JPH039368A - Recording material for laser beam printer - Google Patents
Recording material for laser beam printerInfo
- Publication number
- JPH039368A JPH039368A JP14334589A JP14334589A JPH039368A JP H039368 A JPH039368 A JP H039368A JP 14334589 A JP14334589 A JP 14334589A JP 14334589 A JP14334589 A JP 14334589A JP H039368 A JPH039368 A JP H039368A
- Authority
- JP
- Japan
- Prior art keywords
- sulfonic acid
- polymer
- meth
- group
- paper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 18
- 229920000642 polymer Polymers 0.000 claims abstract description 38
- 150000003839 salts Chemical class 0.000 claims abstract description 27
- 239000000178 monomer Substances 0.000 claims abstract description 23
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims abstract description 17
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 13
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims abstract description 9
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229920001577 copolymer Polymers 0.000 claims abstract description 6
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 24
- 229920001467 poly(styrenesulfonates) Polymers 0.000 claims description 8
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 5
- 150000004945 aromatic hydrocarbons Chemical group 0.000 claims description 3
- 239000000470 constituent Substances 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 abstract description 13
- 239000004793 Polystyrene Substances 0.000 abstract description 10
- 229920002223 polystyrene Polymers 0.000 abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 10
- 230000000694 effects Effects 0.000 abstract description 8
- 239000004215 Carbon black (E152) Substances 0.000 abstract description 4
- 229930195733 hydrocarbon Natural products 0.000 abstract description 4
- 239000002253 acid Substances 0.000 abstract description 3
- 230000008602 contraction Effects 0.000 abstract description 3
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 2
- 229920003169 water-soluble polymer Polymers 0.000 abstract description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 abstract 1
- -1 aliphatic halogenated hydrocarbons Chemical class 0.000 description 16
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Inorganic materials O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 9
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 4
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000002879 Lewis base Substances 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- 229920002472 Starch Polymers 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 150000007527 lewis bases Chemical class 0.000 description 3
- 108091008695 photoreceptors Proteins 0.000 description 3
- 159000000000 sodium salts Chemical class 0.000 description 3
- 239000008107 starch Substances 0.000 description 3
- 235000019698 starch Nutrition 0.000 description 3
- 150000003440 styrenes Chemical class 0.000 description 3
- 238000006277 sulfonation reaction Methods 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- 239000005995 Aluminium silicate Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- 239000004368 Modified starch Substances 0.000 description 2
- 229920000881 Modified starch Polymers 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 235000012211 aluminium silicate Nutrition 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229960003750 ethyl chloride Drugs 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 125000001273 sulfonato group Chemical class [O-]S(*)(=O)=O 0.000 description 2
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical compound OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- PAAZPARNPHGIKF-UHFFFAOYSA-N 1,2-dibromoethane Chemical compound BrCCBr PAAZPARNPHGIKF-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBQFBEBEBCHTBK-UHFFFAOYSA-N 1-phenylprop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)C(C=C)C1=CC=CC=C1 CBQFBEBEBCHTBK-UHFFFAOYSA-N 0.000 description 1
- FXNDIJDIPNCZQJ-UHFFFAOYSA-N 2,4,4-trimethylpent-1-ene Chemical group CC(=C)CC(C)(C)C FXNDIJDIPNCZQJ-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- SPJBHDZSXQBVPB-UHFFFAOYSA-N 2-phenylethene-1,1-disulfonic acid Chemical compound OS(=O)(=O)C(S(O)(=O)=O)=CC1=CC=CC=C1 SPJBHDZSXQBVPB-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- OBNZQBVPDZWAEB-UHFFFAOYSA-N 2-phenylprop-1-ene-1-sulfonic acid Chemical compound OS(=O)(=O)C=C(C)C1=CC=CC=C1 OBNZQBVPDZWAEB-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 241000251730 Chondrichthyes Species 0.000 description 1
- 244000241257 Cucumis melo Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 240000003183 Manihot esculenta Species 0.000 description 1
- 235000016735 Manihot esculenta subsp esculenta Nutrition 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- 244000082204 Phyllostachys viridis Species 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 240000006394 Sorghum bicolor Species 0.000 description 1
- 235000011684 Sorghum saccharatum Nutrition 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229920001938 Vegetable gum Polymers 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- WASQWSOJHCZDFK-UHFFFAOYSA-N diketene Chemical compound C=C1CC(=O)O1 WASQWSOJHCZDFK-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethyl mercaptane Natural products CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Natural products O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- 239000001254 oxidized starch Substances 0.000 description 1
- 235000013808 oxidized starch Nutrition 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- 150000004968 peroxymonosulfuric acids Chemical class 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- YKKYHJNXWUHFTR-UHFFFAOYSA-N propane;prop-2-enamide Chemical compound CCC.NC(=O)C=C YKKYHJNXWUHFTR-UHFFFAOYSA-N 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920003066 styrene-(meth)acrylic acid ester copolymer Polymers 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Paper (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は、レーザ・・−ビーノ、プリンター記録材料に
関する。詳しくは、紙送りトラブルのない1)〜ザービ
ーノ、プリンター記録材料に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to recording materials for laser, vino, and printers. More specifically, it relates to 1) - Zerbino and printer recording materials that do not cause paper feeding troubles.
[従来の技術]
近年、ファクシミリの分野にレーザービームプリンター
で記録する方法が普及しつつある。こtiに使用する記
録紙に、塩化ナトリウム、硫酸すIリウムなどを内添し
て帯電防+1.したI−性紙が提案されている。[Prior Art] In recent years, a method of recording using a laser beam printer has become popular in the field of facsimile. The recording paper used for this purpose is doped with sodium chloride, sulfuric acid, etc. to prevent static electricity by +1. An I-quality paper has been proposed.
[発明が解決しようとする課題]
しかし、これらは、低湿用:での帯電防勺1効果が少な
く、また湿気による伸び縮みが大きく一=it;!安定
竹が充分でないため、しばしば受信時に紙!、’iすす
などのトラブルを生じる。[Problems to be Solved by the Invention] However, these have little antistatic effect in low humidity applications, and also have large expansion and contraction due to humidity. Because there is not enough stable bamboo, often when receiving paper! This may cause problems such as soot.
[!!I!題を解決するための手段]
本発明者等は、かかる課題のなし目ノーザービームプリ
ンター記録材料について検討した結果、本発明に到達し
た。[! ! I! Means for Solving the Problem] The inventors of the present invention have studied recording materials for continuous norther beam printers that solve the above problem, and as a result, they have arrived at the present invention.
即ち本発明は、スルホン酸(塩)基含有重合体で被覆さ
れた紙からなるレーザービームプリンター記録材料であ
る。 以下スルボン酸(壌)it含n重合体は、スル
ホン酸基6有重合体と略す。That is, the present invention is a laser beam printer recording material comprising paper coated with a polymer containing sulfonic acid (salt) groups. Hereinafter, the sulfonic acid it-containing polymer will be abbreviated as a sulfonic acid group-containing polymer.
本発明において、スルホン酸基含有重合体としては、水
分散性または水溶性の重合体で、ポリスチレン類のスル
ホン化物および/またはその塩、並びに芳香族炭化水素
ビニルスルホン酸、スルホン酸基含有(メタ)アクリル
アミド、スルホン酸基含有(メタ)アクリレート、脂肪
族炭化水素ビニルスルポン酸およびこれらの塩からなる
群より選ばれる単量体を必須構成41位とする重合体ま
たは共重合体が挙げられる。好ましくは、ポリスチレン
類のスルホン化物の塩である。In the present invention, the sulfonic acid group-containing polymer is a water-dispersible or water-soluble polymer, including sulfonated polystyrenes and/or salts thereof, aromatic hydrocarbon vinyl sulfonic acid, sulfonic acid group-containing (meth) ) Acrylamide, sulfonic acid group-containing (meth)acrylate, aliphatic hydrocarbon vinyl sulfonic acid, and salts thereof. Preferred are salts of sulfonated polystyrenes.
具体的には、下記のスルホン酸基含有重合体が挙げられ
る。Specifically, the following sulfonic acid group-containing polymers may be mentioned.
(A)ポリスチレン類のスルホン化物
ポリスチレン類は、スチレン、α−メチルスチレン、α
−エチルスチレンなどのスチレン類の単独重合体および
スチレン類とこれと共重合するw量体との共重合体を包
含する。(A) Sulfonated polystyrenes Polystyrenes include styrene, α-methylstyrene, α
- Includes homopolymers of styrenes such as ethylstyrene and copolymers of styrenes and w-mers copolymerized therewith.
スチレン類と共重合するfil舟体としては、 (メタ
)アクリル酸アルキルエステル[(メタ)アクリル酸メ
チル、 (メタ)アクリル酸エチル、 (メタ)アクリ
ル酸ブチル、 (メタ)アクリル酸−2−Jプ・ルヘキ
シル、 (メタ)アクリル酸ステアリルなど]、脂肪酸
ビニル[醋酸ビニルなど]、芳香族炭化水禦ビニル単量
体[ビニルナフタレン、ビニルトルエン、p−メチルス
チレンなど]、下節fllカルボン酸もしくはその無水
物[(メタ)アクリル酸、無水マレイン酸、無水イタコ
ン酸なとコ、オレフィン類[α・オレフィン、イソプレ
ン、イソブチレン、ジイソブチレン、ブタジェン、クロ
ロブレンなど]、ニトリル基含有ビニル単量体[(メタ
)アクリロニトリルなど]が挙げられる。The fil vessels copolymerized with styrenes include (meth)acrylic acid alkyl esters [methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, (meth)acrylic acid-2-J (prohexyl, stearyl (meth)acrylate, etc.), fatty acid vinyl [vinyl acetate, etc.], aromatic hydrocarbon vinyl monomers [vinylnaphthalene, vinyltoluene, p-methylstyrene, etc.], full carboxylic acid or Its anhydrides [(meth)acrylic acid, maleic anhydride, itaconic anhydride, etc.], olefins [α-olefin, isoprene, isobutylene, diisobutylene, butadiene, chlorobrene, etc.], nitrile group-containing vinyl monomers [( (meth)acrylonitrile, etc.].
スチレン類共重合体のスチレン類の含量は、30千ル%
以上、好ましくは、50モル%以上である。The styrene content of the styrene copolymer is 30,000%
The above amount is preferably 50 mol% or more.
ポリスチレン類の分子mは、通常500〜i、ooo、
。The molecule m of polystyrenes is usually 500 to i, ooo,
.
OO1好ましくは2.000〜500,000、更に好
ましくは、3.000〜ioo、oooである。OO1 is preferably 2.000 to 500,000, more preferably 3.000 to ioo, ooo.
スルホン化物は、通常のスルホン化剤を使用1j、溶媒
中において公知の方法で製造することができる。The sulfonated product can be produced by a known method using a conventional sulfonating agent in a solvent.
溶媒としでは、通常炭素数藍〜2の脂肪族ハロゲン化炭
化水素、炭素数1−3のニトロ化脂肪族炭化水素等のス
ルホン化剤に不活性なものを使用する。As the solvent, those inert to the sulfonating agent are usually used, such as aliphatic halogenated hydrocarbons having 1 to 2 carbon atoms and nitrated aliphatic hydrocarbons having 1 to 3 carbon atoms.
脂肪族ハロゲン化炭化水素の具体例としては、1.2−
ジクロロエタン、メチレンジクロリド、塩化エチル、四
塩化炭素、1.I−ジクロルエタン、1.I、2I2−
テトラクロルエタン、クロロホ月ツム、Jチレンジブロ
ミド等が挙げられる。二I・1化脂肪族炭化水素として
は、ニトロメタン、ニトロエタン、l−ニトロプロパン
、2.−二トロプロパンナトカ小げられる。好ましくは
、脂肪族ハロゲン化炭化水累である。Specific examples of aliphatic halogenated hydrocarbons include 1.2-
Dichloroethane, methylene dichloride, ethyl chloride, carbon tetrachloride, 1. I-dichloroethane, 1. I, 2I2-
Examples include tetrachloroethane, chloromethane, and J ethylene dibromide. Examples of diI-1 aliphatic hydrocarbons include nitromethane, nitroethane, l-nitropropane, 2. - Nitropropane is reduced. Preferred are aliphatic halogenated hydrocarbons.
ポリスチレン類の溶解は、ポリマーの分子量にもよるが
、溶Bioo重量部当り、ポリスチレン類を通常、1〜
100mmff1、好マシくハ、5〜50In m K
溶解させる。The dissolution of polystyrenes depends on the molecular weight of the polymer, but the amount of polystyrenes is usually 1 to 1% per part by weight of dissolved Bio.
100mmff1, better, 5-50In m K
Dissolve.
スルホン化剤としては、無水硫酸、クロル硫酸などが用
いられる。好ましくは無水硫酸である。As the sulfonating agent, sulfuric anhydride, chlorosulfuric acid, etc. are used. Preferred is sulfuric anhydride.
液状無水硫酸、液状無水硫酸を窒素φ乾燥空気等の不活
性ガスおよび1.2−ジクロロエタン、塩化エチルなど
の炭素数1〜2の脂肪族ハロゲン化炭化水素等のスルホ
ン化剤に不活性な溶媒で希釈した無水硫酸も使用できる
。 不活性ガスで希釈した無水硫酸濃度は、通常1〜
15容n%、好ましくは3〜5容量%である。不活性な
溶媒で希釈した無水硫酸濃度ハ、通常1〜50重n%、
好t I、 < LL 5” 20:)If Ja%で
ある。Liquid sulfuric anhydride, liquid sulfuric anhydride mixed with an inert gas such as nitrogen φ dry air, and a solvent inert to the sulfonating agent such as an aliphatic halogenated hydrocarbon having 1 to 2 carbon atoms such as 1,2-dichloroethane or ethyl chloride. Anhydrous sulfuric acid diluted with The concentration of sulfuric anhydride diluted with inert gas is usually 1 to 1.
15% by volume, preferably 3-5% by volume. Concentration of anhydrous sulfuric acid diluted with an inert solvent, usually 1 to 50% by weight,
Preferably t I, < LL 5” 20:) If Ja%.
また無水硫酸とルイス塩基の錯体を用いることもできる
。ルイス塩基としては、 トリエチルホスフェート、ト
リメチルホスフェートなどのトリアルキルホスフェート
、酢酸エチル、バルミチン酸エチルなどの脂肪酸アルキ
ルエステル、ジオキサン、チオキサン、ジエチルエーテ
ルなどのエーテルもしくはチオエーテルなどが挙げられ
る。好ましいルイス塩基は、トリアルキルホスフェート
、および脂肪酸アルキルエステルである。Moreover, a complex of sulfuric anhydride and Lewis base can also be used. Examples of Lewis bases include trialkyl phosphates such as triethyl phosphate and trimethyl phosphate, fatty acid alkyl esters such as ethyl acetate and ethyl valmitate, and ethers or thioethers such as dioxane, thioxane and diethyl ether. Preferred Lewis bases are trialkyl phosphates and fatty acid alkyl esters.
スルホン化剤の使用量は、ポリスチレン類中のスチレン
類単位1モルに対し、通常0.4〜2モル量である。The amount of the sulfonating agent used is usually 0.4 to 2 moles per mole of styrene units in the polystyrene.
スルホン化の反応は通常、0〜80℃、好ましくは、I
O〜50゛Cで行なわれ、無水条件で行う。The sulfonation reaction is usually carried out at 0 to 80°C, preferably at I
It is carried out at 0 to 50°C and under anhydrous conditions.
スルホン化物は、通常、ナトリウム、カリウムなどのア
ルカリ金属、カルシウム、マグネシウムなどのアルカリ
土類金属などの水酸化物、炭酸塩、またはアンモニア、
アミン類例えばトリエチルアミン、ジメチルアミン、ラ
ウリルアミン、ステアリルアミンなどのアルキルアミン
、モノエタノールアミン、ジェタノールアミンなどのア
ルカノールアミンなどの中和剤で中和され塩にされる。Sulfonates are typically hydroxides, carbonates, or ammonia, such as alkali metals such as sodium and potassium, alkaline earth metals such as calcium and magnesium,
It is neutralized with a neutralizing agent such as amines, such as alkylamines such as triethylamine, dimethylamine, laurylamine, and stearylamine, and alkanolamines such as monoethanolamine and jetanolamine.
好ましくは、ナトリウム塩、カリウム塩、およびアンモ
ニウム塩である。Preferred are sodium salts, potassium salts, and ammonium salts.
溶剤は、分岐、ろ過、蒸留などの通常の方法で除去され
、水分散性若しくは水溶性の水性液杖または粉末状のス
ルホン酸(塩)基含有重合体を得る。The solvent is removed by conventional methods such as branching, filtration, and distillation to obtain a water-dispersible or water-soluble aqueous liquid or powdered sulfonic acid (salt) group-containing polymer.
上記方法以外に本出願人が特許出願している特願平1−
8111i9号明細(Yの方法、平成元年5月8日付け
、発明の名称「芳8族ポリマーのスルホン化方法」およ
び平成元年5月8日付け、発明の名称「スルホン化ポリ
マー水性岐の製造法」によってもスルポン化を行なうこ
とができる。Patent application No. 1-1 for which the present applicant has applied for a patent for a method other than the above-mentioned method.
Specification No. 8111i9 (Method of Y, dated May 8, 1989, title of the invention ``Method for sulfonating octaroaromatic polymers'' and dated May 8, 1989, title of the invention ``Method of sulfonated polymer aqueous polymers'') Sulponization can also be carried out by the "Production method".
(B)スルホン酸基含有単量体の重台体スルホン酸基含
有単量体の重合体としては、芳省核炭化水紫ビニルスル
ボン酸、スルホン酸基含有(メタ)アクリルアミド、ス
ルホン酸基含有(メタ)アクリレート、脂肪族炭化水素
ビニルスルホン酸、およびこれらの塩からなる群より選
ばれた単量体を必須構成単位とする重合体または共重合
体があげられる。 好ましくは、スルホン酸塩基含有
単量体を、必須構成単位とする重合体または共重合体で
ある。スルホン酸(塩)基含有単m体としては、下記単
m体があげられる。(B) Heavy polymers of sulfonic acid group-containing monomers Examples of polymers of sulfonic acid group-containing monomers include aromatic nuclear hydrocarbon purple vinyl sulfonic acid, sulfonic acid group-containing (meth)acrylamide, and sulfonic acid group-containing (meth)acrylamide; Examples include polymers or copolymers whose essential constituent units are monomers selected from the group consisting of meth)acrylates, aliphatic hydrocarbon vinyl sulfonic acids, and salts thereof. Preferably, it is a polymer or copolymer containing a sulfonic acid group-containing monomer as an essential structural unit. Examples of the sulfonic acid (salt) group-containing monomer include the following monomer.
(B−1)芳呑族炭化水素ビニルスルホン酸P−および
0−スチレンスルホン酸、スチレンジスルホン酸、α−
メチルスチレンスルホン酸、ビニルフェニルメタンスル
ホン酸などおよびこれらの塩(B−2)スルホン酸基含
有(メタ)アクリルアミド
2−(メタ)アクリルアミド−2−メチルプロパンスル
ポンM、3−(メタ)アクリルアミドプロパン−1−ス
ルホン&、2−(メタ)アクリルアミドエチル−1−ス
ルホン酸、3−(メタ)アクリルアミド−2−ヒドロキ
シプロパンスルホンM、P−(メタ)アクリルアミドメ
チルベンゼンスルホン酸などおよびこれらの塩
(B−3)スルホン酸基含有(メタ)アクリレート
3−(メタ)アクリロイロキシプロパンートスルホン酸
、4−(メタ)アクリロイロキシブタン−1−スルホン
酸、4−(メタ)アクリロイロキシブタン−2−スルホ
ンfiQ、2−(メタ)アクリロイロキシエチル−1ス
ルホン酸、3−(メタ)アクリロイロキシ−2−Lドロ
キシプロパンスルホン酸などおよびこれらの塩
(B−4)脂肪族炭化水素ビニルスルホン酸塩ビニルス
ルホン酸、(メタ)アリルスルホン酸などおよびこれら
の塩
スルポン酸基含有単量体の塩としては、ナトリウム、カ
リウム、リチウノ・などのアルカリ金属塩、カルシウム
、マグネシウムなどのアルカリ土類金属塩、アンモニウ
ム塩、エタノールアミン、ジェタノールアミン、モノメ
チルアミン、トリメチルアミン、トリエチルアミンなど
のアミン塩があげられ、好ましくは、ナトリウム塩、カ
リウム塩、およびアンモニウム塩である。(B-1) Aromatic hydrocarbon vinylsulfonic acid P- and 0-styrenesulfonic acid, styrene disulfonic acid, α-
Methylstyrenesulfonic acid, vinylphenylmethanesulfonic acid, etc. and their salts (B-2) Sulfonic acid group-containing (meth)acrylamide 2-(meth)acrylamide-2-methylpropane sulfone M, 3-(meth)acrylamide propane -1-sulfone &, 2-(meth)acrylamidoethyl-1-sulfonic acid, 3-(meth)acrylamido-2-hydroxypropanesulfone M, P-(meth)acrylamidomethylbenzenesulfonic acid, etc. and salts thereof (B -3) Sulfonic acid group-containing (meth)acrylate 3-(meth)acryloyloxypropane sulfonic acid, 4-(meth)acryloyloxybutane-1-sulfonic acid, 4-(meth)acryloyloxybutane-2 -Sulfone fiQ, 2-(meth)acryloyloxyethyl-1-sulfonic acid, 3-(meth)acryloyloxy-2-L droxypropanesulfonic acid, etc. and salts thereof (B-4) Aliphatic hydrocarbon vinyl sulfonic acid Examples of the salts of vinyl sulfonic acid, (meth)allylsulfonic acid, and monomers containing sulfonic acid groups include alkali metal salts such as sodium, potassium, and lithium salts, and alkaline earth metal salts such as calcium and magnesium. , ammonium salt, ethanolamine, jetanolamine, monomethylamine, trimethylamine, triethylamine, and the like, with sodium salt, potassium salt, and ammonium salt being preferred.
スルホン酸(塩)基含有単量体と共重合する単量体とし
ては、下記の単量体があげられる。Examples of the monomer copolymerized with the sulfonic acid (salt) group-containing monomer include the following monomers.
水溶性ビニル単量体としては、アミド基含有ビニル単量
体[(メタ)アクリルアミド、N−メチル(メタ)アク
リルアミド、N−メチロール(メタ)アクリルアミド、
N、 N、 −ジメチルアクリルアミドなどコ、ヒ
ドロキシル基含有ビニル単量体[ヒドロキシエチル(メ
タ)アクリレート、ヒドロキシプロピル(メタ)アクリ
レート、 トリエチレングリコール(メタ)アクリレー
ト(メタ)アリルアルコールなど]、不飽和(ジ)カル
ボン酸またはその酸無水物[(メタ)アクリル酸、 (
無水)マレイン酸、フマル酸、イタコン酸など]、N−
ビニルピロリドンなどがあげられる。難水溶性ビニル単
量体としては、 (メタ)アクリル酸エステル[(メタ
)アクリル酸メチル、 (メタ)アクリル酸エチル、
(メタ)アクリル酸ブチル、 (メタ)アクリル酸エチ
ルヘキンル、メタクリル酸ステアリルなど]、脂肪酸ビ
ニル[酢酸ビニルなど]、芳δ族炭化水素ビニル単量体
[スチレン、α−メヲルスチ1ノン、ビニルナフタレン
、ビニルトルエン、p−メチルステ1ノンなど]、ニト
リル含有ビニル単量体[(メタ)ア゛クリ口ニトリルな
ど]などがあげられる。好ましくは、水喧ケ1ビニル単
量体である。Examples of water-soluble vinyl monomers include amide group-containing vinyl monomers [(meth)acrylamide, N-methyl(meth)acrylamide, N-methylol(meth)acrylamide,
N, N, -Dimethylacrylamide, etc., hydroxyl group-containing vinyl monomers [hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, triethylene glycol (meth)acrylate (meth)allyl alcohol, etc.], unsaturated ( di)carboxylic acid or its acid anhydride [(meth)acrylic acid, (
anhydride) maleic acid, fumaric acid, itaconic acid, etc.], N-
Examples include vinylpyrrolidone. Examples of poorly water-soluble vinyl monomers include (meth)acrylic acid esters [methyl (meth)acrylate, ethyl (meth)acrylate,
(meth)butyl acrylate, (meth)ethylhexyl acrylate, stearyl methacrylate, etc.], fatty acid vinyl [vinyl acetate, etc.], aromatic δ hydrocarbon vinyl monomers [styrene, α-merolstinone, vinylnaphthalene, vinyl toluene, p-methylsterone, etc.], nitrile-containing vinyl monomers [(meth)acrylic nitrile, etc.]. Preferably, it is a vinyl monomer.
スルホン酸(塩)基含有JJim体の重合体の!!!造
!τついては、特に制限はないが、通常の溶液重合法に
よって製造できる。例えば、スルホン酸(塩)基含有単
量体および必要であれば他の#!量体を、水; メチ
ルアルコール、エチルアルコ・−ル、イソプロピルアル
コールなどの低級】゛ルキルアルコ・−ル; エチルセ
ロソルブ、エチルセロソルブ等のセロソルブ類等の溶媒
またはこれらの2種以上の況合溶媒中で50〜150℃
で重合する。ラジカル重合開始剤としては、過硫酸塩、
アゾビスイソブチロ−トリル、ベンゾイルパーオキサイ
i!、・ソクミルバメ4:→Jイドなどを、弔L1体に
対し0.1〜15重fjl 9”oを用いる。必要であ
れば、ラウリルメルカプタン、チオグリコール酸、メル
カプトエタノールなどの辻鎖移動剤を用いる。A JJim polymer containing sulfonic acid (salt) groups! ! ! Construction! There is no particular restriction on τ, but it can be produced by a normal solution polymerization method. For example, monomers containing sulfonic acid (salt) groups and if necessary other #! In a solvent such as water; lower methyl alcohol such as methyl alcohol, ethyl alcohol, isopropyl alcohol; cellosolves such as ethyl cellosolve, ethyl cellosolve, or a combination of two or more of these solvents. 50~150℃
Polymerizes with As a radical polymerization initiator, persulfate,
Azobisisobutyrotolyl, benzoylperoxyi! , - Socumilbame 4: → J-id, etc., is used with 0.1 to 15 heavy fjl 9"o for SomuL1 body. If necessary, a cross-chain transfer agent such as lauryl mercaptan, thioglycolic acid, or mercaptoethanol is used. use
本発明におけるスルホン鮫基含自重合体の分子量は、通
常1.000−= 2.000.000.。好ましくは
2..0110−1.000.000% 史に好t
L、 < 413,000〜201)、000′r:あ
る。分子量が、 1,0OOIIJ下であると充分な
寸ti、支’ii:性がず絆らオ′lす゛、また2 、
000.000を越えると重合体tl)水性液の粘度が
大きくなり、作業性が低十する。。The molecular weight of the sulfone shark group-containing autopolymer in the present invention is usually 1.000-=2.000.000. . Preferably 2. .. 0110-1.000.000% Good for history
L, < 413,000-201), 000'r: Yes. When the molecular weight is less than 1,000, it is sufficient that the molecular weight is less than 1,000.
If it exceeds 000.000, the viscosity of the aqueous liquid of the polymer (tl) increases, resulting in poor workability. .
30重n%水性液粘度で示・した場合、約to−ioo
、o。When expressed as a 30% by weight aqueous liquid viscosity, approximately to-ioo
,o.
0CI)Sで、好ましくは、約20−50.000e
p S ’?Fある。0CI)S, preferably about 20-50.000e
pS'? There is F.
スルホン酸基含有重合イイ・中のスル汁、ン酸基のハエ
は、塩成分を除いた重合体に対する正量%で示すと、通
常重合体中20重n%以上、好ましくは30重景%以上
である。 20重■%未滴になるとN法安定性が悪くな
る。The sulfonic acid group-containing polymer in the sulfonic acid group-containing polymer usually accounts for 20% by weight or more, preferably 30% by weight, in the polymer, expressed as a weight percent based on the polymer excluding the salt component. That's all. If 20% by weight is not added, the stability of the N method will deteriorate.
本発明の記録材料を構成する紙は、木材バルブm紐カラ
ナル紙テ、L−BKP、N−BKP、SCPなどの木材
バルブを酸性、中性またはアルカリ性条件下で抄紙した
上質紙、中質紙およびコート紙原紙があげられ、好まし
くはアルキルケテンダイマー アルケニル無水コハク酸
などで内添サイズされた中性ないしアルカリ性抄紙した
」−性紙である。これらの紙は、紙中にカオリン、タル
ク、炭酸カルシウムなどの無i墳料を、通常3=40%
、好ましくは5〜20%を含む。坪量は、通常35〜1
20g/mpである。The paper constituting the recording material of the present invention is high-quality paper or medium-quality paper made from wood valves such as M-string caranal paper, L-BKP, N-BKP, and SCP under acidic, neutral, or alkaline conditions. and coated paper base paper, preferably neutral to alkaline paper which has been internally added with alkyl ketene dimer alkenyl succinic anhydride or the like. These papers contain free materials such as kaolin, talc, and calcium carbonate, usually 3=40%.
, preferably 5 to 20%. The basis weight is usually 35-1
It is 20g/mp.
本発明におけるスルホン酸基含イJ重合体を使用するに
際しては、必要により他の配合剤とから塗布液を11整
する。上記配合剤としては、生デンプン1゛フーンスタ
ーチ、タピオカデンプンなど]、変性デンプン[酸化デ
ンプン、酵素変性デンプンなどコ、ポリビニルアルコー
ル、ポリアクリルアミド、植物ガム、合成ラテックスな
どのバインダ無機顔料[カオリン、タルク、炭酸カルシ
ウム、酸化チタン、シリカ、酸化面66、 水酸化ア
ルミごラム、硫酸バリウムなど]、有機顔ネ1[尿素−
ホルマリン樹脂、ポリスチレンなど]、a・−料、防腐
剤、消泡剤などが挙げられる。When using the sulfonic acid group-containing polymer of the present invention, the coating solution is prepared with other ingredients if necessary. The above-mentioned ingredients include raw starch (hoon starch, tapioca starch, etc.), modified starch (oxidized starch, enzyme-modified starch, etc.), binder such as polyvinyl alcohol, polyacrylamide, vegetable gum, synthetic latex, etc., inorganic pigments (kaolin, talc, etc.). , calcium carbonate, titanium oxide, silica, oxidized surface 66, aluminum hydroxide, barium sulfate, etc.], organic face 1 [urea-
Formalin resin, polystyrene, etc.], a-agents, preservatives, antifoaming agents, etc.
本発明おけるスルホン酸基含有重合体の塗布液中での泊
度は、塗布時の紙の碧油量ないし紙に要求される帯電防
止性、寸法安定性などにより決χピされるが、通常0.
05〜!O重ffi%である。紙・\の塗布量は、通常
0.05= I g / m’、好ましくi、tO,I
−0,5g/ln”である、4 塗布量が多すぎると塗
布■の割りに効果を発揮ゼず、少ないと本発明のIJ的
を構成できない。The degree of hydration of the sulfonic acid group-containing polymer in the coating solution in the present invention is determined by the amount of blue oil on the paper at the time of coating, the antistatic properties and dimensional stability required of the paper, etc. 0.
05~! It is O weight ffi%. The coating amount of paper is usually 0.05=I g/m', preferably i, tO, I
-0.5 g/ln'', 4 If the coating amount is too large, the effect will not be exhibited in spite of the coating amount, and if it is too small, the IJ objective of the present invention cannot be achieved.
本発明に係るスルホン酸λ(含有重合体は、通);λの
方法で塗布できる。すなイ)ち、塗布液を号ナイズプレ
ス、ゲート12−ル、キャレンダー エアーナイフコー
ターなどの塗布装置を用いr、紙の表面し塗布するか、
またはウコーワトバ=1の堺紙にスプレーし又乾燥する
。The sulfonic acid λ (containing polymer is normal) according to the present invention can be applied by the method of λ. In other words, apply the coating liquid to the surface of the paper using a coating device such as a No. 12 press, a gate 12-ru, or a calender air knife coater, or
Alternatively, spray on Sakai paper with Uko Watoba = 1 and dry.
スルホン酸基含有’Jfi合体゛じ被覆されL紙は、1
・−ザーじ一ムブシンターの記録材料としマ゛使用され
る。レーザービーノ、プリンター・は、光源に1ノ〜・
ザービームを使用17.た電子’Jj: ):(法によ
る記録機゛(′ある。詳L<は、セレン蒸着膜などの光
半導体からなる感光体上を、コロナ放電で帯電し、レー
ザービームで露光することによって潜像をつくる。L paper coated with sulfonic acid group-containing 'Jfi coalescence' is 1
・-Used as a recording material for laser sintering. For laser vino and printers, the light source is 1 no.
Use ther beam 17. Electron 'Jj: ): (According to the recording method), a photoreceptor made of a photosemiconductor such as a selenium-deposited film is charged with a corona discharge and exposed to a laser beam to generate a latent image. Make a statue.
潜像は、潜像の電荷が、正(負)であれば、負(正)に
帯電したトナーで現像される。そして感光体上に現像さ
れた可視像は、本発明の記録材料の表面(スルホン酸基
含有重合体を被覆していない而)に転写されて、定着さ
れる。通常、本発明の記録材料を、感光体上に重ね、本
発明の記録材料の裏面から正(負)のコロナ放電を行な
うことによって、訳の力へ転写し、ついでトナー中に含
有される結着樹脂(例えば、スチIノン重合体、スチレ
ン−メタクリル酸エステル共重合体など)を加熱溶融1
9、て、紙に融着させ可視像を安定化させる。If the charge of the latent image is positive (negative), the latent image is developed with negatively (positively) charged toner. The visible image developed on the photoreceptor is transferred to the surface of the recording material of the present invention (not coated with the sulfonic acid group-containing polymer) and fixed thereon. Usually, the recording material of the present invention is stacked on a photoreceptor, and a positive (negative) corona discharge is performed from the back side of the recording material of the present invention to transfer the particles to the surface, and then the particles contained in the toner are transferred. The adhesive resin (for example, styrene non-polymer, styrene-methacrylic acid ester copolymer, etc.) is heated and melted.
9. Fuse to paper to stabilize visible image.
1/−ザーには、通常 He −N es A r
−He −Cdレーザーなどが使用される。1/-user usually has He −N es A r
-He-Cd laser etc. are used.
露光は、通常走査露光がおこなわれ、ファクシミリの場
合には、送られてくる文字、図形、およびその他情報の
電気信号を、レーザー光まで変換して走査する。Exposure is usually performed by scanning exposure, and in the case of facsimile, electrical signals of sent characters, figures, and other information are converted to laser light and scanned.
このレーザービームプリンターは、゛ファクシミリ、オ
フィスコンビ、−ター バー、lルコンビュター ワー
ドプロセサー 漢字プリッタ−などに使用される。This laser beam printer is used for fax machines, office combinations, computers, computer systems, word processors, kanji splitters, etc.
[実施例コ
以下に実施例により本発明を更に説明するが、本発明は
これに限定されるものではない。実施例中の部及び%は
重量基準である。[Example] The present invention will be further explained below with reference to Examples, but the present invention is not limited thereto. Parts and percentages in the examples are by weight.
合成例1
スルホン化反応器として、撹拌機および温度81をとり
つifた3Lの4つ首フラスコに1,2−ジクロロエタ
ン1040 gおよびリン酸トリエチル9.1g (0
,05モル)を加えた。また予め、ポリスチレン(分子
ff120,000) 104g (スチレン中位とし
て1.0モル)を!、2−ジクロロエタン936 gに
溶解し溶液Aを得た。Synthesis Example 1 As a sulfonation reactor, 1040 g of 1,2-dichloroethane and 9.1 g of triethyl phosphate (0
, 05 mol) was added. Also, add 104 g of polystyrene (molecular ff 120,000) (1.0 mol as styrene medium) in advance! , was dissolved in 936 g of 2-dichloroethane to obtain solution A.
反応器中の温度を、20= 25℃に保ち、液状無水硫
酸4g (0,05モル)を徐々に滴下した。 次に
、溶液へ1040gおよび液状無水硫酸80g (1,
0モル)を同時に滴下した。滴下速度は、溶#i、Aが
、 416g/時間、無水硫酸が、32g/時間の割
合になるように調節した。滴下の間は、冷却して温度を
18−22℃に保った。The temperature in the reactor was maintained at 20=25° C., and 4 g (0.05 mol) of liquid sulfuric anhydride was gradually added dropwise. Next, add 1040 g to the solution and 80 g of liquid sulfuric anhydride (1,
0 mol) was added dropwise at the same time. The dropping rate was adjusted so that the rate of solution #i, A was 416 g/hour, and the rate of sulfuric anhydride was 32 g/hour. During the addition, cooling was performed to maintain the temperature at 18-22°C.
スルホン化したポリスチレンは、生成するにつれて沈澱
した。スルホン化が終了した後、スルホン化ポリスチレ
ンの分散スラリーは、水酸化ナトリウム44gを含む温
度30℃の水溶液481gに撹拌し。The sulfonated polystyrene precipitated as it formed. After the sulfonation was completed, the dispersed slurry of sulfonated polystyrene was stirred into 481 g of an aqueous solution containing 44 g of sodium hydroxide at a temperature of 30°C.
なから、徐々に加えられた。さらにスルホン化物の水性
液中の!、2−ジクロロエタンの臭気がなくなるまで、
l、2−ジクロロエタンを留出除去した。次に水酸化ナ
トリウムでPH8,0にWA整し1、水を加えて30%
濃度のスルホン化ポリスチレンのプトリウム塩を得た。It was added gradually. Furthermore, sulfonates in aqueous liquids! , until the odor of 2-dichloroethane disappears.
1,2-dichloroethane was distilled off. Next, adjust the pH to 8.0 with sodium hydroxide and add water to 30%.
A concentration of putrium salt of sulfonated polystyrene was obtained.
重合体のスルホン酸含量は、42重n%、水溶液の粘度
70cl)Sであった。The sulfonic acid content of the polymer was 42% by weight, and the viscosity of the aqueous solution was 70 cl)S.
合成例2〜4
種々のポリスチレン類を合成例1と同様な方法で反応さ
せて各種ポリスチレン類のスルホン化物のナトリウム塩
を得た。その結果を表−1に示t。Synthesis Examples 2 to 4 Various polystyrenes were reacted in the same manner as in Synthesis Example 1 to obtain sodium salts of sulfonated polystyrenes. The results are shown in Table 1.
表−1
合成例5
撹拌羽根、冷却管、滴下D −F、窒素吹き込み管およ
び温度計を付帯する1、0OOCc:Jルベンに、水t
20gおよびイソプロピルアルコール180gを仕込み
、窒素気流下に、還流温度まで昇温した。滴下ロートに
水100g、 スチレンスルホン酸ソーグ60gおよ
び°γクリル7ミド 40g)、E仕込み、別の滴下ロ
ートに過硫酸す[・リウム1gと水logを仕込、各々
を同時に約2時間を要してコルベンに篩下した。滴下後
約2時間還流温度にて熟成を行った。Table 1 Synthesis Example 5 1,0OOCc:J Reuben with stirring blade, cooling tube, dropping D-F, nitrogen blowing tube and thermometer, water t
20 g and 180 g of isopropyl alcohol were charged, and the temperature was raised to reflux temperature under a nitrogen stream. Into a dropping funnel, charge 100 g of water, 60 g of styrene sulfonic acid sorghum, and 40 g of °γcryl 7mid), E, and in another dropping funnel, charge 1 g of persulfuric acid and 1 g of water, and it takes about 2 hours to prepare each at the same time. I passed it on to Kolben. After dropping, the mixture was aged at reflux temperature for about 2 hours.
熟成後、イソプロピルアルコールを留去して、水を加え
30%澗度岐の水溶性瓜合体(粘度200cl)S)を
得た。After aging, the isopropyl alcohol was distilled off and water was added to obtain a water-soluble melon mixture (viscosity: 200 cl) with a concentration of 30%.
合成例6〜8
種々のビニル単量体を合成例5と同様な方法で重合して
各種スルホン酸基含有重合体を1!Jた。Synthesis Examples 6 to 8 Various vinyl monomers were polymerized in the same manner as in Synthesis Example 5 to obtain various sulfonic acid group-containing polymers. J.
その結果を表−2に示す。The results are shown in Table-2.
表−2 但しく )内は、 重合体中のスルホン酸基含1辻 (重量%) を示す。Table-2 However, ) is 1 sulfonic acid group in the polymer (weight%) shows.
実施例1〜8、比較例1〜2
合成例1〜8で得られたスルホン酸基含有重合体を、食
塩を含まない中性抄紙原紙に法面し、本発明の記録材料
を作成した。この記録材料についてその寸法安定化効果
および帯電防止効果を試験した。その結果を表−3に示
す。塗布しない原紙および食塩1%を含む原紙と比較し
た(比較例1゜2)。Examples 1 to 8, Comparative Examples 1 to 2 The sulfonic acid group-containing polymers obtained in Synthesis Examples 1 to 8 were applied onto neutral base paper containing no salt to prepare recording materials of the present invention. This recording material was tested for its dimensional stabilizing effect and antistatic effect. The results are shown in Table-3. A comparison was made with an uncoated base paper and a base paper containing 1% salt (Comparative Example 1°2).
表−3
記号説明 ◎優 O良
く試験条件〉
△可
X不可
■原紙
バルブ
填料
坪■
ステキス
;L−BKP 100%;重質炭酸カル
シウム(紙中20%)
;64g/m2
トサイズ度;
8秒(アルキルケテンダイマーで
内添サイズしたもの)
■塗布条件
装置 ; ラボサイズプレス
塗布ffi ; 0.3g/m2
乾燥 −回転型オートドライヤー
105℃、 60秒
■測定条件
寸法安定性試験;塗布した紙を試料片とし、恒温恒湿室
(20℃、65%)に−昼夜放置し、浸水伸度、気中神
1lji率を測定した。なお浸水伸度は、試料を20℃
の水中に10分間浸し、浸水前の状態を基準にした伸び
率を測定した。また気中伸率は、20℃、湿度33%に
おける試料片を基準とし、湿度を33%から72%まで
変化させ、更に72%にて24時間放置した後の伸び率
を測定した、縮率についても、同様に20℃、19度7
2%の時を基環とし湿度を72%から33%まで変化さ
せ、更に33%にて24時間放置した後の縮み率を測定
した。Table-3 Symbol explanation ◎Excellent O Good test conditions〉 △Good Internally added size with alkyl ketene dimer) ■Coating conditions Equipment; Lab size press coating ffi; 0.3 g/m2 Drying - Rotating auto dryer 105℃, 60 seconds ■Measurement conditions Dimensional stability test; Coated paper as sample A piece was left in a constant temperature and humidity room (20° C., 65%) day and night, and the water immersion elongation and air immersion rate were measured. The water immersion elongation is measured at 20°C.
The sample was immersed in water for 10 minutes, and the elongation rate was measured based on the state before immersion. In addition, the air elongation rate is based on a sample piece at 20°C and 33% humidity, and the elongation rate is measured after changing the humidity from 33% to 72% and leaving it at 72% for 24 hours. Similarly, 20℃, 19℃7
The humidity was changed from 72% to 33% using 2% as the base ring, and the shrinkage rate was measured after being left at 33% for 24 hours.
表面固有抵抗値; JIS−C−2122で規足され
ている装置を用い、20℃、40%RHの環境で4時間
、塗布した試料片を調湿し測定した。Surface specific resistance value: Using an apparatus specified in JIS-C-2122, the coated sample piece was conditioned and measured in an environment of 20° C. and 40% RH for 4 hours.
[発明の効果]
本発明のレーザービームプリンター記録材料は、湿気に
よる紙の伸び縮みが少なく寸法安定性に優れるもので、
従来塩化ナトリウムを内添した紙では得られなかった効
果を奏する。さらに表面固有抵抗値も小さく、帯電防止
効果も優れている。特に中性ないしアルカリ性抄紙され
た原紙に対する効果が優れている。またコピー後のカー
ルも適正でトレイ収容性も良好である。[Effects of the Invention] The laser beam printer recording material of the present invention has excellent dimensional stability with less paper expansion and contraction due to moisture.
It produces effects that could not be obtained with conventional paper that has internally added sodium chloride. Furthermore, the surface resistivity value is small and the antistatic effect is excellent. It is particularly effective on base paper made from neutral or alkaline paper. In addition, the curl after copying is appropriate and the tray storage capacity is also good.
Claims (1)
なるレーザービームプリンター記録材料。 2、スルホン酸(塩)基含有重合体が、ポリスチレン類
のスルホン化物および/またはその塩である請求項1記
載の記録材料。 3、スルホン酸(塩)基含有重合体が、芳香族炭化水素
ビニルスルホン酸、スルホン酸基含有(メタ)アクリル
アミド、スルホン酸基含有(メタ)アクリレート、脂肪
族炭化水素ビニルスルホン酸およびこれらの塩からなる
群より選ばれる単量体を必須構成単位とする重合体また
は共重合体である請求項1記載の記録材料。[Claims] 1. A laser beam printer recording material comprising paper coated with a polymer containing sulfonic acid (salt) groups. 2. The recording material according to claim 1, wherein the sulfonic acid (salt) group-containing polymer is a sulfonated polystyrene and/or a salt thereof. 3. The sulfonic acid (salt) group-containing polymer is an aromatic hydrocarbon vinyl sulfonic acid, a sulfonic acid group-containing (meth)acrylamide, a sulfonic acid group-containing (meth)acrylate, an aliphatic hydrocarbon vinyl sulfonic acid, and salts thereof. 2. The recording material according to claim 1, which is a polymer or copolymer whose essential constituent unit is a monomer selected from the group consisting of:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14334589A JPH039368A (en) | 1989-06-06 | 1989-06-06 | Recording material for laser beam printer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14334589A JPH039368A (en) | 1989-06-06 | 1989-06-06 | Recording material for laser beam printer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH039368A true JPH039368A (en) | 1991-01-17 |
Family
ID=15336629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14334589A Pending JPH039368A (en) | 1989-06-06 | 1989-06-06 | Recording material for laser beam printer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH039368A (en) |
-
1989
- 1989-06-06 JP JP14334589A patent/JPH039368A/en active Pending
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