JPH0367337U - - Google Patents

Info

Publication number
JPH0367337U
JPH0367337U JP12845289U JP12845289U JPH0367337U JP H0367337 U JPH0367337 U JP H0367337U JP 12845289 U JP12845289 U JP 12845289U JP 12845289 U JP12845289 U JP 12845289U JP H0367337 U JPH0367337 U JP H0367337U
Authority
JP
Japan
Prior art keywords
illuminance
ultraviolet
varying
ultraviolet lamp
ozone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12845289U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12845289U priority Critical patent/JPH0367337U/ja
Publication of JPH0367337U publication Critical patent/JPH0367337U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】
第１図は本考案の実施例を示すレジスト除去装
置の構成図、第２図はそのレジスト除去装置の紫
外線ランプの側面図、第３図は従来の紫外線とオ
ゾンを用いたレジスト除去装置の平面図、第４図
はそのレジスト除去装置の紫外線ランプの構成図
である。 １１〜１４……紫外線ランプ管、２１〜２８…
…端子、３０……電源、３１……電圧制御器。

Claims (1)

  1. 【実用新案登録請求の範囲】 紫外線とオゾンを用いたレジスト除去装置にお
    いて、 (a) 同心円状に独立して複数個配置される紫外
    線ランプと、 (b) 各紫外線ランプの照度を可変にする手段と
    、 (c) 該紫外線ランプの照度の可変手段により全
    体の照度分布を調整する手段とを具備することを
    特徴とするレジスト除去装置。
JP12845289U 1989-11-04 1989-11-04 Pending JPH0367337U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12845289U JPH0367337U (ja) 1989-11-04 1989-11-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12845289U JPH0367337U (ja) 1989-11-04 1989-11-04

Publications (1)

Publication Number Publication Date
JPH0367337U true JPH0367337U (ja) 1991-07-01

Family

ID=31676159

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12845289U Pending JPH0367337U (ja) 1989-11-04 1989-11-04

Country Status (1)

Country Link
JP (1) JPH0367337U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019091762A (ja) * 2017-11-13 2019-06-13 東京エレクトロン株式会社 基板処理装置、基板処理方法、及び記憶媒体

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019091762A (ja) * 2017-11-13 2019-06-13 東京エレクトロン株式会社 基板処理装置、基板処理方法、及び記憶媒体
US11469115B2 (en) 2017-11-13 2022-10-11 Tokyo Electron Limited Substrate processing apparatus, substrate processing method and recording medium
TWI810216B (zh) * 2017-11-13 2023-08-01 日商東京威力科創股份有限公司 基板處理裝置、基板處理方法及記錄媒體

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