irradiation light spot diameter, that is, smaller than the resolution limit. Further, even if it appears in the image, it will not cause any substantial trouble because it is below the resolution of the eye. In the present invention, it is preferable that the uneven inclined surface has a mirror finish in order to reliably align the reflected light in one direction. The size l (one period of the uneven shape) of the minute portion suitable for the present invention satisfies l≦L, where L is the spot diameter of the irradiated light. In addition, in order to more effectively achieve the object of the present invention, the difference in layer thickness (d ₅ - d ₆ ) in the minute portion l is expressed as d ₅ - _{d 6} ≧λ, where λ is the wavelength of the irradiated light. /2n (n: refractive index of the second layer 602). In the present invention, within the layer thickness of a microscopic portion l of a multilayered photoreceptive layer (hereinafter referred to as a "microcolumn"), at least any two layer interfaces are in a non-parallel relationship. The layer thickness of each layer is controlled within the microcolumn, but if this condition is satisfied, any two layer interfaces may be in a parallel relationship within the microcolumn. However, the layers forming the parallel layer interface can be any two layers.
It is desirable that the layer be formed to have a uniform layer thickness over the entire region so that the difference in layer thickness at two positions is λ/2n (n: refractive index of the layer) or less. A photosensitive layer constituting a photoreceptive layer, a charge injection prevention layer,
In order to achieve the present invention more effectively and easily in forming each layer such as a barrier layer made of an electrically insulating material,
Plasma vapor phase method (PCVD method), optical CVD method, thermal CVD method because layer thickness can be precisely controlled at optical level
law is adopted. As methods for processing the support to achieve the objects of the present invention, chemical methods such as chemical etching and electroplating, physical methods such as vapor deposition and sputtering, and mechanical methods such as lathe processing can be used. However, in order to easily manage production, a mechanical processing method such as a lathe is preferred. For example, when machining a support with a lathe, a cutting tool having a V-shaped cutting edge is fixed in a predetermined position of a cutting machine such as a milling machine or a lathe, and the cylindrical support is machined in advance in accordance with the desired design. By regularly moving in a predetermined direction while rotating according to a program, the surface of the support is accurately cut to form a desired uneven shape, pitch, and depth. The linear protrusion created by the unevenness formed by such a cutting method has a spiral structure centered on the central axis of the cylindrical support. The helical structure of the protrusion may be a double or triple helical structure, or a crossed helical structure. Alternatively, a slow line structure along the central axis may be introduced in addition to the spiral structure. In order to enhance the effects of the present invention and to facilitate processing control, it is preferable that the convex portions within a predetermined cross section of the support of the present invention have the same shape in a linear approximation. Further, the convex portions are preferably arranged regularly or periodically in order to enhance the effects of the present invention. Further, it is preferable that the convex portion has a plurality of sub-peaks in order to further enhance the effect of the present invention and improve the adhesion between the light-receiving layer and the support. In addition to each of these, in order to efficiently scatter incident light in one direction, the convex portions are unified into a symmetrical shape (FIG. 9A) or an asymmetrical shape (FIG. 9B) around the main peak. It is preferable that However, in order to increase the degree of freedom in controlling the processing of the support, it is better to have both of them mixed together. In the present invention, each dimension of the irregularities provided on the surface of the support in a controlled manner is set in such a way that the object of the present invention can be achieved as a result, taking into account the following points. That is, firstly, the A-Si layer constituting the photosensitive layer is structurally sensitive to the condition of the surface on which the layer is formed, and the layer quality changes greatly depending on the surface condition. Therefore,
It is necessary to set the dimensions of the irregularities provided on the surface of the support so as not to cause deterioration in the layer quality of the A-Si photosensitive layer. Secondly, if the free surface of the photoreceptive layer is extremely uneven, it becomes impossible to perform cleaning completely after image formation. Further, when cleaning the blade, there is a problem that the blade becomes damaged quickly. As a result of examining the above-mentioned problems in layer deposition, process problems in electrophotography, and conditions for preventing interference fringes, the pitch of the recesses on the surface of the support is preferably 500 μm to 0.3 μm, more preferably 200μm
~1 μm, optimally 50 μm to 5 μm. Also, the maximum depth of the recess is preferably 0.1 μm ~
5μm, more preferably 0.3μm to 3μm, optimally
It is desirable that the thickness be 0.6 μm to 2 μm. When the pitch and maximum depth of the recesses on the surface of the support are within the above range, the slope of the slope of the recesses (or linear protrusions) is:
Preferably 1 degree to 20 degrees, more preferably 3 degrees to
It is desirable that the angle be 15 degrees, optimally between 4 degrees and 10 degrees. Further, the maximum difference in layer thickness due to non-uniformity of the layer thickness of each layer deposited on such a support is preferably 0.1 μm to 2 μm, more preferably 0.1 μm within the same pitch.
It is desirable that the thickness be ~1.5 μm, optimally 0.2 μm to 1 μm. Next, specific examples of the multilayered light receiving member according to the present invention will be shown. A light-receiving member 1000 shown in FIG. 10 has a light-receiving layer 1002 on a support surface 1001 whose surface is machined to achieve the object of the present invention. It is composed of a charge injection prevention layer 1003 and a photosensitive layer 1004 from the body 1001 side. The support 1001 may be electrically conductive or electrically insulating. Examples of the conductive support include NiCr, stainless steel, Al.Cr.Mo.Au.Nb.Ta.V.
Examples include metals such as Ti.Pt.Pd and alloys thereof. As the electrically insulating support, films or sheets of synthetic resins such as polyester, polyethylene, polycarbonate, cellulose, acetate, polypropylene, polyvinyl chloride, polyvinylidene chloride, polystyrene, polyamide, glass, ceramic, paper, etc. are usually used. Ru. Preferably, at least one surface of these electrically insulating supports is conductively treated, and another layer is preferably provided on the conductively treated surface side. For example, if the surface is glass, NiCr.Al.
Cr.Mo.Au.Ir.Nb.Ta.V.Ti.Pt.Pd.In ₂ O ₃ .SnO ₂ .ITO
(In ₂ O ₃ +SnO ₂ ) etc., conductivity is imparted by providing a thin film, or if it is a synthetic resin film such as polyester film, NiCr.Al.
A thin film of a metal such as Ag.Pd.Zn.Ni.Au.Cr.Mo.Ir.Nb.Ta.V.Ti.Pt is provided on the surface by vacuum evaporation, electron beam evaporation, sputtering, etc., or The surface is laminated to give it electrical conductivity. The shape of the support body is cylindrical,
It may have any shape such as a belt shape or a plate shape, and the shape is determined depending on the need. For example, if the light receiving member 1000 shown in FIG. 10 is used as an electrophotographic image forming member, continuous copying is possible. In some cases, it is desirable to have an endless belt shape or a cylindrical shape. The thickness of the support is determined as appropriate so that a desired light-receiving member is formed, but when flexibility is required as a light-receiving member, the support can sufficiently function as a support. It is made as thin as possible within this range.
However, in such a case, from the viewpoint of manufacturing and handling of the support, mechanical strength, etc., it is preferable to
It is considered to be 10μ or more. The charge injection prevention layer 1000 is provided for the purpose of preventing charge injection into the photosensitive layer 1004 from the support 1001 side and increasing the apparent resistance. The charge injection prevention layer 1000 is made of A-Si (hereinafter referred to as "A-Si") containing hydrogen atoms and/or halogen atoms X.
It is composed of Si (HX)) and contains a substance C that controls conductivity. Charge injection prevention layer 1
As the substance C that controls conductivity contained in 003, there can be mentioned impurities that are referred to in the semiconductor field, and in the present invention, for Si,
Mention may be made of p-type impurities that provide p-type conductivity and n-type impurities that provide n-type conductivity. Specifically, p-type impurities include atoms belonging to Group 3 of the periodic table (Group atoms), such as B (boron) and Al.
(aluminum), Ga (gallium), In (indium), Tl (thallium), etc., and B.Ga is particularly preferably used. N-type impurities include atoms belonging to the group of the periodic table (group atoms), such as P (phosphorus), As (arsenic), and Sb.
(antimony), Bi (bismuth), etc., and P.As is particularly preferably used. In the present invention, the content of the substance C that controls the conductivity contained in the charge injection prevention layer 1003 is determined according to the required charge injection prevention property or whether the charge injection prevention layer 1003 is directly on the support 1001. When provided in contact with each other, it can be appropriately selected depending on the organic relationship, such as the relationship with the characteristics at the contact interface with the support 1001. In addition, the characteristics of other layer regions provided in direct contact with the charge injection prevention layer and the relationship with the characteristics at the contact interface with the other layer regions are also taken into consideration, and the material that controls the conduction characteristics is selected. The content of is selected as appropriate. In the present invention, the content of the substance controlling conductivity contained in the charge injection prevention layer is preferably 0.001 to 5×10 4 atomic ppm, more preferably 0.001 to 5×10 ⁴ atomic ppm.
0.5 to 1×10 ⁴ atomic ppm, optimally 1 to 5×
It is desirable to set it to 10 ³ atomic ppm. In the present invention, the content of substance C in the charge injection prevention layer 1003 is preferably 30 atomic
ppm or more, more preferably 50 atomic ppm or more, optimally 100 atomic ppm or more,
For example, when the substance C to be contained is the p-type impurity mentioned above, the movement of electrons injected from the support side into the photosensitive layer when the free surface of the photoreceptive layer is subjected to polar charging treatment is more effectively suppressed. It is possible to prevent
In addition, when the substance C to be contained is the n-type impurity, the movement of holes injected from the support side into the photosensitive layer when the free surface of the photoreceptive layer is subjected to polar charging treatment is suppressed. It can be prevented more effectively. The thickness of the charge injection prevention layer 1003 is preferably 30 Å to 10 μm, more preferably 40 Å to 8 μm, and optimally 50 Å to 5 μm. The photosensitive layer 1004 is made of A-Si(HX),
It has both a charge generation function that generates photocarriers by laser light irradiation and a charge transport function that transports the charges. The thickness of the photosensitive layer 1004 is preferably as follows:
It is desirable that the thickness be 1 to 100 μm, more preferably 1 to 80 μm, and optimally 2 to 50 μm. The photosensitive layer 1004 includes a charge injection prevention layer 1003.
The charge injection prevention layer 1003 may contain a substance that controls conductivity with a polarity different from the polarity of the substance that controls the conduction characteristics contained in the charge injection prevention layer 1003. It may be contained in an amount much smaller than the actual amount contained in. In such a case, the content of the substance controlling the conduction properties contained in the photosensitive layer 1004 may be determined as desired depending on the polarity and content of the substance contained in the charge injection prevention layer 1003. It is determined as appropriate, but preferably 0.001~
1000atomic ppm, more preferably 0.05~
500atomic ppm, optimally 0.1-200atomic ppm
It is desirable that this is done. In the present invention, when the charge injection prevention layer 1003 and the photosensitive layer 1004 contain the same kind of substance that controls conductivity, the content in the photosensitive layer 1004 is preferably 30 atomic ppm or less. is desirable. In the present invention, the amount of hydrogen atoms (H), the amount of halogen atoms (X), or the sum of the amounts of hydrogen atoms and halogen atoms (H+X) contained in the charge injection prevention layer 1003 and the photosensitive layer 1004 is preferably is 1~
It is desirable that the content be 40 atomic %, more preferably 5 to 30 atomic %. Examples of the halogen atom (X) include F.Cl.Br.I, and among these, F.Cl is preferred. In the light receiving member shown in FIG. 10, a so-called barrier layer made of an electrically insulating material may be provided instead of the charge injection prevention layer 1003. Alternatively, the barrier layer and the charge injection prevention layer 1003 may be used together. Barrier layer forming materials include Al ₂ O ₃ , SiO ₂ ,
Examples include inorganic electrically insulating materials such as Si ₃ N ₄ and organic electrically insulating materials such as polycarbonate. Another preferred embodiment of the invention is shown in FIG. A light receiving member 1100 for electrophotography shown in FIG. 11 is composed of a conductive layer 1102, a barrier layer 1103, a charge generation layer 1104, and a charge transport layer 1105 on a conductive support 1101 having minute and smooth irregularities. Multilayer structure photoreceptive layer 1106
and has. As the above-mentioned conductive layer 1102, for example, a vapor-deposited film of a conductive metal such as aluminum, tin, or gold, or a film in which conductive powder is dispersed in a resin can be used. The conductive powders used in this case include metal powders such as aluminum, tin, and silver, carbon powders, and conductive pigments mainly made of metal oxides such as titanium oxide, barium sulfate, zinc oxide, and tin oxide. can be mentioned. Moreover, this conductive layer 1
102 can also contain a light absorber. The resin in which the conductive pigment is dispersed must have (1) strong adhesion to the substrate, (2) good powder dispersibility, and (3) sufficient solvent resistance. It can be used as long as it meets the conditions, but especially hardening rubber, polyurethane resin, epoxy resin,
Thermosetting resins such as alkyd resins, polyester resins, silicone resins, and acrylic-melamine resins are suitable. The volume resistivity of the resin in which the conductive pigment is dispersed is suitably 10 ¹³ Ωcm or less, preferably 10 ¹² Ωcm or less. Therefore, it is preferable that the conductive pigment is contained in the coating film in an amount of 10 to 60% by weight. The conductive layer 1102 can contain a surface energy reducing agent such as silicone oil or various surfactants, thereby making it possible to obtain a uniform coating surface with few coating defects. The conductive powder can be dispersed in the resin by conventional methods such as a roll mill, a ball mill, a vibrating ball mill, an attritor, a sand mill, and a colloid mill.
When the substrate is in the form of a sheet, wire bar coating, blade coating, knife coating, roll coating, screen coating, etc. are suitable, and when the substrate is in the form of a cylinder, dip coating is suitable. The conductive material 1102 is generally formed with a film thickness of about 1 μm to 50 μm, preferably about 5 μm to 30 μm, so that the height h of the projections 2 of the conductive substrate 1 can be reduced.
If the diameter is 100 μm or less, surface defects can be sufficiently hidden. A barrier layer 1103 having a barrier function exhibiting an electrical barrier effect and an adhesive function is provided between the conductive layer 1102 and the charge generation layer 1104. The barrier layer 1103 is formed of casein, polyvinyl alcohol, nitrocellulose, ethylene-acrylic acid copolymer, polyamide (nylon 6, nylon 66, nylon 610, copolymerized nylon, alkoxymethylated nylon, etc.), polyurethane, gelatin, etc. can. The layer thickness of the barrier layer 1103 is preferably 0.1μ to
It is desirable that the thickness be 5μ, more preferably 0.5μ to 3μ. The charge generation layer 1104 is made of azo pigments such as Sudan Red, Diane Blue, and Junus Green B, quinone pigments such as alcohol yellow, bilene quinone, and indanthrene brilliant violet RRP, quinocyanine pigments, berylene pigments,
A charge-generating substance selected from indigo pigments such as indigo and thioindigo, bisbenzimidazole pigments such as India First Orange Toner, phthalocyanine pigments such as copper phthalocyanine and aluminol-phthalocyanine, quinacridone pigments and azulene compounds, such as polyester, polystyrene, ,
polyvinyl butyral, polyvinylpyrrolidone,
Methyl cellulose, polyacrylic esters,
It is formed by being dispersed in a binder resin such as cellulose ester. Its thickness is preferably 0.01μm~1μ,
More preferably, it is about 0.05μ to 0.5μ. In addition, the charge transport layer 1105 has a main chain or a side chain containing a polycyclic aromatic compound such as anthracene, pyrene, phenanthrene, coronene, or indole, carbazole, oxazole, isoxazole, thiazole, imidazole, pyrazole, oxadiazole, pyrazoline, or thiadiazole. It is formed by dissolving a hole-transporting substance such as a compound having a nitrogen-containing cyclic compound such as , triazole, or a hydrazone compound in a resin that has film-forming properties. This is because the charge transporting substance generally has a low molecular weight and has poor film-forming properties by itself. Examples of such resins include polycarbonates, polymethacrylates, polyarylates, polystyrene, polyesters, polysulfones, styrene-acrylonitrile copolymers, styrene-methyl methacrylate copolymers, and the like. The thickness of the charge transport layer 1105 is preferably 5 μm or more.
A value of 20μ is desirable. Further, the photosensitive layer may have a structure in which the charge generation layer 1104 described above is laminated on the charge transport layer 1105. Furthermore, the photosensitive layer mentioned above is not limited to the one mentioned above, for example, the one described in IBM Journal of the Reseach and
Development.January 1971. Charge transfer complex consisting of polyvinylcarbazole and trinitrofluorenone disclosed on pages 75 to 89, U.S. Patent No.
A photosensitive layer using a pyrium-based compound described in Publication No. 4315983, U.S. Patent No. 4327169, or a photosensitive layer containing a well-known inorganic photoconductive substance such as zinc oxide or cadmium sulfide dispersed in a resin. It is also possible to use vapor-deposited photosensitive layers of selenium, selenium-tellurium, arsenic selenide, and the like. Examples of the present invention will be described below. Example 1 In this example, a spot type 80 μm semiconductor laser (wavelength 780 nm) was used. Therefore A-
Cylindrical Al support (length L) on which Si:H is deposited
357 mm, diameter r 80 mm), a spiral groove was created using a lathe. The cross-sectional shape of the groove at this time is shown in Figure 12B.
Shown below. A charge injection prevention layer and a photosensitive layer were deposited on this Al support using the apparatus shown in FIG. 13 in the following manner. First, the configuration of the device will be explained. 1301 is a high frequency power supply, 1302 is a matching box, 1303
130 is a diffusion pump and a mechanical booster pump, 1304 is a motor for rotating the Al support, 130
5 is an Al support, 1306 is a heater for heating the support,
1307 is a gas introduction pipe, 1308 is a cathode electrode for high frequency introduction, 1309 is a shield, 1310 is a power source for a heater, 1321 to 1325, 1341 to
1345 is a valve, 1331-1335 is a mass flow controller, 1351-1355 is a regulator, 1361 is a hydrogen ( _H2 ) cylinder, 13
62 is a silane (SiH ₄ ) cylinder, 1363 is a diborane (B ₂ H ₆ ) cylinder, 1364 is a nitrogen oxide (NO) cylinder, and 1367 is a methane (CH ₄ ) cylinder. Next, the manufacturing procedure will be explained. 1361-1365
All cylinder main valves were closed, all mass flow controllers and valves were opened, and the pressure inside the deposition apparatus was reduced to 10 ^-7 Torr using a 1303 diffusion pump. At the same time, the Al support 1305 was heated to 250°C using the heater 1306 and kept at a constant temperature of 250°C. The temperature of the Al support of 1305 is 250
After becoming constant at ℃ 1321-1325, 134
Close the valves 1 to 1345 and 1351 to 1355, open the main valves of cylinders 1361 to 1365,
Replace the diffusion pump in 1303 with a mechanical booster pump. The secondary pressure of the regulator-equipped valves 1351 to 1355 was set to 1.5 Kg/cm ² .
1331 mass flow controller 300SCCM
The valves 1341 and 1321 were opened in sequence to introduce H ₂ gas into the deposition apparatus. Next, set the 1361 SiH ₄ gas to 1332 mass flow controller setting to 150SCCM,
The SiH 4 gas was introduced into the SiH ₄ gas deposition apparatus in the same manner as the introduction of H ₂ gas. Next, set the B ₂ B ₆ gas flow rate of 1363 to 1600 Vol ppm relative to the SiH ₄ gas flow rate.
A 1333 mass front roller was set up to introduce B ₂ H ₆ gas into the deposition apparatus in a similar manner to the introduction of H ₂ gas. When the internal pressure in the deposition apparatus stabilizes at 0.2 Torr, turn on the high frequency power supply 1301 and adjust the matching box 1302 to generate a glow discharge between the Al support 1305 and the cathode electrode 1308, A-Si:H with a power of 150W and a thickness of 5μm
A layer (to become a P-type A-Si:H layer containing B) was deposited (charge injection prevention layer) and a 5 μm thick A-Si:H (P
After depositing B ₂ H ₆ , close the valve 1323 without turning off the discharge. And 20μm thick A-Si:H with high frequency power of 150W
After depositing the layer (non-deped) (photosensitive layer), the high frequency power supply and gas valves were all closed, the deposition apparatus was evacuated, the temperature of the Al support was lowered to room temperature, and the support on which the photoreceptive layer was formed was removed. I took it out. In this case, the surface of the photosensitive layer and the surface of the support were non-parallel as shown in FIGS. 12B and 12C. In this case, the difference in average layer thickness between the center and both ends of the Al support was 2 μm. Regarding the above light-receiving members for electrophotography, the wavelength
Image exposure was performed using a 780 nm semiconductor laser with a spot diameter of 80 μm using the apparatus shown in FIG. 14, and the image was developed and transferred to obtain an image. In this case, no interference fringe pattern was observed, and a product showing electrophotographic characteristics sufficient for practical use was obtained. Example 2 The surface of the cylindrical Al support was polished using a lathe.
It was processed as shown in Figure 5. An a-Si:H electrophotographic light-receiving member was produced on this cylindrical Al support under the same conditions as in Example 1. This electrophotographic light-receiving member was subjected to image exposure using the apparatus shown in FIG. 14 in the same manner as in Example 1, and was developed and transferred to obtain an image. No interference fringes were observed in the transferred image in this case, and the characteristics were sufficient for practical use. Example 3 An electrophotographic light-receiving member was formed on a cylindrical Al support having the surface properties shown in FIGS. 16 and 17 under the conditions shown in Table 1. These electrophotographic light-receiving members were subjected to image exposure using the same image exposure apparatus as in Example 1, and then developed, transferred, and fixed to obtain a visible image on plain paper. This image forming process was repeated 100,000 times. In this case, no interference fringes were observed in any of the images obtained, and the characteristics were sufficient for practical use. Moreover, there was no difference between the initial image and the 100,000th image, and the images were of high quality. Example 4 An electrophotographic light-receiving member was formed on a cylindrical Al support having the surface properties shown in FIGS. 16 and 17 under the conditions shown in Table 2. These electrophotographic light-receiving members were subjected to image exposure using the same image exposure apparatus as in Example 1, and then developed, transferred, and fixed to obtain a visible image on plain paper. In the image obtained in this case, no interference fringes were observed, and the characteristics were sufficient for practical use. Example 5 An electrophotographic light-receiving member was formed on a cylindrical Al support having the surface properties shown in FIGS. 16 and 17 under the conditions shown in Table 3. These electrophotographic light-receiving members were subjected to image exposure using the same image exposure apparatus as in Example 1, and then developed, transferred, and fixed to obtain a visible image on plain paper. In the image obtained in this case, no interference fringes were observed, and the characteristics were sufficient for practical use. Example 6 An electrophotographic light-receiving member was formed on a cylindrical Al support having the surface properties shown in FIGS. 16 and 17 under the conditions shown in Table 4. These electrophotographic light-receiving members were subjected to image exposure using the same image exposure apparatus as in Example 1, and then developed, transferred, and fixed to obtain a visible image on plain paper. In the image obtained in this case, no interference fringes were observed, and the characteristics were sufficient for practical use. Example 7 A cylindrical aluminum support with a diameter of 60 mm and a length of 258 mm was processed to have the surface properties shown in FIGS. 16 and 17. Next, titanium oxide (ECT-
62) 25 parts by weight, titanium oxide (SR-
1T) and 500 parts by weight of phenolic resin (Pryophene J325) manufactured by Dainippon Ink Co., Ltd. were mixed with methanol and 500 parts by weight of methyl cellosolve (methanol/methyl cellosolve = 4 parts by weight/15 parts by weight) and stirred. Thereafter, the mixture was dispersed in a sand mill disperser for 10 hours with 50 parts by weight of glass beads having a diameter of 1 mm. To this dispersion, 50 ppm of silicone oil (SH289A) manufactured by Toshiba Silicone Co., Ltd. was added as a solid content, and the mixture was stirred to prepare a coating liquid for forming conductivity. This coating liquid for forming a conductive layer is applied to the surface of the cylindrical aluminum machined as described above, and the film thickness after drying is
Apply by dip coating to a thickness of 20 μm, then apply at 140℃ for 30 minutes.
It was heated and dried for a minute to form a conductive layer. Next, copolymerized nylon resin (product name: Amilan
10 parts by weight of CM-8000 (manufactured by Toray Industries, Inc.) and 60 parts by weight of methanol.
It was dissolved in a mixed solution consisting of 40 parts by weight of 10 parts by weight and 40 parts by weight of butanol, and the solution was dip-coated onto the above conductive layer to provide a 1 μm thick polyamide resin layer. Next, ε-type copper phthalocyanine (Lionol Blue)
1 part by weight of ES, produced by Toyo Ink Co., Ltd., and 1 part by weight of butyral resin (Eslec BM-2; produced by Sekisui Chemical Co., Ltd.) and 10 parts by weight of cyclohexanone were dispersed for 20 hours using a sand mill dispersion machine containing 1 mm diameter glass beads. After that, it was diluted with 20 parts by weight of methyl ethyl ketone.
This liquid was applied by dip coating onto the previously formed polyamide resin layer and dried to form a charge generation layer. The film thickness at this time was 0.3μ. Next, 10 parts by weight of a hydrazone compound having the following structural formula and 15 parts by weight of a styrene-methyl methacrylate copolymer resin (trade name: MS200; manufactured by Tetsuto Kagaku Co., Ltd.) were dissolved in 80 parts by weight of toluene. This liquid was applied onto the charge generation layer and dried with hot air at 100° C. for 1 hour to form a charge transport layer with a thickness of 16 μm. The electrophotographic light-receiving member created in this way was used in the Canon Laser Beam Printer LBP-CX (Canon Inc.), which is a reversal development type electrophotographic printer equipped with a semiconductor laser with an oscillation wavelength of 778 nm.
After loading the toner into a toner imager (manufactured by Manufacturer, Inc.), a line scan was performed over the entire surface to form an image of black toner on the entire surface, and no interference fringe pattern appeared in this all-black image. Next, the laser beam was line-scanned according to the character signal to form characters as an image.The operation was repeated 2000 times at a temperature of 15°C and a relative humidity of 10%, and the 2000th copy character image was extracted. . When the number of black spots (black spots) with a diameter of 0.2 mm or more in this copied character image was measured, no black spots were found at all. Example 8 Particulate zinc oxide (Sazax 2000 manufactured by Sakai Chemical Co., Ltd.) 10
A coating solution for a photosensitive layer was prepared by sufficiently mixing in a ball mill 10 mg of an azulenium compound having the following structural formula, 4 g of an acrylic resin (Dyanal LR009 manufactured by Mitsubishi Rayon Co., Ltd.), 10 g of toluene. This photosensitive layer coating solution was provided in place of the photosensitive layer having a laminated structure consisting of a charge generation layer and a charge transport layer used in Example 7 so that the film thickness after drying was 21 μm. An electrophotographic light-receiving member was prepared in a similar manner. When this light-receiving member was attached to the laser beam printer used in Example 7 (however, the charger was changed so that the charge was of positive polarity) and the same measurements were carried out, it was found that in an all-black image, It was found that the image was extremely good, with no interference fringes, and no black spots with a diameter of 0.2 mm or more were found in the 2000th letter copy. Example 9 The cut cylindrical aluminum support of Example 7 was anodized by a conventional method to form a thin film of aluminum oxide, and an arsenic selenide layer (tellurium; 10% by weight) was deposited on top of it by vacuum evaporation. layer thickness due to
It was formed to a thickness of 15 μm. When this electrophotographic light-receiving member was attached to the laser beam printer used in Example 8 and the same measurements were performed, similar results were obtained. [Effects of the Invention] As described above in detail, according to the present invention,
It is possible to provide a support for a light-receiving member and a light-receiving member that are suitable for image formation using coherent monochromatic light and whose manufacturing control is easy. In addition, it is possible to simultaneously and completely eliminate the interference fringe pattern that appears during image formation and the appearance of spots during reversal development, and it also has high photosensitivity, high signal-to-noise ratio characteristics, and good electrical connection between the support and the support. It is possible to provide a light-receiving member having physical contact properties.

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【table】

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【table】 [Brief explanation of drawings]

FIG. 1 is a general explanatory diagram of interference fringes. FIG. 2 is an explanatory diagram of interference fringes in the case of a multilayer light receiving member. FIG. 3 is an explanatory diagram of interference fringes due to scattered light. FIG. 4 is an explanatory diagram of interference fringes due to scattered light in the case of a multilayer light receiving member. Figure 5 shows
FIG. 3 is an explanatory diagram of interference fringes when the interfaces of each layer of the light-receiving member are parallel. FIG. 6 is an explanatory diagram showing that no interference fringes appear when the interfaces of each layer of the light-receiving member are non-parallel. FIG. 7 is an explanatory diagram of a comparison of reflected light intensity when the interfaces of each layer of the light-receiving member are parallel and non-parallel. FIG. 8 is an explanatory diagram showing that no interference fringes appear when the interfaces of each layer are non-parallel. FIGS. 9A and 9B are explanatory diagrams of the surface conditions of typical supports, respectively. FIG. 10 and FIG. 11 are explanatory diagrams of the layer structure of the light receiving member. FIG. 13 is an explanatory diagram of a photoreceptive layer deposition apparatus used in Examples. FIG. 14 shows an image exposure apparatus used in the example. Figure 12, Figure 15,
FIGS. 16 and 17 are explanatory diagrams of the surface state of the Al support used in the examples. 1000, 1100...light receiving member, 100
2,1106...Photoreceptive layer, 1001...Al support, 1003...Charge injection prevention layer, 1004...
... Photosensitive layer, 1101 ... Support, 1102 ... Conductive layer, 1103 ... Barrier layer, 1104 ... Charge generation layer, 1105 ... Charge transport layer, 1401 ... Light receiving member for electrophotography, 1402 ... Semiconductor Laser, 1403...Fθ lens, 1404...Polygon mirror, 1405...Plan view of exposure device, 14
06...Side view of the exposure apparatus.

Claims (1)

[Claims] 1. A cylindrical support having a periodic convexity forming a spiral structure. A support for a light-receiving member, characterized in that it has a shape. 2. The support for a light-receiving member according to claim 1, wherein each of the convex portions has substantially the same shape. 3. The support for a light-receiving member according to claim 1, wherein the convex portion has a plurality of sub-peaks. 4. The support for a light-receiving member according to claim 1, wherein the cross-sectional shape of the convex portion is symmetrical about the main peak. 5. The support for a light-receiving member according to claim 1, wherein the cross-sectional shape of the convex portion is asymmetrical with respect to the main peak. 6. The support for a light-receiving member according to claim 1, wherein the convex portion is formed by machining. 7. A support in which the cross-sectional shape of the convex section cut along a plane including the central axis of the cylindrical support having convex portions forming a periodic, spiral structure is a convex shape in which a sub-peak is superimposed on a main peak. A light-receiving member comprising: a light-receiving layer in which at least a portion of the layer region has photosensitivity. 8. The light receiving member according to claim 7, wherein each of the convex portions has substantially the same shape. 9. The light-receiving member according to claim 7, wherein the convex portion has a plurality of sub-peaks. 10. The light-receiving member according to claim 7, wherein the cross-sectional shape of the convex portion is symmetrical about the main peak. 11. The light-receiving member according to claim 7, wherein the cross-sectional shape of the convex portion is asymmetrical with respect to the main peak. 12. The light receiving member according to claim 7, wherein the convex portion is formed by machining.