JPH0373384A - Optical information recording member - Google Patents

Optical information recording member

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Publication number
JPH0373384A
JPH0373384A JP1209547A JP20954789A JPH0373384A JP H0373384 A JPH0373384 A JP H0373384A JP 1209547 A JP1209547 A JP 1209547A JP 20954789 A JP20954789 A JP 20954789A JP H0373384 A JPH0373384 A JP H0373384A
Authority
JP
Japan
Prior art keywords
recording
crystal
phase
compound
recording layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1209547A
Other languages
Japanese (ja)
Inventor
Hiroko Iwasaki
岩崎 博子
Yukio Ide
由紀雄 井手
Masato Harigai
真人 針谷
Katsuyuki Yamada
勝幸 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP1209547A priority Critical patent/JPH0373384A/en
Publication of JPH0373384A publication Critical patent/JPH0373384A/en
Pending legal-status Critical Current

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  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

PURPOSE:To prolong the life and improve the recording sensitivity of a recording component by a method wherein a compound composing a recording layer consists of Ib-IIIb-IVb2 or IIb-IVb-Vb2, and crystal variation thereof consists of a phase transition between a chalcopyrite structure and a zinc blende structure. CONSTITUTION:An optical information recording component has a recording layer composed of a compound of which a crystal structure is varied when irradiated by optical beams, and can record and erase information by variation of the crystal structure of this compound. The compounds in the recording layer are Ib-III-b-IVb2 or IIb-IVb-Vb2, and the crystal structure variation thereof is a phase transition between a chalcopyrite structure and a zincblende structure. Such a crystal structural transition improves recording sensitivity of a phase variation type recording material and can make it have long life. Further, 700 to 2000Angstrom should be preferable as a film thickness of the recording layer, and beams of a small compact semiconductor are optimum when attached to a drive as an electromagnetic wave to be used for recording, reproducing, and erazing.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は光情報記録部材、特に、記録層を構成する材料
の結晶構造の変化を利用する光情報記録部材である。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an optical information recording member, particularly an optical information recording member that utilizes a change in the crystal structure of a material constituting a recording layer.

[従来の技術] 電磁波特にレーザービームの照射による情報の記録・再
生および消去可能な光メモリー媒体の一つとして、結晶
−非晶質相間或いは結晶−結晶相聞の転移を利用する、
いわゆる相変化型記録媒体が良く知られている。特に光
、磁気メモリーでは困難な単一ビームによるオーバーラ
イドが可能であり、ドライブ側の光学系もより単純であ
ることなどから最近その研究開発が活発になっている。
[Prior Art] As an optical memory medium that can record, reproduce, and erase information by irradiation with electromagnetic waves, especially laser beams, it utilizes transitions between crystal and amorphous phases or between crystal and crystal phases.
So-called phase change recording media are well known. In particular, it is possible to override with a single beam, which is difficult to do with optical and magnetic memory, and the optical system on the drive side is also simpler, so research and development on this topic has been active recently.

その代表的な材料例として、USP 3.530,44
1に開示されているようにGe−Te5Ge−Te−5
,Ge−5e−8SGe−5e−SbSGe−As−5
eS I n−Te。
As a typical material example, USP 3.530,44
Ge-Te5Ge-Te-5 as disclosed in 1
,Ge-5e-8SGe-5e-SbSGe-As-5
eS I n-Te.

5e−Te、5e−As等所渭カルコゲン系合金材料が
挙げられる。又、安定性、高速結晶化等の向上を目的に
Ge−Te系にAu (特開昭6l−219692) 
、S n及びAu(特開昭61−270190)Pd(
特開昭62−19490)等を添加した材料の提案や、
記録/消去の繰返し性能向上を目的に、Ge−Te−5
e−Sbの組成比を特定した材料(特開昭62−734
38)の提案等もなされている。
Examples include chalcogen-based alloy materials such as 5e-Te and 5e-As. In addition, Au is added to the Ge-Te system for the purpose of improving stability, high-speed crystallization, etc.
, S n and Au (JP-A-61-270190) Pd (
Proposals for materials containing additives such as JP-A-62-19490),
Ge-Te-5 for the purpose of improving repeated recording/erasing performance.
Material with specified composition ratio of e-Sb (Japanese Patent Application Laid-open No. 62-734
38) has also been proposed.

しかしながら、そのいずれもが相変化型書換え可能光メ
モリー媒体として要求される緒特性のすべてを満足し得
るものとはいえない。
However, none of them can satisfy all the characteristics required of a phase change type rewritable optical memory medium.

従来の相変化型記録媒体は結晶−非晶質間の相変化を利
用したものが主である。このような情報記録では記録材
料の温度を融点近くまで上昇させ、結晶を構成している
原子間の結合を切断できるだけの高エネルギーを与える
レーザーを照射することが必要である。
Conventional phase change recording media mainly utilize phase change between crystalline and amorphous states. To record such information, it is necessary to raise the temperature of the recording material close to its melting point and irradiate it with a laser that provides enough energy to break the bonds between the atoms that make up the crystal.

したがって、レーザーの出力を高くするか、記録材に照
射する時間を長くすることが必要になる。レーザーの出
力を高くするには、現在用いられる半導体レーザーの出
力を最大限に利用してやっと実現できる程の高出力を必
要とするため、低エネルギーで書き込み、消去ができる
ものが求められている。一方、照射時間を長くするとき
の問題は光情報記録材の大きな長所とされている高記録
密度、高速アクセスという課題に対して重大な障害にな
る。また、こうして形成させ非晶質相は、熱的安定状態
にはないから経時変化を起し易い。
Therefore, it is necessary to increase the output of the laser or to lengthen the time for irradiating the recording material. Increasing the output of a laser requires a high output that can only be achieved by maximizing the output of currently used semiconductor lasers, so there is a need for something that can write and erase with low energy. On the other hand, the problem of increasing the irradiation time becomes a serious hindrance to the challenges of high recording density and high-speed access, which are considered to be major advantages of optical information recording materials. Furthermore, the amorphous phase formed in this manner is not in a thermally stable state and is therefore susceptible to changes over time.

その結果、長期保存の後にC/Nが低下する可能性があ
る。
As a result, the C/N may decrease after long-term storage.

特に記録感度、消去感度の向上、オーバーライド時の消
し残りによる消去比低下の防止、並びに記録部、未記録
部の長寿命化が解決すべき最重要課題となっている。
In particular, the most important issues to be solved are improving recording sensitivity and erasing sensitivity, preventing a decrease in erasing ratio due to unerased areas during overwriting, and extending the lifespan of recorded and unrecorded areas.

本発明者は黄銅鉱(Chalcopyrite)型構造
を有する化合物が非結晶−結晶の相転移を利用した相変
化型記録材として有効であることを見出しているが、さ
らに−層優れた光情報記録部材が要求されている。
The present inventor has discovered that a compound having a chalcopyrite structure is effective as a phase change type recording material that utilizes an amorphous-crystalline phase transition. is required.

[発明が解決しようとする課題] 本発明は、更に、記録部材の寿命増大および記録感度の
向上した光情報記録部材を提供しようとするものである
[Problems to be Solved by the Invention] A further object of the present invention is to provide an optical information recording member that has an increased service life and improved recording sensitivity.

[課題を解決するための手段] 上記課題を解決するためには、本発明は結晶−非晶質間
の相変化より、結晶−結晶間の相転移を利用する方が、
その物質の融点より低温で、かつ、書き込み、消去に必
要なエネルギーが小さく、かつ、記録部、未記録部共に
結晶質であるので熱的安定性が大きいという特性を利用
しようという着想に基づくものである。
[Means for Solving the Problems] In order to solve the above problems, the present invention utilizes a crystal-crystal phase transition rather than a crystal-amorphous phase change.
This is based on the idea of taking advantage of the characteristics of the material, which is lower in temperature than its melting point, requires less energy for writing and erasing, and has high thermal stability because both the recorded and unrecorded areas are crystalline. It is.

さらに研究を重ねた末黄銅鉱型構造と閃亜鉛鉱(Zln
cblene)型構造間の結晶構造転移が相変化型記録
材として要求されている記録感度の向上、長寿命化とい
う課題を大幅に改善できる有効な相転移であることを見
出した。
Further research has revealed the chalcopyrite-type structure and sphalerite (Zln).
It has been found that the crystal structure transition between the cblene) type structures is an effective phase transition that can significantly improve the problems of improved recording sensitivity and longer life required for phase change recording materials.

すなわち、本発明の構成は、光ビームが照射されると結
晶構造が変化する化合物からなる記録層を有し、上記化
合物の結晶構造変化によって情報を記録、消去できる光
情報記録部材において、記録層の化合物がIb−111
b−VIb2または■b−IVb−Vb2であり、これ
らの結晶構造変化が、黄銅鉱型構造と閃亜鉛鉱構造間の
相転移である光情報記録部材である。
That is, the structure of the present invention is an optical information recording member that has a recording layer made of a compound whose crystal structure changes when irradiated with a light beam, and in which information can be recorded and erased by the change in the crystal structure of the compound. The compound is Ib-111
b-VIb2 or b-IVb-Vb2, and the crystal structure change thereof is a phase transition between a chalcopyrite structure and a sphalerite structure.

記録材中には添加元素を加えてもよい。添加元素として
は、遷移金属や化合物構成元素以外のIb族、■−b族
、■b族あるいはnb族、IVb族、vb族から選ばれ
たものなどが挙げられる。
Additional elements may be added to the recording material. Examples of the additive element include those selected from the Ib group, ■-b group, ■b group, nb group, IVb group, and Vb group other than transition metals and compound constituent elements.

本発明の前記情報記録媒体は、必要に応じて耐熱保護層
、表面保護層、反射層、接着層等の補助層を設けてもよ
い。本発明で用いられる基板は通常、ガラス、セラミッ
クスあるいは樹脂であり、樹脂基板が成型性、コスト等
の点で好適である。樹脂の代表例としてはポリカーボネ
ート樹脂、アクリル樹脂、エポキシ樹脂、ポリスチレン
樹脂、アクリロニトリル−スチレン共重合体樹脂、ポリ
エチレン樹脂、ポリプロピレン樹脂、シリコン系樹脂、
フッ素系樹脂、ABS樹脂、ウレタン樹脂等が挙げられ
るが、加工性、光学特性等の点でポリカーボネート樹脂
、アクリル系樹脂が好ましい。又、基板の形状としては
ディスク状、カード状あるいはシート状であっても良い
The information recording medium of the present invention may be provided with auxiliary layers such as a heat-resistant protective layer, a surface protective layer, a reflective layer, and an adhesive layer, if necessary. The substrate used in the present invention is usually made of glass, ceramics, or resin, and resin substrates are preferable in terms of moldability, cost, and the like. Typical examples of resins include polycarbonate resin, acrylic resin, epoxy resin, polystyrene resin, acrylonitrile-styrene copolymer resin, polyethylene resin, polypropylene resin, silicone resin,
Examples include fluororesins, ABS resins, urethane resins, etc., but polycarbonate resins and acrylic resins are preferable in terms of processability, optical properties, etc. Further, the shape of the substrate may be a disk, a card, or a sheet.

耐熱性保護層の材料としては、Sin。The material for the heat-resistant protective layer is Sin.

5iOz、ZnO,SnO2、Al2O3、Ti0z、
In2O3、Mg0SZr02等の金属酸化物、Si:
+N4、AIN、TtN。
5iOz, ZnO, SnO2, Al2O3, TiOz,
Metal oxides such as In2O3, Mg0SZr02, Si:
+N4, AIN, TtN.

BNSZrN等の窒化物、SiC,、TaC。Nitride such as BNSZrN, SiC, TaC.

B 4 CSW Cs T iCSZ r C等の炭化
物やダイヤモンド状カーボン或いはそれらの混合物力(
挙げられる。又、必要に応じて不純物を含んでいてもよ
い。このような耐熱性保護層は各種気)目成膜法、例え
ば、真空蒸着法、スノ<・フタ法、プラズマCVD法、
光CVD法、イオンブレーティング広、電子ビーム蒸着
法等によって形成できる。
B 4 CSW Cs T iCSZ r Carbide such as C, diamond-like carbon, or a mixture thereof (
Can be mentioned. Further, it may contain impurities as necessary. Such a heat-resistant protective layer can be formed by various film-forming methods, such as vacuum evaporation, snow-cover method, plasma CVD method,
It can be formed by a photo-CVD method, ion blating method, electron beam evaporation method, or the like.

耐熱性保護層の膜厚としては200〜5000X 。The thickness of the heat-resistant protective layer is 200 to 5000X.

好適には500〜3000ムとするのが良い。200λ
より薄くなると耐熱性保護層としての機能を果たさなく
なり、逆に5000λより厚くなると、感度低下を来し
たり、界面剥離を生じ易くなる。
The preferred range is 500 to 3000 μm. 200λ
If it becomes thinner, it will no longer function as a heat-resistant protective layer, and if it becomes thicker than 5000λ, sensitivity will decrease or interfacial peeling will easily occur.

又、必要に応じて保護層を多層化することもできる。Moreover, the protective layer can be multi-layered if necessary.

相変化材料は単層のみならず、多層膜あるいは超微粒子
状の相変化物質を耐熱性マトリ・ソクス中に分散せしめ
たようなものであっても良い。
The phase change material is not limited to a single layer, but may also be a multilayer film or a phase change material in the form of ultrafine particles dispersed in a heat-resistant matrix.

後者のような記録膜の作製法としては、前記気相成膜以
外にゾル−ゲル法のような湿式プロセスも適用可能であ
る。
As a method for producing the latter type of recording film, a wet process such as a sol-gel method can also be applied in addition to the above-mentioned vapor phase film formation.

記録層の膜厚としては200〜10,000大、好適に
は500〜3000λ、最適には700〜2000λで
ある。
The thickness of the recording layer is 200 to 10,000, preferably 500 to 3000λ, most preferably 700 to 2000λ.

記録、再生及び消去に用いる電磁波としてはレーザー光
、電子線、X線、紫外線、可視光線、赤外線、マイクロ
波等、種々のものが採用可能であるが、ドライブに取付
ける際、小型でコンパクトな半導体レーザーのビームが
最適である。
Various types of electromagnetic waves can be used for recording, reproducing, and erasing, such as laser light, electron beams, X-rays, ultraviolet rays, visible light, infrared rays, and microwaves. A laser beam is best.

[実施例] 実施例によって本発明を具体的に説明する。[Example] The present invention will be specifically explained with reference to Examples.

ただし、これらの実施例は本発明を何ら制限するもので
はない。
However, these Examples do not limit the present invention in any way.

実施例1 記録材としてAgInTe2を用いた。この系の相図を
第1図に示す。図中のγ相は黄銅鉱型構造を6相は閃亜
鉛鉱型構造を示す。
Example 1 AgInTe2 was used as a recording material. The phase diagram of this system is shown in Figure 1. The γ phase in the figure shows a chalcopyrite structure, and the 6 phases show a sphalerite structure.

薄膜はアルゴンプラズマ中で従来のrfス/くツタリン
グ法によりガラス基板上に成膜した。
Thin films were deposited on glass substrates by conventional RF sputtering methods in argon plasma.

膜厚はおよそ2000五である。製膜時にはアモルファ
ス相が得られた。
The film thickness is approximately 2,000 mm. An amorphous phase was obtained during film formation.

第2図は作製した薄膜の示差走査熱量測定(P S C
)の結果である。昇温速度は15℃/winである。2
02℃で非晶質相から結晶相への転移が見られる。この
結晶相は相図とX線回折の結果、黄銅鉱型構造のA g
 I n T e、2である。
Figure 2 shows differential scanning calorimetry (PSC) of the prepared thin film.
) is the result. The temperature increase rate is 15° C./win. 2
A transition from an amorphous phase to a crystalline phase is observed at 02°C. As a result of the phase diagram and X-ray diffraction, this crystal phase has a chalcopyrite-type structure.
I n Te, 2.

353℃で吸熱ピークが観測される。これは黄銅鉱型構
造から閃亜鉛鉱型構造への転移点である。
An endothermic peak is observed at 353°C. This is the transition point from a chalcopyrite-type structure to a sphalerite-type structure.

相図では転移点はおよそ530℃であるが、観測される
転移点はこれに比べ180℃あまり低くなっている。こ
れはAg1nTe2を薄膜化したため、エントロピーの
高い状態が実現され易くなったためと考えられる。又、
この薄膜の融点は相図から得られる融点に近<630℃
である。
In the phase diagram, the transition point is approximately 530°C, but the observed transition point is about 180°C lower than this. This is considered to be because the thinning of Ag1nTe2 makes it easier to achieve a state of high entropy. or,
The melting point of this thin film is close to the melting point obtained from the phase diagram <630℃
It is.

このことから、非晶質−結晶間の転移を利用する場合の
転移点よりも280℃低い温度で結晶−結晶間の相転移
が可能となる。
From this, a crystal-crystal phase transition is possible at a temperature 280° C. lower than the transition point when utilizing an amorphous-crystal transition.

実施例2 記録材として実施例1のAgInTe2のかわりにZn
5nAszを用いた以外は実施例1と同じ条件でガラス
基板上に薄膜を形成した。
Example 2 Zn was used instead of AgInTe2 in Example 1 as a recording material.
A thin film was formed on a glass substrate under the same conditions as in Example 1 except that 5nAsz was used.

記録材はアモルファス相であった。The recording material was in an amorphous phase.

これを実施例1と同じ条件で分析、試験をした。This was analyzed and tested under the same conditions as in Example 1.

第3図は作製した薄膜の示差走査熱量測定(DSC)の
結果を示す。
FIG. 3 shows the results of differential scanning calorimetry (DSC) of the produced thin film.

非晶質相から結晶相への転移は約20L’Cであり、こ
の結晶相は黄銅鉱型構造の Zn5nAs2である。
The transition from the amorphous phase to the crystalline phase is about 20 L'C, and this crystalline phase is Zn5nAs2 with a chalcopyrite structure.

約412℃で観測される吸熱ピークは黄銅鉱型構造から
閃亜鉛型構造への転移点である。相図では転移点は大体
630℃であるが観測される転移点はこれより約220
℃低くなっている。
The endothermic peak observed at about 412° C. is the transition point from the chalcopyrite structure to the zincblende structure. In the phase diagram, the transition point is approximately 630°C, but the observed transition point is about 220°C.
The temperature is getting lower.

これはZn5nAszが薄膜になっているためと考えら
れる。また、この薄膜の融点は相図から得られる融点に
近く、約770℃である。
This is considered to be because Zn5nAsz is a thin film. Further, the melting point of this thin film is approximately 770° C., which is close to the melting point obtained from the phase diagram.

このことから非晶質−結晶間の転移を利用する場合の転
移点よりも360℃低い温度で結晶−結晶間の相転移が
可能になる。
This makes it possible to perform a crystal-crystal phase transition at a temperature 360° C. lower than the transition point when utilizing an amorphous-crystal transition.

[発明の効果] 以上説明したように本発明の光情報記録部材は以下の改
善がなされる。
[Effects of the Invention] As explained above, the optical information recording member of the present invention has the following improvements.

1)融点よりも低い温度での相転移が利用できるので低
パワーでの書き込み消去が可能である。
1) Since a phase transition at a temperature lower than the melting point can be utilized, writing and erasing can be performed with low power.

2)結晶−結晶量転移を利用するため、熱的に安定で長
寿命の光情報記録部材である。
2) Since it utilizes crystal-crystal mass transition, it is a thermally stable and long-life optical information recording member.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は実施例1の材料の相図、 第2図は上記材料の示差走査熱量測定の結果を示すグラ
フ、 第3図は実施例2の材料の示差走査熱量測定の結果を示
すグラフである。
Figure 1 is a phase diagram of the material of Example 1, Figure 2 is a graph showing the results of differential scanning calorimetry of the above material, and Figure 3 is a graph showing the results of differential scanning calorimetry of the material of Example 2. be.

Claims (1)

【特許請求の範囲】[Claims]  光ビームが照射されると結晶構造が変化する化合物か
らなる記録層を有し、上記化合物の結晶構造変化によっ
て情報を記録、消去できる光情報記録部材において、記
録層の化合物が I b−IIIb−VIb_2またはIIb−I
Vb−Vb_2であり、これらの結晶構造変化が、黄銅
鉱型構造と閃亜鉛鉱構造間の相転移であることを特徴と
する光情報記録部材。
In an optical information recording member that has a recording layer made of a compound whose crystal structure changes when irradiated with a light beam and is capable of recording and erasing information by changing the crystal structure of the compound, the compound of the recording layer is Ib-IIIb- VIb_2 or IIb-I
Vb-Vb_2, and these crystal structure changes are phase transitions between a chalcopyrite structure and a sphalerite structure.
JP1209547A 1989-08-15 1989-08-15 Optical information recording member Pending JPH0373384A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1209547A JPH0373384A (en) 1989-08-15 1989-08-15 Optical information recording member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1209547A JPH0373384A (en) 1989-08-15 1989-08-15 Optical information recording member

Publications (1)

Publication Number Publication Date
JPH0373384A true JPH0373384A (en) 1991-03-28

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP1209547A Pending JPH0373384A (en) 1989-08-15 1989-08-15 Optical information recording member

Country Status (1)

Country Link
JP (1) JPH0373384A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6022605A (en) * 1997-02-28 2000-02-08 Kao Corporation Optical recording medium and recording/erasing method therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6022605A (en) * 1997-02-28 2000-02-08 Kao Corporation Optical recording medium and recording/erasing method therefor

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