JPH0376846B2 - - Google Patents
Info
- Publication number
- JPH0376846B2 JPH0376846B2 JP14879785A JP14879785A JPH0376846B2 JP H0376846 B2 JPH0376846 B2 JP H0376846B2 JP 14879785 A JP14879785 A JP 14879785A JP 14879785 A JP14879785 A JP 14879785A JP H0376846 B2 JPH0376846 B2 JP H0376846B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- hologram
- optical system
- spherical wave
- illuminates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 26
- 238000005286 illumination Methods 0.000 claims description 15
- 238000000034 method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000004556 laser interferometry Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Description
【発明の詳細な説明】
(イ) 発明の目的
[産業上の利用分野]
この発明は楕円面鏡の表面形状を測定するため
のホログラム干渉計に関するものである。楕円面
鏡は一点からの発散球面波を収差なく他の一点に
集光することができる非球面鏡であつて、重要な
光学素子の1つであり、例えば、レーザ発振用の
キセノンフラツシユランプ集光器やX線反射用ミ
ラー(トロイダルミラー)として使用されてい
る。[Detailed Description of the Invention] (a) Object of the Invention [Field of Industrial Application] This invention relates to a hologram interferometer for measuring the surface shape of an ellipsoidal mirror. An ellipsoidal mirror is an aspherical mirror that can condense a diverging spherical wave from one point to another point without aberration, and is one of the important optical elements.For example, it is used in a xenon flash lamp collection for laser oscillation. It is used as an optical device and an X-ray reflecting mirror (toroidal mirror).
[従来の技術]
この楕円面鏡の形状の検査及び定量的かつ高精
度の測定手法は未だ確立されていない。[Prior Art] A method for inspecting the shape of this ellipsoidal mirror and measuring it quantitatively and with high precision has not yet been established.
楕円面鏡の形状の検査及び測定の技術として従
来用いられているものはフーコーテスト、ロンキ
ーテスト、球面基準レーザ干渉法、液浸法、二波
長法、または計算機ホログラム干渉計がある。 Conventionally used techniques for inspecting and measuring the shape of ellipsoidal mirrors include the Foucault test, the Ronchi test, the spherical reference laser interferometry, the immersion method, the dual wavelength method, and the computer-generated hologram interferometer.
[発明が解決しようとする問題点]
しかしながら、フーコーテスト、ロンキーテス
トは定性的な検査手段であつて、楕円面鏡の形状
の定量的測定はできない。[Problems to be Solved by the Invention] However, the Foucault test and the Ronchi test are qualitative inspection means, and cannot quantitatively measure the shape of an ellipsoidal mirror.
また、球面基準レーザ干渉法は干渉縞の解析が
必要であつて、検査の手間が煩雑である。また、
液浸法は、被測定物を液体に浸さねばならず、か
つ、その液体の屈折率を正確に測定せねばならな
い。また、二波長法は、二つの波面をアライメン
トする方法が難しい。更に、計算機ホログラム干
渉計は、計算機ホログラムの作成に手間がかかる
という問題がある。 Further, the spherical reference laser interferometry requires analysis of interference fringes, and the inspection process is complicated. Also,
In the liquid immersion method, the object to be measured must be immersed in a liquid, and the refractive index of the liquid must be accurately measured. Furthermore, in the two-wavelength method, it is difficult to align two wavefronts. Furthermore, the computer-generated hologram interferometer has a problem in that it takes time and effort to create a computer-generated hologram.
この発明は上記の如き事情に鑑みてなされたも
のであつて楕円面鏡の表面形状を高精度に、かつ
定量的に測定することかでき、しかもその測定を
容易、確実、安価に測定することができる測定技
術を提供することを目的としている。 The present invention has been made in view of the above circumstances, and it is an object of the present invention to be able to measure the surface shape of an ellipsoidal mirror with high precision and quantitatively, and to do so easily, reliably, and inexpensively. The aim is to provide measurement technology that can
(ロ) 発明の構成
[問題を解決するための手段]
この目的に対応して、この発明の楕円面鏡の表
面形状測定用ホログラム干渉計は、レーザ光源
と、前記レーザ光源からの光束を少なくとも2光
束に分割するビームスプリツタと、前記2光束の
うちの一方の光束から平行光の参照光を生成させ
る参照光光学系と、発散球面波光である物体光を
前記参照光により記録したホログラムと、被検体
楕円鏡面を照明する発散球面波光である照明光を
前記2光束のうちの他方の光束から生成させる照
明光光学系を備え、前記照明光が前記被検体楕円
鏡面で反射したのち前記ホログラムを照明するよ
うに構成し、前記参照光を前記ホログラムに照明
して再生される再生物体光と前記ホログラムに照
明した前記照明光との干渉縞を観測するように構
成したことを特徴としている。(B) Structure of the Invention [Means for Solving the Problem] Corresponding to this object, a hologram interferometer for measuring the surface shape of an ellipsoidal mirror of the present invention includes a laser light source and a light beam from the laser light source that at least a beam splitter that splits the beam into two beams; a reference beam optical system that generates a parallel reference beam from one of the two beams; and a hologram that records an object beam that is a diverging spherical wave beam using the reference beam. , an illumination light optical system that generates illumination light, which is a diverging spherical wave light that illuminates the object elliptical mirror surface, from the other of the two light beams, and after the illumination light is reflected by the object elliptical mirror surface, the hologram The hologram is illuminated with the reference light, and interference fringes between the reproduced object light reproduced by illuminating the hologram and the illumination light illuminating the hologram are observed.
以下、この発明の詳細を一実施例を示す図面に
ついて説明する。 Hereinafter, details of the present invention will be explained with reference to the drawings showing one embodiment.
この実施例では、参照光として平行光を使用
し、物体光として発散球面波光を使用し、照明光
として発散球面波光を使用するものである。 In this embodiment, parallel light is used as the reference light, divergent spherical wave light is used as the object light, and divergent spherical wave light is used as the illumination light.
第1図において、1はホログラム干渉計であ
る。ホログラム干渉計1はホログラムHPを備え
ている。そこでまずホログラムHPの作製につい
て説明する。 In FIG. 1, 1 is a hologram interferometer. The hologram interferometer 1 is equipped with a hologram HP. First, we will explain the production of the hologram HP.
第2図において2はホログラムHPを作製する
ための光学系である。光学系2は例えばアルゴン
イオンレーザを発生させるレーザ光源3、参照光
光学系4、物体光光学系5、ビームスプリツタ
(または半透鏡)BS1,BS2を備えている。 In FIG. 2, 2 is an optical system for producing the hologram HP. The optical system 2 includes, for example, a laser light source 3 that generates an argon ion laser, a reference light optical system 4, an object light optical system 5, and beam splitters (or semi-transparent mirrors) BS1 and BS2.
参照光光学系4は反射鏡M1、顕微鏡対物レン
ズMo1、ピンホールP1及びコリメータレンズ
L1を備えている。物体光光学系5は反射鏡M
2、顕微鏡対物レンズMo2及びピンホールP2
を備えている。 The reference light optical system 4 includes a reflecting mirror M1, a microscope objective lens Mo1, a pinhole P1, and a collimator lens L1. The object light optical system 5 is a reflecting mirror M
2. Microscope objective lens Mo2 and pinhole P2
It is equipped with
ホログラムHPを作製する場合にはレーザ光源
3からのレーザ光をビームスプリツタBS2で2
光束に分割し、一方の光束を参照光光学系4に入
れ、反射鏡M1で光路変更したのち顕微鏡対物レ
ンズMo1、ピンホールP1によつて発散球面波
としたのちコリメータレンズL1で平行光の参照
光を生成する。他方の光束は物体光光学系5に入
れ、反射鏡M2で反射してのち、顕微鏡対物レン
ズMo2、ピンホールP2によつて発散球面波の
物体光を生成させる。この物体光を前記の参照光
を用いてホログラムHPの位置にある写真乾板に
露光記録し、かつ写真処理してホログラムHPが
完成し、もとの位置にセツトされる。 When creating a hologram HP, the laser light from the laser light source 3 is divided into two parts using the beam splitter BS2.
The light beam is divided into two beams, one beam is input into the reference beam optical system 4, the optical path is changed by the reflector M1, the beam is made into a diverging spherical wave by the microscope objective lens Mo1 and the pinhole P1, and then the parallel beam is referenced by the collimator lens L1. Generate light. The other beam enters the object beam optical system 5, is reflected by a reflecting mirror M2, and then is generated by a microscope objective lens Mo2 and a pinhole P2 to generate a diverging spherical wave object beam. This object light is exposed and recorded on a photographic plate at the position of the hologram HP using the reference light, and photographically processed to complete the hologram HP, which is then set at the original position.
第1図に示す干渉計1は第2図に示す光学系2
から物体光光学系5をとり除き、かつ照明光光学
系6を付加し、かつ被検楕円面鏡面EMのセツト
位置を設定したものである。 The interferometer 1 shown in FIG. 1 is connected to the optical system 2 shown in FIG.
The object light optical system 5 is removed from the above, an illumination light optical system 6 is added, and the set position of the ellipsoidal mirror surface EM to be tested is set.
照明光光学系6は顕微鏡対物レンズMo3、ピ
ンホールP3、及び反射鏡M3からなり、ビーム
スプリツタBS1で分割された他方の光束を顕微
鏡対物レンズMo3、ピンホールP3で発散球面
波光にしたのち、この発散球面波光で被検楕円面
鏡面EMを照明するようになつている。被検楕円
面鏡面EMからの反射光はホログラムHPを照射
する。 The illumination light optical system 6 consists of a microscope objective lens Mo3, a pinhole P3, and a reflector M3, and after converting the other light beam split by the beam splitter BS1 into diverging spherical wave light by the microscope objective lens Mo3 and pinhole P3, This diverging spherical wave light illuminates the ellipsoidal mirror surface EM to be tested. The reflected light from the ellipsoidal mirror surface EM to be tested illuminates the hologram HP.
被検楕円面鏡EM面のセツト位置は一方の焦点
がピンホールP3と一致する位置とする
[作用]
この第1図に示す如きホログラム干渉計1にお
いて、被検楕円面鏡面EMの表面形状を測定する
には、レーザ光源3からのビームをビームスプリ
ツタBS1で分割し、一方の光束を参照光光学系
4に導いて平行光の参照光を生成させてホログラ
ムHPに入射し、ホログラムHPに記録してある
発散球面波光の物体光を再生させる。かつ他方の
光束を照明光光学系6に導いて発散球面波光の照
明光を生成させて、被検楕円面鏡面EMで反射さ
せて発散球面波を生成させたのちホログラムHP
に入射する。 The set position of the ellipsoidal mirror EM surface to be tested is such that one focal point coincides with the pinhole P3.[Operation] In the hologram interferometer 1 as shown in FIG. 1, the surface shape of the ellipsoidal mirror EM to be tested is To measure, the beam from the laser light source 3 is split by the beam splitter BS1, and one beam is guided to the reference beam optical system 4 to generate a parallel reference beam, which is incident on the hologram HP. The recorded object light of divergent spherical wave light is reproduced. The other light flux is guided to the illumination light optical system 6 to generate a divergent spherical wave illumination light, which is reflected by the test ellipsoidal mirror surface EM to generate a divergent spherical wave, and then the hologram HP.
incident on .
照明光は被検楕円面鏡面EMの鏡面の形状誤差
である凹凸の影響を受けて反射された後は標準と
なる物体光からずれているので、再生物体光と照
明光とで第3図に示すような干渉縞が生じる。 The illumination light is affected by the unevenness which is the shape error of the mirror surface of the ellipsoidal mirror surface EM to be tested, and after being reflected, it deviates from the standard object light, so the reproduced object light and illumination light are shown in Figure 3. Interference fringes as shown are produced.
この干渉縞における干渉縞ピツチDとずれ量
d、被検面の形状誤差△hの間には、λを波長と
して
△h=(d/D)・(λ/2)
の関係があるから、第3図に示すように、干渉縞
ピツチDとずれ量dから形状誤差△hを求め、被
検楕円面鏡面EMの表面形状を測定することがで
きる。 The relationship between the interference fringe pitch D in this interference fringe, the amount of deviation d, and the shape error △h of the surface to be measured is △h=(d/D)・(λ/2), where λ is the wavelength. As shown in FIG. 3, the shape error Δh is obtained from the interference fringe pitch D and the amount of deviation d, and the surface shape of the ellipsoidal mirror surface EM to be tested can be measured.
(ハ) 発明の効果
このように、この発明のホログラム干渉計によ
れば、標準となる楕円面鏡面を必要とせず、製作
が容易で、かつ安価にすることができる。しか
も、測定操作が煩雑となることはなく、高精度の
定量的表面形状測定が可能になる。(C) Effects of the Invention As described above, the hologram interferometer of the present invention does not require a standard ellipsoidal mirror surface, and can be manufactured easily and at low cost. Moreover, the measurement operation does not become complicated, and highly accurate quantitative surface shape measurement becomes possible.
第1図はこの発明の楕円面鏡の表面形状測定用
ホログラム干渉計を示す構成図、第2図はホログ
ラム作製用の光学系を示す構成図、及び第3図は
干渉縞の例を示す線図である。
1……ホログラム干渉計、2……ホログラム作
製用光学系、3……レーザ光源、4……参照光光
学系、5……物体光光学系、6……照明光光学
系、HP……ホログラム、BS1,BS2……ビー
ムスプリツタ、M1,M2,M3……反射鏡、
Mo1,Mo2,Mo3……顕微鏡対物レンズ、P
1,P2,P3……ピンホール、L1……コリメ
ータレンズ、EM……被検楕円面鏡面。
Fig. 1 is a block diagram showing a hologram interferometer for measuring the surface shape of an ellipsoidal mirror according to the present invention, Fig. 2 is a block diagram showing an optical system for producing a hologram, and Fig. 3 is a line diagram showing an example of interference fringes. It is a diagram. 1... Hologram interferometer, 2... Hologram production optical system, 3... Laser light source, 4... Reference light optical system, 5... Object light optical system, 6... Illumination light optical system, HP... Hologram , BS1, BS2...beam splitter, M1, M2, M3...reflector,
Mo1, Mo2, Mo3...Microscope objective lens, P
1, P2, P3...Pinhole, L1...Collimator lens, EM...Test ellipsoidal mirror surface.
Claims (1)
少なくとも2光束に分割するビームスプリツタ
と、前記2光束のうちの一方の光束から平行光の
参照光を生成させる参照光光学系と、発散球面波
光である物体光を前記参照光により記録したホロ
グラムと、被検体楕円鏡面を照明する発散球面波
光である照明光を前記2光束のうちの他方の光束
から生成させる照明光光学系を備え、前記照明光
が前記被検体楕円鏡面で反射したのち前記ホログ
ラムを照明するように構成し、前記参照光を前記
ホログラムに照明して再生される再生物体光と前
記ホログラムに照明した前記照明光との干渉縞を
観測するように構成したことを特徴とする楕円面
鏡の表面形状測定用ホログラム干渉計。1 a laser light source, a beam splitter that splits the light beam from the laser light source into at least two light beams, a reference light optical system that generates a parallel reference light from one of the two light beams, and a diverging spherical wave light. and an illumination light optical system that generates illumination light, which is a diverging spherical wave light that illuminates an elliptical mirror surface of the object, from the other of the two light beams, The configuration is such that the light illuminates the hologram after being reflected by the object elliptical mirror surface, and interference fringes between the reproduced object light that is reproduced by illuminating the hologram with the reference light and the illumination light that illuminates the hologram. A hologram interferometer for measuring the surface shape of an ellipsoidal mirror, characterized in that it is configured to observe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14879785A JPS629203A (en) | 1985-07-05 | 1985-07-05 | Hologram interferometer for measuring surface shape of elliptic surface mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14879785A JPS629203A (en) | 1985-07-05 | 1985-07-05 | Hologram interferometer for measuring surface shape of elliptic surface mirror |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS629203A JPS629203A (en) | 1987-01-17 |
| JPH0376846B2 true JPH0376846B2 (en) | 1991-12-06 |
Family
ID=15460918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14879785A Granted JPS629203A (en) | 1985-07-05 | 1985-07-05 | Hologram interferometer for measuring surface shape of elliptic surface mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS629203A (en) |
-
1985
- 1985-07-05 JP JP14879785A patent/JPS629203A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS629203A (en) | 1987-01-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |