JPH04113519A - Method for initializing optical recording medium - Google Patents
Method for initializing optical recording mediumInfo
- Publication number
- JPH04113519A JPH04113519A JP23216690A JP23216690A JPH04113519A JP H04113519 A JPH04113519 A JP H04113519A JP 23216690 A JP23216690 A JP 23216690A JP 23216690 A JP23216690 A JP 23216690A JP H04113519 A JPH04113519 A JP H04113519A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- optical recording
- optical
- initialization
- laser beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Recording Or Reproduction (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は、非晶相と結晶相の間の相変化により情報を記
録、再生または消去を行なう光ディスク、光カード、光
テープなどの書換可能相変化型光記録媒体の初期化方法
に関する。[Detailed Description of the Invention] [Industrial Application Fields] The present invention is applicable to rewritable optical discs, optical cards, optical tapes, etc. that record, reproduce, or erase information through phase change between an amorphous phase and a crystalline phase. The present invention relates to a method for initializing a phase change optical recording medium.
[従来技術]
相変化を利用した書換可能な光記録媒体は、−般に非晶
質状態を記録状態とし、結晶状態を消去状態として用い
られている。光記録媒体の記録、消去および再生は、レ
ーザ光の照射により行ない、従来のビーム径が1μm程
度の小さいスポットで記録、再生を行ない、ディスクの
半径方向が1μm程度、円周方向が110l1程度の楕
円形の細長いスポットで消去を行なう2ビ一ム方式から
、ビーム径が1μm程度の小さいスポットの単一ビーム
を用い、その強度を変えることだけで記録、消去および
再生ができる1ビ一ムオーバライド方式%式%))
1ビ一ムオーバライド方式の光記録媒体としては、記録
膜の結晶化速度が速いことが必須条件であり、結晶化速
度が速い媒体としては、例えば、5b2Tea薄膜(特
開昭59−185048公報)、Ge−8b−Te系薄
膜(特開昭62−209742公報、特開昭53−22
5934公報、N、Yamada et at、Ipn
、 J、Appl、 Phys、 、 26.5upp
1. 、26−4.61−66 (1987)) 、M
−Ge−8b−Te系薄膜((MはPd、 Cu、
Ag、TI、Goなどの金属元素)(第50応用物理
学会学術講演予稿集29p−PB−37、第36応用物
理学会学術講演予稿集1p4B−9) ) 、I n−
8e系薄膜(T、 N15hida el a、l、
Jpn、 J、 Appl、 Phys、 、 26S
upp1. 、5upp1. 、26−4.67−70
(1987))、In−8bTe系薄膜(Y、 Ma
eda ef al、 J、 Appl、Phys、
64.1715 (1988) )などが提案されてい
る。[Prior Art] A rewritable optical recording medium using phase change is generally used in an amorphous state as a recording state and in a crystalline state as an erasing state. Recording, erasing, and reproducing on optical recording media are performed by irradiating laser light, and recording and reproducing are performed using a small spot with a conventional beam diameter of about 1 μm. From the 2-beam method that performs erasing using an elongated elliptical spot, to the 1-beam override method, which uses a single beam with a small beam diameter of about 1 μm and can record, erase, and playback simply by changing its intensity. For an optical recording medium using the 1-beam override method, it is essential that the recording film has a fast crystallization speed. Ge-8b-Te based thin film (JP-A-62-209742, JP-A-53-22)
5934 Publication, N. Yamada et at, Ipn.
, J. Appl, Phys., 26.5upp.
1. , 26-4.61-66 (1987)), M
-Ge-8b-Te based thin film ((M is Pd, Cu,
Metal elements such as Ag, TI, Go) (50th Japan Society of Applied Physics Academic Conference Proceedings 29p-PB-37, 36th Japan Society of Applied Physics Academic Conference Proceedings 1p4B-9) ), I n-
8e series thin film (T, N15hida el a, l,
Jpn, J., Appl, Phys., 26S.
upp1. , 5upp1. , 26-4.67-70
(1987)), In-8bTe thin film (Y, Ma
eda ef al, J, Appl, Phys.
64.1715 (1988)) have been proposed.
これらの記録膜は、蒸着やスパッタリングなどの真空成
膜法により形成されており、一般に非晶質状態で形成さ
れる。そのため光記録媒体として使用する場合、記録に
先立って一度記録領域全体の記録層を結晶状態にする、
いわゆる初期化処理を行う必要がある。These recording films are formed by vacuum film forming methods such as vapor deposition and sputtering, and are generally formed in an amorphous state. Therefore, when used as an optical recording medium, the recording layer in the entire recording area must be brought into a crystalline state before recording.
It is necessary to perform so-called initialization processing.
従来、光記録媒体を初期化する方法としては、特開昭6
0−10631公報に示されるような大パワーで連続発
光させたアルゴンレーザ光を幅広く光記録媒体に照射し
、記録部全面を短時間かつ反射率が均一になるように初
期化する方法や特開昭63−31046公報に示される
ような大きなスポット径のレーザ光を回折格子を用いて
形成した干渉光や、特開昭63−31[1471公報に
示されるような大きなスポット径のレーザ光をビームス
プリッタを用いて2分した後重ね合わせて形成した干渉
光を明部と暗部が光記録媒体の半径方向に並ぶように照
射して光記録媒体の熱歪みを軽減させ、さらに保護層の
マイクロクラックの発生を防止するように初期化する方
法が知られている。Conventionally, as a method for initializing an optical recording medium, Japanese Patent Laid-Open No. 6
0-10631, a method of irradiating a wide range of optical recording media with argon laser light continuously emitted with high power to initialize the entire surface of the recording area in a short period of time so that the reflectance is uniform, and JP-A No. 0-10631 Interference light formed by using a diffraction grating to form a laser beam with a large spot diameter as shown in Publication No. 63-31046, or a laser beam with a large spot diameter as shown in Japanese Patent Application Laid-Open No. 63-31 [1471] The interference light is split into two parts using a splitter and then overlapped to form interference light, which is then irradiated so that the bright and dark parts are aligned in the radial direction of the optical recording medium to reduce thermal distortion of the optical recording medium and further reduce micro-cracks in the protective layer. There is a known method of initializing to prevent this from occurring.
[発明が解決しようとする課題]
しかしながら上記従来の方法では、レーザビームプロフ
ィルを積極的に制御していない限り、光強度分布は中心
部が最大パワーとなるガウス分布となり、初期化部の反
射レベルにおいても同様な分布を生じる。したがって、
光記録媒体全面を均一に初期化するには光記録媒体の相
対的移動方向に垂直な方向つまり半径方向の送りピッチ
を初期化幅よりかなり小さくしなければ反射レベルにむ
らを生じ、記録、消去特性が安定して得られないばかり
かパワーを大きくした場合、中心部が熱により膜破壊さ
れ易い。また、反射レベルを均一にするように送りピッ
チを設定した場合、光記録媒体を初期化する処理時間が
長くなり生産性に問題がある。[Problems to be Solved by the Invention] However, in the conventional method described above, unless the laser beam profile is actively controlled, the light intensity distribution becomes a Gaussian distribution with the maximum power at the center, and the reflection level at the initialization part A similar distribution occurs in . therefore,
In order to uniformly initialize the entire surface of an optical recording medium, the feed pitch in the direction perpendicular to the direction of relative movement of the optical recording medium, that is, in the radial direction, must be much smaller than the initialization width, otherwise the reflection level will become uneven, and recording and erasing will occur. Not only cannot stable characteristics be obtained, but when the power is increased, the film tends to be destroyed by heat in the center. Further, if the feed pitch is set so as to make the reflection level uniform, the processing time for initializing the optical recording medium becomes long, which poses a problem in productivity.
これを解決する手段としては、特開昭60−10631
公報に示されるようなレーザ光を円柱レンズにより対物
レンズの開口径より大きい発散光にし、平行光によりフ
ォーカスサーボをかけて光記録媒体の半径方向の光強度
分布をほぼ均一にする方法が知られていた。しかし、こ
の方法では最大パワーが低下するため、初期化の処理時
間を上げるためには、初期化する時の光記録媒体の移動
線速度を遅くしたりパワーを上げなければならないため
必ずしも単純に生産性が向上するとは言い難い。さらに
、レーザビームスポットをかなり大きいし、より大きな
初期化幅を得ようとすると、光強度密度が同じでも中心
部が周辺部に比べ熱が貯まり易く、温度分布が均一でな
いため反射レベルにむらを生じたり、中心部が熱歪みを
受は易くなり、光記録媒体の特に保護層にマイクロクラ
ックか発生したり、耐湿熱性や記録、消去の繰り返し特
性が劣化したり、寿命が低下するという問題かある。As a means to solve this problem, Japanese Patent Application Laid-Open No. 60-10631
There is a known method, as shown in the publication, in which a cylindrical lens is used to make a laser beam a diverging beam larger than the aperture diameter of an objective lens, and a focus servo is applied to the parallel beam to make the light intensity distribution in the radial direction of the optical recording medium almost uniform. was. However, with this method, the maximum power decreases, so in order to increase the initialization processing time, it is necessary to slow down the linear velocity of movement of the optical recording medium during initialization or increase the power. It's hard to say that it improves sex. Furthermore, the laser beam spot is quite large, and if you try to obtain a larger initialization width, even if the light intensity density is the same, heat will accumulate more easily in the center than in the periphery, and the temperature distribution will be uneven, resulting in uneven reflection levels. The problem is that the central part becomes more susceptible to thermal distortion, microcracks occur especially in the protective layer of the optical recording medium, the moisture and heat resistance and repeatability of recording and erasing deteriorate, and the service life decreases. be.
この問題の解決手段としては、特開昭63−31046
公報に示されるような大きなスポット径のレーザ光を回
折格子を用いて形成した干渉光や、特開昭63−310
471公報に示されるような大きなスポット径のレーザ
光をビームスプリッタを用いて2分した後重ね合わせて
形成した干渉光を明部と暗部が光記録媒体の半径方向に
並ぶように光記録媒体に照射し、光が照射されていない
部分で光が照射されている部分の歪みを緩和させて熱歪
み軽減させる方法が提案されているが、この方法だと光
学系が非常に複雑になるという欠点があった。As a solution to this problem, Japanese Patent Application Laid-Open No. 63-31046
Interference light formed by using a diffraction grating to form a laser beam with a large spot diameter as shown in the publication, and Japanese Patent Application Laid-Open No. 63-310
A laser beam with a large spot diameter as shown in Publication No. 471 is divided into two parts using a beam splitter, and then the interference light formed by superimposing the light is applied to an optical recording medium so that the bright and dark areas are aligned in the radial direction of the optical recording medium. A method has been proposed in which the thermal distortion is reduced by irradiating the object and relaxing the distortion in the irradiated area with the unirradiated area, but this method has the disadvantage that the optical system becomes extremely complex. was there.
本発明はかかる従来技術の諸問題に鑑み創案されたもの
で、その目的は反射レベルが均一で、膜の熱破壊および
熱歪みがなく、高速で、かつ簡素な光学系で、良好な記
録、消去特性が得られる光記録媒体を生産性良く初期化
する方法を提供することにある。The present invention has been devised in view of the problems of the prior art, and its objectives are to provide a uniform reflection level, no thermal destruction or distortion of the film, high speed, and a simple optical system to provide good recording and recording. It is an object of the present invention to provide a method for initializing an optical recording medium with high productivity that provides erasing characteristics.
[課題を解決するための手段]
かかる本発明の目的は、基板上に形成された記録層に光
を照射することによって、情報の記録、消去および再生
が可能であり、情報の記録および消去が、非晶相と結晶
相の間の相変化により行なわれる光記録媒体を初期化す
るに際して、半値全幅しかそれぞれ2μm≦L≦100
μmを有する2つのレーザ光を用い、前記光記録媒体の
相対的移動方向に垂直な方向における光軸のずらし幅M
をL/4≦M≦7L/4の範囲でずらして合成した放射
光を照射して前記光記録媒体の記録層を非晶質状態から
結晶状態に変えることを特徴とする光記録媒体の初期化
方法により達成される。[Means for Solving the Problems] An object of the present invention is to make it possible to record, erase, and reproduce information by irradiating a recording layer formed on a substrate with light; , when initializing an optical recording medium performed by a phase change between an amorphous phase and a crystalline phase, the full width at half maximum is only 2 μm≦L≦100, respectively.
A shift width M of the optical axis in a direction perpendicular to the relative movement direction of the optical recording medium using two laser beams having a diameter of μm.
An initial stage of an optical recording medium, characterized in that the recording layer of the optical recording medium is changed from an amorphous state to a crystalline state by irradiating with synchrotron radiation light synthesized by shifting L/4≦M≦7L/4. This is achieved by a method of
本発明は、2つのレーザ光を使用し特定の条件で合成し
たものであるため、最大パワーを低下させるとなく光強
度分布を変えることができ、2つのレーザ光を合成した
放射光は光強度が単一のレーザ光より大きくなり、均一
の部分が増加し、かつスポット径も大きくなるので、光
記録媒体の半径方向の送りピッチを大きく、初期化の線
速度も速くてきるので初期化の処理時間かかなり短縮で
き生産性か向上し、かつ光記録媒体全体で記録、消去特
性が良好で均一な特性が得られる。Since the present invention uses two laser beams and synthesizes them under specific conditions, it is possible to change the light intensity distribution without reducing the maximum power, and the synchrotron radiation light obtained by combining the two laser beams has a light intensity of is larger than that of a single laser beam, the uniform area increases, and the spot diameter also increases, which increases the radial feed pitch of the optical recording medium and increases the linear speed of initialization. Processing time can be considerably shortened, productivity can be improved, and good and uniform recording and erasing characteristics can be obtained over the entire optical recording medium.
本発明のレーザ光の光源としては、アルゴンレーザ、ヘ
ルウム・カドミウムレーザ、などのガスレーザおよび半
導体レーザなどが用いられるが、とりわけ、半導体レー
ザを用いることは、装置を小型化でき消費電力も小さい
ことから好ましい。As the light source of the laser beam of the present invention, gas lasers such as argon lasers, helium-cadmium lasers, semiconductor lasers, etc. are used, but in particular, the use of semiconductor lasers is preferable because the device can be made smaller and its power consumption is lower. preferable.
半導体レーザを用い本発明の方法により光記録媒体を初
期化する装置の1具体例を第1図に示し説明するが、初
期化装置は特にこれに限定されない。A specific example of an apparatus for initializing an optical recording medium by the method of the present invention using a semiconductor laser will be described with reference to FIG. 1, but the initializing apparatus is not particularly limited to this.
第1図において、1は光記録媒体である。2.5は、半
導体レーザでレーザ光3.6を発光し、コリメータレン
ズ4.7でレーザ光3.6を平行光にする。8は偏光ビ
ームスプリッタでレーザ光3.6を合成しレーザ光13
とする。9は1/2波長板で8の偏光ビームスプリッタ
で楕円のレーザビームを平行に合成する。10は、非点
隔差補正レンズで半導体レーザ2.5を合成したレーザ
光13をp−n接合面に平行方向、垂直方向で同じ位置
に焦点を結ぶように補正する。その後、レーザ光13は
、ミラー11、対物レンズ12を経て光記録媒体の記録
層に照射される。これらの光学系16は移動台15によ
り光記録媒体1の半径方向に適当な送りピッチで送られ
る。一方、光記録媒体1はモータ14により回転される
。In FIG. 1, 1 is an optical recording medium. 2.5 emits a laser beam 3.6 with a semiconductor laser, and converts the laser beam 3.6 into parallel light with a collimator lens 4.7. 8 is a polarizing beam splitter that combines laser beams 3 and 6 to form laser beam 13.
shall be. A half-wave plate 9 combines elliptical laser beams in parallel with a polarizing beam splitter 8. Reference numeral 10 indicates an astigmatism correction lens which corrects the laser beam 13 obtained by combining the semiconductor lasers 2.5 so that the laser beam 13 is focused at the same position in parallel and perpendicular directions to the pn junction surface. Thereafter, the laser beam 13 passes through the mirror 11 and the objective lens 12 and is irradiated onto the recording layer of the optical recording medium. These optical systems 16 are fed by the movable table 15 in the radial direction of the optical recording medium 1 at appropriate feeding pitches. On the other hand, the optical recording medium 1 is rotated by a motor 14.
半導体レーザ2.5の2つのレーザ光の半値全幅りは、
2μm≦L≦100μmが好ましく、より好ましくは1
0μm≦L≦70μmである。2μm未満では、初期化
の処理時間が長くなり生産性が悪くなる。100μmよ
り大きいと基板の熱変形や膜の熱歪みが生じ易くなる。The full width at half maximum of the two laser beams of the semiconductor laser 2.5 is
2 μm≦L≦100 μm, more preferably 1
0 μm≦L≦70 μm. If it is less than 2 μm, the initialization processing time will be long and productivity will be poor. If the thickness is larger than 100 μm, thermal deformation of the substrate and thermal distortion of the film are likely to occur.
半導体レーザ2.5の2つのレーザ光のスポット径は、
半値全幅りが光記録媒体の半径方向と円周方向で同じ円
形スポットであっても良く、違う楕円スポットであって
も良いが、とりわけ、レーザ光のスポット径と光強度が
同じで半値全幅りが半径方向に長い楕円スポットを用い
ることは、移動線速度を速くでき初期化の処理時間が短
く、光学系が簡素で、かつ反射レベルが容易に均一にで
きることから好ましい。The spot diameter of the two laser beams of the semiconductor laser 2.5 is
It may be a circular spot whose full width at half maximum is the same in the radial direction and the circumferential direction of the optical recording medium, or it may be a different elliptical spot, but especially when the spot diameter and light intensity of the laser beam are the same and the full width at half maximum is the same. It is preferable to use an elliptical spot that is long in the radial direction because the moving linear velocity can be increased, the initialization processing time is short, the optical system is simple, and the reflection level can be easily made uniform.
本願発明においては、上述のごとき特定の半値全幅を有
する2つのレーザ光を光記録媒体の相対的移動方向に垂
直な方向における光軸のずらし幅MをL/4≦M≦7L
/4の範囲でずらして合成することが重要である。In the present invention, the shift width M of the optical axis of two laser beams having a specific full width at half maximum as described above in the direction perpendicular to the relative movement direction of the optical recording medium is L/4≦M≦7L.
It is important to synthesize with a shift within a range of /4.
光軸のずらし幅Mμmは、L/4μm〜7L/4μmで
あることが必要であり、より好ましくは3L/4μm〜
3L/2μmである。L / 4 μm未満しでは、光
強度がガウス分布とほとんどかわらず均一の部分も狭い
ので、本発明の効果がほとんど得られない。7L/4μ
mより大きいと光強度が中心部でかなり低下し反射レベ
ルのむらを生じ易い。The optical axis shift width Mμm needs to be from L/4μm to 7L/4μm, more preferably from 3L/4μm to
It is 3L/2μm. If it is less than L/4 μm, the light intensity is hardly different from a Gaussian distribution and the uniform area is narrow, so that the effect of the present invention is hardly obtained. 7L/4μ
If it is larger than m, the light intensity will drop considerably at the center, which tends to cause unevenness in the reflection level.
2つのレーザ光の光軸をずらす方法としては、例えば半
導体レーザ2.5を光強度分布で最大パワーとなる軸の
光軸をずらすように偏光ビームスプリッタ8に対して平
行に移動させ配置する方法や半導体レーザ5の偏光ビー
ムスプリッタ8への入射角を変える方法や半導体レーザ
2.5の光軸を合せたあと8の偏光ビームスプリッタを
回転させる方法等があげられるが、勿論これらの方法に
限定されない。またこれらの方法は単独で使用しても良
いが、これらの方法を適宜併用することもできる。A method for shifting the optical axes of the two laser beams is, for example, a method of moving and arranging the semiconductor laser 2.5 parallel to the polarizing beam splitter 8 so as to shift the optical axis of the axis that has the maximum power in the light intensity distribution. , a method of changing the incident angle of the semiconductor laser 5 to the polarizing beam splitter 8, and a method of rotating the polarizing beam splitter 8 after aligning the optical axes of the semiconductor laser 2.5, but of course, the method is limited to these methods. Not done. Further, these methods may be used alone, but they can also be used in combination as appropriate.
光記録媒体の回転は自由に設定できるが、レーザ光の照
射時間をディスクの全初期化部分で一定にするため移動
線速度を一定する方が好ましい。Although the rotation of the optical recording medium can be set freely, it is preferable to keep the moving linear velocity constant in order to keep the laser beam irradiation time constant over the entire initialized portion of the disk.
線速度が遅い場合には、ディスク記録部全面の初期化に
時間がかなり要し、場合によっては熱により膜破壊が生
じる恐れがあり、線速度が速い場合には光記録媒体の面
振れが大きくなることから、線速度としては、2m/S
〜40m/sの範囲が好ましい。If the linear velocity is slow, it will take a considerable amount of time to initialize the entire surface of the disk recording area, and in some cases, the film may be destroyed due to heat, while if the linear velocity is high, the surface runout of the optical recording medium will be large. Therefore, the linear velocity is 2m/S
A range of ~40 m/s is preferred.
光記録媒体の構成としては、特に限定されないが、例え
ば第2図に示すようなディスク基板17上に誘電体層1
8a1記録層19、誘電体層18bをこの順に設け、さ
らに誘電体層18b上に反射冷却層20および5μm〜
40μmの厚さの紫外線硬化樹脂層などの樹脂保護層2
1をこの順て設けた積層構造が、本発明の初期化方法を
適用することにより、より好ましい効果が期待できるの
で望ましい。また、保護層21の上に接着剤層を設は他
の基板と張合わせたものでもかまわない。Although the structure of the optical recording medium is not particularly limited, for example, a dielectric layer 1 is formed on a disk substrate 17 as shown in FIG.
8a1 recording layer 19 and dielectric layer 18b are provided in this order, and a reflective cooling layer 20 and a layer of 5 μm to 5 μm are further provided on the dielectric layer 18b.
Resin protective layer 2 such as an ultraviolet curable resin layer with a thickness of 40 μm
1 in this order is desirable because a more favorable effect can be expected by applying the initialization method of the present invention. Further, an adhesive layer may be provided on the protective layer 21 or may be bonded to another substrate.
ディスク基板としては、基板側から記録消去を行なう場
合にはレーザ光が透過する材料を用いることが好ましく
、例えばポリメチルメタクリレート樹脂、ポリカーボネ
ート樹脂、エポキシ樹脂、ポリオリフイン樹脂等の高分
子樹脂またはガラスが挙げられる。When recording and erasing data from the substrate side, it is preferable to use a material that allows laser light to pass through the disk substrate, such as polymer resins such as polymethyl methacrylate resin, polycarbonate resin, epoxy resin, polyolefin resin, or glass. It will be done.
誘電体層は、基板や記録層などが記録により熱によって
変形し記録消去特性が劣化することを防止する変形防止
層、記録層の耐湿熱性や耐酸化性の効果をもたせる保護
層、かつ記録層から反射層への原子拡散を防止する拡散
防止層の役割を果たす。このような誘電体層としては、
例えばZnS。The dielectric layer is a deformation prevention layer that prevents the substrate and recording layer from being deformed by heat during recording and deterioration of recording and erasing characteristics, a protective layer that provides the recording layer with moist heat resistance and oxidation resistance, and a recording layer. It plays the role of an anti-diffusion layer that prevents atoms from diffusing from the reflective layer to the reflective layer. As such a dielectric layer,
For example, ZnS.
SiO2,Ta205.ITO,ZrC,TiC。SiO2, Ta205. ITO, ZrC, TiC.
M g F 2等の無機膜やそれらの混合膜が使用でき
る。特に、ZnSとMgF2およびZnSと5i02の
混合膜は、耐湿熱性に優れており、さらに記録消去の繰
り返しによる記録層の劣化を抑制するので好ましい。Inorganic films such as M g F 2 and mixed films thereof can be used. In particular, mixed films of ZnS and MgF2 and ZnS and 5i02 are preferable because they have excellent heat and humidity resistance and further suppress deterioration of the recording layer due to repeated recording and erasing.
記録層は、結晶化速度が速いものが光記録媒体として好
ましく、例えば、Ge−8b−Te系薄膜、M−Ge−
8b−Te系薄膜(MはPd、Cu、Ag、TI、Go
などの金属元素)、In−8b−Te系薄膜など挙げら
れる。特にPd−Ge−8b−Te系薄膜が、本発明の
方法により初期化することにより結晶構造が非晶相から
結晶相へ移行する際、原子の移動が少なくてすむような
単純な面心立方構造でかつ単一相にできるため結晶化速
度が速いばかりか、記録、消去の繰り返しよっても相分
離や組成の偏析など起りにくく、さらに熱安定性が優れ
ているので好ましい。The recording layer preferably has a fast crystallization rate as an optical recording medium, such as a Ge-8b-Te thin film, M-Ge-
8b-Te-based thin film (M is Pd, Cu, Ag, TI, Go
etc.), In-8b-Te based thin films, etc. In particular, when a Pd-Ge-8b-Te system thin film is initialized by the method of the present invention and its crystal structure transitions from an amorphous phase to a crystalline phase, it is a simple face-centered cubic film that requires less movement of atoms. It is preferable because it not only has a high crystallization rate because it has a structure and can be made into a single phase, but also is less likely to cause phase separation or compositional segregation even after repeated recording and erasing, and has excellent thermal stability.
反射冷却層は、誘電体層からの熱拡散を容易にし、記録
時に溶融した記録層の冷却速度を高めることにより、非
晶質ピットの形成を容易にする。The reflective cooling layer facilitates the formation of amorphous pits by facilitating heat diffusion from the dielectric layer and increasing the cooling rate of the recording layer melted during recording.
また、誘電体層などが、熱的の変形することを防止する
効果、光学的干渉により再生信号のコントラストを改善
する効果がある。このような反射冷却層としては、レー
ザ光の波長で光反射性、吸収性を有し、かつ誘電体層よ
りも熱伝導度か高い金属または金属酸化物、金属窒化物
、金属炭化物などと金属の混合物、例えばZr、 Hf
、 Ti、 Ta、Mo、Si、AI、Auなどの金属
や、これらの合金、こららのZr酸化物、Si酸化物、
Si窒化物、AI酸化物などを混合したものが使用でき
る。特にAI、Au、Taやそれらの合金等は、膜の形
成が容易であり、材料選択により熱伝導率が広範囲に調
整可能であるため好ましい。It also has the effect of preventing thermal deformation of the dielectric layer and the like, and the effect of improving the contrast of reproduced signals through optical interference. Such a reflective cooling layer can be made of metals, metal oxides, metal nitrides, metal carbides, etc. that have optical reflectivity and absorption at the wavelength of the laser beam and have higher thermal conductivity than the dielectric layer. mixtures of, e.g. Zr, Hf
, Ti, Ta, Mo, Si, AI, Au and other metals, their alloys, these Zr oxides, Si oxides,
A mixture of Si nitride, AI oxide, etc. can be used. In particular, materials such as AI, Au, Ta, and alloys thereof are preferred because they are easy to form a film and the thermal conductivity can be adjusted over a wide range by selecting the material.
誘電体層、記録層、反射冷却層の厚さは、18aの誘電
体層が50nm〜300nmであり、18bの誘電体層
が10nm〜30nmであり、記録層が10nm〜60
nmであり、かつ反射冷却層が20nm〜1100nと
したものが記録、消去特性が良好な光記録媒体が得られ
るため好ましい。The thickness of the dielectric layer, recording layer, and reflective cooling layer is 50 nm to 300 nm for the dielectric layer 18a, 10 nm to 30 nm for the dielectric layer 18b, and 10 nm to 60 nm for the recording layer.
It is preferable that the reflective cooling layer has a thickness of 20 nm to 1100 nm because an optical recording medium with good recording and erasing characteristics can be obtained.
誘電体層、記録層、反射冷却層をディスク基板上に形成
する方法とては、公知の真空中での薄膜形成法、例えは
真空蒸着法、イオンプレーテインク法、スパッタリング
法等が挙げられる。特に組成、膜厚のコントロールが容
易であることから、スパッタリング法が好ましい。Methods for forming the dielectric layer, recording layer, and reflective cooling layer on the disk substrate include known thin film forming methods in vacuum, such as vacuum evaporation, ion plate ink, and sputtering. . In particular, the sputtering method is preferred because the composition and film thickness can be easily controlled.
[実施例コ
以下、本発明の実施例に基づいて具体的に説明するが、
本発明はこれらに限定されない。[Example] The following is a detailed explanation based on an example of the present invention.
The present invention is not limited thereto.
なお実施例中の特性は以下の方法に基づいて評価したも
のである。Note that the characteristics in the examples were evaluated based on the following method.
(1)組成
記録層、誘電体層の組成は、ICP発光分析(セイコー
電子工業■製FTS−1100型)によって各元素の含
有量を求め、組成比を算出した。(1) Composition The compositions of the recording layer and dielectric layer were determined by determining the content of each element by ICP emission spectrometry (model FTS-1100, manufactured by Seiko Electronics Co., Ltd.), and calculating the composition ratio.
(2)記録、消去特性(1ビームオーバライド特性)
初期化した光記録媒体を9m/sで回転させ、基板側か
ら周波数5.3MHz、パルス幅60nSで変調した記
録パワー1フmW、消去パワー9mWの波長780nm
の半導体レーザ光を開口数0.5の対物レンズで集光照
射しオーバライド記録を行なった。(2) Recording and erasing characteristics (1 beam override characteristics) The initialized optical recording medium was rotated at 9 m/s, and the recording power was modulated from the substrate side at a frequency of 5.3 MHz and a pulse width of 60 nS, with a recording power of 1 fmW and an erasing power of 9 mW. wavelength 780nm
Override recording was performed by condensing and irradiating semiconductor laser light using an objective lens with a numerical aperture of 0.5.
記録後、1.3mWの半導体レーザ光で記録部分を走査
し記録の再生を行なった。さらに、上記記録周波数を2
.OMHzに変更しオーバライド記録を行ない5.3M
Hzの記録信号を消去した後、先と同一の条件で再生を
行なった。記録後および消失後再生信号をそれぞれスペ
クトル・アナライザによりキャリヤレベルとノイズレベ
ルを測定シ、バンド幅30kHzの条件でキャリヤ対ノ
イズ比(C/N)にを求め、さらに5.3MHzの記録
時のキャリヤレベルと2、OMHzの記録時(5,3M
Hzの消去時)の5.3MHzのキャリヤレベルの差を
消去率とした求めた。After recording, the recorded portion was scanned with a 1.3 mW semiconductor laser beam to reproduce the recording. Furthermore, the above recording frequency is
.. Changed to OMHz and performed override recording, 5.3M
After erasing the Hz recording signal, reproduction was performed under the same conditions as before. The carrier level and noise level of the recorded and erased reproduced signals were measured using a spectrum analyzer, the carrier-to-noise ratio (C/N) was determined under the condition of a bandwidth of 30 kHz, and the carrier level during recording at 5.3 MHz was determined. Level and 2, when recording OMHz (5,3M
The difference in carrier level at 5.3 MHz (when erasing Hz) was determined as the erasure rate.
(3)初期化後の反射レベル
初期化後の反射レベルは、記録、消去特性測定に使用し
たものと同じ光学系を用いて、再生パワーを1.3mW
の時の全反射レベルをオシロスコープにて電圧を測定し
た。(3) Reflection level after initialization The reflection level after initialization was determined using the same optical system used for measuring recording and erasing characteristics, and with a playback power of 1.3 mW.
The total reflection level was measured using an oscilloscope.
(4)初期化状態 初期化状態は、顕微鏡により目視により行なつた。(4) Initialization state The initialization state was visually observed using a microscope.
実施例1
厚さl、 2mm、直径130mm、1.6μmピッ
チのスパイラルグループ付きポリカーボネート製基板を
毎分600回転回転させながら、RFマグネトロンスパ
ッタリング法により記録層、誘電体層、および反射冷却
層を形成した。Example 1 A recording layer, a dielectric layer, and a reflective cooling layer were formed by RF magnetron sputtering while rotating a polycarbonate substrate with spiral groups having a thickness of 1, 2 mm, a diameter of 130 mm, and a pitch of 1.6 μm at 600 revolutions per minute. did.
まず、7X10−5Paまで排気した後、6×10−’
Paのアルゴンガス雰囲気中で基板上にZnSと5i0
2のモル比が80 + 20の誘電体層のZnS−8i
02をスパッリング法により170nm形成し、次にT
e 、S b XT e、およびPdを水晶振動子膜
厚計でモニタしながら同時スパッタリングしてPd2
Ge18Sb30Te50の元素組成の記録層を25n
m形成した。さらに、上記の誘電体層のZnS−8i0
2スツパタリング法により20nm、その上に反射冷却
層としてA1合金を1100n形成した。最後に、A1
層上に紫外線硬化樹脂をスピンコード法により塗布し、
その後紫外線を照射して硬化させ10μmの保護層を形
成した。以上により本発明の初期化方法を施す光ディス
クを得た。First, after exhausting to 7×10-5Pa, 6×10-'
ZnS and 5i0 were deposited on the substrate in an argon gas atmosphere of Pa.
ZnS-8i in a dielectric layer with a molar ratio of 2 to 80 + 20
02 with a thickness of 170 nm by sputtering method, then T
Pd2 was sputtered simultaneously while monitoring e, S b XT e, and Pd with a crystal resonator thickness meter
A recording layer with an elemental composition of Ge18Sb30Te50 is 25n
m was formed. Furthermore, ZnS-8i0 of the above dielectric layer
A 20 nm thick layer was formed thereon by a two-strip sputtering method, and 1100 nm of A1 alloy was formed thereon as a reflective cooling layer. Finally, A1
Apply ultraviolet curable resin on the layer using spin code method,
Thereafter, it was cured by irradiation with ultraviolet rays to form a 10 μm thick protective layer. As described above, an optical disc to which the initialization method of the present invention was applied was obtained.
初期化は、第1図に示した装置で光記録媒体の半径方向
の半値全幅が22μm1円周方向が66μm、パワー密
度0.5mW/μrrfのレーザ光2.5の光軸を22
μmずらした放射光で行なった。Initialization is carried out using the apparatus shown in Fig. 1, in which the full width at half maximum in the radial direction of the optical recording medium is 22 μm, the circumferential direction is 66 μm, and the optical axis of the laser beam 2.5 with a power density of 0.5 mW/μrrf is set at 22 μm.
The experiment was performed using synchrotron radiation shifted by μm.
その結果、光ディスクの回転は、線速度2.0〜6.0
m/Sで初期化でき、光デイスク1回転で初期化した部
分の反射レベルの分布はかなり均一になり、送りピッチ
は20μm以下で光デイスク全体をむらなく均一に初期
化できた。良好な記録、消去特性が得られる条件、線速
度3.0m/s1送りピッチ16μmで全面を初期化し
た光ディスクの記録消去特性を前期評価方法により評価
した。その結果、初期化後の反射レベルは均一であり、
初回のC/Nは52.5dB、消去率 30.2dBと
良好なC/N、消去率が得られかつ、初期化の処理時間
は、3分45秒でかなり短時間でできた。As a result, the rotation of the optical disc has a linear velocity of 2.0 to 6.0
Initialization can be performed at m/S, and the distribution of reflection levels in the initialized portion after one revolution of the optical disk becomes fairly uniform, and the entire optical disk can be initialized evenly and uniformly with a feed pitch of 20 μm or less. The recording and erasing properties of an optical disc whose entire surface was initialized under conditions that provided good recording and erasing properties at a linear velocity of 3.0 m/s and a feed pitch of 16 μm were evaluated using the previous evaluation method. As a result, the reflection level after initialization is uniform,
The initial C/N was 52.5 dB and the erasure rate was 30.2 dB, which were good C/N and erasure rates, and the initialization processing time was 3 minutes and 45 seconds, which was quite short.
比較例1
光軸のすらしをなく以外は実施例1と同様に初期化した
。Comparative Example 1 Initialization was carried out in the same manner as in Example 1 except that the optical axis was not slender.
その結果、パワー密度か2倍になり光ディスクの回転は
速く線速度5,5〜10.0m/sの範囲で初期化でき
たが、光デイスク1回転で初期化した部分の反射レベル
の分布は中心部に比べ周辺部が小さく差が太きため送り
ピッチは実施例1に比べかなり小さく4μm以下にしな
いと光デイスク全体をむらなく均一に初期化できなっか
った。As a result, the power density was doubled and the rotation of the optical disk was fast and the linear velocity could be initialized in the range of 5.5 to 10.0 m/s, but the distribution of reflection levels in the part initialized with one rotation of the optical disk was Since the peripheral portion is smaller than the central portion and the difference is thicker, the feeding pitch is considerably smaller than that in Example 1, and unless it is set to 4 μm or less, the entire optical disk cannot be initialized evenly and uniformly.
線速度5.5m/s未満では記録膜が熱により破壊され
ていた。良好な記録、消去特性が得られる条件、線速度
6.5m/s、送りピッチ2μmで全面を初期化した光
ディスクの記録、消去特性を前期評価方法により評価し
た。その結果、初期化後の反射レベルは均一であり、初
回のC/Nは50.5dEi、消去率 29.6dBと
良好なC/N1消去率が得られが初期化の処理時間は、
11分35秒でかなり時間がかかった。At a linear velocity of less than 5.5 m/s, the recording film was destroyed by heat. The recording and erasing properties of an optical disc whose entire surface was initialized under conditions that provided good recording and erasing properties, such as a linear velocity of 6.5 m/s and a feed pitch of 2 μm, were evaluated using the previous evaluation method. As a result, the reflection level after initialization was uniform, and a good C/N1 cancellation rate of 50.5 dEi and 29.6 dB was obtained for the initial C/N, but the initialization processing time was
It took a long time, 11 minutes and 35 seconds.
比較例2
光軸のずらしを44μmとした以外は実施例1と同様に
初期化した。Comparative Example 2 Initialization was carried out in the same manner as in Example 1, except that the optical axis was shifted by 44 μm.
その結果、光ディスクの回転は、線速度2.0〜5.0
m/sで初期化でき実施例1とあまり変らないが、光デ
イスク1回転での初期化した部分の反射レベルの分布は
中心部が周辺部に比べ小さく差が太きため送りピッチは
実施例1に比べ小さく4μm以下にしないと光デイスク
全体をむらなく均一に初期化できなっかった。良好な記
録、消去特性が得ら・れる条件、線速度4.Om/s、
送りピッチ2μmで全面を初期化した光ディスクの記録
、消去特性を前期評価方法により評価した。As a result, the rotation of the optical disk has a linear velocity of 2.0 to 5.0
m/s, which is not much different from Example 1, but the distribution of the reflection level in the initialized part during one revolution of the optical disk is smaller in the center than in the peripheral part, and the difference is wider, so the feeding pitch is as follows. It is smaller than 1, and unless it is 4 μm or less, the entire optical disk cannot be initialized evenly and uniformly. Conditions for obtaining good recording and erasing characteristics, linear velocity 4. Om/s,
The recording and erasing characteristics of an optical disk whose entire surface was initialized with a feed pitch of 2 μm were evaluated using the previous evaluation method.
その結果、初期化後の反射レベルは均一であり、初回の
C/Nは51.0dB、消去率30.2dBと良好なC
/N、消去率が得られが初期化の処理時間は、19分5
5秒でかなり時間かかかり生産性が悪い。As a result, the reflection level after initialization is uniform, the initial C/N is 51.0 dB, and the cancellation rate is 30.2 dB, which is a good C/N.
/N, the erasure rate was obtained, but the initialization processing time was 19 minutes 5
It takes 5 seconds, but it takes a lot of time and productivity is bad.
[発明の効果コ
本発明は、上述のごとく特定の2つのレーザ光を特定の
条件で合成して使用するようにしたので、光強度分布お
よび温度分布の均一度の著しく高められた放射光を照射
して初期化を行うことができるため光記録媒体を均一に
結晶化することができる。さらに、初期化のするときの
半径方向の送りピッチを大きく、および線速度を速くで
きるので初期化の処理時間がかなり短縮でき生産性を上
げることができる。[Effects of the Invention] As described above, the present invention uses two specific laser beams combined under specific conditions, so that synchrotron radiation with significantly increased uniformity of light intensity distribution and temperature distribution can be obtained. Since initialization can be performed by irradiation, the optical recording medium can be uniformly crystallized. Furthermore, since the radial feed pitch and linear speed can be increased during initialization, initialization processing time can be considerably shortened and productivity can be increased.
第1図は本発明の初期化方法の実施に使用する装置の1
例を示す説明図、第2図は光記録媒体構成の1例を示す
説明図である。
1:光記録媒体、2,5:半導体レーザ、3.6.13
:レーザ光、
4.7:コリメータレンズ、
8:偏光ビームスプリッタ、
9 : 1/2波長板、10:非点隔差補正レンズ、1
6:光学系、17:ディスク基板、
18a、18b:誘電体層、19:記録層、20:反射
冷却層、21:樹脂保護層
第1図
第2図FIG. 1 shows one of the devices used to carry out the initialization method of the present invention.
FIG. 2 is an explanatory diagram showing an example of the structure of an optical recording medium. 1: Optical recording medium, 2, 5: Semiconductor laser, 3.6.13
: Laser light, 4.7: Collimator lens, 8: Polarizing beam splitter, 9: 1/2 wavelength plate, 10: Astigmatism correction lens, 1
6: Optical system, 17: Disk substrate, 18a, 18b: Dielectric layer, 19: Recording layer, 20: Reflective cooling layer, 21: Resin protective layer Fig. 1 Fig. 2
Claims (1)
て、情報の記録、消去および再生が可能であり、情報の
記録および消去が、非晶相と結晶相の間の相変化により
行なわれる光記録媒体を初期化するに際して、半値全幅
Lがそれぞれ2μm≦L≦100μmを有する2つのレ
ーザ光を用い、前記光記録媒体の相対的移動方向に垂直
な方向における光軸のずらし幅MをL/4≦M≦7L/
4の範囲でずらして合成した放射光を照射して前記光記
録媒体の記録層を非晶質状態から結晶状態に変えること
を特徴とする光記録媒体の初期化方法。Information can be recorded, erased, and reproduced by irradiating a recording layer formed on a substrate with light, and information is recorded and erased by a phase change between an amorphous phase and a crystalline phase. When initializing the recording medium, two laser beams each having a full width at half maximum L of 2 μm≦L≦100 μm are used, and the shift width M of the optical axis in the direction perpendicular to the relative movement direction of the optical recording medium is set as L/ 4≦M≦7L/
4. A method for initializing an optical recording medium, characterized in that the recording layer of the optical recording medium is changed from an amorphous state to a crystalline state by irradiating the synthesized synchrotron radiation light shifted within a range of 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23216690A JPH04113519A (en) | 1990-08-31 | 1990-08-31 | Method for initializing optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23216690A JPH04113519A (en) | 1990-08-31 | 1990-08-31 | Method for initializing optical recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04113519A true JPH04113519A (en) | 1992-04-15 |
Family
ID=16935030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23216690A Pending JPH04113519A (en) | 1990-08-31 | 1990-08-31 | Method for initializing optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04113519A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001033564A1 (en) * | 1999-11-04 | 2001-05-10 | Innopsys | Method and device for initialising digital optical discs |
| US6256286B1 (en) | 1997-02-21 | 2001-07-03 | Nec Corporation | Method for initiating a phase change recording medium |
| EP1014353A3 (en) * | 1998-12-24 | 2001-08-29 | Ricoh Company | Initialization of phase-change optical recording medium |
| FR2813695A1 (en) * | 2000-09-05 | 2002-03-08 | Moulage Plastique De L Ouest | METHOD AND DEVICE FOR INITIALIZING A PHASE CHANGE RECORDING MEDIUM |
-
1990
- 1990-08-31 JP JP23216690A patent/JPH04113519A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6256286B1 (en) | 1997-02-21 | 2001-07-03 | Nec Corporation | Method for initiating a phase change recording medium |
| EP1014353A3 (en) * | 1998-12-24 | 2001-08-29 | Ricoh Company | Initialization of phase-change optical recording medium |
| US6445669B1 (en) | 1998-12-24 | 2002-09-03 | Ricoh Company, Ltd. | Initialization of phase-change optical recording medium |
| USRE39901E1 (en) | 1998-12-24 | 2007-10-30 | Ricoh Company, Ltd. | Initialization of phase-change optical recording medium |
| WO2001033564A1 (en) * | 1999-11-04 | 2001-05-10 | Innopsys | Method and device for initialising digital optical discs |
| FR2813695A1 (en) * | 2000-09-05 | 2002-03-08 | Moulage Plastique De L Ouest | METHOD AND DEVICE FOR INITIALIZING A PHASE CHANGE RECORDING MEDIUM |
| WO2002021521A1 (en) * | 2000-09-05 | 2002-03-14 | Moulage Plastique De L'ouest | Method and device for initialising a phase-change recording medium |
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