JPH038767A - Voltage-dependent nonlinear resistor ceramic composition and method for producing varistor - Google Patents

Voltage-dependent nonlinear resistor ceramic composition and method for producing varistor

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Publication number
JPH038767A
JPH038767A JP1143729A JP14372989A JPH038767A JP H038767 A JPH038767 A JP H038767A JP 1143729 A JP1143729 A JP 1143729A JP 14372989 A JP14372989 A JP 14372989A JP H038767 A JPH038767 A JP H038767A
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Japan
Prior art keywords
mol
component
varistor
voltage
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1143729A
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Japanese (ja)
Inventor
Keiichi Noi
野井 慶一
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Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
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Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1143729A priority Critical patent/JPH038767A/en
Publication of JPH038767A publication Critical patent/JPH038767A/en
Pending legal-status Critical Current

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  • Thermistors And Varistors (AREA)

Abstract

PURPOSE:To improve dielectric constant and extent of surge resistance by constructing a composition from composition composed of a principal component, such as SrTiO3, Nb2O5 or Al2O3, and an additive prepared by calcining a mixture of MgTiO3 with SiO2. CONSTITUTION:The subject composition is formed from 100 pts.wt. principal component composed of 90-99.998mol% first component of SraTiO3 (a is 0.95-1), 0.001-5mol% second component and 0.001-5mol% third component and 0.001-10 pts.wt. additive. The above-mentioned second component is composed of one or more of Nb2O5, Ta2O5, WO3, Dy2O3, etc. The aforementioned third component is composed of one or more of Al2O3, Sb2O3, BaO, BeO, PbO, etc. Furthermore, the above-mentioned additive is obtained by calcining a mixture composed of 60-32.5mol% MgTiO3 and 40-67.5mol% SiO2 at >=1200 deg.C temperature.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は電気機器、電子機器で発生する異常高電圧、ノ
イズ、静電気などから機器の半導体および回路を保護す
るためのコンデンサ特性とバリスタ特性を有する電圧依
存性非直線抵抗体磁器組成物およびバリスタの製造方法
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a voltage having capacitor characteristics and varistor characteristics to protect semiconductors and circuits of equipment from abnormal high voltages, noise, static electricity, etc. generated in electrical equipment and electronic equipment. The present invention relates to a dependent nonlinear resistor ceramic composition and a method for manufacturing a varistor.

従来の技術 従来、各種の電気機器、電子機器における異常高電圧の
吸収、ノイズの除去、火花消去、静電気対策のために電
圧依存性非直線抵抗特性を有するSiCバリスタや、Z
nO系バリスタなどが使用されている。このようなバリ
スタの電圧−電流特性は近似的に次式のように表すこと
ができる。
Conventional technology Conventionally, SiC varistors and Z
nO type varistors are used. The voltage-current characteristics of such a varistor can be approximately expressed as in the following equation.

1=(V/C)α ここで、■は電流、■は電圧、Cはバリスタ固有の定数
、αは電圧−電流非直線指数である。
1=(V/C) α Here, ■ is a current, ■ is a voltage, C is a constant specific to the varistor, and α is a voltage-current nonlinear index.

SiCバリスタのαは2〜7程度、ZnO系バノスタで
はαが50にもおよぶものがある。このようなバリスタ
は比較的高い電圧の吸収には優れた性能を有しているが
、誘電率が低(、固有の静電容量が小さいため、バリス
タ電圧以下の比較的低い電圧の吸収にはほとんど効果を
示さず、また誘電損失tanδが5〜10%と大きい。
The α of SiC varistors is about 2 to 7, and the α of some ZnO-based vanostars is as high as 50. Such varistors have excellent performance in absorbing relatively high voltages, but due to their low dielectric constant (and small inherent capacitance), they are not suitable for absorbing relatively low voltages below the varistor voltage. It shows almost no effect, and the dielectric loss tan δ is as large as 5 to 10%.

一方、これらの低電圧のノイズなどの除去には見かけの
誘電率が5 X 104程度で、tanδが1%前後の
半導体コンデンサが利用されている。
On the other hand, semiconductor capacitors with an apparent dielectric constant of about 5×10 4 and a tan δ of about 1% are used to remove these low voltage noises.

しかし、このような半導体コンデンサはサージなどによ
りある限度以上の電圧または電流が印加される七、静電
容量が減少したり、破壊されたりしてコンデンサとして
の機能を果たさな(なったりする。
However, when a voltage or current exceeding a certain limit is applied to such a semiconductor capacitor due to a surge or the like, the capacitance decreases or is destroyed and the capacitor no longer functions as a capacitor.

そこで最近になって5rTi○3を主成分とし、バリス
タ特性とコンデンサ特性の両方の機能を有するものが開
発され、コンピュータなどの電子機器におけるIC,L
SIなどの半導体素子の保護に利用されている。
Therefore, recently, a product that has 5rTi○3 as its main component and has both varistor and capacitor properties has been developed, and it is used in IC, L, and other electronic devices such as computers.
It is used to protect semiconductor devices such as SI.

発明が解決しようとする課題 上記の5rTi03を主成分とするバリスタとコンデン
サの両方の機能を有する素子は、ZnO系バリスタに比
べ誘電率が約10倍と大きいが、αやサージ耐量が小さ
(、バリスタ電圧を低くすると特性が劣化しやすいとい
った欠点を有していた。
Problems to be Solved by the Invention The above-mentioned 5rTi03-based element, which functions as both a varistor and a capacitor, has a dielectric constant about 10 times higher than that of a ZnO-based varistor, but has a small α and surge resistance (, This has the disadvantage that when the varistor voltage is lowered, the characteristics tend to deteriorate.

そこで本発明では、誘電率が太き(、バリスタ電圧が低
く、αが大きいと共にサージ耐量が大きい電圧依存性非
直線抵抗体磁器組成物およびバリスタの製造方法を提供
することを目的とするものである。
Therefore, an object of the present invention is to provide a voltage-dependent nonlinear resistor ceramic composition having a large dielectric constant (low varistor voltage, large α, and large surge withstand capacity), and a method for manufacturing the varistor. be.

課題を解決するための手段 上記の問題点を解決するために本発明では、S r a
 T i 03 (0.950≦a≦1.000) (
以下第1成分と呼ぶ)を90.OOO〜99.998m
o 1%、Nb2O5,Ta205.WO3,Dy2O
3゜Y2O3,La2O3,ceO2,Sm2O3,P
 r601Nd203のうち少なくとも1ill類以上
(以下第2成分と呼ぶ)を0.001〜5.OOOmo
 1%。
Means for Solving the Problems In order to solve the above problems, in the present invention, S r a
T i 03 (0.950≦a≦1.000) (
(hereinafter referred to as the first component) is 90. OOO~99.998m
o 1%, Nb2O5, Ta205. WO3, Dy2O
3゜Y2O3, La2O3, ceO2, Sm2O3, P
Of r601Nd203, at least 1ill or more (hereinafter referred to as the second component) is 0.001 to 5. OOOmo
1%.

A 1203,Sb2O3,BaO,Bed、PbO。A1203, Sb2O3, BaO, Bed, PbO.

B2O3,Cr2O3,Fe2O3,CaO,に20゜
CaO,CO2O3,CuO,Cu2O,L 120L
 i F、MgO,MnO2,MOO3,Na2O。
B2O3, Cr2O3, Fe2O3, CaO, 20°CaO, CO2O3, CuO, Cu2O, L 120L
i F, MgO, MnO2, MOO3, Na2O.

NaF,NiO,Rh2O3,5eOz、’Ag2O。NaF, NiO, Rh2O3, 5eOz, 'Ag2O.

S i 02.S i C,S ro、T I2O3,
ThO3,TiO2,V2O5T B 12O3,Zn
O,Z ro3,SnO2のうち少なくとも1種類以上
(以下第3成分と呼ぶ)を0.001〜5.OOOmo
 1%含有してなる主成分100重量部と、MgTi(
h60、OOO〜32.500mo 1%,SiO24
0.000〜67.500mo 1%からなる混合物を
1200℃以上で焼成してなる添加物(以下第4成分と
呼ぶ)0.001〜10.000重量部とからなる電圧
依存性非直線抵抗体磁器組成物を得ることにより問題を
解決しようとするものである。
S i 02. S i C, S ro, T I2O3,
ThO3, TiO2, V2O5T B 12O3, Zn
At least one of O, Z ro3, and SnO2 (hereinafter referred to as the third component) in an amount of 0.001 to 5. OOOmo
100 parts by weight of the main component containing 1% MgTi (
h60, OOO~32.500mo 1%, SiO24
A voltage-dependent nonlinear resistor consisting of 0.001 to 10.000 parts by weight of an additive (hereinafter referred to as the fourth component) obtained by firing a mixture consisting of 1% of 0.000 to 67.500 mo at 1200°C or higher. The aim is to solve the problem by obtaining a porcelain composition.

また、上記組成物を1100℃以上で焼成するバリスタ
の製造方法、あるいは上記組成物を1100℃以上で焼
成した後、還元性雰囲気中で1200℃以上で焼成し、
その後酸化性雰囲気中で900〜1300℃で焼成する
バリスタの製造方法を提案するものである。
Further, a method for producing a varistor comprising firing the above composition at 1100°C or higher, or firing the above composition at 1100°C or higher and then firing at 1200°C or higher in a reducing atmosphere,
The present invention proposes a method for producing a varistor in which the varistor is then fired at 900 to 1300°C in an oxidizing atmosphere.

作用 上記の発明において第1成分は主たる成分であり、第2
成分は主に第1成分の半導体化を促進する金属酸化物で
ある。また、第3成分は誘電率。
Effect In the above invention, the first component is the main component, and the second component is the main component.
The components are mainly metal oxides that promote semiconducting of the first component. Also, the third component is the dielectric constant.

α、サージ耐量の改善に寄与するものであり、第4成分
はバリスタ電圧の低下、誘電率の改善に有効なものであ
る。特に、第4成分は融点が1230〜1250℃と比
較的低いため、融点前後の温度で焼成すると液相となり
、その他の成分の反応を促進すると共に粒子の成長を促
進する。そのため粒界部分に第3成分が偏析しやすくな
り、粒界が高抵抗化され易くなり、バリスタ機能および
コンデンサ機能が改善される。また、粒成長が促進され
るためバリスタ電圧が低くなり、粒径の均一性が向上す
るため特性の安定性がよくなり、特にサージ耐量が改善
されることとなる。
α contributes to improving the surge resistance, and the fourth component is effective in reducing the varistor voltage and improving the dielectric constant. In particular, since the fourth component has a relatively low melting point of 1230 to 1250° C., when fired at a temperature around the melting point, it turns into a liquid phase, which promotes the reactions of the other components and the growth of particles. Therefore, the third component is likely to segregate in the grain boundary portion, making the grain boundary more likely to have a high resistance, thereby improving the varistor function and capacitor function. Furthermore, since grain growth is promoted, the varistor voltage is lowered, and the uniformity of the grain size is improved, resulting in improved stability of characteristics, and in particular, improved surge resistance.

実施例 以下に実施例を挙げて本発明を具体的に説明する。Example The present invention will be specifically described below with reference to Examples.

まず、MgT i○3.SiC2を下記の第1表に示す
ように組成比を種々変えて秤量し、ボールミルなどで2
0Hr混合する。次に、乾燥した後、下記の第1表に示
すように温度を種々変えて焼成し、再びボールミルなど
で208 r粉砕した後、乾燥し、第4成分とする。次
いで、第1成分、第2成分、第3成分、第4成分を下記
の第1表に示した組成比になるように秤量し、ボールミ
ルなどで248 r混合した後、乾燥し、ポリビニルア
ルコールなどの有機バインダーを10wt%添加して造
粒した後、1(t/c/)のプレス圧力で1oφXIt
(mm)の円板状に成形し、1000℃で10Hr焼成
し脱バインダーする。次に、第1表に示したように温度
を種々変えて3Hr焼成(第1焼成)シ、その後還元性
雰囲気、例えばN2:)(2=9:1のガス中で温度を
種々変えて4Hr焼成(第2焼成)する。さらにその後
、酸化性雰囲気中で温度を種々変えて4Hr焼成(第3
焼成)する。
First, MgT i○3. SiC2 was weighed at various composition ratios as shown in Table 1 below, and 2
Mix for 0 hours. Next, after drying, the mixture is fired at various temperatures as shown in Table 1 below, ground again at 208 r with a ball mill, etc., and dried to obtain the fourth component. Next, the first component, second component, third component, and fourth component were weighed to have the composition ratio shown in Table 1 below, mixed in a ball mill for 248 r, dried, and mixed with polyvinyl alcohol, etc. After adding 10 wt% of organic binder and granulating it, 1oφXIt was added with a press pressure of 1 (t/c/).
(mm) and baked at 1000° C. for 10 hours to remove the binder. Next, as shown in Table 1, the temperature was varied and fired for 3 hours (first firing), and then the temperature was varied for 4 hours in a reducing atmosphere, for example, N2:) (2=9:1 gas). Firing (second firing).After that, firing for 4 hours at various temperatures in an oxidizing atmosphere (third firing).
firing).

こうして得られた第1図および第2図に示す焼結体1の
両平面に外周を残すようにして、Mなどの導電性ペース
トをスクリーン印刷などにより塗布し、600℃、5m
1nで焼成し、電極2,3を形成する。次に、半田など
によりリード線を取付け、エポキシなどの樹脂を塗装す
る。このようにして得られた素子の特性を下記の第2表
に示す。
The thus obtained sintered body 1 shown in FIGS. 1 and 2 was coated with a conductive paste such as M by screen printing, leaving the outer periphery on both planes, and heated at 600°C for 5 m.
The electrodes 2 and 3 are formed by firing at 1n. Next, the lead wires are attached using solder or the like, and a resin such as epoxy is applied. The characteristics of the device thus obtained are shown in Table 2 below.

なお、見掛は誘電率はIKHzでの静電容量から計算し
たものであり、αは α=1/Log (V+ornA/V+mA)(ただし
、VlmA、VHmAは1mA、10mAの電流を流し
た時に素子の両端にかかる電圧である。)で評価した。
Note that the apparent permittivity is calculated from the capacitance at IKHz, and α is α=1/Log (V+ornA/V+mA) (however, VlmA and VHmA are the values of the element when a current of 1mA and 10mA is applied. It is the voltage applied across both ends.).

また、サージ耐量はパルス性の電流を印加した後のVl
mAの変化率が±10%以内である時の最大のパルス性
電流値により評価している。
In addition, the surge withstand capacity is Vl after applying a pulsed current.
The evaluation is based on the maximum pulse current value when the rate of change in mA is within ±10%.

(以  下  余  白  ) また、第1成分の5raTi03の範囲を規定したのは
、aが1.000よりも大きくなると格子欠陥が発生し
にくいため半導体化が促進されず、VlmAが高くなり
すぎて特性が劣化し、方0.95より小さくなるとTi
が過剰になりすぎてTiO2の結晶が生成し、組織が不
均一になり特性が劣化するためである。さらに、第2成
分はO,OO1mol%未満では効果を示さず、5.0
00mol%を超えると粒界に偏析して粒界の高抵抗化
を抑制し、粒界に第2相を形成するため特性が劣化する
ものである。また、第3成分は0.001mol%未満
では効果を示さず、5、000mol%を超えると粒界
に偏析して第2相を形成するため特性が劣化するもので
ある。
(Margin below) Also, the reason why the range of 5raTi03 of the first component was specified is that when a is larger than 1.000, lattice defects are less likely to occur, so semiconductor formation is not promoted, and VlmA becomes too high. When the characteristics deteriorate and become smaller than 0.95, Ti
This is because TiO2 crystals are formed when TiO2 becomes too excessive, resulting in a non-uniform structure and deterioration of properties. Furthermore, the second component has no effect when O,OO is less than 1 mol%, and 5.0
If it exceeds 00 mol %, it segregates at the grain boundaries, suppresses the increase in resistance of the grain boundaries, and forms a second phase at the grain boundaries, resulting in deterioration of properties. Furthermore, if the third component is less than 0.001 mol%, it will not be effective, and if it exceeds 5,000 mol%, it will segregate at grain boundaries and form a second phase, resulting in deterioration of properties.

また、第4成分はMgTiChと5i02の2成分系の
相図のなかでMgTiO360.000〜32.500
mol%、S iCh  40.000〜67 、50
0 m o ’1%の範囲内のものは最も融点の低い領
域の物質であり、その範囲外では融点が高くなるもので
ある。また、第4成分の添加量は、0.001重量部未
満では効果を示さず、10.000重量部を超えると粒
界の抵抗は高くなるが粒界の幅が厚くなるため、静電容
量が小さくなると共にV+ mAが高(なり、サージに
対して弱(なるものである。また、第4成分の焼成温度
を規定したのは、低融点の第4成分が合成される温度が
1200℃以上であるためである。そして、第1焼成の
温度を規定したのは、第4成分の融点が1200〜12
50℃であるため、1100℃以上の1温度で焼成する
と第4成分が液相に近い状態になって焼結が促進される
ためであり、1100℃未満では第4成分の液相焼結効
果がないためである。また、第2焼成の温度を規定した
のは、1200℃未満では第1焼成後の焼結体が十分に
還元されず、バリスタ特性、コンデンサ特性共に劣化す
るためである。さらに、第3焼成の温度を規定したのは
、900℃未満では粒界の高抵抗化が十分に進まないた
め、VlmAが低(なりすぎバリスタ特性が劣化するた
めであり、1300℃を越えると静電容量が小さくなり
すぎコンデンサ特性が劣化するためである。また、第1
焼成の雰囲気は酸化性雰囲気でも還元性雰囲気でも同様
の効果があることを確認した。
In addition, the fourth component is MgTiO360.000-32.500 in the phase diagram of the two-component system of MgTiCh and 5i02.
mol%, SiCh 40.000-67, 50
Those within the range of 0 m o '1% are the substances with the lowest melting points, and those outside this range have higher melting points. Furthermore, if the amount of the fourth component added is less than 0.001 parts by weight, no effect will be shown, and if it exceeds 10.000 parts by weight, the resistance of the grain boundaries will increase, but the width of the grain boundaries will become thicker, so the capacitance will increase. As V+ mA becomes smaller, V+ mA becomes higher (and weaker against surge). Also, the firing temperature of the fourth component was specified so that the temperature at which the fourth component with a low melting point was synthesized was 1200°C. This is because the temperature of the first firing was specified because the melting point of the fourth component was between 1200 and 1200.
Since the temperature is 50°C, firing at a temperature of 1,100°C or higher causes the fourth component to enter a state close to a liquid phase, promoting sintering, while below 1,100°C, the liquid phase sintering effect of the fourth component decreases. This is because there is no. Further, the temperature of the second firing is specified because if it is lower than 1200° C., the sintered body after the first firing will not be sufficiently reduced, and both the varistor characteristics and the capacitor characteristics will deteriorate. Furthermore, the temperature of the third firing was specified because if it is less than 900°C, the resistance of the grain boundaries will not increase sufficiently, and VlmA will become too low (too much), and the varistor characteristics will deteriorate; if it exceeds 1300°C, This is because the capacitance becomes too small and the capacitor characteristics deteriorate.
It was confirmed that the same effect can be obtained whether the firing atmosphere is an oxidizing atmosphere or a reducing atmosphere.

なお、第2成分としては、上記実施例で挙げた成分以外
にSm 2O3, P r so++を用いることがで
き、かつ2種類以上を組み合せて上記範囲内の添加量で
用いてもよいものである。また、第3成分としては、上
記実施例で挙げた成分以外にBad、Bed、PbO,
B203 、CaOCu20.L i20.L iF、
MgO,Na2O。
In addition, as the second component, in addition to the components listed in the above examples, Sm2O3 and Prso++ may be used, and two or more types may be combined and used in an amount within the above range. . Further, as the third component, in addition to the components mentioned in the above examples, Bad, Bed, PbO,
B203, CaOCu20. L i20. L iF,
MgO, Na2O.

NaF、Rh2O3,5e02.Ag2O。NaF, Rh2O3, 5e02. Ag2O.

5i02 、SiC,SrO,T1203’I’110
2.TiO2を用いることができ、かつ第2成分と同様
に2種類以上を組合せて上述した範囲内の添加量で用い
てもよいものである。さらに、上記実施例ではこれら添
加物の組合せについては一部のみ示しているが、その他
の組合せでも同様の効果が得られることが確認された。
5i02, SiC, SrO, T1203'I'110
2. TiO2 can be used, and like the second component, two or more types can be used in combination in the amount added within the above-mentioned range. Furthermore, although only some of the combinations of these additives are shown in the above examples, it was confirmed that similar effects can be obtained with other combinations.

発明の効果 以上に示したように本発明によれば、粒子径が大きいた
めバリスタ電圧が低(、誘電率εおよびαが大きく、粒
子径のばらつきが小さいことからサージ電流が素子に均
一に流れるため、サージ耐量が太き(なるという効果が
得られる。
Effects of the Invention As shown above, according to the present invention, the varistor voltage is low because the particle size is large (and the surge current flows uniformly through the element because the permittivity ε and α are large and the variation in particle size is small). Therefore, the effect of increasing surge resistance can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による素子を示す上面図、第2図は本発
明による素子を示す断面図である。 1・・・・・・焼結体、2,3・・・・・・電極。
FIG. 1 is a top view showing an element according to the invention, and FIG. 2 is a sectional view showing the element according to the invention. 1... Sintered body, 2, 3... Electrode.

Claims (1)

【特許請求の範囲】 (1)Sr_aTiO_3(0.950≦a≦1.00
0)を90.000〜99.998mol%,Nb_2
O_5,Ta2O_5,WO_3,Dy_2O_3,Y
_2O_3,La_2O_3,CeO_2,Sm_2O
_3,Pr_6O_1_1,Nd_2O_3のうち少な
くとも1種類以上を0.001〜5.000mol%,
Al_2O_3,Sb_2O_3,BaO,BeO,P
bO,B_2O_3,Cr_2O_3,Fe_2O_3
,CdO,K_2O,CaO,Co_2O_3,CuO
,Cu_2O,Li_2O,LiF,MgO,MnO_
2,MoO_3,Na_2O,NaF,NiO,Rh_
2O_3,SeO_2,Ag_2O,SiO_2,Si
C,SrO,Tl_2O_3,ThO_2,TiO_2
,V_2O_5,Bi_2O_3,ZnO,ZrO_2
.SnO_2のうち少なくとも1種類以上を0.001
〜5.000mol%含有してなる主成分100重量部
と、MgTiO_3 60.000〜32.500mol%,SiO_240
.000〜67.500mol%からなる混合物を12
00℃以上で焼成してなる添加物0.001〜10.0
00重量部とからなることを特徴とする電圧依存性非直
線抵抗体磁器組成物。 (2)Sr_aTiO_3(0.950≦a≦1.00
0)を90.000〜99.998mol%,Nb_2
O_5,Ta_2O_5,WO_3,Dy_2O_3,
Y_2O_3,La_2O_3,CeO_2,Sm_2
O_3,Pr_6O_1_1,Nd_2O_3のうち少
なくとも1種類以上を0.001〜5.000mol%
,Al_2O_3,Sb_2O_3,BaO,BeO,
PbO,B_2O_3,Cr_2O_3,Fe_2O_
3,CdO,K_2O,CaO,Co_2O_3,Cu
O,Cu_2O,Li_2O,LiF,MgO,MnO
_2,MoO_3,Na_2O,NaF,NiO,Rh
_2O_3,SeO_2,Ag_2O,SiO_2,S
iC,SrO,Tl_2O_3,ThO_2,TiO_
2,V_2O_5,Bi_2O_3,ZnO,ZrO_
2,SnO_2のうち少なくとも1種類以上を0.00
1〜5.000mol%含有してなる主成分100重量
部と、MgTiO_3 60.000〜32.500mol%,SiO_240
.000〜67.500mol%からなる混合物を12
00℃以上で焼成してなる添加物0.001〜10.0
00重量部とからなる組成物を1100℃以上で焼成し
たことを特徴とするバリスタの製造方法。 (3)Sr_aTiO_3(0.950≦a≦1.00
0)を90.000〜99.998mol%,Nb_2
O_5,Ta_2O_5,WO_3,Dy_2O_3,
Y_2O_3,La_2O_3,CeO_2,Sm_2
O_3,Pr_6O_1_1,Nd_2O_3のうち少
なくとも1種類以上を0.001〜5.000mol%
,Al_2O_3,Sb_2O_3,BaO,BeO,
PbO,B_2O_3,Cr_2O_3,Fe_2O_
3,CdO,K_2O,CaO,Co_2O_3,Cu
O,Cu_2O,Li2O,LiF,MgO,MnO_
2,MoO_3,Na_2O,NaF,NiO,Rh_
2O_3,SeO_2,Ag_2O,SiO_2,Si
C,SrO,Tl_2O_3,ThO_2,TiO_2
,V_2O_5,Bi_2O_3,ZnO,ZrO_2
,SnO_2のうち少なくとも1種類以上を0.001
〜5.000mol%含有してなる主成分100重量部
と、MgTiO_3 60.000〜32.500mol%,SiO_240
.000〜67.500mol%からなる混合物を12
00℃以上で焼成してなる添加物0.001〜10.0
00重量部とからなる組成物を1100℃以上で焼成し
た後、還元性雰囲気中で1200℃以上で焼成し、その
後酸化性雰囲気中で900〜1300℃で焼成したこと
を特徴とするバリスタの製造方法。
[Claims] (1) Sr_aTiO_3 (0.950≦a≦1.00
0) from 90.000 to 99.998 mol%, Nb_2
O_5, Ta2O_5, WO_3, Dy_2O_3, Y
_2O_3, La_2O_3, CeO_2, Sm_2O
0.001 to 5.000 mol% of at least one of _3, Pr_6O_1_1, Nd_2O_3,
Al_2O_3, Sb_2O_3, BaO, BeO, P
bO, B_2O_3, Cr_2O_3, Fe_2O_3
, CdO, K_2O, CaO, Co_2O_3, CuO
, Cu_2O, Li_2O, LiF, MgO, MnO_
2, MoO_3, Na_2O, NaF, NiO, Rh_
2O_3, SeO_2, Ag_2O, SiO_2, Si
C, SrO, Tl_2O_3, ThO_2, TiO_2
, V_2O_5, Bi_2O_3, ZnO, ZrO_2
.. 0.001 of at least one type of SnO_2
100 parts by weight of the main component containing ~5.000 mol%, MgTiO_3 60.000-32.500 mol%, SiO_240
.. A mixture consisting of 000 to 67.500 mol%
Additives baked at 00°C or higher 0.001 to 10.0
00 parts by weight of a voltage-dependent nonlinear resistor ceramic composition. (2) Sr_aTiO_3 (0.950≦a≦1.00
0) from 90.000 to 99.998 mol%, Nb_2
O_5, Ta_2O_5, WO_3, Dy_2O_3,
Y_2O_3, La_2O_3, CeO_2, Sm_2
0.001 to 5.000 mol% of at least one of O_3, Pr_6O_1_1, Nd_2O_3
, Al_2O_3, Sb_2O_3, BaO, BeO,
PbO, B_2O_3, Cr_2O_3, Fe_2O_
3, CdO, K_2O, CaO, Co_2O_3, Cu
O, Cu_2O, Li_2O, LiF, MgO, MnO
_2, MoO_3, Na_2O, NaF, NiO, Rh
_2O_3, SeO_2, Ag_2O, SiO_2, S
iC, SrO, Tl_2O_3, ThO_2, TiO_
2, V_2O_5, Bi_2O_3, ZnO, ZrO_
2.0.00 of at least one type of SnO_2
100 parts by weight of the main component containing 1 to 5.000 mol%, MgTiO_3 60.000 to 32.500 mol%, SiO_240
.. A mixture consisting of 000 to 67.500 mol%
Additives baked at 00°C or higher 0.001 to 10.0
A method for manufacturing a varistor, characterized in that a composition comprising 0.00 parts by weight is fired at 1100°C or higher. (3) Sr_aTiO_3 (0.950≦a≦1.00
0) from 90.000 to 99.998 mol%, Nb_2
O_5, Ta_2O_5, WO_3, Dy_2O_3,
Y_2O_3, La_2O_3, CeO_2, Sm_2
0.001 to 5.000 mol% of at least one of O_3, Pr_6O_1_1, Nd_2O_3
, Al_2O_3, Sb_2O_3, BaO, BeO,
PbO, B_2O_3, Cr_2O_3, Fe_2O_
3, CdO, K_2O, CaO, Co_2O_3, Cu
O, Cu_2O, Li2O, LiF, MgO, MnO_
2, MoO_3, Na_2O, NaF, NiO, Rh_
2O_3, SeO_2, Ag_2O, SiO_2, Si
C, SrO, Tl_2O_3, ThO_2, TiO_2
, V_2O_5, Bi_2O_3, ZnO, ZrO_2
, at least one type of SnO_2 at 0.001
100 parts by weight of the main component containing ~5.000 mol%, MgTiO_3 60.000-32.500 mol%, SiO_240
.. A mixture consisting of 000 to 67.500 mol%
Additives baked at 00°C or higher 0.001 to 10.0
00 parts by weight is fired at 1100°C or higher, then fired at 1200°C or higher in a reducing atmosphere, and then fired at 900 to 1300°C in an oxidizing atmosphere. Method.
JP1143729A 1989-06-06 1989-06-06 Voltage-dependent nonlinear resistor ceramic composition and method for producing varistor Pending JPH038767A (en)

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JPH038767A true JPH038767A (en) 1991-01-16

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0558723A (en) * 1990-11-28 1993-03-09 Tam Ceramics Inc Method for sintering alkaline earth metal titanate
US5569632A (en) * 1994-06-30 1996-10-29 Korea Institute Of Science And Technology Compositions of high frequency dielectrics

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0558723A (en) * 1990-11-28 1993-03-09 Tam Ceramics Inc Method for sintering alkaline earth metal titanate
US5569632A (en) * 1994-06-30 1996-10-29 Korea Institute Of Science And Technology Compositions of high frequency dielectrics

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