JPH0377442B2 - - Google Patents
Info
- Publication number
- JPH0377442B2 JPH0377442B2 JP55021393A JP2139380A JPH0377442B2 JP H0377442 B2 JPH0377442 B2 JP H0377442B2 JP 55021393 A JP55021393 A JP 55021393A JP 2139380 A JP2139380 A JP 2139380A JP H0377442 B2 JPH0377442 B2 JP H0377442B2
- Authority
- JP
- Japan
- Prior art keywords
- scale
- metal
- light
- manufacturing
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B1/00—Measuring instruments characterised by the selection of material therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B3/00—Measuring instruments characterised by the use of mechanical techniques
- G01B3/02—Rulers with scales or marks for direct reading
- G01B3/04—Rulers with scales or marks for direct reading rigid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/12—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in capacitance, i.e. electric circuits therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Transform (AREA)
- Length Measuring Devices By Optical Means (AREA)
- ing And Chemical Polishing (AREA)
Description
【発明の詳細な説明】
本発明は相対的に移動する２つの位置の移動量
を測定し、または上記位置の相対関係を求めるた
めの電子計測装置に使用する改良型金属スケール
の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an improved metal scale used in an electronic measuring device for measuring the amount of movement of two relatively moving positions or determining the relative relationship between the positions. It is.
本発明で使用する電子計測装置は一般に知られ
ており、第１図に示すように相対移動する２つの
物体の一方の側に、光吸収目盛面と光反射目盛面
とを交互に隣接して有する金属スケール１を設
け、他方の側に光源２、コリメータレンズ、光電
変換素子５、および交互に隣接する光透過目盛面
と光吸収目盛面とよりなるインデツクススケール
４を有する検出器６を、インデツクススケール４
の目盛面が金属スケール１の目盛面と対向するよ
うに設け、光源２からの光線（矢印入りの点線で
示す）をコリメータレンズ３を通して平行光線と
し、この平行光線をインデツクススケール４およ
び金属スケール１に向けて照射し、光反射目盛に
より反射した光を光電変換素子５にて受光し、イ
ンデツクススケール４と金属スケール１の相対移
動に伴なう反射光量の変化を光電変換素子５で感
知し、そこに発生する電圧変化をＡ−Ｄ変換し、
これを表示器例えばデジタル表示器（図示せず）
で読み取ることにより、上記２つの物体の相対移
動量を求める装置である。 The electronic measuring device used in the present invention is generally known, and as shown in FIG. A detector 6 is provided with a metal scale 1 having a metal scale 1, and a detector 6 having a light source 2, a collimator lens, a photoelectric conversion element 5, and an index scale 4 consisting of alternately adjacent light transmission scale surfaces and light absorption scale surfaces on the other side. index scale 4
The scale surface of the scale is arranged to face the scale surface of the metal scale 1, and the light beam from the light source 2 (indicated by a dotted line with an arrow) is made into a parallel light beam through the collimator lens 3, and this parallel light beam is connected to the index scale 4 and the metal scale. 1, the light reflected by the light reflection scale is received by the photoelectric conversion element 5, and the change in the amount of reflected light due to relative movement between the index scale 4 and the metal scale 1 is detected by the photoelectric conversion element 5 Then, the voltage change that occurs there is converted from analog to digital,
Connect this to a display such as a digital display (not shown).
This device calculates the amount of relative movement between the two objects by reading the information.
本発明はこのような計測装置に使用する金属ス
ケールの製造方法に関するものである。従来、こ
のような計測器に用いる金属スケールとしては、
第３図に示すように金属素地表面上に付着した高
反射金属にて形成した光反射目盛面１６′および
エツチングにより粗らされた金属素地表面にて形
成した光吸収目盛面１５′よりなるスケール１″が
使用されている。このスケール１″は、光反射目
盛面１６′では入射光が整反射し、光吸収目盛面
１５′では入射光が乱反射するため、光反射目盛
面１６′と光吸収目盛面１５′に明暗の差が生ずる
ようになつている。 The present invention relates to a method of manufacturing a metal scale used in such a measuring device. Traditionally, metal scales used in such measuring instruments include:
As shown in FIG. 3, a scale consisting of a light-reflecting scale surface 16' formed of a highly reflective metal adhered to the surface of a metal base and a light-absorbing scale surface 15' formed on a surface of the metal base roughened by etching. 1" is used. With this scale 1", the light reflection scale surface 16' uniformly reflects the incident light, and the light absorption scale surface 15' reflects the incident light diffusely, so the light reflection scale surface 16' and the light A difference in brightness and darkness is created on the absorption scale surface 15'.
このような従来のスケールは具体的には次のよ
うにして製造されている。先ずラツプ仕上げした
金属素地表面に、クローム、銀、金またはアルミ
ニウム等の高反射率の金属をメツキ、蒸着等によ
り約0.5〜2μｍの厚さに付着せしめて鏡面を形成
した後、この鏡面上にフオトレジストを塗布し、
次にスケールに付すべき目盛の画像を有するフオ
トマスクを通してフオトレジスト膜に目盛の画像
を投影感光して現像し、該フオトレジスト膜の現
像除去された部分を周知のエツチング方法により
エツチングし、反射金属膜を目盛状に残して反射
目盛面を形成する。このエツチング操作におい
て、各反射目盛面の間の部分は反射金属膜ととも
に金属スケールの素地まで刻蝕され、素地の表面
が粗らされることによつて光を乱反射する光吸収
目盛面（暗部）が形成される。 Specifically, such conventional scales are manufactured as follows. First, a highly reflective metal such as chrome, silver, gold, or aluminum is deposited on the lap-finished metal base surface to a thickness of approximately 0.5 to 2 μm by plating or vapor deposition to form a mirror surface. Apply photoresist,
Next, the image of the scale is projected onto the photoresist film through a photomask having an image of the scale to be attached to the scale, and then developed, and the portion of the photoresist film that has been removed by development is etched by a well-known etching method to form a reflective metal film. is left in the form of a scale to form a reflective scale surface. In this etching operation, the areas between each reflective scale face are etched down to the base of the metal scale along with the reflective metal film, and the surface of the base is roughened, resulting in light-absorbing scale faces (dark areas) that reflect light diffusely. is formed.
また、他の製造方法としては高反射金属をつけ
ることなく、金属素地表面をラツプすることによ
り高反射面を形成し、その上にフオトレジスト膜
を塗布し、以下前記と同様にして目盛を刻蝕し、
スケール粗地の表面を粗すことにより暗部を形成
する方法も行なわれている。 Another manufacturing method is to form a highly reflective surface by lapping the surface of the metal base without attaching a highly reflective metal, and then apply a photoresist film thereon, and then engrave scales in the same manner as above. erode,
There is also a method of forming dark areas by roughening the surface of a scaled rough ground.
しかしながら、これらの従来方法では光反射面
を金属メツキで比較的厚い凸状に形成するため、
メツキ用高反射金属として例えば金等の軟質金属
を使用すれば、光反射面の耐摩耗性に問題が生
じ、銀または銅を使用すれば耐腐蝕性に問題が生
ずる。 However, in these conventional methods, the light reflecting surface is formed with metal plating into a relatively thick convex shape.
If a soft metal such as gold is used as the highly reflective metal for plating, a problem will arise in the wear resistance of the light reflecting surface, and if silver or copper is used, a problem will arise in corrosion resistance.
さらに、より重大な問題は、これらの従来方法
では光吸収面の形成をスケール金属素地を粗らす
ことにより行なうため、素地面をできる限り充分
に粗らさなければ良好な光吸収面が得られないこ
とである。したがつて、エツチングを苛酷な条件
で行なうので、第３図に示すとおりサイドエツチ
１８が激しく発生し、そのため光反射面と光吸収
面の明暗の境界線が不鮮明になり、目盛パターン
のバランスも崩れてしまう。しかもサイドエツチ
の発生は、細かい目盛巾の刻設を不可能にし、そ
のため例えば目盛巾が10μｍより小さいスケール
の製造は従来方法では実際上不可能である。 Furthermore, a more serious problem is that in these conventional methods, the light-absorbing surface is formed by roughening the scale metal base, so a good light-absorbing surface cannot be obtained unless the base surface is roughened as much as possible. This is something that cannot be done. Therefore, since the etching is carried out under harsh conditions, side etching 18 occurs violently as shown in Figure 3, and as a result, the bright and dark boundaries between the light-reflecting surface and the light-absorbing surface become unclear, and the balance of the scale pattern becomes unbalanced. I end up. Furthermore, the occurrence of side etching makes it impossible to engrave fine scale widths, and therefore, it is practically impossible to manufacture scales with scale widths smaller than 10 μm, for example, using conventional methods.
以上の理由から、従来のスケールは計測器に使
用した時、得られる信号波形に歪が出やすいた
め、信号波形の多分割が困難で、より精密な測定
を行なうことができないという欠点がある。 For the above reasons, when conventional scales are used in measuring instruments, the resulting signal waveform tends to be distorted, making it difficult to divide the signal waveform into multiple parts, making it impossible to perform more precise measurements.
これらの欠点を取り除き、目盛巾10μｍ以下の
スケールを製造する方法として、近年電子ビー
ム、レーザー、イオン、プラズマ等の利用による
エツチングを行なう方法も開発されているが、い
ずれも設備が大きくなり且つ高価なため、数10cm
から数ｍに及ぶ長尺スケールの製造には不向きで
ある。 In order to eliminate these drawbacks and manufacture scales with a graduation width of 10 μm or less, etching methods using electron beams, lasers, ions, plasma, etc. have been developed in recent years, but all of these methods require large and expensive equipment. Number 10 cm
It is unsuitable for manufacturing long scales ranging from several meters in length.
さらに、ガラス素地にクロームの薄膜を付着
し、同様にエツチングによりクロームのみを目盛
状に剥離したスケールで、剥離した部分は光を透
過し、クロームの残つている目盛部は光を透過し
ないようにしたスケールも知られている。この方
法もサイドエツチの問題が少ない方法で、光の透
過部分と不透過部分の境界線も鮮明である。 In addition, a thin chrome film is attached to the glass base, and the chrome is peeled off in the same way by etching.The peeled part transmits light, while the remaining chrome scale does not transmit light. The scale is also known. This method also has fewer problems with side etching, and the boundary line between the light-transmitting portion and the non-light-transmitting portion is also clear.
しかしながら、このようなガラスを素地とした
スケールは、スケール面を透過した光を検出する
目的で使用するものであるから、本発明のように
スケール面で反射した光を検出する目的には使用
できない。すなわち、ガラスを素地としたスケー
ルは、スケールをはさんで一方の側に発光ランプ
を置き、他方の側にインデツクススケールと光電
変換素子を配し、ガラススケールとインデツクス
スケールを相対的に移動させながらこれら２つの
スケールを透過した光の強さの変化を光電変換素
子で電気的に検出して、スケールの相対移動量を
読み取るものである。したがつて、このようなス
ケールは第１図に示したように発光ランプと光電
変換素子がスケールに対して同じ側にある計測器
のスケールとして使用することができない。更に
反射形スケールに関して実開昭50−98751号公報
には、鏡面仕上げしたドラム側面にマスクをかけ
てから黒色インク等を塗布して後、前記マスクを
除去することにより反射パターンを生成する考案
が開示されている。これを目盛幅20μｍ程度の金
属スケールの製造に適用した場合について第４図
を用いて考察する。 However, such a scale made of glass is used for the purpose of detecting light transmitted through the scale surface, and cannot be used for the purpose of detecting light reflected from the scale surface as in the present invention. . In other words, with a scale made of glass, a light-emitting lamp is placed on one side of the scale, an index scale and a photoelectric conversion element are placed on the other side, and the glass scale and index scale are moved relative to each other. The relative movement amount of the scales is read by electrically detecting changes in the intensity of light transmitted through these two scales using a photoelectric conversion element. Therefore, such a scale cannot be used as a scale for a measuring instrument in which the light emitting lamp and the photoelectric conversion element are on the same side of the scale as shown in FIG. Furthermore, regarding a reflective scale, Japanese Utility Model Application Publication No. 50-98751 proposes a method of creating a reflective pattern by applying a mask to the mirror-finished drum side surface, applying black ink, etc., and then removing the mask. Disclosed. A case where this is applied to the production of a metal scale with a graduation width of about 20 μm will be discussed using FIG. 4.
第４図Ａのラツプ面１７を有する金属素地１１
に第４図Ｄの目盛幅Ｑが約20μｍの目盛を形成す
るためには、先ず第４図ＢのようにピツチＰが約
40μｍの保護マスク２０を形成する。次に第４図
Ｃに示す如く反射防止膜１２を形成するが、ピツ
チＰが40μｍ程度と微少であるため、保護マスク
２０の上面全体が反射防止膜１２におおわれてし
まう。 Metal substrate 11 having lapped surface 17 as shown in FIG. 4A
In order to form a scale with a scale width Q of approximately 20 μm as shown in Figure 4D, first the pitch P must be approximately 20μm as shown in Figure 4B.
A 40 μm protective mask 20 is formed. Next, the antireflection film 12 is formed as shown in FIG. 4C, but since the pitch P is as small as about 40 μm, the entire upper surface of the protective mask 20 is covered with the antireflection film 12.
したがつて、第４図Ｃの状態から保護マスク２
０を除去して第４図Ｄのスケールを得ることとは
極めて困難であり、この方法は目盛幅20μｍ以下
のスケール製造にはそのままでは適用できないこ
とがわかる。 Therefore, from the state shown in FIG. 4C, the protective mask 2
It is extremely difficult to obtain the scale shown in FIG. 4D by removing 0, and it can be seen that this method cannot be applied as is to manufacturing a scale with a graduation width of 20 μm or less.
本発明は上記の従来スケールの各種欠点を改良
したもので、特にサイドエツチの発生の問題を解
消し、これによつて光反射面と光吸収面の境界線
を鮮明ならしめ、目盛巾を細かく刻設しうるとと
もに、光反射面の耐久性にも優れた金属スケール
の容易な製造方法を提供するものである。 The present invention improves the various drawbacks of the conventional scales described above, and in particular eliminates the problem of side etching, thereby making the boundary line between the light reflecting surface and the light absorbing surface clear, and making the scale width finely incised. The object of the present invention is to provide a method for easily manufacturing a metal scale that can be easily installed and has an excellent durability of a light reflecting surface.
本発明の金属スケールは、第２図Ｅに示すとお
り、金属スケール素地１１のラツプ面１７よりな
る光反射目盛面１６およびラツプ面１７上に付着
した光吸収目盛面１５よりなり、従来の金属スケ
ールとは逆にエツチングされた部分が光反射目盛
面１６を形成することおよびサイドエツチの発生
が殆んどないことを特徴とする。 The metal scale of the present invention, as shown in FIG. On the contrary, it is characterized in that the etched portion forms the light-reflecting scale surface 16 and that there is almost no occurrence of side etching.
以下実施例をもつて本発明を説明する。 The present invention will be explained below with reference to Examples.
第２図は本発明の金属スケールの製造方法を示
す図である。先ず金属スケール素地１１として、
通常、ステンレス鋼を用い、表面を0.2S以下、好
ましくは0.1S以下の鏡面にラツプ仕上げする（第
２図Ａ）。この表面にCr2O3、MgF2、SiO、
Ce2O3等の反射防止膜または光吸収膜１２を真空
メツキ、化学メツキ、電気メツキ等で付着させ
る。スケールのパターン暗部として形成する反射
防止膜としては、鏡面仕上した金属素地に比較し
てより高い光の反射防止または吸収作用を有する
物質であれば、不導体、半導体その他の適当な物
質も使用できる。この反射防止膜１２は後述の理
由から、光の反射防止能および付着強度等が充分
であれば薄いほどよく、例えばCr2O3の場合約
200〜2000Å程度である。次にこの表面に通常の
フオトレジスト膜１３を塗布等により形成する。
このフオトレジスト膜１３上にスケール原板のマ
スク１４を重ね、矢印方向から光を照射し（第２
図Ｂ）、フオトレジスト膜１３の所要部分を感光
させて現像し（第２図Ｃ）、フオトレジスト膜１
３の剥離部分にCr2O3等は溶解するがステンレス
材料は溶解し無い腐蝕剤、例えば硝酸セリウムア
ンモニウムと過酸化水素との混合液を作用させ
る。このようにして反射防止膜１２を溶解し、金
属スケール素地１１のラツプ面を浸すことなく、
反射防止膜１２をスケール原板のマスク１４の画
像にしたがつて目盛状に除去することができる
（第２図Ｄ）。最後に反射防止膜１２上に残存する
フオトレジスト膜１３を除去することによつて金
属スケール（第２図Ｅ）を得る。 FIG. 2 is a diagram showing a method of manufacturing a metal scale according to the present invention. First, as a metal scale base 11,
Usually, stainless steel is used, and the surface is lap-finished to a mirror finish of 0.2S or less, preferably 0.1S or less (Figure 2A). Cr 2 O 3 , MgF 2 , SiO,
An antireflection film or light absorption film 12 such as Ce 2 O 3 is attached by vacuum plating, chemical plating, electroplating, or the like. As the antireflection film formed as the dark part of the scale pattern, nonconductors, semiconductors, and other suitable materials can be used as long as they have a higher antireflection or absorption effect than mirror-finished metal substrates. . For reasons described later, the thinner the anti-reflection film 12 is, the better, as long as it has sufficient anti-reflection ability and adhesion strength. For example, in the case of Cr 2 O 3 ,
It is about 200 to 2000 Å. Next, a conventional photoresist film 13 is formed on this surface by coating or the like.
A mask 14 of a scale original plate is placed on this photoresist film 13, and light is irradiated from the direction of the arrow (second
Figure B), the required portions of the photoresist film 13 are exposed and developed (Figure 2C), and the photoresist film 1
A corrosive agent that dissolves Cr 2 O 3 and the like but does not dissolve stainless steel materials, such as a mixed solution of cerium ammonium nitrate and hydrogen peroxide, is applied to the peeled part 3. In this way, the anti-reflection film 12 is dissolved and the lap surface of the metal scale base 11 is not immersed.
The antireflection film 12 can be removed in a graduated pattern according to the image of the mask 14 on the scale original plate (FIG. 2D). Finally, the photoresist film 13 remaining on the antireflection film 12 is removed to obtain a metal scale (FIG. 2E).
なお、本実施例では腐蝕剤として硝酸セリウム
アンモニウムと過酸化水素との混合液を使用した
が、使用した金属素地および反射防止膜の材料に
応じて腐蝕剤の組成、濃度ならびに腐蝕時間を適
宜選択することにより、ステンレス鋼以外の金属
素地のラツプ面でも侵すことなく反射防止膜を目
盛状に除去することができる。また金属素地が比
較的腐蝕剤に侵され易い場合でも、前記の通り反
射防止膜は薄いため、ラツプ面の腐蝕は最少限度
に止めることができる。 In this example, a mixture of cerium ammonium nitrate and hydrogen peroxide was used as the corrosive agent, but the composition, concentration, and corrosion time of the corrosive agent may be selected as appropriate depending on the metal base used and the material of the antireflection film. By doing so, it is possible to remove the anti-reflection film in a graduated pattern without damaging even the lap surfaces of metal bases other than stainless steel. Furthermore, even if the metal base is relatively easily attacked by corrosive agents, the anti-reflection coating is thin as described above, so corrosion of the lap surface can be kept to a minimum.
以上のようにして得られる本発明の金属スケー
ルは、従来の方法での重大問題であつたサイドエ
ツチの発生が殆んどなく、したがつて著しく鮮明
な目盛パターンの境界線が得られる。このような
本発明の金属スケールの利点は、従来方法とは逆
に、エツチングした部分に光反射面を形成すると
いう本発明の製造方法により初めて達成されたも
のである。すなわち、本発明の製造方法において
は、エツチングの目的は従来方法のように素地金
属面を粗らして光吸収面を形成することではな
く、単に厚さ1μｍ以下の非常に薄い反射防止膜
をエツチングすることにすぎないので、非常に穏
和なエツチング条件が使用でき、しかも素地金属
に通常、耐蝕性の材料を使用するため、サイドエ
ツチは殆んど発生しない。しかも本発明の金属ス
ケールでは、光吸収目盛面（暗部）は金属粗地表
面を粗らして乱反射面としたものではなく、それ
自身光の反射を防止する材料で形成できるので、
光反射面と光吸収面のコントラストをより一層鮮
明にできる。 The metal scale of the present invention obtained as described above has almost no occurrence of side etching, which was a serious problem in conventional methods, and therefore provides extremely clear boundaries of the scale pattern. These advantages of the metal scale of the present invention were achieved for the first time by the manufacturing method of the present invention in which a light reflecting surface is formed in the etched portion, contrary to the conventional method. That is, in the manufacturing method of the present invention, the purpose of etching is not to roughen the base metal surface to form a light absorption surface as in the conventional method, but to simply etch a very thin antireflection film with a thickness of 1 μm or less. Since the etching process is only a matter of etching, very mild etching conditions can be used, and since the base metal is usually a corrosion-resistant material, side etching hardly occurs. Furthermore, in the metal scale of the present invention, the light-absorbing scale surface (dark area) is not formed by roughening the rough metal surface to create a diffusely reflecting surface, but can itself be formed of a material that prevents reflection of light.
The contrast between the light-reflecting surface and the light-absorbing surface can be made even clearer.
以上の理由により、本発明の製造方法によつ
て、従来全く不可能であつた目盛巾2μｍ程度の
細かい目盛でさえも容易に刻設することができ、
また反射面の明暗のコントラストが大きいため電
気信号を多分割して取り出すことも従来の金属ス
ケールよりはるかに容易になつた。 For the above reasons, by the manufacturing method of the present invention, it is possible to easily engrave even fine scales with a scale width of about 2 μm, which was previously impossible.
Also, because the contrast between light and dark on the reflective surface is large, it is much easier to divide and extract electrical signals into multiple parts than with conventional metal scales.
以上の利点に加え、本発明の製造方法により得
られた金属スケールは光反射面を耐蝕性金属で形
成し、しかもエツチングにより光吸収面より下に
形成したため、使用による光反射面の摩耗および
損傷の少ない耐久性に優れた金属スケールが得ら
れるものである。 In addition to the above-mentioned advantages, the metal scale obtained by the manufacturing method of the present invention has a light-reflecting surface made of a corrosion-resistant metal and is formed below the light-absorbing surface by etching, so that the light-reflecting surface will not be worn out or damaged by use. This results in a metal scale with excellent durability and low oxidation.
第１図は電子計測装置の概略図、第２図は本発
明の金属スケールの製造工程を示す図、第３図は
従来の金属スケールを示す図である。第４図は従
来の粗い目盛の反射パターンの製造工程を金属ス
ケールの製造に適用した場合に予想される製造工
程を示す図である。
１…金属スケール、１′…本発明の金属スケー
ル、１″…従来の金属スケール、２…光源、３…
コリメータレンズ、４…インデツクススケール、
５…光電変換素子、６…検出器、１１…金属スケ
ール素地、１２…反射防止膜、１３…フオトレジ
スト膜、１４…スケール原板のマスク、１５，１
５′…光吸収目盛面、１６，１６′…光反射目盛
面、１７…金属素地のラツプ面、１８…サイドエ
ツチ。
FIG. 1 is a schematic diagram of an electronic measuring device, FIG. 2 is a diagram showing the manufacturing process of the metal scale of the present invention, and FIG. 3 is a diagram showing a conventional metal scale. FIG. 4 is a diagram showing the expected manufacturing process when the conventional manufacturing process of a coarse scale reflection pattern is applied to the manufacturing of a metal scale. DESCRIPTION OF SYMBOLS 1... Metal scale, 1'... Metal scale of this invention, 1''... Conventional metal scale, 2... Light source, 3...
Collimator lens, 4...index scale,
5... Photoelectric conversion element, 6... Detector, 11... Metal scale base, 12... Antireflection film, 13... Photoresist film, 14... Mask for scale original plate, 15, 1
5'...Light absorption scale surface, 16, 16'...Light reflection scale surface, 17...Lap surface of metal base, 18...Side etching.
Claims (1)
し、また該位置の相対関係を求めるための電子計
測装置用の金属スケールの製造方法において、金
属素地の表面を鏡面仕上げし、次に該鏡面に比較
してより高い光の反射防止または吸収作用を有す
る厚さ１〔マイクロメートル〕以下の薄膜を該金
属素地表面上に形成し、該薄膜上にフオトレジス
ト被膜を重層し、マスクを通して該フオトレジス
ト被膜を感光させ現像して、刻設すべき目盛部分
のフオトレジスト被膜を除去し、前記薄膜は溶解
するが前記金属素地は溶解しにくい腐蝕剤にて前
記薄膜を除去して目盛を形成することを特徴とす
る金属スケールの製造方法。[Claims] 1. In a method for manufacturing a metal scale for an electronic measuring device for measuring the amount of movement of two relatively moving positions and determining the relative relationship between the positions, the surface of the metal base is mirror-finished. Then, a thin film with a thickness of 1 [micrometer] or less having a higher antireflection or absorption effect than the mirror surface is formed on the surface of the metal base, and a photoresist coating is applied on the thin film. The photoresist film is exposed to light through a mask and developed to remove the photoresist film at the scale portions to be engraved. A method for manufacturing a metal scale, characterized by forming a scale by removing the scale.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2139380A JPS56118606A (en) | 1980-02-22 | 1980-02-22 | Metal scale and manufacture thereof |
| DE19813105934 DE3105934A1 (en) | 1980-02-22 | 1981-02-18 | METAL SCALE AND METHOD FOR THEIR PRODUCTION |
| GB8105226A GB2072850B (en) | 1980-02-22 | 1981-02-19 | Metal scale for an electronic measuring instrument |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2139380A JPS56118606A (en) | 1980-02-22 | 1980-02-22 | Metal scale and manufacture thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56118606A JPS56118606A (en) | 1981-09-17 |
| JPH0377442B2 true JPH0377442B2 (en) | 1991-12-10 |
Family
ID=12053811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2139380A Granted JPS56118606A (en) | 1980-02-22 | 1980-02-22 | Metal scale and manufacture thereof |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS56118606A (en) |
| DE (1) | DE3105934A1 (en) |
| GB (1) | GB2072850B (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60118912U (en) * | 1984-01-18 | 1985-08-12 | アルプス電気株式会社 | Code wheel of reflective optical rotary encoder |
| JPS61102915U (en) * | 1984-12-12 | 1986-07-01 | ||
| JPS61197510U (en) * | 1985-05-31 | 1986-12-10 | ||
| GB2188426A (en) * | 1986-03-26 | 1987-09-30 | Digital Building Systems Limit | Quantity surveying instrument |
| JPH04208810A (en) * | 1990-12-03 | 1992-07-30 | Omron Corp | Apparatus for outputting displacement signal |
| US5963330A (en) * | 1996-11-13 | 1999-10-05 | Dr. Johannes Heidenhain Gmbh | Optical position measuring device |
| GB2339910A (en) * | 1998-07-17 | 2000-02-09 | Ab Automotive Electronics Ltd | Position determining system for a vehicle seat |
| DE19937023A1 (en) * | 1999-08-05 | 2001-02-08 | Heidenhain Gmbh Dr Johannes | Reflection material measure and method for producing a reflection material measure |
| JP2006337321A (en) * | 2005-06-06 | 2006-12-14 | Mitsutoyo Corp | Optical scale and manufacturing method therefor |
| JP6086070B2 (en) * | 2011-12-28 | 2017-03-01 | 株式会社ニコン | Encoder and drive device |
| JP6425875B2 (en) * | 2013-06-14 | 2018-11-21 | 株式会社ミツトヨ | Scale for photoelectric type measuring instrument, encoder and method of forming scale |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR638014A (en) * | 1926-07-10 | 1928-05-14 | Comp Generale Electricite | Process for obtaining layers of nickel from sheets composed of alternating layers of nickel and copper |
| DE902713C (en) * | 1950-02-28 | 1955-11-17 | Wenczler & Heidenhain | Process for applying copies to any material |
| DE1217637B (en) * | 1961-01-04 | 1966-05-26 | Philips Nv | Device for measuring displacements |
| DE1278124B (en) * | 1965-09-02 | 1968-09-19 | Leitz Ernst Gmbh | Process for producing graduations, measuring marks, grids and like |
| CH460365A (en) * | 1966-12-08 | 1968-07-31 | Wild Heerbrugg Ag | Opaque and non-reflective coating applied to an optical carrier |
| DE1798372A1 (en) * | 1967-03-28 | 1972-08-10 | Rudolph Dietbert Dipl Phys | Process for the production of reflection and transmission gratings |
| AT284483B (en) * | 1967-08-10 | 1970-09-10 | Wenczler & Heidenhain | Etched graduations and methods of making them |
| US3878391A (en) * | 1973-12-17 | 1975-04-15 | Westinghouse Electric Corp | Radiometric pulse initiator having a reflective patterned drum |
| DE3316144A1 (en) * | 1982-05-04 | 1983-11-10 | Canon K.K., Tokyo | Method and device for measuring the extent of a movement |
-
1980
- 1980-02-22 JP JP2139380A patent/JPS56118606A/en active Granted
-
1981
- 1981-02-18 DE DE19813105934 patent/DE3105934A1/en active Granted
- 1981-02-19 GB GB8105226A patent/GB2072850B/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE3105934C2 (en) | 1991-07-18 |
| GB2072850B (en) | 1984-02-29 |
| GB2072850A (en) | 1981-10-07 |
| DE3105934A1 (en) | 1982-01-07 |
| JPS56118606A (en) | 1981-09-17 |
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