JPH0370201B2 - - Google Patents
Info
- Publication number
- JPH0370201B2 JPH0370201B2 JP5754182A JP5754182A JPH0370201B2 JP H0370201 B2 JPH0370201 B2 JP H0370201B2 JP 5754182 A JP5754182 A JP 5754182A JP 5754182 A JP5754182 A JP 5754182A JP H0370201 B2 JPH0370201 B2 JP H0370201B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- grating
- diffraction grating
- refractive index
- optical element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 6
- 230000002265 prevention Effects 0.000 claims 1
- 239000010408 film Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000001028 reflection method Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Description
【発明の詳細な説明】
本発明は、回折格子を利用した、光学素子の新
規な表面反射防止法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel method for preventing surface reflection of optical elements using a diffraction grating.
従来、レンズ、プリズム、ビームスプリツタ
等々の光学素子の表面反射の防止のためには、単
層または二層の透明薄膜をその表面に蒸着するこ
とにより、反射防止膜を形成している。例えば二
層膜では、各層の屈折率をn1、n2、その厚みを
d1、d2とすれば、光がこの薄膜に垂直に入射する
とき、
n0・n2 2=n2 1ng ……(1)
n1、d1=n2・d2=λ/4 ……(2)
ただし、np:光学素子に入射する側の媒質、例
えば空気の屈折率 ng:光学素子の屈折率
λ:光学素子に入射する光の波長
の関係を満すようにすれば反射率を殆んど零にす
ることが出来る。 Conventionally, in order to prevent surface reflection of optical elements such as lenses, prisms, beam splitters, etc., an antireflection film is formed by depositing a single-layer or two-layer transparent thin film on the surface of the optical element. For example, in a two-layer film, the refractive index of each layer is n 1 , n 2 , and the thickness is
Assuming d 1 and d 2 , when light is perpendicularly incident on this thin film, n 0 · n 2 2 = n 2 1 n g ...(1) n 1 , d 1 = n 2 · d 2 = λ /4 ...(2) where, n p : refractive index of the medium on the side that enters the optical element, such as air n g : refractive index of the optical element λ : satisfies the relationship of wavelength of light entering the optical element By doing so, the reflectance can be reduced to almost zero.
しかし、この屈折率n1、n2の条件を完全に満す
材料はなく、膜厚d1、d2のコントロールも技術的
にかなり困難である。その上、普通は入射光は単
色光でなく、入射角が垂直からずれることが多い
ので完全な反射防止効果を望むことは出来ない。
現状では、例えば入射光の波長幅が200nm、入射
角度の幅20゜の場合、反射率を2%以下にするこ
とはかなり困難である。さらに、光学素子の屈折
率、入射角等に応じてそのつど反射防止膜の設
計・作成を行なわなければならない等、多くの問
題を含むものであつた。 However, there is no material that completely satisfies the conditions for the refractive index n 1 and n 2 , and controlling the film thicknesses d 1 and d 2 is also technically quite difficult. Furthermore, since the incident light is usually not monochromatic and the angle of incidence often deviates from the vertical, a perfect antireflection effect cannot be expected.
At present, for example, when the wavelength width of incident light is 200 nm and the width of the incident angle is 20 degrees, it is quite difficult to reduce the reflectance to 2% or less. Furthermore, there are many other problems, such as the need to design and prepare an antireflection film each time depending on the refractive index, angle of incidence, etc. of the optical element.
本発明は、透過型の回折格子の格子間隔が小と
なり、0次回折光しか存在しないようになれば、
0次光以外の方向への光の伝播がなくなり、結局
反射光も消滅することを利用し、波長、入射角等
にある程度の幅のある場合でも有効に作用する反
射防止法を提供するものである。 In the present invention, if the grating interval of the transmission type diffraction grating becomes small and only the 0th order diffraction light exists,
This method utilizes the fact that light propagation in directions other than zero-order light disappears, and reflected light eventually disappears, and provides an anti-reflection method that is effective even when there is a certain range of wavelength, angle of incidence, etc. be.
以下、図面を参照して詳細に説明する。 A detailed description will be given below with reference to the drawings.
本発明の方法の原理は次のようである。第1図
は、回折格子の拡大断面を示し、媒質の屈折率
をnp、レリーフ型の回折格子を形成してある媒質
の屈折率をngとし、媒質から媒質へ波長λ
の光が入射角θiで入射するものとする。このと
き、回折格子で回折され、媒質中へ進入する回
折光の次数をm、出射角度をθmとすれば次式が
成立つ
(ngk)2−(npksinθi+m2π/D)2
=(ngkcosθn)2 ……(3)
ただし、k=2π/λ D:回折格子間隔
ところで、格子間隔Dを波長λに比べて短かく
すると上式はm=0の0次回折光に対してのみ成
立し、m=±1、±2…等の高次回折光に対して
は成立しなくなる。この状態になると、入射光の
エネルギーは0次光に集中し、他の高次回折光は
存在しなくなる。 The principle of the method of the present invention is as follows. Figure 1 shows an enlarged cross section of a diffraction grating, where the refractive index of the medium is n p , the refractive index of the medium forming the relief grating is n g , and the wavelength from one medium to another is λ
Assume that light is incident at an incident angle θ i . At this time, if the order of the diffracted light that is diffracted by the diffraction grating and enters the medium is m, and the exit angle is θm, the following formula holds (n g k) 2 − (n p k sin θ i + m2π/D) 2 = (n g kcosθ n ) 2 ...(3) where, k = 2π/λ D: Diffraction grating spacing By the way, if the grating spacing D is made shorter than the wavelength λ, the above equation becomes the 0th order diffracted light with m = 0. This only holds true for high-order diffracted light such as m=±1, ±2, . . . . In this state, the energy of the incident light is concentrated in the zero-order light, and other higher-order diffraction light ceases to exist.
上式を変形して、m=±1、±2…の高次回折
光が存在しなくなる条件を求めると次式となる。 By modifying the above equation to find the conditions under which higher-order diffracted light of m=±1, ±2, etc. no longer exists, the following equation is obtained.
D<λ/(npsinθi+ng) ……(4)
第2図は上記の回折格子による反射防止を行つ
た光学素子の1例を示す概念図で、立方体型ビー
ムスプリツタ1の光の入射面に形成した三角形状
レリーフ型の直線回折格子2を誇張して示してあ
る。 D<λ/(n p sinθ i +n g ) ...(4) Figure 2 is a conceptual diagram showing an example of an optical element that uses the above-mentioned diffraction grating to prevent reflection. The triangular relief type linear diffraction grating 2 formed on the incident surface is exaggerated.
回折格子の深さをhとし、この深さhを変化さ
せたときの反射率変化を理論的に算出した結果を
第3図に示す。ただし、ビームスプリツタの屈折
率を1.52とし、これに貼着された回折格子の媒質
の屈折率ngを1.5、空気の屈折率npを1、入射光
波長λを0.550μm、格子間隔Dを0.5λとし、入射
光は格子に平行な直線偏光とした。これによれ
ば、格子の深さがほぼλ/4で反射率を1%程度に
抑えることが出来る。 The depth of the diffraction grating is h, and FIG. 3 shows the results of theoretically calculating the change in reflectance when the depth h is changed. However, the refractive index of the beam splitter is 1.52, the refractive index n g of the medium of the diffraction grating attached to it is 1.5, the refractive index n p of air is 1, the incident light wavelength λ is 0.550 μm, and the grating spacing D was set to 0.5λ, and the incident light was linearly polarized parallel to the grating. According to this, the reflectance can be suppressed to about 1% when the depth of the grating is approximately λ/4.
第2図に示すように三角形状回折格子は光の入
射面に透光性樹脂あるいは透光性無機材料を塗布
あるいは蒸着し、周知のようにルーリングエンジ
ンによつてダイモンドカツターによつて切ること
が出来る。第1図に示すような正弦波状レリーフ
型回折格子は、ホトレジスト等の感光材料を塗布
し、2つの平面波の干渉光で露光・現像するとい
う公知のホログラフイツク技術によつて容易に作
成しうる。第4図はそのための光学配置の1例を
示し、光学素子11上に塗布されたフオトレジス
ト等の感光材料12に図示しないレーザからの平
行光13をビームスプリツタ14によつて2つの
平行光束15,16に分割し、それぞれ反射鏡1
7,18で反射させ、その干渉光を入射させる。
いま、2つの平行光束が感光材料12に入射する
角度をそれぞれφO、φRとすれば、感光材料12
には次式で示される間隔Dの干渉縞が生ずる。 As shown in Figure 2, a triangular diffraction grating is produced by coating or depositing a transparent resin or a transparent inorganic material on the light incident surface, and then cutting it with a diamond cutter using a ruling engine as is well known. I can do it. A sinusoidal relief type diffraction grating as shown in FIG. 1 can be easily produced by a known holographic technique in which a photosensitive material such as photoresist is coated, exposed and developed using interference light of two plane waves. FIG. 4 shows an example of an optical arrangement for this purpose, in which a parallel beam 13 from a laser (not shown) is applied to a photosensitive material 12 such as a photoresist coated on an optical element 11, and is divided into two parallel beams by a beam splitter 14. Divided into 15 and 16 parts, each with 1 reflecting mirror.
7 and 18, and the interference light is made incident.
Now, if the angles at which the two parallel light beams enter the photosensitive material 12 are φ O and φ R , respectively, then the photosensitive material 12
Interference fringes with an interval D shown by the following equation are generated.
D=λO/(sinφO+sinφR) ……(5)
ただし、λO:記録する光の波長
このDが光学素子11の使用条件の範囲内で(4)
式の条件を満すようにλO、φO、φRを選んでやれ
ばよい。 D=λ O /(sinφ O +sinφ R ) ...(5) However, λ O is the wavelength of the light to be recorded. If this D is within the usage conditions of the optical element 11, (4)
λ O , φ O , and φ R should be selected so as to satisfy the conditions of the equation.
本発明の反射防止効果を従来の2層の反射防止
膜と比較してみる。第5図は入射光の波長の変化
に対する反射率の変化を示したもので、実線は回
折格子の深さh=0.24μm、格子間隔D=0.25μm、
格子の媒質の屈折率ng=1.50とした場合のもので
あり、破線は2層反射防止膜で(1)(2)式に従い中心
波長λ=0.550μm、n1=1.39、n2=1.714、d1=
98.9nm、d2=80.2nmとしてある。共に光学素子
の屈折率は1.52、入射角は0゜である。2層膜では
0.4〜0.8μmの波長範囲で反射率は0%から5%と
大きく変化しているが、本発明の回折格子を用い
た場合は同じ波長範囲で0.4%〜0.9%と波長変化
による反射率の変動が殆んど見られない。 The antireflection effect of the present invention will be compared with that of a conventional two-layer antireflection film. Figure 5 shows the change in reflectance with respect to the change in the wavelength of incident light.
This is when the refractive index of the grating medium n g = 1.50, and the broken line is a two-layer anti-reflection film, with center wavelength λ = 0.550 μm, n 1 = 1.39, n 2 = 1.714 according to equations (1) and (2). , d 1 =
98.9 nm, d 2 =80.2 nm. The refractive index of both optical elements is 1.52, and the angle of incidence is 0°. In a two-layer film
The reflectance varies greatly from 0% to 5% in the wavelength range of 0.4 to 0.8 μm, but when the diffraction grating of the present invention is used, the reflectance due to wavelength change is 0.4% to 0.9% in the same wavelength range. Almost no changes can be seen.
第6図は本発明の反射防止回折格子への入射角
度θiの変化に伴う反射率の変動を示す。 FIG. 6 shows changes in reflectance with changes in the angle of incidence θ i on the antireflection diffraction grating of the present invention.
格子の深さh=0.3λ及びh=0.4λの2つの場合
を示し、格子間隔D=0.5λ、格子媒質の屈折率は
1.50である。入射角変化が30゜にも及ぶ範囲で反
射率は高々1%に抑えることが出来る。 Two cases are shown: grating depth h = 0.3λ and h = 0.4λ, grating spacing D = 0.5λ, and the refractive index of the grating medium is
It is 1.50. In a range where the angle of incidence changes by as much as 30°, the reflectance can be suppressed to at most 1%.
上記の説明では回折格子は直線格子としたが、
使用目的によつて同心円格子等、他の形状の格子
でもよく、光学素子からの光の出射面についても
同様の効果が生ずることは云う迄もない。 In the above explanation, the diffraction grating is a linear grating, but
Depending on the purpose of use, a grating of other shapes such as a concentric grating may be used, and it goes without saying that the same effect will be produced on the light exit surface of the optical element.
第1図は本発明の反射防止法の原理説明図、第
2図はビームスプリツタに応用した場合の概念
図、第3図は格子の深さと反射率の関係を示す曲
線図、第4図はホログラムの記録光学系の配置
図、第5図、第6図は入射光波長及び入射角の変
化に伴う反射率の変動を示す曲線図である。
1……ビームスプリツタ、2……回折格子、1
1……光学素子、12……感光材料、13……入
射ビーム、14……ビームスプリツタ、17,1
8……反射鏡。
Figure 1 is a diagram explaining the principle of the antireflection method of the present invention, Figure 2 is a conceptual diagram when applied to a beam splitter, Figure 3 is a curve diagram showing the relationship between grating depth and reflectance, and Figure 4. 5 is a layout diagram of a hologram recording optical system, and FIGS. 5 and 6 are curve diagrams showing changes in reflectance with changes in incident light wavelength and incident angle. 1... Beam splitter, 2... Diffraction grating, 1
1... Optical element, 12... Photosensitive material, 13... Incident beam, 14... Beam splitter, 17, 1
8...Reflector.
Claims (1)
該回折格子間隔Dが D<λ/(npsinθi+ng) ただし λ:光学素子への入射光波長 θi光学
素子への入射角、np:格子の入射側の媒質の屈折
率、ng:回折格子の媒質の屈折率の関係を満すこ
とを特徴とする光学素子の表面反射防止法[Claims] 1. A diffraction grating is provided on the light input/output surface of the optical element,
The diffraction grating spacing D is D<λ/(n p sinθ i +n g ) where λ: wavelength of light incident on the optical element θi angle of incidence on the optical element, n p : refractive index of the medium on the incident side of the grating, n g : A surface reflection prevention method for optical elements characterized by satisfying the refractive index relationship of the medium of the diffraction grating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5754182A JPS58174906A (en) | 1982-04-07 | 1982-04-07 | Method for preventing surface reflection of optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5754182A JPS58174906A (en) | 1982-04-07 | 1982-04-07 | Method for preventing surface reflection of optical element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58174906A JPS58174906A (en) | 1983-10-14 |
| JPH0370201B2 true JPH0370201B2 (en) | 1991-11-06 |
Family
ID=13058618
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5754182A Granted JPS58174906A (en) | 1982-04-07 | 1982-04-07 | Method for preventing surface reflection of optical element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58174906A (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5115423A (en) * | 1988-01-07 | 1992-05-19 | Ricoh Company, Ltd. | Optomagnetic recording/reproducing apparatus |
| JPH01252902A (en) * | 1988-04-01 | 1989-10-09 | Kuraray Co Ltd | Low reflection diffraction grating and its production |
| BE1010069A6 (en) * | 1996-03-29 | 1997-12-02 | Imec Inter Uni Micro Electr | Optical system with high reflectivity grid |
| US5995285A (en) * | 1996-07-09 | 1999-11-30 | Canon Kabushiki Kaisha | Multilevel optical diffraction device with antireflection film and exposure apparatus |
| JP2000111715A (en) | 1998-10-01 | 2000-04-21 | Canon Inc | Reflective optical element and imaging device using the same |
| JP2002350624A (en) | 2001-05-25 | 2002-12-04 | Canon Inc | Optical element, scanning optical system having the same, and image forming apparatus |
| JP4454898B2 (en) * | 2001-12-17 | 2010-04-21 | キヤノン株式会社 | Scanning optical system and image forming apparatus having the same |
| US6661830B1 (en) | 2002-10-07 | 2003-12-09 | Coherent, Inc. | Tunable optically-pumped semiconductor laser including a polarizing resonator mirror |
| JP2005062525A (en) | 2003-08-13 | 2005-03-10 | Canon Inc | Optical element and optical system |
| JP2008116965A (en) * | 2007-11-07 | 2008-05-22 | Canon Inc | Scanning optical system and image forming apparatus having the same |
| JP2017111278A (en) * | 2015-12-16 | 2017-06-22 | 株式会社リコー | Optical window member, laser device, ignition device, and internal combustion engine |
-
1982
- 1982-04-07 JP JP5754182A patent/JPS58174906A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58174906A (en) | 1983-10-14 |
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