JPH04161428A - Polyimide film - Google Patents

Polyimide film

Info

Publication number
JPH04161428A
JPH04161428A JP28754790A JP28754790A JPH04161428A JP H04161428 A JPH04161428 A JP H04161428A JP 28754790 A JP28754790 A JP 28754790A JP 28754790 A JP28754790 A JP 28754790A JP H04161428 A JPH04161428 A JP H04161428A
Authority
JP
Japan
Prior art keywords
polyimide film
polyamic acid
film
copolymer
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28754790A
Other languages
Japanese (ja)
Inventor
Katsunori Yabuta
勝典 薮田
Taku Ito
卓 伊藤
Yoshifumi Okada
好史 岡田
Hitoshi Nojiri
仁志 野尻
Kosaku Nagano
広作 永野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP28754790A priority Critical patent/JPH04161428A/en
Publication of JPH04161428A publication Critical patent/JPH04161428A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N

Landscapes

  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

PURPOSE:To provide the title high-modulus film excellent in resistance to water and moisture and dimensional stability, useful for flexible printing circuit boards, etc., made up of each specific two kinds of recurring unit. CONSTITUTION:The objective film made up of two kinds of recurring unit of formulas I and II (X is H or F), respectively, with the molar ratio I/II of (40:60)-(60:40). The present film can be obtained from a polyamic acid copolymer solution as precursor, which can be prepared by polymerization, in an organic polar solvent, between equimolar amounts of an acid anhydride and diamine component.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、耐水性及び耐湿性に優れ且つ高い弾性率を有
し、そのため、優れた寸法安定性を持つポリイミドフィ
ルムに関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a polyimide film that has excellent water resistance and moisture resistance, high elastic modulus, and therefore excellent dimensional stability.

゛〔従来の技術〕 ポリイミドは、一般に、耐熱性、電気絶縁性、耐薬品性
および耐放射線性に優れており、フレキシブルプリント
基板の絶縁層等の用途に広く利用されている。しかし乍
ら、従来のポリイミドは、その化学構造上、耐水性、耐
湿性が悪い、つまり吸水率、吸湿率が高いという欠点が
ある。そのため、例えば、このポリイミドのフィルムを
フレキシブルプリント基板の絶縁層に用いた場合、エツ
チング工程などの水に曝される工程において吸湿して寸
法変化を生じ、微細加工を施す際に非常に大きな困難を
招いていた。
[Prior Art] Polyimide generally has excellent heat resistance, electrical insulation, chemical resistance, and radiation resistance, and is widely used for applications such as insulating layers of flexible printed circuit boards. However, conventional polyimides have the disadvantage of poor water resistance and moisture resistance, that is, high water absorption and moisture absorption rates, due to their chemical structure. Therefore, for example, when this polyimide film is used as an insulating layer of a flexible printed circuit board, it absorbs moisture during the etching process and other processes where it is exposed to water, resulting in dimensional changes, making it very difficult to carry out microfabrication. I was invited.

そこで、吸水率、吸湿率を下げるための試みとして、長
鎖の芳香族ジアミンを用いて、イミド環の数の全体に占
める割合を減らし、吸水率の低いポリイミドフィルムを
製造することが提案されている。しかしながら、このポ
リイミドフィルムは耐水性、耐湿性に優れてはいるが、
多くの長鎖ジアミンはいくつかの屈曲基を構造中に有す
るため、弾性率が低くなってしまうという欠点を持つ。
Therefore, as an attempt to lower the water absorption rate and moisture absorption rate, it has been proposed to use a long-chain aromatic diamine to reduce the proportion of the total number of imide rings and to produce a polyimide film with a low water absorption rate. There is. However, although this polyimide film has excellent water resistance and moisture resistance,
Many long-chain diamines have several bending groups in their structure, which has the disadvantage of low elastic modulus.

すなわち、このポリイミドフィルムはテンションに対す
る歪が大きく、例えばフレキシブルプリント基板の製造
において微細加工を施す際などの寸法安定性に問題があ
る。
That is, this polyimide film has a large strain due to tension, and has a problem with dimensional stability when microfabrication is performed, for example, in the production of flexible printed circuit boards.

上記の如く、従来、優れた耐水性、耐湿性および高い弾
性率を併せ持つポリイミドフィルムの出現が望まれてい
た。
As mentioned above, there has been a desire for a polyimide film that has both excellent water resistance, moisture resistance, and high elastic modulus.

[発明が解決しようとする課題] 本発明は、優れた耐水性、耐湿性と高い弾性率を併せ持
つポリイミドフィルムを得ることを目的とする。
[Problems to be Solved by the Invention] An object of the present invention is to obtain a polyimide film that has both excellent water resistance and moisture resistance and high elastic modulus.

〔課題を解決するための手段〕[Means to solve the problem]

すなわち本発明は、下記一般式(A)および(B)で表
される反復単位を有するポリイミドフィルムを内容とす
るものである。
That is, the present invention includes a polyimide film having repeating units represented by the following general formulas (A) and (B).

(Xは水素原子またはフン素原子を表す。)本発明者ら
は、耐水性、耐湿性に優れ、且つ高弾性率のポリイミド
フィルムを得るべく種々の長鎖ジアミンと剛直なジアミ
ンと酸二無水物の共重合を検討した結果、比較的長鎖が
長く屈曲基数が多いジアミンであるにもかかわらず、そ
れを用いて共重合して得たポリイミドフィルムが、ある
特定の組合せにおいて、高弾性率を示すことを見い出し
た。
(X represents a hydrogen atom or a fluorine atom.) In order to obtain a polyimide film with excellent water resistance, moisture resistance, and high elastic modulus, the present inventors developed various long-chain diamines, rigid diamines, and acid dianhydrides. As a result of studying the copolymerization of diamines, we found that although diamines have relatively long chains and a large number of bending groups, polyimide films obtained by copolymerizing with diamines have high elastic modulus in certain combinations. We found that this shows that

すなわち、本発明によるポリイミドフィルムは、屈曲基
を持つ長鎖の芳香族ジアミン残基を含む一般式(A)で
表される反復単位と、剛直な芳香族ジアミン残基を含む
一般式(B)で表される反復単位で構成される共重合体
からなる。
That is, the polyimide film according to the present invention has a repeating unit represented by the general formula (A) containing a long-chain aromatic diamine residue having a bending group, and a repeating unit represented by the general formula (B) containing a rigid aromatic diamine residue. It consists of a copolymer composed of repeating units represented by

本発明のポリイミド共重合体はランダム共重合体、交互
共重合体、ブロック共重合体のいずれでもよい。また、
一般式(A)及び(B)で表される反復単位の繰返し数
はそれぞれ100〜10000の範囲が好ましく、また
モル比(A)/(B)は20/80〜80/20の範囲
にあることが好ましく、更に好ましくは40/60〜6
0/40の範囲である。(A)の比率が上記範囲より小
さいとフィルムの吸水率が高くなり、逆に(A)の比率
が上記範囲より大きいと弾性率が低くなる。
The polyimide copolymer of the present invention may be a random copolymer, an alternating copolymer, or a block copolymer. Also,
The number of repeating units represented by general formulas (A) and (B) is preferably in the range of 100 to 10,000, and the molar ratio (A)/(B) is in the range of 20/80 to 80/20. is preferable, more preferably 40/60 to 6
It is in the range of 0/40. If the ratio of (A) is smaller than the above range, the water absorption rate of the film will be high, and conversely, if the ratio of (A) is larger than the above range, the elastic modulus will be low.

また、このポリイミド共重合体に各種の有機添加材、或
いは無機のフィラー類、或いは各種の強化材を単独又は
組み合わせて複合することも可能である。
It is also possible to compound various organic additives, inorganic fillers, or various reinforcing materials singly or in combination with this polyimide copolymer.

次に、このポリイミドフィルムの製造法について説明す
る。このポリイミド共重合体は、その前駆体であるポリ
アミド酸共重合体溶液から得られるが、このポリアミド
酸共重合体溶液は、公知の方法で製造することができる
。すなわち、酸無水物とジアミン成分を実質等モル使用
し、を機極性溶媒中で重合して得られる。
Next, a method for manufacturing this polyimide film will be explained. This polyimide copolymer is obtained from a polyamic acid copolymer solution which is its precursor, and this polyamic acid copolymer solution can be produced by a known method. That is, it is obtained by using substantially equimolar amounts of acid anhydride and diamine components and polymerizing them in a polar solvent.

゛このポリアミド酸共重合体溶液の製造方法の具体例を
以下に示す。
A specific example of the method for producing this polyamic acid copolymer solution is shown below.

(1)芳香族テトラカルボン酸二無水物(a)と、芳香
族ジアミン化合物(b)と(c)の混合物を実質的に等
モル、有機極性溶媒中で反応させる共重合方法。この方
法ではランダム共重合体が得られる。
(1) A copolymerization method in which substantially equimolar amounts of an aromatic tetracarboxylic dianhydride (a) and a mixture of aromatic diamine compounds (b) and (c) are reacted in an organic polar solvent. This method yields random copolymers.

(2)芳香族テトラカルボン酸二無水物(a)と一方の
芳香族ジアミン化合物(b)を、(a)を(b)より過
剰モル用い、有機極性溶媒中にて反応させ、両末端に酸
無水物基を有するプレポリマーを得て、続いてここに芳
香族ジアミン化合物(c)を、全芳香族ジアミン((b
)+ (c))が芳香族テトラカルボン酸二無水物(a
)と実質的に等モルになるように添加する共重合方法、
この方法により、どちらか一方の反復単位が存在するセ
グメントの長さが共重合体分子内において一定である共
重合体を得ることができる。
(2) Aromatic tetracarboxylic dianhydride (a) and one aromatic diamine compound (b) are reacted in an organic polar solvent using a molar excess of (a) over (b), and both ends are reacted. A prepolymer having an acid anhydride group is obtained, and then an aromatic diamine compound (c) is added thereto, and a wholly aromatic diamine ((b)
) + (c)) is aromatic tetracarboxylic dianhydride (a
), a copolymerization method in which the copolymerization method is added in a substantially equimolar amount with
By this method, a copolymer can be obtained in which the length of the segment in which one of the repeating units is present is constant within the copolymer molecule.

(3)芳香族ジアミン化合物(b)に対して芳香族テト
ラカルボン酸二無水物(a)を、 (b)が(a)より
過剰になるように反応させ、両末端にアミノ基を有する
プレポリマーを得て、続いてこれに芳香族ジアミン成分
(c)を追加添加後、全ジアミン成分C(b)+ (c
))と実質的に等モルになるように、不足分の芳香族テ
トラカルボン酸二無水物(a)を添加反応させる共重合
方法。
(3) React the aromatic tetracarboxylic dianhydride (a) with the aromatic diamine compound (b) in such a way that (b) is in excess of (a), and prepare a precipitate having amino groups at both ends. After obtaining a polymer and subsequently adding the aromatic diamine component (c) to it, the total diamine component C(b) + (c
)) A copolymerization method in which an insufficient amount of aromatic tetracarboxylic dianhydride (a) is added and reacted so as to be substantially equimolar.

この方法により、ブロック共重合体を得ることができる
A block copolymer can be obtained by this method.

ポリアミド酸共重合体を得るには上記以外の方法を用い
てもよく、さらには異種のポリアミド酸溶液の混合によ
り得ることも可能である。(2)の方法を用いると、特
性の面で優れたものが得られるので好ましい。
Methods other than those described above may be used to obtain the polyamic acid copolymer, and it is also possible to obtain the polyamic acid copolymer by mixing different types of polyamic acid solutions. It is preferable to use the method (2) because it yields products with excellent properties.

上記のポリアミド酸を得るために、芳香族テトラカルボ
ン酸二無水物としてピロメリット酸二無水物を用いる。
In order to obtain the above polyamic acid, pyromellitic dianhydride is used as the aromatic tetracarboxylic dianhydride.

芳香族ジアミン成分(b)としては、一般式%式% で表される芳香族ジアミンが用いられる。一般式(1)
で表される芳香族ジアミンとしては、2゜2−ビスC4
−C4−アミノフェノキシ)フェニル〕プロパン、2,
2−ビスC4−(4−アミノフェノキシ)ツユニル〕へ
キサフルオロプロパン等を挙げることができ、これらは
単独または2種以上組み合わせて用いられる。
As the aromatic diamine component (b), an aromatic diamine represented by the general formula % is used. General formula (1)
The aromatic diamine represented by 2゜2-bisC4
-C4-aminophenoxy)phenyl]propane, 2,
Examples include 2-bisC4-(4-aminophenoxy)tuunyl]hexafluoropropane, which may be used alone or in combination of two or more.

また、芳香族ジアミン(C)としては、一般式で表され
るパラフェニレンジアミンが用いられる。
Further, as the aromatic diamine (C), paraphenylene diamine represented by the general formula is used.

また、該ポリアミド酸共重合体の性成反応に使用される
有機極性溶媒として、ジメチルスルホキシド、ジエチル
スルホキシドなどきスルホキシド系溶媒、N、N−ジメ
チルホルムアミド、N、 N−ジエチルホルムアミドな
どのホルムアミド系溶媒、N、N−ジメチルアセトアミ
ド、N、N−ジエチルアセトアミドなどのアセトアミド
系溶媒、N−メチル−2−ピロリドン、N−ビニル−2
−ピロリドンなどのピロリドン系溶媒、フェノール、0
−1m−1またはp−クレゾール、キシレノール、ハロ
ゲン化フェノール、カテコールなどのフェノール系溶媒
、あるいはへキサメチルホスホルアミド、γ−ブチロラ
クトンなどを挙げることができ、これらを単独または2
種以上の混合物として用いるのが望ましく、更にはキシ
レン、トルエンのような芳香族炭化水素の使用も可能で
ある。
In addition, as the organic polar solvent used in the formation reaction of the polyamic acid copolymer, sulfoxide-based solvents such as dimethyl sulfoxide and diethyl sulfoxide, formamide-based solvents such as N,N-dimethylformamide, N,N-diethylformamide, etc. , N,N-dimethylacetamide, acetamide solvents such as N,N-diethylacetamide, N-methyl-2-pyrrolidone, N-vinyl-2
-Pyrrolidone solvents such as pyrrolidone, phenol, 0
-1m-1 or p-cresol, xylenol, halogenated phenol, phenolic solvents such as catechol, hexamethylphosphoramide, γ-butyrolactone, etc., which can be used alone or in combination.
It is preferable to use a mixture of more than one type of hydrocarbon, and it is also possible to use aromatic hydrocarbons such as xylene and toluene.

また、このポリアミド酸共重合体は各々前記のを機種性
溶媒中に5〜40重量%、好ましくは10〜30重量%
溶解されているのが取扱いの面からも望ましい。
In addition, this polyamic acid copolymer contains 5 to 40% by weight, preferably 10 to 30% by weight of each of the above in a specific solvent.
From the viewpoint of handling, it is desirable that the material be dissolved.

次いで、このポリアミド酸溶液からポリイミドフィルム
を製造する方法については、従来公知の方法を用いるこ
とができる。すなわち、熱的に脱水する熱的方法、脱水
剤と触媒を用いる化学的方法のいずれを用いてもよいが
、化学的方法によると生成するポリイミド重合体の機械
特性が優れたものになるので好ましい。なお、ここで言
う脱水剤としては、例えば無水酢酸等の脂肪族酸無水物
、フタル酸無水物等の芳香族酸無水物などが挙げられる
。また触媒として、例えばトリエチルアミンなどの脂肪
族第3級アミン類、N、N−ジメチルアニリン等の芳香
族第3級アミン類、ピリジン、ピコリン、イソキノリン
、キノリン等の複素環式第3級アミン類などが挙げられ
る。
Next, a conventionally known method can be used to produce a polyimide film from this polyamic acid solution. That is, either a thermal method of thermal dehydration or a chemical method using a dehydrating agent and a catalyst may be used, but chemical methods are preferred because the resulting polyimide polymer has excellent mechanical properties. . Note that the dehydrating agent mentioned here includes, for example, aliphatic acid anhydrides such as acetic anhydride, aromatic acid anhydrides such as phthalic anhydride, and the like. Examples of catalysts include aliphatic tertiary amines such as triethylamine, aromatic tertiary amines such as N,N-dimethylaniline, and heterocyclic tertiary amines such as pyridine, picoline, isoquinoline, and quinoline. can be mentioned.

このようにして、低い吸水率と高い弾性率を併せ持つポ
リイミドフィルムを得ることができる。
In this way, a polyimide film having both low water absorption and high elastic modulus can be obtained.

〔実施例〕〔Example〕

以下、実施例により本発明を具体的に説明するが、本発
明はこれら実施例のみに限定されるものではない。
EXAMPLES Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited only to these Examples.

実施例中、ODAは4.4′−ジアミノジフェニルエー
テル、p−PDAはパラフェニレンジアミン、PMDA
はピロメリット酸二無水物、BAPPは2,2−ビス(
4−(4−アミノフェノキシ)フェニル]プロパン、D
MFはジメチルホルムアミドを表す。
In the examples, ODA is 4,4'-diaminodiphenyl ether, p-PDA is paraphenylenediamine, PMDA
is pyromellitic dianhydride, BAPP is 2,2-bis(
4-(4-aminophenoxy)phenyl]propane, D
MF represents dimethylformamide.

比較例1 21のセパラブルフラスコに脱水精製したDMF815
gを入れ、ここに0DA49.75 g (0゜248
モル)を投入し均一になるまで攪拌した。
Comparative Example 1 Dehydrated and purified DMF815 in 21 separable flasks
g, here 0DA49.75 g (0°248
mol) and stirred until uniform.

次に、ここにPMDA108.38g (0,497モ
ル)を添加し、2時間反応させた。この間反応系を0℃
の氷水で冷却した。続いて、ここにp−pDA26.8
7 g (0,248モル)を添加し、更に4時間反応
させて、固形分18.5重量%のポリアミド酸溶液を得
た。
Next, 108.38 g (0,497 mol) of PMDA was added thereto and reacted for 2 hours. During this time, the reaction system was kept at 0°C.
Cooled with ice water. Next, here is p-pDA26.8
7 g (0,248 mol) was added thereto, and the reaction was further continued for 4 hours to obtain a polyamic acid solution with a solid content of 18.5% by weight.

このポリアミド酸溶液に、脱水側として無水酢酸、触媒
としてピリジンを添加した後、ガラス板上に流延塗布し
、約100℃にて約90秒乾燥した後、ポリアミド酸塗
膜をガラス板より剥し、その塗膜を支持枠に固定した。
After adding acetic anhydride as a dehydrating side and pyridine as a catalyst to this polyamic acid solution, it was cast onto a glass plate, dried at about 100°C for about 90 seconds, and then the polyamic acid coating was peeled off from the glass plate. , the coating was fixed to a support frame.

その後、約110℃で約90秒、約200℃で約60秒
、約300℃で約60秒、続いて約400℃で約60秒
加熱し、脱水閉環、乾燥した後、上記支持枠より取り外
し、約25μmのポリイミドフィルムを得た。このフィ
ルムの初期弾性率は630 kg/mJであり、吸水−
率は4.2%であった。
Thereafter, it was heated at about 110°C for about 90 seconds, about 200°C for about 60 seconds, about 300°C for about 60 seconds, and then heated at about 400°C for about 60 seconds, dehydrated and ring-closed, dried, and then removed from the support frame. , a polyimide film of about 25 μm was obtained. The initial elastic modulus of this film was 630 kg/mJ, and the water absorption
The rate was 4.2%.

比較例2 EAPP I 20.81 g (0,294モル)と
PMDA64.19g (0,294モル)をDMF8
15g中で重合し、18.5重量%のポリアミド酸溶液
を得た。以下、比較例1と同様の操作により約25μm
の厚みを有するポリイミドフィルムを得た。
Comparative Example 2 20.81 g (0,294 mol) of EAPP I and 64.19 g (0,294 mol) of PMDA were mixed with DMF8
Polymerization was carried out in 15 g to obtain a 18.5% by weight polyamic acid solution. Hereinafter, approximately 25 μm was obtained by the same operation as in Comparative Example 1.
A polyimide film having a thickness of .

このフィルムの初期弾性率は280 kg/am2であ
り、吸水率は0.5%であった。
The initial elastic modulus of this film was 280 kg/am2, and the water absorption rate was 0.5%.

実施例1 比較例1と同様の手順でDMF815gにBAPP79
.53g (0,194モル)、PMDA84゜52g
(0,388モル)、P−PDA20.95g(0,1
94モル)を順に加えて重合し、18.5重量%のポリ
アミド#溶液を得た。以下、比較例1と同様の操作によ
り約25μmの厚みを有するポリイミドフィルムを得た
。このフィルムの初期弾性率は600kg/atai”
であり、吸水率は】、5%であった。
Example 1 BAPP79 was added to 815 g of DMF in the same manner as in Comparative Example 1.
.. 53g (0,194mol), PMDA84゜52g
(0,388 mol), P-PDA 20.95 g (0,1
94 mol) were added in order and polymerized to obtain a 18.5% by weight polyamide # solution. Thereafter, a polyimide film having a thickness of about 25 μm was obtained by the same operation as in Comparative Example 1. The initial elastic modulus of this film is 600 kg/atai"
The water absorption rate was 5%.

以上の結果を第1表にまとめて示す。The above results are summarized in Table 1.

第    1    表 〔発明の効果〕 本発明のポリイミドフィルムは弾性率が高く、且つ優れ
た耐水性、耐湿性を備えている。
Table 1 [Effects of the Invention] The polyimide film of the present invention has a high elastic modulus and has excellent water resistance and moisture resistance.

Claims (1)

【特許請求の範囲】 1、下記一般式(A)および(B)で表される反復単位
を有するポリイミドフィルム。 ▲数式、化学式、表等があります▼ (Xは水素原子またはフッ素原子を表す。)2、上記一
般式(A)および(B)で表される反復単位の比(A)
/(B)が40/60〜60/40の範囲である請求項
1記載のポリイミドフィルム。
[Claims] 1. A polyimide film having repeating units represented by the following general formulas (A) and (B). ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (X represents a hydrogen atom or a fluorine atom.) 2. Ratio (A) of repeating units represented by the above general formulas (A) and (B)
The polyimide film according to claim 1, wherein /(B) is in the range of 40/60 to 60/40.
JP28754790A 1990-10-24 1990-10-24 Polyimide film Pending JPH04161428A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28754790A JPH04161428A (en) 1990-10-24 1990-10-24 Polyimide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28754790A JPH04161428A (en) 1990-10-24 1990-10-24 Polyimide film

Publications (1)

Publication Number Publication Date
JPH04161428A true JPH04161428A (en) 1992-06-04

Family

ID=17718751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28754790A Pending JPH04161428A (en) 1990-10-24 1990-10-24 Polyimide film

Country Status (1)

Country Link
JP (1) JPH04161428A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006033324A1 (en) * 2004-09-24 2006-03-30 Kaneka Corporation Process for production of polyimide film having high adhesiveness
WO2008010409A1 (en) * 2006-07-18 2008-01-24 Kaneka Corporation Polyimide film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006033324A1 (en) * 2004-09-24 2006-03-30 Kaneka Corporation Process for production of polyimide film having high adhesiveness
KR100981852B1 (en) * 2004-09-24 2010-09-13 가부시키가이샤 가네카 Manufacturing method of polyimide film having high adhesiveness
US8513373B2 (en) 2004-09-24 2013-08-20 Kaneka Corporation Process for production of polyimide film having high adhesiveness
WO2008010409A1 (en) * 2006-07-18 2008-01-24 Kaneka Corporation Polyimide film

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