JPH04148873A - Optical sampling device - Google Patents

Optical sampling device

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Publication number
JPH04148873A
JPH04148873A JP2274731A JP27473190A JPH04148873A JP H04148873 A JPH04148873 A JP H04148873A JP 2274731 A JP2274731 A JP 2274731A JP 27473190 A JP27473190 A JP 27473190A JP H04148873 A JPH04148873 A JP H04148873A
Authority
JP
Japan
Prior art keywords
light
optical
circuit
output
under test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2274731A
Other languages
Japanese (ja)
Other versions
JP2906285B2 (en
Inventor
Kazuo Nagata
和生 永田
Sunao Sugiyama
直 杉山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yokogawa Electric Corp
Original Assignee
Yokogawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yokogawa Electric Corp filed Critical Yokogawa Electric Corp
Priority to JP2274731A priority Critical patent/JP2906285B2/en
Publication of JPH04148873A publication Critical patent/JPH04148873A/en
Application granted granted Critical
Publication of JP2906285B2 publication Critical patent/JP2906285B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Measuring Instrument Details And Bridges, And Automatic Balancing Devices (AREA)
  • Measurement Of Current Or Voltage (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To enable a high-speed measurement signal to be measured with a high S/N ratio by measuring a voltage waveform of a circuit to be measured based on an output of a calculation circuit. CONSTITUTION:This device is provided with an electric optical element 31 which changes a polarization surface by an electric field corresponding to an operation voltage of a circuit 15 to be measured by entering an output light of an optical pulse generation means 10 which outputs optical pulses with an optical frequency of light; a laser light source 20 which outputs a continuous light with a second optical frequency; a synthesizing means 22 for synthesizing both; a light-receiving element 23 which receives an output light of the means 22; and a calculation circuit 24 which calculates voltage waveform of the circuit to be measured 15 based on this output. A polarization surface of optical pulses with the first optical frequency is rotated by an electric optical element 31 and is entered into the light-receiving element 23 along with a local oscillation light with the second optical frequency for performing optical frequency heterodyne detection, thus enabling signal to the amplified equivalently and internal voltage waveform of the circuit to be measured 15 is measured with a high S/N ratio.

Description

【発明の詳細な説明】 〈産業−にの利用分野〉 この発明は高速の電気信号を測定する装置に関し、特に
S/Nを改善した光サンプリング装置に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION <Field of Industrial Application> The present invention relates to a device for measuring high-speed electrical signals, and more particularly to an optical sampling device with improved S/N ratio.

〈従来技術〉 最近の高速電子デバイスは高遠なものが多く開発されて
いる。例えは、HE M T (H1(Ih f +e
ctr。
<Prior Art> Recently, many high-speed electronic devices have been developed with high distances. For example, HE M T (H1(Ih f +e
ctr.

n Nobility ’transistor )で
はゲート遅延時間が約1.0 p s程度であり、また
光通信などに用いられる半導体レーザーの直接変調帯域
も数十G Hzに達している。このような高速電子デバ
イスによる高速現象の測定は、通常サンプリングオシロ
スコープが用いられている。第4図にサンプリングオシ
ロスコープの原理を示ず。ずなわち、(A)のように連
続するN個の被測定信号に対して、ゲート時間を少しず
つずらしながら測定して行き、その結果を合成して(F
()のような測定値を?)る。
The gate delay time of the N Nobility'transistor is approximately 1.0 ps, and the direct modulation band of semiconductor lasers used in optical communications has reached several tens of GHz. A sampling oscilloscope is usually used to measure high-speed phenomena using such high-speed electronic devices. Figure 4 does not show the principle of a sampling oscilloscope. That is, as shown in (A), N consecutive signals under test are measured while changing the gate time little by little, and the results are synthesized (F
Measurements like ()? ).

この技術ては、サンプリング幅が測定結果の分解能にな
る。
In this technique, the sampling width becomes the resolution of the measurement result.

しかしながら、第111ン]のサンプリングオシI7ス
コープでは、サンプリング幅はステップリカバリダイオ
ードの速度に制限され、25ps程度が限界であり、光
パルスを用いる光オシ17スコープで610ps程疫が
限界であるという速反上の欠点があっな。
However, in the sampling oscillator I7 scope of the 111th system, the sampling width is limited by the speed of the step recovery diode, and the limit is about 25 ps, while the limit of the sampling width is about 610 ps in the optical oscillator 17 scope that uses optical pulses. There are drawbacks to the upside.

一方、G a A s基板は゛、E気光学効果を有する
ので、電界の大きさに応じてその戻り光の1祠波面が変
化する。この現象を利用して、光を用いた測定装置が開
発されている。第5図にこのような光を用いた測定装置
の構成を示す。Y A Gレーザー1の出力光はパルス
圧縮部2でps程度のパルス幅に圧縮され、偏光子3、
波長板4を介してG a AS集積回路5に入力される
。また、その戻り光は波長板4を通り、偏光子3で反射
されて受光索子6でその強度がA1す定され、表示部8
て表示される。
On the other hand, since the GaAs substrate has an E-optical effect, the one-power wavefront of the returned light changes depending on the magnitude of the electric field. Taking advantage of this phenomenon, measurement devices using light have been developed. FIG. 5 shows the configuration of a measuring device using such light. The output light of the YAG laser 1 is compressed to a pulse width of approximately ps in the pulse compression section 2, and then
The signal is input to the G a AS integrated circuit 5 via the wave plate 4 . Further, the returned light passes through the wavelength plate 4, is reflected by the polarizer 3, and its intensity is determined by the light receiving probe 6 as A1, and the display section 8
will be displayed.

駆動回路7でG a A、 s集積回路5が発生ずる電
界を変えるとその戻り光の偏光面が変化し、偏光子3に
よって受光索子6に入射する光の強度が変化する。駆動
回路7により、YAGレーザ−1の出力光のタイミング
とG a A s集積回路5を駆動するタイミングを同
期させ、かつその位相差を少しずつずらして行くことに
よって、第4図で説明しなザンブリンク技術と同1.〕
原理でG a A S集積回路5の内部電圧波形を測定
する事が出来る。この装置によればpsオーダーのサン
プリング幅で測定が1.IJ能である。
When the drive circuit 7 changes the electric field generated by the G a A,s integrated circuit 5, the polarization plane of the returned light changes, and the intensity of the light incident on the light receiving probe 6 changes by the polarizer 3. The driving circuit 7 synchronizes the timing of the output light of the YAG laser 1 and the timing of driving the GaAs integrated circuit 5, and by gradually shifting the phase difference, the timing of the output light of the YAG laser 1 and the timing of driving the GaAs integrated circuit 5 are synchronized. Same as Zambrink technology 1. ]
Based on this principle, the internal voltage waveform of the GaAs integrated circuit 5 can be measured. According to this device, measurement can be performed with a sampling width of ps order. IJ Noh.

〈発明が解決すべき課題〉 しかしながら、第5図の装置ではF1a5hランプ励起
によるNd:YAGレーザが用いられており、これはサ
イズ(全長的2m)、パワー消費、コスl〜および帯域
の各点で問題があり、改善が望まれている。そこで、現
在、半導体レーザや、半導体レーザ励起による固体レー
ザ等で置き変えが考えられているが、光パワーが小さい
なめ、S/Nが悪いという課題かある。
<Problems to be Solved by the Invention> However, the device shown in Fig. 5 uses an Nd:YAG laser pumped by an F1a5h lamp, and this has disadvantages in terms of size (total length: 2 m), power consumption, cost l~, and band. There are problems and improvements are desired. Therefore, it is currently being considered to replace it with a semiconductor laser or a solid-state laser pumped by a semiconductor laser, but this has the problem of low optical power and poor S/N.

〈発明の目的〉 この発明はL記の課題を解決するなめになされたもので
、半導体レーザ等を用いて高速の測定信号を高いS/N
比で測定できる光サンプリンタ装置を実現することを目
的とする。
<Purpose of the Invention> This invention was made to solve the problems listed in L.
The purpose is to realize an optical sampler device that can measure by ratio.

く課題を解決する為の手段〉 本発明は光パルスの偏波面の状態を被測定回路の動作電
圧に応じて変化させ、この偏波面の変化を検出して被測
定回路の電圧波形を測定する光サン゛ブリンク装化゛に
f系るもので、その特徴とするところは第1の光周波数
を持つ光パルスを出力する光パルス発生手段と、この光
パルス発生手段の出力光を入射し°C被測定回路の動作
電圧に対応する電界により偏波面を変化させる電気光学
素子と、第2の光周波数を持つ連続光を出力するレーザ
光源と、前記電気光学素子からの戻り光と前記レザ光源
の出力)〜1とを合波する音波手1jQと、この合波1
段の出力光を受光する受光素r−と、この受光素子の出
力に基ついて被測定回路の電圧波形を演算する演算回路
をfll−え 演算回j路の出力に基づいて被諧j定回
路の電坪波形を測定するように構成[7た点にある。
Means for Solving the Problems> The present invention changes the state of the polarization plane of an optical pulse according to the operating voltage of the circuit under test, detects this change in the polarization plane, and measures the voltage waveform of the circuit under test. The f-type optical sunblink system is characterized by a light pulse generating means for outputting a light pulse having a first light frequency, and a light pulse generating means for inputting the output light of the light pulse generating means. C: an electro-optical element that changes the plane of polarization by an electric field corresponding to the operating voltage of the circuit under test; a laser light source that outputs continuous light having a second optical frequency; return light from the electro-optical element; and the laser light source. A sonic wave hand 1jQ that combines the output of ) ~1 and this combined wave 1
A light-receiving element r- that receives the output light of the stage and an arithmetic circuit that calculates the voltage waveform of the circuit under test based on the output of this light-receiving element. It is configured to measure the electric waveform of [7].

く作用〉 第1の光周波数を持つ光パルスを被測定回路の電界が加
わった電気光学素子において偏波面を回転し、第2の光
周波数を有する局部発振光とともに受光素子に入射して
光周波数ヘテロタイン検波を行うことにより、等測的に
信号を増幅し、被測定回路の内部電圧波形を高いS/N
比で測定することができる。
Effect> The optical pulse having the first optical frequency is rotated in the polarization plane in the electro-optical element to which the electric field of the circuit under test is applied, and is incident on the light receiving element together with the locally oscillated light having the second optical frequency, thereby changing the optical frequency. By performing heterotine detection, the signal is amplified isometrically and the internal voltage waveform of the circuit under test has a high S/N.
It can be measured as a ratio.

〈実施例〉 第1図に本発明に係る光サンプリング装置の−・実施例
を示す。
<Embodiment> FIG. 1 shows an embodiment of the optical sampling device according to the present invention.

第1図において、10は第1の光周波数で1−Dlを持
った光パルスを出力する光パルス発生手段でコヒーレン
シーの高い半導体レーザ゛からなるもの、11は半導体
レーザ10の出力光を通過し戻り光を団IJ−1する光
アイソレータ、12は光゛γイソレタから出力された光
を透過する面光子、13は偏光子13の出力光の偏波面
を調整する波長板、14(」波長板13から出力された
光をG a、 A s集積回路からなる肢測定回1賂1
.5 (C集光するしンスである。16は半導体し一ザ
IOを1)l<動する電気パルスを介ノlするパルス発
生回路、17は光パルスθ)繰返1−7周波数f′1.
の!上弦波111号でパルス発生回路16を駆動する高
周波発振器、18は発振器17と同期しl:周波数から
微小周波数Δfずれた周波数で被測定回路15を駆動す
る駆動回路、20は局部介JI6光源を楢成し、第2の
光周波数f1.2を持ち、コヒーレンシーの高い連続光
を出力するレーザ光源、21は半導体し・−ザ20の出
力光を通過し戻り光を阻止する光アイソし 夕、22は
被測定回路15からの反射光をレンズト1.波長&13
および偏光子12を介し7て光アイソレータ21の出力
光ととらに音波するtン波手段を禍成するハーフミラ−
223はハーフミラ−22の出力光が入用する受光素1
’−12・′1は受光素−1′23の電気出力に基つい
て被測定四R1,、5の内部電圧波形を演算表小する演
算表示回路である。
In FIG. 1, reference numeral 10 denotes an optical pulse generating means that outputs an optical pulse having a first optical frequency of 1-Dl, and is composed of a highly coherent semiconductor laser. An optical isolator that collects the returned light IJ-1, 12 a surface photon that transmits the light output from the optical isolator, 13 a wavelength plate that adjusts the plane of polarization of the output light from the polarizer 13, and 14 (a wavelength plate) The light output from 13 is connected to the limb measurement circuit consisting of Ga and A s integrated circuits.
.. 5 (C is a beam condensing beam. 16 is a semiconductor, one IO is 1) a pulse generation circuit that mediates an electric pulse that moves, 17 is a light pulse θ) repetition 1-7 frequency f' 1.
of! A high frequency oscillator 18 drives the pulse generation circuit 16 with a sinusoidal wave No. 111, a drive circuit 18 drives the circuit under test 15 at a frequency that is synchronized with the oscillator 17 and is slightly shifted from the frequency by a small frequency Δf, and 20 a locally mediated JI6 light source. 21 is a semiconductor laser light source that outputs continuous light with a second optical frequency f1.2 and high coherency; 22 directs the reflected light from the circuit under test 15 to the lens 1. Wavelength & 13
and a half mirror that forms a t-wave means that makes sound waves with the output light of the optical isolator 21 through the polarizer 12.
223 is a light receiving element 1 that receives the output light from the half mirror 22.
'-12.'1 is an arithmetic display circuit which calculates the internal voltage waveforms of the four R1, 5 to be measured based on the electrical output of the light receiving element-1'23.

上記構成の装置の動作を次に説明する。The operation of the apparatus having the above configuration will be explained next.

パルス発生回iN816の電気パルス出力により、半導
体レーザ10は狭光パルスを発生ずる。この光パルスは
光アイソレータ11.偏光子12.波長板13を透過し
、レンズ14により被測定回路15I−に焦点を結ぶ。
The semiconductor laser 10 generates a narrow optical pulse by the electric pulse output of the pulse generator iN816. This light pulse is transmitted to the optical isolator 11. Polarizer 12. The light passes through the wave plate 13 and is focused on the circuit under test 15I- by the lens 14.

この入射光は、第2図に小ずように、被測定回路15の
裏面から入射してGa A、、 s基板31を透過し、
被測定回路15の表面にあるICパターン32の裏面で
反射され、占ひG a、 A s基板31を逆向きに透
過して裏面から出射される。この反射光の偏波面は、被
測定回路15のGaAs基板が電気光学効果を持つため
、入射光パルスの偏波面に対し、ICパターン上の電気
信号強度に対応して発生ずる電界強度に応じて変化する
。この反射光パルスは、レンズ14.波長板13を逆向
きに透過した後、偏光子12において反射する際にその
偏波面に応じて光強度変調を受ける。藺光了12の反射
光は光アイソレータ21を透過した半導体レーザ20の
連続出力光とバー フミラー22で合波され、受光素子
23で検出され、両光が重なった区間について後述のよ
うにヘデ冒タイン検波が行なわれる。演算表示装置24
は受光素子23の出力に基づいて被測定回路15の内部
信号波形を表示する。
As shown in FIG. 2, this incident light enters from the back surface of the circuit under test 15, passes through the Ga A...s substrate 31, and
The light is reflected by the back surface of the IC pattern 32 on the front surface of the circuit under test 15, passes through the Ga, As substrate 31 in the opposite direction, and is emitted from the back surface. Since the GaAs substrate of the circuit under test 15 has an electro-optic effect, the plane of polarization of this reflected light depends on the electric field intensity generated in response to the intensity of the electric signal on the IC pattern with respect to the plane of polarization of the incident light pulse. Change. This reflected light pulse is transmitted to the lens 14. After passing through the wavelength plate 13 in the opposite direction, the light is reflected by the polarizer 12 and undergoes light intensity modulation according to its plane of polarization. The reflected light from the light beam 12 is combined with the continuous output light from the semiconductor laser 20 that has passed through the optical isolator 21 by the barf mirror 22, and is detected by the light receiving element 23. Error detection is performed. Arithmetic display device 24
displays the internal signal waveform of the circuit under test 15 based on the output of the light receiving element 23.

一11記へテ17ダイン検波について以−1・に式を用
いて説明する。例えば半導体レーザ10からの光出力は
光周波数がω1であるとすると、E1sinω11で表
され、半導体レーザ20からの光出力は光周波数が6.
12であるとすると、1−”) 2 S 1 n O,
)2[、て表される。この2つの光かハ フミラ−22
によって合波されると、受光素子23の受光部−Lの合
波光を表す式は、 け:sin  ω    t、 −1E     !、
;   i   n  (メ) 2  t  )・・ 
く 1 ) となる。受光素子23により電気信号に変換後、ローパ
スフィルタおよびDCカッ−へ回路を通過した後のf、
−1号は、 E  −E  C08(ω  ω2)t、  =(2)
となる。ここて ω −ω −2π(f   −f   )1  2  
    1D1    +112・・(3) である。(2)式において、Elに被)11す定回路1
5の内部電圧信号に対ル6した有益な情報が含まれてい
るが、通常、 E  <<F、  、 E2−−−一定であるから、 El(El ・E2 であり、等測的に信号E1がE2倍増幅されたことにな
り、S/N比が改善されることが明らかである。
The 17th dyne detection will be explained below using equation-1. For example, if the optical frequency of the optical output from the semiconductor laser 10 is ω1, it is expressed as E1 sin ω11, and the optical output from the semiconductor laser 20 has an optical frequency of 6.
12, then 1-”) 2 S 1 n O,
)2[, is expressed as. Are these two lights? Hafmirah-22
When the light is combined by ,
; in (me) 2 t)...
1). f after being converted into an electrical signal by the light receiving element 23 and passing through a circuit to a low-pass filter and DC cutter;
-1 is E −E C08(ω ω2)t, = (2)
becomes. Here ω −ω −2π(f −f )1 2
1D1 +112...(3). In equation (2), El is covered by )11 constant circuit 1
Although the internal voltage signal of 6 contains useful information, normally E << F, , E2 --- is constant, so El(El ・E2, and isometrically the signal It is clear that E1 is amplified by E2 times, and the S/N ratio is improved.

またサンプリング技術を用いるために、駆動回路18か
ら出力される被測定回路15の駆動信号の基本周波数ゴ
′dは fd二N−f、+Δf       ・・・(4)で表
される。ここでN=1.2,3.・・・1、Δfは微小
周波数である。(4)式にお(°)るΔfの存在により
、被測定回路15内の被測電信すに対し、位相を僅かず
つずらして光パルスでサンプリングすることができ、高
速な現象を低速な現象として処理することができる。こ
れを基本周波数によって説明ずれは、被測定物内の高い
周波数fdが低い周波数Δfに変換されることになる。
Furthermore, since the sampling technique is used, the fundamental frequency go'd of the drive signal of the circuit under test 15 output from the drive circuit 18 is expressed as fd2N-f, +Δf (4). Here, N=1.2, 3. ...1, Δf is a minute frequency. Due to the presence of Δf in equation (4), it is possible to sample the telegram to be measured in the circuit under test 15 using optical pulses with a slight phase shift, thereby converting a fast phenomenon into a slow one. It can be treated as The difference in explaining this in terms of the fundamental frequency is that the high frequency fd in the object under test is converted to a low frequency Δf.

このような構成の光サンプリンタ装置によれば、ヘテロ
ダイン検波を用いることにより、S/N比を改善するこ
とかてさ、半導体レーザや半導体レザ励起固体レー1ノ
゛等のように、光パワーが小さいが→ノーイス、パワー
消費、コスト、帯域の点で而れだ光源の使用を可能とな
る。
According to an optical sampler device having such a configuration, the S/N ratio can be improved by using heterodyne detection, and the optical power can be improved by using a semiconductor laser or a semiconductor laser pumped solid-state laser. Although it is small, it allows the use of light sources that are low in power consumption, cost, and bandwidth.

また被a!11定物に入射する光パワーを小さくするこ
とができるので、過大光パワー人力によって生じる光電
子や逆電気光学効果の発生を防ぐことができ、被測定回
路への影響を抑えることかできる。
Covered again! 11. Since the optical power incident on the constant object can be reduced, it is possible to prevent the occurrence of photoelectrons and reverse electro-optic effects caused by excessive optical power, and the influence on the circuit under test can be suppressed.

なお上記の実施例では半導体レーザを光源として用いた
が、高いコヒーレンシーを持つ半導体レザ励起による固
体レーザを使用することもてきる。
Although a semiconductor laser is used as a light source in the above embodiment, a solid-state laser pumped by a semiconductor laser with high coherency may also be used.

第3図は第1図装置の変形例で、S/N比をさらに改善
するするなめに検出部を差動構成としたものを示す要部
構成ブロック図である。第1図と同じ部分は同一の記号
を付している。半導体し→ノ”10からの光出力は、爛
光子33、回転子37および偏光r−12を透過し、被
測定回路15へ導かれる。被測定回路15からの出力光
は、その偏波面のX、Y方向成分について、それぞれ+
1iI光子12と偏光−r−33で分離され、出力され
る6各分離光は、それぞれバー フミラー 38.39
にて半導体レーザ20の光出力と合波される。各合波光
はそれぞり、受光素子34および35で検出され、減算
器36で互いに引算される。光パルスの偏波面は被測定
回路15においてX、Y方向成分が逆極性で変調される
ので、受光索子34..35に逆位相成分同士が等量入
射するように光学系のアラインメン1〜を行えば、光源
自体のノイズは位相に無関係なので受光素子34.35
で同相となって引算により相殺され、被測定回路15て
変調を受けた検出光の信−り成分は逆相となって引算に
より足し合わされる。しながってS / N比がさらに
白土する。
FIG. 3 is a block diagram showing a main part configuration of a modification of the device shown in FIG. 1, in which the detection section has a differential configuration in order to further improve the S/N ratio. The same parts as in FIG. 1 are given the same symbols. The light output from the semiconductor device 10 passes through the photon 33, the rotator 37, and the polarized light r-12, and is guided to the circuit under test 15.The output light from the circuit under test 15 has its plane of polarization. For X and Y direction components, +
The 1iI photon 12 and the polarized light -r-33 are separated and each of the 6 separated lights is outputted by a barf mirror 38.39
It is combined with the optical output of the semiconductor laser 20 at. Each of the multiplexed lights is detected by light receiving elements 34 and 35, and subtracted from each other by a subtracter 36. Since the polarization plane of the optical pulse is modulated in the circuit under test 15 with the X and Y direction components having opposite polarities, the light receiving probe 34. .. If the optical system alignment 1~ is performed so that equal amounts of opposite phase components are incident on the light receiving element 34 and 35, the noise of the light source itself is irrelevant to the phase.
The signals are in phase and canceled by subtraction, and the signal components of the detection light modulated by the circuit under test 15 are in opposite phase and are added together by subtraction. As a result, the S/N ratio becomes even whiter.

なおこれらの実施例では被測定物かG a、 A s集
積回路の場合すなわち、被測定物自身が電気光学材料で
構成されている場合を説明したが、シリコン等の電気光
学効果を有さないイ1料にも適用される。この場合はシ
リ:7ン等の被測定物に近接して1−7j′I″a O
3単結晶などの電気光学効果を有する材料を配置し、こ
のL i ’I″aO3屯結晶に光全結晶して、シリコ
ン等からなる被測定回路が発生ずる電界により電気光学
効果を生じさせるようにずれはよい。
Note that in these examples, the case where the object to be measured is a Ga, As integrated circuit, that is, the case where the object to be measured itself is made of an electro-optic material, has been explained, but it is also possible to use a material such as silicon which does not have an electro-optic effect. This also applies to A1 fees. In this case, 1-7j′I″a O
3. A material having an electro-optic effect, such as a single crystal, is arranged, and the light is totally crystallized in this L i 'I''aO3 crystal, so that the electro-optic effect is caused by the electric field generated by the circuit under test made of silicon or the like. The deviation is good.

また被測定回路の反射光の1扁波面の状態の変化を検出
する代りに透過光を検出してもよい。
Furthermore, instead of detecting a change in the state of one wavefront of reflected light from the circuit under test, transmitted light may be detected.

〈発明の効果〉 以上、実施例に基づいて具体的に説明したように、本発
明によれは、半導体レーザ等を用いて高速の測定18号
を高いS/N比て測定てきる光サンプリング装置を簡単
な構成て実現することができる。
<Effects of the Invention> As described above in detail based on the embodiments, the present invention provides an optical sampling device that can measure high-speed measurement No. 18 with a high S/N ratio using a semiconductor laser or the like. can be realized with a simple configuration.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る光サンプリンタ装置の一実施例を
示す構成ブI7ツタ図、第2図は第1図装置の動作を説
明するなめの説明し1、第3I’aは第1図装置の変形
例を示す要部構成ブロック図、第41り1はサンブリン
ク技術の原理図、第5図は従来の光サンプリンタ装置の
構成図である。
FIG. 1 is a configuration block I7 diagram showing an embodiment of the optical sampler device according to the present invention, FIG. 2 is a block diagram 1 explaining the operation of the device shown in FIG. Figure 41 is a block diagram showing a modification of the apparatus; Figure 41 is a diagram showing the principle of the Sunblink technology; Figure 5 is a diagram showing the configuration of a conventional optical sampler apparatus.

Claims (1)

【特許請求の範囲】 光パルスの偏波面の状態を被測定回路の動作電圧に応じ
て変化させ、この偏波面の変化を検出して被測定回路の
電圧波形を測定する光サンプリング装置において、 第1の光周波数を持つ光パルスを出力する光パルス発生
手段と、 この光パルス発生手段の出力光を入射して被測定回路の
動作電圧に対応する電界により偏波面を変化させる電気
光学素子と、 第2の光周波数を持つ連続光を出力するレーザ光源と、 前記電気光学素子からの戻り光と前記レーザ光源の出力
光とを合波する合波手段と、 この合波手段の出力光を受光する受光素子と、この受光
素子の出力に基づいて被測定回路の電圧波形を演算する
演算回路を備え、 演算回路の出力に基づいて被測定回路の電圧波形を測定
するように構成したことを特徴とする光サンプリング装
置。
[Scope of Claims] An optical sampling device that changes the state of the polarization plane of an optical pulse according to the operating voltage of the circuit under test, and measures the voltage waveform of the circuit under test by detecting the change in the polarization plane, comprising: an optical pulse generating means for outputting an optical pulse having an optical frequency of 1; an electro-optical element for receiving the output light of the optical pulse generating means and changing the plane of polarization by an electric field corresponding to the operating voltage of the circuit under test; a laser light source that outputs continuous light having a second optical frequency; a multiplexer that multiplexes the return light from the electro-optical element and the output light of the laser light source; and a receiver that receives the output light of the multiplexer. and a calculation circuit that calculates the voltage waveform of the circuit under test based on the output of the calculation circuit, and is configured to measure the voltage waveform of the circuit under test based on the output of the calculation circuit. Optical sampling device.
JP2274731A 1990-10-12 1990-10-12 Optical sampling device Expired - Fee Related JP2906285B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2274731A JP2906285B2 (en) 1990-10-12 1990-10-12 Optical sampling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2274731A JP2906285B2 (en) 1990-10-12 1990-10-12 Optical sampling device

Publications (2)

Publication Number Publication Date
JPH04148873A true JPH04148873A (en) 1992-05-21
JP2906285B2 JP2906285B2 (en) 1999-06-14

Family

ID=17545795

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2274731A Expired - Fee Related JP2906285B2 (en) 1990-10-12 1990-10-12 Optical sampling device

Country Status (1)

Country Link
JP (1) JP2906285B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002522770A (en) * 1998-08-07 2002-07-23 インテル・コーポレーション Method and apparatus for directly measuring voltage in an integrated circuit using an infrared laser probe
JP2002207068A (en) * 2000-09-28 2002-07-26 Schlumberger Technol Inc On-chip optically driven latch for integrated circuit device inspection

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104777344A (en) * 2015-04-18 2015-07-15 安庆师范学院 Non-contact type overvoltage detection system on basis of electro-optic effect

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002522770A (en) * 1998-08-07 2002-07-23 インテル・コーポレーション Method and apparatus for directly measuring voltage in an integrated circuit using an infrared laser probe
JP4846902B2 (en) * 1998-08-07 2011-12-28 インテル・コーポレーション Method and apparatus for directly measuring voltage in an integrated circuit using an infrared laser probe
JP2002207068A (en) * 2000-09-28 2002-07-26 Schlumberger Technol Inc On-chip optically driven latch for integrated circuit device inspection

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