JPH0369529A - Insulator glass composition - Google Patents

Insulator glass composition

Info

Publication number
JPH0369529A
JPH0369529A JP20443089A JP20443089A JPH0369529A JP H0369529 A JPH0369529 A JP H0369529A JP 20443089 A JP20443089 A JP 20443089A JP 20443089 A JP20443089 A JP 20443089A JP H0369529 A JPH0369529 A JP H0369529A
Authority
JP
Japan
Prior art keywords
cao
glass
wollastonite
sio2
mgo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20443089A
Other languages
Japanese (ja)
Other versions
JP2832374B2 (en
Inventor
Hideyuki Kuribayashi
栗林 秀行
Tomoyuki Taguchi
智之 田口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamamura Glass KK
Original Assignee
Yamamura Glass KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamamura Glass KK filed Critical Yamamura Glass KK
Priority to JP1204430A priority Critical patent/JP2832374B2/en
Publication of JPH0369529A publication Critical patent/JPH0369529A/en
Application granted granted Critical
Publication of JP2832374B2 publication Critical patent/JP2832374B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Glass Compositions (AREA)

Abstract

PURPOSE:To obtain an insulator glass compsn. ensuring improved heat resistance, surface smoothness and withstand voltage characteristic by mixing a glass compsn. contg. SiO2, Al2O3, ZnO, TiO2 and MgO with wollastonite. CONSTITUTION:A glass compsn. consisting of, by weight, 20-50% SiO2, 10-20% Al2O3, 10-20% CaO, 10-15.49% ZnO, 10-20% TiO2, 0-3% B2O3, 0.5-10% MgO, 0-3% ZrO2, 0-3% P2O5 and 0-2% F2 is mixed with 0.1-5wt.% wollastonite (CaO.SiO2) to obtain an insulator glass compsn. Since this compsn. contains fine wollastonite powder as an external crystal nucleating agent, Zn2SiO4, CaO.Al2O3.2SiO2 and CaO.TiO2.SiO2 are deposited as crystal phases by heat treatment at about <=850 deg.C. When a small amt. of fine ceramic powder is further added, heat resistance and surface smoothness are considerably improved and withstand voltage characteristic is improved.

Description

【発明の詳細な説明】 (イ〉産業上の利用分野 本発明は、主として厚膜集積回路のクロスオバー用の電
気絶縁滴形成のための結晶化ガラス組成物に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Industrial Application Field The present invention relates primarily to a crystallized glass composition for forming electrically insulating droplets for crossover of thick film integrated circuits.

(ロ)従来の技術 従来、この種厚膜集積回路の電気絶縁層を形成する耐火
物フィラーを含む結晶化ガラス組成物として、特公昭6
2−10940Qに開示されたようにアノルサイト結晶
(CaO”A I203 ・2Si02>を主結晶とし
て形成することを特徴とする結晶化カラス組成物、及び
特公昭62−21739号に開示されたように焼成過程
でBaA2F02結晶を一部析出せしめるガラス組成物
がある。又その他として、特公昭46−42917号、
特公昭F−6168@、特公昭F−10844号、特公
昭52−34645号等にも電気絶縁層形成用ガラス組
成物が開示されている。
(b) Prior Art Conventionally, a crystallized glass composition containing a refractory filler for forming an electrical insulating layer of this type of thick film integrated circuit has been developed.
2-10940Q, a crystallized glass composition characterized by forming anorsite crystals (CaO''A I203 2Si02> as the main crystals), and a sintered glass composition as disclosed in Japanese Patent Publication No. 62-21739. There are glass compositions that partially precipitate BaA2F02 crystals during the process.Other examples include Japanese Patent Publication No. 46-42917,
Glass compositions for forming electrically insulating layers are also disclosed in Japanese Patent Publication No. Sho F-6168@, Japanese Patent Publication No. Sho F-10844, Japanese Patent Publication No. 34645/1987, and the like.

(ハ)発明が解決しようとする問題点 しかしながら上記の特公昭62−10940号の結晶化
カラスは、結晶化する温度が2つに別れており、850
°Cて熱処理して、再現性よくBつ安定して結晶化させ
るためには、2つに別れて結晶化する高温側のピークを
850’C以下に出現させる必要があり、そのためには
もう一つのピークを低温側に出現させねばならなかった
。2つのピークのうち高温側のものを低温側(850’
C)に移行させるためには、ガラスの転移点及び軟化点
を低下させる必要があり、必然的にB2O3、ZnO等
の融剤を多量に含有させる必要かあった。
(c) Problems to be solved by the invention However, the crystallized crow disclosed in Japanese Patent Publication No. 62-10940 mentioned above has two crystallization temperatures;
In order to stably crystallize B with good reproducibility by heat treatment at One peak had to appear on the low temperature side. Of the two peaks, the one on the high temperature side is compared to the low temperature side (850'
In order to shift to C), it was necessary to lower the transition point and softening point of the glass, and it was inevitably necessary to contain a large amount of a fluxing agent such as B2O3 or ZnO.

しかし、この融剤を多量に含有させるとガラスが軟化す
る温度が低下し結晶化するまでの間にカラス相が流動し
て導体と反応するため、例えば副電圧特性(絶縁層を介
して導体間に高電圧(250kV/Cm以上)をかけた
時の絶縁層の破壊強度をいう。)等を著しく劣化させる
。この劣化を防ぐためにフィラーを添加するのか一般的
であるがこの結果表面粗度を低下させる問題があった。
However, when a large amount of this flux is contained, the temperature at which the glass softens decreases, and the glass phase flows and reacts with the conductor until it crystallizes. This refers to the breakdown strength of an insulating layer when a high voltage (250 kV/Cm or more) is applied to it. Generally, fillers are added to prevent this deterioration, but this results in a problem of lowering the surface roughness.

更に、この表面粗度の低下は、被膜厚の不均一性をもた
らせ、肉薄部を補うために少なくとも2回の印刷焼成を
必要としていた。又、高温側ピークを850′C以下に
抑え且つ導体との反応の低減と結晶相以外のガラス相の
耐熱性を向上させるためには、耐火物フィラーを相当量
添加させなしプればならないが、この場合にはフィラー
量の増加と共に逆に接着強度や表面平滑性の低下か生じ
るといった問題があった。
Furthermore, this reduction in surface roughness results in non-uniformity in coating thickness, requiring printing and firing at least twice to compensate for thinner areas. In addition, in order to suppress the peak on the high temperature side to 850'C or less, reduce the reaction with the conductor, and improve the heat resistance of the glass phase other than the crystal phase, it is necessary to add a considerable amount of refractory filler. In this case, there was a problem in that as the amount of filler increased, adhesive strength and surface smoothness deteriorated.

(ニ)課題を解決するための手段 本発明は、上記従来技術のもつ欠点を解決するために開
発されたものであり、 重量%表示で: 102 1203 CaO ZnO T + 02 120〜50% 110〜20% 110〜20% 110〜15.49% : 10〜20% B2O3: 0〜3% MgO:0.5〜10% ZrO:  0〜3% P2O5: 0〜3% F2   : 0〜2% のガラス組成物に、重量比でウオラストナイト(CaO
4S i 02 )0.1〜5%を)昆合してなる絶縁
体ガラス組成物であることを特徴とする。
(d) Means for Solving the Problems The present invention was developed in order to solve the drawbacks of the above-mentioned prior art, and in terms of weight %: 102 1203 CaO ZnO T + 02 120~50% 110~ 20% 110-20% 110-15.49%: 10-20% B2O3: 0-3% MgO: 0.5-10% ZrO: 0-3% P2O5: 0-3% F2: 0-2% Wollastonite (CaO
4S i 02 ) 0.1 to 5%).

即ち、結晶核剤としてウオラストナイト〜(CaO−3
iO2)を少量使用することにより、2つの温度域で結
晶化していたガラスを1つの温度域で同時に結晶化させ
ることができ、結晶化ガラスの構成成分として含有させ
るべき融剤成分を大巾に低減させることができ、導体や
抵抗体との反応性の低い、信頼性の高い絶縁層を形成で
きる。
That is, wollastonite ~ (CaO-3
By using a small amount of iO2), glass that has been crystallized in two temperature ranges can be simultaneously crystallized in one temperature range, and the flux component that should be included as a constituent of crystallized glass can be greatly reduced. It is possible to form a highly reliable insulating layer with low reactivity with conductors and resistors.

更には、通常のセラミック微粉末(α−A1203、η
−A1203.γ−AI203゜θ−AI203.ジル
コニア、ジルコン、酸化チタン、コージェライト、β−
ユークリプタイト。
Furthermore, ordinary ceramic fine powder (α-A1203, η
-A1203. γ-AI203°θ-AI203. Zirconia, zircon, titanium oxide, cordierite, β-
Eucryptite.

スポジュメン、5i02.Mgo等〉を少量添加するこ
とにより、より一層の耐熱性を付与できるばかりでなく
、添加量か従来に比して少量でよいので表面平滑性が大
巾に改善され、最も重要な耐電圧特性を大巾に向上でき
る。
Spodumene, 5i02. By adding a small amount of Mgo, etc., not only can further heat resistance be imparted, but also the addition amount is only a small amount compared to the conventional method, so surface smoothness is greatly improved, and the most important dielectric strength property is improved. can be greatly improved.

本発明の組成物の限定理由は下記の通りである。The reasons for limiting the composition of the present invention are as follows.

s r 02は、ガラス形成酸化物であり、SiO2が
20%以下では、ガラス軟化点が低くなりすぎるし、又
、析出結晶相であるZnS104、CaO” A I 
203 ・23 ! 02の構成成分であるため、これ
が少なすぎると、これらの結晶相か析出しにくくなる。
s r 02 is a glass-forming oxide, and if SiO2 is less than 20%, the glass softening point will be too low, and the precipitated crystal phase ZnS104, CaO'' A I
203 ・23! Since it is a constituent component of 02, if it is too small, these crystal phases will be difficult to precipitate.

逆に8102が50%以上では、膨張係数が低くなりす
ぎる。このS i 02は30〜40%か更に好ましい
Conversely, if 8102 is 50% or more, the expansion coefficient becomes too low. This S i 02 is more preferably 30 to 40%.

Al2O3は、ガラス中間酸化物であり、A 203が
10%以下では転移点が低くなりすぎるし、且つ、結晶
相の1っであるCaO−A203・2SiQ2の析出か
困難となり、化学耐久性も悪くなる。、Al2O3か2
0%以上では液相温度が高くなりすぎ溶融時失透する。
Al2O3 is a glass intermediate oxide, and if A203 is less than 10%, the transition point will be too low, and it will be difficult to precipitate CaO-A203.2SiQ2, which is one of the crystal phases, and the chemical durability will be poor. Become. , Al2O3 or 2
If it is 0% or more, the liquidus temperature becomes too high and devitrification occurs during melting.

CaOは、ガラス修飾酸化物であり、結晶構成成分であ
る。CaOが10%以下では、膨張係数が小さくなりす
ぎると共に、結晶相の1っであるCa0−A I203
−23 F02の析出が困難となる。CaOが20%以
上では、逆に膨張係数が大きくなりずぎると共に、化学
耐久性が悪化する。
CaO is a glass-modified oxide and a crystal constituent component. If CaO is less than 10%, the expansion coefficient becomes too small and the CaO-A I203, which is one of the crystal phases, becomes too small.
-23 Precipitation of F02 becomes difficult. If the CaO content is 20% or more, the expansion coefficient becomes too large and the chemical durability deteriorates.

このCaOは、15〜20%か更に好ましい。This CaO is more preferably 15 to 20%.

MgOは、カラス修飾酸化物で、MgOか0゜5%以下
では化学耐久性が悪くなる。MgOが10%以上では分
相しやすくなる。このMgOは、0.5〜5%が更に好
ましい。
MgO is a glass-modified oxide, and chemical durability deteriorates when MgO is less than 0.5%. If MgO is 10% or more, phase separation becomes easy. This MgO is more preferably 0.5 to 5%.

ZnOは、融剤、結晶構成成分及び彫版係数調整剤とし
て使用され、ZnOが10%以下では、主結晶相である
Z n2 S ! 04の析出が困難となり、ZnOが
15.5%以上ではガラスの転移点が低下すると共に、
膨張係数も小さくなりすぎ、残部のガラス相の耐熱性が
悪化する。
ZnO is used as a fluxing agent, crystal constituent and engraving coefficient modifier, and when ZnO is less than 10%, the main crystal phase is Zn2S! 04 becomes difficult to precipitate, and when ZnO exceeds 15.5%, the transition point of the glass decreases, and
The expansion coefficient also becomes too small, and the heat resistance of the remaining glass phase deteriorates.

T!02は、ガラス形成酸化物であり、化学的耐久性を
付与すると共に、結晶相の1つであるCao−T i 
02−3 i 02の構成成分である。
T! 02 is a glass-forming oxide that provides chemical durability and also contains one of the crystalline phases, Cao-Ti
02-3 i It is a constituent of 02.

TiO2が10%以下では結晶相の析出が困難となり、
丁102が20%以上では、液相温度が高くなりすぎ溶
融時に失透する。
When TiO2 is less than 10%, precipitation of crystal phase becomes difficult,
If the content of 102 is 20% or more, the liquidus temperature becomes too high and devitrification occurs during melting.

B203は、融剤として使用され、B2O3が3%以上
では耐熱性が悪化する。このB2O3は0.5〜2%が
更に好ましい。
B203 is used as a fluxing agent, and when B2O3 is 3% or more, heat resistance deteriorates. This B2O3 is more preferably 0.5 to 2%.

ZrO2は、結晶核剤として、及び化学的耐久性向上の
ために使用され、ZrO2が3%以上では、未溶解でジ
ャワとしてガラス中に残存しやすくなる。このZrO2
は0.2〜1%が更に好ましい。
ZrO2 is used as a crystal nucleating agent and to improve chemical durability, and if ZrO2 is 3% or more, it tends to remain undissolved in the glass as java. This ZrO2
is more preferably 0.2 to 1%.

P2O5は、結晶核剤及びZrO2の融剤として使用さ
れ、P2O5が3%以上では化学的耐久性が悪化する。
P2O5 is used as a crystal nucleating agent and a fluxing agent for ZrO2, and if P2O5 exceeds 3%, chemical durability deteriorates.

このP2O5は0.1〜1%が更に好ましい。This P2O5 is more preferably 0.1 to 1%.

F2は、結晶核剤及び融剤として使用され、「2が2%
以上では、化学的耐久性が悪くなると共に導体と反応し
やすくなる。この「2は0.1〜1%が更に好ましい。
F2 is used as a crystal nucleating agent and a fluxing agent.
Above this, the chemical durability deteriorates and it becomes more likely to react with the conductor. This "2" is more preferably 0.1 to 1%.

(以下、余白〉 上記の組成物よりなるガラスを850’C以下の温度域
で結晶化するガラスとするために、添加する結晶核剤と
して、ウオラストナイト(CaO・5i02>を0.1
〜5重量%使用する。ウオラストナイトか0.1%以下
では、外部結晶核剤としての効果がなく、結晶ピークが
2か所となり、5%以上では、導体と反応し電気特性が
劣化する。
(Hereinafter, blank space) In order to make the glass made of the above composition into a glass that crystallizes in a temperature range of 850'C or less, wollastonite (CaO 5i02>) is added at 0.1% as a crystal nucleating agent.
~5% by weight is used. If wollastonite is less than 0.1%, it will not be effective as an external crystal nucleating agent and the crystal peaks will be in two places, and if it is more than 5%, it will react with the conductor and deteriorate the electrical properties.

上記の範囲で少量使用することにより、850’Cで熱
処理することによって、結晶相として、Zn2F04 
、Ca0−AI2o3628102、CaO”T : 
02 ”S : 02を析出させ、融剤成分を大巾に低
減させることができ、厚膜回路用絶縁体ガラスとして信
頼性の高いガラスが得られる。
By using a small amount within the above range and heat-treating at 850'C, Zn2F04 can be formed as a crystalline phase.
, Ca0-AI2o3628102, CaO"T:
02''S: By precipitating 02, the fluxing agent component can be greatly reduced, and a highly reliable glass can be obtained as an insulating glass for thick film circuits.

更に、上記のガラスに、耐熱性を付与するために、通常
のセラミック微粉末として、α−アルミナ、Y)−アル
ミナ、γ−アルミナ、θ−アルミナ、ジルコニア、ジル
コン、酸化チタン、コージェライト、β−ユークリプタ
イト、スボジュメン、F02、MgO等を0.1〜5重
量%添加することができる。このセラミック微粉末が0
.1重量%以下であればその効果がなくなり、5重量%
を超えると、平面平滑性が悪くなり、耐電圧特性も悪く
なる。
Furthermore, in order to impart heat resistance to the above glass, ordinary ceramic fine powders such as α-alumina, Y)-alumina, γ-alumina, θ-alumina, zirconia, zircon, titanium oxide, cordierite, β - Eucryptite, subodumene, F02, MgO, etc. can be added in an amount of 0.1 to 5% by weight. This ceramic fine powder is 0
.. If it is less than 1% by weight, the effect disappears, and if it is less than 5% by weight.
If it exceeds, the planar smoothness will deteriorate and the withstand voltage characteristics will also deteriorate.

(ホ)作用 本願は、外部結晶核剤として、ウオラストナイト微粉末
を添加することによって約850’C以下の熱処理によ
り、結晶相として、Z n2 S l 04、Ca0−
A I2O3・23 io2 、cao−TO2・S 
+ 02を析出するガラス組成物とし、又、更にはセラ
ミック微粉末を少量添加することによって、耐熱性及び
表面平滑[生か大巾に改善され、耐電圧特性が向上する
(E) Function The present invention is capable of forming Z n2 S l 04, Ca0- as a crystalline phase by heat treatment at about 850'C or less by adding fine wollastonite powder as an external crystal nucleating agent.
A I2O3・23 io2, cao-TO2・S
By using a glass composition that precipitates +02 and further adding a small amount of fine ceramic powder, the heat resistance and surface smoothness are greatly improved, and the withstand voltage characteristics are improved.

(へ〉実施例 常法に従い、表に示す目標組成となるように各成分原料
を適宜秤量調合して、パッチを調整し、1400〜15
00°Cで1〜3時間溶解し、溶融1 ガラスとする。この溶融ガラスを水砕し、ガラス片とし
、このガラス片とウオラストナイトを、更に必要に応じ
てセラミック微粉末を、ボールミル等で微粉砕し分級処
理を行って、平均粒径2〜3μm、最大粒径10)tl
mのガラスセラミック微粉体とする。このガラスセラミ
ック微粉体を周知のビヒクル剤、例えば、エチルセルロ
ース5%のαテルピネオールとブチルカルピトールアセ
テートを2:1の比率で混合した溶液と混練してペース
ト化した。次いて基板上に導体ペーストと絶縁ペストと
をスクリーン印刷し、乾燥後、850’Cで10分間焼
戊し、導体被膜と絶縁被膜を交互に形成し、表に示す各
品持性を測定した結果を同表に示す。
(F) Example According to the usual method, each component raw material was appropriately weighed and mixed to achieve the target composition shown in the table, and the patch was prepared.
Melt at 00°C for 1 to 3 hours to obtain molten glass. This molten glass is crushed into glass pieces, and the glass pieces and wollastonite, and if necessary, ceramic fine powder are finely pulverized and classified using a ball mill, etc., to obtain particles with an average particle size of 2 to 3 μm. Maximum particle size 10)tl
m of glass ceramic fine powder. This glass ceramic fine powder was kneaded with a well-known vehicle agent, for example, a solution of 5% ethyl cellulose, alpha terpineol and butyl carpitol acetate mixed in a ratio of 2:1 to form a paste. Next, a conductive paste and an insulating paste were screen printed on the board, dried, and baked at 850'C for 10 minutes to form a conductive film and an insulating film alternately, and the properties shown in the table were measured. The results are shown in the same table.

表に示すように本願の実施例1乃至5は、比較例1乃至
6に比べて絶縁破壊強度が大きく、耐酸性及び表面平滑
性も良好である。
As shown in the table, Examples 1 to 5 of the present application have higher dielectric breakdown strength and better acid resistance and surface smoothness than Comparative Examples 1 to 6.

(ト〉本発明の効果 2 本発明のガラス組成物は、表の諸性[生を有しているた
め、厚膜集積回路のクロスオーバー用の電気絶縁層形成
のためのガラス組成物として好適である。
(G) Effect 2 of the present invention The glass composition of the present invention has various properties listed below, and is therefore suitable as a glass composition for forming an electrically insulating layer for crossover of thick film integrated circuits. It is.

尚、表中の品持性の説明は以下のとおりである。In addition, the explanation of the shelf life in the table is as follows.

・DTA特性 各ガラス粉末250m3を示差熱分析器のホルダーに入
れ、室温より20’Q/minの昇温速度で上昇させ、
転移点、軟化点、結晶第1、第2ピーク(°C)を測定
し、表に示した。
・DTA characteristics 250 m3 of each glass powder was placed in a holder of a differential thermal analyzer, and the temperature was raised from room temperature at a rate of 20'Q/min.
The transition point, softening point, and first and second crystal peaks (°C) were measured and shown in the table.

・熱膨張係数 各粉末試験を棒状に圧縮成形した後、850°Cで10
分間加熱したものの熱膨張係数(50〜350°C平均
、単位:X10−7℃−1を測定し、表に小した。
・Thermal expansion coefficient After compression molding each powder test into a rod shape, the coefficient of thermal expansion was 10 at 850°C.
The thermal expansion coefficient (50-350°C average, unit: X10-7°C-1) of the sample heated for 1 minute was measured and shown in the table.

・誘電率、読電損失 各試料の焼成品(850°C110分)の25°C16
0%R目、1MHzにおける誘電率(ε〉、及び誘電損
失(tanδ)を測定し、表に示した。
・Dielectric constant, reading loss of each sample fired product (850°C 110 minutes) at 25°C16
The dielectric constant (ε>) and dielectric loss (tan δ) at 0% Rth and 1 MHz were measured and shown in the table.

εは11以下、tanδは、20X10−4以下である
ことが望ましい。
It is desirable that ε is 11 or less, and tan δ is 20×10 −4 or less.

・体積固有抵抗 各試料の焼成品(850’C,10分〉の25°C16
0%Rl−(,50Vにおける体積固有抵抗(1014
0hm−cm〉を測定し、表に示した。この値は、10
14ohm−cm以上であることが要求される。
・Volume resistivity Calculated products of each sample (850'C, 10 minutes) at 25°C16
0%Rl-(, Volume resistivity at 50V (1014
0 hm-cm> was measured and shown in the table. This value is 10
It is required that the thickness be 14 ohm-cm or more.

・絶縁破壊強度 各試料の焼成品(850’C,10分)の絶縁破壊強度
(K V / cm )を測定し、表に示した。この値
は250K V / cm以上であることか望ましい。
- Dielectric breakdown strength The dielectric breakdown strength (K V / cm ) of each sample fired product (850'C, 10 minutes) was measured and shown in the table. It is desirable that this value is 250 KV/cm or more.

・耐酸性 各試料の焼成品(850°C110分)を20%のシュ
ウ酸水溶液に入れ、90°Cに10分間加温し、試料の
重量損失割合(%)を測定し、その値を表に示した。こ
の値は0,1%以下であることが望ましい。
- Acid resistance: Place the baked product of each sample (850°C, 110 minutes) in a 20% oxalic acid aqueous solution, heat it to 90°C for 10 minutes, measure the weight loss rate (%) of the sample, and display the value. It was shown to. This value is preferably 0.1% or less.

・表面粗さ 各試料の焼成品(850’C110分〉の表面粗さ(μ
卯)を測定し、表に示した。この値は0゜6μ班以下で
あることが望ましい。
・Surface roughness The surface roughness (μ
Rabbit) was measured and shown in the table. This value is desirably 0°6 μm or less.

Claims (2)

【特許請求の範囲】[Claims] (1)重量%表示で: SiO_2:20〜50% A_2O_3:10〜20% CaO:10〜20% ZnO:10〜15.49% TiO_2:10〜20% B_2O_3:0〜3% MgO:0.5〜10% ZrO_2:0〜3% P_2O_5:0〜3% F_2:0〜2% のガラス組成物に、重量比でウオラストナイト(CaO
−SiO_2)0.1〜5%を混合してなる絶縁体ガラ
ス組成物。
(1) In weight% display: SiO_2: 20-50% A_2O_3: 10-20% CaO: 10-20% ZnO: 10-15.49% TiO_2: 10-20% B_2O_3: 0-3% MgO: 0. Wollastonite (CaO
-SiO_2) 0.1 to 5% of an insulating glass composition.
(2)重量%表示で: SiO_2:30〜40% Al_2O_3:10〜20% CaO:15〜20% ZnO:10〜15.49% TiO_2:10〜20% B_2O_3:0.5〜2% ′ MgO:0.5〜5% ZrO_2:0.2〜1% P_2O_5:0.1〜1% F_2:0.1〜1% のガラス組成物に、重量比でウオラストナイト(CaO
−SiO_2)0.1〜5%とセラミック微粉末0.1
〜5%を混合してなる絶縁体ガラス組成物。
(2) In weight%: SiO_2: 30-40% Al_2O_3: 10-20% CaO: 15-20% ZnO: 10-15.49% TiO_2: 10-20% B_2O_3: 0.5-2%' MgO : 0.5-5% ZrO_2: 0.2-1% P_2O_5: 0.1-1% F_2: 0.1-1% Wollastonite (CaO
-SiO_2) 0.1-5% and ceramic fine powder 0.1
An insulating glass composition formed by mixing ~5%.
JP1204430A 1989-08-07 1989-08-07 Insulator glass composition Expired - Lifetime JP2832374B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1204430A JP2832374B2 (en) 1989-08-07 1989-08-07 Insulator glass composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1204430A JP2832374B2 (en) 1989-08-07 1989-08-07 Insulator glass composition

Publications (2)

Publication Number Publication Date
JPH0369529A true JPH0369529A (en) 1991-03-25
JP2832374B2 JP2832374B2 (en) 1998-12-09

Family

ID=16490409

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1204430A Expired - Lifetime JP2832374B2 (en) 1989-08-07 1989-08-07 Insulator glass composition

Country Status (1)

Country Link
JP (1) JP2832374B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0547154A4 (en) * 1990-09-07 1994-07-06 Ferro Corp Crystallizing enamel composition and method of using the same
WO2010006116A1 (en) * 2008-07-09 2010-01-14 E. I. Du Pont De Nemours And Company Insulation layer and method for producing thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0547154A4 (en) * 1990-09-07 1994-07-06 Ferro Corp Crystallizing enamel composition and method of using the same
WO2010006116A1 (en) * 2008-07-09 2010-01-14 E. I. Du Pont De Nemours And Company Insulation layer and method for producing thereof

Also Published As

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