JPH0419032B2 - - Google Patents
Info
- Publication number
- JPH0419032B2 JPH0419032B2 JP57181118A JP18111882A JPH0419032B2 JP H0419032 B2 JPH0419032 B2 JP H0419032B2 JP 57181118 A JP57181118 A JP 57181118A JP 18111882 A JP18111882 A JP 18111882A JP H0419032 B2 JPH0419032 B2 JP H0419032B2
- Authority
- JP
- Japan
- Prior art keywords
- resistor
- raw
- insulator
- sheet
- insulator sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012212 insulator Substances 0.000 claims description 41
- 239000004020 conductor Substances 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 24
- 238000004519 manufacturing process Methods 0.000 claims description 18
- 239000000919 ceramic Substances 0.000 claims description 13
- 238000007639 printing Methods 0.000 claims description 8
- 238000010030 laminating Methods 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 238000005245 sintering Methods 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 2
- 238000005553 drilling Methods 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 12
- 239000010409 thin film Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 6
- 238000003475 lamination Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000007650 screen-printing Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000005266 casting Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000001454 recorded image Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Electronic Switches (AREA)
- Laminated Bodies (AREA)
Description
【発明の詳細な説明】
本発明はセラミツクサーマルヘツドに関し、特
に絶縁体材料、発熱体材料、導電体材料を一体化
して焼結したセラミツクサーマルヘツドの製造法
に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a ceramic thermal head, and more particularly to a method for manufacturing a ceramic thermal head in which an insulating material, a heating material, and a conductive material are integrated and sintered.
従来、感熱記録用のサーマルヘツドは厚膜法、
薄膜法あるいは薄膜、厚膜混合法などによつて、
セラミツク基板上に形成し、実用化されている。 Traditionally, thermal heads for heat-sensitive recording have been produced using the thick film method.
By thin film method or thin film/thick film mixed method, etc.
It is formed on a ceramic substrate and has been put into practical use.
従来使用されているサーマルヘツドは厚膜型、
薄膜型それぞれに長所欠点を有していた。すなわ
ち厚膜型の場合には、大きな寸法のものが比較的
安価にできるが、電極、発熱体を厚膜印刷法で行
うため、解像度に制限があり、8ドツト/mmが限
界であつた。さらに厚膜法によつて、解像度を上
げようとすると、配線パターンを微細化する必要
があるため、導体として金を使用しなければなら
ず、コストが非常に高くなる欠点ももつていた。
さらに多層配線を高密度に行うため、歩留が悪く
コスト上昇の原因になつていた。 The thermal heads conventionally used are thick film type.
Each thin film type had advantages and disadvantages. In other words, in the case of the thick film type, large dimensions can be produced relatively inexpensively, but since the electrodes and heating elements are printed using a thick film printing method, the resolution is limited to 8 dots/mm. Furthermore, in order to increase the resolution using the thick film method, it is necessary to miniaturize the wiring pattern, which necessitates the use of gold as a conductor, which also has the disadvantage of extremely high costs.
Furthermore, the high density of multi-layer wiring leads to poor yields and increased costs.
さらに厚膜型では、発熱体の抵抗バラツキが印
刷の厚みコントロールが困難なため大きくなり、
抵抗のバラツキとして非常に良いものでも±20%
程度あり、ヘツドとして使用した時の記録品質に
も問題があつた。 Furthermore, with thick film types, the resistance variation of the heating element becomes large because it is difficult to control the printing thickness.
Resistance variation is ±20% even if it is very good.
There were also problems with recording quality when used as a head.
また薄膜法によるサーマルヘツドは、微細なパ
ターン形成ができるため、解像度は良くすること
ができるが、大きな寸法のものが作りにくく、製
造工程が複雑なため、コストが高くなり、さらに
形成した表面積が薄いため耐摩耗性に問題があつ
た。 In addition, thermal heads using the thin film method can form fine patterns, which can improve resolution, but they are difficult to make in large dimensions and the manufacturing process is complicated, resulting in high costs and the surface area formed is small. There was a problem with wear resistance because it was thin.
また薄膜法によるサーマルヘツドは多層配線が
むずかしく、多層配線層にピンホールの発生によ
る歩留の低下や、多層配線の配線抵抗が高くな
り、素子の発熱、駆動回路などに問題があつた。 In addition, multilayer wiring is difficult for thermal heads made using the thin film method, resulting in lower yields due to the occurrence of pinholes in the multilayer wiring, higher wiring resistance in the multilayer wiring, and problems with element heat generation and drive circuits.
本発明はこれらの問題点を全て解決するもの
で、小型でコストが低く、解像度の優れた信頼性
の高いサーマルヘツドの製造方法を提供するもの
である。 The present invention solves all of these problems and provides a method for manufacturing a thermal head that is small in size, low in cost, has excellent resolution, and is highly reliable.
すなわち本発明は絶縁体生シートを形成する工
程と絶縁体生シートに孔を穿設する工程と、該孔
に導電体物質を充填すると同時に導体層を絶縁体
生シート上に形成する工程と絶縁体生シート上に
抵抗体層を印刷により形成する工程と抵抗体層と
導体層を形成した絶縁体生シート、導体層のみ形
成した絶縁体生シートおよび絶縁体生シートを積
層圧着し、積層体を形成する工程と前記積層体を
所定の寸法に切断し、焼結する工程と焼結した積
層体に外部取出電極を付ける工程と該焼結体の所
定の面を研摩する工程を有することを特徴とする
積層セラミツクサーマルヘツドの製造方法であ
る。サーマルヘツドは均一な形と抵抗値を持つ抵
抗体を微細な間隔で1000以上横1列に並べなくて
はならず、さらに、抵抗と同じ数のリード線を同
じ密度で配線する必要がある。しかも、これらの
抵抗体およびリード線のいずれか一つでも不良が
発生するとヘツドとしては使用できなくなる。 That is, the present invention comprises a process of forming a raw insulator sheet, a process of drilling holes in the raw insulator sheet, a process of filling the holes with a conductive material and at the same time forming a conductor layer on the raw insulator sheet, and a process of forming a conductive layer on the raw insulator sheet. A step of forming a resistor layer on a biosheet by printing, a raw insulator sheet with a resistor layer and a conductor layer formed thereon, a raw insulator sheet with only a conductor layer formed thereon, and a raw insulator sheet are laminated and crimped to form a laminate. cutting the laminate into predetermined dimensions and sintering the laminate, attaching external electrodes to the sintered laminate, and polishing a predetermined surface of the sintered body. This is a method for manufacturing a characteristic laminated ceramic thermal head. A thermal head must have more than 1,000 resistors of uniform shape and resistance value arranged in a horizontal row at minute intervals, and it must also have the same number of lead wires as resistors and wire them at the same density. Moreover, if any one of these resistors or lead wires becomes defective, the head cannot be used.
本発明は、絶縁体生シート上に抵抗体および導
体を形成し、しかも各導体をスルーホールを用い
て、立体的に配線することによつて、配線の密度
を従来平面内で微細化していたものよりも実際的
な配線密度を著しく向上させ、かつ配線の信頼性
を著しく向上させることができた。 The present invention forms resistors and conductors on a raw insulator sheet, and uses through holes to wire each conductor three-dimensionally, thereby reducing the wiring density in a conventional plane. We were able to significantly improve the actual wiring density and the reliability of the wiring.
さらに抵抗体を厚膜印刷によつて形成し、厚み
方向に積層することによつて発熱体層を形成する
ため抵抗層の厚みを数十ミクロンの厚さまで薄く
することができる。その結果サーマルヘツドとし
ての解像度は薄膜型ヘツドと同等以上にすること
が可能となつた。 Furthermore, since the resistor is formed by thick film printing and the heat generating layer is formed by laminating in the thickness direction, the thickness of the resistor layer can be reduced to several tens of microns. As a result, it has become possible to achieve resolution as a thermal head equal to or higher than that of a thin film type head.
また従来のサーマルヘツドでは厚膜型、薄膜型
いずれの方法によつても、形成される抵抗体層の
厚さが数千オングストロームから数十ミクロンで
あるため、耐摩耗性が悪く、使用状態で抵抗体層
が擦り切れてしまうことが多くあつた。 In addition, in conventional thermal heads, regardless of whether the thick film type or thin film type is used, the thickness of the resistor layer formed is from several thousand angstroms to several tens of microns, resulting in poor wear resistance and poor wear resistance. The resistor layer often wore out.
このため従来のサーマルヘツドでは、表面に耐
摩耗性のガラス、Ta2O5などの耐摩耗層を数十ミ
クロンの厚さに形成していた。 For this reason, in conventional thermal heads, a wear-resistant layer of abrasion-resistant glass, Ta 2 O 5 , or the like is formed on the surface to a thickness of several tens of microns.
しかし、これらの耐摩耗層を形成すると、抵抗
発熱体からの熱が耐摩耗層に伝導する時、横方向
への熱の拡散が厚み方向と同時に起るため、解像
度を悪くする原因となつていた。 However, when these wear-resistant layers are formed, when heat from the resistance heating element is conducted to the wear-resistant layers, heat diffusion in the lateral direction occurs simultaneously in the thickness direction, which causes resolution to deteriorate. Ta.
このように従来のサーマルヘツドは、厚膜型、
薄膜型、これらの混合型のいずれの方法によつて
も、それぞれに問題点を含んでいた。 In this way, conventional thermal heads are thick film type,
Both the thin film method and the mixed method have their own problems.
本発明は従来と全く異なる構造により、これら
の問題点を解決し、量産性のある高性能の低コス
トサーマルヘツドを提供するものである。 The present invention solves these problems by using a structure completely different from conventional ones, and provides a high-performance, low-cost thermal head that can be mass-produced.
以下図面と実施例により、本発明の詳細を説明
する。 The details of the present invention will be explained below with reference to the drawings and examples.
第1図は、本発明の製造方法によつて作製した
サーマルヘツドの構造の一例を示す斜視図であ
り、1は表面に露出している抵抗体層、2は絶縁
体、3は外部から電気信号を入力するため外部接
続用の電極を示している。この図で抵抗体1と絶
縁体2は完全に一体化したセラミツクになつてい
る。 FIG. 1 is a perspective view showing an example of the structure of a thermal head manufactured by the manufacturing method of the present invention, in which 1 is a resistor layer exposed on the surface, 2 is an insulator, and 3 is an externally connected It shows electrodes for external connection for inputting signals. In this figure, the resistor 1 and the insulator 2 are completely integrated into ceramic.
第2図は第1図のサーマルヘツドの断面を図示
したものでaは第1図の点線で示した部分の断面
を表わし、bは同じく第1図の一点鎖線の部分の
断面を示している。第2図aの1は抵抗体、2は
絶縁体、第2図bの4は内部導体4′はスルーホ
ールを示している。 Figure 2 shows a cross section of the thermal head in Figure 1, where a represents the cross section of the portion indicated by the dotted line in Figure 1, and b represents the cross section of the portion indicated by the dashed-dotted line in Figure 1. . In FIG. 2a, 1 is a resistor, 2 is an insulator, and 4 in FIG. 2b is an internal conductor 4' is a through hole.
第1図、第2図から明らかなように、本発明の
構造によるサーマルヘツドでは発熱抵抗体が、絶
縁体の中に埋め込まれた構造になつているため、
抵抗体の摩耗は絶縁体によつて保護され、表面に
耐摩耗層と設けなくても、充分耐摩耗性のある構
造となつている。また抵抗体の大部分が絶縁体内
に埋め込まれているため、抵抗体が断線状態にな
ることが全くない構造になつている。従つて熱の
耐摩耗層による拡散がないため、抵抗体の厚さと
ほぼ等しい解像度が得られる。さらに、従来のサ
ーマルヘツドでは抵抗体の内部に電極が流れて発
熱する場合、抵抗体に幅があり、その幅の中での
抵抗体の厚みのバラツキから発熱量が場所によつ
て変化し、記録した像にムラが生ずることが多か
つた。 As is clear from FIGS. 1 and 2, in the thermal head according to the structure of the present invention, the heating resistor is embedded in the insulator.
The resistor is protected from wear by the insulator, and the structure is sufficiently wear-resistant even without a wear-resistant layer on the surface. Furthermore, since most of the resistor is embedded within the insulator, the structure is such that the resistor never becomes disconnected. Therefore, since there is no diffusion of heat through the wear-resistant layer, a resolution approximately equal to the thickness of the resistor can be obtained. Furthermore, in conventional thermal heads, when the electrode flows inside the resistor and generates heat, the amount of heat generated varies depending on the location due to the width of the resistor and variations in the thickness of the resistor within that width. Unevenness often occurred in the recorded images.
本発明の構造によれば、抵抗体の厚み方向が表
面に露出した構造になつているため、同一ドツド
内の熱は均一となり、濃度ムラも少くなつた。さ
らに本発明のサーマルヘツドは後に実施例の製造
工程で詳しく述べるが、均一な絶縁体生シート上
に均一な抵抗体を、スクリーン印刷法によつて形
成するため、抵抗体の厚さは数ミクロンから数百
ミクロンの厚さまで均一に形成でき、絶縁体生シ
ートも数十ミクロンから数百ミクロンまで均一に
形成できるため、抵抗体の厚さ、抵抗体のピツチ
を非常に細かくすることができ、記録した時の解
像度を従来の6〜8ドツド/mmから、数十ドツ
ド/mmと飛躍的に良くすることができる。 According to the structure of the present invention, since the thickness direction of the resistor is exposed at the surface, heat within the same dot becomes uniform and density unevenness is reduced. Furthermore, the thermal head of the present invention will be described in detail later in the manufacturing process of Examples, but since a uniform resistor is formed on a uniform insulating green sheet by screen printing, the thickness of the resistor is several microns. It is possible to uniformly form insulator sheets from tens of microns to hundreds of microns in thickness, so the thickness of the resistor and the pitch of the resistor can be made extremely fine. The recording resolution can be dramatically improved from the conventional 6 to 8 dots/mm to several tens of dots/mm.
次に本発明の製造方法を図面により説明する。
第3図は本発明の製造工程の工程図を示すもので
ある。 Next, the manufacturing method of the present invention will be explained with reference to the drawings.
FIG. 3 shows a process diagram of the manufacturing process of the present invention.
第3図によつて本製造方法を説明すると、まず
絶縁体粉末を有機ビヒクル中に分散し、泥漿とす
る。この泥漿をドクターブレードを用いたキヤス
テイング法により、絶縁体生シートにする。 The present manufacturing method will be explained with reference to FIG. 3. First, insulator powder is dispersed in an organic vehicle to form a slurry. This slurry is made into an insulating green sheet by a casting method using a doctor blade.
このようにして作成した絶縁体生シートを所定
の大きさに打抜き、導体ペーストを用い、導体パ
ターンの印刷と、予め生シート中に形成されてい
るスルーホール孔中に導体ペーストの充填を行な
う。導体を形成した絶縁グリーンシート上に抵抗
体層を印刷する。 The insulator green sheet thus produced is punched out to a predetermined size, a conductor pattern is printed using conductor paste, and the through holes previously formed in the green sheet are filled with the conductor paste. A resistor layer is printed on the insulating green sheet on which the conductor is formed.
この様にして形成したスルーホール、導体を形
成し、なおかつ抵抗体を印刷した絶縁体生シート
を必要な枚数と、さらに導体とスルーホールのみ
形成した絶縁体生シート、および絶縁体生シート
のみのぞれぞれを、立体配線が形成するように積
層し、熱プレスによつて圧着し、生積層体を形成
する。 The required number of raw insulator sheets with through-holes and conductors formed in this way and printed with resistors, and raw insulator sheets with only conductors and through-holes formed, and raw insulator sheets with only conductors and through-holes formed. Each of them is laminated so as to form three-dimensional wiring, and pressed together by hot pressing to form a green laminate.
生積層体を所定の形状に切断後、脱バインダー
工程を経て焼結し、外部取出電極を焼付けて、積
層セラミツクサーマルヘツドとする。 After the green laminate is cut into a predetermined shape, it is sintered through a binder removal process, and the external electrodes are baked to form a laminated ceramic thermal head.
この様な製造方法によるため、絶縁生シートお
よび抵抗体層の膜厚は数ミクロンから数百ミクロ
ンと広い範囲で生シートを形成することができる
ため、焼結後の抵抗体の厚さ、となりの抵抗体と
の間隔を数ミクロンから数ミリと広範囲に自由に
選ぶことができる。特に抵抗体の厚さ、絶縁体の
厚さを薄くすることによつて、数十ドツド/mm以
上の解像度を実現できる。 Due to this manufacturing method, it is possible to form raw insulating sheets and resistor layers with a wide range of film thickness from several microns to several hundred microns, so the thickness of the resistor after sintering can be The distance between the resistor and the resistor can be freely selected from a wide range from several microns to several millimeters. In particular, by reducing the thickness of the resistor and insulator, a resolution of several tens of dots/mm or more can be achieved.
また本製造方法によつて、抵抗体を発熱させる
ために必要な配線をスルーホールを介して、立体
的に形成することができるため、従来の配線の様
な非常に高度な厚膜、薄膜の技術を用いることな
く、信頼性良く、小型に歩留良くサーマルヘツド
を製造することができる。 Additionally, with this manufacturing method, the wiring required to generate heat in the resistor can be formed three-dimensionally through through-holes, making it possible to create very advanced thick-film or thin-film wiring, unlike conventional wiring. A thermal head can be manufactured with high reliability, small size, and high yield without using any technology.
また第4図は本発明製造工程のうち積層工程で
積層する生シート(イ〜オ)を積層順に示したも
ので1は絶縁体生シート、2は導体、3は印刷に
よつて形成した抵抗体層、4はスルーホールを示
している。また生シートイ,オはスルーホールの
みを形成した層、生シートロとルは導体層および
スルーホールを形成した層、生シートハ〜ヌは抵
抗体層、導体層、スルーホールのいずれもが形成
されている絶縁生シートである。なお生シートヘ
〜チは必要に応じて、積層数を増減して積層を行
う。 In addition, Figure 4 shows the raw sheets (I to O) that are laminated in the lamination step of the manufacturing process of the present invention in the order of lamination, where 1 is an insulator raw sheet, 2 is a conductor, and 3 is a resistor formed by printing. Body layer 4 indicates a through hole. In addition, the raw sheets I and O are layers with only through holes formed, the raw sheets TOL are layers with a conductor layer and through holes formed, and the raw sheets H~N are layers with all of the resistor layer, conductor layer, and through holes formed. This is a raw insulating sheet. Note that the number of layers of raw sheets can be increased or decreased as necessary.
なお第4図は図を解り易くするために1素子当
りの絶縁体生シート部分を示しているが、実際に
製造する場合は、第4図のパターンが平面上に多
数回くり返されたパターン印刷し、一度の積層に
よつて、数十から数百の積層セラミツクサーマル
ヘツドを作ることができる。 Note that Fig. 4 shows the raw insulator sheet portion per element to make the diagram easier to understand, but in actual manufacturing, the pattern in Fig. 4 is repeated many times on a plane. Tens to hundreds of laminated ceramic thermal heads can be made by printing and laminating in one go.
このように積層技術によつて、サーマルヘツド
を作ると、一回の積層によつて多数のサーマルヘ
ツドを作ることができるので、1個当りの単価が
従来方法よりも著しく安価になり、量産化も可能
である。 When thermal heads are made using lamination technology in this way, a large number of thermal heads can be made in one lamination process, so the cost per unit becomes significantly cheaper than with conventional methods, making mass production possible. is also possible.
次に本発明を実施例により詳細に説明する。 Next, the present invention will be explained in detail with reference to examples.
実施例 1
絶縁体材料として、アルミナ−結晶化ガラス混
合物を使用した。アルミナ50wt%、ホウケイ酸
鉛系結晶化ガラス50wt%の粉末をボールミルで
湿式混合した後、過乾燥し、絶縁体粉末とし
た。Example 1 An alumina-crystalline glass mixture was used as the insulator material. Powders of 50 wt% alumina and 50 wt% borosilicate lead crystallized glass were wet mixed in a ball mill, and then overdried to obtain insulating powder.
絶縁体粉末を有機ビヒクル中に分散し泥漿と
し、これをドクターブレートを用いたキヤステイ
ング法により、膜厚が20μm〜500μmの絶縁体生
シートを作製した。なお有機ビヒクルのバインダ
ーとしてはポリビニルブチラールを使用し、溶媒
は多価アルコールのエステルを用いた。 An insulator powder was dispersed in an organic vehicle to form a slurry, and a green insulator sheet having a thickness of 20 μm to 500 μm was produced by casting the slurry using a doctor blade. Note that polyvinyl butyral was used as the binder of the organic vehicle, and polyhydric alcohol ester was used as the solvent.
絶縁体生シートを金型を用い、外形およびスル
ーホールを打抜き、この上にスクリーン印刷法に
より、銀−パラジウム合金のペーストを用い、配
線パターンとスルーホールの孔うめパターンを印
刷した。次に抵抗体ペーストをスクリーン印刷法
により印刷し、絶縁体生シート上に抵抗体層を形
成した。抵抗体ペーストとしては酸化ルテニユウ
ム系ペーストを使用した。 The outer shape and through holes were punched out of the insulating raw sheet using a mold, and a wiring pattern and a hole filling pattern for the through holes were printed thereon by screen printing using a silver-palladium alloy paste. Next, a resistor paste was printed by a screen printing method to form a resistor layer on the insulator raw sheet. Ruthenium oxide paste was used as the resistor paste.
このようにして作つた抵抗体シートを印刷し導
体を形成した絶縁体生シートと導体の形成のみを
行つた絶縁生シートおよび必要な場合はスルーホ
ールの形成のみの絶縁体生シートなどを所定の数
だけ金型に入れて積層、熱圧着を行つた。 A raw insulator sheet on which a conductor was formed by printing the resistor sheet made in this way, a raw insulator sheet on which only a conductor was formed, and a raw insulator sheet on which only through holes were formed if necessary, etc. A few pieces were placed in a mold, laminated, and bonded under heat.
積層の終つた生積層体を5mm×10mmの寸法に切
断し、500℃で脱バインダー後、800℃〜1000℃の
温度で焼結した。 After lamination, the green laminate was cut into a size of 5 mm x 10 mm, and after removing the binder at 500°C, it was sintered at a temperature of 800°C to 1000°C.
焼成の終つた焼結積層体に外部取出電極を焼付
け、感熱紙に接触する抵抗体の露出した面を鏡面
に研摩した後、リード線を取付けサーマルヘツド
とした。 After baking an external electrode on the sintered laminate that had been fired, and polishing the exposed surface of the resistor in contact with the thermal paper to a mirror finish, a lead wire was attached to form a thermal head.
出来上つたサーマルヘツドをサーマルプリンタ
にセツトし、動作試験を行つたところ10ドツド/
mm〜50ドツド/mmの解像度が得られ、充分実用に
なり、しかも従来のサーマルヘツドに比べ、著し
く改善された解像度を示すことがわかつた。 When the completed thermal head was set in a thermal printer and an operation test was performed, it produced 10 dots/print.
It was found that a resolution of mm to 50 dots/mm was obtained, which is sufficient for practical use, and also shows a significantly improved resolution compared to conventional thermal heads.
実施例 2
絶縁体材料として、アルミナ−結晶化ガラス混
合物を用いた。純度99.9%以上のアルミナ56wt%
とホウケイ酸鉛系結晶化ガラス44wt%を秤量し、
ボールミルで湿式混合を行い、過乾燥後絶縁体
粉末とした。Example 2 An alumina-crystalline glass mixture was used as the insulator material. Alumina 56wt% with purity over 99.9%
Weighed 44wt% of lead borosilicate crystallized glass,
Wet mixing was performed in a ball mill, and after drying, an insulator powder was obtained.
この絶縁体粉末を有機ビヒクル中に分散し泥漿
とし、これをドクターブレードを用いたキヤステ
イング法により膜厚が20μm〜500μmの絶縁体生
シートを作成した。なお、有機ビヒクルのバイン
ダーとしては、ポリビニルアルコールを使用し、
溶媒は水を用いた。 This insulating powder was dispersed in an organic vehicle to form a slurry, and a green insulating sheet having a thickness of 20 μm to 500 μm was prepared by casting the slurry using a doctor blade. In addition, polyvinyl alcohol is used as the binder for the organic vehicle.
Water was used as the solvent.
絶縁体生シートを金型を用い、外形およびスル
ーホールを打抜き、この上にスクリーン印刷法に
より、金ペーストを用い配線パターンとスルーホ
ール孔うめパターンを印刷した。 The outer shape and through holes were punched out of the raw insulator sheet using a mold, and a wiring pattern and a through hole filling pattern were printed thereon using gold paste by screen printing.
次に導体を形成した絶縁体生シートの上にさら
に、ルテニユウム系抵抗体ペーストを用い、所定
の位置にスクリーン印刷法によつて抵抗体層を形
成した。抵抗体層の厚さは6μm〜100μmとし、
抵抗体層が厚い場合には重ね印刷を行つた。 Next, on the insulating green sheet on which the conductor was formed, a resistor layer was further formed at a predetermined position by screen printing using a ruthenium-based resistor paste. The thickness of the resistor layer is 6 μm to 100 μm,
When the resistor layer was thick, overprinting was performed.
このようにして作つた抵抗体層、導体層を形成
した絶縁生シートと導体の形成のみを行つた絶縁
生シートおよび、必要な場合はスルーホール形成
のみの絶縁体生シートなどを所定の数だけ金型に
入れ、積層熱圧着を行つた。 A predetermined number of raw insulating sheets with resistor layers, conductor layers formed in this way, insulating raw sheets with only conductor formation, and insulating raw sheets with only through-holes formed if necessary. It was placed in a mold and laminated and thermocompressed.
積層の終つた生積層体を5mm×10mmの寸法に切
断し、500℃で脱バインダーを行つた後800℃〜
1000℃の温度で焼結した。 After lamination, the raw laminate is cut into 5 mm x 10 mm dimensions, and the binder is removed at 500°C, followed by heating at 800°C.
Sintered at a temperature of 1000℃.
焼成の終つた焼結積層体に外部取出電極を焼付
け、感熱紙に接触する面を鏡面に研摩した後、リ
ード線を取付け、サーマルヘツドとした。 External electrodes were baked on the sintered laminate after firing, and the surface in contact with the thermal paper was polished to a mirror finish, and then lead wires were attached to form a thermal head.
出来上つたサーマルヘツドをサーマルプリンタ
にセツトし、動作試験を行つたところ、10ドツ
ド/mm〜30ドツド/mmの解像度が得られ、充分実
用になり、しかも、従来のサーマルヘツドに比ら
べ、著しく改善された解像度を示すことがわかつ
た。 When the completed thermal head was set in a thermal printer and an operation test was performed, a resolution of 10 dots/mm to 30 dots/mm was obtained, making it fully practical, and moreover, compared to conventional thermal heads. It was found to exhibit significantly improved resolution.
以上述べた様に本発明の製造方法による積層セ
ラミツクサーマルヘツドは、従来のサーマルヘツ
ドでは実現できない様な解像度で、小型高信頼化
を実現し、かつ、量産化が可能で、コストダウン
もできる優れたサーマルヘツドであることが明ら
かになつた。 As described above, the laminated ceramic thermal head manufactured by the manufacturing method of the present invention has the advantage of achieving a resolution that cannot be achieved with conventional thermal heads, being compact and highly reliable, mass-produced, and reducing costs. It turned out to be a thermal head.
第1図は本発明の製造方法によつて作製した積
層セラミツクサーマルヘツドの実施例の斜視図で
ある。第2図は第1図の積層セラミツクサーマル
ヘツドの断面図を示し、aは第1図破線の部分の
断面、bは第1図の一点鎖線の部分の断面を示
す。第3図は本発明の積層セラミツクサーマルヘ
ツドの製造工程を示す図である。第4図は本発明
の積層セラミツクサーマルヘツドの積層工程での
生シートの積層の順を示した図である。
各図において、1は抵抗体、2は絶縁体、3は
外部取出電極、4は内部導体、4′はスルーホー
ルである。
FIG. 1 is a perspective view of an embodiment of a laminated ceramic thermal head manufactured by the manufacturing method of the present invention. FIG. 2 shows a cross-sectional view of the laminated ceramic thermal head of FIG. 1, where a shows the cross-section of the portion indicated by the broken line in FIG. FIG. 3 is a diagram showing the manufacturing process of the laminated ceramic thermal head of the present invention. FIG. 4 is a diagram showing the order of stacking green sheets in the stacking process of the laminated ceramic thermal head of the present invention. In each figure, 1 is a resistor, 2 is an insulator, 3 is an external lead electrode, 4 is an internal conductor, and 4' is a through hole.
Claims (1)
シートに孔を穿設する工程と、該孔に導電体物質
を充填すると同時に導体層を絶縁体生シート上に
形成する工程と絶縁体生シート上に抵抗体層を印
刷により形成する工程と抵抗体層と導体層を形成
した絶縁体生シートと導体層のみ形成した絶縁体
生シートと絶縁体生シートとを積層圧着し、積層
体を形成する工程と前記積層体を所定の寸法に切
断し、焼結する工程と焼結した積層体に外部取出
電極を付ける工程と該焼結体の所定の面を研摩す
る工程を有することを特徴とする積層セラミツク
サーマルヘツドの製造方法。1. A step of forming a green insulator sheet, a step of drilling a hole in the green insulator sheet, a step of filling the hole with a conductive material and simultaneously forming a conductor layer on the green insulator sheet, and a step of forming a conductor layer on the green insulator sheet. A process of forming a resistor layer on a sheet by printing, and laminating and pressing a raw insulator sheet with a resistor layer and a conductor layer formed thereon, a raw insulator sheet with only a conductor layer formed thereon, and a raw insulator sheet to form a laminate. It is characterized by comprising the steps of: forming the laminate, cutting the laminate into predetermined dimensions and sintering it, attaching an external electrode to the sintered laminate, and polishing a predetermined surface of the sintered body. A method for manufacturing a laminated ceramic thermal head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57181118A JPS5970591A (en) | 1982-10-15 | 1982-10-15 | Manufacture of laminate ceramic thermal head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57181118A JPS5970591A (en) | 1982-10-15 | 1982-10-15 | Manufacture of laminate ceramic thermal head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5970591A JPS5970591A (en) | 1984-04-21 |
| JPH0419032B2 true JPH0419032B2 (en) | 1992-03-30 |
Family
ID=16095160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57181118A Granted JPS5970591A (en) | 1982-10-15 | 1982-10-15 | Manufacture of laminate ceramic thermal head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5970591A (en) |
-
1982
- 1982-10-15 JP JP57181118A patent/JPS5970591A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5970591A (en) | 1984-04-21 |
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