JPH0366722A - Epoxy resin composition for sealing semiconductor - Google Patents

Epoxy resin composition for sealing semiconductor

Info

Publication number
JPH0366722A
JPH0366722A JP20220689A JP20220689A JPH0366722A JP H0366722 A JPH0366722 A JP H0366722A JP 20220689 A JP20220689 A JP 20220689A JP 20220689 A JP20220689 A JP 20220689A JP H0366722 A JPH0366722 A JP H0366722A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
filler
epoxy
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20220689A
Other languages
Japanese (ja)
Inventor
Keiichi Kinashi
木梨 恵市
Shinsuke Hagiwara
伸介 萩原
Fumio Furusawa
文夫 古沢
Hiroyuki Saito
裕之 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP20220689A priority Critical patent/JPH0366722A/en
Publication of JPH0366722A publication Critical patent/JPH0366722A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To provide the subject composition comprising an epoxy resin, a hardening agent, a filler and a specific copolymer, having excellent flowability in the sealing of semiconductors and useful for sealing semiconductors such as transistors, IC or LSI by a transfer molding method. CONSTITUTION:The objective composition comprises (A) an epoxy resin (preferably having an epoxy equivalent of 180-200), (B) a hardening agent (e.g. a novolak phenolic resin), (C) a filler (e.g. silica, glass or alumina) and (D) a copolymer prepared by a carboxyl group-containing organopolysiloxane (preferably having a polymerization degree of <=500) with an epoxy resin (the same resin as the component A) in the presence of an organic phosphorus compound catalyst (preferably triphenylphosphine) of the formula: P-(R)3 (R is monovalent hydrocarbon).

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はトランジスタ、IC及びLSIなどの〔従来の
技術〕 エポキシ樹脂組成物は他の熱硬化性樹脂組成物と比べ、
電気特性、耐湿性、機械特性、接着性等のバランスが最
も優れているため、現在半導体封止用材料の主流となっ
ている。
[Detailed Description of the Invention] [Industrial Application Field] The present invention applies to transistors, ICs, LSIs, etc. [Prior Art] Compared to other thermosetting resin compositions, the epoxy resin composition has
Because it has the best balance of electrical properties, moisture resistance, mechanical properties, adhesiveness, etc., it is currently the mainstream material for semiconductor encapsulation.

一方、近年素子の大型化、アルミ配線の細線化、パッケ
ージの小型薄肉化に伴い、素子上のパッシベーションク
ラック、アルミ配線変形、パッケージクラック等の不良
が顕著になり、封止用材料の低応力化がますます重要と
なっている。
On the other hand, in recent years, as devices have become larger, aluminum wiring has become thinner, and packages have become smaller and thinner, defects such as passivation cracks on devices, deformation of aluminum wiring, and package cracks have become more prominent, and the stress of sealing materials has become lower. is becoming increasingly important.

封止材の低応力化には、低弾性率化と低熱膨張化があり
、低弾性率化には、シリコーン等の可撓剤を添加する方
法、また低熱膨張化にはシリカ等のフィラーの添加量を
増量する手法が一般的である。しかし、これら手法は、
いづれもエポキシ組成物の流動性を低下させるため、可
撓剤、フィラ−の使用量には限界がある。
There are two ways to reduce the stress of the encapsulant: lowering the modulus of elasticity and lowering the thermal expansion. To lower the modulus of elasticity, add a flexibilizing agent such as silicone, and to lower the thermal expansion, add a filler such as silica. A common method is to increase the amount added. However, these methods
Since both of these reduce the fluidity of the epoxy composition, there is a limit to the amount of flexibilizers and fillers that can be used.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

本発明は上記観点からなされたものであり、流動性に優
れかつ低応力の半導体封止用エポキシ樹脂組成物を得よ
うとするものである。
The present invention has been made from the above-mentioned viewpoint, and an object is to obtain an epoxy resin composition for semiconductor encapsulation that has excellent fluidity and low stress.

〔課題を解決するための手段〕[Means to solve the problem]

本発明者らは上記問題点を解決すべく鋭意検討を行った
結果、特定なオルガノボリレ0キサンとエポキシ樹脂と
を反応させて得られる共重合体をエポキシ樹脂組11i
、!l!7Jに配合することにより、前記問題点を解決
することができることを見出し、この知見に基づいて本
発明を完成するに至った。
The present inventors conducted extensive studies to solve the above problems, and as a result, we developed a copolymer obtained by reacting a specific organoborylene xane with an epoxy resin.
,! l! It was discovered that the above-mentioned problems could be solved by blending it with 7J, and the present invention was completed based on this knowledge.

すなわち、本発明は(A)エポキシ樹脂、(B)硬化剤
、(C)充填剤及び(D)カルボキシル基含有オルガノ
ポリシロキサンとエポキシ樹脂とを下記一般式(1)で
示される有機リン系化合物触媒により反応させて得られ
る共重合体からなることを特徴とする半導体封止用エポ
キシ樹脂組成物を提供するものである。
That is, the present invention combines (A) an epoxy resin, (B) a curing agent, (C) a filler, and (D) a carboxyl group-containing organopolysiloxane, and an epoxy resin with an organic phosphorus compound represented by the following general formula (1). An object of the present invention is to provide an epoxy resin composition for semiconductor encapsulation, which is comprised of a copolymer obtained by reaction with a catalyst.

P−(−R)、、−−−−−−−−・−(1)(式中の
Rは一価、炭化水素基) 以下に本発明の詳細な説明する。
P-(-R), ----------(1) (R in the formula is a monovalent, hydrocarbon group) The present invention will be described in detail below.

本発明において用いられる(D)のカルボキシル基含有
オルガノポリシロキサンとエポキシ樹脂とを反応させて
得られる共重合体は、触媒の存在下で単純な加熱反応に
より得ることができる。
The copolymer obtained by reacting the carboxyl group-containing organopolysiloxane (D) with an epoxy resin used in the present invention can be obtained by a simple heating reaction in the presence of a catalyst.

この加熱反応においては反応性の点で、溶媒を用いるこ
とが好ましく、溶媒としては具体的には、トルエン、M
IBK、ジオキサン等が挙げられる。
In this heating reaction, it is preferable to use a solvent from the viewpoint of reactivity, and specific examples of the solvent include toluene, M
Examples include IBK and dioxane.

本発明において用いられるカルボキシル基含有オルガノ
ポリシロキサンとしては重合度が500以下のものが好
ましい0重合度が500を超えると流動性が低下する。
The carboxyl group-containing organopolysiloxane used in the present invention preferably has a degree of polymerization of 500 or less. If the degree of polymerization exceeds 500, fluidity decreases.

また反応させるエポキシ樹脂としては、フェノール、ク
レゾール、ビスフェノールA等とホルムアルデヒドなど
を酸性触媒下で縮合させて得られる樹脂を原料として、
エピクロルヒドリンでグリシジルエニテル化するなどし
てエポキシ化したものが好ましく用いられる。またエポ
キシ樹脂はエポキシ当量が170〜300のものが好ま
しく用いられ、さらに、エポキシ当量が180〜200
のものが硬化性の点で優れている。
The epoxy resin to be reacted is made from a resin obtained by condensing phenol, cresol, bisphenol A, etc. with formaldehyde under an acidic catalyst.
Epoxidized products such as glycidyl enyterization with epichlorohydrin are preferably used. Moreover, the epoxy resin having an epoxy equivalent of 170 to 300 is preferably used, and furthermore, an epoxy resin having an epoxy equivalent of 180 to 200 is used.
is superior in terms of curability.

反応の際用いられる触媒としては一般的には、イミダゾ
ール、DBU(1,8−ジアザビシクロ(5,4,0)
ウンデセン−7)、BDMA等のアミン系が知られてい
るが、組成物の流動性の点で、下記一般式(1)で示さ
れる有機リン系化合物触媒が用いられる。
Catalysts used in the reaction are generally imidazole, DBU (1,8-diazabicyclo(5,4,0)
Although amine-based catalysts such as undecene-7) and BDMA are known, an organic phosphorus-based compound catalyst represented by the following general formula (1) is used from the viewpoint of fluidity of the composition.

P −G−R)3  −・・〜・−一一一一・ (1)
(式中のRは一価の炭化水素基) 前記有機リン系化合物としては、トリフェニルホスフィ
ン、トリブチルホスフィン、トリバラトリルホスフィン
等の三級ホスフィン、特にトリフェニルホスフィンが好
ましく用いられる。触媒量としてはエポキシ樹脂に対し
0.1〜2wt%用いられる。
P-G-R)3 -・・〜・−1111・(1)
(R in the formula is a monovalent hydrocarbon group) As the organic phosphorus compound, tertiary phosphines such as triphenylphosphine, tributylphosphine, and trivalatrylphosphine, particularly triphenylphosphine, are preferably used. The amount of catalyst used is 0.1 to 2 wt% based on the epoxy resin.

反応時のオルガノシロキサンとエポキシ樹脂との配合比
は、カルボキシル基1個に対し、エポキシ基5個以上と
することが好ましく、5個未満ではゲル化する恐れがあ
る。
The compounding ratio of organosiloxane and epoxy resin during the reaction is preferably 5 or more epoxy groups to 1 carboxyl group, and if it is less than 5, gelation may occur.

次に、(B)の硬化剤としては、ノボラック型フェノー
ル樹脂が好適であり、具体的には、フェノール、クレゾ
ール、ビスフェノールAなどとホルムアルデヒドなどを
酸性触媒下で縮合させて得られる樹脂が挙げられる。
Next, as the curing agent (B), a novolak type phenolic resin is suitable, and specific examples include resins obtained by condensing phenol, cresol, bisphenol A, etc. with formaldehyde under an acidic catalyst. .

また、(A)のエポキシ樹脂としては、先に述べた共重
合体を合成する際のエポキシ樹脂が用いられる。エポキ
シ樹脂と硬化剤の配合比は、エポキシ樹脂中に含まれる
エポキシ基1個当たり硬化剤中のフェノール性水酸基等
の官能基が0.5〜2゜0個、好適には0.8〜1.2
個となるような割合で用いる。
Further, as the epoxy resin (A), the epoxy resin used in synthesizing the copolymer described above is used. The blending ratio of the epoxy resin and the curing agent is such that the number of functional groups such as phenolic hydroxyl groups in the curing agent is 0.5 to 20, preferably 0.8 to 1 per epoxy group contained in the epoxy resin. .2
Use in proportions such that

エポキシ樹脂組成物中の共重合体の添加量は総エポキシ
樹脂100重量部に対し、共重合体中のシロキサン量が
10〜30重量部となるように添加することが好ましく
、シロキサン量が10重量部未満では低応力化の効果が
小さく、30重量部を超える流動性が低下する。
The amount of the copolymer added to the epoxy resin composition is preferably such that the amount of siloxane in the copolymer is 10 to 30 parts by weight based on 100 parts by weight of the total epoxy resin, and the amount of siloxane is 10 parts by weight. If the amount is less than 30 parts by weight, the effect of reducing stress will be small, and if it exceeds 30 parts by weight, the fluidity will decrease.

本発明において用いられる(C)の充填剤としては、シ
リカ、ガラス、ケイソウ土、タルク、マイカ、アスベス
ト、アルミナ等を用いることができるが、シリカ、ガラ
ス、アルミナが電気特性の点で優れている。充填剤の使
用量は(A)、(B)及び(D)の合計100重量部に
対し、100〜500重量部が良好であり、100重量
部未満では耐湿性に劣り、また500重量部を超えると
、流動性が失われる。
As the filler (C) used in the present invention, silica, glass, diatomaceous earth, talc, mica, asbestos, alumina, etc. can be used, but silica, glass, and alumina are superior in terms of electrical properties. . The amount of filler to be used is preferably 100 to 500 parts by weight based on the total of 100 parts by weight of (A), (B), and (D); less than 100 parts by weight results in poor moisture resistance; If this is exceeded, liquidity will be lost.

また、エポキシ樹脂と硬化剤との反応を促進するために
硬化促進剤さらに配合することが好ましい。硬化促進剤
としては、具体的にはトリブチルアミン、1,8−ジア
ザビシクロ(5,4,0)ウンデセン−7のようなアミ
ン類、トリフェニルホスフィンのような有機リン系化合
物、2−フェニルイミダゾールのようなイミダゾール類
が挙げられる。配合量はエポキシ樹脂に対して好ましく
は0.1〜3重量%である。
Further, it is preferable to further include a curing accelerator in order to promote the reaction between the epoxy resin and the curing agent. Specific examples of curing accelerators include tributylamine, amines such as 1,8-diazabicyclo(5,4,0)undecene-7, organic phosphorus compounds such as triphenylphosphine, and 2-phenylimidazole. Examples include imidazoles such as The blending amount is preferably 0.1 to 3% by weight based on the epoxy resin.

本発明のエポキシ樹脂組成物に、は必要に応じて離型剤
、着色剤、難燃剤、難燃助剤、カップリング剤などを使
用することもできる。特にカップリング剤は充填剤の効
果を有効に発揮させるために重要であり、例えばγ−グ
リシドキシブロビルトリメトキシシラン、β−(3,4
−エポキシシクロヘキシル)−エチルトリメトキシシラ
ンなどがある。
In the epoxy resin composition of the present invention, a mold release agent, a coloring agent, a flame retardant, a flame retardant aid, a coupling agent, etc. can also be used as necessary. In particular, coupling agents are important for effectively exerting the effect of fillers, such as γ-glycidoxybrobyltrimethoxysilane, β-(3,4
-epoxycyclohexyl)-ethyltrimethoxysilane.

本発明のエポキシ樹脂組成物は、上記のエポキシ樹脂、
硬化剤、硬化促進剤、共重合体、充填剤、カップリング
剤その他の添加剤などをミキシングロールで加熱しなが
ら混練する方法により製造することができる。
The epoxy resin composition of the present invention comprises the above-mentioned epoxy resin,
It can be manufactured by a method of kneading a curing agent, a curing accelerator, a copolymer, a filler, a coupling agent, and other additives while heating them with a mixing roll.

得られたエポキシ樹脂組成物は、トランスファー底形、
注型などの方法により底形する。
The obtained epoxy resin composition has a transfer bottom shape,
Shape the bottom by casting or other methods.

〔実施例〕〔Example〕

以下に実施例により本発明を具体的に説明する。 The present invention will be specifically explained below using Examples.

なお実施例を示す前に、物性の測定方法、共重合体の製
造方法等を以下に示す。
Before showing Examples, methods for measuring physical properties, methods for producing copolymers, etc. will be shown below.

(1)スパイラルフロー(SF) EMMI規格に準じた金型を用いて175°c16.8
6MPaの条件で測定した。
(1) Spiral flow (SF) 175°c16.8 using a mold according to EMMI standard
Measurement was performed under the condition of 6 MPa.

(2)線膨張係数(α、) 理学電機製の熱機械分析装置TMA標準形を用いて昇温
速度5℃/win、試験片寸法19mmX4amX4m
で測定した。
(2) Coefficient of linear expansion (α,) Using Rigaku's thermomechanical analyzer TMA standard type, heating rate 5°C/win, test piece size 19 mm x 4 am x 4 m
It was measured with

(3)曲げ弾性率(E) J I S−に6911に準じ、成形温度175°C1
圧力6.86MPa、成形時間2分の条件で試験片を作
成し175°C,6hベークしたものについて測定した
(3) Flexural modulus (E) According to JIS-6911, molding temperature 175°C1
A test piece was prepared under the conditions of a pressure of 6.86 MPa and a molding time of 2 minutes, and was baked at 175°C for 6 hours.

(4)共重合体の製造方法 表1に示す配合比でカルボキシル基含有オルガノポリシ
ロキサンとエポキシ樹脂をトルエンに溶解し、さらに触
媒を加えたのち、トルエンの沸点で加熱攪拌した0反応
終了後、トルエンを常圧、及び減圧で除去し、共重合体
を得た。
(4) Method for producing a copolymer A carboxyl group-containing organopolysiloxane and an epoxy resin were dissolved in toluene at the compounding ratio shown in Table 1, and a catalyst was further added thereto. After the reaction was completed, the mixture was heated and stirred at the boiling point of toluene. Toluene was removed under normal pressure and reduced pressure to obtain a copolymer.

(5)表1に示す組成物を配合し、直径10インチのミ
キシングロールにて、前ロール22rpm。
(5) The composition shown in Table 1 was blended, and the front roll was rolled at 22 rpm using a mixing roll with a diameter of 10 inches.

後ロール18rpmの条件で常法に従い10分間混練し
た。得られたシート状組成物を粉砕して、エポキシ樹脂
組成物を得た。
The mixture was kneaded in a conventional manner for 10 minutes with a rear roll at 18 rpm. The obtained sheet-like composition was pulverized to obtain an epoxy resin composition.

なお、表中の符号は下記のものを示す。Note that the symbols in the table indicate the following.

1′″ :0−タレゾールノボラック型エポキシ樹脂(
住友化学社製、ESCN−195−3)2″ : (重合度はいずれも平均値) 3″ : 41 : 日立化成社製HP−80ON 1.8−ジアザビシクロ(5,4,0)ウンデセン−7 5° : γ−グリシドキシブロビルトリメ トキシ シラン 以下余白 表1に示すように実施例1〜3の材料は比較例1〜4の
材料と比較し、スパイラルフローが大きく又低弾性率の
ため低応力化されていることがわかる。
1''': 0-Talesol novolac type epoxy resin (
Manufactured by Sumitomo Chemical Co., Ltd., ESCN-195-3) 2": (all degrees of polymerization are average values) 3": 41: Manufactured by Hitachi Chemical Co., Ltd. HP-80ON 1.8-diazabicyclo(5,4,0) undecene-7 5°: γ-glycidoxybrobyltrimethoxysilane Below margin As shown in Table 1, the materials of Examples 1 to 3 have a larger spiral flow and lower elastic modulus than the materials of Comparative Examples 1 to 4. It can be seen that stress is reduced.

〔発明の効果〕〔Effect of the invention〕

本発明のエポキシ樹脂組成物を用いて半導体を封止する
場合、流動性に優れ、且つ硬化物の低応力化効果もある
ことから、その半導体封止用材料として工業的価値は大
きい。
When encapsulating a semiconductor using the epoxy resin composition of the present invention, it has excellent fluidity and is effective in reducing stress in the cured product, so it has great industrial value as a material for semiconductor encapsulation.

Claims (1)

【特許請求の範囲】 1、(A)エポキシ樹脂、 (B)硬化剤、 (C)充填剤及び (D)カルボキシル基含有オルガノポリシロキサンとエ
ポキシ樹脂とを下記一般式 (1)で示される有機リン系化合物触媒 により反応させて得られる共重合体から なることを特徴とする半導体封止用エポ キシ樹脂組成物。 ▲数式、化学式、表等があります▼・・・・・・・・・
・・・・(1) (式中のRは一価の炭化水素基)
[Claims] 1. (A) an epoxy resin, (B) a curing agent, (C) a filler, and (D) a carboxyl group-containing organopolysiloxane and an epoxy resin represented by the following general formula (1). An epoxy resin composition for semiconductor encapsulation, comprising a copolymer obtained by reaction with a phosphorus compound catalyst. ▲There are mathematical formulas, chemical formulas, tables, etc.▼・・・・・・・・・
...(1) (R in the formula is a monovalent hydrocarbon group)
JP20220689A 1989-08-03 1989-08-03 Epoxy resin composition for sealing semiconductor Pending JPH0366722A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20220689A JPH0366722A (en) 1989-08-03 1989-08-03 Epoxy resin composition for sealing semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20220689A JPH0366722A (en) 1989-08-03 1989-08-03 Epoxy resin composition for sealing semiconductor

Publications (1)

Publication Number Publication Date
JPH0366722A true JPH0366722A (en) 1991-03-22

Family

ID=16453722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20220689A Pending JPH0366722A (en) 1989-08-03 1989-08-03 Epoxy resin composition for sealing semiconductor

Country Status (1)

Country Link
JP (1) JPH0366722A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014061811A1 (en) * 2012-10-19 2014-04-24 三菱瓦斯化学株式会社 Resin composition, pre-preg, laminate, metal foil-clad laminate, and printed wiring board
US10639838B2 (en) 2014-03-14 2020-05-05 Kraussmaffei Berstorff Gmbh Hose extrusion head and method for producing a hose

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014061811A1 (en) * 2012-10-19 2014-04-24 三菱瓦斯化学株式会社 Resin composition, pre-preg, laminate, metal foil-clad laminate, and printed wiring board
CN104736589A (en) * 2012-10-19 2015-06-24 三菱瓦斯化学株式会社 Resin composition, pre-preg, laminate, metal foil-clad laminate, and printed wiring board
JPWO2014061811A1 (en) * 2012-10-19 2016-09-05 三菱瓦斯化学株式会社 Resin composition, prepreg, laminate, metal foil clad laminate and printed wiring board
US10030141B2 (en) 2012-10-19 2018-07-24 Mitsubishi Gas Chemical Company, Inc. Resin composition, pre-preg, laminate, metal foil-clad laminate, and printed wiring board
US10639838B2 (en) 2014-03-14 2020-05-05 Kraussmaffei Berstorff Gmbh Hose extrusion head and method for producing a hose

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