JPH037210B2 - - Google Patents
Info
- Publication number
- JPH037210B2 JPH037210B2 JP58094050A JP9405083A JPH037210B2 JP H037210 B2 JPH037210 B2 JP H037210B2 JP 58094050 A JP58094050 A JP 58094050A JP 9405083 A JP9405083 A JP 9405083A JP H037210 B2 JPH037210 B2 JP H037210B2
- Authority
- JP
- Japan
- Prior art keywords
- surface layer
- vinyl silane
- mesh electrodes
- optical component
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 14
- 239000002344 surface layer Substances 0.000 claims description 11
- -1 vinyl silane compound Chemical class 0.000 claims description 9
- 239000007789 gas Substances 0.000 claims description 8
- 239000004033 plastic Substances 0.000 claims description 8
- 229920003023 plastic Polymers 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 7
- 239000002991 molded plastic Substances 0.000 claims description 6
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000004381 surface treatment Methods 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- YLJJAVFOBDSYAN-UHFFFAOYSA-N dichloro-ethenyl-methylsilane Chemical compound C[Si](Cl)(Cl)C=C YLJJAVFOBDSYAN-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2011/00—Optical elements, e.g. lenses, prisms
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Description
【発明の詳細な説明】
この発明は、成形したプラスチツク製光学部品
の表面処理方法および装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method and apparatus for surface treatment of molded plastic optical components.
従来、プラスチツク製光学部品の表面の強化処
理技術としてはSiO2スパツタや蒸着コーテイン
グ法が古くから用いられてきた。このような方法
は十分な耐薬品性耐摩耗性を表面層に与えるが、
色素によつては着色させることができない欠点が
ある。またプラスチツクス（有機質）の上ににハ
ードコート膜（無機質／有機質）を成膜してプラ
スチツクスの表面に光学用薄膜（無機質）を密着
よく形成する方法も知られているが、この方法で
はその処理工程において被処理物を液体中に浸漬
するため、付着膜面が厚くなり、高い光学精度に
成形された表面の精度を損なうおそれがある。さ
らにAPPLIED OPTICS Vol.16，No.３にはビニ
ールシランモノマーを用いてポリカーボネート上
にプラズマ重合によつて単層耐摩耗性反射防止膜
を形成し、そしてプラズマ酸化反応を用いて上記
膜の表面の耐摩耗性を更に向上させる方法が提案
されている。しかしこの方法では単なるプラズマ
重合だけであるので十分な重合反応を保証するこ
とができない。 Conventionally, SiO 2 sputtering and vapor deposition coating methods have long been used as surface strengthening treatment techniques for plastic optical components. Although such methods provide sufficient chemical and abrasion resistance to the surface layer,
Some dyes have the disadvantage that they cannot be colored. Another known method is to form a hard coat film (inorganic/organic) on plastic (organic) to form an optical thin film (inorganic) with good adhesion to the surface of the plastic. Since the object to be treated is immersed in the liquid in the treatment process, the surface of the adhered film becomes thick, which may impair the precision of the surface formed with high optical precision. Furthermore, APPLIED OPTICS Vol. 16, No. 3 uses vinyl silane monomer to form a single-layer abrasion-resistant anti-reflective coating on polycarbonate by plasma polymerization, and then uses plasma oxidation reaction to improve the surface of the coating. Methods have been proposed to further improve wear resistance. However, since this method involves only plasma polymerization, a sufficient polymerization reaction cannot be guaranteed.
そこでこの発明の目的は、高分子の有機化学的
性質を十分保持できる範囲内で、成形したプラス
チツク製光学部品の表面にSiの酸化物を含む側鎖
を持ち十分な耐薬品性耐摩耗性の表面層を形成す
る方法および装置を提供することにある。 Therefore, the purpose of this invention is to have a side chain containing Si oxide on the surface of a molded plastic optical component to have sufficient chemical resistance and wear resistance, within a range that can sufficiently maintain the organic chemical properties of the polymer. An object of the present invention is to provide a method and apparatus for forming a surface layer.
上記目的のためこの発明の方法によれば、成形
したプラスチツク製光学部品の表面層を活性化
し、表面層の活性化された光学部品を一般構造を
もつビニールシラン化合物蒸気にさらしてビニー
ルシラン化合物を上記活性化された表面層にグラ
フト結合させ、その後酸化処理によつて高分子に
グラフト結合されたビニールシラン化合物側鎖を
酸化して耐薬品性耐摩耗性表面層を得ることを特
徴としている。 For the above purpose, according to the method of the present invention, the surface layer of a molded plastic optical component is activated, and the optical component with the activated surface layer is exposed to a vinyl silane compound vapor having the general structure to form a vinyl silane compound. It is characterized in that it is graft-bonded to the above-mentioned activated surface layer and then oxidized by oxidation treatment to oxidize the side chains of the vinyl silane compound graft-bonded to the polymer to obtain a chemical-resistant and abrasion-resistant surface layer.
表面層の活性化は好ましくはプラズマ中に浸漬
することによつて行なわれ得るが、当然、ラジカ
ル種を生成させることのできる他の手段、例えば
EB照射、Ｘ線照射、UV照射等を用いることも
できる。 Activation of the surface layer can preferably be carried out by immersion in a plasma, but of course other means capable of generating radical species, e.g.
EB irradiation, X-ray irradiation, UV irradiation, etc. can also be used.
またこの発明による装置においては、処理すべ
き成形したプラスチツク製光学部品を収容する真
空処理室内に二つの網状電極を間隔を置いて重ね
て配置し、これら網状電極間でRF放電を生じさ
せ、それによるアフターグローで処理すべき光学
部品を覆うように構成される。 In the apparatus according to the invention, two mesh electrodes are placed one above the other at a distance in a vacuum processing chamber containing the molded plastic optical component to be processed, and an RF discharge is generated between the mesh electrodes, which is configured to cover the optical component to be treated with afterglow.
従つてこの発明によれば、プラスチツク製光学
部品の表面をプラズマやEB，Ｘ線，UV等を利
用して活性化した後、グラフト反応を利用するた
め、充分な反応を短時間で行なうことができる。
またこの発明はグラフト反応によつて高分子側鎖
に有機シラン化合物を作つた後酸化処理すること
によつて従来の方法により表面の硬くて耐薬品性
の優れた強化層を形成することができる。 Therefore, according to this invention, after activating the surface of a plastic optical component using plasma, EB, X-rays, UV, etc., a sufficient reaction can be carried out in a short time by utilizing a graft reaction. can.
In addition, this invention makes it possible to form a reinforcing layer with a hard surface and excellent chemical resistance using conventional methods by creating an organic silane compound on the side chain of a polymer through a graft reaction and then oxidizing it. .
以下この発明を添附図面を参照して一実施例に
ついて説明する。 Hereinafter, one embodiment of the present invention will be described with reference to the accompanying drawings.
図面にはこの発明の方法の実施に直接する装置
は概略的に示し、１は真空処理室で、この真空処
理室１内に二つの網状電極２，３が間隔（例えば
25mm）を置いて配置され、一方の網状電極２は接
地され、また他方の網状電極３はRF電源４に接
続されている。５は基板すなわち処理すべきプラ
スチツク製光学部品で、図示例では網状電極３か
ら50mmの位置に置かれている。真空処理室１は図
示したように排気系６に連結され、RF放電させ
るための不活性ガスアルゴン又はプラズマ酸化の
場合の酸素を供給する入口７が設けられている。
入口７よりアルゴンガス又は酸素を導入しつつ真
空排気系で所定の圧力に維持し、RF放電を発生
させそのアフターグローで基板を覆う。また気相
のビニールシラン化合物を供給する入口８が設け
られている。ガス供給口７は、例えばプラズマ重
合を行なわせる場合、モノマーガスを導入する場
合にも利用される。 In the drawing, the apparatus directly involved in carrying out the method of the invention is schematically shown, and 1 is a vacuum processing chamber, in which two mesh electrodes 2, 3 are arranged at a distance (e.g.
25 mm), one mesh electrode 2 is grounded, and the other mesh electrode 3 is connected to an RF power source 4. Reference numeral 5 denotes a substrate, that is, a plastic optical component to be processed, which is placed at a position of 50 mm from the mesh electrode 3 in the illustrated example. The vacuum processing chamber 1 is connected to an exhaust system 6 as shown, and is provided with an inlet 7 for supplying an inert gas argon for RF discharge or oxygen for plasma oxidation.
While introducing argon gas or oxygen through the inlet 7, a predetermined pressure is maintained with a vacuum exhaust system to generate RF discharge and cover the substrate with its afterglow. Also provided is an inlet 8 for supplying a vinyl silane compound in a gas phase. The gas supply port 7 is also used, for example, when performing plasma polymerization or when introducing monomer gas.
次にこの発明の方法の一実施例を記載する。 Next, one embodiment of the method of this invention will be described.
まずアルゴンプラズマを用いて基板を成すプラ
スチツクCR−39の表面処理を行なう。すなわち
基板５の汚れをプラズマで除去すると共にグラフ
ト反応を誘起させるためのラジカル種を生成させ
る。この場合、処理条件は放電パワー密度
1.0Watt／cm2、圧力0.3Torr、アルゴンガス流量
292sccm、放電時間10分である。これにより基板
５はこの条件の下で放電のアフターグローによつ
て完全に覆われる。 First, the surface of the plastic CR-39 that forms the substrate is treated using argon plasma. That is, contamination on the substrate 5 is removed by plasma, and radical species for inducing a graft reaction are generated. In this case, the processing conditions are discharge power density
1.0Watt/cm 2 , pressure 0.3Torr, argon gas flow rate
292 sccm, discharge time 10 minutes. The substrate 5 is thereby completely covered by the afterglow of the discharge under these conditions.
次に排気系により真空処理室１およびビニール
シランモノマーから注意深く酸素を除去する。そ
の後、真空処理室１内にビニールシランを気相で
入口８から導入し、飽和蒸気圧で約３時間放置す
る。この場合飽和蒸気圧は温度によつて変わるの
で、処理温度を高くして飽和蒸気圧を増大させる
ことによつて放置時間を短かくすることができ
る。ビニールシランとして例えばジクロルメチル
ビニールシランを用いた場合、その飽和蒸気圧は
2.5Torrである。こうして約３時間のグラフト反
応により、１ミクロンの膜厚が得られた。 Oxygen is then carefully removed from the vacuum chamber 1 and the vinyl silane monomer using an evacuation system. Thereafter, vinyl silane is introduced into the vacuum processing chamber 1 in a gas phase from the inlet 8, and left at saturated vapor pressure for about 3 hours. In this case, since the saturated vapor pressure changes depending on the temperature, the standing time can be shortened by increasing the processing temperature and increasing the saturated vapor pressure. For example, when dichloromethylvinylsilane is used as the vinyl silane, its saturated vapor pressure is
It is 2.5 Torr. In this way, a film thickness of 1 micron was obtained by grafting reaction for about 3 hours.
こうして基板５の活性化された表面にグラフト
結合したビニールシランの表面被膜を酸素プラズ
マにより酸化処理する。この場合処理条件として
放電密度0.3Watt／cm2弱、圧力0.6Torr、ガス流
量300sccm、放電時間１時間に設定すると表面被
膜の表面硬さ約６（アプレーシヨンテストまたは
スクラツチテスト）が得られた。 The vinyl silane surface film graft-bonded to the activated surface of the substrate 5 is oxidized by oxygen plasma. In this case, if the processing conditions are set to a discharge density of 0.3 Watt/cm2 or less, a pressure of 0.6 Torr, a gas flow rate of 300 sccm, and a discharge time of 1 hour, a surface hardness of approximately 6 (application test or scratch test) of the surface film can be obtained. Ta.
この一連の処理工程により得られた表面被膜は
無色透明であり、グラフト反応により母材と一体
化しているのでスクラツチ耐性が極めてよく、有
機溶媒に対しても安定であつた。しかも生成され
る膜厚は薄く、光学部品の特性を損なうことがな
い。 The surface coating obtained through this series of treatment steps was colorless and transparent, and because it was integrated with the base material through a graft reaction, it had extremely good scratch resistance and was stable against organic solvents. Moreover, the film thickness produced is thin and does not impair the characteristics of the optical component.
このようにこの発明によればプラスチツク製光
学部品の表面をまず活性化した後ビニールシラン
化合物を用いてグラフト反応により表面被膜を形
成し、それを酸化処理することによつて表面硬さ
が約６〜８（スクラツチ特性）でしかも耐薬品性
の保護膜を形成することができる。 As described above, according to the present invention, the surface of a plastic optical component is first activated, and then a surface coating is formed by a graft reaction using a vinyl silane compound, and the surface coating is oxidized to achieve a surface hardness of about 6. -8 (scratch property) and a chemical-resistant protective film can be formed.
図面はこの発明の方法を実施するための装置を
概略的に示す。
図中、１：真空処理室、２，３：網状電極。
The drawing schematically shows an apparatus for carrying out the method of the invention. In the figure, 1: vacuum processing chamber, 2 and 3: mesh electrodes.
Claims (1)
中に浸漬してその表面層を活性化し、表面層の活
性化された上記光学部品をそのまま外気にさらす
ことなく一般構造をもつビニールシラン化合物蒸
気にさらしてビニールシラン化合物を上記活性化
された表面層にグラフト結合させ、そして酸素プ
ラズマによる酸化処理によつて高分子にグラフト
結合されたビニールシラン化合物側鎖を酸化して
耐薬品性耐摩耗性表面層を生成することを特徴と
するプラスチツク製光学部品の表面処理方法。 ２ 処理すべき成形したプラスチツク製光学部品
を収容する真空処理室内に二つの網状電極を間隔
を置いて重ねて配置し、これらの網状電極をそれ
ぞれRF電源および接地に接続し、これらの網状
電極を通つて必要な処理ガスを供給し、上記網状
電極間にグロー放電を発生させこのグロー放電の
アフターグローで上記処理すべき光学部品を覆う
ように構成したことを特徴とする特許請求の範囲
第１項に記載の方法の実施に直接使用する装置。[Scope of Claims] 1. A molded plastic optical component is immersed in plasma to activate its surface layer, and the optical component with the activated surface layer is not exposed to the outside air as it is, but a vinyl silane having a general structure is produced. A vinyl silane compound is grafted to the activated surface layer by exposure to compound vapor, and an oxidation treatment with oxygen plasma oxidizes the vinyl silane compound side chains grafted to the polymer to provide chemical resistance. A method for surface treatment of plastic optical components, characterized in that it produces an abrasive surface layer. 2. Place two mesh electrodes spaced one on top of the other in a vacuum processing chamber containing the molded plastic optics to be processed, connect these mesh electrodes to an RF power source and ground, respectively, and Claim 1 characterized in that the apparatus is configured to supply necessary processing gas through the mesh electrodes, generate glow discharge between the mesh electrodes, and cover the optical components to be treated with the afterglow of the glow discharge. Equipment used directly for carrying out the method described in Section 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58094050A JPS59219340A (en) | 1983-05-30 | 1983-05-30 | Method and apparatus for treating surface of plastic optical part |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58094050A JPS59219340A (en) | 1983-05-30 | 1983-05-30 | Method and apparatus for treating surface of plastic optical part |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59219340A JPS59219340A (en) | 1984-12-10 |
| JPH037210B2 true JPH037210B2 (en) | 1991-02-01 |
Family
ID=14099721
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58094050A Granted JPS59219340A (en) | 1983-05-30 | 1983-05-30 | Method and apparatus for treating surface of plastic optical part |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59219340A (en) |
-
1983
- 1983-05-30 JP JP58094050A patent/JPS59219340A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59219340A (en) | 1984-12-10 |
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