JPH04193765A - Production of aluminum nitride substrate - Google Patents

Production of aluminum nitride substrate

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Publication number
JPH04193765A
JPH04193765A JP2318081A JP31808190A JPH04193765A JP H04193765 A JPH04193765 A JP H04193765A JP 2318081 A JP2318081 A JP 2318081A JP 31808190 A JP31808190 A JP 31808190A JP H04193765 A JPH04193765 A JP H04193765A
Authority
JP
Japan
Prior art keywords
carbon
aln
temp
aln substrate
firing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2318081A
Other languages
Japanese (ja)
Inventor
Etsuro Udagawa
悦郎 宇田川
Eizo Maeda
榮造 前田
Taku Yamamura
卓 山村
Masato Kumagai
正人 熊谷
Toshihiko Funabashi
敏彦 船橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP2318081A priority Critical patent/JPH04193765A/en
Publication of JPH04193765A publication Critical patent/JPH04193765A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To improve thermal conductivity, electrical insulating property and stability of appearance by sustaining a definite temp. in the case of calcining an AlN substrate in the temp. increasing stage of the calcining temp. pattern and accelerating the decarburization. CONSTITUTION:To an AlN powder consisting of 0.5-1.0wt.% oxygen as impurity and <=0.05wt.% carbon, an oxide sintering aid (e.g. Y2O3) is added to control total quantity of oxygen at 1.0-2.0wt.% and is molded in the presence of an organic binder and calcined to obtain the AlN substrate 4 of <=0.7wt.% residual carbon. Then, into an AlN crucible 2 housed in a crucible 1, a setter 4 laminated with an AlN substrate 3 is disposed and covered with a lid 6 via spacer 5. Then, heat-up is started while blowing gaseous N2 7 from the outside, and when temp. arrives to 1500-1600 deg.C and is sustained for 2-10 hours to accelerate the decarburization, temp. is further increased and sintering is completed.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、ARN (窒化アルミニウム)基板の製造方
法に関し、特に電子部品基板材料として要求の高い、熱
伝導性、電気絶縁性に優れたAlN焼結体の安定した外
観を得るための製造方法に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing an ARN (aluminum nitride) substrate, and particularly relates to a method for manufacturing an ARN (aluminum nitride) substrate. The present invention relates to a manufacturing method for obtaining a stable appearance of a sintered body.

[従来の技術1 高熱伝導性AlN焼結体の用途は、具体的には半導体用
基板を代表とする絶縁材料である。半導体の高集積化、
高速化、高出力化等の動向に伴って、以下のような問題
がクローズアップされてきた。すなわち、 (a)半導体チップの発熱をいかに効率良(系外へ逃す
か。
[Prior Art 1 Highly thermally conductive AlN sintered bodies are specifically used as insulating materials, typified by semiconductor substrates. High integration of semiconductors,
With the trend toward higher speeds and higher outputs, the following problems have come into focus. In other words, (a) How efficiently can the heat generated by the semiconductor chip be released to the outside of the system?

(b)動作精度の向上につれて、基板又はパッケージ部
分の信号の遅延が問題となる。
(b) As operational accuracy improves, signal delays in the substrate or package portion become a problem.

(C)チップザイズの大型化により、チップとの熱膨張
差が大きくなる。
(C) As the chip size increases, the difference in thermal expansion with the chip increases.

(d)高電力チップては使用電圧が増大しており、基板
の絶縁抵抗や絶縁耐圧が問題となりつつある。
(d) The operating voltage of high-power chips is increasing, and the insulation resistance and dielectric strength of the substrate are becoming problems.

半導体素子か抱えるこのような問題を解決するためには
、従来のアルミナに代わる新しい基板又はパッケージ用
の材料が望まれる。このような材料としては、 ■ 熱伝導率か高い。
In order to solve these problems faced by semiconductor devices, a new substrate or package material is desired to replace the conventional alumina. Such materials have: ■ High thermal conductivity.

■ 電気絶縁性に優れる。■Excellent electrical insulation.

■ 高周波特性が良い(低誘電率、低誘電損失)。■ Good high frequency characteristics (low dielectric constant, low dielectric loss).

■ 熱膨張がシリコンに近い。■Thermal expansion is similar to silicon.

■ 化学的に安定である。■ Chemically stable.

■ 機械的な強度が大きい。■ High mechanical strength.

■ 回路形成が容易である。■ Circuit formation is easy.

■ 気密封止ができる。■ Can be airtightly sealed.

などの特性を有することが望ましい。このような要求に
応えつる材料としてAlNが有望視されている。
It is desirable to have the following characteristics. AlN is seen as a promising material that can meet these demands.

ΔffNを基板材料として利用するだめの研究は、非酸
化性の雰囲気において有効な焼結助剤を用いて、先に述
べた特性を得ることにあった。具体的な技術としては、
特公昭46−4.1003号公報に示されるように、Y
203を焼結助剤として用いたり、又は特公昭58−4
9510号公報に示されるように、Cab、Bad、S
r○等を焼結助剤として用い、熱伝導率か100W/m
K程度の焼結体が得られている。
Research into the use of ΔffN as a substrate material has focused on obtaining the properties described above using sintering aids that are effective in non-oxidizing atmospheres. The specific technology is
As shown in Japanese Patent Publication No. 46-4.1003, Y
203 as a sintering aid, or
As shown in Publication No. 9510, Cab, Bad, S
Using r○ etc. as a sintering aid, the thermal conductivity is 100W/m
A sintered body of about K was obtained.

また、窯業協会誌、第25回窯業基礎討論会、ID03
.3HO3(昭和62年1月)では、AffN成形体を
還元雰囲気中、1850〜1950°Cで2〜96時間
焼成することにより、熱伝導率の高い焼結体を得ている
。この方法では一旦焼成した基板を黒鉛ルツボに再充填
して焼成するために製造コストか高いといった問題があ
る。
In addition, Ceramics Association Journal, 25th Ceramics Basics Debate, ID03
.. In 3HO3 (January 1988), a sintered body with high thermal conductivity is obtained by firing an AffN molded body at 1850 to 1950°C for 2 to 96 hours in a reducing atmosphere. This method has a problem in that the manufacturing cost is high because the fired substrate is refilled in a graphite crucible and fired.

特開昭62−52181号公報に、AgNに焼結助剤で
あるY2O3の他に、還元剤として作用するカーボンを
添加することによって熱伝導率が向上するという報告が
ある。
JP-A-62-52181 reports that thermal conductivity is improved by adding carbon, which acts as a reducing agent, to AgN in addition to Y2O3, which is a sintering aid.

残留酸素の低減には、還元剤あるいは還元雰囲気の積極
的な利用が有効であることがわかる。
It can be seen that active use of a reducing agent or reducing atmosphere is effective in reducing residual oxygen.

一方、残留カーボンの低減には、原料粉末合成時の脱炭
工程の最適化や、非酸化性雰囲気でも効率よく除去でき
る有機バインダの選択、あるいは大気中での脱バインダ
などが考えられる。しかし、これらはどれも焼成前の処
理や対応であって、残留カーボンの低減には効果はある
ものの、焼成の際の脱酸素との整合性はかならずしもよ
くない。
On the other hand, possible ways to reduce residual carbon include optimizing the decarburization process during raw material powder synthesis, selecting an organic binder that can be efficiently removed even in a non-oxidizing atmosphere, or debinding in the atmosphere. However, these are all treatments or countermeasures taken before firing, and although they are effective in reducing residual carbon, they are not always compatible with deoxidation during firing.

ずなわぢ、焼成前に十分なカーボンの除去を行うと、焼
成による脱酸素が不十分となり、熱伝導率の低下がみら
れる。また、焼成の際に積極的に還元剤(還元雰囲気)
を利用すると取り残されたカーボンはもぢろん、炉内構
造物から外来のカーボンまで取り込み、焼結体中のカー
ボン量が増加し、絶縁抵抗や絶縁耐圧の低下がみもれる
。
Zunawaji: If sufficient carbon is removed before firing, deoxidation during firing will be insufficient, resulting in a decrease in thermal conductivity. In addition, during firing, we actively use a reducing agent (reducing atmosphere).
If this is used, not only the carbon left behind but also foreign carbon will be taken in from the furnace internal structure, increasing the amount of carbon in the sintered body and causing a decrease in insulation resistance and dielectric strength.

[発明が解決しようとする課題1 従来のY203を始めとする酸化物系焼結助剤を用いた
焼成技術では、 (1)十分な熱伝導率が得られない(特公昭46−41
003号公報、特開昭62−52181号公報)。
[Problem to be solved by the invention 1 With the conventional firing technology using oxide sintering aids such as Y203, (1) Sufficient thermal conductivity cannot be obtained (Japanese Patent Publication No. 46-41
003, JP-A-62-52181).

(2)十分な熱伝導率を得るためには、−度焼成した基
板を黒鉛るつぼに詰め直して再焼成をおこなうため製造
コス1〜が高い(第25回窯業基礎討論会、IDO3,
3I(03)といった問題点がある。
(2) In order to obtain sufficient thermal conductivity, the manufacturing cost is high because the -degree-fired substrate is packed back into the graphite crucible and re-fired (25th Ceramic Industry Basics Forum, IDO3,
There are problems such as 3I (03).

本発明は、焼成時に被焼成品中に含有されている酸素及
びカーボンをどちらか一方の除去、低減にとどまらず、
両者を同時に低減することが可能な焼成技術を提供する
ことにある。
The present invention does not only remove or reduce either oxygen or carbon contained in the fired product during firing, but also
The object of the present invention is to provide a firing technique that can reduce both of these factors at the same time.

[課題を解決するための手段1 本発明では、焼成前に被焼成品が含有する酸素及びカー
ボン不純物を焼成時に効率よ(取除くべく、これら酸素
やカーボンの形態を把握し、あわせて焼成パターンの最
適化を達成した。
[Means for Solving the Problems 1] In the present invention, in order to efficiently remove oxygen and carbon impurities contained in the product to be fired before firing, the form of these oxygen and carbon is grasped, and the firing pattern is adjusted accordingly. Achieved optimization.

すなわち、本発明は、AgN原料粉末にアルミナ等の形
で含まれる酸素不純物、あるいはカーボン不純物、また
グリーンシート成形時に添加される有機バインダの残留
分等を下記の反応を最適化することによって、AlN基
板の焼成時に、被焼成品内の酸素、カーボンを系外に取
除くことを可能にした。
That is, the present invention removes oxygen impurities or carbon impurities contained in the AgN raw material powder in the form of alumina or the like, and the residual amount of organic binder added during green sheet forming by optimizing the following reaction. When firing the substrate, it is possible to remove oxygen and carbon from the fired product to the outside of the system.

酸素不純物(酸化物) +C(内部のカーボン)−COT ・・・・・・(1) 具体的には、焼成温度パターンのうち、昇温過程におけ
る適当な温度において、一定温度に保持する保持工程を
設け、脱炭を促進することを特徴とするAlN基板の製
造方法である。
Oxygen impurities (oxides) +C (internal carbon) -COT (1) Specifically, a holding step in which the temperature is maintained at a constant temperature at an appropriate temperature during the heating process in the firing temperature pattern. This is a method for manufacturing an AlN substrate, characterized in that a method is provided to promote decarburization.

この場合、上記保持工程は好適には1500〜1700
 ’C12〜10時間とするのがよい。
In this case, the holding step is preferably performed at a temperature of 1500 to 1700
'C12 to 10 hours is preferable.

また、含有酸素不純物の量が0,5〜1.0重量%、カ
ーボン量が0.05重量%以下の原料粉末を用い、酸化
物焼結助剤を添加した時点での全酸素量を1.0〜2.
0重量%とし、さらにグリーンシート成形時に添加した
有機バインダの除去後の残留カーボン量を0.7重量%
以下とするのが好適である。さらにAlN基板から発生
したガスの排出量を調整すると好適である。
In addition, using raw material powder containing 0.5 to 1.0% by weight of oxygen impurities and 0.05% by weight or less of carbon, the total oxygen content at the time of adding the oxide sintering aid is 1. .0~2.
0% by weight, and the amount of residual carbon after removing the organic binder added during green sheet molding is 0.7% by weight.
The following is preferable. Furthermore, it is preferable to adjust the amount of gas discharged from the AlN substrate.

[作用] 本発明によって製造されるAlN焼結体は、熱伝導率が
高(、絶縁抵抗、絶縁耐圧等の電気的特性は、アルミナ
と同程度であった。
[Function] The AlN sintered body produced according to the present invention had high thermal conductivity (and electrical properties such as insulation resistance and dielectric strength were comparable to those of alumina).

本発明では、上記(1)式で示した脱炭反応において、
酸素及びカーボンの形態を杷握したうえで、途中保持の
最適な温度、時間の範囲を限定した。また、発生したガ
スの系外への除去(Coガス圧の制御)は、上記(1)
式で示した脱炭反応の促進に重要であり、排出速度の制
御により達成された。
In the present invention, in the decarburization reaction shown by the above formula (1),
After controlling the forms of oxygen and carbon, we limited the optimal temperature and time range for intermediate holding. In addition, the removal of the generated gas from the system (control of Co gas pressure) is as described in (1) above.
This is important for promoting the decarburization reaction shown in the equation, and was achieved by controlling the discharge rate.

カーボンに関しては、原料粉末の合成時に混入したもの
と、成形時に添加した有機バインダの残留物とでは、酸
化反応の温度や時間の幅が異なり、したがってCOガス
発生のタイミングも違う。また、焼結を促進する液相が
形成される温度(1700℃後半)に達すると、カーボ
ンの除去は困難になる。
Regarding carbon, the temperature and time range of the oxidation reaction are different depending on what is mixed in during the synthesis of the raw material powder and the residue of the organic binder added during molding, and therefore the timing of CO gas generation is also different. Further, when the temperature (late 1700° C.) at which a liquid phase that promotes sintering is formed is reached, it becomes difficult to remove carbon.

そこで、有機バインダ起因のカーボンの酸化ピークであ
る15oO〜16oo℃、原料粉末合成時に混入したカ
ーボンの酸化ピークである1700’C前半において、
昇温過程で保持を設けることによって、COガスを十分
に発生させた。
Therefore, at 15oO to 16oooC, which is the oxidation peak of carbon caused by the organic binder, and in the first half of 1700'C, which is the oxidation peak of carbon mixed during raw material powder synthesis,
By providing a hold during the temperature raising process, sufficient CO gas was generated.

このことによって、外部からの積極的な酸化や還元にた
よることなく残留酸素、カーボンの低減を達成すること
ができる。
This makes it possible to reduce residual oxygen and carbon without relying on active oxidation or reduction from the outside.

〔実施例1 実施例−1 平均粒径1,2μm (OAρN粉末(酸素含有量0.
65重量%、カーボン含有量0.02重量%)に、平均
粒径0.5μmのY2O3を2.5重量%添加し、ポリ
ビニルブチラール(PVB)を適量加え、AgNスラリ
ーとした。このスラリーより、ドクターブレード法にて
グリーンシートを成形し、さらに65X65mm角に打
ち抜き加工した。
[Example 1 Example-1 Average particle size 1.2 μm (OAρN powder (oxygen content 0.
65% by weight, carbon content 0.02% by weight), 2.5% by weight of Y2O3 having an average particle size of 0.5 μm was added, and an appropriate amount of polyvinyl butyral (PVB) was added to prepare an AgN slurry. A green sheet was formed from this slurry by a doctor blade method, and further punched into a 65 x 65 mm square.

このグリーンシートを1気圧の窒素気流中、600℃、
3時間で脱脂した。引き続き、第6図に示す焼成炉で、
1気圧の窒素気流中(5(1!/m1n)で、1900
℃、4時間の焼成を行った。第6図の焼成炉は、Ag、
Nコーティングした黒鉛製るつぼ1内にスペーサ5を介
して蓋6をしたるつぼ2を収納し、このAlNるっぽ2
内にはBNセッタ4に焼成すべきAlNシート3を載せ
て加熱焼成する。黒鉛製るっぽlの底部がらN2ガス7
を送入しるつぼ内に窒素気流を形成している。
This green sheet was heated at 600°C in a nitrogen stream of 1 atm.
It was degreased in 3 hours. Subsequently, in the firing furnace shown in Figure 6,
In a nitrogen flow of 1 atm (5 (1!/m1n), 1900
C. for 4 hours. The firing furnace shown in Fig. 6 contains Ag,
A crucible 2 with a lid 6 is placed in an N-coated graphite crucible 1 through a spacer 5, and this AlN crucible 2 is
Inside, the AlN sheet 3 to be fired is placed on the BN setter 4 and heated and fired. N2 gas from the bottom of the graphite Ruppol 7
A nitrogen gas flow is created in the crucible into which the nitrogen gas is introduced.

1バツチ当たりの処理量(本実施例においては7〜8k
g)と脱脂残留カーボン量(本実施例においては0.6
重量%)及びcoガス排出量がら、焼成の際の途中保持
の条件を、1625℃、8時間とした。第2図は従来の
焼成ヒートパターンを示し、これに対して、本発明では
第1図のヒートパターンで焼成する。この時のcoガス
発生量の時間変化も併せて示した。
Processing amount per batch (7 to 8k in this example)
g) and the amount of residual carbon after degreasing (0.6 in this example)
% by weight) and the amount of CO gas discharged, the conditions for holding during firing were 1625° C. for 8 hours. FIG. 2 shows a conventional firing heat pattern, whereas in the present invention, firing is performed using the heat pattern shown in FIG. The time change in the amount of co gas generated at this time is also shown.

得られたAlN基板について、通常のホーニング処理の
後、明度、色調等の外観測定、及び熱伝導率、絶縁抵抗
の測定を行った。結果を第1表及び第5図のNo、1に
示す。
After the obtained AlN substrate was subjected to a normal honing treatment, appearance measurements such as brightness and color tone, and measurements of thermal conductivity and insulation resistance were performed. The results are shown in Table 1 and No. 1 in FIG.

実施例−2 実施例−1と同様に焼成を行い、昇温過程における保持
温度を1450〜1750℃、保持時間を2〜12時間
とした。結果を第1表及び第5図のNo、2−No、1
0に示す。
Example 2 Firing was carried out in the same manner as in Example 1, and the holding temperature in the heating process was 1450 to 1750°C, and the holding time was 2 to 12 hours. The results are No., 2-No., 1 in Table 1 and Figure 5.
0.

比較例−1 第2区に示す温度パターンで実施例−1と同じ/1f2
Nを焼成した。昇温過程における温度保持は行なわず、
従来通りの一段焼成とした。結果を第1表及び第5図の
No、11に示す。
Comparative Example-1 Same as Example-1 with temperature pattern shown in Section 2/1f2
N was fired. The temperature is not maintained during the heating process,
It was fired in one stage as before. The results are shown in Table 1 and No. 11 in FIG.

比較例−2 実施例−1と同様に焼成を行った。ただし1バッチ当り
の処理量を(a)実施例−1の1.5侶、(b)実施例
−1の届とした。結果を第1表及び第5図にNo、12
.13として示した。
Comparative Example-2 Firing was performed in the same manner as in Example-1. However, the processing amount per batch was (a) 1.5 mm as in Example-1, and (b) as in Example-1. The results are shown in Table 1 and Figure 5 as No. 12.
.. It was shown as 13.

比較例−3 実施例−1と同様に焼成を行った。発生したCOガスの
排出量を制御することによって、被焼成品のまわりのC
Oガスの分圧を調整した。具体的には第6図に示すスベ
ーザ5の高さを調整し、COガスの排出口開度を(a)
実施例−1の2倍、(b)実施例−1の坏とした。結果
を第1表及び第5図にNo、14、N015として示し
た。
Comparative Example-3 Firing was performed in the same manner as in Example-1. By controlling the amount of CO gas generated, the amount of CO gas around the fired product can be reduced.
The partial pressure of O gas was adjusted. Specifically, the height of the scrubber 5 shown in Fig. 6 is adjusted, and the opening degree of the CO gas outlet is adjusted to (a).
(b) twice as much as that of Example-1; The results are shown in Table 1 and FIG. 5 as No. 14 and No. 015.

また、以上の実施例の結果から、保持時間を2時間とし
た時の保持温度と残留カーボン量との関係を第3図に、
保持温度を1625°Cとした時の保持時間と残留カー
ボン量との関係を第4図に示した。
Furthermore, from the results of the above examples, the relationship between the holding temperature and the amount of residual carbon when the holding time is 2 hours is shown in Figure 3.
FIG. 4 shows the relationship between the holding time and the amount of residual carbon when the holding temperature was 1625°C.

第5図は、第1表のN091〜No、]、5を色調と明
度のグラフ上に表示したもので、色調Yが大きいと黄褐
色を呈し、明度が大きいと明るい色彩となる。好ましい
値は Y=3.4〜5.O,L=64以」二 である。さらに最も好ましい値は Y=4〜5、L−75〜85% である。熱伝導率、絶縁抵抗、外観から見て、No、1
が最も好適である。
FIG. 5 shows No. 091 to No.], 5 in Table 1 on a graph of tone and lightness. When the tone Y is large, the color is yellowish brown, and when the lightness is large, the color is bright. The preferred value is Y=3.4-5. O, L=64 or more"2. Further, the most preferable values are Y=4 to 5 and L-75 to 85%. No. 1 in terms of thermal conductivity, insulation resistance, and appearance
is the most suitable.

[発明の効果] 本発明では、外部からの積極的な還元作用を用いたり、
また積極的なバインダ除去を行わなくても、被焼成品内
に含まれる酸素とカーボンを効率よく反応させるような
焼成ヒートパターンを採用することによって、さらには
発生したCOガスの系外への排出を調整することによっ
て、焼結体中の残留酸素、カーボンを大幅に低減するこ
とができた。本発明によれば、熱伝導率が高(、絶縁抵
抗も優れ、明度や色調などの外観の安定した/IN焼結
体を得ることができる。
[Effect of the invention] In the present invention, an active reducing action from the outside is used,
In addition, by adopting a firing heat pattern that allows the oxygen and carbon contained in the fired product to react efficiently without actively removing the binder, the generated CO gas can be discharged outside the system. By adjusting this, we were able to significantly reduce residual oxygen and carbon in the sintered body. According to the present invention, it is possible to obtain a /IN sintered body that has high thermal conductivity, excellent insulation resistance, and stable appearance such as brightness and color tone.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例の焼成ヒートパターンを示すグ
ラフ、第2図は従来の焼成ヒートパターンを示すグラフ
、第3図は保持温度と残留カーボン量との関係を示すグ
ラフ、第4図は保持時間と残留カーボン量との関係を示
すグラフ、第5図は色調と明度を示すグラフ、第6図は
本発明の実施に用いる焼成炉の模式断面図である。 1・・・るつぼ 2・・・AlNるつぼ 3・・・AlNシート 4・・・BNセッタ 5・・・スペーサ 6・・・蓋 7・・・N2ガス
Fig. 1 is a graph showing the firing heat pattern of the embodiment of the present invention, Fig. 2 is a graph showing the conventional firing heat pattern, Fig. 3 is a graph showing the relationship between holding temperature and residual carbon amount, Fig. 4 5 is a graph showing the relationship between retention time and amount of residual carbon, FIG. 5 is a graph showing color tone and brightness, and FIG. 6 is a schematic cross-sectional view of a firing furnace used in carrying out the present invention. 1... Crucible 2... AlN crucible 3... AlN sheet 4... BN setter 5... Spacer 6... Lid 7... N2 gas

Claims (1)

【特許請求の範囲】 1 AlN基板の焼成に際し、その焼成温度パターンの
うち昇温過程において一定温度に保持する保持工程を設
け、脱炭を促進することを特徴とするAlN基板の製造
方法。 2 保持工程は、保持温度が1500〜1700℃、保
持時間が2〜10時間であることを特徴とする請求項1
記載のAlN基板の製造方法。 3 含有酸素不純物の量が0.5〜1.0重量%、カー
ボン量が0.05重量%以下の原料粉末を用い、酸化物
焼結助剤を添加した時点での全酸素量を1.0〜2.0
重量%とし、さらにグリーンシート成形時に添加した有
機バインダの除去後の残留カーボン量を0.7重量%以
下とすることを特徴とする請求項1又は2記載のAlN
基板の製造方法。 4 AlN基板から発生したガスの排出量を調整するこ
とを特徴とする請求項1、2又は3記載のAlN基板の
製造方法。
[Scope of Claims] 1. A method for producing an AlN substrate, characterized in that during firing of the AlN substrate, a holding step is provided in which the temperature is maintained at a constant temperature during the heating process in the firing temperature pattern to promote decarburization. 2. Claim 1, wherein the holding step has a holding temperature of 1500 to 1700°C and a holding time of 2 to 10 hours.
The method for manufacturing the AlN substrate described above. 3 Using a raw material powder containing 0.5 to 1.0% by weight of oxygen impurities and 0.05% by weight or less of carbon, the total oxygen content at the time of adding the oxide sintering aid is 1. 0-2.0
% by weight, and the amount of residual carbon after removing the organic binder added during green sheet molding is 0.7% by weight or less.
Substrate manufacturing method. 4. The method for manufacturing an AlN substrate according to claim 1, 2 or 3, characterized in that the amount of gas discharged from the AlN substrate is adjusted.
JP2318081A 1990-11-26 1990-11-26 Production of aluminum nitride substrate Pending JPH04193765A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2318081A JPH04193765A (en) 1990-11-26 1990-11-26 Production of aluminum nitride substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2318081A JPH04193765A (en) 1990-11-26 1990-11-26 Production of aluminum nitride substrate

Publications (1)

Publication Number Publication Date
JPH04193765A true JPH04193765A (en) 1992-07-13

Family

ID=18095267

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2318081A Pending JPH04193765A (en) 1990-11-26 1990-11-26 Production of aluminum nitride substrate

Country Status (1)

Country Link
JP (1) JPH04193765A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005187235A (en) * 2003-12-24 2005-07-14 Toshiba Corp High thermal conductivity aluminum nitride sintered body
WO2022210517A1 (en) * 2021-03-31 2022-10-06 デンカ株式会社 Aluminium nitride sintered body, production method for same, circuit board, and laminated substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005187235A (en) * 2003-12-24 2005-07-14 Toshiba Corp High thermal conductivity aluminum nitride sintered body
WO2022210517A1 (en) * 2021-03-31 2022-10-06 デンカ株式会社 Aluminium nitride sintered body, production method for same, circuit board, and laminated substrate
JPWO2022210517A1 (en) * 2021-03-31 2022-10-06

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