JPH0375314A - Production of thick nonoriented silicon steel plate having high magnetic flux density - Google Patents

Production of thick nonoriented silicon steel plate having high magnetic flux density

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Publication number
JPH0375314A
JPH0375314A JP21268989A JP21268989A JPH0375314A JP H0375314 A JPH0375314 A JP H0375314A JP 21268989 A JP21268989 A JP 21268989A JP 21268989 A JP21268989 A JP 21268989A JP H0375314 A JPH0375314 A JP H0375314A
Authority
JP
Japan
Prior art keywords
rolling
less
flux density
magnetic flux
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21268989A
Other languages
Japanese (ja)
Other versions
JPH0762174B2 (en
Inventor
Yukio Tomita
冨田 幸男
Tatsuya Kumagai
達也 熊谷
Ryota Yamaba
山場 良太
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP1212689A priority Critical patent/JPH0762174B2/en
Priority to US07/567,142 priority patent/US5062905A/en
Priority to EP90115574A priority patent/EP0413306B1/en
Priority to DE69026442T priority patent/DE69026442T2/en
Publication of JPH0375314A publication Critical patent/JPH0375314A/en
Publication of JPH0762174B2 publication Critical patent/JPH0762174B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To obtain a thick nonoriented silicon steel plate having high magnetic flux density in a low magnetic field by specifying the composition of a thick steel plate, rolling conditions, and annealing conditions, performing hot rolling, and then carrying out crystalline grain regulation and dehydrogenating heat treatment. CONSTITUTION:A steel slab or a cast slab having a steel composition consisting of, by weight, <=0.01% C, 0.10-3.5% Si, <=0.20% Mn, <=0.010% S, <=0.05% Cr, <=0.01% Mo, <=0.01% Cu, 0.10-3.0% Al, <=0.004% N, <=0.005% O, <=0.0002% H, and the balance essentially iron is used. The above steel slab or cast slab is heated up to 1150-1300 deg.C and subjected to high shape ratio rolling where rolling pass at >=0.7 rolling shape ratio A is exerted at least once or more under the condition of >=900 deg.C finishing temp., and further, in the case of a thick plate of >=50mm plate thickness, dehydrogenating heat treatment is exerted at 600-750 deg.C., then, annealing is carried out at 750-950 deg.C, if necessary, and in the case of <50mm plate thickness, annealing is performed at 750-950 deg.C. In an equation, A, h1, H0, and R represent rolling shape ratio, entry thickness (mm), exit thickness (mm), and the diameter (mm) of a roll for rolling, respectively.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は直流磁化条件で使用される磁石の鉄心用、ある
いは磁場を遮蔽するのに必要な磁気シールド用の磁束密
度の高い電磁厚鋼板の製造方法に関するものである。
Detailed Description of the Invention (Industrial Application Field) The present invention is directed to the production of electromagnetic thick steel plates with high magnetic flux density for the iron core of magnets used under DC magnetization conditions or for magnetic shields required to shield magnetic fields. This relates to a manufacturing method.

(従来の技術) 近年最先端科学技術である素粒子研究や医療機器の進歩
に伴って、大型構造物に磁気を用いる装置が使われ、そ
の性能向上が求められている。
(Prior Art) In recent years, with advances in elementary particle research and medical equipment, which are cutting-edge science and technology, devices that use magnetism are being used in large structures, and there is a demand for improved performance.

磁束密度に優れた電磁鋼板としては、従来から薄板分野
で珪素鋼板、電磁軟鉄板をはじめとする数多くの材料が
提供されているのは公知である。
It is well known that many materials such as silicon steel sheets and electromagnetic soft iron sheets have been provided in the field of thin plates as electromagnetic steel sheets with excellent magnetic flux density.

しかし、構造部材として使用するには組み立て加工及び
強度上の問題があり、厚鋼板を利用する必要が生じてく
る。
However, when used as a structural member, there are problems with assembly and strength, and it becomes necessary to use thick steel plates.

これまで電磁厚板としては純鉄系成分で製造されている
。たとえば、特開昭60−96749号公報が公知であ
る。しかしながら、近年の装置の大型化、能力の向上等
に伴いさらに磁気特性の優れた、とくに低磁場、たとえ
ば80A/mでの磁束密度の高い鋼材開発の要望が強い
。前掲の特許等で開発された鋼材では、80A/rnで
の低磁場での高い磁束密度が安定して得られていない。
Until now, electromagnetic plates have been manufactured using pure iron-based components. For example, Japanese Patent Laid-Open No. 60-96749 is known. However, in recent years, as devices have become larger and their capabilities have improved, there has been a strong demand for the development of steel materials with even better magnetic properties, particularly those with higher magnetic flux density at low magnetic fields, for example, 80 A/m. With the steel materials developed in the above-mentioned patents, it is not possible to stably obtain a high magnetic flux density in a low magnetic field of 80 A/rn.

(発明が解決しようとする課題) 本発明の目的は以上の点を鑑みなされたもので、低磁場
での磁束密度が高く、その板厚方向での磁気特性差の少
ない無方向性電磁厚板の製造方法を提供することにある
(Problems to be Solved by the Invention) The purpose of the present invention has been made in view of the above points. The purpose of this invention is to provide a method for manufacturing the same.

(課題を解決するための手段) このような目的を達成するため本発明は以下のように構
成したものである。
(Means for Solving the Problems) In order to achieve such objects, the present invention is constructed as follows.

1、重量%で、C: 0.01%以下、S I:0.l
O〜3.5%、Mn:0.20%以下、S :0.01
0%以下、Cr:o、05%以下、M o : 0 、
01%以下、Cu:0.01%以下、Ag:0、lO〜
3.0%、N :0.004%以下、O:0.005%
以下、H:0.0002%以下、残部実質的に鉄からな
る鋼組成の鋼片または鋳片を1150〜1800℃に加
熱し、仕上げ温度を900℃以上となる条件下で圧延形
状比Aが0.7以上の圧延パスを1回以上はとる高形状
比圧延を行った後、板厚5hm以上の厚板については6
00〜750℃の脱水素熱処理を行った後、必要に応じ
て750〜950℃で焼鈍し、板厚50關未満について
は750〜950℃で焼鈍することを特徴とする磁場8
0A/mでの磁束密度が1.0テスラ以上の磁気特性を
有する低磁場での磁束密度の高い無方向性電磁厚板の製
造方法。
1. In weight%, C: 0.01% or less, SI: 0. l
O~3.5%, Mn: 0.20% or less, S: 0.01
0% or less, Cr: o, 05% or less, Mo: 0,
01% or less, Cu: 0.01% or less, Ag: 0, lO~
3.0%, N: 0.004% or less, O: 0.005%
Hereinafter, a steel billet or slab having a steel composition consisting of H: 0.0002% or less and the remainder substantially iron is heated to 1150 to 1800°C, and the rolling shape ratio A is set at a finishing temperature of 900°C or higher. 6 for thick plates with a thickness of 5hm or more after performing high shape ratio rolling that takes one or more rolling passes of 0.7 or more.
Magnetic field 8 characterized by performing dehydrogenation heat treatment at 00 to 750°C, then annealing at 750 to 950°C as necessary, and annealing at 750 to 950°C for plate thicknesses less than 50°C.
A method for manufacturing a non-oriented electromagnetic thick plate having a magnetic property with a magnetic flux density of 1.0 Tesla or more at 0 A/m and a high magnetic flux density in a low magnetic field.

ただし、 A−(2月r石肩−]弓ゴ) / (h r +h。)
A :圧延形状比 hI:入側板厚(ml h :出側板厚(am) R:圧延ロール半径(am) 2、重量%で、c : 0.0196以下、Si:0.
lO〜3,5%、Mn:0.20%以下、S :0.0
10%以下、Cr:0.05%以下、Mo:0.01%
以下、Cu:0.01%以下、Ag;0.10〜3.0
%、N:0.004!?6以下、O:0.005%以下
、H: 0.0002%以下、残部実質的に鉄からなる
鋼組成の鋼片または、鋳片を1150〜1300℃に加
熱し、仕上げ温度を900℃以上となる条件下で圧延形
状比Aが0.7以上の圧延パスを1回以上はとる高形状
比圧延を行った後、板厚50mm以上の厚板についでは
600〜750℃の脱水素熱処理を行った後、必要に応
じて910〜1000℃で焼準し、板厚50璽璽未満に
ついては910〜1000℃で焼準することを特徴とす
る磁場80A/mでの磁束密度が1.0テスラ以上の磁
気特性を有する低磁場での磁束密度の高い無方向性電磁
厚板の製造方法。
However, A- (February stone shoulder-] Yumigo) / (hr + h.)
A: Rolling shape ratio hI: Inlet side plate thickness (ml) h: Outlet side plate thickness (am) R: Roll radius (am) 2, in weight%, c: 0.0196 or less, Si: 0.
lO~3.5%, Mn: 0.20% or less, S: 0.0
10% or less, Cr: 0.05% or less, Mo: 0.01%
Below, Cu: 0.01% or less, Ag: 0.10 to 3.0
%, N: 0.004! ? 6 or less, O: 0.005% or less, H: 0.0002% or less, and the remainder substantially consists of iron. A steel slab or slab is heated to 1150 to 1300°C, and the finishing temperature is 900°C or higher. After performing high shape ratio rolling in which rolling passes with a rolling shape ratio A of 0.7 or more are performed at least once under the following conditions, thick plates with a thickness of 50 mm or more are subjected to dehydrogenation heat treatment at 600 to 750°C. After that, it is normalized at 910 to 1000°C as necessary, and for plate thicknesses of less than 50 mm, it is normalized at 910 to 1000°C. The magnetic flux density at a magnetic field of 80 A/m is 1.0 Tesla. A method for manufacturing a non-oriented electromagnetic thick plate having the above magnetic properties and high magnetic flux density in a low magnetic field.

ただし、 A−(2IFて正7:17ゴ)/ (hl トh。)A
 :圧延形状比 hl:入側板厚(Ilm) h :出側板厚(關) R=圧延ロール半径(am ) (作  用) まず、低磁場での磁束密度を高くするために磁化のプロ
セスについて述べると、消磁状態の鋼を磁界の中に入れ
、磁界を強めていくと次第に磁区の向きに変化が生じ、
磁界の方向に近い磁区が優勢になり他の磁区を蚕食併合
していく。つまり、磁壁の移動が起こる。さらに磁界が
強ぐなり磁壁の移動が完了すると、次に磁区全体の磁力
方向が向きを変えていく。この磁化プロセスの中で低磁
場での磁束密度を決めるのは、磁壁の移動しやすさであ
る。つまり低磁場で高磁束密度を得るためには、磁壁の
移動を障害するものを極力減らすことであると定性的に
言うことができる。
However, A-(2IF 7:17)/(hl h.)A
: Rolling shape ratio hl: Inlet plate thickness (Ilm) h : Outlet plate thickness (Ilm) R = Roll radius (am) (Function) First, we will describe the magnetization process to increase the magnetic flux density in a low magnetic field. When demagnetized steel is placed in a magnetic field and the field is strengthened, the orientation of the magnetic domains gradually changes.
The magnetic domains close to the direction of the magnetic field become dominant and merge with other magnetic domains. In other words, movement of the domain wall occurs. When the magnetic field becomes stronger and the movement of the domain wall is completed, the direction of the magnetic force of the entire magnetic domain changes direction. In this magnetization process, the ease with which domain walls move determines the magnetic flux density in low magnetic fields. In other words, it can be said qualitatively that in order to obtain a high magnetic flux density in a low magnetic field, it is necessary to reduce as much as possible what impedes the movement of domain walls.

発明者らはここにおいて低磁場で高磁束密度を得るため
の手段として、粒径と内部応力の原因となる元素及び空
隙性欠陥の作用につき詳細な検討を行い、製造方法とし
ては、加熱温度を極力上げ加熱オーステナイト粒の粗大
化、圧延仕上げ温度を極力高めにし、圧延による結晶粒
の微細化を防止すること並びに圧延後の焼鈍をすること
が有効であることを見出した。
Here, as a means to obtain high magnetic flux density in a low magnetic field, the inventors conducted a detailed study on the effects of grain size, elements that cause internal stress, and void defects, and as a manufacturing method, the heating temperature was changed. It has been found that it is effective to coarsen the austenite grains by heating as much as possible, to make the rolling finishing temperature as high as possible, to prevent grain refinement due to rolling, and to perform annealing after rolling.

内部応力減少のための元素の影響としては、Cの低下が
必要である。第1図に示す1.(is f−0,1Mn
−2,OAN鋼においてC含有量の増加につれ低磁場(
80A/m)での磁束密度が低下している。
As an elemental influence for reducing internal stress, a reduction in C is necessary. 1 shown in Figure 1. (is f-0,1Mn
-2, As the C content increases in OAN steel, the lower magnetic field (
The magnetic flux density at 80 A/m) has decreased.

また、空隙性欠陥の影響についても種々検討した結果、
そのサイズが100μ以上のものが磁気特性を大幅に低
下することを知見したものである。
In addition, as a result of various studies on the effects of void defects,
It has been found that when the size is 100 μm or more, the magnetic properties are significantly deteriorated.

モして100μ以上の有害な空隙性欠陥をなすくために
は、圧延形状比Aが0.7以上が必要であることを見い
出した。
It has been found that in order to eliminate harmful void defects of 100 microns or more, the rolled shape ratio A needs to be 0.7 or more.

ただし、 A−(2R(h、−h ))/(h、+ho)1   
 0 A :圧延形状比 hI:入側板厚(m11) h :出側板厚(關) R:圧延ロール半径(+n) さらに、鋼中の水素の存在も第2図に示すように有害で
、脱水素熱処理を行うことによって磁気特性が大幅に向
上することを知見した。第2図で示すように0.007
C−1,5Si−0,1Mn鋼にあって高形状比圧延に
より、空隙性欠陥のサイズを100μ以下にし、かつ、
脱水素熱処理により鋼中水素を減少することで、低磁場
での磁束密度が大幅に上昇することがわかる。
However, A-(2R(h,-h))/(h,+ho)1
0 A: Rolling shape ratio hI: Inlet side plate thickness (m11) h: Outlet side plate thickness (m11) R: Roll radius (+n) Furthermore, the presence of hydrogen in steel is also harmful as shown in Figure 2, and dehydration It was found that the magnetic properties were significantly improved by performing elementary heat treatment. 0.007 as shown in Figure 2
In C-1,5Si-0,1Mn steel, the size of void defects is reduced to 100μ or less by high shape ratio rolling, and
It can be seen that by reducing the hydrogen in the steel through dehydrogenation heat treatment, the magnetic flux density in a low magnetic field increases significantly.

さらに、磁気特性の均質性を確保することも重要である
が、本発明による方法によれば、これに対しても極めて
有効な手段であることを確認した。
Furthermore, it is also important to ensure homogeneity of magnetic properties, and it has been confirmed that the method according to the present invention is an extremely effective means for this as well.

成分元素に関しては、本製造法において特に、Si及び
Al添加が低磁場で高磁束密度を得るために非常に有効
であることを見出した。第3図及び第4図は、0.00
5C−0,O8Mn鋼にあって、S1量及びA11kが
低磁場(8[IA/m)での磁束密度に及ぼす影響を示
したものである。
Regarding the component elements, it has been found that in this manufacturing method, in particular, addition of Si and Al is very effective for obtaining high magnetic flux density in a low magnetic field. Figures 3 and 4 are 0.00
This figure shows the influence of S1 amount and A11k on the magnetic flux density in a low magnetic field (8 [IA/m) in 5C-0, O8Mn steel.

本製造法において、Si量が0.1〜3.5%、特に0
.6〜2.5%の範囲で、AI量が0.1〜3.0%、
特に、0.9〜2.5%の範囲で高い磁束密度を示して
いる。
In this manufacturing method, the amount of Si is 0.1 to 3.5%, especially 0.
.. In the range of 6 to 2.5%, the amount of AI is 0.1 to 3.0%,
In particular, high magnetic flux density is shown in the range of 0.9 to 2.5%.

次に本発明の成分限定理由をのべる。Next, the reason for limiting the ingredients of the present invention will be described.

Cは鋼中の内部応力を高め、磁気特性、とくに低磁場で
の磁束密度を最も下げる元素であり、極力下げることが
低磁場での磁束密度を低下させないことに寄与する。ま
た、磁気時効の点からも低いほど経時劣化が少なく磁気
特性の良い状態で恒久的に使用できるものであり、この
ようなことから0.010%以下に限定する。
C is an element that increases the internal stress in steel and lowers the magnetic properties, particularly the magnetic flux density in a low magnetic field, the most, and reducing it as much as possible contributes to not reducing the magnetic flux density in a low magnetic field. In addition, from the viewpoint of magnetic aging, the lower the content, the less deterioration over time and the ability to use it permanently with good magnetic properties.For this reason, the content is limited to 0.010% or less.

第1図に示すように、さらに0.005%以下にするこ
とにより一層高磁束密度が得られる。
As shown in FIG. 1, an even higher magnetic flux density can be obtained by reducing the amount to 0.005% or less.

51、AIは低磁場での磁束密度の点から添加すると有
利な元素で、第3図により、Stは0.1〜3.5%の
範囲で、望ましくは0.B〜2.5%の範囲で添加する
。また、第4図より、Afiは0.1〜3,0%の範囲
で、望ましくは069〜2.5%の範囲で添加する。
51. Al is an element that is advantageous to add from the viewpoint of magnetic flux density in a low magnetic field, and as shown in Fig. 3, St is in the range of 0.1 to 3.5%, preferably 0. B is added in a range of 2.5%. Further, from FIG. 4, Afi is added in a range of 0.1 to 3.0%, preferably in a range of 0.69 to 2.5%.

Mnは低磁場での磁束密度の点から少ない方が好ましく
、MnはMnS系介在物を生成する点からも低い方がよ
い。この意味からMnは0420%以下に限定する。M
nに関してはMnS系介在物を生成する点よりさらに望
ましくは0.10%以下がよい。
The lower the Mn content, the better from the viewpoint of magnetic flux density in a low magnetic field, and the lower the Mn content, also from the viewpoint of generating MnS-based inclusions. In this sense, Mn is limited to 0420% or less. M
Regarding n, from the point of view of forming MnS-based inclusions, it is more preferably 0.10% or less.

S、0は鋼中において非金属介在物を形成しかつ偏析す
ることにより、磁壁の移動を妨げる害を及ぼし、含有量
が多くなるに従って磁束密度の低下が見られ、磁気特性
を低下させるので少ないほどよい。このためSは0.0
10%以下、Oは0.005%以下とした。
S,0 forms non-metallic inclusions in steel and segregates, thereby hindering the movement of domain walls, and as the content increases, a decrease in magnetic flux density is seen, deteriorating magnetic properties, so it is rare. Moderate. Therefore, S is 0.0
10% or less, and O was 0.005% or less.

Cr、Mo、Cuは低磁場での磁束密度を低下させるの
で少ない程好ましく、また偏析度合を少なくすることか
ら極力低くすることが必要であり、この意味からC「は
0.05%以下、Moは0,01%以下、Cuは0.0
1%以下とする。
Cr, Mo, and Cu reduce the magnetic flux density in a low magnetic field, so it is preferable to have as little as possible, and in order to reduce the degree of segregation, it is necessary to keep them as low as possible. From this point of view, C' is 0.05% or less, Mo is 0.01% or less, Cu is 0.0
1% or less.

Nは内部応力を高めかつANNにより結晶粒微細化作用
により、低磁場での磁束密度を低下させるので上限は0
.004%以下とする。
The upper limit is 0 because N increases the internal stress and reduces the magnetic flux density in a low magnetic field due to the crystal grain refinement effect of ANN.
.. 0.004% or less.

Hは電磁特性を低下させ、かつ、空隙性欠陥の減少を妨
げるので0.0002%以下とする。
Since H deteriorates electromagnetic properties and prevents the reduction of void defects, it is set to 0.0002% or less.

次に製造法について述べる。Next, the manufacturing method will be described.

圧延条件については、まず圧延前棚熱温度を1150℃
以上にするのは、加熱オーステナイト粒を粗大化し磁気
特性をよくするためである。1300℃を超す加熱はス
ケールロスの防止、省エネルギーの観点から不必要であ
るため上限を1300℃とした。
Regarding the rolling conditions, first, the shelf heating temperature before rolling was set to 1150℃.
The reason for this is to coarsen the heated austenite grains and improve the magnetic properties. Since heating above 1300°C is unnecessary from the viewpoint of preventing scale loss and saving energy, the upper limit was set at 1300°C.

圧延仕上げ温度については、900℃以下の仕上げでは
低温圧延により結晶粒が微細化し、磁気特性が低下する
ため結晶粒の粗大化による磁束密度の上昇を狙い900
℃以上とした。
As for the rolling finishing temperature, if the finishing temperature is below 900℃, the crystal grains will become finer due to low-temperature rolling, and the magnetic properties will deteriorate.
℃ or higher.

さらに熱間圧延にあたり前述の空隙性欠陥は鋼の凝固過
程で大小はあるが、必ず発生するものであり、これをな
くす手段は圧延によらなければならないので熱間圧延の
役目は重要である。すなわち、熱間圧延1回当たりの変
形量を大きくし、板厚中心部にまで変形が及ぶ熱間圧延
が有効である。
Furthermore, during hot rolling, the above-mentioned void defects always occur in the solidification process of steel, although they may vary in size, and the means to eliminate these defects must be through rolling, so the role of hot rolling is important. That is, hot rolling is effective in that the amount of deformation per hot rolling is increased and the deformation extends to the center of the sheet thickness.

具体的には圧延形状比Aが0.7以上の圧延パスが1回
以上を含む高形状比圧延を行い、空隙性欠陥のサイズを
100μ以下にすることが電磁特性によい。圧延中にこ
の高形状比圧延により空隙性欠陥をなくすことで、後で
行う脱水素熱処理における脱水素効率が飛躍的に上昇す
るのである。
Specifically, it is good for electromagnetic properties to perform high shape ratio rolling including one or more rolling passes with a rolling shape ratio A of 0.7 or more and to reduce the size of void defects to 100 μm or less. By eliminating void defects during rolling by this high shape ratio rolling, the dehydrogenation efficiency in the subsequent dehydrogenation heat treatment is dramatically increased.

次に熱間圧延に引き続き結晶粒粗大化、内部歪除去及び
板厚50mm以上の厚手材については脱水素熱処理を施
す。板厚50mm以上では水素の拡散がしにくく、これ
が空隙性欠陥の原因となり、かつ、水素自身の作用と合
わさって低磁場での磁束密度を低下させる。
Next, hot rolling is followed by grain coarsening, internal strain removal, and dehydrogenation heat treatment for thick materials with a plate thickness of 50 mm or more. If the plate thickness is 50 mm or more, it is difficult for hydrogen to diffuse, which causes void defects, and combined with the action of hydrogen itself, reduces the magnetic flux density in a low magnetic field.

このため、脱水素熱処理を行うが、この脱水素熱処理温
度としては600℃未満では脱水素効率が悪く、750
℃以上では変態が一部開始するので600〜750℃の
温度範囲で行う。
For this reason, dehydrogenation heat treatment is performed, but if the dehydrogenation heat treatment temperature is less than 600°C, the dehydrogenation efficiency is poor;
Since transformation begins partially at temperatures above 600 to 750°C.

脱水素時間としては種々検討の結果(0,8(t −5
0)+6)時間(t;板厚)が適当である。
As a result of various studies, the dehydrogenation time (0.8(t -5
0)+6) time (t; plate thickness) is appropriate.

焼鈍は結晶粒粗大化及び内部歪除去のために行うが、7
50℃未満では結晶粒粗大化が起こらず、また、950
℃以上では結晶粒の板厚方向の均質性が保てないため、
焼鈍温度としては750〜950℃に限定する。
Annealing is performed to coarsen grains and remove internal strain, but
At temperatures below 50°C, crystal grain coarsening does not occur;
At temperatures above ℃, homogeneity of crystal grains in the thickness direction cannot be maintained.
The annealing temperature is limited to 750 to 950°C.

焼準は板厚方向の結晶粒調整及び内部歪除去のために行
うが、A c a点の910℃以上でかつtoo。
Normalization is performed to adjust grains in the thickness direction of the plate and remove internal strain, but at a temperature of 910°C or higher, which is the A ca point, and too.

℃以上では結晶粒の板厚方向の均質性が保てないので、
焼準温度は910〜1000℃に限定する。なお、板1
150m−以上の厚手材で行う脱水素熱処理でこの焼鈍
あるいは焼準をかねることが可能である。
At temperatures above ℃, the homogeneity of the crystal grains in the thickness direction cannot be maintained.
The normalization temperature is limited to 910 to 1000°C. In addition, board 1
It is possible to perform this annealing or normalization by dehydrogenation heat treatment performed on a thick material of 150 m or more.

(実 施 例) 第1表に示す電磁厚板の製造条件とフェライト粒径、低
磁場での磁束密度を示す。
(Example) Table 1 shows the manufacturing conditions, ferrite grain size, and magnetic flux density in a low magnetic field for the electromagnetic thick plate.

例1〜10は本発明の実施例を示し、例11〜30は比
較例を示す。
Examples 1 to 10 show examples of the present invention, and Examples 11 to 30 show comparative examples.

例1〜5は板厚10h−に仕上げたもので、均一かつ粗
粒で高い磁気特性を示す。例1に比べ、さらに例2は低
C1例3,4は低Mn、例5は低Aflであり、より高
い磁気特性を示す。例6〜8は500mm、例9は40
mm、例1Oは10mmに仕上げたもので、均一かつ粗
粒で高い磁気特性を示す。
Examples 1 to 5 were finished to a thickness of 10 h, and exhibited uniform, coarse grains and high magnetic properties. Compared to Example 1, Example 2 has lower C, Examples 3 and 4 have lower Mn, and Example 5 has lower Afl, and exhibits higher magnetic properties. Examples 6-8 are 500mm, Example 9 is 40mm
Example 1O is finished to 10 mm and exhibits uniform, coarse grains and high magnetic properties.

例11はCが高く、例12はSiが低く、例13はSi
が高く、例14はMnが高く、例15はSが高く、例1
BはCrが高く、例17はMoが高く、例18はCuが
高く、例I9はlが低く、例20はAN)が高く、例2
1はNが高く、例22はOが高く、例23はHが高く、
それぞれ上限を超えるため低磁気特性値となっている。
Example 11 has high C, Example 12 has low Si, and Example 13 has high Si.
is high, Example 14 is high in Mn, Example 15 is high in S, Example 1
B is high in Cr, Example 17 is high in Mo, Example 18 is high in Cu, Example I9 is low in l, Example 20 is high in AN), Example 2
1 has high N, Example 22 has high O, Example 23 has high H,
Each exceeds the upper limit, resulting in a low magnetic property value.

例24は加熱温度が下限をはずれ、例25は圧延仕上げ
温度が下限をはずれ、例2Bは最大形状比が下限をはず
れ、例27は脱水素熱処理温度が下限をはずれ、例28
は焼鈍温度が下限をはずれ、例29は焼準温度が上限を
超え、例30は脱水素熱処理がないため低磁気特性値と
なっている。
In Example 24, the heating temperature was outside the lower limit, in Example 25, the rolling finishing temperature was outside the lower limit, in Example 2B, the maximum shape ratio was outside the lower limit, in Example 27, the dehydrogenation heat treatment temperature was outside the lower limit, and in Example 28.
In Example 29, the annealing temperature exceeds the upper limit; in Example 30, the annealing temperature exceeds the upper limit; and in Example 30, there is no dehydrogenation heat treatment, resulting in low magnetic property values.

(発明の効果) 以上詳細に述べた如く、本発明によれば適切な成分限定
により板厚の厚い厚鋼板に均質な高電磁特性を具備せし
めることに成功し、直流磁化による磁気性質を利用する
構造物に適用可能としたものであり、かつその製造法も
前述の成分限定と熱間圧延後結晶粒調整及び脱水素熱処
理を同時に行う方式であり、極めて経済的な製造法を提
供するもので産業上多大な効果を奏するものである。
(Effects of the Invention) As described in detail above, according to the present invention, it is possible to successfully provide a thick steel plate with uniform high electromagnetic properties by appropriately limiting the ingredients, and to utilize the magnetic properties caused by direct current magnetization. It can be applied to structures, and its manufacturing method simultaneously performs the above-mentioned ingredient restriction, grain adjustment after hot rolling, and dehydrogenation heat treatment, providing an extremely economical manufacturing method. This has great industrial effects.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は80A/mにおける磁束密度におよぼすC含有
量の影響をしめずグラフ、第2図は80A/mにおける
磁束密度におよぼす空隙性欠陥のサイズ及び脱水素熱処
理の影響を示すグラフ、第3図は80A/mにおける磁
束密度におよぼす5iiiの影響を示すグラフ、第4図
は80A/mにおける磁束密度におよぼすAg量の影響
を示すグラフである。 代 理 人  弁理士  茶野木 立 末弟1図 第3図 θ θO2 04 C(り) θO6 Q8 第2図 第4図 空涼姓欠陥のサイズ”0す AAt(%)
Figure 1 is a graph showing the influence of C content on magnetic flux density at 80 A/m, Figure 2 is a graph showing the influence of void defect size and dehydrogenation heat treatment on magnetic flux density at 80 A/m; FIG. 3 is a graph showing the effect of 5iii on the magnetic flux density at 80 A/m, and FIG. 4 is a graph showing the effect of the amount of Ag on the magnetic flux density at 80 A/m. Agent Patent Attorney Tadashi Chanoki Youngest brother 1 Figure 3 θ θO2 04 C(ri) θO6 Q8 Figure 2 Figure 4 Sora Suzaku size of defect "0suAAt (%)

Claims (1)

【特許請求の範囲】 1、重量%で、 C:0.01%以下、 Si:0.10〜3.5%、 Mn:0.20%以下、 S:0.010%以下、 Cr:0.05%以下、 Mo:0.01%以下、 Cu:0.01%以下、 Al:0.10〜3.0%、 N:0.004%以下、 O:0.005%以下、 H:0.0002%以下、 残部実質的に鉄からなる鋼組成の鋼片または鋳片を11
50〜1300℃に加熱し、仕上げ温度を900℃以上
となる条件下で圧延形状比Aが0.7以上の圧延パスを
1回以上はとる高形状比圧延を行った後、板厚50mm
以上の厚板については600〜750℃の脱水素熱処理
を行った後、必要に応じて750〜950℃で焼鈍し、
板厚50mm未満については750〜950℃で焼鈍す
ることを特徴とする磁場80A/mでの磁束密度が1.
0テスラ以上の磁気特性を有する磁束密度の高い無方向
性電磁厚板の製造方法。 ただし、 A=(2√R(h_i−h_o))/(h_i+h_o
)A:圧延形状比 h_i:入側板厚(mm) h_o:出側板厚(mm) R:圧延ロール半径(mm) 2、高形状比圧延を行った後、板厚50mm以上の厚板
については600〜750℃の脱水素熱処理を行った後
、必要に応じて910〜1000℃で焼準し、板厚50
mm未満については910〜1000℃で焼準すること
を特徴とする請求項1記載の磁場80A/mでの磁束密
度が1.0テスラ以上の磁気特性を有する磁束密度の高
い無方向性電磁厚板の製造方法。
[Claims] 1. In weight%, C: 0.01% or less, Si: 0.10 to 3.5%, Mn: 0.20% or less, S: 0.010% or less, Cr: 0 .05% or less, Mo: 0.01% or less, Cu: 0.01% or less, Al: 0.10 to 3.0%, N: 0.004% or less, O: 0.005% or less, H: 0.0002% or less, the remainder being substantially iron.11
After performing high shape ratio rolling in which the plate is heated to 50 to 1300°C and the finishing temperature is 900°C or more and one or more rolling passes with rolling shape ratio A of 0.7 or more are performed, the plate thickness is 50 mm.
For the above thick plates, after dehydrogenation heat treatment at 600-750°C, annealing at 750-950°C as necessary,
For plates with a thickness of less than 50 mm, the magnetic flux density at a magnetic field of 80 A/m is 1.
A method for manufacturing a non-oriented electromagnetic thick plate with a high magnetic flux density and a magnetic property of 0 Tesla or more. However, A=(2√R(h_i-h_o))/(h_i+h_o
) A: Rolling shape ratio h_i: Inlet side plate thickness (mm) h_o: Outlet side plate thickness (mm) R: Roll radius (mm) 2. For thick plates with a plate thickness of 50 mm or more after high shape ratio rolling After dehydrogenation heat treatment at 600 to 750°C, normalize at 910 to 1000°C as necessary to obtain a plate with a thickness of 50°C.
The non-directional electromagnetic thickness having a high magnetic flux density and having a magnetic property having a magnetic flux density of 1.0 Tesla or more in a magnetic field of 80 A/m according to claim 1, wherein the non-directional electromagnetic thickness is normalized at 910 to 1000 °C for less than mm. Method of manufacturing the board.
JP1212689A 1989-08-18 1989-08-18 Method for manufacturing non-oriented electromagnetic thick plate with high magnetic flux density Expired - Lifetime JPH0762174B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP1212689A JPH0762174B2 (en) 1989-08-18 1989-08-18 Method for manufacturing non-oriented electromagnetic thick plate with high magnetic flux density
US07/567,142 US5062905A (en) 1989-08-18 1990-08-14 Method of producing non-oriented magnetic steel plate having high magnetic flux density
EP90115574A EP0413306B1 (en) 1989-08-18 1990-08-14 Method of producing non-oriented magnetic steel plate having high magnetic flux density
DE69026442T DE69026442T2 (en) 1989-08-18 1990-08-14 Process for the production of non-oriented steel sheets with high magnetic flux density

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1212689A JPH0762174B2 (en) 1989-08-18 1989-08-18 Method for manufacturing non-oriented electromagnetic thick plate with high magnetic flux density

Publications (2)

Publication Number Publication Date
JPH0375314A true JPH0375314A (en) 1991-03-29
JPH0762174B2 JPH0762174B2 (en) 1995-07-05

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ID=16626797

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5411605A (en) * 1991-10-14 1995-05-02 Nkk Corporation Soft magnetic steel material having excellent DC magnetization properties and corrosion resistance and a method of manufacturing the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5668767B2 (en) * 2013-02-22 2015-02-12 Jfeスチール株式会社 Hot rolled steel sheet for manufacturing non-oriented electrical steel sheet and method for manufacturing the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6096749A (en) * 1983-11-01 1985-05-30 Nippon Steel Corp Thick plate for dc magnetization and preparation thereof
JPS60208418A (en) * 1984-03-30 1985-10-21 Sumitomo Metal Ind Ltd Method for manufacturing thick steel plates for high magnetic permeability structural members
JPH024920A (en) * 1988-06-24 1990-01-09 Nippon Steel Corp Manufacture of thick electrical plate for d.c. magnetization

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6096749A (en) * 1983-11-01 1985-05-30 Nippon Steel Corp Thick plate for dc magnetization and preparation thereof
JPS60208418A (en) * 1984-03-30 1985-10-21 Sumitomo Metal Ind Ltd Method for manufacturing thick steel plates for high magnetic permeability structural members
JPH024920A (en) * 1988-06-24 1990-01-09 Nippon Steel Corp Manufacture of thick electrical plate for d.c. magnetization

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5411605A (en) * 1991-10-14 1995-05-02 Nkk Corporation Soft magnetic steel material having excellent DC magnetization properties and corrosion resistance and a method of manufacturing the same
DE4293604C2 (en) * 1991-10-14 1997-04-03 Nippon Kokan Kk Soft magnetic steel material and process for its manufacture

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