JPH0376738B2 - - Google Patents

Info

Publication number
JPH0376738B2
JPH0376738B2 JP22898086A JP22898086A JPH0376738B2 JP H0376738 B2 JPH0376738 B2 JP H0376738B2 JP 22898086 A JP22898086 A JP 22898086A JP 22898086 A JP22898086 A JP 22898086A JP H0376738 B2 JPH0376738 B2 JP H0376738B2
Authority
JP
Japan
Prior art keywords
light
defect detection
base material
transmitting small
detection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP22898086A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62259454A (ja
Inventor
Akihiro Yoshida
Takahide Iida
Hiroshi Myake
Shuzo Hatsutori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Industries Corp
Original Assignee
Toyoda Jidoshokki Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyoda Jidoshokki Seisakusho KK filed Critical Toyoda Jidoshokki Seisakusho KK
Priority to US07/003,572 priority Critical patent/US4760265A/en
Priority to DE8787100518T priority patent/DE3775417D1/de
Priority to EP87100518A priority patent/EP0230285B1/fr
Publication of JPS62259454A publication Critical patent/JPS62259454A/ja
Publication of JPH0376738B2 publication Critical patent/JPH0376738B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP61228980A 1986-01-18 1986-09-27 パタ−ンの欠陥検出方法および装置 Granted JPS62259454A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US07/003,572 US4760265A (en) 1986-01-18 1987-01-15 Method and device for detecting defects of patterns in microelectronic devices
DE8787100518T DE3775417D1 (de) 1986-01-18 1987-01-16 Verfahren und vorrichtung zum nachweis von musterfehlern fuer mikroelektronische anordnungen.
EP87100518A EP0230285B1 (fr) 1986-01-18 1987-01-16 Méthode et dispositif de détection de défauts dans des configurations pour des dispositifs microélectroniques

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP839186 1986-01-18
JP61-8391 1986-01-18

Publications (2)

Publication Number Publication Date
JPS62259454A JPS62259454A (ja) 1987-11-11
JPH0376738B2 true JPH0376738B2 (fr) 1991-12-06

Family

ID=11691900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61228980A Granted JPS62259454A (ja) 1986-01-18 1986-09-27 パタ−ンの欠陥検出方法および装置

Country Status (1)

Country Link
JP (1) JPS62259454A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2850175B1 (fr) * 2003-01-17 2007-08-17 Europ De Systemes Optiques Soc Systeme deformable comportant une piece de forme parallelepipedique et un actionneur
WO2011121694A1 (fr) * 2010-03-31 2011-10-06 株式会社 日立ハイテクノロジーズ Dispositif d'essai et procédé d'essai
KR20240044491A (ko) * 2021-08-16 2024-04-04 칼 짜이스 에스엠테 게엠베하 X선에 의해 조명된 물체를 이미징하기 위한 이미징 광학 장치

Also Published As

Publication number Publication date
JPS62259454A (ja) 1987-11-11

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