JPH0412633U - - Google Patents

Info

Publication number
JPH0412633U
JPH0412633U JP1990053185U JP5318590U JPH0412633U JP H0412633 U JPH0412633 U JP H0412633U JP 1990053185 U JP1990053185 U JP 1990053185U JP 5318590 U JP5318590 U JP 5318590U JP H0412633 U JPH0412633 U JP H0412633U
Authority
JP
Japan
Prior art keywords
contact
insulating film
contact hole
contact pad
outer peripheral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1990053185U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990053185U priority Critical patent/JPH0412633U/ja
Publication of JPH0412633U publication Critical patent/JPH0412633U/ja
Pending legal-status Critical Current

Links

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案におけるコンタクト構成体の配
線部の模式的平面図、第2図は本考案におけるコ
ンタクト構成体の製造時における露光面積を示す
説明図、第3図は従来のコンタクト構成体の配線
部の模式的平面図、第4図は従来のコンタクト構
成体の不都合例を示す説明図、第5図は従来のコ
ンタクト製造体の構造時における露光面積を示す
説明図である。 1,2……上部配線層、3……コンタクトパツ
ド、4……コンタクト穴。
Fig. 1 is a schematic plan view of the wiring part of the contact structure in the present invention, Fig. 2 is an explanatory diagram showing the exposed area during manufacturing of the contact structure in the present invention, and Fig. 3 is a diagram of the conventional contact structure. FIG. 4 is a schematic plan view of a wiring section, FIG. 4 is an explanatory diagram showing an example of a disadvantage of a conventional contact structure, and FIG. 5 is an explanatory diagram showing an exposed area in the structure of a conventional contact manufacturing body. 1, 2... Upper wiring layer, 3... Contact pad, 4... Contact hole.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 下部導電層と、この上に絶縁膜を隔てて設けた
上部配線層とを前記絶縁膜に穿つたコンタクト穴
内に充填した導電材料及び該コンタクト穴の周囲
に形成したコンタクトパツドを介して接続するよ
うにしたコンタクト構成体において、前記コンタ
クトパツドの外周縁の輪郭を円形又は楕円形とし
たことを特徴とするコンタクト構成体。
A lower conductive layer and an upper wiring layer provided thereon with an insulating film interposed therebetween are connected through a conductive material filled in a contact hole formed in the insulating film and a contact pad formed around the contact hole. A contact structure as described above, wherein the outer peripheral edge of the contact pad has a circular or elliptical outline.
JP1990053185U 1990-05-21 1990-05-21 Pending JPH0412633U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990053185U JPH0412633U (en) 1990-05-21 1990-05-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990053185U JPH0412633U (en) 1990-05-21 1990-05-21

Publications (1)

Publication Number Publication Date
JPH0412633U true JPH0412633U (en) 1992-01-31

Family

ID=31574153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990053185U Pending JPH0412633U (en) 1990-05-21 1990-05-21

Country Status (1)

Country Link
JP (1) JPH0412633U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61245549A (en) * 1985-04-24 1986-10-31 Hitachi Ltd Multilayer wiring structure

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61245549A (en) * 1985-04-24 1986-10-31 Hitachi Ltd Multilayer wiring structure

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