JPH0410602Y2 - - Google Patents

Info

Publication number
JPH0410602Y2
JPH0410602Y2 JP1984084035U JP8403584U JPH0410602Y2 JP H0410602 Y2 JPH0410602 Y2 JP H0410602Y2 JP 1984084035 U JP1984084035 U JP 1984084035U JP 8403584 U JP8403584 U JP 8403584U JP H0410602 Y2 JPH0410602 Y2 JP H0410602Y2
Authority
JP
Japan
Prior art keywords
light distribution
plate
slit
shaft
slit opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1984084035U
Other languages
Japanese (ja)
Other versions
JPS61144U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8403584U priority Critical patent/JPS61144U/en
Publication of JPS61144U publication Critical patent/JPS61144U/en
Application granted granted Critical
Publication of JPH0410602Y2 publication Critical patent/JPH0410602Y2/ja
Granted legal-status Critical Current

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  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
  • Control Of Exposure In Printing And Copying (AREA)

Description

【考案の詳細な説明】 産業上の利用分野 本考案は可変倍率型複写機に関し、特に、変倍
露光装置において光路断面積内の配光割合を調整
するための構造に関する。
[Detailed Description of the Invention] Industrial Application Field The present invention relates to a variable magnification type copying machine, and more particularly to a structure for adjusting the light distribution ratio within an optical path cross-sectional area in a variable magnification exposure device.

従来技術 周知のように、スリツト露光式複写機において
は、第4図の原理図に示すように原稿台ガラスA
に臨ませた照明ランプB、複数のミラーC,D,
E、インミラーレンズF(スルーレンズであるこ
ともある)を用いて、原稿台ガラスA上の原稿G
の像を感光体Hに結像して複写機を形成する。と
ころで、このようなスリツト露光式光学装置にお
いて、複写倍率を変更する場合、例えば第2ミラ
ーDの位置を矢印α方向に移動させて全体光路長
を変えると共に、インミラーレンズFの位置を矢
印β方向に変えて焦点距離を定めればよいが、複
写倍率を変更すると、スリツト中央部と周辺部の
配光割合が倍率によつて変化する問題がある。こ
のため、従来では、例えば本出願人による特願昭
58−188747号出願で示されたような変倍露光装置
が提案されている。即ち、この変倍露光装置にお
いては、露光光学系の光路の途中に、スリツト開
口を形成するフレームを位置し、スリツト開口中
に介入できる板状遮光部材を同フレームに枢支
し、同遮光部材をレンズ取付板等の可変要素の位
置に応動させたものである。したがつて、この変
倍露光装置によると、複写倍率に応じて遮光部材
の位置が自動調整されるから、スリツト開口を通
る光量割合が複写倍率に応じて補正される。しか
しながら、このような構造によると、遮光部材の
位置はレンズ取付板等に設けられる作動部材、作
動部材に対する遮光部材の関係位置によつて一義
的に定まるので、フレーム、遮光部材、レンズ取
付板に加工誤差や組立誤差があると、所定の配光
割合が得られず、組立後に調整を行うことは、ほ
とんど不可能であつた。
Prior Art As is well known, in a slit exposure type copying machine, as shown in the principle diagram of FIG.
A lighting lamp B, multiple mirrors C, D,
E. Use an in-mirror lens F (sometimes a through lens) to scan the original G on the original platen glass A.
The image is formed on a photoreceptor H to form a copying machine. By the way, in such a slit exposure type optical device, when changing the copying magnification, for example, the position of the second mirror D is moved in the direction of arrow α to change the overall optical path length, and the position of the in-mirror lens F is moved in the direction of arrow β. The focal length can be determined by changing the direction, but if the copying magnification is changed, there is a problem that the light distribution ratio between the central part and the peripheral part of the slit changes depending on the magnification. For this reason, conventionally, for example, patent applications filed by the applicant
A variable magnification exposure apparatus as shown in the application No. 58-188747 has been proposed. That is, in this variable magnification exposure apparatus, a frame forming a slit opening is located in the middle of the optical path of the exposure optical system, and a plate-shaped light shielding member that can intervene in the slit opening is pivotally supported on the frame. is made to respond to the position of variable elements such as the lens mounting plate. Therefore, according to this variable magnification exposure apparatus, the position of the light shielding member is automatically adjusted according to the copying magnification, so that the proportion of the amount of light passing through the slit opening is corrected according to the copying magnification. However, according to such a structure, the position of the light shielding member is uniquely determined by the operating member provided on the lens mounting plate, etc., and the relative position of the light shielding member with respect to the operating member. If there are processing errors or assembly errors, a predetermined light distribution ratio cannot be obtained, and it is almost impossible to make adjustments after assembly.

考案の目的 本考案の目的は、以上に述べたような従来の変
倍露光装置の問題に鑑み、変倍露光装置の構成部
材に加工誤差や組立誤差があつても、複写倍率に
応じたスリツト開口の配光割合が得られる構造を
得るにある。
Purpose of the invention In view of the problems of conventional variable magnification exposure devices as described above, the purpose of the present invention is to create a slit according to the copying magnification even if there are processing errors or assembly errors in the components of the variable magnification exposure device. The purpose is to obtain a structure that allows the light distribution ratio of the aperture to be obtained.

考案の構成 この目的を達成するため、本考案は、スリツト
板に設けたスリツト開口を通る光路断面積内の配
光割合を、倍率に応じた可変要素の位置に応動す
る配光板により調整する、複写機の変倍露光装置
において、ブラケツトで保持され、前記スリツト
板の長手方向に沿つて設けられた軸と、前記軸上
であつて、該軸の延設方向と直角な方向に揺動す
るように設けた揺動部材と、2つの板状部材に分
割して構成され、前記スリツト開口の長手方向に
沿つて配設された配光板と、前記配光板それぞれ
の内端部側を前記揺動部材を連結する部材と、前
記配光板を相反方向に付勢するように設けたバネ
部材と、前記両配光板それぞれの外端部側に設け
た係合部と係合するように前記軸上に設けた係合
部材と、前記揺動部材を揺動させ、前記スリツト
開口に対する前記配光板の初期位置を調節するた
めの調節部材とを備えた複写機の変倍露光装置を
提案するものである。
Composition of the Invention In order to achieve this object, the present invention adjusts the light distribution ratio within the cross-sectional area of the optical path passing through the slit opening provided in the slit plate, using a light distribution plate that responds to the position of a variable element according to the magnification. In a variable magnification exposure device of a copying machine, a shaft is held by a bracket and is provided along the longitudinal direction of the slit plate, and a shaft swings on the shaft in a direction perpendicular to the extending direction of the shaft. a light distribution plate that is divided into two plate-like members and arranged along the longitudinal direction of the slit opening; a member connecting the movable members, a spring member provided to bias the light distribution plate in opposite directions, and the shaft so as to engage with an engaging portion provided on the outer end side of each of the light distribution plates. The present invention proposes a variable magnification exposure device for a copying machine, comprising an engaging member provided above and an adjusting member for swinging the swinging member and adjusting the initial position of the light distribution plate with respect to the slit opening. It is.

実施例 以下、第1図から第3図について本考案の実施
例の詳細を説明する。
Embodiments Hereinafter, details of embodiments of the present invention will be explained with reference to FIGS. 1 to 3.

第2図は本考案による変倍露光装置の全体を示
し、露光装置ボツクス1の内部左右には光軸Xと
平行な方向に延長した一対の案内ロツド2R,2
Lが架設してある。これらの案内ロツド2R,2
Lに対しては指定された複写倍率に応じた光軸方
向の位置に移動できるレンズ取付板3及び第2ミ
ラー支持部材4が騎乗され、第1ミラー5から反
射された原稿の反射光は第2ミラー支持部材4の
第2ミラー6、レンズ取付板3のインミラーレン
ズ7、露光装置ボツクス1の端部に位置する第3
ミラー8を通つて、図示を省略する感光体に入射
かつ結像される。そして、前記光軸Xに沿つたイ
ンミラーレンズ7及び第3ミラー8の中間に、第
1図及び第3図に詳細を示す配光調整装置10が
位置してあり、同配光調整装置10によつて複写
倍率に応じたスリツト開口11を通る光量が調整
される。
FIG. 2 shows the entire variable magnification exposure apparatus according to the present invention, in which a pair of guide rods 2R and 2 are provided on the left and right sides of the exposure apparatus box 1, extending in a direction parallel to the optical axis X.
L has been constructed. These guide rods 2R, 2
A lens mounting plate 3 and a second mirror support member 4, which can be moved to a position in the optical axis direction according to a designated copying magnification, are mounted on L, and the light reflected from the original from the first mirror 5 is transferred to the second mirror. The second mirror 6 of the two-mirror support member 4, the in-mirror lens 7 of the lens mounting plate 3, and the third mirror located at the end of the exposure device box 1.
The light passes through the mirror 8 and is incident on and imaged on a photoreceptor (not shown). A light distribution adjustment device 10 whose details are shown in FIGS. 1 and 3 is located between the in-mirror lens 7 and the third mirror 8 along the optical axis X. The amount of light passing through the slit opening 11 is adjusted according to the copying magnification.

第1図及び第3図に詳細を示した配光調整装置
10は、露光装置ボツクス1の底板1aに対して
別々に取付ける“L”字状のスリツト板12及び
“U”字状取付ブラケツト13を備え、スリツト
板12の上部には通過光量を制限する細長いスリ
ツト開口11を形成してある。前記取付ブラケツ
ト13の上部は左右方向に伸びた回動可能な制御
ロツド14を介して“U”字状断面の揺動部材1
5を支持し、前記スリツト板12に近接して略垂
直に折立てる揺動部材15の前壁15aに支点ピ
ン16R,16Lを介して一対の配光板17R,
17Lが取付けられる。これらの配光板17R,
17Lは、それぞれの耳17a,17aの間に掛
渡す付勢ばね18で相反方向に付勢してあるか
ら、配光板17R,17Lに何等の外力も作用し
ないとき、スリツト開口11下に退却する。ま
た、揺動部材15の底壁15bには先端を取付ブ
ラケツト13の底壁13aに当接する調整ねじ1
9がねじ込んであり、調節ねじ19を調節するこ
とにより揺動部材15を制御ロツド14を中心と
して揺動可能としてある。したがつて、調節ねじ
19の調節によりスリツト開口11に対する配光
板17R,17Lの初期的な高さを調節できる。
The light distribution adjusting device 10 whose details are shown in FIGS. 1 and 3 includes an "L"-shaped slit plate 12 and a "U"-shaped mounting bracket 13 that are separately attached to the bottom plate 1a of the exposure apparatus box 1. An elongated slit opening 11 is formed in the upper part of the slit plate 12 to limit the amount of light passing therethrough. The upper part of the mounting bracket 13 is connected to the swinging member 1 having a "U"-shaped cross section via a control rod 14 which is rotatable and extends in the left-right direction.
A pair of light distribution plates 17R, 17R are attached to the front wall 15a of the swinging member 15, which supports the slit plate 12 and is folded approximately vertically close to the slit plate 12, via fulcrum pins 16R, 16L.
17L is installed. These light distribution plates 17R,
17L is biased in opposite directions by a biasing spring 18 that is stretched between the respective ears 17a, 17a, so when no external force acts on the light distribution plates 17R, 17L, it retreats below the slit opening 11. . Further, on the bottom wall 15b of the swinging member 15, there is provided an adjustment screw 1 whose tip abuts against the bottom wall 13a of the mounting bracket 13.
9 is screwed in, and by adjusting an adjusting screw 19, the swinging member 15 can swing around the control rod 14. Therefore, by adjusting the adjusting screw 19, the initial height of the light distribution plates 17R, 17L relative to the slit opening 11 can be adjusted.

前記制御ロツド14の一端には、前述したレン
ズ取付板3の一側下部に取付ける作動部材20に
従動する従動レバー21が固定され、指定倍率に
応じたレンズ取付板3の移動に伴なつて制御ロツ
ド14を回動させるようにしてある。そして、前
記制御ロツド14の左右に固定する一対の制御レ
バー21R,21Lの先端ピン22R,22L
は、前記支点ピン16R,16Lの反対側の配光
板背面に植える従動ピン23R,23Lに係合す
ることにより、制御ロツド14の回動角を配光板
17R,17Lの傾動角に変換する。
A driven lever 21 is fixed to one end of the control rod 14 and is driven by an actuating member 20 attached to the lower portion of one side of the lens mounting plate 3 described above, and is controlled as the lens mounting plate 3 moves according to a specified magnification. The rod 14 is made to rotate. The tip pins 22R, 22L of a pair of control levers 21R, 21L are fixed to the left and right sides of the control rod 14.
converts the rotation angle of the control rod 14 into a tilting angle of the light distribution plates 17R, 17L by engaging with driven pins 23R, 23L installed on the rear surface of the light distribution plates on the opposite side of the fulcrum pins 16R, 16L.

図示実施例は、以上のような構造であるから、
構成部材に加工誤差や組立誤差があつても、配光
調整装置10を後から調整できる。即ち、露光装
置ボツクス10にスリツト板12及び取付ブラケ
ツト13を取付けた後、調整ねじ19を調整する
だけで、スリツト開口11に対する配光板17
R,17Lの初期的な高さを設定できるから、配
光板17R,17Lによつてスリツト開口11を
通る光量を、複写倍率に応じたものに自動調整で
きる。
Since the illustrated embodiment has the above structure,
Even if there are processing errors or assembly errors in the constituent members, the light distribution adjusting device 10 can be adjusted later. That is, after attaching the slit plate 12 and the mounting bracket 13 to the exposure apparatus box 10, by simply adjusting the adjustment screw 19, the light distribution plate 17 can be adjusted to the slit opening 11.
Since the initial heights of R and 17L can be set, the amount of light passing through the slit opening 11 can be automatically adjusted according to the copying magnification using the light distribution plates 17R and 17L.

なお、図示実施例においては、細長い長方形の
配光板を例示するが、配光板の形状は照明ランプ
の配光特性やレンズの周辺光量特性に応じた形状
に選定されるのは明らかである。
In the illustrated embodiment, an elongated rectangular light distribution plate is illustrated, but it is clear that the shape of the light distribution plate is selected according to the light distribution characteristics of the illumination lamp and the peripheral light amount characteristics of the lens.

考案の効果 以上の説明から明らかなように、本考案によれ
ば、組立後にスリツト開口に対する配光板の関係
位置を調整できるから、構成部材に加工誤差や組
立誤差があつても、複写倍率に応じた配光割合が
得られ、組立調整作業が容易となる。
Effects of the Device As is clear from the above explanation, according to the present invention, the relative position of the light distribution plate with respect to the slit opening can be adjusted after assembly, so even if there are processing errors or assembly errors in the component parts, it can be adjusted according to the copying magnification. It is possible to obtain a suitable light distribution ratio, which facilitates assembly and adjustment work.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の特徴を示した変倍露光装置要
部の拡大斜視図、第2図は本考案による変倍露光
装置の全体斜視図、第3図は第1図示の装置の断
面図、第4図は従来の変倍露光装置の原理説明図
である。 X……光軸、11……スリツト開口、12……
スリツト板、13……取付ブラケツト、14……
制御ロツド、15……揺動部材、17R,17L
……配光板。
Fig. 1 is an enlarged perspective view of the main parts of a variable magnification exposure device showing the features of the present invention, Fig. 2 is an overall perspective view of the variable magnification exposure device according to the present invention, and Fig. 3 is a sectional view of the device shown in Fig. 1. , FIG. 4 is a diagram illustrating the principle of a conventional variable magnification exposure apparatus. X...Optical axis, 11...Slit opening, 12...
Slit plate, 13...Mounting bracket, 14...
Control rod, 15... Swinging member, 17R, 17L
...Light distribution board.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] スリツト板に設けたスリツト開口を通る光路断
面積内の配光割合を、倍率に応じた可変要素の位
置に応動する配光板により調整する、複写機の変
倍露光装置において、ブラケツトで保持され、前
記スリツト板の長手方向に沿つて設けられた軸
と、前記軸上であつて、該軸の延設方向と直角な
方向に揺動するように設けた揺動部材と、2つの
板状部材に分割して構成され、前記スリツト開口
の長手方向に沿つて配設された配光板と、前記配
光板それぞれの内端部側を前記揺動部材と連結す
る部材と、前記配光板を相反方向に付勢するよう
に設けたバネ部材と、前記両配光板それぞれの外
端部側に設けた係合部と係合するように前記軸上
に設けた係合部材と、前記揺動部材を揺動させ、
前記スリツト開口に対する前記配光板の初期位置
を調節するための調節部材とを有することを特徴
とする複写機の変倍露光装置。
In a variable magnification exposure device of a copying machine that adjusts the light distribution ratio within the cross-sectional area of an optical path passing through a slit opening provided in a slit plate by a light distribution plate that responds to the position of a variable element according to the magnification, the exposure device is held by a bracket, a shaft provided along the longitudinal direction of the slit plate; a swinging member provided on the shaft so as to swing in a direction perpendicular to the extending direction of the shaft; and two plate-like members. A light distribution plate arranged along the longitudinal direction of the slit opening, a member connecting the inner end side of each of the light distribution plates to the swinging member, and a member that connects the light distribution plate in opposite directions. a spring member provided to bias the light distribution plate; an engagement member provided on the shaft to engage with an engagement portion provided on the outer end side of each of the light distribution plates; and the swinging member. rock it,
A variable magnification exposure device for a copying machine, comprising: an adjustment member for adjusting an initial position of the light distribution plate with respect to the slit opening.
JP8403584U 1984-06-06 1984-06-06 Copy machine variable magnification exposure device Granted JPS61144U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8403584U JPS61144U (en) 1984-06-06 1984-06-06 Copy machine variable magnification exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8403584U JPS61144U (en) 1984-06-06 1984-06-06 Copy machine variable magnification exposure device

Publications (2)

Publication Number Publication Date
JPS61144U JPS61144U (en) 1986-01-06
JPH0410602Y2 true JPH0410602Y2 (en) 1992-03-16

Family

ID=30633196

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8403584U Granted JPS61144U (en) 1984-06-06 1984-06-06 Copy machine variable magnification exposure device

Country Status (1)

Country Link
JP (1) JPS61144U (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5841497B2 (en) * 1976-05-31 1983-09-12 ミノルタ株式会社 Exposure amount adjustment device for slit exposure type copying machine
JPS58134664A (en) * 1982-02-05 1983-08-10 Ricoh Co Ltd Exposing method for photoreceptor

Also Published As

Publication number Publication date
JPS61144U (en) 1986-01-06

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