JPH04190967A - Atmosphere furnace - Google Patents
Atmosphere furnaceInfo
- Publication number
- JPH04190967A JPH04190967A JP2318495A JP31849590A JPH04190967A JP H04190967 A JPH04190967 A JP H04190967A JP 2318495 A JP2318495 A JP 2318495A JP 31849590 A JP31849590 A JP 31849590A JP H04190967 A JPH04190967 A JP H04190967A
- Authority
- JP
- Japan
- Prior art keywords
- furnace
- oxygen
- gas
- concentration
- buffer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Sampling And Sample Adjustment (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、連続熱処理を行い、炉内を不活性雰囲気とし
た炉1例えば、N2ガス・リフロー装置等の雰囲気炉に
関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a furnace 1 that performs continuous heat treatment and has an inert atmosphere inside the furnace, such as an atmospheric furnace such as a N2 gas reflow apparatus.
従来の技術
従来、電子部品リフロー装置や厚膜ハイブリッドIC基
板焼成炉等においては、基板に印刷されたCu等の導体
が、炉中での加熱処理中に酸化さ打ることを防ぐ目的で
、窒素ガス(N)、グリ−・ス(N2. N2)等の不
活性ガスを抽入し、炉内の酸素濃度を低く一定に保持す
ることが試みられてきしかしながら、メンシュヘルド、
多数のローラ。Conventional technology Conventionally, in electronic component reflow equipment, thick film hybrid IC substrate firing furnaces, etc., in order to prevent conductors such as Cu printed on the substrate from being oxidized during heat treatment in the furnace, Attempts have been made to keep the oxygen concentration in the furnace low and constant by injecting inert gases such as nitrogen gas (N) and grease (N2.N2).
A large number of rollers.
チェーンベルト等により被加熱物を連続搬送する高炉の
出入口に開口部が存在し、炉内の不活性ガスを毎日大量
に抽入口なけれずならず、ランニングコストか高くつい
ていた。このため、炉の出入口に被加熱物か通過すると
きのみ開口するシャッター部を設けたり、また、実開昭
63−180076号公報に開示されているように炉の
出入口にバッファを設け、被加熱物を炉内へ搬入または
、炉外へ搬出する時には、バッファ内に被加熱物を入れ
密閉し、バッファ内の気体を真空吸引することで、N2
ガスの消費量を低く押さえる試みかされてきた。There is an opening at the entrance and exit of the blast furnace, which continuously conveys the heated material using a chain belt, etc., and a large amount of inert gas in the furnace must be injected every day, resulting in high running costs. For this reason, a shutter part that opens only when the object to be heated is passed through the entrance and exit of the furnace is provided, or a buffer is provided at the entrance and exit of the furnace as disclosed in Japanese Utility Model Application Publication No. 180076/1983. When carrying objects into or out of the furnace, the objects to be heated are placed in a buffer and sealed, and the gas in the buffer is vacuum-sucked to remove N2.
Attempts have been made to keep gas consumption low.
発明が解決しようとする課題
しかしながら、前記真空バッファ、シャッター等の利用
においても炉内雰囲気ガスは、被加熱物の搬入搬出に伴
い、徐々に炉外へ拡散消費されていく。このため、炉内
02濃度を監視するとともに、不活性雰囲気ガスを供給
する設備を工場内に依然として必要としていた。Problems to be Solved by the Invention However, even when the vacuum buffer, shutter, etc. are used, the atmosphere gas inside the furnace is gradually diffused and consumed outside the furnace as the object to be heated is brought in and taken out. For this reason, equipment for monitoring the O2 concentration in the furnace and for supplying an inert atmosphere gas was still required within the factory.
課題を解決するための手段
本発明では、上記課題を解決するため、第1に炉壁に開
孔部を設け、炉内雰囲気ガスを循環させる経路と、経路
途中にガス内の02を除去する触媒を詰めた管路を設け
、かつ炉内に酸素濃度を検出するセンサーを備えたもの
である。Means for Solving the Problems In the present invention, in order to solve the above problems, firstly, an opening is provided in the furnace wall to provide a path for circulating the furnace atmosphere gas and to remove 02 in the gas in the middle of the path. It is equipped with a pipe line filled with catalyst and a sensor inside the furnace to detect the oxygen concentration.
第2には、複数の02除去触媒管を円周上または並設し
位置をずらすと、新規の02除去触媒管に、経路口が接
続されるよう保持したものである。Second, when a plurality of 02 removal catalyst tubes are arranged circumferentially or in parallel and their positions are shifted, the passage port is held so as to be connected to a new 02 removal catalyst tube.
作用
本発明は上記構成により、炉雰囲気中の酸素濃度を検出
し、所定の酸素濃度から逸脱した場合、炉内ガスを循環
させ、酸素を触媒により除去する。炉内酸素濃度が所定
値となった時に動作を停止するものである。Operation The present invention has the above configuration to detect the oxygen concentration in the furnace atmosphere, and when the oxygen concentration deviates from a predetermined oxygen concentration, the furnace gas is circulated and the oxygen is removed by the catalyst. The operation is stopped when the oxygen concentration in the furnace reaches a predetermined value.
かつ、触媒管が使用済となる直前にて、他の触媒管と交
替することで、連続的な炉内酸素濃度維持を行う。In addition, just before a catalyst tube becomes used up, it is replaced with another catalyst tube to continuously maintain the oxygen concentration in the furnace.
実施例
(実施例1)
次に本発明を図面を用いて説明する。第1図は、入口出
口部にンヤッターを備えた不活性ガス雰囲気炉の場合を
示す。本加熱または焼成帯1、予備加熱またはベーンア
ウト帯2、炉底部に設けた炉内搬送部3゜電子基板等の
被加熱物冷却部4からなる雰囲気炉において、入口部シ
ャンク−5、出口部シャッター6、シャンター開閉用ノ
リンダ−7,8、さらに、炉内の酸素濃度を検出するセ
ンサー9a、9b、炉内空気か循環するダクト10、炉
内ガスを送風するポンプ11、ポンプ11を作動、停止
させるコントロール部12、酸素を除去する触媒(例え
ばNi触媒)をつめた管]3とからなる。Example (Example 1) Next, the present invention will be explained using the drawings. FIG. 1 shows an inert gas atmosphere furnace equipped with a dryer at the inlet and outlet. In an atmospheric furnace consisting of a main heating or firing zone 1, a preheating or vane-out zone 2, an in-furnace conveying section 3 provided at the bottom of the furnace, and a cooling section 4 for the object to be heated such as an electronic board, an inlet shank 5, an outlet section Shutter 6, shunter opening/closing nolinders 7, 8, sensors 9a, 9b for detecting oxygen concentration in the furnace, duct 10 for circulating air in the furnace, pump 11 for blowing gas in the furnace, operating pump 11, It consists of a control unit 12 for stopping the operation, and a tube 3 filled with a catalyst (for example, Ni catalyst) for removing oxygen.
尚、14は加熱処理対象(本図はクリーム半田上に電子
部品を載せたリフロー処理前型子基板)、15は装入コ
ンベアである。Note that 14 is an object to be heat treated (the figure shows a pre-reflow molded board with electronic components mounted on cream solder), and 15 is a charging conveyor.
pノ下に前記構成からなる雰囲気炉の動作について説明
する。The operation of the atmospheric furnace having the above configuration will be explained below.
ます前記のように、基板14かコンヘア15によって撤
退されてくると、入ロンヤッター5をンリンダ−7によ
って開口し、搬送ヘルド3(チェーン・ローラ等の搬送
方式でもよい)により基板14を炉内へ装入し、予備加
熱部27本加熱部1により加熱処理した後、冷却部4に
よって所定の温度(プリント基板の場合100℃前後)
にまで基板を冷却した後、出口シャッター6を開いて基
板14を搬出する。As mentioned above, when the substrate 14 is withdrawn by the converter 15, the inlet iron yatter 5 is opened by the unlinder 7, and the substrate 14 is moved into the furnace by the conveyor heald 3 (a conveyor system such as a chain roller may also be used). After being heated in the preheating section 27 and heating section 1, it is heated to a predetermined temperature (approximately 100°C in the case of printed circuit boards) in the cooling section 4.
After the substrate has been cooled down to a certain temperature, the exit shutter 6 is opened and the substrate 14 is carried out.
連続処理中、炉内の酸素濃度は1つないし複数の酸素濃
度センサー9 (9a、9b)によって監視し7ており
、所定の酸素濃度(例えば50ppm)以上となった時
、コントロール部12よリフアン11を始動させる命令
が出され、炉内ガス循環ダクト10を通じ、炉内ガスを
循環させる。ダクト10の途中に設けられた酸素除去触
媒13によって、炉内ガス中の酸素は除去され、炉内の
酸素濃度が所定の値になった時、コントロール部12に
よりファン11は停止される。以上により、炉内の酸素
濃度は任意の一定の値に保たれる。触媒を作用させるの
は間欠動作となり、一定量の酸素除去を行った後、酸素
除去触媒は再生するため交換されるが、その頻度は少な
い。During continuous processing, the oxygen concentration in the furnace is monitored by one or more oxygen concentration sensors 9 (9a, 9b), and when the oxygen concentration reaches a predetermined level (for example, 50 ppm) or higher, the control unit 12 triggers a reset. 11 is issued to circulate the furnace gas through the furnace gas circulation duct 10. Oxygen in the furnace gas is removed by an oxygen removal catalyst 13 provided in the middle of the duct 10, and when the oxygen concentration in the furnace reaches a predetermined value, the fan 11 is stopped by the control unit 12. As described above, the oxygen concentration in the furnace is maintained at an arbitrary constant value. The catalyst is operated intermittently, and after a certain amount of oxygen has been removed, the oxygen removal catalyst is replaced for regeneration, but this is done infrequently.
(実施例2)
次に第2図に示す雰囲気炉における適用例を示す。実施
例1と異なるのは、入口部シャッタ=5、出口部シャッ
ター6の代わりに真空バッファ16(入口部)および真
空バッファ17を設けている雰囲気炉であり、この前後
の真空バッファ内部から、炉内に設けられた前部ダクh
lOa、後部ダクト10bが備えられている。(Example 2) Next, an example of application in an atmospheric furnace shown in FIG. 2 will be described. The difference from Embodiment 1 is that the atmosphere furnace is provided with a vacuum buffer 16 (inlet) and a vacuum buffer 17 instead of an inlet shutter 5 and an outlet shutter 6, and the furnace can be accessed from inside the vacuum buffers before and after this. Front duct h provided inside
lOa and a rear duct 10b are provided.
前記実施例のように基板14を炉入口部に近づくと、装
入側真空バッファ16のシャッター16aを開け、基板
14か装入側真空バッファ16内に入ると、シャッター
16aを閉じ(シャッター16bは閉じられている。)
、ここで真空バッファ16内の空気を排気しダクト10
aを通じ、ポンプllaによって排気された空気を酸素
除去触媒13に通し、所定02濃度以下のガスとした後
、炉中に排気する。この場合、真空バッファ16内に排
気ガスを戻してもよい。As in the above embodiment, when the substrate 14 approaches the furnace inlet, the shutter 16a of the charging side vacuum buffer 16 is opened, and when the substrate 14 enters the charging side vacuum buffer 16, the shutter 16a is closed (the shutter 16b is closed). closed.)
, here the air in the vacuum buffer 16 is exhausted and the duct 10
The air exhausted by pump lla is passed through oxygen removal catalyst 13 through a, and after being made into a gas having a predetermined 02 concentration or less, it is exhausted into the furnace. In this case, the exhaust gas may be returned into the vacuum buffer 16.
次に加熱処理の終わった基板14は、後部真空バフ7ア
17の前部シャッター17bを開け、バッファ17内に
搬入される。この時、前記のことくンヤソター17a、
17bを閉した状態でバッファ内の空気をポンプ1.1
bによっテ排気し、ダクト10bを通し、酸素除去触
媒13によって酸素を除去する。以上の動作の後、後部
出口シャッター17bを開け、基板を炉外へ搬出する。Next, the heated substrate 14 is carried into the buffer 17 by opening the front shutter 17b of the rear vacuum buff 7a 17. At this time, the aforementioned Kunyasotar 17a,
Pump the air in the buffer with 17b closed 1.1
The gas is exhausted through duct 10b, and oxygen is removed by oxygen removal catalyst 13. After the above operations, the rear exit shutter 17b is opened and the substrate is carried out of the furnace.
以上で一連の加熱処理か終了するか、炉前後にバッファ
を設けた雰囲気炉においては実施例]の場合に比し、炉
内部への外気の影響はさらに僅少なものとなる。This completes the series of heat treatments, and in the case of an atmospheric furnace in which buffers are provided before and after the furnace, the influence of outside air on the inside of the furnace will be even smaller than in the case of Example].
以上1.2の実施例の両方の炉において、第3図(a)
、(blに02除去装置の構成を示す。同図に示すよう
に、複数の酸素除去触媒管を円周上に配置し、02除去
触媒作用のなくなった触媒管18aを次の新規触媒管1
8bに交替させる為、矢印方向に取手19によって回転
可能な構造をもつ。第4図(at、 fb)、 fcl
に示すように、ここで新規に排気ダクト10の管継部1
0°に新規触媒管18°をワンタッチで挿入するように
管口部18”を2枚の弾性板20a、20bで保持する
。触媒管18aの取り出し時には、弾性板20a、20
bの間隔をおし広げ、所定の位置に新たな触媒管18b
か来ると、軽い弾性力で触媒管18bを固定することか
できる。In both the furnaces of the embodiments 1.2 above, Fig. 3(a)
, (bl shows the configuration of the 02 removal device. As shown in the figure, a plurality of oxygen removal catalyst tubes are arranged on the circumference, and the catalyst tube 18a that has lost the 02 removal catalytic action is replaced with the next new catalyst tube 1.
8b, it has a structure that can be rotated by a handle 19 in the direction of the arrow. Figure 4 (at, fb), fcl
As shown in FIG.
The pipe opening 18'' is held by two elastic plates 20a, 20b so that a new catalyst tube 18° can be inserted at 0° with one touch.When taking out the catalyst tube 18a, the elastic plates 20a, 20
Widen the gap between b and insert a new catalyst tube 18b in the specified position.
In this case, the catalyst tube 18b can be fixed with a light elastic force.
第5図に示す炉体は、前述第4図における触媒管群を円
周上の代わりに平面上に配置し、テーブル22とガイド
23によって直線方向に触媒管群を移動し、触媒管の交
替を行う構造である。In the furnace body shown in FIG. 5, the catalyst tube group in FIG. 4 is arranged on a plane instead of on the circumference, and the catalyst tube group is moved in a straight line by a table 22 and a guide 23, and the catalyst tubes are replaced. It is a structure that performs.
発明の効果
以上の説明で明らかなように、本発明によれば、従来の
ごとく工場内に大がかりな不活性ガス補充(N 2ガス
等)タンク、また配管設備を設ける必要もない。しかも
、N 2ガス等のガスを大量に消費することがなくなり
、ランニングコストが低減する。Effects of the Invention As is clear from the above explanation, according to the present invention, there is no need to provide a large-scale inert gas replenishment tank (for N2 gas, etc.) or piping equipment in the factory, unlike in the past. Furthermore, a large amount of gas such as N 2 gas is not consumed, and running costs are reduced.
さらに、炉内の酸素濃度をセンサーにて監視し、02濃
度を任意に設定できるため、良質な加熱処理(リフロー
、焼成)を行うことかできる。Furthermore, since the oxygen concentration in the furnace is monitored by a sensor and the 02 concentration can be set arbitrarily, high-quality heat treatment (reflow, firing) can be performed.
第1図は第1の実施例の出入口部にシャッターをもつ雰
囲気炉の構成図、第2図は第2の実施例の出入口部に真
空バッファを設け、この真空バッファの空気の02除去
を行う雰囲気炉の構成図、第3図は触媒管を円周上に複
数搭載した0、除去装置の構成図、第4図は第3図の触
媒管固定部の拡大図、第5図は触媒管を平面上に並置し
た場合の構成図である。
1・・・・・・本加熱部、2・・・・・・予熱部、3・
・・・・搬送部、5・・・・・前部ンヤソター、6・・
・・・・後部シャッター、7・・・・・・前部ンヤノタ
ー」二下ンリングー、8・・・・・・後部ンヤッター上
下ンリンダー、9a、9b・・・・・・酸素濃度センサ
ー、10・・・・・通気ダクト、1]・・・・・・ポン
プ、12・・・・・・コントローラ、13・・・・・・
酸素除去装置、14・・・・・・プリント基板、16・
・・・前部真空バッファ、16a・・・・・・前部人ロ
シャソター、16b・・・・・・前部出口シャッター、
17a・・・・・・後部入口シャッター、17b・・・
・・・後部出口シャッター、18・・・・・酸素除去触
媒管、19・・・・・レバー、20a、20 b・・・
・・・入口ガイド、22・・・・・・プレート、23・
・・・・・LMガイド。
代理人の氏名 弁理士小蝦治明 ほか2名cq
伯雛
13 図
8b
第4図
室 5 図Fig. 1 is a block diagram of an atmosphere furnace having a shutter at the entrance and exit of the first embodiment, and Fig. 2 shows a vacuum buffer provided at the entrance and exit of the second embodiment, and the air in this vacuum buffer is removed by 02. A configuration diagram of an atmospheric furnace, Figure 3 is a configuration diagram of a removal device with multiple catalyst tubes mounted on the circumference, Figure 4 is an enlarged view of the catalyst tube fixing part in Figure 3, and Figure 5 is a diagram of a catalyst tube. It is a block diagram when these are arranged side by side on a plane. 1...Main heating section, 2...Preheating section, 3.
...Conveyance section, 5...Front nya soter, 6...
... Rear shutter, 7...Front rear shutter, 8...Rear upper and lower shutters, 9a, 9b...Oxygen concentration sensor, 10... ...Ventilation duct, 1]...Pump, 12...Controller, 13...
Oxygen removal device, 14... Printed circuit board, 16.
...Front vacuum buffer, 16a...Front Rochasota, 16b...Front exit shutter,
17a... Rear entrance shutter, 17b...
...Rear exit shutter, 18...Oxygen removal catalyst pipe, 19...Lever, 20a, 20b...
...Entrance guide, 22...Plate, 23.
...LM Guide. Name of agent: Patent attorney Haruaki Koebi and 2 otherscq
Hakuhina 13 Figure 8b Figure 4 Room 5 Figure
Claims (4)
熱する加熱手段と、被加熱物を搬送する搬送手段とを有
し、炉内雰囲気をN_2ガス等の不活性ガス体である雰
囲気炉において、1.炉内のガス体を循環させる循環手
段と2.前記循環中のガス体より酸素を除去する手段と
3.炉内の酸素濃度を測定する手段と4.炉内を所定の
酸素濃度に保つ為、炉内酸素濃度に応じて1.炉内ガス
循環手段を動作させるコントロール手段を備えた事を特
徴とする雰囲気炉。(1) For reflow soldering of electronic circuit boards, etc., the furnace has a heating means for heating the object to be heated and a transport means for transporting the object, and the atmosphere inside the furnace is an inert gas such as N_2 gas. In the furnace, 1. 2. a circulation means for circulating the gas in the furnace; 3. means for removing oxygen from the circulating gaseous body; 4. means for measuring oxygen concentration in the furnace; In order to maintain the oxygen concentration inside the furnace at a predetermined level, 1. An atmosphere furnace characterized by comprising a control means for operating an in-furnace gas circulation means.
部に被加熱物を密閉・開放することのできるバッファ部
と前記バッファ内の気体を排気する孔部とを備え、炉外
部から侵入したバッファ内の酸素を除去する手段を有す
る事を特徴とする雰囲気炉。(2) The apparatus according to claim 1, wherein the inlet and outlet of the furnace are provided with a buffer part capable of sealing and opening the object to be heated, and a hole part for exhausting gas in the buffer. An atmospheric furnace characterized by having means for removing oxygen that has entered the buffer.
素除去を可能とする為に複数の酸素除去部を備え、使用
済の酸素除去部と未使用の酸素除去部を円周上に配置し
たことを特徴とする雰囲気炉。(3) In order to enable continuous oxygen removal in the apparatus according to claims 1 or 2, a plurality of oxygen removal sections are provided, and used oxygen removal sections and unused oxygen removal sections are arranged on the circumference. An atmosphere furnace characterized by the following.
を平面状に配置した事を特徴とする雰囲気炉。(4) An atmospheric furnace according to claim 3, characterized in that a plurality of oxygen removing sections are arranged in a plane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2318495A JPH0747207B2 (en) | 1990-11-22 | 1990-11-22 | Reflow equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2318495A JPH0747207B2 (en) | 1990-11-22 | 1990-11-22 | Reflow equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04190967A true JPH04190967A (en) | 1992-07-09 |
| JPH0747207B2 JPH0747207B2 (en) | 1995-05-24 |
Family
ID=18099762
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2318495A Expired - Lifetime JPH0747207B2 (en) | 1990-11-22 | 1990-11-22 | Reflow equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0747207B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1759798A1 (en) * | 2005-09-02 | 2007-03-07 | Behr GmbH & Co. KG | Installation for manufacturing of brazed components with a continuous furnace and a catalyst |
| CN110434432A (en) * | 2019-08-01 | 2019-11-12 | 东莞市泰丰空调制冷设备有限公司 | Automatic pipeline tee joint structure welding assembly line with leak source detection function |
| CN117587209A (en) * | 2024-01-16 | 2024-02-23 | 新江科技(江苏)有限公司 | A kind of magnesium alloy casting heat treatment equipment |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101469859B1 (en) * | 2014-08-28 | 2014-12-08 | 헬러코리아(주) | Vacuum heating device for circuit board |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56144860A (en) * | 1980-04-14 | 1981-11-11 | Fuji Electric Co Ltd | Conveyor furnace |
| JPS59215269A (en) * | 1983-05-23 | 1984-12-05 | Ishikawajima Harima Heavy Ind Co Ltd | Vacuum furnace device |
| JPS62101372A (en) * | 1985-10-26 | 1987-05-11 | Tamura Seisakusho Co Ltd | Method and device for soldering |
-
1990
- 1990-11-22 JP JP2318495A patent/JPH0747207B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56144860A (en) * | 1980-04-14 | 1981-11-11 | Fuji Electric Co Ltd | Conveyor furnace |
| JPS59215269A (en) * | 1983-05-23 | 1984-12-05 | Ishikawajima Harima Heavy Ind Co Ltd | Vacuum furnace device |
| JPS62101372A (en) * | 1985-10-26 | 1987-05-11 | Tamura Seisakusho Co Ltd | Method and device for soldering |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1759798A1 (en) * | 2005-09-02 | 2007-03-07 | Behr GmbH & Co. KG | Installation for manufacturing of brazed components with a continuous furnace and a catalyst |
| CN110434432A (en) * | 2019-08-01 | 2019-11-12 | 东莞市泰丰空调制冷设备有限公司 | Automatic pipeline tee joint structure welding assembly line with leak source detection function |
| CN110434432B (en) * | 2019-08-01 | 2022-04-19 | 东莞市泰丰空调制冷设备有限公司 | Automatic pipeline tee joint structure welding assembly line with leak source detection function |
| CN117587209A (en) * | 2024-01-16 | 2024-02-23 | 新江科技(江苏)有限公司 | A kind of magnesium alloy casting heat treatment equipment |
| CN117587209B (en) * | 2024-01-16 | 2024-05-14 | 新江科技(江苏)有限公司 | A heat treatment equipment for magnesium alloy castings |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0747207B2 (en) | 1995-05-24 |
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