JPH0415229U - - Google Patents
Info
- Publication number
- JPH0415229U JPH0415229U JP5632390U JP5632390U JPH0415229U JP H0415229 U JPH0415229 U JP H0415229U JP 5632390 U JP5632390 U JP 5632390U JP 5632390 U JP5632390 U JP 5632390U JP H0415229 U JPH0415229 U JP H0415229U
- Authority
- JP
- Japan
- Prior art keywords
- wafers
- pillars
- boat
- cvd apparatus
- pressure cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 235000012431 wafers Nutrition 0.000 claims 4
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図ａ，ｂはそれぞれ本考案ポートの一実施
例の構成を示す正面図及びその−線断面図、
第２図は縦型減圧ＣＶＤ装置の一例の構成を示す
簡略断面図、第３図ａ，ｂはそれぞれ従来ポート
の一例の構成を示す正面図及びその−線断面
図である。
１……ウエハ、７……支柱部、８……ウエハ支
持部。
Figures 1a and 1b are a front view and a cross-sectional view taken along the line 1, respectively, showing the configuration of an embodiment of the port of the present invention;
FIG. 2 is a simplified cross-sectional view showing the structure of an example of a vertical reduced pressure CVD apparatus, and FIGS. 3a and 3b are a front view and a cross-sectional view taken along the line 1-2, respectively, showing the structure of an example of a conventional port. 1...Wafer, 7...Strut part, 8...Wafer support part.
Claims (1)
３本以上の支柱部７と、これらの支柱部７から周
方向に伸び、更にウエハ１の中心方向に突出する
Ｌ字形状を有し、多数枚のウエハ１を水平に一定
間隔で積み重ねて保持するウエハ保持部８からな
る縦型減圧ＣＶＤ装置用ボート。 It has three or more pillars 7 arranged vertically surrounding a large number of wafers 1, and has an L-shape extending in the circumferential direction from these pillars 7 and further protrudes toward the center of the wafers 1. A boat for a vertical low-pressure CVD apparatus includes a wafer holding section 8 that holds wafers 1 stacked horizontally at regular intervals.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5632390U JPH0415229U (en) | 1990-05-28 | 1990-05-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5632390U JPH0415229U (en) | 1990-05-28 | 1990-05-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0415229U true JPH0415229U (en) | 1992-02-06 |
Family
ID=31580044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5632390U Pending JPH0415229U (en) | 1990-05-28 | 1990-05-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0415229U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997032339A1 (en) * | 1996-02-29 | 1997-09-04 | Tokyo Electron Limited | Heat-treating boat for semiconductor wafer |
-
1990
- 1990-05-28 JP JP5632390U patent/JPH0415229U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997032339A1 (en) * | 1996-02-29 | 1997-09-04 | Tokyo Electron Limited | Heat-treating boat for semiconductor wafer |
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