JPH04128376A - Highly corrosion resistant metal - Google Patents
Highly corrosion resistant metalInfo
- Publication number
- JPH04128376A JPH04128376A JP25099990A JP25099990A JPH04128376A JP H04128376 A JPH04128376 A JP H04128376A JP 25099990 A JP25099990 A JP 25099990A JP 25099990 A JP25099990 A JP 25099990A JP H04128376 A JPH04128376 A JP H04128376A
- Authority
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- Japan
- Prior art keywords
- layer
- surface layer
- film
- intermediate layer
- inner layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Silicon Polymers (AREA)
- Chemical Vapour Deposition (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野〕
本発明はプラズマ重合被膜を有する高耐食性金属に関し
、詳細には上記プラズマ重合被膜が優れた密着性を発揮
する高耐食性金属に関するものである。従って本発明を
金属板に適用した場合は曲げ加工に対して優れた耐剥離
性を示すプラズマ重合被膜が得られる。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a highly corrosion resistant metal having a plasma polymerized coating, and more particularly to a highly corrosion resistant metal in which the plasma polymerized coating exhibits excellent adhesion. Therefore, when the present invention is applied to a metal plate, a plasma polymerized coating that exhibits excellent peeling resistance against bending can be obtained.
[従来の技術]
従来の有機コーティング法にはウェットプロセスとドラ
イプロセスがあり、ウェットプロセスであるデイツプ法
、ロールコート法、スプレー塗装法等は、乾燥工程を含
むため、該乾燥工程における溶媒除去に伴ない被膜にピ
ンホールが生じ易く、錆発生の原因となっている。[Conventional technology] Conventional organic coating methods include wet processes and dry processes, and wet processes such as dip methods, roll coating methods, and spray painting methods include a drying process. Pinholes are likely to form in the resulting coating, causing rust.
−1ドライプロセスであるプラズマ重合法は、比較的薄
い被膜であってもピンホールが形成されず、しかも乾燥
工程等を必要としないので、ウェットプロセスに比べて
少ない工程で済むといった利点を有している。-1 The plasma polymerization method, which is a dry process, does not form pinholes even in relatively thin films and does not require a drying process, so it has the advantage of requiring fewer steps than a wet process. ing.
上記プラズマ重合を用いて金属に耐食性を付与する技術
としては、下記■〜■の様に有機シリコーン系モノマー
やSi02を用いたもの等が知られている。Known techniques for imparting corrosion resistance to metals using the plasma polymerization described above include those using organic silicone monomers and Si02 as shown in (1) to (2) below.
■H,P、5chreiberら(Thin 5oli
d Films 72(1980)P487〜493]
は、ヘキサメチルジシロキサンのプラズマ重合膜で被覆
した鋼板であって、該膜厚が2μm以上である場合には
、4%NaC1水溶液中に28日間漫潰した後でも腐食
が観察されないことを報告している。■H, P, 5chreiber et al. (Thin 5oli
d Films 72 (1980) P487-493]
reported that when a steel plate is coated with a plasma-polymerized film of hexamethyldisiloxane and the film thickness is 2 μm or more, no corrosion is observed even after immersing it in a 4% NaCl aqueous solution for 28 days. are doing.
■に、W、Biegら[5olar Energy M
aterials 3(1980)P301〜316]
は、アルミニウム反射鏡上にメチルトリメトキシシラン
のプラズマ重合膜をコーティングしたものが6か月にわ
たる耐候性試験において優れた耐久性を示したと報告し
ている。■, W. Bieg et al. [5olar Energy M
materials 3 (1980) P301-316]
reported that an aluminum reflector coated with a plasma-polymerized film of methyltrimethoxysilane showed excellent durability in a six-month weather test.
■伊藤渉ら[プラズマ材料科学第153委員会、第5回
研究会資料(1989)P9〜18]は、プラズマCV
Dによりステンレス鋼板上にSin2膜を形成して耐食
性を付与する技術を開示している。■Wataru Ito et al. [153rd Committee on Plasma Materials Science, 5th Research Meeting Materials (1989) P9-18]
D discloses a technique for forming a Sin2 film on a stainless steel plate to impart corrosion resistance.
[発明が解決しようとする課題]
しかしながらこれらの有機シリコーン系プラズマ重合被
膜やSi02被膜を有する被覆金属板であっても、曲げ
加工を行うと、前者では金属との密着性が低いため簡単
に剥離するという問題があり、一方後者では靭性が低い
ことから被膜中にミクロクランクが発生し、耐食性が低
下するという問題を有している。[Problems to be Solved by the Invention] However, even with coated metal plates having these organic silicone-based plasma polymerized coatings or Si02 coatings, when bending is performed, the former easily peels off due to its low adhesion to the metal. On the other hand, the latter has a problem in that microcranks occur in the coating due to its low toughness, resulting in a decrease in corrosion resistance.
本発明は上記事情に着目してなされたものであって、被
膜にミクロクラックが発生せず、しかも曲げ加工に対し
てもプラズマ重合被膜が優れた密着性を示す高耐食性金
属を提供しようとするものである。The present invention has been made in view of the above circumstances, and aims to provide a highly corrosion-resistant metal in which microcracks do not occur in the coating and the plasma polymerized coating exhibits excellent adhesion even during bending. It is something.
[課題を解決するための手段]
上記目的を達成した本発明とは、プラズマ重合被膜を内
層、中間層1表面層からなる多層構造とし、該内層は赤
外分光分析においてSi−0−Siの振動に基づく11
00〜1000cl’の吸収ピークの強さに対するSi
−CH3の振動に基づく870〜750 cln−’の
吸収ピークの強さの比が0.5以下で、且つ膜厚が50
A以上5000A以下となる様に形成し、上記表面層は
酸素濃度を20原子%以下として、前記中間層を上記内
層の組成から該表面層の組成へ移る傾斜組成膜として1
00A以上15000A以下形成すると共に、上記中間
層と上記表面層の合計膜厚を500A以上5μm以下と
してなるこ゛とを要旨とするものである。[Means for Solving the Problems] The present invention, which achieves the above object, has a multilayer structure consisting of an inner layer, an intermediate layer, and a surface layer of the plasma polymerized coating, and the inner layer has a structure of Si-0-Si in infrared spectroscopy. 11 based on vibration
Si for intensity of absorption peak from 00 to 1000 cl'
- The ratio of the absorption peak intensity of 870 to 750 cln-' based on the vibration of CH3 is 0.5 or less, and the film thickness is 50
The surface layer has an oxygen concentration of 20 atomic % or less, and the intermediate layer is formed as a composition gradient film that shifts from the composition of the inner layer to the composition of the surface layer.
00A to 15000A, and the total thickness of the intermediate layer and the surface layer is 500A to 5μm.
[作用]
本発明者らは鋭意研究の結果、プラズマ重合膜を多層に
することにより、例えば板材においては曲げ加工後も膜
の密着性が良く、しかも耐食性も曲げ加工をしない時と
同等の性能を示すプラズマ重合膜被覆金属を開発した。[Function] As a result of extensive research, the present inventors have found that by forming a multilayer plasma polymerized film, for example, on plate materials, the adhesion of the film is good even after bending, and the corrosion resistance is equivalent to that without bending. We have developed a plasma-polymerized film-coated metal that exhibits the following properties.
即ち内層を特定構成とすることにより金属との密着性を
良好にし、且つ仮に該内層にミクロクランクが生じても
割れが表層部まで伝播しない様な表面層を設けることに
より高耐食性を発揮させる様にしたものである。In other words, the inner layer has a specific structure to improve its adhesion to metal, and even if a microcrank occurs in the inner layer, a surface layer that prevents cracks from propagating to the surface layer ensures high corrosion resistance. This is what I did.
本発明に係る各条件の限定理由は以下の通りである。The reasons for limiting each condition according to the present invention are as follows.
内層の赤外分光分析において、Si−0−Siの振動に
よる1100〜1000cm−の吸収ピークとS 1−
CH,(D振動による870〜75゜cl’の吸収ピー
クとの強さの比を0.5以下と規定したのは、0.5を
超えると内層側が相対的に炭素成分が多くなり有機化合
物としての特性が強まって金属基材との密着性が低下す
るからである。In the infrared spectroscopic analysis of the inner layer, an absorption peak of 1100 to 1000 cm due to the vibration of Si-0-Si and an absorption peak of S1-
The reason why the intensity ratio with the absorption peak of 870 to 75° cl' due to D vibration was specified to be 0.5 or less is because if it exceeds 0.5, the inner layer side will have a relatively large amount of carbon components and organic compounds This is because the adhesiveness with the metal base material decreases as the properties of the metal become stronger.
また内層における膜厚が50A未満の場合は、ピンホー
ルが多くなり、その上に中間層2表面層を重ねても良好
な密着性が得られず、一方5000Aを超えると曲げ加
工時に内層が金属より剥離し易くなる。従って内層にお
ける膜厚は50A以上5000A以下とした。In addition, if the film thickness in the inner layer is less than 50A, there will be many pinholes, and good adhesion will not be obtained even if the surface layer of the intermediate layer 2 is stacked on top of it. It becomes easier to peel off. Therefore, the film thickness of the inner layer was set to 50 A or more and 5000 A or less.
中間層を設けたのは、内層と表面層の密着性を上げるた
めであり、中間層厚さがt OOA未満だと曲げ加工時
の密着性が良くなく、テープ剥離試験を行うと内層と表
面層界面から剥離する。一方厚過ぎも効果が飽和し、成
膜に時間を要するだけなので15000Aを上限とした
。The reason why the intermediate layer was provided was to increase the adhesion between the inner layer and the surface layer.If the thickness of the intermediate layer is less than tOOA, the adhesion during bending will not be good, and when a tape peel test is performed, the inner layer and the surface layer will be separated. Peeling off from the layer interface. On the other hand, if the thickness is too thick, the effect will be saturated and it will only take time to form the film, so 15000A was set as the upper limit.
表面層の酸素濃度を20原子%以下としたのは、表面層
の靭性を高めるためであり、曲げ加工により内層にマイ
クロクランクが発生しても表面層は曲げ変形に追随して
耐食性を確保することができる。The reason why the oxygen concentration in the surface layer is set to 20 atomic percent or less is to increase the toughness of the surface layer. Even if microcranks occur in the inner layer due to bending, the surface layer follows the bending deformation and maintains corrosion resistance. be able to.
また表面層と中間層の厚さ合計を500A〜5μIとし
たのは、50o八未満の場合ピンホールが形成されて耐
食性が劣化し、一方5μmを超えて厚くしても耐食性は
それ稚内上せず、成膜に時間を要するだけであるからで
ある。Also, the reason why the total thickness of the surface layer and the intermediate layer is set to 500A to 5μI is that if it is less than 50μm, pinholes will be formed and the corrosion resistance will deteriorate, whereas if it is thicker than 5μm, the corrosion resistance will be lower than Wakkanai. First, it only takes time to form the film.
本発明に通用できる有機シリコーンモノマーは、Stと
Cを含む化合物であって通常の蒸着条件で蒸気圧を有す
るものであればよく、テトラメチルシラン、ビニルトリ
メチルシラン、ヘキサメチルジシラン、メチルトリメト
キシシラン、ビニルトリメトキシシラン、ヘキサメチル
ジシロキサン、テトラメチルジシロキサン、ヘキサメチ
ルジシラザン、ヘキサメチルシクロトリシラザン等が例
示できる。Organic silicone monomers that can be used in the present invention may be compounds containing St and C and have a vapor pressure under normal vapor deposition conditions, such as tetramethylsilane, vinyltrimethylsilane, hexamethyldisilane, methyltrimethoxysilane, etc. , vinyltrimethoxysilane, hexamethyldisiloxane, tetramethyldisiloxane, hexamethyldisilazane, hexamethylcyclotrisilazane, and the like.
尚本発明に係るプラズマ重合被膜は、便宜上内層、中間
層9表面層という表現を用いてその多層構造を説明した
が、前記の条件を満たす範囲であれば、内層及び表面層
は必ずしも均一な組成で形成されている必要はなく、本
発明の趣旨に徴して金属との接着面から最表面へ向かっ
てその組成が適宜変化しておればよい。The multilayer structure of the plasma-polymerized film according to the present invention has been explained using the expressions of an inner layer, an intermediate layer, and a surface layer for convenience. However, as long as the above conditions are satisfied, the inner layer and the surface layer do not necessarily have a uniform composition. It is not necessary that the composition be formed of a metal, and in keeping with the spirit of the present invention, the composition may change as appropriate from the adhesive surface to the metal toward the outermost surface.
[実施例]
第1図は本発明に係るプラズマ重合膜の多層構造を示す
断面説明図であり、金属基材1の上に内層2.中間層3
2表面層4を以下の様にして順次形成した。まず常法に
より脱脂された炭素鋼を金属基材1として用い、これを
プラズマ重合装置のチャンバー内に置き、アルゴンによ
りプラズマエツチング処理を行なった。上記プラズマ重
合装置としては内部平行平板電極型のものを用い、13
.56MHzの高周波電源によりプラズマを発生させた
。尚出力は100W、処理時間は10分であり、基板温
度は35℃であった。[Example] FIG. 1 is a cross-sectional explanatory diagram showing a multilayer structure of a plasma polymerized film according to the present invention, in which an inner layer 2. middle layer 3
Two surface layers 4 were sequentially formed in the following manner. First, carbon steel degreased by a conventional method was used as the metal base material 1, and this was placed in a chamber of a plasma polymerization apparatus, and plasma etching treatment was performed using argon. As the plasma polymerization apparatus, an internal parallel plate electrode type was used, and 13
.. Plasma was generated using a 56 MHz high frequency power source. Note that the output was 100 W, the processing time was 10 minutes, and the substrate temperature was 35°C.
上記プラズマエツチング処理後、ヘキサメチルジシロキ
サンと酸素をプラズマ重合装置のチャンバー内に導入し
てプラズマ重合により内層を形成した。該内層の重合条
件は出力ioow、酸素供i量100 sccm、モノ
マー流量10 sccm、チャンバー内圧力0.ITo
rr 、基板温度200℃であった。After the plasma etching process, hexamethyldisiloxane and oxygen were introduced into the chamber of a plasma polymerization apparatus to form an inner layer by plasma polymerization. The polymerization conditions for the inner layer were: output ioow, oxygen supply amount 100 sccm, monomer flow rate 10 sccm, and chamber internal pressure 0. ITo
rr, and the substrate temperature was 200°C.
上記内層について赤外分光分析した結果を第2図に示す
。Si−0−3tの吸収スペクトル(11o o 〜t
o o ocm−’)におけるピークの高さaに対す
るSi−CHsの吸収スペクトル(870〜750cl
’)におけるピークの高さbとの比(b/a”)は0.
22であった。FIG. 2 shows the results of infrared spectroscopic analysis of the inner layer. Absorption spectrum of Si-0-3t (11 o ~ t
Absorption spectrum of Si-CHs (870 to 750 cl
The ratio (b/a'') to the peak height b in ') is 0.
It was 22.
引き続き酸素流量を徐々に減少させて中間層を形成し、
最終的に酸素流量を0にして表面層を形成した。この様
にして得た積層コーテイング膜の内層、中間層及び表面
層の厚さを第1表に示す。Continue to gradually reduce the oxygen flow rate to form an intermediate layer.
Finally, the oxygen flow rate was set to 0 to form a surface layer. Table 1 shows the thicknesses of the inner layer, intermediate layer, and surface layer of the laminated coating film thus obtained.
上記積層コーテイング膜が形成された炭素鋼について耐
食性評価試験、重合膜密着性評価試験を行った。耐食性
評価試験は、エリクセン試験機で6mm押し出した後、
3wt%NaC1水溶液に浸し、赤錆発生までの時間を
測定することによって行なった。また密着性評価試験は
重合膜をカッターナイフで1 mmX 1 mmのゴバ
ン目状にけがぎ、エリクセン試験機で6mm押し出した
後、テープを付着して剥離し、テープ剥離後の膜残存率
で膜密着性を評価した。結果は第1表に併記する。A corrosion resistance evaluation test and a polymer film adhesion evaluation test were conducted on the carbon steel on which the laminated coating film was formed. In the corrosion resistance evaluation test, after extruding 6 mm with an Erichsen tester,
This was done by immersing it in a 3wt% NaCl aqueous solution and measuring the time until red rust appeared. In addition, in the adhesion evaluation test, the polymer film was scored into 1 mm x 1 mm squares with a cutter knife, extruded to 6 mm using an Erichsen tester, and then a tape was attached and peeled off. Adhesion was evaluated. The results are also listed in Table 1.
弗
表
No、1〜4は本発明に係る実施例であって、いずれも
本発明の条件を満たしているので、赤錆発生時間は30
0時間以上且つゴバン目残存率は100%であり、耐食
性及び膜密着性に優れている。Table Nos. 1 to 4 are examples according to the present invention, and all of them satisfy the conditions of the present invention, so the red rust generation time was 30
It lasted for 0 hours or more and the grain survival rate was 100%, and it had excellent corrosion resistance and film adhesion.
No、5〜11は本発明の条件のうち1つ以上を満たし
ていない場合の比較例であり、耐食性および/または膜
密着性が劣る。No、5.6は内層が形成されていない
場合と、内層の膜厚が薄過ぎる場合の比較例であり、耐
食性に劣ると共に膜密着性も悪い。No、7は内層の膜
厚が厚過ぎる場合の比較例であり、耐食性、膜密着性共
に不十分である。N018〜10は中間層及び表面層が
形成されていないか薄過ぎる場合の比較例であり、耐食
性が劣悪である。No、11は中間層の膜厚が薄過ぎる
場合の比較例であり、内層と表面層の間で剥離してしま
い、耐食性とm密着性が共に悪い。Nos. 5 to 11 are comparative examples in which one or more of the conditions of the present invention are not satisfied, and the corrosion resistance and/or film adhesion are poor. No. 5.6 is a comparative example in which no inner layer is formed and the inner layer is too thin, and has poor corrosion resistance and poor film adhesion. No. 7 is a comparative example in which the film thickness of the inner layer is too thick, and both corrosion resistance and film adhesion are insufficient. Nos. 018 to 10 are comparative examples in which the intermediate layer and the surface layer are not formed or are too thin, and the corrosion resistance is poor. No. 11 is a comparative example in which the thickness of the intermediate layer is too thin, and peeling occurs between the inner layer and the surface layer, resulting in poor corrosion resistance and m-adhesion.
[発明の効果]
本発明は以上の様に構成されているので、耐食性及び@
密着性に優れけたプラズマ重合膜被覆金属が提供できる
こととなった。[Effect of the invention] Since the present invention is configured as described above, corrosion resistance and @
It has now become possible to provide a metal coated with a plasma polymerized film with excellent adhesion.
第1図は本発明に係るプラズマ重合膜を示す断面説明図
、第2図は本発明に係る内層の赤外線分光分析結果を示
すグラフ、第3図は表面層及び中間層の合計膜厚と耐食
性の関係を示すグラフ、第4図は内層の膜厚と膜密着性
との関係を示すグラフである。Figure 1 is a cross-sectional explanatory diagram showing the plasma polymerized film according to the present invention, Figure 2 is a graph showing the results of infrared spectroscopic analysis of the inner layer according to the present invention, and Figure 3 is the total film thickness and corrosion resistance of the surface layer and intermediate layer. FIG. 4 is a graph showing the relationship between inner layer film thickness and film adhesion.
Claims (1)
ンの重合被膜が形成されてなる高耐食性金属において、
上記重合被膜を内層、中間層、表面層からなる多層構造
とし、該内層は赤外分光分析においてSi−O−Siの
振動に基づく1100〜1000cm^−^1の吸収ピ
ークの強さに対するSi−CH_3の振動に基づく87
0〜750cm^−^1の吸収ピークの強さの比が0.
5以下で、且つ膜厚が50Å以上5000Å以下となる
様に形成し、上記表面層は酸素濃度を20原子%以下と
して、前記中間層を上記内層の組成から該表面層の組成
へ移る傾斜組成膜として100Å以上15000Å以下
形成すると共に、上記中間層と上記表面層の合計膜厚を
500Å以上5μm以下としてなることを特徴とする高
耐食性金属。In highly corrosion-resistant metals in which an organic silicone polymer film is formed on the surface of a metal base material by plasma polymerization,
The above polymerized coating has a multilayer structure consisting of an inner layer, an intermediate layer, and a surface layer, and the inner layer has a Si- 87 based on the vibration of CH_3
The ratio of absorption peak intensities from 0 to 750 cm^-^1 is 0.
5 or less and with a film thickness of 50 Å or more and 5000 Å or less, the surface layer has an oxygen concentration of 20 atomic % or less, and the intermediate layer has a gradient composition that changes from the composition of the inner layer to the composition of the surface layer. A highly corrosion-resistant metal characterized by forming a film of 100 Å or more and 15,000 Å or less, and having a total thickness of 500 Å or more and 5 μm or less of the intermediate layer and the surface layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25099990A JPH04128376A (en) | 1990-09-19 | 1990-09-19 | Highly corrosion resistant metal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25099990A JPH04128376A (en) | 1990-09-19 | 1990-09-19 | Highly corrosion resistant metal |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04128376A true JPH04128376A (en) | 1992-04-28 |
Family
ID=17216146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25099990A Pending JPH04128376A (en) | 1990-09-19 | 1990-09-19 | Highly corrosion resistant metal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04128376A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995018249A1 (en) * | 1993-12-24 | 1995-07-06 | Seiko Epson Corporation | Method and apparatus for processing surface with plasma under atmospheric pressure, method of producing semiconductor device and method of producing ink-jet printing head |
-
1990
- 1990-09-19 JP JP25099990A patent/JPH04128376A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995018249A1 (en) * | 1993-12-24 | 1995-07-06 | Seiko Epson Corporation | Method and apparatus for processing surface with plasma under atmospheric pressure, method of producing semiconductor device and method of producing ink-jet printing head |
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