JPH0420970A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPH0420970A JPH0420970A JP12402490A JP12402490A JPH0420970A JP H0420970 A JPH0420970 A JP H0420970A JP 12402490 A JP12402490 A JP 12402490A JP 12402490 A JP12402490 A JP 12402490A JP H0420970 A JPH0420970 A JP H0420970A
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin
- formula
- formulas
- tables
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 claims abstract description 191
- 239000011347 resin Substances 0.000 claims abstract description 191
- 239000011230 binding agent Substances 0.000 claims abstract description 41
- 229920001577 copolymer Polymers 0.000 claims abstract description 32
- 239000000178 monomer Substances 0.000 claims abstract description 31
- -1 cyclic acid anhydride Chemical class 0.000 claims description 106
- 229920000642 polymer Polymers 0.000 claims description 52
- 125000004432 carbon atom Chemical group C* 0.000 claims description 38
- 108091008695 photoreceptors Proteins 0.000 claims description 33
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 31
- 150000002430 hydrocarbons Chemical group 0.000 claims description 28
- 239000000126 substance Substances 0.000 claims description 25
- 230000002378 acidificating effect Effects 0.000 claims description 24
- 229910052799 carbon Inorganic materials 0.000 claims description 22
- 125000000217 alkyl group Chemical group 0.000 claims description 21
- 125000005843 halogen group Chemical group 0.000 claims description 15
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 14
- 229920000578 graft copolymer Polymers 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 11
- 239000004215 Carbon black (E152) Substances 0.000 claims description 10
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 10
- 229930195733 hydrocarbon Natural products 0.000 claims description 10
- 125000001931 aliphatic group Chemical group 0.000 claims description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 238000006116 polymerization reaction Methods 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 9
- 239000002253 acid Substances 0.000 abstract description 6
- 239000004721 Polyphenylene oxide Substances 0.000 abstract description 4
- 229920000570 polyether Polymers 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 55
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 42
- 230000015572 biosynthetic process Effects 0.000 description 41
- 239000000975 dye Substances 0.000 description 39
- 238000003786 synthesis reaction Methods 0.000 description 39
- 238000000034 method Methods 0.000 description 34
- 239000000463 material Substances 0.000 description 32
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 23
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 22
- 125000000524 functional group Chemical group 0.000 description 22
- 229910052757 nitrogen Inorganic materials 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 21
- 238000007639 printing Methods 0.000 description 21
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 239000000203 mixture Substances 0.000 description 18
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 18
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 16
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 14
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical class C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 13
- 238000007334 copolymerization reaction Methods 0.000 description 13
- 125000005647 linker group Chemical group 0.000 description 13
- 150000001875 compounds Chemical class 0.000 description 12
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 11
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 10
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 10
- 229910052801 chlorine Inorganic materials 0.000 description 10
- 125000001309 chloro group Chemical group Cl* 0.000 description 10
- 239000011259 mixed solution Substances 0.000 description 10
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 10
- 230000007613 environmental effect Effects 0.000 description 9
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 9
- 238000003384 imaging method Methods 0.000 description 9
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 239000000123 paper Substances 0.000 description 8
- 239000000843 powder Substances 0.000 description 8
- 229920002554 vinyl polymer Polymers 0.000 description 8
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 7
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 7
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 7
- 206010034972 Photosensitivity reaction Diseases 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- 230000036211 photosensitivity Effects 0.000 description 7
- 239000003505 polymerization initiator Substances 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- 125000003944 tolyl group Chemical group 0.000 description 7
- 229910052720 vanadium Inorganic materials 0.000 description 7
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 6
- 125000000068 chlorophenyl group Chemical group 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 238000000586 desensitisation Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 125000005842 heteroatom Chemical group 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 230000003993 interaction Effects 0.000 description 6
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 6
- 238000012552 review Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 230000001235 sensitizing effect Effects 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 5
- 125000004803 chlorobenzyl group Chemical group 0.000 description 5
- 239000003431 cross linking reagent Substances 0.000 description 5
- 238000010908 decantation Methods 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 230000014759 maintenance of location Effects 0.000 description 5
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 5
- 125000006178 methyl benzyl group Chemical group 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 239000011787 zinc oxide Substances 0.000 description 5
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 125000004799 bromophenyl group Chemical group 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 229920005604 random copolymer Polymers 0.000 description 4
- 125000000547 substituted alkyl group Chemical group 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 125000005023 xylyl group Chemical group 0.000 description 4
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 4
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 3
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 3
- WJCCNRRUTSLHLJ-UHFFFAOYSA-N 2-ethenyl-1,4-dioxane Chemical compound C=CC1COCCO1 WJCCNRRUTSLHLJ-UHFFFAOYSA-N 0.000 description 3
- 125000004924 2-naphthylethyl group Chemical group C1=C(C=CC2=CC=CC=C12)CC* 0.000 description 3
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 3
- ORNUPNRNNSVZTC-UHFFFAOYSA-N 2-vinylthiophene Chemical compound C=CC1=CC=CS1 ORNUPNRNNSVZTC-UHFFFAOYSA-N 0.000 description 3
- KXFHZSFZCQPLPW-UHFFFAOYSA-N 3-ethenyl-2h-oxazine Chemical compound C=CC1=CC=CON1 KXFHZSFZCQPLPW-UHFFFAOYSA-N 0.000 description 3
- YPIINMAYDTYYSQ-UHFFFAOYSA-N 5-ethenyl-1h-pyrazole Chemical compound C=CC=1C=CNN=1 YPIINMAYDTYYSQ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 3
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 239000012986 chain transfer agent Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N chloroform Substances ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 3
- 229960001701 chloroform Drugs 0.000 description 3
- 229920006026 co-polymeric resin Polymers 0.000 description 3
- 229960002944 cyclofenil Drugs 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 125000004188 dichlorophenyl group Chemical group 0.000 description 3
- 125000006182 dimethyl benzyl group Chemical group 0.000 description 3
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 3
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 3
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000001294 propane Substances 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 241000894007 species Species 0.000 description 3
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- 238000001308 synthesis method Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 3
- YKZMWXJHPKWFLS-UHFFFAOYSA-N (2-chlorophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1Cl YKZMWXJHPKWFLS-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2,2'-azo-bis-isobutyronitrile Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000005999 2-bromoethyl group Chemical group 0.000 description 2
- XRCRJFOGPCJKPF-UHFFFAOYSA-N 2-butylbenzene-1,4-diol Chemical compound CCCCC1=CC(O)=CC=C1O XRCRJFOGPCJKPF-UHFFFAOYSA-N 0.000 description 2
- JDCUKFVNOWJNBU-UHFFFAOYSA-N 2-ethenyl-1,3-thiazole Chemical compound C=CC1=NC=CS1 JDCUKFVNOWJNBU-UHFFFAOYSA-N 0.000 description 2
- XUGNJOCQALIQFG-UHFFFAOYSA-N 2-ethenylquinoline Chemical compound C1=CC=CC2=NC(C=C)=CC=C21 XUGNJOCQALIQFG-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- 150000003926 acrylamides Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 2
- 229950005228 bromoform Drugs 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 125000005626 carbonium group Chemical group 0.000 description 2
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000004802 cyanophenyl group Chemical group 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- UFULAYFCSOUIOV-UHFFFAOYSA-N cysteamine Chemical compound NCCS UFULAYFCSOUIOV-UHFFFAOYSA-N 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 229960004592 isopropanol Drugs 0.000 description 2
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- YWFWDNVOPHGWMX-UHFFFAOYSA-N n,n-dimethyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(C)C YWFWDNVOPHGWMX-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N phthalic anhydride Chemical group C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 125000003107 substituted aryl group Chemical group 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000011345 viscous material Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229940075420 xanthine Drugs 0.000 description 2
- 239000004711 α-olefin Substances 0.000 description 2
- CWMPPVPFLSZGCY-VOTSOKGWSA-N (2E)-oct-2-enoic acid Chemical compound CCCCC\C=C\C(O)=O CWMPPVPFLSZGCY-VOTSOKGWSA-N 0.000 description 1
- JIAFOCJABIEPNM-BYPYZUCNSA-N (2s)-2-(3-sulfanylpropanoylamino)propanoic acid Chemical compound OC(=O)[C@H](C)NC(=O)CCS JIAFOCJABIEPNM-BYPYZUCNSA-N 0.000 description 1
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- HMYXKHZCEYROAL-UHFFFAOYSA-N (4-chloro-2,3,5,6-tetrafluorophenyl)methanol Chemical compound OCC1=C(F)C(F)=C(Cl)C(F)=C1F HMYXKHZCEYROAL-UHFFFAOYSA-N 0.000 description 1
- DSSYKIVIOFKYAU-XCBNKYQSSA-N (R)-camphor Chemical group C1C[C@@]2(C)C(=O)C[C@@H]1C2(C)C DSSYKIVIOFKYAU-XCBNKYQSSA-N 0.000 description 1
- QDYRHGGXBLRFHS-SNAWJCMRSA-N (e)-4-methylhex-2-enoic acid Chemical compound CCC(C)\C=C\C(O)=O QDYRHGGXBLRFHS-SNAWJCMRSA-N 0.000 description 1
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- RMSGQZDGSZOJMU-UHFFFAOYSA-N 1-butyl-2-phenylbenzene Chemical group CCCCC1=CC=CC=C1C1=CC=CC=C1 RMSGQZDGSZOJMU-UHFFFAOYSA-N 0.000 description 1
- 125000006039 1-hexenyl group Chemical group 0.000 description 1
- 125000006023 1-pentenyl group Chemical group 0.000 description 1
- FETFXNFGOYOOSP-UHFFFAOYSA-N 1-sulfanylpropan-2-ol Chemical compound CC(O)CS FETFXNFGOYOOSP-UHFFFAOYSA-N 0.000 description 1
- CISIJYCKDJSTMX-UHFFFAOYSA-N 2,2-dichloroethenylbenzene Chemical compound ClC(Cl)=CC1=CC=CC=C1 CISIJYCKDJSTMX-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- OKKJMXCNNZVCPO-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethylphosphonic acid Chemical compound CC(=C)C(=O)OCCP(O)(O)=O OKKJMXCNNZVCPO-UHFFFAOYSA-N 0.000 description 1
- CWMPPVPFLSZGCY-UHFFFAOYSA-N 2-Octenoic Acid Natural products CCCCCC=CC(O)=O CWMPPVPFLSZGCY-UHFFFAOYSA-N 0.000 description 1
- OEUOSNUUSQBBKI-UHFFFAOYSA-N 2-[(2-cyano-1-hydroxypentan-2-yl)diazenyl]-2-(hydroxymethyl)pentanenitrile Chemical compound CCCC(CO)(C#N)N=NC(CO)(C#N)CCC OEUOSNUUSQBBKI-UHFFFAOYSA-N 0.000 description 1
- WTOFYLAWDLQMBZ-UHFFFAOYSA-N 2-azaniumyl-3-thiophen-2-ylpropanoate Chemical compound OC(=O)C(N)CC1=CC=CS1 WTOFYLAWDLQMBZ-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- NICLKHGIKDZZGV-UHFFFAOYSA-N 2-cyanopentanoic acid Chemical compound CCCC(C#N)C(O)=O NICLKHGIKDZZGV-UHFFFAOYSA-N 0.000 description 1
- VMSBGXAJJLPWKV-UHFFFAOYSA-N 2-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1C=C VMSBGXAJJLPWKV-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- 125000006040 2-hexenyl group Chemical group 0.000 description 1
- RXZZSDCLSLACNC-UHFFFAOYSA-N 2-iodoethanesulfonic acid Chemical compound OS(=O)(=O)CCI RXZZSDCLSLACNC-UHFFFAOYSA-N 0.000 description 1
- QSECPQCFCWVBKM-UHFFFAOYSA-N 2-iodoethanol Chemical compound OCCI QSECPQCFCWVBKM-UHFFFAOYSA-N 0.000 description 1
- KZLYQYPURWXOEW-UHFFFAOYSA-N 2-iodopropanoic acid Chemical compound CC(I)C(O)=O KZLYQYPURWXOEW-UHFFFAOYSA-N 0.000 description 1
- 229940006193 2-mercaptoethanesulfonic acid Drugs 0.000 description 1
- 125000006020 2-methyl-1-propenyl group Chemical group 0.000 description 1
- 125000006024 2-pentenyl group Chemical group 0.000 description 1
- KZCLFWYVLDNEMU-UHFFFAOYSA-N 2-propan-2-yl-1,4,5,6-tetrahydropyrimidine Chemical compound CC(C)C1=NCCCN1 KZCLFWYVLDNEMU-UHFFFAOYSA-N 0.000 description 1
- WYKHFQKONWMWQM-UHFFFAOYSA-N 2-sulfanylidene-1h-pyridine-3-carboxylic acid Chemical compound OC(=O)C1=CC=CN=C1S WYKHFQKONWMWQM-UHFFFAOYSA-N 0.000 description 1
- VMKYTRPNOVFCGZ-UHFFFAOYSA-N 2-sulfanylphenol Chemical compound OC1=CC=CC=C1S VMKYTRPNOVFCGZ-UHFFFAOYSA-N 0.000 description 1
- SYIUWAVTBADRJG-UHFFFAOYSA-N 2H-pyran-2,6(3H)-dione Chemical group O=C1CC=CC(=O)O1 SYIUWAVTBADRJG-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- MJQWABQELVFQJL-UHFFFAOYSA-N 3-Mercapto-2-butanol Chemical compound CC(O)C(C)S MJQWABQELVFQJL-UHFFFAOYSA-N 0.000 description 1
- MARYDOMJDFATPK-UHFFFAOYSA-N 3-hydroxy-1h-pyridine-2-thione Chemical compound OC1=CC=CN=C1S MARYDOMJDFATPK-UHFFFAOYSA-N 0.000 description 1
- 125000006050 3-methyl-2-pentenyl group Chemical group 0.000 description 1
- IRRCCOQNMSPSSM-UHFFFAOYSA-N 3-sulfanylbutane-1-sulfonic acid Chemical compound CC(S)CCS(O)(=O)=O IRRCCOQNMSPSSM-UHFFFAOYSA-N 0.000 description 1
- RQPNXPWEGVCPCX-UHFFFAOYSA-N 3-sulfanylbutanoic acid Chemical compound CC(S)CC(O)=O RQPNXPWEGVCPCX-UHFFFAOYSA-N 0.000 description 1
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 1
- NMSRALOLNIBERV-UHFFFAOYSA-N 4,5,6,6a-tetrahydro-3ah-cyclopenta[c]furan-1,3-dione Chemical group C1CCC2C(=O)OC(=O)C21 NMSRALOLNIBERV-UHFFFAOYSA-N 0.000 description 1
- HMMBJOWWRLZEMI-UHFFFAOYSA-N 4,5,6,7-tetrahydro-2-benzofuran-1,3-dione Chemical group C1CCCC2=C1C(=O)OC2=O HMMBJOWWRLZEMI-UHFFFAOYSA-N 0.000 description 1
- QDYRHGGXBLRFHS-UHFFFAOYSA-N 4-Methyl-2-hexenoic acid Natural products CCC(C)C=CC(O)=O QDYRHGGXBLRFHS-UHFFFAOYSA-N 0.000 description 1
- PQVHMOLNSYFXIJ-UHFFFAOYSA-N 4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]pyrazole-3-carboxylic acid Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(N1CC2=C(CC1)NN=N2)=O)C(=O)O PQVHMOLNSYFXIJ-UHFFFAOYSA-N 0.000 description 1
- SEAPWVKYZKVDCR-UHFFFAOYSA-N 4-cyanopentanoyl chloride Chemical compound N#CC(C)CCC(Cl)=O SEAPWVKYZKVDCR-UHFFFAOYSA-N 0.000 description 1
- ISOQNEPBGIJCLU-UHFFFAOYSA-N 4-sulfanylbutane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCCS ISOQNEPBGIJCLU-UHFFFAOYSA-N 0.000 description 1
- 241000723346 Cinnamomum camphora Species 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 108700042658 GAP-43 Proteins 0.000 description 1
- 101700012268 Holin Proteins 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- CXOFVDLJLONNDW-UHFFFAOYSA-N Phenytoin Chemical group N1C(=O)NC(=O)C1(C=1C=CC=CC=1)C1=CC=CC=C1 CXOFVDLJLONNDW-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- 241001600434 Plectroglyphidodon lacrymatus Species 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- 101100123587 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) HDA3 gene Proteins 0.000 description 1
- 101100297842 Schizosaccharomyces pombe (strain 972 / ATCC 24843) plo1 gene Proteins 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- YTGJWQPHMWSCST-UHFFFAOYSA-N Tiopronin Chemical compound CC(S)C(=O)NCC(O)=O YTGJWQPHMWSCST-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- YMOONIIMQBGTDU-VOTSOKGWSA-N [(e)-2-bromoethenyl]benzene Chemical compound Br\C=C\C1=CC=CC=C1 YMOONIIMQBGTDU-VOTSOKGWSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000005036 alkoxyphenyl group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- YIYBQIKDCADOSF-UHFFFAOYSA-N alpha-Butylen-alpha-carbonsaeure Natural products CCC=CC(O)=O YIYBQIKDCADOSF-UHFFFAOYSA-N 0.000 description 1
- AFVLVVWMAFSXCK-VMPITWQZSA-N alpha-cyano-4-hydroxycinnamic acid Chemical group OC(=O)C(\C#N)=C\C1=CC=C(O)C=C1 AFVLVVWMAFSXCK-VMPITWQZSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- CJPQIRJHIZUAQP-MRXNPFEDSA-N benalaxyl-M Chemical compound CC=1C=CC=C(C)C=1N([C@H](C)C(=O)OC)C(=O)CC1=CC=CC=C1 CJPQIRJHIZUAQP-MRXNPFEDSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- IDVDAZFXGGNIDQ-UHFFFAOYSA-N benzo[e][2]benzofuran-1,3-dione Chemical group C1=CC2=CC=CC=C2C2=C1C(=O)OC2=O IDVDAZFXGGNIDQ-UHFFFAOYSA-N 0.000 description 1
- AJCHRUXIDGEWDK-UHFFFAOYSA-N bis(ethenyl) butanedioate Chemical compound C=COC(=O)CCC(=O)OC=C AJCHRUXIDGEWDK-UHFFFAOYSA-N 0.000 description 1
- JZQAAQZDDMEFGZ-UHFFFAOYSA-N bis(ethenyl) hexanedioate Chemical compound C=COC(=O)CCCCC(=O)OC=C JZQAAQZDDMEFGZ-UHFFFAOYSA-N 0.000 description 1
- HABAXTXIECRCKH-UHFFFAOYSA-N bis(prop-2-enyl) butanedioate Chemical compound C=CCOC(=O)CCC(=O)OCC=C HABAXTXIECRCKH-UHFFFAOYSA-N 0.000 description 1
- 125000006278 bromobenzyl group Chemical group 0.000 description 1
- UDSAIICHUKSCKT-UHFFFAOYSA-N bromophenol blue Chemical compound C1=C(Br)C(O)=C(Br)C=C1C1(C=2C=C(Br)C(O)=C(Br)C=2)C2=CC=CC=C2S(=O)(=O)O1 UDSAIICHUKSCKT-UHFFFAOYSA-N 0.000 description 1
- YFRNYWVKHCQRPE-UHFFFAOYSA-N buta-1,3-diene;prop-2-enoic acid Chemical compound C=CC=C.OC(=O)C=C YFRNYWVKHCQRPE-UHFFFAOYSA-N 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229910000011 cadmium carbonate Inorganic materials 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- GKDXQAKPHKQZSC-UHFFFAOYSA-L cadmium(2+);carbonate Chemical compound [Cd+2].[O-]C([O-])=O GKDXQAKPHKQZSC-UHFFFAOYSA-L 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 229960000846 camphor Drugs 0.000 description 1
- 229930008380 camphor Natural products 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- QCDMKVKJOHXJQS-UHFFFAOYSA-N chloroethene;ethenoxyethene Chemical compound ClC=C.C=COC=C QCDMKVKJOHXJQS-UHFFFAOYSA-N 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- OOCCDEMITAIZTP-UHFFFAOYSA-N cinnamyl alcohol Chemical compound OCC=CC1=CC=CC=C1 OOCCDEMITAIZTP-UHFFFAOYSA-N 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- ZNEWHQLOPFWXOF-UHFFFAOYSA-N coenzyme M Chemical compound OS(=O)(=O)CCS ZNEWHQLOPFWXOF-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 125000002946 cyanobenzyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 125000006285 dibromobenzyl group Chemical group 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 125000006286 dichlorobenzyl group Chemical group 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- FFYWKOUKJFCBAM-UHFFFAOYSA-N ethenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC=C FFYWKOUKJFCBAM-UHFFFAOYSA-N 0.000 description 1
- BNKAXGCRDYRABM-UHFFFAOYSA-N ethenyl dihydrogen phosphate Chemical compound OP(O)(=O)OC=C BNKAXGCRDYRABM-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000012847 fine chemical Substances 0.000 description 1
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 1
- MCQOWYALZVKMAR-UHFFFAOYSA-N furo[3,4-b]pyridine-5,7-dione Chemical group C1=CC=C2C(=O)OC(=O)C2=N1 MCQOWYALZVKMAR-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- MUTGBJKUEZFXGO-UHFFFAOYSA-N hexahydrophthalic anhydride Chemical group C1CCCC2C(=O)OC(=O)C21 MUTGBJKUEZFXGO-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007327 hydrogenolysis reaction Methods 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Substances C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- JDNTWHVOXJZDSN-UHFFFAOYSA-N iodoacetic acid Chemical compound OC(=O)CI JDNTWHVOXJZDSN-UHFFFAOYSA-N 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 229910052981 lead sulfide Inorganic materials 0.000 description 1
- 229940056932 lead sulfide Drugs 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical group O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 229960003151 mercaptamine Drugs 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 1
- SYUYXOYNRMMOGW-UHFFFAOYSA-N n,n-dimethyl-3-phenylprop-2-en-1-amine Chemical compound CN(C)CC=CC1=CC=CC=C1 SYUYXOYNRMMOGW-UHFFFAOYSA-N 0.000 description 1
- WVFLGSMUPMVNTQ-UHFFFAOYSA-N n-(2-hydroxyethyl)-2-[[1-(2-hydroxyethylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCO WVFLGSMUPMVNTQ-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 150000002924 oxiranes Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 238000010094 polymer processing Methods 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical compound C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 229920013730 reactive polymer Polymers 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- VDNLFJGJEQUWRB-UHFFFAOYSA-N rose bengal free acid Chemical compound OC(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C(O)=C(I)C=C21 VDNLFJGJEQUWRB-UHFFFAOYSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- RINCXYDBBGOEEQ-UHFFFAOYSA-N succinic anhydride Chemical group O=C1CCC(=O)O1 RINCXYDBBGOEEQ-UHFFFAOYSA-N 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- FIDKFEIEZJGDBE-UHFFFAOYSA-N thieno[2,3-c]furan-4,6-dione Chemical group S1C=CC2=C1C(=O)OC2=O FIDKFEIEZJGDBE-UHFFFAOYSA-N 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- YIYBQIKDCADOSF-ONEGZZNKSA-N trans-pent-2-enoic acid Chemical compound CC\C=C\C(O)=O YIYBQIKDCADOSF-ONEGZZNKSA-N 0.000 description 1
- 229920001567 vinyl ester resin Chemical group 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は電子写真感光体に関し、詳しくは静電特性、耐
湿性及び耐久性の優れた電子写真感光体に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an electrophotographic photoreceptor, and more particularly to an electrophotographic photoreceptor having excellent electrostatic properties, moisture resistance, and durability.
(従来の技術)
電子写真感光体には所定の特性を得るため、あるいは通
用される電子写真プロセスの種類↓こ応じて種々の構成
をとる。(Prior Art) Electrophotographic photoreceptors have various configurations in order to obtain predetermined characteristics or depending on the type of electrophotographic process in use.
電子写真感光体の代表的なものとして、支持体上に光導
電層が形成されている感光体及び表面に絶縁層を備えた
感光体があり、広く用いられている。支持体と少なくと
も1層の光導電層から構成される感光体は、最も一般的
な電子写真プロセスによる、即ち、帯電、画像露光及び
現像、更に必要に応じて転写による画像形成に用いられ
る。As representative electrophotographic photoreceptors, there are photoreceptors having a photoconductive layer formed on a support and photoreceptors having an insulating layer on the surface, which are widely used. Photoreceptors comprising a support and at least one photoconductive layer are used for image formation by most common electrophotographic processes, ie, charging, image exposure and development, and optionally transfer.
更には、ダイレクト製版用のオフセント原版として電子
写真感光体を用いる方法が広く実用されている。Furthermore, a method of using an electrophotographic photoreceptor as an offset master plate for direct plate making is widely used.
電子写真感光体の光導電層を形成するために使用する結
着樹脂は、それ自体の成膜性および光導電性粉末の結着
樹脂中への分散能力が優れるとともに、形成された記録
体層の基材に対する接着性が良好であり、しかも記録体
層の光導電層は帯電能力に優れ、暗減衰が小さ(、光減
衰が大きく、前露光疲労が少く、且つ、撮像時の湿度の
変化によってこれら特性を安定に保持していることが必
要である等の各種の静電特性および優れた撮像性を具備
する必要がある。The binder resin used to form the photoconductive layer of the electrophotographic photoreceptor has excellent film-forming properties itself and ability to disperse photoconductive powder into the binder resin, and also has excellent film-forming properties and excellent dispersion ability of the photoconductive powder into the binder resin. The photoconductive layer of the recording layer has good adhesion to the substrate, and the photoconductive layer of the recording layer has excellent charging ability, low dark decay (high light decay, low pre-exposure fatigue, and resistance to changes in humidity during imaging. Therefore, it is necessary to have various electrostatic properties such as the need to stably maintain these properties and excellent imaging performance.
更に、電子写真感光体を用いた平版印刷用原版の研究が
鋭意行なわれており、電子写真感光体としての静電特性
と印刷原版としての印刷特性を両立させた光導電層用の
結着樹脂が必要である。Furthermore, research is being carried out on lithographic printing original plates using electrophotographic photoreceptors, and a binder resin for the photoconductive layer that has both the electrostatic properties of an electrophotographic photoreceptor and the printing properties of a printing original plate has been developed. is necessary.
しかしながら、従来公知の結着樹脂には、特に帯電性、
暗電荷保持性、光感度の静電特性、光導電層の平滑性等
に問題があり、実用上満足できるものではなかった。However, conventionally known binder resins have particularly high chargeability and
There were problems with dark charge retention, electrostatic characteristics of photosensitivity, smoothness of the photoconductive layer, etc., and it was not practically satisfactory.
又、電子写真式平版印刷用原版として開発されたとする
結着樹脂においても、現実に評価してみると前記の静電
特性、印刷物の地汚れ等に問題があった。Furthermore, even in the case of a binder resin which is said to have been developed as an original plate for electrophotographic lithographic printing, when actually evaluated, there were problems with the above-mentioned electrostatic properties, scumming of printed matter, etc.
更に、これらの問題点を解決するために、結着樹脂とし
て酸性基を重合体の側鎖に含有する共重合成分を0.0
5〜10重量%含有する低分子量の樹脂および酸性基を
重合体主鎖の末端に結合する低分子量の樹脂(PMwl
o”〜104)を用いることにより、光導電層の平滑性
及び静電特性を良好にし、しかも地汚れのない画質を得
ることが特開昭63−217354号、同64−707
61号および特開平2−67563号に記載されている
。Furthermore, in order to solve these problems, a copolymer component containing an acidic group in the side chain of the polymer was used as a binder resin.
A low molecular weight resin containing 5 to 10% by weight and a low molecular weight resin that binds an acidic group to the end of the polymer main chain (PMwl).
It is disclosed in JP-A-63-217354 and JP-A-64-707 that the smoothness and electrostatic properties of the photoconductive layer can be improved by using the photoconductive layer and the image quality without background smudge can be obtained by using
61 and JP-A-2-67563.
また、結着樹脂として、酸性基を共重合体の側鎖に含有
し、又は重合体主鎖の末端に結合し、且つ熱及び/又は
光硬化性官能基を含有する重合成分を含有する樹脂を用
いる技術が特開平1−100554号、特願昭63−3
9690号に、酸性基を共重合体の側鎖に含有し、又は
重合体主鎖の末端に結合する樹脂を架橋剤と併用する技
術が特開平1−102537号、同2−874号にそれ
ぞれ開示され、更に該低分子量体(重量平均分子量10
’〜104)を高分子量(重量平均分子量104以上)
の樹脂を組合せて用いる技術が特開昭64−564号、
同63−220149号、同63220148号、特開
平1−280761号、同1−116643号及び同1
−169455号に、かかる低分子量体を熱及び/又は
光硬化性樹脂と組合せて用いる技術が特開平1−211
766号及び同2−34859号にかかる低分子量体を
クシ型ポリマーと組合せて用いる゛技術が特開平2−5
3064号、同2−56558号及び特願昭63−25
4786号にそれぞれ開示されている。これらの技術に
より、側鎖又は末端に酸性基を含有する樹脂を用いたこ
とによる上記特性を阻害せずにさらに光導電層の膜強度
を充分ならしめ、機械的強度が増大されることが記載さ
れている。In addition, as a binder resin, a resin containing a polymeric component containing an acidic group in the side chain of the copolymer, or bonded to the end of the main chain of the polymer, and containing a thermally and/or photocurable functional group. The technique using this is disclosed in Japanese Patent Application Laid-open No. 1-100554 and Japanese Patent Application No. 1983-3.
9690, and JP-A-1-102537 and JP-A-2-874 disclose a technique of using a resin containing an acidic group in the side chain of the copolymer or bonding to the end of the main chain of the polymer together with a crosslinking agent. disclosed, furthermore, the low molecular weight body (weight average molecular weight 10
' ~ 104) with high molecular weight (weight average molecular weight 104 or more)
A technique using a combination of resins is disclosed in Japanese Patent Application Laid-open No. 64-564,
63-220149, 63220148, JP1-280761, 1-116643 and 1
JP-A No. 1-169455 discloses a technique for using such a low molecular weight material in combination with a heat-curable and/or photo-curable resin.
The technique of using the low molecular weight substances disclosed in No. 766 and No. 2-34859 in combination with a comb-shaped polymer is disclosed in JP-A No. 2-5.
No. 3064, No. 2-56558 and patent application No. 1983-25
No. 4786, respectively. It is stated that by these techniques, the film strength of the photoconductive layer can be made sufficient and the mechanical strength can be increased without impeding the above-mentioned properties due to the use of a resin containing an acidic group at the side chain or terminal end. has been done.
(発明が解決しようとする課題)
しかしながら、これらの樹脂を用いても、環境が高温・
高温から低温・低湿まで著しく変動した場合における安
定した性能の維持においてはいまだ不充分であることが
判った。特に半導体レーザー光を用いたスキャニング露
光方式では、従来の可視光による全面同時露光方式に比
べ、露光時間が長くなり、また露光強度にも制約がある
ことから、静電特性、特に暗電荷保持特性、光感度に対
して、より高い性能が要求される。(Problem to be solved by the invention) However, even when these resins are used, the environment is high temperature and
It has been found that it is still insufficient to maintain stable performance when the temperature fluctuates significantly from high temperature to low temperature and low humidity. In particular, scanning exposure methods using semiconductor laser light require longer exposure times than conventional simultaneous exposure methods using visible light across the entire surface, and there are restrictions on exposure intensity. , higher performance is required in terms of photosensitivity.
更には、電子写真式平版印刷用原版において、半導体レ
ーザー光を用いたスキャニング露光方式を採用した場合
、従来の感光体で実際に試験してみると、上記の静電特
性が不満足であるとともに、特にE+/!とE171゜
との差が大きく露光後の残留電位を小さくするのが困難
となり、複写画像のカブリが顕著となってしまい、又、
オフセットマスターとして印刷しても、印刷物に印刷原
稿の貼り込み跡が出てしまう等の重大な問題となって現
われた。Furthermore, when a scanning exposure method using semiconductor laser light is adopted in an electrophotographic lithographic printing original plate, actual tests using a conventional photoreceptor show that the electrostatic properties described above are unsatisfactory. Especially E+/! The large difference between the
Even when printing as an offset master, serious problems such as pasting marks of the printed original appear on the printed matter.
本発明は、以上の様な従来の電子写真感光体の有する課
題を改良するものである。The present invention is intended to improve the problems of conventional electrophotographic photoreceptors as described above.
本発明の目的は、複写画像形成時の環境が低温低湿ある
いは高温高湿の如く変動した場合でも、安定して良好な
静電特性を維持し、鮮明で良質な画像を有する電子写真
感光体を提供することである。An object of the present invention is to provide an electrophotographic photoreceptor that stably maintains good electrostatic properties and produces clear, high-quality images even when the environment during copy image formation changes such as low temperature and low humidity or high temperature and high humidity. It is to provide.
本発明の他の目的は、静電特性に優れ且つ環境依存性の
小さいCPC電子写真感光体を提供することである。Another object of the present invention is to provide a CPC electrophotographic photoreceptor with excellent electrostatic properties and low environmental dependence.
本発明の他の目的は、半導体レーザー光を用いたスキャ
ニング露光方式に有効な電子写真感光体を提供すること
である。Another object of the present invention is to provide an electrophotographic photoreceptor that is effective in a scanning exposure method using semiconductor laser light.
本発明の他の目的は、電子写真式平版印刷原版として、
静電特性(特に暗電荷保持性及び光感度)に優れ、原画
に対して忠実な複写画像を再現し、且つ、印刷物の全面
一様な地汚れはもちろん点状の地汚れをも発生させず、
また耐剛性の優れた貼り込み跡が生じない平版印刷原版
を提供することである。Another object of the present invention is to provide an original plate for electrophotographic planographic printing.
It has excellent electrostatic properties (particularly dark charge retention and photosensitivity), reproduces copied images that are faithful to the original, and does not cause not only uniform background smudges on the entire surface of printed matter but also dotted smudges. ,
Another object of the present invention is to provide a lithographic printing original plate which has excellent rigidity resistance and does not leave any pasting marks.
(課題を解決するための手段)
上記目的は無機光導電体及び結着樹脂を少なくとも含有
する光導電層を有する電子写真感光体において、該結着
樹脂が、下記に示される樹脂[A)の少なくとも1種と
、樹! CB)の少なくとも1種とを含有して成る事を
特徴とする電子写真感光体により達成されることが見出
された。(Means for Solving the Problems) The above object is to provide an electrophotographic photoreceptor having a photoconductive layer containing at least an inorganic photoconductor and a binder resin, wherein the binder resin is a resin [A] shown below. At least one species and a tree! It has been found that this can be achieved by an electrophotographic photoreceptor characterized by containing at least one type of CB).
樹脂〔A〕:
下記一般式(I)で示される重量平均分子量1×103
〜2×104のマクロモノマー(MA)の少なくとも1
種を重合成分として含有し、且つ、重合体主鎖の片末端
にのみ、−poツH1基、−3OzH基、−COQI4
基炭化水素基を示す)基を表わす)基から選ばれる少な
くとも1つの酸性基を結合して成る重量平均分子量1.
OXIOコ〜2.OXIO’のグラフト共重合体。Resin [A]: Weight average molecular weight 1 x 103 represented by the following general formula (I)
At least one of ~2 x 104 macromonomers (MA)
Contains a species as a polymerization component, and only at one end of the polymer main chain, -potsH1 group, -3OzH group, -COQI4
Weight average molecular weight 1.
OXIO Ko~2. Graft copolymer of OXIO'.
一般式(1)
〔式(1)中、al及びむは、互いに同じでも異なって
もよく、各々水素原子、ハロゲン原子、シアノ基、炭素
数1〜8の炭化水素基、−Coo−Z又は炭素数1〜8
の炭化水素基を介した一Coo−Z (Zは炭素数1
〜18の炭化水素基を表わす)を表わす。General formula (1) [In formula (1), al and al may be the same or different, and each represents a hydrogen atom, a halogen atom, a cyano group, a hydrocarbon group having 1 to 8 carbon atoms, -Coo-Z or Carbon number 1-8
-Coo-Z (Z is 1 carbon number
~18 hydrocarbon groups).
Xは、−COO−−0CO−HCHtvCOO−1−(
CIlz)BOCO−1景CHz7 (J!+ 、j!
gは1〜3の整数を示す)、
P。X is -COO--0CO-HCHtvCOO-1-(
CIlz) BOCO-1 view CHz7 (J!+, j!
g represents an integer from 1 to 3), P.
の炭化水素基ヲ表ワt) 、−、coNncoo−1−
CONHCOO−YはXと一〇−とを連結する基を表わ
す。, -, coNncoo-1-
CONHCOO-Y represents a group connecting X and 10-.
〔〕内は繰り返し単位を表わし、nは1〜3の整数を表
わす、nが2以上のときは、〔〕内のWは少なくとも隣
りのC〕内のWと興なる基を表わす。[ ] represents a repeating unit, and n represents an integer of 1 to 3. When n is 2 or more, W in [ ] represents a group that forms with at least the W in the adjacent C].
(r+及びrzは、互いに同じでも異なってもよく、各
々水素原子又はアルキル基を表わす)。(r+ and rz may be the same or different and each represents a hydrogen atom or an alkyl group).
Roは水素原子又は炭化水素基を表わす、〕結着樹脂〔
B〕:
下記一般式(TVa)及び(IVb)で示される重合体
成分のうちの少なくとも1種と −COOII基、PO
sHi基、 5O3H基、−OH基、−P Rg(R
zはOH
前記R1と同一の内容を表わす)基、−COO基及び酸
無水物含有基から選ばれる少なくとも1つの極性基を含
有する成分を少なくとも1種含有する重合体成分の少な
くとも1種とを含有する重合体主鎖の一方の末端にのみ
下記−船蔵(III)で示される重合性二重結合基を結
合して成る重量平均分子12×104以下の一官能性マ
クロモノマー(MB)と下記−船蔵(V)で示される七
ツマ−とから少なくとも成る重量平均分子量5×104
〜lXl0’の共重合体。Ro represents a hydrogen atom or a hydrocarbon group, [binder resin]
B]: at least one of the polymer components represented by the following general formulas (TVa) and (IVb), -COOII group, PO
sHi group, 5O3H group, -OH group, -PRg(R
z represents the same content as R1 above) group, -COO group, and at least one polymer component containing at least one component containing at least one polar group selected from an acid anhydride-containing group; A monofunctional macromonomer (MB) with a weight average molecule of 12 x 104 or less, which is formed by bonding a polymerizable double bond group shown in the following Funazura (III) only to one end of the main chain of the polymer it contains; A weight average molecular weight of 5 x 104 consisting of at least the following:
~lXl0' copolymer.
一般式(III)
CH=C
式(1)中、X、は−Coo OCOCH!0C
OCHtCOO−
−O−−SO□
−CONHCOO
は炭化水素基を表わす)。General formula (III) CH=C In formula (1), X is -Coo OCOCH! 0C
OCHtCOO- -O--SO□ -CONHCOO represents a hydrocarbon group).
Cl5C1は、互いに同しでも異なってもよく、各
々水素原子、ハロゲン原子、シアノ基、炭化水素基、−
coo−z、又は炭化水素を介したーC00−Z+ (
Z+は各々水素原子又は置換されてもよい炭化水素基を
示す)を表わす。Cl5C1 may be the same or different, and each represents a hydrogen atom, a halogen atom, a cyano group, a hydrocarbon group, -
coo-z, or -C00-Z+ (
Each Z+ represents a hydrogen atom or a hydrocarbon group which may be substituted.
L Ql
一般式(IVb)
Q・
式(IVa)又は(IVb)中、Xlは式(II[)中
のX、と同一の内容を表わす、Qlは、炭素数1〜18
の脂肪族基又は炭素数6〜12の芳香族基を表わす。L Ql General formula (IVb) Q In formula (IVa) or (IVb), Xl represents the same content as X in formula (II[), Ql has a carbon number of 1 to 18
represents an aliphatic group or an aromatic group having 6 to 12 carbon atoms.
dl、d8は、互いに同じでも、異なってもよく、式(
1)中のcl、 cmと同一の内容を表わす。dl and d8 may be the same or different from each other, and can be expressed by the formula (
Represents the same content as cl and cm in 1).
Tは水素原子、ハロゲン原子、アルコキシ基又はC00
Zz(Zxはアルキル基、アラルキル基又はアリール基
を示す)を表わす。T is a hydrogen atom, a halogen atom, an alkoxy group, or C00
Zz (Zx represents an alkyl group, an aralkyl group or an aryl group).
一般式(V)
CIl=C
i −QX
式(V)中、x2は、式(IVa)中のXlと同一の内
容を表わし、QXは(rVa)中の01と同一の内容を
表すael、C2は互いに同じでも異なってもよく、式
(III)中の01、Cオと同一の内容を表わす。General formula (V) CIl=C i -QX In formula (V), x2 represents the same content as Xl in formula (IVa), and QX represents ael, which represents the same content as 01 in (rVa), C2 may be the same or different, and represent the same content as 01 and C0 in formula (III).
即ち、本発明に供される結着樹脂は、一般式(I)で示
されるポリエーテル構造を有する、−官能性マクロモノ
マ−(MA)を、共重合成分として含有するグラフト型
共重合体であって、該グラフト型共重合体の重合体主鎖
の片末端に酸性基(−POJ□H
結合する低分子量の樹脂〔A〕と、−官能性マクロモノ
マー(MB)と−船蔵(V)で示されるモノマーとを少
なくとも含むグラフト型共重合体から成る高分子量の樹
脂〔B〕とから少なくとも構成される。That is, the binder resin used in the present invention is a graft copolymer containing a -functional macromonomer (MA) as a copolymerization component and having a polyether structure represented by the general formula (I). Then, a low molecular weight resin [A] bonded to an acidic group (-POJ□H), a -functional macromonomer (MB) and a -Funazura (V) at one end of the polymer main chain of the graft copolymer. and a high molecular weight resin [B] made of a graft copolymer containing at least the monomer shown below.
前述の如き従来公知の酸性基含有結着樹脂は主としてオ
フセントマスター用であって、膜強度保持による耐刷性
向上のためにその分子量は大きいものであり(例えば5
×104以上)、且つこれらの共重合体はランダム共重
合体であり酸性基含有の共重合体成分は、重合体主鎖に
ランダムに存在しているものであった。The conventionally known acidic group-containing binder resins mentioned above are mainly used for offset masters, and their molecular weights are large (for example, 5.
×104 or more), and these copolymers were random copolymers, and the acidic group-containing copolymer components were randomly present in the polymer main chain.
これに対し、本発明の結着樹脂で用いられる樹脂〔A〕
は、グラフト型共重合体であり、且つ樹脂中に含有され
る酸性基が、重合体主鎖中にランダムに存在するもので
なく、グラフト部の末端にのみ特定に結合された共重合
体である。On the other hand, resin [A] used in the binder resin of the present invention
is a graft copolymer, and the acidic groups contained in the resin are not randomly present in the main chain of the polymer, but are specifically bonded only to the ends of the graft part. be.
従って、重合体の主鎖から離れた特定の位置に存在する
酸性基の部分が無機光導電体の化学量論的な欠陥に吸着
し、重合体の主鎖部分は、光導電体の表面をゆるやかに
且つ充分に被覆していると推定される。その事により、
光導電体のトラップを補償すると共に湿度特性を向上さ
せる一方、光導電体の分散が充分に行なわれ、凝集を抑
制するとともに、高温・高温から低温・低湿まで環境変
化が著しく変動しても安定した高性能の電子写真特性を
維持することが判った。そして樹脂CB)は、樹脂〔A
〕を用いたことによる上記電子写真特性の高性能を全(
阻害せずに、樹脂〔A〕のみでは不充分な光導電層の機
械的強度を充分ならしめるものである。特に半導体レー
ザーを用いたスキャニング露光方式を用いる場合に有効
である。Therefore, the part of the acidic group present at a specific position away from the main chain of the polymer adsorbs to the stoichiometric defects of the inorganic photoconductor, and the part of the main chain of the polymer covers the surface of the photoconductor. It is estimated that the coating is loose and sufficient. Due to that,
It compensates for traps in the photoconductor and improves humidity characteristics, while ensuring sufficient dispersion of the photoconductor, suppressing agglomeration, and being stable even when the environment changes significantly from high temperature/high temperature to low temperature/low humidity. It was found that high performance electrophotographic properties were maintained. And resin CB) is resin [A
] The high performance of the electrophotographic properties mentioned above can be achieved by using (
It makes the mechanical strength of the photoconductive layer sufficient, which is insufficient with resin [A] alone, without inhibiting it. This is particularly effective when using a scanning exposure method using a semiconductor laser.
また、本発明では光導電層表面の平滑性が滑らかとなる
。電子写真式平版印刷原版として光導電層表面の平滑性
の粗らい感光体を用いると、光導電体である酸化亜鉛粒
子と結着樹脂の分散状態が適切でなく、凝集物が存在す
る状態で光導電層が形成されるため、不感脂化処理液に
よる不感脂化処理をしても非画像部の親水化が均一に充
分に行なわれず、印刷時に印刷インキの付着を引き起こ
し、結果として印刷物の非画像部の地汚れが生じてしま
う。Further, in the present invention, the surface of the photoconductive layer has smoothness. When a photoreceptor with a rough photoconductive layer surface is used as an electrophotographic lithographic printing original plate, the dispersion state of the zinc oxide particles that are the photoconductor and the binder resin is not appropriate, and aggregates may be present. Because a photoconductive layer is formed, even if desensitization treatment is performed using a desensitization treatment liquid, the non-image areas cannot be made uniformly and sufficiently hydrophilic, causing printing ink to adhere during printing, and as a result, the printed matter deteriorates. Background stains occur in non-image areas.
更に極性基をグラフト部末端でなく重合体主鎖に連結す
る側鎖に含有するランダム共重合体樹脂に比べて光感度
が良好であることが判った。Furthermore, it was found that the photosensitivity was better than that of a random copolymer resin in which the polar group is contained not at the end of the graft portion but in the side chain connected to the main chain of the polymer.
通常可視光〜赤外光域に光感度を保育させるために用い
る分光増感色素は、光導電体に吸着することでその分光
増感作用が充分機能するものであることから、本発明の
共重合体を含有する結着樹脂は、分光増感色素の吸着を
阻害しないで光導電体と適切に相互作用するものと推定
される。この作用は、近赤外〜赤外光の分光増感用色素
として特に有効なシアニン色素あるいはフタロソアニン
系顔料で特に顕著な効果を示した。Spectral sensitizing dyes, which are normally used to maintain photosensitivity in the visible to infrared light range, fully function their spectral sensitizing action when adsorbed to a photoconductor. It is assumed that the polymer-containing binder resin interacts appropriately with the photoconductor without inhibiting adsorption of the spectral sensitizing dye. This effect was particularly remarkable with cyanine dyes or phthalosoanine pigments, which are particularly effective as dyes for spectral sensitization of near-infrared to infrared light.
本発明における低分子量体の樹脂[A)のみを結着樹脂
として用いる場合にも、光導電体と結着樹脂が充分に吸
着し、粒子表面を被覆し得るため、光導電層の平滑性及
び静電特性においても良好で、しかも地汚れのない画質
が得られ、更に、CPC感光体あるいは数十枚の印刷枚
数のオフセント原版としては充分な膜強度が保有される
。しかし、ここで本発明の如く樹脂〔B〕を共存させる
ことで、樹脂〔A〕の機能を何ら疎外することなく機能
〔A〕のみではいまだ不充分な光導電層の機械的強度を
より向上させることができた。従って、本発明の感光体
は、環境条件が変動しても優れた静電特性を有し且つ、
膜強度も充分であり、苛酷な印刷条件下(例えば大型臼
Wllfliで印圧が強くなる場合など)でも8000
枚以上の印刷枚数が可能となった。Even when only the low molecular weight resin [A] in the present invention is used as the binder resin, the photoconductor and the binder resin can sufficiently adsorb and coat the particle surface, which improves the smoothness of the photoconductive layer. It has good electrostatic properties, provides image quality without background smearing, and has sufficient film strength for use as a CPC photoreceptor or as an offset original plate for printing several tens of sheets. However, by coexisting resin [B] as in the present invention, the mechanical strength of the photoconductive layer, which is still insufficient with function [A] alone, is further improved without alienating the function of resin [A]. I was able to do it. Therefore, the photoreceptor of the present invention has excellent electrostatic properties even when environmental conditions vary, and
The film strength is also sufficient, and even under severe printing conditions (for example, when the printing pressure is strong with a large mill Wllfli), the film strength is 8000
It is now possible to print more than one sheet.
本発明によれば、無機光導電体の結着樹脂として、樹脂
〔A〕と樹脂〔B〕を各々樹脂の重量平均分子量並びに
樹脂中の酸性基又は極性基の含有量及び結合位置等を特
定化することで、無機光導電体と樹脂との相互作用の強
さを適度に変えることができたことによると推定される
。即ち、相互作用のより強い樹脂〔A〕が選択的に無機
光導電体に適切に吸着し、一方で樹脂〔A〕に比べて相
互作用の弱い樹脂〔B〕においては、樹脂中の重合体主
鎖に対して特定の位置に結合した酸性基が電子写真特性
を疎外しない程度に無機光導電体とゆるやかに相互作用
し、且つ樹脂〔B〕間においては長い分子鎖長及びグラ
フト部鎖長の分子鎖同志が相互作用をすることで、上記
した如く電子写真特性及び膜の機械的強度をともに著し
く向上させることができたと推定される。According to the present invention, the weight average molecular weight of the resin [A] and the resin [B] as the binder resin of the inorganic photoconductor, the content of acidic groups or polar groups in the resin, the bonding position, etc. are determined. It is presumed that this is due to the fact that the strength of the interaction between the inorganic photoconductor and the resin could be appropriately changed by changing the temperature. That is, resin [A] with stronger interaction is selectively and appropriately adsorbed to the inorganic photoconductor, while resin [B] with weaker interaction than resin [A] has a polymer in the resin. The acidic group bonded to a specific position with respect to the main chain interacts gently with the inorganic photoconductor to the extent that the electrophotographic properties are not affected, and the molecular chain length and the graft part chain length are long between the resins [B]. It is presumed that both the electrophotographic properties and the mechanical strength of the film could be significantly improved as described above by the interaction between the molecular chains of the film.
更に、樹脂CB)は、重合体主鎖の月末@ムこのみ−P
OxH*基、 5(hH基、−caoH5、−OH基、
OH
わす)および環状酸無水物含有基から選ばれる少なくと
も1つの極性基を更に結合して成るグラフト共重合体(
以下この高分子量体をとくに樹脂〔B′〕と称する)で
あることが好ましい。Furthermore, resin CB) has a polymer main chain at the end of the month
OxH* group, 5(hH group, -caoH5, -OH group,
Graft copolymer (OH) and at least one polar group selected from cyclic acid anhydride containing groups (
This polymer is preferably referred to as resin [B'] hereinafter.
樹脂〔B′〕を用いると、静電特性、特にり、R,[l
及びE17I@がより良好となり、樹脂〔A〕を用いた
ことによる優れた特性を全く妨げず、その効果は特に高
温・高温、低温低湿等の知多環境変化においても変動が
殆どな(好ましい、更に、膜強度もより良好となり、耐
刷性が向上する。When resin [B'] is used, the electrostatic properties, especially R, [l
and E17I@ are better, and the excellent properties achieved by using resin [A] are not hindered at all, and the effect is that there is almost no fluctuation even in Chita environmental changes such as high temperature, high temperature, low temperature and low humidity (preferable, and , the film strength is also better, and the printing durability is improved.
樹脂〔A〕において、グラフト型共重合体の重量平均分
子量はlXl0”〜2×104、好ましくは3XIQ’
〜I XIO’ 、該マクロモノマー(MA)の共重合
成分の存在割合は5〜80重量%、好ましくは10〜6
帽1%、共重合体主鎖の末端に結合する酸性基の共重合
体中における存在割合は0.5〜15重置%、好ましく
は1〜10重量%である。また、樹脂〔A〕のガラス転
移点は好ましくは一20°C〜120℃、より好ましく
は一1O℃〜90°Cである。In the resin [A], the weight average molecular weight of the graft copolymer is lXl0" to 2x104, preferably 3XIQ'
~I
The proportion of the acidic group bonded to the end of the copolymer main chain in the copolymer is 0.5 to 15% by weight, preferably 1 to 10% by weight. Further, the glass transition point of the resin [A] is preferably -20°C to 120°C, more preferably -10°C to 90°C.
結着樹脂〔A〕の分子量がlXl0’より小さくなると
、皮膜形成能が低下し充分な膜強度が保てず、一方分子
量が2×104より大きくなると本発明の樹脂であって
も電子写真特性(特に初期電位、暗減衰保持率)が劣化
するため好ましくない、特にかかる高分子量体の場合に
末端結合の酸性基含有量が3重量%を越えるとかかる電
子写真特性の劣化が著しく、オフセットマスターとして
用いたときに地汚れが顕著となる。If the molecular weight of the binder resin [A] is smaller than lXl0', the film forming ability will decrease and sufficient film strength cannot be maintained, while if the molecular weight is larger than 2 x 104, even the resin of the present invention may have poor electrophotographic properties. In particular, in the case of such high molecular weight materials, if the content of acidic groups in the terminal bond exceeds 3% by weight, the deterioration of the electrophotographic properties will be significant, and the offset master When used as an adhesive, scumming becomes noticeable.
結着樹脂〔A〕における主鎖末端に結合する酸性基含有
量が0.5重量%より少ないと、初期電位が低くて充分
な画像濃度を得ることができない。If the content of acidic groups bonded to the main chain terminal in the binder resin [A] is less than 0.5% by weight, the initial potential will be low and sufficient image density will not be obtained.
一方該酸性基含有量が15重量%よりも多いと、分散性
が低下し、膜平滑度及び電子写真特性の高温特性が低下
し、更にオフセットマスターとして用いるときに地汚れ
が増大する。On the other hand, if the content of acidic groups is more than 15% by weight, the dispersibility decreases, film smoothness and high-temperature electrophotographic properties decrease, and furthermore, background smearing increases when used as an offset master.
本発明のポリエーテル構造を有するマクロモノマーを共
重合成分として含有するグラフト共重合体樹脂に供せら
れるマクロモノマー(MA)について、更に具体的に説
明する。The macromonomer (MA) used in the graft copolymer resin containing the macromonomer having a polyether structure of the present invention as a copolymerization component will be explained in more detail.
一般式(1)のマクロモノマー(MA)において、好ま
しくは、a、及びagは、互いに同じでも異なってもよ
く、各々水素原子、ハロゲン原子(例えば塩素原子、臭
素原子、フッ素原子)、シアノ基、炭素数1〜3のアル
キル基(例えばメチル基、エチル基、プロピル基等)
、−cooz又は−CLCOOZ (Zは、炭素数1〜
8のアルキル基(例えばメチル基、エチル基、プロピル
基、ブチル基、ペンチル基、ヘキシル基、オクチル基等
)、炭素数7〜9のアラルキル基(例えばベンジル基、
フェネチル基、3−フェニルプロピル基等)又は置換さ
れてもよいフェニル基(例えばフェニル基、トリル基、
キシリル基、メトキシフェニル基等)を表わす。In the macromonomer (MA) of general formula (1), a and ag may be the same or different, and are each a hydrogen atom, a halogen atom (for example, a chlorine atom, a bromine atom, a fluorine atom), or a cyano group. , an alkyl group having 1 to 3 carbon atoms (e.g. methyl group, ethyl group, propyl group, etc.)
, -cooz or -CLCOOZ (Z has 1 to 1 carbon atoms
8 alkyl groups (e.g. methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, octyl group, etc.), aralkyl groups having 7 to 9 carbon atoms (e.g. benzyl group,
phenyl group, 3-phenylpropyl group, etc.) or optionally substituted phenyl group (e.g. phenyl group, tolyl group,
(xylyl group, methoxyphenyl group, etc.).
より好ましくは、al、a2のうちのいずれか一方が水
素原子を表わす。More preferably, either al or a2 represents a hydrogen atom.
Xは、好ましくは、−COO−1
0CO−1−CO−1
co、coo−1−cotoco−1−CONH−5−
CONI(CONH−1P、は、水素原子又は炭素数1
〜12の炭化水素基(例えばメチル基、エチル基、プロ
ピル基、ブチル基、ヘキシル基、オクチル基、デシル基
、ドデシル基、2−メトキシエチル基、2−クロロエチ
ル基、2−シアノエチル基、ベンジル基、メチルベンジ
ル基、クロロベンジル基、メトキシベンジル基、フェネ
チル基、フェニル基、トリル基、クロロフェニル基、メ
トキシフェニル基、ブチルフェニル基等)を表わす。X is preferably -COO-10CO-1-CO-1 co, coo-1-cotoco-1-CONH-5-
CONI (CONH-1P, hydrogen atom or carbon number 1
~12 hydrocarbon groups (e.g. methyl group, ethyl group, propyl group, butyl group, hexyl group, octyl group, decyl group, dodecyl group, 2-methoxyethyl group, 2-chloroethyl group, 2-cyanoethyl group, benzyl group) , methylbenzyl group, chlorobenzyl group, methoxybenzyl group, phenethyl group, phenyl group, tolyl group, chlorophenyl group, methoxyphenyl group, butylphenyl group, etc.).
Yは、Xと一〇−とを連結する基を表わし、直接結合又
は連結基を表わす、連結基を表わすYとしては、ヘテロ
原子を介していてもよい2価の連結基が挙げられ(ヘテ
ロ原子としては、酸素原子、イオウ原子、又は窒素原子
を示す)、例えば、P!
0− −S−−N−−COO−−CONI(−1−5
0!5(hNH−−NHCOO−−NHCONH−等の
結合単位の単独又は組合せの構成より成るものである(
但しfl、f□は同しでも異なってもよく各々、水素原
子、ハロゲン原子(例えば、塩素原子、臭素原子)、ヒ
ドロキシル基、シアノ基、炭素数1〜12の脂肪族基(
例えば、メチル基、エチル基、プロピル基、ブチル基、
ヘキシル基、オクチル基、デシル基、ドデシル基、ベン
ジル基、フェネチル基、2−クロロエチル基、2−シア
ノエチル基、等)等を表わし、P2は前記P1と同一の
内容を表わす)。Y represents a group connecting X and 10- and represents a direct bond or a connecting group. Y representing a connecting group includes a divalent connecting group which may be via a hetero atom (hetero The atom is an oxygen atom, a sulfur atom, or a nitrogen atom), for example, P! 0- -S--N--COO--CONI(-1-5
0!5 (hNH--NHCOO--NHCONH-, etc., consisting of a single or a combination of bonding units (
However, fl and f□ may be the same or different and each represents a hydrogen atom, a halogen atom (for example, a chlorine atom, a bromine atom), a hydroxyl group, a cyano group, an aliphatic group having 1 to 12 carbon atoms (
For example, methyl group, ethyl group, propyl group, butyl group,
(hexyl group, octyl group, decyl group, dodecyl group, benzyl group, phenethyl group, 2-chloroethyl group, 2-cyanoethyl group, etc.), and P2 represents the same content as P1).
(但し、r、、「8は互いに同じでも異なってもよく、
水素原子又は炭素数1〜8のアルキル基(例えばメ5−
JL4、エチル基、プロピル基、ブチル基、へキシル基
、オクチル基等)を表わす)。(However, r, ``8 may be the same or different from each other,
A hydrogen atom or an alkyl group having 1 to 8 carbon atoms (e.g.
JL4 represents an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, etc.).
〔〕内は式1)のマクロモノマー(MA)の重量平均分
子量をI XIO’〜2X’IO’とするに十分な繰り
返し単位を表わし、nは1〜3の整数を表わす、但し、
nが2以上のときは、(〕内のWは少なくとも隣りのC
〕内のWと異なる基を表わし、例えば、以下の如き組合
せが考えられる(以下の各偶において、賀3、―、及び
―、は各々異なる基を表わし、Wと同一の内容を表わす
)。[ ] represents a repeating unit sufficient to make the weight average molecular weight of the macromonomer (MA) of formula 1) IXIO' to 2X'IO', and n represents an integer from 1 to 3, provided that,
When n is 2 or more, W in () is at least the adjacent C
] represents a group different from W, and for example, the following combinations are possible (in each case below, KA3, --, and -- each represent a different group and represent the same content as W).
−x−v−o+w、−o←l。-x-v-o+w, -o←l.
−X−Y−0−E−W、−0)−ヒJofR++−X−
Y−o−(−w+−o)−f−Ht−o)−f−ws−
0+−R。-X-Y-0-E-W, -0)-HiJofR++-X-
Y-o-(-w+-o)-f-Ht-o)-f-ws-
0+-R.
−x −vt−o −f−11+−o )−f−L−0
3−f−11+−0辷R1R0は、水素原子又は炭化水
素基を表わす、炭化水素基としては、炭素数1〜18の
置換されてもよいアルキル基(例えばメチル基、エチル
基、プロピル基、ブチル基、ヘキシル基、オクチル基、
デシル基、ドデシル基、テトラデシル基、オクタデシル
基、2−メトキシエチル基、3−メトキシエチル基、2
−シアノエチル基、2〜エトキシエチル基等)、炭素数
7〜9の置換されてもよいアラルキル基(例えばベンジ
ル基、フェネチル基、3−フェニルプロピル基、メチル
ベンジル基、ジメチルベンジル基、メトキシベンジル基
、クロロベ ンジル基等)、炭素数5〜8の脂環式基(
例えばシクロペンチル基、シクロヘキシル基等)、炭素
数6〜12の置換されてもよい芳香族基(例えば、フェ
ニル基、トリル基、キシリル基、ナフチル基、クロロフ
ェニル基、ブロモフェニル基、アルコキシフェニル基(
アルキル基としては、メチル基、エチル基、プロピル基
、ブチル基、ヘキシル基、オクチル基、ノニル基、デシ
ル基、ドデシル基等)、アセトキシフェニル基、メチル
−クロロ−フェニル基、プロピルフェニル基、ブチルフ
ェニル基、デシルフェニル基等)等が挙げられる。-x -vt-o -f-11+-o) -f-L-0
3-f-11+-0 辷R1R0 represents a hydrogen atom or a hydrocarbon group. Examples of the hydrocarbon group include an optionally substituted alkyl group having 1 to 18 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, Butyl group, hexyl group, octyl group,
Decyl group, dodecyl group, tetradecyl group, octadecyl group, 2-methoxyethyl group, 3-methoxyethyl group, 2
-cyanoethyl group, 2-ethoxyethyl group, etc.), optionally substituted aralkyl groups having 7 to 9 carbon atoms (e.g. benzyl group, phenethyl group, 3-phenylpropyl group, methylbenzyl group, dimethylbenzyl group, methoxybenzyl group) , chlorobenzyl group, etc.), alicyclic group having 5 to 8 carbon atoms (
(e.g., cyclopentyl group, cyclohexyl group, etc.), optionally substituted aromatic groups having 6 to 12 carbon atoms (e.g., phenyl group, tolyl group, xylyl group, naphthyl group, chlorophenyl group, bromophenyl group, alkoxyphenyl group (
Examples of alkyl groups include methyl, ethyl, propyl, butyl, hexyl, octyl, nonyl, decyl, dodecyl, etc.), acetoxyphenyl, methyl-chlorophenyl, propylphenyl, butyl phenyl group, decylphenyl group, etc.).
−船蔵(I)におけるマクロモノマー(MA)の −Y
−
次の例が挙げられるが、これらに限定されるものではな
い、また、以下の各偶において、aは一■、CH,、−
CH*C00CHs、−CI、−Br又は−CNを表わ
し、bは−H又は−CHlを表わし、Pはl又は2の整
数を表わし、mは2〜12の整数を表わし、kは3又は
4の整数を表わす。-Y of macromonomer (MA) in shipyard (I)
- The following examples include, but are not limited to, and in each case below, a is 1, CH, -
CH*C00CHs, -CI, -Br or -CN, b represents -H or -CHl, P represents an integer of 1 or 2, m represents an integer of 2 to 12, k is 3 or 4 represents an integer.
(A−1) a
CNl=C
C〇−
(A−2) CHs
CNl=C
(A−5)
(A
CH2=C
C0NH(CHz(GO−
(A
■
CH,=C
C0NHCOO(CHz)i−
(A−8)
CH,=C
C0NIC0NH(CHirco−
(A
CH2=C
COO(CHthE
(A
If)
CH,=C
C0NH(C)12ルー
(A−12)
cnz=c
COO(CHzhEOCO(CH辻r
(A
CH2=C
C00(CHz)−OCOCH=CH−C0(A
(A
CHz = CH−+CHz−与一
(A−16) b
■
C11,=C
Coo(CHzト「So□IIH(CH2)r−(A−
17) b
CH2=C
COO(C1l!h−Coo(CH2h一般式(I)で
示されるポリエーテル型のマクロモノマー(MA)は、
従来公知の合成法によって製造することができる。即ち
、カルボン酸類又はアルコール類とエポキサイド類ある
いはテトラヒドロフラン類とのカチオン重合により合成
する方法により得られる。具体的には、P、F、Rem
pp and E。(A-1) a CNl=C C〇- (A-2) CHs CNl=C (A-5) (A CH2=C C0NH(CHz(GO-) (A ■ CH,=C C0NHCOO(CHz)i- (A-8) CH,=C C0NIC0NH(CHirco- (A CH2=C COO(CHthE (A If) CH,=C C0NH(C)12ru (A-12) cnz=c COO(CHzhEOCO(CH A -(A-
17) b CH2=C COO(C1l!h-Coo(CH2h) The polyether type macromonomer (MA) represented by the general formula (I) is
It can be produced by conventionally known synthesis methods. That is, it can be obtained by a method of synthesis by cationic polymerization of carboxylic acids or alcohols and epoxides or tetrahydrofurans. Specifically, P, F, Rem
pp and E.
Franta、 Adv:Polym、Sci、58.
3(1984)、 R,Asami、 M。Franta, Adv: Polym, Sci, 58.
3 (1984), R, Asami, M.
Takaki K、Kita and E、Asak
ura、 Makromol、Che*。Takaki K, Kita and E, Asak
ura, Makromol, Che*.
186 +685(1985)+ R,Asami
and M、 Takaki、Makromo
lChew、 5upp1.、 14. 163(1
985)、 P、Rempp、 P、LutzP、
Masson and E、Franta、 M
akromol、Che鴎、、 5uppl。186 +685 (1985) + R, Asami
and M, Takaki, Makromo
lChew, 5upp1. , 14. 163 (1
985), P, Rempp, P, LutzP,
Masson and E, Franta, M.
akromol, Che gu,, 5uppl.
11、3 (1984)、 相田卓三、井上祥平、有
機合成協会誌、43.300(1985)等に記載の合
成法によって合成することができる。11, 3 (1984), Takuzo Aida, Shohei Inoue, Journal of Organic Synthesis Association, 43.300 (1985), etc.
以下に、本発明に供される一般式(1)で示Jれるマク
ロモノマー(MA)についての具体例を示1が、本発明
の範囲はこれらに限定されるもので番。Specific examples of the macromonomer (MA) represented by general formula (1) used in the present invention are shown below, but the scope of the present invention is not limited to these.
ない。また、各側において、a、b、l、m、シは前記
と同一の内容を表わす。do not have. Further, on each side, a, b, l, m, and shi represent the same contents as above.
(門A−1) b
(MA−2ン
(MA−3)
(MA−4>
(■
よ
0■
(MA
(MA
(MA
(門A
(1A
(MA
(MA
(MA
(MA
(MA
(11A
本発明の結着樹脂〔A〕は、前記した一般式(1)のマ
クロモノマーを共重合成分とするグラフト共重合体であ
り、他の共重合成分としては、前記した結着樹脂の物性
を満足し、且つ該マクロモノマーとラジカル共重合し得
る単量体であればいずれでもよい。(gate A-1) b (MA-2 (MA-3) (MA-4> (■ yo0■ (MA (MA (MA (MA) (gate A-1) The binder resin [A] of the present invention is a graft copolymer containing the macromonomer of general formula (1) described above as a copolymerization component, and other copolymerization components that have the physical properties of the binder resin described above. Any monomer may be used as long as it satisfies the above requirements and can be radically copolymerized with the macromonomer.
好ましくは、下記−船蔵(n)で示される単量体を共重
合成分として共重合体中の20〜95重量%、好ましく
は40〜90重量%の量で含有する。Preferably, the monomer represented by -Funzo (n) below is contained as a copolymer component in an amount of 20 to 95% by weight, preferably 40 to 90% by weight of the copolymer.
−船蔵(n) b、b2
CH=C
X3 1Lz
一般式(II)において、bl、b2は式(1)中の8
1、a2と同一の内容を表わし、より好ましくは、水素
原子又はメチル基を表わす。-Ship storage (n) b, b2 CH=C X3 1Lz In general formula (II), bl and b2 are 8 in formula (1)
1, represents the same content as a2, and more preferably represents a hydrogen atom or a methyl group.
×3は−000−1−〇C〇−又は−O−を表わし、好
ましくは−COO−を表わす。×3 represents -000-1-〇C〇- or -O-, preferably -COO-.
R12は、炭素数1〜18の炭化水素基を表わす。R12 represents a hydrocarbon group having 1 to 18 carbon atoms.
好ましくは、炭素数1〜18の置換されていてもよいア
ルキル基(例えば、メチル基、エチル基、プロピル基、
ブチル基、ペンチル基、ヘキシル基、オクチル基、デシ
ル基、ドデシル基、トリデシル基、テトラデシル基、2
−メトキシエチル基、2エトキシエチル基、2−ヒドロ
キシエチル基、3−ヒドロキシプロピル基、2−ヒドロ
キシプロピル基、2−クロロエチル基、2−シアノエチ
ル基、2−01.N−ジメチルアミノ)エチル基、2.
3ジヒドロキシプロピル基、3−カルバモイルプロピル
基等)、炭素数7〜12の置換されていてもよいアラル
キル基(例えばヘンシル基、フェネチル基、メトキシヘ
ンシル基、エトキシヘンシル基、メチルヘンシル基、ジ
メチルヘンシル基、クロロヘンシル基、ジクロロヘンシ
ル基、ジブロモベンジル基、アセトキンヘンノル基、シ
アノベンジル基、ナフチルメチル基、2−ナフチルエチ
ル基等)、炭素数5〜8の置換されていてもよいシクロ
アルキル基(例えばシクロペンチル基、シクロへキシル
基、シクロへブチル基等)、置換されていてもよいアリ
ール基(例えば、フェニル基、トリル基、キシリル基、
メシチル基、ナフチル基、メトキシフェニル基、エトキ
シフェニル基、クロロフェニル基、ジクロロフェニルL
ブロモフェニル基、ジブロモフェニル基、クロロブロ
モフェニル基、アセトキシフェニル基、アセチルフェニ
ル基、クロロ−メチル−フェニル基、プロモーメチル−
フェニル基、シアノフェニル基、メトキシカルボニルフ
ェニル基等)等を表わす。Preferably, an optionally substituted alkyl group having 1 to 18 carbon atoms (for example, a methyl group, an ethyl group, a propyl group,
Butyl group, pentyl group, hexyl group, octyl group, decyl group, dodecyl group, tridecyl group, tetradecyl group, 2
-Methoxyethyl group, 2ethoxyethyl group, 2-hydroxyethyl group, 3-hydroxypropyl group, 2-hydroxypropyl group, 2-chloroethyl group, 2-cyanoethyl group, 2-01. N-dimethylamino)ethyl group, 2.
3-dihydroxypropyl group, 3-carbamoylpropyl group, etc.), optionally substituted aralkyl groups having 7 to 12 carbon atoms (e.g., hensyl group, phenethyl group, methoxyhensyl group, ethoxyhensyl group, methylhensyl group, dimethylhensyl group) sil group, chlorohensyl group, dichlorohensyl group, dibromobenzyl group, acetoquinhenyl group, cyanobenzyl group, naphthylmethyl group, 2-naphthylethyl group, etc.), optionally substituted cyclo having 5 to 8 carbon atoms Alkyl groups (e.g. cyclopentyl group, cyclohexyl group, cyclohebutyl group, etc.), optionally substituted aryl groups (e.g. phenyl group, tolyl group, xylyl group,
Mesityl group, naphthyl group, methoxyphenyl group, ethoxyphenyl group, chlorophenyl group, dichlorophenyl L
Bromophenyl group, dibromophenyl group, chlorobromophenyl group, acetoxyphenyl group, acetylphenyl group, chloro-methyl-phenyl group, promomethyl-
phenyl group, cyanophenyl group, methoxycarbonylphenyl group, etc.).
更に、本発明の樹脂は、前記した一般式(1)のマクロ
モノマ−(MA)及び−船蔵(If)の単量体とともに
これら以外の他の単量体を共重合成分として含有しても
よい。Furthermore, the resin of the present invention may contain monomers other than these as copolymerization components together with the macromonomer (MA) and the monomer (If) of general formula (1) described above. good.
例えば、α−オレフィン類、アルカン酸ビニル又はアリ
ルエステル類、アクリロニトリル、メタクリロニトリル
、ビニルエーテル類、アクリルアミド類、メタクリルア
ミド類、スチレン類、複素環ビニル類(例えば、ビニル
ピロリドン、ビニルピリジン、ビニルイミダゾール、ビ
ニルチオフェン、ビニルイミダシリン、ビニルピラゾー
ル、ビニルジオキサン、ビニルキノリン、ビニルチアゾ
ール、ビニルオキサジン等)等が挙げられる。For example, α-olefins, vinyl alkanoates or allyl esters, acrylonitrile, methacrylonitrile, vinyl ethers, acrylamides, methacrylamides, styrenes, heterocyclic vinyls (e.g., vinylpyrrolidone, vinylpyridine, vinylimidazole, vinylthiophene, vinylimidacilline, vinylpyrazole, vinyldioxane, vinylquinoline, vinylthiazole, vinyloxazine, etc.).
但し、これら他の単量体は、共重合体中20重量%以上
を越えることはない。However, the content of these other monomers in the copolymer does not exceed 20% by weight.
本発明のグラフト共重合体において、マクロモノマー(
MA)に相当する共重合成分が5重量%以下となると、
感光層塗布物としての分散が充分に行なわれなくなって
しまう。又80重量%を越えると、−船蔵(n)との共
重合が充分に進行しなくなり、所望のグラフト共重合体
以外に一般式(■)の単量体あるいは他の単量体のみの
重合体が形成してしまうため好ましくない。更には、こ
れろの樹脂を用いて分散すると、光導電体との凝集が発
生してしまう。In the graft copolymer of the present invention, the macromonomer (
When the copolymerization component corresponding to MA) is 5% by weight or less,
Dispersion as a photosensitive layer coating product will not be sufficient. Moreover, if it exceeds 80% by weight, the copolymerization with -Fleet (n) will not proceed sufficiently, and in addition to the desired graft copolymer, only the monomer of general formula (■) or other monomers will be present. This is not preferable because a polymer is formed. Furthermore, when these resins are used for dispersion, aggregation with the photoconductor occurs.
樹脂〔A)はこれらグラフト型共重合体の玉鎖の末端に
酸性基(−POJ、基、−5038基、−COOH基、
H
及びR6が表わす炭化水素基としては、弐N)のR1+
の炭化水素基と同一の内容を表わす。The resin [A] has acidic groups (-POJ, -5038 group, -COOH group, -COOH group,
As the hydrocarbon group represented by H and R6, R1+ of 2N)
represents the same content as the hydrocarbon group.
これらの酸性基は、重合体主鎖の末端に直接結合しても
よいし、連結基を介して結合してもよい。These acidic groups may be directly bonded to the terminal of the polymer main chain or may be bonded via a linking group.
連結基としては、いずれの結合する基でもよいが、α貫
例えば具体的に挙げるとすれば、子C,+TT−αt
(α1、αオは同じでも異なってもよく、各り水素原子
、ハロゲン原子(塩素原子、臭素原子等)、OH基、−
シアノ基、アルキル基(メチル基、エチル基、2−クロ
ロエチル基、2−ヒドロキシエチル基、プロピル基、ブ
チル基、ヘキンル基等)、アラルキル基(ヘンシル基、
フェネチル基等)、フェニル基等を表わす)、
αコ α−
千CH=CH→−(α1、α4はα1、α2と同一α5
S−−N−(α、は、水素原子、又は炭化水素基を表わ
す(炭化水素基として具体的には炭素数1〜12の炭化
水素基(例えばメチル基、エチル基、プロピル基、ブチ
ル基、ヘキンル基、オクチル基、デンル基、ドデシル基
、2−メトキシエチル基、2−クロロエチル基、2−シ
アノエチル基、ベンジル基、メチルベンジル基、クロロ
ベンジル基、メトキシベンジル基、フェネチル基、フェ
ニル基、トリル基、クロロフェニル基、メチキシフェニ
ル基、ブチルフェニル基等)が挙げられる))−S02
NHCONHNHCOO’ N)ls
Oz−C0NHCOO−1−C0NHCONII−1複
素環(ペテロ原子として、O,S、N等の少なくとも1
種含有する5〜6員環又はこれらの縮合環であればいず
れでもよい:例えば、チオフェン環、ピリジン環、フラ
ン環、イミダゾール環、ピペリジン環、モルα6
ホリン環等が挙げられる)又は−31−(α6、α7α
)
は同しでも異なってもよく、炭化水素基又は−0α。The linking group may be any bonding group, but specific examples include α1, +TT-αt (α1 and αO may be the same or different, and each may be a hydrogen atom, a halogen Atom (chlorine atom, bromine atom, etc.), OH group, -
Cyano group, alkyl group (methyl group, ethyl group, 2-chloroethyl group, 2-hydroxyethyl group, propyl group, butyl group, hequinyl group, etc.), aralkyl group (hensyl group,
phenyl group, etc.), phenyl group, etc.), α- 1,000 CH=CH→- (α1, α4 are the same as α1, α2 α5 S--N- (α is a hydrogen atom or a hydrocarbon group) (Specifically, the hydrocarbon group includes a hydrocarbon group having 1 to 12 carbon atoms (e.g., methyl group, ethyl group, propyl group, butyl group, hequinyl group, octyl group, denyl group, dodecyl group, 2-methoxyethyl group) group, 2-chloroethyl group, 2-cyanoethyl group, benzyl group, methylbenzyl group, chlorobenzyl group, methoxybenzyl group, phenethyl group, phenyl group, tolyl group, chlorophenyl group, methoxyphenyl group, butylphenyl group) ))-S02
NHCONHNHCOO' N)ls
Oz-C0NHCOO-1-C0NHCONII-1 heterocycle (at least one of O, S, N, etc. as a petro atom)
Any 5- to 6-membered ring containing a species or a condensed ring thereof may be used (for example, a thiophene ring, a pyridine ring, a furan ring, an imidazole ring, a piperidine ring, a mole α6 holin ring, etc.) or -31- (α6, α7α
) may be the same or different, and are a hydrocarbon group or -0α.
(α8は炭化水素基)を表わす。これらの炭化水素基と
しては、α、で挙げたものと同一のものを挙げることが
できる)等の結合基の単独又は、これらの組合せにより
構成された連結基等が挙げられる。(α8 is a hydrocarbon group). Examples of these hydrocarbon groups include the same ones as those listed for α) alone or a linking group constituted by a combination thereof.
これらの樹脂の製造方法として、具体的には、該酸性基
又は後に変換して該酸性基に代えることのできる官能基
を含有する重合開始剤を用いる方法、あるいは該酸性基
又は後に該酸性基に変換できる官能基を含有する連鎖移
動剤を用いる方法、前記両者を併用する方法、更には、
アニオン重合法において停止反応を利用し、該官能基を
導入する方法等を用いて製造することができる。Specifically, methods for producing these resins include a method using a polymerization initiator containing the acidic group or a functional group that can be converted later to replace the acidic group; A method using a chain transfer agent containing a functional group that can be converted into
It can be produced using a method of introducing the functional group by utilizing a termination reaction in an anionic polymerization method.
例えば、P、Dreyfuss、 R,P、Quirk
、Encycl、Po1y+5SCj、Eng、Z、
551(1987) 、V、Percec、Appl
、Polym。For example, P, Dreyfuss, R, P, Quirk.
, Encycle, Po1y+5SCj, Eng, Z,
551 (1987), V. Percec, Appl.
, Polym.
Sci、刈紅95(1985) 、P、F、Rempp
、 E、Franta、Adv。Sci, Karibeni 95 (1985), P.F., Rempp.
, E., Franta, Adv.
POIym、Sci、53. 1(1984) 、
Y、Yamashita、 J、Appl。POIym, Sci, 53. 1 (1984),
Y, Yamashita, J, Appl.
Po1y+s、Sci、Appl、Polym、5ys
p、36.193(1981)、R,Asasi、
M、Takaki、 Makromol、Chem、
5upp1. 12゜163(1985)等の総説引例
の合成方法によって製造することができる。Po1y+s, Sci, Appl, Polym, 5ys
p, 36.193 (1981), R, Asasi,
M, Takaki, Makromol, Chem.
5upp1. 12° 163 (1985), etc., by the synthesis method cited in the review.
本発明の結着樹脂は、上記の如き樹脂〔A〕を2種以上
含有していてもよい。The binder resin of the present invention may contain two or more types of resins [A] as described above.
一方、樹脂〔B〕の重量平均分子量は5×104〜l
×104、好ましくは8×104〜5X10Sである。On the other hand, the weight average molecular weight of resin [B] is 5 x 104 ~ l
x104, preferably 8 x 104 to 5 x 10S.
−官能性マクロモノマー(MB)の重合体中における存
在割合は、1〜70重量%であることが好ましく、また
、−船蔵(V)で示される単量体の重合体中における存
在割合は30〜99重量%であることが好ましい。- The proportion of the functional macromonomer (MB) in the polymer is preferably from 1 to 70% by weight, and - the proportion of the monomer represented by shipyard (V) in the polymer is It is preferably 30 to 99% by weight.
共重合体主鎖末端に極性基が結合する場合における該極
性基の共重合体中における存在割合は0.1〜10重量
%、好ましくは0.2〜5重量%である。When a polar group is bonded to the end of the main chain of the copolymer, the proportion of the polar group in the copolymer is 0.1 to 10% by weight, preferably 0.2 to 5% by weight.
樹脂〔B〕のガラス転移点は、好ましくは0゛c〜ll
o’c、より好ましくは、20°C〜90°Cである。The glass transition point of the resin [B] is preferably 0゛c~ll
o'c, more preferably 20°C to 90°C.
結着樹脂CB)の分子量が5XIO’より小さくなると
、膜強度が充分に保てず、一方分子量が1×106より
大きくなると、分散性が低下し膜平滑度が劣下し、複写
画像の再質(特に、細線・文字の再現性が悪くなる)が
悪化し、更にオフセットマスターとして用いる時に地汚
れが著しくなってしまう。If the molecular weight of the binder resin CB) is smaller than 5XIO', sufficient film strength cannot be maintained, while if the molecular weight is larger than 1 x 106, dispersibility decreases and film smoothness deteriorates, making it difficult to reproduce copied images. The quality (particularly the reproducibility of fine lines and characters deteriorates) is deteriorated, and furthermore, when used as an offset master, background stains become significant.
結着樹脂〔B〕における−官能性マクロモノマー(MB
)の含有量が1.0重量%より少ないと電子写真特性(
特に暗減衰率、光感度)が低下し、又環境条件での電子
写真特性の変動が特に近赤外〜赤外光分光増感色素との
組み合わせにおいて、大きくなる。これはグラフト部と
なるマクロモノマーが微かとなることで結果として従来
のホモポリマーあるいはランダム共重合体と殆んど回し
組成になってしまうことによると考えられる。-Functional macromonomer (MB) in binder resin [B]
) content is less than 1.0% by weight, the electrophotographic properties (
In particular, dark decay rate, photosensitivity) are reduced, and fluctuations in electrophotographic properties under environmental conditions become large, especially in combination with near-infrared to infrared spectral sensitizing dyes. This is thought to be due to the fact that the amount of the macromonomer that becomes the graft portion is small, resulting in a composition that is almost the same as that of conventional homopolymers or random copolymers.
−カー官能性マクロモノマー(MB)の含有量が70%
を越えると、他の共重合成分に相当する単量体と本発明
に従うマクロモノマーとの共重合性が充分でなくなり、
結着樹脂として用いても充分な電子写真特性が得られな
くなってしまう。- 70% car-functional macromonomer (MB) content
If it exceeds this, the copolymerizability of the macromonomer according to the present invention with monomers corresponding to other copolymerization components will not be sufficient,
Even if it is used as a binder resin, sufficient electrophotographic properties cannot be obtained.
本発明の用脂〔B〕において、グラフト型共重合樹脂の
共重合成分として供せられる、−官能基マクロモノマー
(MB)について更に具体的に説明する。−官能性マク
ロモノマー(MB)は、−船蔵(Ill)で示される重
合性二重結合基を、−船蔵(IVa)及び(rVb)で
示される重合体成分のうちの少なくとも1種と特定の極
性基(−C0OH基、OH
CHO基及び/又は酸無水物含有基)を含有する重合体
成分のうちの少なくともlitを含有する重合体主鎖の
一方の末端にのみ結合して成る、重量平均分子量2×1
04以下のものである。In the oil [B] of the present invention, the -functional group macromonomer (MB) provided as a copolymerization component of the graft type copolymer resin will be explained in more detail. - The functional macromonomer (MB) has a polymerizable double bond group represented by - Funazura (Ill) and at least one of the polymer components represented by - Funazura (IVa) and (rVb). Of the polymer components containing a specific polar group (-C0OH group, OH CHO group and/or acid anhydride-containing group), at least lit is bonded to only one end of the polymer main chain, Weight average molecular weight 2×1
04 or less.
一般弐(I[l)、(rVa)及び(■b)において、
C5、C2、Xo、dl、d2、島、Q、及びQoに含
まれる炭化水素基は各々示された炭素数(未置換の炭化
水素基としての)を有するが、これら炭化水素基は置換
基を有していてもよい。In general 2 (I[l), (rVa) and (■b),
The hydrocarbon groups contained in C5, C2, Xo, dl, d2, island, Q, and Qo each have the indicated number of carbon atoms (as an unsubstituted hydrocarbon group); It may have.
一般式(III)において、Xoは、−coo−1−O
CO−1CI(,0CO−2−C)I200− −0−
−3(h−−CO−5子のほか、好ましい炭化水素基
としては、炭素数1〜18の置換されてもよいアルキル
基(例えば、メチル基、エチル基、プロピル基、ブチル
基、ヘプチル基、ヘキシル基、オクチル基、デシル基、
ドデシル基、ヘキサデシル基、オクタデシル基、2−ク
ロロエチル基、2−ブロモエチル、I、2−シアノエチ
ル基、2−メトキシカルボニルエチル基、2−メトキシ
エチル基、3−ブロモプロピル基等)、炭素数4〜18
の置換されてもよいアルヶニル基(例えば、2−メチル
−1−プロペニル基、2−ブテニル基、2−ペンテニル
基、3−メチル2−ペンテニル基、1−ペンテニルL
1−へキセニル基、2−ヘキセニル基、4−メチル−
2へキセニル基等)、炭素数7〜12の置換されてもよ
いアラルキル基(例えば、ヘンシル基、フェネチル基、
3−フェニルプロピル基、ナフチルメチル基、2−ナフ
チルエチル基、クロロベンジル基、ブロモヘンシル基、
メチルベンジル基、エチルヘンシル基、メトキシベンジ
ル基、ジメチルベンジル基、ジメトキシベンジル基等)
、炭素数5〜8の置換されてもよい脂環式基(例えば、
シクロヘキシル基、2−シクロヘキシルエチル基、2−
シクロペンチルエチル基等)又は炭素数6〜12の置換
されてもよい芳香族基(例えば、フェニル基、ナフチル
基、トリル基、キシリル基、プロピルフェニル基、ブチ
ルフェニル基、オクチルフェニル基、ドデシルフェニル
基、メトキシフェニル基、エトキシフェニル基、ブトキ
シフェニル基、デシルオキシフェニル基、クロロフェニ
ル基、ジクロロフェニル基、ブロモフェニル基、シアノ
フェニル基、アセチルフェニル基、メトキシカルボニル
フェニル基、エトキシカルボニルフェニル基、ブトキシ
カルボニルフェニル基、アセトアミドフェニル基、プロ
ピオアミドフェニル基、ドブノロイルアミドフェニル基
等)があげられる。In general formula (III), Xo is -coo-1-O
CO-1CI(,0CO-2-C)I200- -0-
-3(h--CO-5, preferred hydrocarbon groups include optionally substituted alkyl groups having 1 to 18 carbon atoms (e.g., methyl group, ethyl group, propyl group, butyl group, heptyl group) , hexyl group, octyl group, decyl group,
dodecyl group, hexadecyl group, octadecyl group, 2-chloroethyl group, 2-bromoethyl, I, 2-cyanoethyl group, 2-methoxycarbonylethyl group, 2-methoxyethyl group, 3-bromopropyl group, etc.), carbon number 4 to 18
an optionally substituted alganyl group (e.g., 2-methyl-1-propenyl group, 2-butenyl group, 2-pentenyl group, 3-methyl-2-pentenyl group, 1-pentenyl L
1-hexenyl group, 2-hexenyl group, 4-methyl-
2hexenyl group, etc.), an optionally substituted aralkyl group having 7 to 12 carbon atoms (e.g., hensyl group, phenethyl group,
3-phenylpropyl group, naphthylmethyl group, 2-naphthylethyl group, chlorobenzyl group, bromohensyl group,
methylbenzyl group, ethylhensyl group, methoxybenzyl group, dimethylbenzyl group, dimethoxybenzyl group, etc.)
, an optionally substituted alicyclic group having 5 to 8 carbon atoms (for example,
Cyclohexyl group, 2-cyclohexylethyl group, 2-
cyclopentylethyl group, etc.) or an optionally substituted aromatic group having 6 to 12 carbon atoms (e.g., phenyl group, naphthyl group, tolyl group, xylyl group, propylphenyl group, butylphenyl group, octylphenyl group, dodecylphenyl group) , methoxyphenyl group, ethoxyphenyl group, butoxyphenyl group, decyloxyphenyl group, chlorophenyl group, dichlorophenyl group, bromophenyl group, cyanophenyl group, acetylphenyl group, methoxycarbonylphenyl group, ethoxycarbonylphenyl group, butoxycarbonylphenyl group , acetamidophenyl group, propioamidophenyl group, dobnoloylamidophenyl group, etc.).
置換基を有してもよい。置換基としては、ハロゲン原子
(例えば塩素原子、臭素原子等)、アルキル基(例えば
メチル基、エチル基、プロピル基、ブチル基、クロロメ
チル基、メトキシメチル基等)、アルコキシ基(例えば
メトキシ基、エトキン基、プロピオキシ基、ブトキシ基
等)等が挙げられる。It may have a substituent. Examples of substituents include halogen atoms (e.g., chlorine atom, bromine atom, etc.), alkyl groups (e.g., methyl group, ethyl group, propyl group, butyl group, chloromethyl group, methoxymethyl group, etc.), alkoxy groups (e.g., methoxy group, (ethquin group, propioxy group, butoxy group, etc.).
C5及びczは、互いに同じでも異なっていてもよく、
好ましくは水素原子、ハロゲン原子(例えば、塩素原子
、臭素原子等)、シアノ基、炭素数1〜4のアルキル基
(例えば、メチル基、エチル基、プロピル基、ブチル基
等) 、−coo−z、又は炭化水素を介したC00Z
I(Zlは、好ましくは水素原子又は炭素数1〜18の
アルキル基、アルケニル基、アラルキル基、脂環式基ま
たは了り−ル基を表わし、これらは置換されていてもよ
く、具体的には、上記R31について説明したものと同
様の内容を表わす)を表わす。C5 and cz may be the same or different from each other,
Preferably a hydrogen atom, a halogen atom (for example, a chlorine atom, a bromine atom, etc.), a cyano group, an alkyl group having 1 to 4 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group, etc.), -coo-z , or C00Z via hydrocarbon
I (Zl preferably represents a hydrogen atom or an alkyl group having 1 to 18 carbon atoms, an alkenyl group, an aralkyl group, an alicyclic group, or an alicyclic group, which may be substituted, specifically represents the same content as that described for R31 above).
上記炭化水素を介した一coo−z、基における炭化水
素としては、メチレン基、エチレン基、プロピレン基等
が挙げられる。Examples of the hydrocarbon in the one-coo-z group via the hydrocarbon include a methylene group, an ethylene group, a propylene group, and the like.
更に好ましくは、−船蔵(I)について、xoはCOO
−−0CO−−ClbOCO−−CH2C0O−−O−
−CONHCOO−−CONI(CONH−−CONH
−いに同じでも異なってもよく、各々水素原子、メチル
基、 C00Zs又は−C1(zcOOZs (Zsは
、より好ましくは水素原子又は炭素数1〜6のアルキル
基(例えばメチル基、エチル基、プロピル基、ブチル基
、ヘキシル基等)を表わす。)を表わす。更により好ま
しくは、Cl5C!においていずれか一方が水素原子を
表わす。More preferably, - for shipyard (I), xo is COO
--0CO--ClbOCO--CH2C0O--O-
-CONHCOO--CONI(CONH--CONH
- may be the same or different, and each is a hydrogen atom, a methyl group, C00Zs or -C1(zcOOZs (Zs is more preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms (for example, a methyl group, an ethyl group, a propyl group) In Cl5C!, one of them represents a hydrogen atom.
即ち、−船蔵(I[l)で表わされる重合性重粘
合基として、具体的には、
CH,=C1(−C−(I
CfhCOOCHi
CH2=C
O=C−O−
CH,OC1h O
II l +1
CH2=C−C−0−1C)l=CH−C−0C)1.
C00I(
CH2=C
CHz=CH−CONH
−C
等が挙げられる。That is, the polymerizable polymerizable group represented by -Funazou (I[l) is, specifically, CH,=C1(-C-(I CfhCOOCHi CH2=C O=C-O- CH,OC1h O II l +1 CH2=C-C-0-1C) l=CH-C-0C)1.
C00I (CH2=C CHz=CH-CONH-C, etc.).
一般式(IVa)又は(rVb)において、Xlは式(
Ill)中のXoと同一の内容を表わす。dl、d2は
互いに同じでも異なってもよく、式(DI)中のC0、
C2と同一の内容を表わす。In the general formula (IVa) or (rVb), Xl is the formula (
It represents the same content as Xo in Ill). dl and d2 may be the same or different from each other, and C0 in formula (DI),
Represents the same content as C2.
Qlは、炭素数1〜18の脂肪族基又は炭素数6〜12
の芳香族基を表わす。Ql is an aliphatic group having 1 to 18 carbon atoms or 6 to 12 carbon atoms
represents an aromatic group.
具体的には、炭素数1−18の置換されてもよいアルキ
ル基(例えばメチル基、エチル基、プロピル基、ブチル
基、ヘプチル基、ヘキシル基、オクチル基、デノル基、
ドデシル基、トリデシル基、ヘキサデソル基、オクタデ
シル基、2−クロロエチル基、2−ブロモエチル基、2
−ヒドロキシルエチル基、2−メトキシエチル基、2−
エトキシエチル基、2−シアンエチル基、3−クロロプ
ロヒル基、2−(トリメトキシシリル)エチル基、2−
テトラヒドロフリル基、2−チエニルエチル基、2−N
、N−ジメチルアミノエチル基、2−N、Nジエチルア
ミノエチル基等)、炭素数5〜8のシクロアルキル基(
例えばシクロヘプチル基、シクロヘキシル基、クロロナ
フチル基等)、炭素数7〜12の置換されてもよいアラ
ルキル基(例えば、ヘンシル基、フェネチル基、3−フ
ェニルプロピル基、ナフチルメチル基、2−ナフチルエ
チル基、クロロベンジル基、ブロモベンジル基、ジクロ
ロベンジル基、メチルベンジル基、クロロ−メチルヘン
シル基、ジメチルベンジル基、トリメチルヘンシル基、
メトキノヘンシル基等)等の脂肪族基、更に炭素数6〜
12の置換されてもよいアリール基(例えば、フェニル
基、トリル基、キンリル基、クロロフェニル基、ブロモ
フェニル基、ジクロロフェニル基、クロロ−メチル−フ
ェニル基、メトキシフェニル基、メトキシカルボニルフ
ェニル基、ナフチル基、クロロナフチル基等)等の芳香
族基が挙げられる。Specifically, an optionally substituted alkyl group having 1 to 18 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a heptyl group, a hexyl group, an octyl group, a denol group,
Dodecyl group, tridecyl group, hexadesol group, octadecyl group, 2-chloroethyl group, 2-bromoethyl group, 2
-hydroxylethyl group, 2-methoxyethyl group, 2-
Ethoxyethyl group, 2-cyanoethyl group, 3-chloroproyl group, 2-(trimethoxysilyl)ethyl group, 2-
Tetrahydrofuryl group, 2-thienylethyl group, 2-N
, N-dimethylaminoethyl group, 2-N,N-diethylaminoethyl group, etc.), cycloalkyl group having 5 to 8 carbon atoms (
For example, cycloheptyl group, cyclohexyl group, chloronaphthyl group), optionally substituted aralkyl group having 7 to 12 carbon atoms (for example, hensyl group, phenethyl group, 3-phenylpropyl group, naphthylmethyl group, 2-naphthylethyl group) group, chlorobenzyl group, bromobenzyl group, dichlorobenzyl group, methylbenzyl group, chloro-methylhensyl group, dimethylbenzyl group, trimethylhensyl group,
aliphatic groups such as methquinohensyl groups, etc., and further carbon atoms of 6 to
12 optionally substituted aryl groups (e.g., phenyl group, tolyl group, quinryl group, chlorophenyl group, bromophenyl group, dichlorophenyl group, chloro-methyl-phenyl group, methoxyphenyl group, methoxycarbonylphenyl group, naphthyl group, Examples include aromatic groups such as chloronaphthyl group, etc.).
式(lVa)において、好ましくは×1は−COO−0
CO−1CToCOOCHzOCO−1−〇−CO−−
CONHCOO−−CONHCONII−−CONHd
3、d2の好ましい例は、前記したC3、C!と同様の
内容を表わす。In formula (lVa), preferably x1 is -COO-0
CO-1CToCOOCHzOCO-1-〇-CO--
CONHCOO--CONHCONII--CONHd
A preferable example of 3, d2 is the above-mentioned C3, C! represents the same content as .
一般式(TVb)において、Qoは−CN、−CONH
2又ン原子(例えば塩素原子、臭素原子等)、アルコキ
シ基(例えばメトキシ基、エトキシ基、プロピオキン基
、ブトキシ基等)又は−COOZz(Zzは好ましくは
炭素数1〜8のアルキル基、炭素数7〜12のアラルキ
ル基又はアリール基を表わす)を表わす。In the general formula (TVb), Qo is -CN, -CONH
a bifurcated atom (e.g. chlorine atom, bromine atom, etc.), an alkoxy group (e.g. methoxy group, ethoxy group, propioquine group, butoxy group, etc.) or -COOZz (Zz is preferably an alkyl group having 1 to 8 carbon atoms, a carbon number 7 to 12 aralkyl or aryl groups).
マクロモノマー(MB)は、式(IVa)及び/又は(
八ib)で示される重合体成分を2種以上含有していて
もよい。又、Qlが脂肪族基の場合、炭素数6〜12の
脂肪族基は、マクロモノマ−(MB)中の全重合体成分
中の20重量%を越えない範囲で用いる事が好ましい。The macromonomer (MB) has the formula (IVa) and/or (
It may contain two or more kinds of polymer components shown in 8ib). When Ql is an aliphatic group, the aliphatic group having 6 to 12 carbon atoms is preferably used in an amount not exceeding 20% by weight of the total polymer component in the macromonomer (MB).
更には、−船蔵(lVa)におけるX、が−COO−で
ある場合には、マクロモノマー0’IB)中の全重合体
成分中、弐(IVa)で示される重合体成分が少なくと
も311%以上含有されることが好ましい。Furthermore, when X in -ship stock (lVa) is -COO-, the polymer component represented by 2 (IVa) is at least 311% of the total polymer components in the macromonomer 0'IB). It is preferable that the content is above.
さらに、マクロモノマ−(MB)において、式(rVa
)及び/又は(rVb)で示される共重合体成分ととも
に第3の成分として共重合する、極性基(−COO)l
C)10基、酸無水物含有基)を含有する成分としては
、前記のマクロモノマー(MB)と共重合し得る上記極
性基を含有するビニル系化合物であればいずれでも用い
ることができる、例えば、高分子データ「高分子データ
・ハンドブンク[基礎編〕培風館(1986刊)等に記
載されている、具体的には、アクリル酸、α及び/又は
β置換アクリル酸(例えばα−アセトキン体、α−アセ
トキシメチル体、α(2−アミノメチル体、α−クロロ
体、α−ブロモ体、α−フロロ体、α−トリブチルシリ
ル体、α−シアノ体、β−クロロ体、β−ブロモ体、α
−クロロ体、β−メジキシ体、α、β−ジクロロ体等)
、メタクリル酸、イタコン酸、イタコン酸半エステル類
、イタコン酸半アミド類、クロトン酸、2−アルケニル
カルボキシ酸類(例えば2−ペンテン酸、2−メチル−
2−ヘキセン酸、2オクテン酸、4−メチル−2−ヘキ
セン酸、4エチル−2−オクテン酸等) 、マレイン酸
、マレイン酸半エステル類、マレイン酸半アミド類、ビ
ニルベンゼンカルボン酸、ビニルベンゼンスルホン酸、
ビニルスルホン酸、ビニルホスホ酸、ジカルボン酸類、
アルコール類のビニル基又はアリル基の半エステル誘導
体、及びこれらのカルボン酸又はスルホン酸のエステル
誘導体、アミド誘導体の置換基中に該極性基を含有する
化合物等が挙げられる。Furthermore, in the macromonomer (MB), the formula (rVa
) and/or a polar group (-COO)l copolymerized as a third component with the copolymer component represented by (rVb)
As the component containing C) 10 groups, acid anhydride-containing group), any vinyl compound containing the above polar group that can be copolymerized with the above macromonomer (MB) can be used, e.g. Specifically, acrylic acid, α- and/or β-substituted acrylic acid (e.g. α-acetoquine, α -acetoxymethyl form, α(2-aminomethyl form, α-chloro form, α-bromo form, α-fluoro form, α-tributylsilyl form, α-cyano form, β-chloro form, β-bromo form, α
-chloro form, β-medixy form, α, β-dichloro form, etc.)
, methacrylic acid, itaconic acid, itaconic acid half esters, itaconic acid half amides, crotonic acid, 2-alkenylcarboxylic acids (e.g. 2-pentenoic acid, 2-methyl-
2-hexenoic acid, 2-octenoic acid, 4-methyl-2-hexenoic acid, 4ethyl-2-octenoic acid, etc.), maleic acid, maleic acid half esters, maleic acid half amides, vinylbenzenecarboxylic acid, vinylbenzene Sulfonic acid,
Vinyl sulfonic acid, vinyl phosphoric acid, dicarboxylic acids,
Examples include half-ester derivatives of vinyl or allyl groups of alcohols, ester derivatives of these carboxylic acids or sulfonic acids, and compounds containing the polar group in the substituent of amide derivatives.
CH わす。CH Was.
また、環状酸無水物含有基とは、少なくとも1つの環状
酸無水物を含有する基であり、含有される環状酸無水物
としては、脂肪族ジカルボン酸無水物、芳香族ジカルボ
ン酸無水物が挙げられる。In addition, the cyclic acid anhydride-containing group is a group containing at least one cyclic acid anhydride, and examples of the cyclic acid anhydride include aliphatic dicarboxylic acid anhydride and aromatic dicarboxylic acid anhydride. It will be done.
脂肪族ジオルボン酸無水物の例としては、コハク酸無水
物環、グルタコン酸無水物環、マレイン#無水物環、シ
クロペンタン1.2−ジカルボン酸無水物環、シクロヘ
キサン−1,2−ジカルボン酸無水物環、シクロヘキセ
ン−1,2−ジカルボン酸無水物環、2,3−ビシクロ
C2,2,2)オクタンジカルボン酸集水物環等が挙げ
られ、これらの環は、例えば塩素原子、臭素原子等のハ
ロゲン原子、メチル基、エチル基、ブチル基、ヘキンル
基等のアルキル基等が置換されていてもよい。Examples of aliphatic diorboxylic anhydrides include succinic anhydride ring, glutaconic anhydride ring, maleic anhydride ring, cyclopentane 1,2-dicarboxylic anhydride ring, and cyclohexane-1,2-dicarboxylic anhydride ring. monocycle, cyclohexene-1,2-dicarboxylic acid anhydride ring, 2,3-bicycloC2,2,2)octanedicarboxylic acid water condensation ring, etc. These rings include, for example, chlorine atom, bromine atom, etc. may be substituted with a halogen atom, an alkyl group such as a methyl group, an ethyl group, a butyl group, or a hekynyl group.
又、芳香族ジカルボン酸無水物の例としては、フタル酸
無水物環、ナフタレン−ジカルボン酸無水物環、ピリジ
ン−ジカルボン酸無水物環、チオフェン−ジカルボン酸
無水物環等が挙げられ、これらの環は、例えば、塩素原
子、臭素原子等のハロゲン原子、メチル基、エチル基、
プロピル基、ブチル基等のアルキル基、ヒドロキシル基
、シアノ基、ニトロ基、アルコキシカルボニル基(アル
コキシ基としては、例えば、メトキン基、エトキシ基等
)等が置換されていてもよい。Examples of aromatic dicarboxylic anhydrides include phthalic anhydride rings, naphthalene-dicarboxylic anhydride rings, pyridine-dicarboxylic anhydride rings, thiophene-dicarboxylic anhydride rings, etc. For example, halogen atoms such as chlorine atom and bromine atom, methyl group, ethyl group,
It may be substituted with an alkyl group such as a propyl group or a butyl group, a hydroxyl group, a cyano group, a nitro group, an alkoxycarbonyl group (as an alkoxy group, for example, a methquin group, an ethoxy group, etc.).
OH基としては、ビニル基又はアリル基含有のアルコー
ル類(例えばアリルアルコール、メタクリル酸エステル
、アクリルアミド等のエステル置換基、N−置換基中に
、−OH基を含有する化合物等)、ヒドロキシフェノー
ル又はヒドロキシフェニル基を置換基として含有するメ
タクリル酸エステルもしくはアミド類を挙げることがで
きる。Examples of the OH group include vinyl group- or allyl group-containing alcohols (for example, allyl alcohol, methacrylic ester, ester substituents such as acrylamide, compounds containing an -OH group in the N-substituent, etc.), hydroxyphenol, or Examples include methacrylic acid esters or amides containing a hydroxyphenyl group as a substituent.
例えば以下に挙げられる単量体が例として示されるが、
本発明の範囲はこれらに限定されるものではない。For example, the following monomers are shown as examples,
The scope of the present invention is not limited thereto.
ここで、以下の各側において、T1は−Hl−CH3、
CI、−Br 、−CN 、 −C)IzCOOC)l
z又は−CH2C0OHを示し、T2は−H又は−CH
5を示し、」、は2〜18の整数を示し、klば2〜5
の整数を示し、h、は1〜4の整数を示し、mlは1〜
12の整数を示す。Here, on each side below, T1 is -Hl-CH3,
CI, -Br, -CN, -C)IzCOOC)l
z or -CH2C0OH, T2 is -H or -CH
"," indicates an integer from 2 to 18, and "kl" indicates an integer from 2 to 5.
represents an integer of 1 to 4, h represents an integer of 1 to 4, and ml represents an integer of 1 to 4.
Indicates 12 integers.
(B−1) T、 (B−2) C)
I。(B-1) T, (B-2) C)
I.
(B−4)
GHz=C
Coo (CL) JCOO)l
丁2
CH,=C
C0NH(CHz) JCOOH
(B−6)
(B−7)
C00(CHz)llCOO(C)Iz)−0OH
(B−8)
t
CHz=C
CO)/1((C1(z)−0CCI(CL)−+C0
0)I(B−9)
z
CH,=C
C0NHCOO(CH,) jcOOl(C0NHCH
cnzcoo。(B-4) GHz=C Coo (CL) JCOO)l 2 CH,=C C0NH(CHz) JCOOH (B-6) (B-7) C00(CHz)llCOO(C)Iz)-0OH (B -8) t CHz=C CO)/1((C1(z)-0CCI(CL)-+C0
0) I(B-9) z CH,=C C0NHCOO(CH,) jcOOl(C0NHCH cnzcoo.
(B
(B
C8z = CHCH20L;U (L;It t)
m IシUUI+(B−18)
CHz=C
Coo (CHZ> j l 0COCH= CH−C
00H(B
(B−20)
T!
(B−21)
丁、
CH,=CO
■
C00(C1lffi)、、0−P−0)1H
(B−23)
t
CHt
O
CONH(CIh);+0−P−OH
H
(B−24)
CH2=C0
Coo(CHt)J、o−P−OC1H5H
(B−26)
CL=C)l−(−CL+r、0−P−OH(B−27
)
■
CH2=CH+CHz +r+C00(Cf(z)10
−P−OHH
(B−30)
z
cnz=c
COO(C)lz)−+SOJ
(B−31)
Tz
(B−36)
(B−37)
Tz
CI+2
COO(CH2)h、CON (CHzCHzCooH
) 2(B−38)
T!
SO,0
(B−40)
Tよ
0OH
(B−41)
(B−42)
I
(B
Cl。(B (B C8z = CHCH20L; U (L; It t)
m IshiUUI+(B-18) CHz=C Coo (CHZ> j l 0COCH= CH-C
00H (B (B-20) T! (B-21) Ding, CH, = CO ■ C00 (C1lffi),, 0-P-0) 1H (B-23) t CHt O CONH (CIh); +0- P-OH H (B-24) CH2=C0 Coo(CHt)J, o-P-OC1H5H (B-26) CL=C)l-(-CL+r, 0-P-OH(B-27
) ■ CH2=CH+CHz +r+C00(Cf(z)10
-P-OHH (B-30) z cnz=c COO(C)lz)-+SOJ (B-31) Tz (B-36) (B-37) Tz CI+2 COO(CH2)h, CON (CHzCHzCooH
) 2 (B-38) T! SO,0 (B-40) Tyo0OH (B-41) (B-42) I (B Cl.
CI = CH COO(CH2)J+0H (B−44) Tz CHz=C CONH(CHz)=+0H (B−45) coz=c CH,011 COOCHzcHOH (B−46) (B−47) (B−48) T。CI = CH COO(CH2)J+0H (B-44) Tz Hz=C CONH (CHz) = +0H (B-45) coz=c CH,011 COOCHzcHOH (B-46) (B-47) (B-48) T.
cHz=c
C)120H
CONI(CH
C)1.0H
(B−50)
(B−51)
T2
OH2
CC00(CHz)
JOCO(CHz)
OH
(B−53)
OH2
C0N)ICOO(CH2) j
H
(B−56)
CIl、=C
C00(CH,)、、C00(C)12)、、OHマク
ロモノマー(MB)中の全重合体成分中、該極性基を含
有する共重合体成分として含有される量は、全重合体成
分100311部当り好ましくは0.5〜50重量部、
より好ましくは1〜40重量部である。cHz=c C)120H CONI(CH C)1.0H (B-50) (B-51) T2 OH2 CC00(CHz) JOCO(CHz) OH (B-53) OH2 C0N)ICOO(CH2) j H ( B-56) CIl, =C C00(CH,), , C00(C)12), OH Contained as a copolymer component containing the polar group in all polymer components in the macromonomer (MB). The amount is preferably 0.5 to 50 parts by weight per 100,311 parts of the total polymer components,
More preferably, it is 1 to 40 parts by weight.
これら極性基含有のランダム共重合体から構成される一
官能性マクロモノマー(問)が共重合成分として樹脂C
B)中に含有された時に、樹脂CB)中の全グラフト部
に含有される該極性基の含有成分の総量は、樹脂〔B〕
中の全重合体成分100重量部当り0.1〜10重量部
含有される事が好ましい。A monofunctional macromonomer (question) composed of these polar group-containing random copolymers is used as a copolymerization component of resin C.
When contained in the resin [B], the total amount of the polar group-containing components contained in all the graft parts in the resin [B]
It is preferably contained in an amount of 0.1 to 10 parts by weight per 100 parts by weight of all polymer components.
更に好ましくは、−COOH基、−3o、H基及び−P
OJz基から選ばれる酸性基を含有する場合には、樹脂
CB)中、グラフト部に存在する総量は0.1〜5重量
%である。More preferably, -COOH group, -3o, H group and -P
When containing acidic groups selected from OJz groups, the total amount present in the graft portion in resin CB) is 0.1 to 5% by weight.
マクロモノマー(MB)中の重合体成分として、これら
以外の他の重合体成分を含有してもよく、例えば重合し
うる他の繰り返し単位に相当する単量体として、アクリ
ロニトリル、メタクリロニトリル、アクリルアミド類、
メタクリルアミド類、スチレン及びその誘導体(例えば
ビニルトルエン、クロロスチレン、ジクロロスチレン、
ブロモスチレン、ヒドロキシメチルスチレン、N、N−
ジメチルアミノメチルスチレン等)、複素環ビニル類(
例えばビニルピリジン、ビニルイミダゾール、ビニルピ
ロリドン、ビニルチオフェン、ビニルピラゾール、ビニ
ルジオキサン、ビニルオキサジン等)等が挙げられる。The macromonomer (MB) may contain other polymer components other than these. For example, monomers corresponding to other polymerizable repeating units include acrylonitrile, methacrylonitrile, and acrylamide. kind,
Methacrylamides, styrene and its derivatives (e.g. vinyltoluene, chlorostyrene, dichlorostyrene,
Bromostyrene, hydroxymethylstyrene, N, N-
dimethylaminomethylstyrene, etc.), heterocyclic vinyls (
Examples include vinylpyridine, vinylimidazole, vinylpyrrolidone, vinylthiophene, vinylpyrazole, vinyldioxane, vinyloxazine, etc.).
これら他の単量体が含有される場合には、マクロモノマ
ー(MB)の全重合体成分100311部当り1〜20
重量部であることが好ましい。When these other monomers are contained, 1 to 20 parts per 100,311 parts of the total polymer components of the macromonomer (MB)
Parts by weight are preferred.
本発明において供されるマクロモノマー(MB)は、上
述の如き、−船人(TVa)及び/又は(IVb)で示
される繰返し単位及び特定の極性基を含有する繰り返し
単位から少なくとも成るランダムな重合体主鎖の一方の
末端にのみ、−船人(In)で示される重合性二重結合
基が、直接結合するか、あるいは、任意の連結基で結合
された化学構造を有するものである。式(I[l)成分
と式(〜“a)もしくは(]Vb)成分又は酸性基含有
成分とを連結する連結基としては、炭素−炭素結合(−
重結合あるいは二重結合)、炭素−へテロ原子結合(ヘ
テロ原子としては例えば、酸素原子、イオウ原子、窒素
原子、ケイ素原子等)、ヘテロ原子−へテロ原子結合の
原子団の任意の組合せで構成されるものである。The macromonomer (MB) provided in the present invention is a random monomer consisting of at least a repeating unit represented by -shipman (TVa) and/or (IVb) and a repeating unit containing a specific polar group, as described above. It has a chemical structure in which a polymerizable double bond group represented by -shipman (In) is directly bonded to only one end of the combined main chain, or bonded by an arbitrary linking group. The linking group that connects the formula (I[l) component and the formula (~"a) or (]Vb) component or the acidic group-containing component is a carbon-carbon bond (-
Any combination of atomic groups of carbon-hetero atom bonds (hetero atoms include, for example, oxygen atoms, sulfur atoms, nitrogen atoms, silicon atoms, etc.), and hetero atom-hetero atom bonds It is composed of
x
さらに具体的な連結基としては、+C→−R)3
[R3□、R13は水素原子、ハロゲン原子(例えば、
フン素原子、塩素原子、臭素原子等)、シアノ基、ヒド
ロキシル基、アルキル基(例えばメチル基、エチル基、
プロピル基等)等を示す〕、(1−−5−−C−−N−
−−Co。x More specific linking groups include +C→-R)3 [R3□, R13 are hydrogen atoms, halogen atoms (e.g.
fluorine atom, chlorine atom, bromine atom, etc.), cyano group, hydroxyl group, alkyl group (e.g. methyl group, ethyl group,
propyl group, etc.], (1--5--C--N-
--Co.
sa
SOz −CON−2−30211−2−NH
COOIh4 R34
ffJ
N)IcON)I−2Si (R3a、R3%は、
水素原子、s
前記式(IVa)におけるQ、と同様の内容を表わす炭
化水素基等を示す]等の原子団から選ばれた単独の連結
基もしくは任意の組合せで構成された2以上の連結基を
表わす。sa SOz -CON-2-30211-2-NH
COOIh4 R34 ffJ N) IcON) I-2Si (R3a, R3% are
A single linking group or two or more linking groups composed of any combination selected from atomic groups such as hydrogen atom, s represents a hydrocarbon group having the same content as Q in the above formula (IVa)] represents.
マクロモノマー(MB)の重量平均分子量が2×104
を超えると、式(V)で示される七ツマ−との共重合性
が低下するため好ましくない。他方、重量平均分子量が
小さすぎると、感光層の電子写真特性の向上効果が小さ
くなるため、lXIO3以上であることが好ましい。The weight average molecular weight of the macromonomer (MB) is 2 x 104
If it exceeds 100%, the copolymerizability with the hexamer represented by formula (V) decreases, which is not preferable. On the other hand, if the weight average molecular weight is too small, the effect of improving the electrophotographic properties of the photosensitive layer will be reduced, so it is preferably 1XIO3 or more.
本発明に供されるマクロモノマー(MB)は、従来公知
の合成法によって製造することができる。具体的には、
分子中に、カルボキシル基、カルボキシハライド基、ヒ
ドロキシル基、アミノ基、ハロゲン原子、エポキシ基等
の反応性基を含有した重合開始剤及び/又はi1鎖移動
剤を用いて、ラジカル重合して得られる末端反応性基結
合のオリゴマーと種々の試薬を反応させて、マクロモノ
マーにするラジカル重合法による方法等二こより合成さ
れる。The macromonomer (MB) used in the present invention can be produced by a conventionally known synthesis method. in particular,
Obtained by radical polymerization using a polymerization initiator and/or i1 chain transfer agent containing a reactive group such as a carboxyl group, a carboxyhalide group, a hydroxyl group, an amino group, a halogen atom, or an epoxy group in the molecule. It is synthesized by two methods, including a radical polymerization method in which an oligomer with terminal reactive groups is reacted with various reagents to form a macromonomer.
具体的には、P、Dreyfuss & R,P、Ωu
irk、 EncyclPolyIl、Sci、Eng
、、l、551 (1987)、P、F、Rempp、
E、Franta、 Adu、 Polym、Sci、
58、l (1984)、用上雄資、化学工業、共、
56(1987)、山下雄也、高分子、■、988 (
1982)、小林四部、高分子、別、625(1981
)、伊藤浩−2高分子加工、剥、262 (+986)
、来貢四部、津田隆、機能材料、1MLLNo、10.
5等の総説及びそれに引例の文献・特許等に記載の方法
に従って合成することができる。Specifically, P, Dreyfuss & R, P, Ωu
irk, EncyclePolyIl, Sci, Eng
,,l,551 (1987), P.F.,Rempp.
E, Franta, Adu, Polym, Sci,
58, l (1984), Yuji Yogami, Kagaku Kogyo Co., Ltd.
56 (1987), Yuya Yamashita, Polymer, ■, 988 (
1982), Shibe Kobayashi, Kobunshi, Betsu, 625 (1981
), Hiroshi Ito-2 polymer processing, peeling, 262 (+986)
, Raiku Shibu, Takashi Tsuda, Functional Materials, 1MLL No., 10.
It can be synthesized according to the methods described in reviews such as No. 5 and the literature and patents cited therein.
但し、本発明のマクロモノマー(MB)は、その繰り返
し単位の成分として該極性基を含有している事から、合
成上、例えば次の配慮をして合成される。However, since the macromonomer (MB) of the present invention contains the polar group as a component of its repeating unit, it is synthesized with the following considerations in mind, for example.
その1つの方法としては、例えば下記反応式(1)で示
される様に、該極性基を保護した官能基の形で含有する
単量体を用いて上記の方法でラジカル重合及び末端反応
性基を導入するものである。As one method, for example, as shown in the following reaction formula (1), a monomer containing the polar group in the form of a protected functional group is used, and the above method is used to carry out radical polymerization and a terminal reactive group. This will introduce the following.
反応式(1)
%式%
重囲 ニーC0OHの保護基;例えば−C(C−Hs)
y、CHl
本発明に供せられるマクロモノマー(MB)中にランダ
ムに含有される該極性基(
SQ、)l基、−PO,H,基、
H
物音有基)の保護基反応及び脱保護反応(例えば加水分
解反応、加水素分解反応、酸化分解反応等)については
、従来公知の方法により行なうことができる。具体的に
は、J、 F 、 H,McOm ie、“Prote
ctive Gvoups in Organic C
he蒙1stry 、 Plenu+5Press (
1973年) 、T、W、Greene、、”Prot
ectiveGvoups in Organic 5
ynthesis 、 John Wiley &5o
us (1981年)、小円良平「高分子ファインケミ
カル」講談社(1976年)、岩倉義勇、栗田恵輔「反
応性高分子」ム談社(1977年) 、に、Berne
retal、J、Radiation Curing、
1986、No、10、PLO1特開昭62−212
669号、特開昭62−286064号、特開昭62−
210475号、特開昭62−195684号、特開昭
62−258476号、特開昭63−260439号、
特願昭62−220510号、特願昭62−22669
2号等に記載の方法を用いて合成する事ができる。Reaction formula (1) % Formula % Covering group for C0OH; e.g. -C(C-Hs)
y, CHl Protecting group reaction and deprotection of the polar groups (SQ, )l group, -PO, H, group, H monomer group) randomly contained in the macromonomer (MB) provided in the present invention Reactions (eg, hydrolysis reaction, hydrogenolysis reaction, oxidative decomposition reaction, etc.) can be carried out by conventionally known methods. Specifically, J. F. H. McOmie, “Prote.
active Gvoups in Organic C
1st try, Plenu+5Press (
(1973), T., W., Greene, “Prot.
activeGvoups in Organic 5
ynthesis, John Wiley & 5o
us (1981), Ryohei Koumaru, "Polymer Fine Chemicals", Kodansha (1976), Yoshiyu Iwakura, Keisuke Kurita, "Reactive Polymers", Mudansha (1977), Berne.
retal, J, Radiation Curing,
1986, No. 10, PLO1 JP-A-62-212
No. 669, JP-A-62-286064, JP-A-62-
210475, JP 62-195684, JP 62-258476, JP 63-260439,
Patent Application No. 1982-220510, Patent Application No. 1983-22669
It can be synthesized using the method described in No. 2, etc.
他の1つの方法としては、例えば下記反応式(II)で
示される様に、前記の様にしてオリゴマーを合成した後
、オリゴマー0片末端に結合した「特定の反応性基」と
オリゴマー中に含有される該極性基との反応性の差を利
用して、「特定の反応性」とのみ反応する重合二重結合
性基含有の試薬と反応させることで合成する方法である
。Another method is to synthesize an oligomer as described above, and then add a "specific reactive group" bonded to one end of the oligomer to the oligomer, as shown in reaction formula (II) below. This is a method of synthesis by making use of the difference in reactivity with the contained polar group and reacting with a reagent containing a polymerizable double bonding group that reacts only with "specific reactivity".
反応式(II)
0部
CNゴ
反応式(It)に示した様に、各特定の官能基の組合せ
についての具体例を表−Aに示すと次の如くなる。しか
し、本発明はこれらに限定されるものでなく、重要なこ
とは通常の有機化学反応における反応の選択性を利用す
ることで、オリゴマー中の該極性基を保護することなく
マクロ七ツマー化が達成されればよいものである。Reaction Formula (II) As shown in Reaction Formula (It), specific examples of combinations of specific functional groups are shown in Table A as follows. However, the present invention is not limited thereto, and the important thing is that by utilizing the reaction selectivity in ordinary organic chemical reactions, macro-septamerization can be carried out without protecting the polar groups in the oligomer. It would be good if it could be achieved.
表
用いることのできる連鎖移動剤としては、例えば該極性
基あるいは、後に該極性基に誘導しうる置換基含有のメ
ルカプト化合物(例えばチオグリコール酸、チオリンゴ
酸、チオサリチル酸、2メルカプトプロピオン酸、3−
メルカプトプロピオン酸、3−メルカプト酪酸、N−(
2−メルカプトプロピオニル)グリシン、2−メルカプ
トニコチン酸、3− CN−(2−メルカプトエチル)
カルバモイル〕プロピオン酸、3− (N−(2−メル
カプトエチル)アミノコプロピオン酸、N(3−メルカ
プトプロピオニル)アラニン、2メルカプトエタンスル
ホン酸、3−メルカトブタンスルホン酸、4−メルカプ
トブタンスルホン酸、2−メルカプトエタノール、3−
メルカプト−1,2−プロパンジオール、1−メルカプ
ト−2プロパツール、3−メルカプト−2−ブタノール
、メルカプトフェノール、2−メルカプトエチルアミン
、2−メカルブルイミダゾール、2−メルカプト−3−
ビリジノール等)又はこれらメルカプト化合物の酸化体
であるヅスルフイド化合物、あるいは上記極性基又は置
換基含有のヨード化アルキル化合物(例えばヨード酢酸
、ヨードプロピオン酸、2−ヨードエタノール、2−ヨ
ードエタンスルホン酸、3−ヨードプロパンスルホンM
等)等が挙げられる。好ましくはメルカプト化合物が挙
げられる。Examples of chain transfer agents that can be used include, for example, mercapto compounds containing the polar group or a substituent that can later be induced into the polar group (for example, thioglycolic acid, thiomalic acid, thiosalicylic acid, 2-mercaptopropionic acid, 3-mercapto compounds).
Mercaptopropionic acid, 3-mercaptobutyric acid, N-(
2-mercaptopropionyl) glycine, 2-mercaptonicotinic acid, 3-CN-(2-mercaptoethyl)
Carbamoyl]propionic acid, 3-(N-(2-mercaptoethyl)aminocopropionic acid, N(3-mercaptopropionyl)alanine, 2-mercaptoethanesulfonic acid, 3-mercaptobutanesulfonic acid, 4-mercaptobutanesulfonic acid) , 2-mercaptoethanol, 3-
Mercapto-1,2-propanediol, 1-mercapto-2propanol, 3-mercapto-2-butanol, mercaptophenol, 2-mercaptoethylamine, 2-mercapto-3-imidazole, 2-mercapto-3-
pyridinol, etc.) or dusulfide compounds which are oxidized products of these mercapto compounds, or iodized alkyl compounds containing the above polar groups or substituents (e.g. iodoacetic acid, iodopropionic acid, 2-iodoethanol, 2-iodoethanesulfonic acid, -Iodopropane sulfone M
etc.) etc. Preferred are mercapto compounds.
用いることのできる特定の反応性基含有の重合開始剤と
しては、例えば、2.2′−アゾビス(2シアツブロバ
ノール)、2,2′−アゾビス(2−シアノペンタノー
ル)、 4.4′−アゾビス(4−シアノ吉草酸)、4
.4′−アゾビス(4−シアノ吉草酸クロライド)、2
,2′−アゾビス〔2−(5−メチル−2−イミダシリ
ン−2−イル)プロパン〕、2.2′−アゾビス(2−
(2−イミダシリン−2−イル)プロパン〕、2.2′
−アゾビス(2−(3,4,5,6−テトラヒドロピリ
ミジン−2−イル)プロパン〕、2,2′−アゾビス(
2(1−(2−ヒドロキシエチル)−2−イミダシリン
−2−イル〕プロパン)、2.2′ −アゾビス〔2−
メチル−N−(2−ヒドロキシエチル)−プロピオンア
ミド〕等又はこれらの誘導体等が挙げられる。Specific reactive group-containing polymerization initiators that can be used include, for example, 2,2'-azobis(2cyatuburobanol), 2,2'-azobis(2-cyanopentanol), 4,4' -Azobis(4-cyanovaleric acid), 4
.. 4'-azobis(4-cyanovaleric acid chloride), 2
, 2'-azobis[2-(5-methyl-2-imidacillin-2-yl)propane], 2.2'-azobis(2-
(2-imidacylin-2-yl)propane], 2.2'
-azobis(2-(3,4,5,6-tetrahydropyrimidin-2-yl)propane), 2,2'-azobis(
2(1-(2-hydroxyethyl)-2-imidacillin-2-yl]propane), 2,2'-azobis[2-
methyl-N-(2-hydroxyethyl)-propionamide] or derivatives thereof.
これら連鎖移動剤あるいは重合開始剤は、各々全単量体
100重量部に対して0.1〜15重量%であり、好ま
しくは0.5〜IO重量%である。The amount of each of these chain transfer agents or polymerization initiators is 0.1 to 15% by weight, preferably 0.5 to IO% by weight, based on 100 parts by weight of the total monomers.
本発明のマクロモノマー(?IB)は、具体的には、下
記の化合物を例として挙げることができる。但し、本発
明の範囲は、これらに限定されるものではない、また、
以下の各個において、T、は−H又はCH,を示し、丁
、は−H,−CH5又は−CH2C0OCH3を示し、
R41は−CeHza−l(nは1〜18の整数を示す
)、Br 、−CH5、−C0CI(s又は−COOC
H3を示す)、vlは−CN 、−0COCH3、−C
ONI(z又は−C,ll、を示シ、vlは−CI、
−Br 、−CN又は−0CR,を示し、αは2〜18
の整数を示し、βは2〜12の整数を示し、Tは2〜4
の整数を示す。Specific examples of the macromonomer (?IB) of the present invention include the following compounds. However, the scope of the present invention is not limited to these, and
In each of the following, T represents -H or CH, D represents -H, -CH5 or -CH2C0OCH3,
R41 is -CeHza-l (n is an integer of 1 to 18), Br, -CH5, -COCI (s or -COOC
H3), vl is -CN, -0COCH3, -C
ONI (z or -C, ll, vl is -CI,
-Br, -CN or -0CR, α is 2 to 18
β represents an integer of 2 to 12, T represents an integer of 2 to 4
indicates an integer.
(MB−11 (阿B−2) (MB−3) (MB−4) (MB−5) (門B−6) (MB−7) CO。(MB-11 (A B-2) (MB-3) (MB-4) (MB-5) (Gate B-6) (MB-7) C.O.
H
(1B−9)
(−B−10)
(MB−14)
(MB−15)
I
* Coo(C8山0CO(CHz)アCOOH(MB
(MB
(MC
00H
(:
H
OOH
(MB
(MB−22)
CH3
(MB−23)
(MB−24)
z
しUUKa+
(MB−25)
z
OH
COOR,、V
Coo(CH2)、、0H
(−B−26)
t
他方、前記したマクロモノマー(MB)と共重合する単
量体は一般式(V)で示される。式(V)において、e
I % e tは互いに同じでも異なってもよく、式
(I[)のC1、C8と同一の内容を表わす、Xtは式
(TVa)中のX、と、Q!は式(TVa)中の01と
各々同一の内容を表わす。H (1B-9) (-B-10) (MB-14) (MB-15) I * Coo (C8 mountain 0CO (CHHz) a COOH (MB (MB (MC 00H) (: H OOH (MB (MB- 22) CH3 (MB-23) (MB-24) z ShiUUKa+ (MB-25) z OH COOR,, V Coo(CH2),, 0H (-B-26) t On the other hand, the above-mentioned macromonomer (MB) The monomer copolymerized with is represented by general formula (V). In formula (V), e
I%et may be the same or different from each other and represent the same content as C1 and C8 in formula (I[), Xt is X in formula (TVa), and Q! represent the same content as 01 in formula (TVa).
本発明の樹脂において、マクロモノマー(MB)を繰り
返し単位とする共重合成分と、−i式(V)で示される
単量体を繰り返し単位とする共重合成分の組成比は、好
ましくは1〜70/30〜99(重量組成比)、より好
ましくは5〜60/95〜40重量組成比である。In the resin of the present invention, the composition ratio of the copolymer component having a macromonomer (MB) as a repeating unit and the copolymer component having a repeating unit of the monomer represented by the -i formula (V) is preferably 1 to 1. The weight composition ratio is 70/30 to 99 (weight composition ratio), more preferably 5 to 60/95 to 40.
又、重合主鎖中には、−po、u、基、−sO,H基、
C0OH基、−0)H基、及び−POJJ基の酸性基を
含有する共重合成分を含有しないものが好ましい。In addition, in the polymer main chain, -po, u, group, -sO, H group,
Those containing no copolymerization component containing acidic groups such as C0OH group, -0)H group, and -POJJ group are preferred.
また、本発明の樹脂CB)は、前記したマクロモノマー
(MB)及び−船蔵(V)の単量体とともにこれら以外
の単量体を更なる共重合成分として含有してもよい。Moreover, the resin CB) of the present invention may contain monomers other than these as further copolymerization components together with the above-mentioned macromonomer (MB) and the monomer (V).
例えば、α−オレフィン類、アルカン酸ビニル又はアリ
ルエステル類、アクリロニトリル、メタクリロニトリル
、ビニルエーテル類、アクリルアミド類、メタクリルア
ミド類、スチレン類、複素環ビニルtic例えば、ビニ
ルピロリドン、ビニルピリジン、ビニルイミダゾール、
ビニルチオフェン、ビニルイミダシリン、ビニルピラゾ
ール、ビニルジオキサン、ビニルキノリン、ビニルチア
ゾール、ビニルオキサジン等)等が挙げられる。For example, α-olefins, vinyl alkanoates or allyl esters, acrylonitrile, methacrylonitrile, vinyl ethers, acrylamides, methacrylamides, styrenes, heterocyclic vinyl tics, such as vinylpyrrolidone, vinylpyridine, vinylimidazole,
vinylthiophene, vinylimidacilline, vinylpyrazole, vinyldioxane, vinylquinoline, vinylthiazole, vinyloxazine, etc.).
ただし、マクロモノマー(MB)及び式(〜′)の単量
体以外のこれら他の単量体は、共重合体中20重量%を
越えることはない。However, the amount of these other monomers other than the macromonomer (MB) and the monomer of formula (~') in the copolymer does not exceed 20% by weight.
更に、樹脂CB)は、−船蔵(V)で示される繰り返し
単位を少なくとも1種及びマクロモノマーで示される繰
返し単位を少なくとも1種含有する重合体主鎖の片末端
にのみ、前記極性基のうちの少なくとも1種を結合して
成る共重合体(樹脂CB’))であってもよい、また共
重合体CB)と〔B′〕を併用してもよい、ここで、該
極性基は重合体主鎖の一方の末端に直接結合するか、あ
るいは任意の連結基を介して結合した化学構造ををする
。Furthermore, resin CB) contains at least one repeating unit represented by -Funazura (V) and at least one repeating unit represented by a macromonomer, and only at one end of the polymer main chain contains the polar group. It may be a copolymer (resin CB')) formed by combining at least one of them, or a copolymer CB' and [B'] may be used together, where the polar group is A chemical structure attached directly to one end of the polymer main chain or via an arbitrary linking group.
結合基としては炭素−炭素結合(−重結合あるいは二重
結合)、炭素−へテロ原子結合(ヘテロ原子としては例
えば、酸素原子、イオウ原子、窒素原子、ケイ素原子等
)、ヘテロ原子−へテロ原子結合の原子団の任意の組合
わせで構成されるも3z
のである0例えば、÷C→−1−(CH=CH→、Rコ
。Bonding groups include carbon-carbon bonds (-double bonds or double bonds), carbon-hetero atom bonds (hetero atoms include, for example, oxygen atoms, sulfur atoms, nitrogen atoms, silicon atoms, etc.), and hetero atoms-hetero atoms. It is composed of any combination of atomic groups of atomic bonds. For example, ÷C→-1-(CH=CH→, Rco.
(Ih□〜R34は各々前記R3!〜R3a と同一の
内容を示す)等から選ばれる原子団の単独あるいは2以
上の組合せで構成される連結基である。(Ih□ to R34 each have the same contents as R3! to R3a above), etc., is a linking group composed of a single atomic group or a combination of two or more.
本発明に供される樹脂〔B〕において、重合体主鎖の末
端に該極性基を結合して成る樹脂〔B′〕を合成するに
は、少なくとも前記したマクロモノマー(MB)と−船
蔵(V)で示される単量体との重合反応時に、該極性基
又はこれに誘導できる特定の反応基を分子中に含有した
重合開始剤又は連鎖移動剤を併用することで達成される
。In the resin [B] used in the present invention, in order to synthesize the resin [B'] in which the polar group is bonded to the terminal of the polymer main chain, at least the above-mentioned macromonomer (MB) and - This can be achieved by concurrently using a polymerization initiator or chain transfer agent containing the polar group or a specific reactive group that can be derived therefrom in the molecule during the polymerization reaction with the monomer represented by (V).
具体的には、マクロモノマーの合成において前記した樟
に片末端反応基結合のオリゴマーの方法と同様にして得
ることができる。Specifically, it can be obtained in the same manner as the method for oligomers in which one terminal reactive group is bonded to camphor in the synthesis of macromonomers.
本発明の電子写真感光体において、その優れた電子写真
特性を保持しつつ、より大きな機械的強度が望まれる場
合がある。この目的の為には、グラフト型共重合体の主
鎖に熱及び/又は光硬化性官能基を導入する手法が適用
できる。In the electrophotographic photoreceptor of the present invention, greater mechanical strength may be desired while maintaining its excellent electrophotographic properties. For this purpose, a method of introducing a thermally and/or photocurable functional group into the main chain of the graft copolymer can be applied.
即ち、本発明では、樹脂〔A〕及び/又は樹脂CB)に
おいて、更に少なくとも1種の熱及び/又は光硬化性官
能基を含有するモノマーを共重合成分として含有するこ
とが好ましい、かかる熱及び/又は光硬化性官能基が適
宜ポリマー間を架橋させることでポリマーの間の相互作
用を強固に、膜としての強度を向上させるものである。That is, in the present invention, it is preferable that the resin [A] and/or the resin CB) further contains as a copolymerization component a monomer containing at least one heat-curable and/or photo-curable functional group. The photocurable functional group appropriately crosslinks the polymers, thereby strengthening the interaction between the polymers and improving the strength of the film.
従って、かかる熱及び/又は光硬化性官能基を更に含有
する本発明の樹脂は、酸化亜鉛粒子表面と結着樹脂の適
切な吸着・被覆を疎外することなく、結着樹脂間の相互
作用を強め、その結果、皮膜強度がより向上する効果を
有するものである。Therefore, the resin of the present invention further containing such a heat-curable and/or photo-curable functional group can prevent the interaction between the binder resin and the zinc oxide particle surface without hindering the adsorption and coating of the binder resin. This has the effect of further improving the film strength.
本発明の熱及び/又は光硬化性官能基とは熱及び光のう
ちの少なくともいずれか一方で樹脂を硬化し得る官能基
をいう。The heat and/or photocurable functional group of the present invention refers to a functional group that can cure a resin with at least one of heat and light.
本発明の「熱硬化性官能基(熱硬化反応を行なう官能基
)」は、例えば、遠藤剛「熱硬化性高分子の精密化J
(C,M、 C麹、1986年刊)、原@勇次「最新
バインダー技術便覧」第11−1章(総合技術センター
、1985年刊)、大津除行「アクリル樹脂の合成・設
計と新用途開発」 (中部経営開発センター出版部、1
985年刊)、大森英三「機能性アクリル系樹脂」 (
テクノシステム、1985年刊)等の総説に引例の官能
基を用いることができる。The "thermosetting functional group (functional group that performs a thermosetting reaction)" of the present invention is, for example, "Refinement of thermosetting polymers" by Tsuyoshi Endo, J.
(C, M, C Koji, published in 1986), Hara@Yuji "Latest Binder Technology Handbook" Chapter 11-1 (General Technology Center, published in 1985), Yokiyuki Otsu "Synthesis and design of acrylic resin and development of new applications" (Chubu Management Development Center Publishing Department, 1
985), Eizo Omori “Functional Acrylic Resin” (
The functional groups cited in the review articles such as Techno System, 1985) can be used.
例えば−〇H基、−3H基、−NH,基、−NHR2,
基(R21は炭化水素基を表わし、具体的には式(In
)のxoにて前出の2,1 と同一の内容を表わす、)
CONHCHzORtx (Ratは、水素原子又は炭
素数1〜8のアルキル基(例えば、メチル基、エチル基
、プロピル基、ブチル基、ヘキンル基、TI Tz
オクチル基等)−N=C=O基又は−C=CH基(TI
及びT、は、各々水素原子、ハロゲン原子(例えば塩素
原子、臭素原子等)又は炭素数1〜4のアルキル基(例
えばメチル基、エチル基等)を表わす)等を挙げること
ができる。又該重合性二重結合として、具体的には、C
H,=C)(−CH,=CH−CH2−1CH,=CH
−C−0CHz = CHCON H−1
CH。For example, -〇H group, -3H group, -NH, group, -NHR2,
group (R21 represents a hydrocarbon group, specifically, the formula (In
xo of ) represents the same content as 2,1 above,) CONHCHzORtx (Rat is a hydrogen atom or an alkyl group having 1 to 8 carbon atoms (e.g., methyl group, ethyl group, propyl group, butyl group, hequinyl group, TI Tz octyl group, etc.) -N=C=O group or -C=CH group (TI
and T each represent a hydrogen atom, a halogen atom (for example, a chlorine atom, a bromine atom, etc.), or an alkyl group having 1 to 4 carbon atoms (for example, a methyl group, an ethyl group, etc.). Moreover, specifically, as the polymerizable double bond, C
H,=C)(-CH,=CH-CH2-1CH,=CH
-C-0CHz = CHCON H-1 CH.
CHt = CCON H− CHz = CHN HC0−1 CH,=CH−CH2− NHCO−1CH,=CH−5O。CHt = CCON H- CHz = CHN HC0-1 CH,=CH-CH2- NHCO-1CH,=CH-5O.
CH,=CH−C0−1CH,=CH−○CH,=CH
−3−
等を挙げることができる。CH, =CH-C0-1CH, =CH-○CH, =CH
-3- etc. can be mentioned.
本発明の「光硬化性官能基」としては、例えば、角田隆
弘、「感光性樹Nj印刷学会出版部(1972年)、永
松元太部、乾英夫、「感光性高分子」講談社(1977
年) G、 A、 De1genne+ ’Encyc
1opedja of Polymer 5cienc
e and Technology。Examples of the "photocurable functional group" of the present invention include Takahiro Tsunoda, "Photosensitive Tree Nj Printing Society Publishing Department (1972), Gentabe Nagamatsu, Hideo Inui, "Photosensitive Polymer" Kodansha (1977)
year) G, A, De1genne+'Encyc
1opedja of Polymer 5cienc
e and Technology.
Supplement、’V o ] I (197
6年)等に記載の官能基を用いることができる。具体的
には、アリルエステル基、ビニルエステル基等の付加重
合基、シンナモイル基、if換されてもよいマレイイミ
ド環基等の二重化基等が挙げられる。Supplement, 'V o ] I (197
6) can be used. Specifically, addition polymerizable groups such as an allyl ester group and a vinyl ester group, a cinnamoyl group, and a duplexing group such as a maleimide ring group which may be converted into if may be mentioned.
本発明において、熱及び/又は光硬化性官能基を含有す
る樹脂を合成するには、核熱及び/又は光硬化性官能基
を含有する共重合体成分として核熱及び/又は光硬化性
官能基を含有する単量体を用いればよい。In the present invention, in order to synthesize a resin containing a thermally and/or photocurable functional group, a nuclear thermal and/or photocurable functional group is used as a copolymer component containing a nuclear thermal and/or photocurable functional group. A monomer containing the group may be used.
本発明の樹脂が該熱硬化性官能基を含有する場合には、
感光層膜中での架橋反応を促進させるために、必要に応
して反応促進剤を添加してもよい。When the resin of the present invention contains the thermosetting functional group,
In order to promote the crosslinking reaction in the photosensitive layer, a reaction accelerator may be added as necessary.
官能基間の化学結合を形成する反応様式の場合には、例
えば有機酸(酢酸、プロピオン酸、酪酸、ベンゼンスル
ホン酸、P−)ルエンスルホン酸等)、架橋剤等が挙げ
られる。In the case of a reaction mode that forms a chemical bond between functional groups, examples thereof include organic acids (acetic acid, propionic acid, butyric acid, benzenesulfonic acid, P-)luenesulfonic acid, etc.), crosslinking agents, and the like.
架橋剤としては、具体的には、山下晋三、金子東助編「
架橋剤ハンドブック」大成社刊(1981年)等に記載
されている化合物等を用いることができる0例えば、通
常用いられる有機シラン、ポリウレタン、ポリイソシア
ナートの如き架橋剤、エポキシ樹脂、メラミン樹脂の如
き硬化剤等を用いることができる。As a crosslinking agent, specifically, Shinzo Yamashita and Tosuke Kaneko ed.
Compounds described in "Crosslinking Agent Handbook" published by Taiseisha (1981) etc. can be used. For example, commonly used crosslinking agents such as organic silane, polyurethane, polyisocyanate, epoxy resin, melamine resin, etc. A curing agent or the like can be used.
重合性反応様式の場合には、重合開始剤(過酸化物、ア
ゾビス系化合物等が挙げられ、好ましくは、アゾビス系
重合開始剤である〜)、多官能重合性基含有の単量体(
例えばビニルメタクリレート、アクリルメタクリレート
、エチレングリコールジアクリレート、ポリエチレング
リコールジアクリレート、ジビニルコハク酸エステル、
ジビニルアジピン酸エステル、ジアリルコハク酸エステ
ル、2−)チルビニルメタクリレート、ジビニルヘンゼ
ン等)等が挙げられる。In the case of a polymerizable reaction mode, a polymerization initiator (peroxides, azobis-based compounds, etc., preferably an azobis-based polymerization initiator), a monomer containing a polyfunctional polymerizable group (
For example, vinyl methacrylate, acrylic methacrylate, ethylene glycol diacrylate, polyethylene glycol diacrylate, divinyl succinate,
divinyl adipate, diallyl succinate, 2-) tilvinyl methacrylate, divinyl hensen, etc.).
また、本発明において、かかる熱硬化性官能基を含有す
る結着樹脂を用いる場合には熱硬化処理が行われる。こ
の熱硬化処理は従来の感光体作製時の乾燥条件を厳しく
することにより行うことができる。例えば、60℃〜1
20℃で5分〜120分間処理すればよい、上述の反応
促進剤を併用すると、より穏やかな条件で処理すること
が可能となる。Further, in the present invention, when using a binder resin containing such a thermosetting functional group, a thermosetting treatment is performed. This heat curing treatment can be performed by tightening the drying conditions during conventional photoreceptor production. For example, 60℃~1
The treatment can be carried out at 20° C. for 5 to 120 minutes, and when the above-mentioned reaction accelerator is used in combination, the treatment can be carried out under milder conditions.
本発明に用いる樹脂CA)と樹脂CB)の使用量の割合
は、使用する無機光導電材料の種類、粒径、表面状態に
よって異なるが一般に樹脂〔A〕と樹脂〔B〕の用いる
割合は5〜80対95〜20(重量比)であり、好まし
くは10〜60対90〜40(重量比)である。The ratio of resin CA) and resin CB) used in the present invention varies depending on the type, particle size, and surface condition of the inorganic photoconductive material used, but in general, the ratio of resin [A] and resin [B] used is 5. ~80:95-20 (weight ratio), preferably 10-60:90-40 (weight ratio).
本発明では、本発明に従う樹脂〔A〕及び樹脂〔B〕(
(B’ )も含む)の他に他の樹脂を併用させることも
できる。それらの樹脂としては、例えば、アルキッド樹
脂、ポリブチラール樹脂、ポリオレフィン類、エチレン
−酢ビ共重合体、スチレン樹脂、スチレン−ブタジェン
樹脂、アクリレートブタジェン樹脂、アルカン酸ビニル
樹脂等が挙げられる。In the present invention, resin [A] and resin [B] (
(B') can also be used in combination with other resins. Examples of such resins include alkyd resins, polybutyral resins, polyolefins, ethylene-vinyl acetate copolymers, styrene resins, styrene-butadiene resins, acrylate-butadiene resins, vinyl alkanoate resins, and the like.
上記他の樹脂は、本発明の樹脂を用いた全結着樹脂量の
30%(重量比)を越えると本発明の効果(特に静電特
性の向上)が失われる。If the above-mentioned other resin exceeds 30% (weight ratio) of the total binder resin amount using the resin of the present invention, the effects of the present invention (especially improvement in electrostatic properties) will be lost.
本発明に使用する無機光導電材料としては、酸化亜鉛、
酸化チタン、硫化亜鉛、硫化カドミウム、炭酸カドミウ
ム、セレン化亜鉛、セレン化カドミウム、セレン化テル
ル、硫化鉛、等が挙げられる。Inorganic photoconductive materials used in the present invention include zinc oxide,
Examples include titanium oxide, zinc sulfide, cadmium sulfide, cadmium carbonate, zinc selenide, cadmium selenide, tellurium selenide, lead sulfide, and the like.
無機光導電材料に対して用いる結着樹脂の総量は、光導
電体100重量部に対して、結着樹脂を10〜100重
量部なる割合、好ましくは15〜50重量部なる割合で
使用する。The total amount of binder resin used for the inorganic photoconductive material is 10 to 100 parts by weight, preferably 15 to 50 parts by weight, per 100 parts by weight of the photoconductor.
本発明では、必要に応じて各種の色素を分光増感剤とし
て併用することができる0例えば、宮本晴視、武井秀彦
、イメージング1iL1(N[L8)第12頁、C,J
、’loung等、 RCA Revi−比469 (
1954)。In the present invention, various dyes can be used in combination as spectral sensitizers if necessary. For example, Harumi Miyamoto, Hidehiko Takei, Imaging 1iL1 (N[L8) p. 12, C, J
, 'loung et al., RCA Revi-ratio 469 (
1954).
清田航平等、電気通信学会論文誌J 63−C(No、
2)97 (1980) 、原崎勇次等、工業化学雑認
並 78及び18B (1963) 、谷忠昭1日本
写真学会誌甚208 (1972)等の総説引例のカ
ーボニウム系色素ジフェニルメタン色素、トリフェニル
メタン色素、キサンチン系色素、フタレイン系色素、ポ
リメチン色素(例えば、オキソノール色素、メロシアニ
ン色素、シアニン色素、ロダシアニン色素、スチリル色
素等)、フタロシアニン色素(金属含有してもよい)等
が挙げられる。Wataru Kiyota, Transactions of the Institute of Electrical Communication Engineers J 63-C (No.
2) Carbonium-based dyes diphenylmethane dyes and triphenylmethane dyes cited in reviews such as 97 (1980), Yuji Harasaki et al., Industrial Chemistry Miscellaneous 78 and 18B (1963), Tadaaki Tani 1 Journal of the Photographic Society of Japan 208 (1972), etc. , xanthine dyes, phthalein dyes, polymethine dyes (for example, oxonol dyes, merocyanine dyes, cyanine dyes, rhodacyanine dyes, styryl dyes, etc.), phthalocyanine dyes (which may contain metal), and the like.
更に具体的には、カーボニウム系色素、トリフェニルメ
タン色素、キサンチン系色素、フタレイン系色素を中心
に用いたものとしては、特公昭51−452号、特開昭
50−90334号、特開昭50−114227号、特
開昭53−39130号、特開昭53−82353号、
米国特許筒3.052.540号、米国特許筒4,05
4,450号、特開昭57−16456号等に記載のも
のが挙げられる。More specifically, examples of those mainly using carbonium dyes, triphenylmethane dyes, xanthine dyes, and phthalein dyes include Japanese Patent Publication No. 452/1983, Japanese Patent Application Laid-open No. 90334/1983, and Japanese Patent Application Laid-Open No. 50-90334. -114227, JP 53-39130, JP 53-82353,
U.S. Patent No. 3.052.540, U.S. Patent No. 4,05
Examples thereof include those described in No. 4,450, JP-A-57-16456, and the like.
オキソノール色素、メロシアニン色素、シアニン色素、
ログシアニン色素等のポリメチン色素としては、F、M
、Harmmar rThe Cyanine Dy
es andRelated Co@pounds J
等に記載の色素類が使用可能であり、更ζこ具体的には
、米国特許筒3.041.384号、米国特許筒3,1
10.591号、米国特許筒3.121008号、米国
特許筒3,125,447号、米国特許筒3、128.
179号、米国特許筒3,132,942号、米国特許
筒3,622.317号、英国特許第1,226,89
2号、英国特許第1,309,274号、英国特許第1
,405,898号、特公昭48−7814号、特公昭
55−18892号等に記載の色素が挙げられる。oxonol dye, merocyanine dye, cyanine dye,
Polymethine dyes such as logcyanine dyes include F, M
,Harmmar rThe Cyanine Dy
es andRelated Co@pounds J
The pigments described in U.S. Pat. No. 3.041.384 and U.S. Pat. No. 3,1 can be used.
No. 10.591, U.S. Patent No. 3.121008, U.S. Patent No. 3,125,447, U.S. Patent No. 3,128.
No. 179, U.S. Patent No. 3,132,942, U.S. Patent No. 3,622.317, British Patent No. 1,226,89
No. 2, British Patent No. 1,309,274, British Patent No. 1
, No. 405,898, Japanese Patent Publication No. 48-7814, Japanese Patent Publication No. 55-18892, and the like.
更に、700nm以上の長波長の近赤外〜赤外光域を分
光増感するポリメチン色素として、特開昭47−840
号、特開昭47−44180号、特公昭51−4106
1号、特開昭49−5034号、特開昭49−4512
2号、特開昭5746245号、特開昭56−3514
1号、特開昭57−157254号、特開昭61−26
044号、特開昭61−27551号、米国特許筒3,
619,154号、米国特許筒4.175.956号、
rResearch Disclosure J 19
82年、216、第117〜118頁等に記載のものが
挙げられる0本発明の感光体は種々の増感色素を併用さ
せても、その性能が増感色素により変動しにくい点にお
いて優れている。更には、必要に応して、化学増感剤等
の従来知られている電子写真感光層用各種添加剤を併用
することもできる1例えば、前記した総説:イメージン
グ1973 (N[L8 )第12頁等の総説引例の電
子受容性化合物(例えば、ハロゲン、ヘンゾキノン、ク
ロラニル、酸無水物、有機カルボン酸等)小門宏等、「
最近の光導電材料と感光体の開発・実用化」第4章〜第
6章二日本科学情報〔株〕出版部Cl986年)の総説
引例のポリアリールアルカン化合物、ヒンダードフェノ
ール化合物、p−フェニレンジアミン化合物等が挙げら
れる。Furthermore, as a polymethine dye that spectrally sensitizes the near-infrared to infrared light region with a long wavelength of 700 nm or more, JP-A-47-840
No., JP-A No. 47-44180, JP-A No. 51-4106
No. 1, JP-A-49-5034, JP-A-49-4512
No. 2, JP-A-5746245, JP-A-56-3514
No. 1, JP-A-57-157254, JP-A-61-26
No. 044, JP-A No. 61-27551, U.S. Patent No. 3,
No. 619,154, U.S. Patent No. 4.175.956,
rResearch Disclosure J 19
1982, 216, pages 117 to 118. The photoreceptor of the present invention is excellent in that its performance does not easily vary depending on the sensitizing dye, even when various sensitizing dyes are used together. There is. Furthermore, if necessary, various conventionally known additives for electrophotographic photosensitive layers, such as chemical sensitizers, may be used in combination. Electron-accepting compounds (e.g., halogens, henzoquinone, chloranil, acid anhydrides, organic carboxylic acids, etc.) in reviews cited by Hiroshi Komon et al.
Polyarylalkane compounds, hindered phenol compounds, and p-phenylene cited in the review of ``Recent Development and Practical Application of Photoconductive Materials and Photoreceptors'' Chapters 4 to 6, published by Nihon Kagaku Information Co., Ltd. (Cl. 986) Examples include diamine compounds.
これら各種添加剤の添加量は、特に限定的ではないが、
通常光導電体100重量部に対して0.0001〜2.
0重量部である。The amount of these various additives added is not particularly limited, but
Usually 0.0001 to 2.0 parts per 100 parts by weight of photoconductor.
It is 0 parts by weight.
光導電層の厚さは1〜100μ、特には10〜50μが
好適である。The thickness of the photoconductive layer is preferably 1 to 100 microns, particularly 10 to 50 microns.
また、電荷発生層と電荷輸送層の積層型感光体の電荷発
生層として光導電層を使用する場合は電荷発生層の厚さ
は0.01〜1μ、特には0.05〜0.5μが好、適
である。In addition, when a photoconductive layer is used as a charge generation layer in a laminated photoreceptor consisting of a charge generation layer and a charge transport layer, the thickness of the charge generation layer is 0.01 to 1μ, particularly 0.05 to 0.5μ. Good, suitable.
感光体の保護および耐久性、暗減衰特性の改善等を正目
的として絶縁層を付設させる場合もある。In some cases, an insulating layer is added for the purpose of protecting the photoreceptor, improving durability, dark decay characteristics, etc.
この時は絶縁層は比較的薄く設定され、感光体を特定の
電子写真プロセスムご用いる場合に設けられる絶縁層は
比較的厚く設定される。At this time, the insulating layer is set to be relatively thin, and when the photoreceptor is used in a specific electrophotographic process, the insulating layer provided is set to be relatively thick.
後者の場合、絶縁層の厚さは、5〜70μ、特には、1
0〜50Iに設定される。In the latter case, the thickness of the insulating layer is between 5 and 70μ, in particular 1
It is set from 0 to 50I.
積層型感光体の電荷輸送材料としてはポリビニルカルバ
ゾール、オキサゾール系色素、ビラプリン系色素、トリ
フェニルメタン系色素などがある。Charge transport materials for the laminated photoreceptor include polyvinylcarbazole, oxazole dyes, birapurin dyes, triphenylmethane dyes, and the like.
電荷輸送層の厚さとしては5〜40μ、特には10〜3
0uが好適である。The thickness of the charge transport layer is 5 to 40 μm, particularly 10 to 3 μm.
0u is preferred.
絶縁層あるいは電荷輸送層の形成に用いる樹脂としては
、代表的なものは、ポリスチレン樹脂、ポリエステル樹
脂、セルロース樹脂、ポリアクリル樹脂、塩化ビニル樹
脂、酢酸ビニル樹脂、塩ビー酸ビ共重合体樹脂、ポリア
クリル樹脂、ポリオレフィン樹脂、ウレタン樹脂、エポ
キシ樹脂、メラミン樹脂、シリコン樹脂の熱可望性樹脂
及び硬化性樹脂が適宜用いられる。Typical resins used to form the insulating layer or charge transport layer include polystyrene resin, polyester resin, cellulose resin, polyacrylic resin, vinyl chloride resin, vinyl acetate resin, vinyl chloride vinyl oxide copolymer resin, Thermoplastic resins and curable resins such as polyacrylic resins, polyolefin resins, urethane resins, epoxy resins, melamine resins, and silicone resins are used as appropriate.
本発明による光導電層は、従来公知の支持体上に設ける
ことができる。一般に云って電子写真感光層の支持体は
、導電性であることが好ましく、導電性支持体としては
、従来と全く同様、例えば、金属、紙、プラスチックシ
ート等の基体に低抵抗性物質を含浸させるなどして導電
処理したもの、基体の裏面(感光層を設ける面と反対面
)に導電性を付与し、更にはカール防止を図る等の目的
で少なくとも1層以上をコートしたもの、前記支持体の
表面に耐水性接着層を設けたもの、前記支持体の表面層
に必要に応して少なくとも1層以上のプレコート層が設
けられたもの、A1等を蒸着した基体導電化プラスチッ
クを紙にラミネートしたもの等が使用できる。The photoconductive layer according to the invention can be provided on a conventionally known support. Generally speaking, the support for the electrophotographic photosensitive layer is preferably electrically conductive.As the electrically conductive support, for example, a base material such as metal, paper, or plastic sheet impregnated with a low-resistance substance is used in the same manner as in the past. those that have been subjected to conductive treatment, such as those that have been coated with at least one layer for the purpose of imparting conductivity to the back surface of the substrate (the surface opposite to the surface on which the photosensitive layer is provided) and also to prevent curling, and those that have been coated with at least one layer for the purpose of preventing curling, etc. Those with a water-resistant adhesive layer on the surface of the support, those with at least one pre-coated layer as required on the surface layer of the support, and those with a conductive plastic base coated with A1, etc., on paper. Laminated materials can be used.
具体的に、導電性基体あるいは導電化材料の例として、
坂本幸男、it子写真、14.(階1)、p2〜11
(1975) 、森賀弘之、「入門特殊紙の化学j高分
子刊行会(1975) 、 M、F、Hoover、
J、 Macr。Specifically, examples of conductive substrates or conductive materials include:
Yukio Sakamoto, IT child photo, 14. (Floor 1), p2-11
(1975), Hiroyuki Moriga, “Introductory Special Paper Chemistry J Polymer Publication Society (1975), M.F., Hoover.
J, Macr.
sol、 Sci、 Chew、 A −4(6) 、
第1327〜1417頁(1970)等に記載されてい
るもの等を用いる。sol, Sci, Chew, A-4(6),
Those described on pages 1327 to 1417 (1970) and the like are used.
(実施例)
以下に本発明の実施例を例示するが、本発明の内容がこ
れらに限定されるものではない。(Example) Examples of the present invention are illustrated below, but the content of the present invention is not limited thereto.
(樹脂〔A〕の合成例)
樹脂〔A〕の合成例1 : (A−1)26−シクロ
ロフエニルメタクリレート70g1下記構造のマクロモ
ノマー(MM−1) 30g及びトルエン200gの混
合物を、窒素気流下に温度80°Cに加温した。 4.
4’−アゾビス(4−シアノ吉草酸)(略称^、C,V
)5.0gを加え4時間攪拌した。更に、A、C,V。(Synthesis example of resin [A]) Synthesis example 1 of resin [A]: (A-1) A mixture of 70 g of 26-cyclophenyl methacrylate, 1 30 g of macromonomer (MM-1) having the following structure, and 200 g of toluene was heated in a nitrogen stream. The temperature was then raised to 80°C. 4.
4'-azobis(4-cyanovaleric acid) (abbreviation ^, C, V
) and stirred for 4 hours. Furthermore, A, C, V.
1.0gを加え2時間、その後更ニA、C,V、0.5
gを加え3時間攪拌した。得られた共重合体の重量平均
分子量(略称〜)は8.6 X 10’であった。Add 1.0g for 2 hours, then wash A, C, V, 0.5
g was added and stirred for 3 hours. The weight average molecular weight (abbreviation ~) of the obtained copolymer was 8.6 x 10'.
(MM−1) CH。(MM-1) CH.
(A−11 CH。(A-11 CH.
CH。CH.
しl
樹脂〔A〕の合成例2〜7叫A−2] 〜[A−7]樹
脂〔A〕の合成例1において、マクロモノマー (MM
−1) ヲ下表−1に示すマクロモマーに代えた他は、
合成例−1と同様に反応させて、下表−1の樹脂〔A〕
を各々合成した。得られた共重合体の〜は、7.5xl
O’ 〜9.5 xlO’ Tニアツタ。Synthesis Examples 2 to 7 of Resin [A] A-2 to A-7 In Synthesis Example 1 of Resin [A], macromonomer (MM
-1) Except for replacing the macromomer shown in Table-1 below,
Resin [A] shown in Table 1 below was obtained by reacting in the same manner as in Synthesis Example 1.
were synthesized respectively. ~ of the obtained copolymer is 7.5xl
O' ~9.5 xlO' Tnia ivy.
樹脂[A)の合成例8:[A−8)
ヘンシルメタクリレ−)60g、下記構造のマクロモノ
マー(MM−8)40g、トルエン150g及びイソプ
ロピルアルコール50gの混合溶液を窒素気流下に温度
80゛Cに加温した。Synthesis Example 8 of Resin [A): A mixed solution of 60 g of [A-8) Hensyl methacrylate], 40 g of a macromonomer (MM-8) having the following structure, 150 g of toluene, and 50 g of isopropyl alcohol was heated at a temperature of 80°C under a nitrogen stream. It was heated to ゛C.
A、C,V、5.0gを加え4時間攪拌した。更ニA、
C,V。5.0 g of A, C, and V were added and stirred for 4 hours. Sarani A,
C.V.
1.0gを加え、2時間、その後ニA、C,ν、0.5
gを加え、3時間攪拌した。Add 1.0g for 2 hours, then add A, C, ν, 0.5
g and stirred for 3 hours.
得られた共重合体の重量平均分子量は8.3 X 10
3であった。The weight average molecular weight of the obtained copolymer was 8.3 x 10
It was 3.
(MM−8)
CHz
CH2=C
COOCHzCl(go 十GHzCH,CI(、CH
zO十CJs〜6.OX to’
(A−8)
−COOCHzCHzO+(CHz)40 +−ca)
ts樹脂〔A〕の合成例9:[^−91
2−クロロフェニルメタクリレート60g、下記Fl、
Mのマクロモノマー0+M−9)40g 、チオグリコ
ール酸4.0g及びトルエン200gの混合溶液を、窒
素気流下に温度75℃に加温した。2,2”−アゾビス
イソブチロニトリル(略称: A、1Bj1.)1.5
gを加え4時間攪拌し、更に^、r、B、N、0.4g
を加え2時間、その後、更に ^、1.B、N、0.2
gを加え3時間攪拌した。(MM-8) CHz CH2=C COOCHzCl(go 10GHzCH,CI(,CH
zO1CJs~6. OX to' (A-8) -COOCHzCHzO+(CHz)40 +-ca)
Synthesis example 9 of ts resin [A]: [^-91 60 g of 2-chlorophenyl methacrylate, the following Fl,
A mixed solution of 40 g of M macromonomer 0+M-9), 4.0 g of thioglycolic acid, and 200 g of toluene was heated to 75° C. under a nitrogen stream. 2,2”-azobisisobutyronitrile (abbreviation: A, 1Bj1.) 1.5
Add g and stir for 4 hours, then add ^, r, B, N, 0.4 g
Add for 2 hours, then continue ^, 1. B, N, 0.2
g was added and stirred for 3 hours.
た、得られた共重合体の重量平均分子量は7.0×10
3であった。The weight average molecular weight of the obtained copolymer was 7.0×10
It was 3.
(MM−9)
CI+!
H
(A−93
寧 −C00C)1.cHc11!0OC(C)1t)
ffcOO+c)IICH!0+−CO2H
樹脂〔A〕の合成例10−15 : [4−107〜m
A−15]樹脂〔A〕の合成例9において、チオグリコ
ール酸4gの代わりに、表−2のメルカプト化合物(連
鎖移動剤)を各4g用いた他は、上記合成例9と同様に
して、各樹脂〔A〕を製造した。(MM-9) CI+! H (A-93 Ning -C00C)1. cHc11!0OC(C)1t)
ffcOO+c)IICH! Synthesis example 10-15 of 0+-CO2H resin [A]: [4-107~m
A-15] In Synthesis Example 9 of Resin [A], 4 g of each of the mercapto compounds (chain transfer agents) shown in Table 2 were used instead of 4 g of thioglycolic acid, but in the same manner as in Synthesis Example 9 above. Each resin [A] was manufactured.
表
樹脂〔A〕の合成例16 : [A−1612,6−シ
クロロフエニルメタクリレート60g、マクロモノマー
(MM−9) 40g 、チオグリコール酸2g、トル
エン150g及びエタノール50gの混合物を窒素気流
下、温度80°Cに加温した。A、CJ 3gを加え4
時間反応し、更にA、CJ 1.Ogを加え4時間反応
した。得られた共重合体の重量平均分子量は8.5×1
03であった。Synthesis Example 16 of Surface Resin [A]: [A-16] A mixture of 60 g of 2,6-cyclophenyl methacrylate, 40 g of macromonomer (MM-9), 2 g of thioglycolic acid, 150 g of toluene, and 50 g of ethanol was heated under a nitrogen stream at temperature. It was heated to 80°C. A. Add 3g of CJ and 4
Time reaction and further A, CJ 1. Og was added and reacted for 4 hours. The weight average molecular weight of the obtained copolymer was 8.5×1
It was 03.
(A−16)
N
樹脂(Alの合成例17〜18 : [A47)〜[A
−18]樹脂〔A〕の合成例9と同様にして、下記構造
の樹脂[A−171及び[^−181をそれぞれ製造し
た。(A-16) N resin (Al synthesis examples 17-18: [A47)-[A
-18] Resins [A-171 and [^-181] having the following structures were respectively produced in the same manner as in Synthesis Example 9 of Resin [A].
樹脂〔A
17〕
I
C)l□
樹脂(A−18)
〜 6.5X10”
樹脂[A)の合成例19〜24 : [A−191〜[
A−241樹脂〔A)の合成例9と同様にして、下記構
造の各樹脂を製造した。各樹脂の〜は、7.3 XIO
”〜9×104であった。Resin [A17] I C)l□ Resin (A-18) ~ 6.5X10" Synthesis Examples 19-24 of Resin [A): [A-191 ~ [
Resins having the following structures were produced in the same manner as in Synthesis Example 9 of A-241 Resin [A). ~ of each resin is 7.3 XIO
”~9×104.
表
マクロモノマー(MB)の合成例1:M−1エチルメタ
クリレート90g、2−ヒドロキンエチルメタクリレー
ト10g、チオグリコール酸5g及びトルエン200g
の混合溶液を、窒素気流下攪拌しながら、温度75°C
に加温した。 2.2’ −アゾビスイソブチロニト
リル(略称a、r、B、N、)1.Ogを加え、8時間
反応した。次にこの反応溶液にグリシジルメタクリレー
ト8 g、 N、N〜ジメチルドデシルアミン1.0g
及びt−ブナルハイドロキノン0.5gを加え、温度1
00°Cにて12時間攪拌した。冷却後この反応溶液を
n−ヘキサン21中に再沈し、白色粉末を82g得た0
重合体の重量平均分子量は3.8 XIO’であった。Table: Synthesis example 1 of macromonomer (MB): 90 g of M-1 ethyl methacrylate, 10 g of 2-hydroquine ethyl methacrylate, 5 g of thioglycolic acid, and 200 g of toluene
The mixed solution was heated to 75°C while stirring under a nitrogen stream.
It was heated to 2.2'-Azobisisobutyronitrile (abbreviations a, r, B, N,)1. Og was added and reacted for 8 hours. Next, 8 g of glycidyl methacrylate and 1.0 g of N,N-dimethyldodecylamine were added to this reaction solution.
and 0.5 g of t-bunalhydroquinone, and the temperature was 1.
The mixture was stirred at 00°C for 12 hours. After cooling, this reaction solution was reprecipitated into n-hexane 21 to obtain 82 g of white powder.
The weight average molecular weight of the polymer was 3.8 XIO'.
(M−1)
マクロモノマー(?IB)の合成例2:M−2ブチルメ
タクリレート90g1
メタアクリルM10
g、2−メルカプトエタノール4g、テトラヒドロフラ
ン200gの混合溶液を窒素気流下温度70°Cに加温
した。A、1.B、N、 1.2gを加え、8時間反応
した。(M-1) Synthesis example 2 of macromonomer (?IB): M-2 A mixed solution of 90 g of butyl methacrylate, 10 g of methacrylic M, 4 g of 2-mercaptoethanol, and 200 g of tetrahydrofuran was heated to a temperature of 70°C under a nitrogen stream. . A.1. 1.2 g of B and N were added and reacted for 8 hours.
次にこの反応溶液を水浴中で冷却して温度20℃とし、
トリエチルアミン10.2gを加え、メタクリル酸クロ
ライド14.5 gを温度25°C以下で攪拌上滴下し
た。滴下後そのまま1時間更に攪拌した。その後、t−
ブチルハイドロキノン0.5gを加え温度60°Cに加
温し、4時間撹拌した。冷却後、水ll中に攪拌しなが
ら滴下しく約10分間)、そのまま1時間攪拌して静置
後、水をデカンテーションで除去した。水での洗浄を更
に2回行なった後、テトラヒドロフラン100I11に
溶解し、石油エーテル2j2中に再沈した。沈澱物をデ
カンテーションで補集し、減圧下に乾燥した。得られた
粘稠物の収量は65gで重量平均分子量5.6X10″
′であった。The reaction solution was then cooled in a water bath to a temperature of 20°C,
10.2 g of triethylamine was added, and 14.5 g of methacrylic acid chloride was added dropwise with stirring at a temperature of 25°C or less. After the dropwise addition, the mixture was further stirred for 1 hour. Then t-
0.5 g of butylhydroquinone was added, heated to 60°C, and stirred for 4 hours. After cooling, the mixture was added dropwise to 1 liter of water with stirring for about 10 minutes), stirred as it was for 1 hour and allowed to stand, and then the water was removed by decantation. After washing twice more with water, it was dissolved in tetrahydrofuran 100I11 and reprecipitated in petroleum ether 2j2. The precipitate was collected by decantation and dried under reduced pressure. The yield of the viscous material obtained was 65g and the weight average molecular weight was 5.6X10''
'Met.
(M
マクロモノマー(MB)の合成例3:M−3ベンジルメ
タクリレート95g、2−ホスホノエチルメタクリレー
ト5g12−アミノエチルメルカプタン4g及びテトラ
ヒドロフラン200 gの混合物を、窒素気流下攪拌下
に温度70℃に加温した。(M Macromonomer (MB) Synthesis Example 3: M-3 A mixture of 95 g of benzyl methacrylate, 5 g of 2-phosphonoethyl methacrylate, 4 g of 2-aminoethyl mercaptan, and 200 g of tetrahydrofuran was heated to a temperature of 70°C with stirring under a nitrogen stream. It was warm.
^、1.B、N、 1.5gを加え4時間反応させ、更
にA、1.B、N、 0.5gを加えて4時間反応させ
た。次に、この反応溶液を温度20℃に冷却し、アクリ
ル酸無水物Logを加えて温度20〜25°Cで1時間
撹拌した。^, 1. B, N, 1.5g were added and reacted for 4 hours, and A, 1. 0.5 g of B and N were added and reacted for 4 hours. Next, this reaction solution was cooled to a temperature of 20°C, acrylic anhydride Log was added, and the mixture was stirred at a temperature of 20 to 25°C for 1 hour.
次にt−ブチルハイドロキノン1.0gを加え温度50
〜60℃で4時間攪拌した。冷却後、水li!、中に攪
拌しながら、この反応混合物を約10分間で清下し、そ
のまま1時間攪拌した後静置して、水をデカンテーショ
ンで除去した。水での洗浄を更に2回繰り返した後、テ
トラヒドロフラン100jlIi!に溶解し、石油エー
テル21中に再沈した。沈澱物をデカンテーションで補
集し、減圧下に乾燥した。Next, add 1.0 g of t-butylhydroquinone and bring the temperature to 50.
Stirred at ~60°C for 4 hours. After cooling, add water! The reaction mixture was clarified for about 10 minutes while being stirred, and after being stirred for 1 hour, it was allowed to stand, and the water was removed by decantation. After repeating the washing with water two more times, tetrahydrofuran 100jlIi! and reprecipitated in petroleum ether 21. The precipitate was collected by decantation and dried under reduced pressure.
得られた粘稠物の収量は70gで重量平均分子量は7.
4 XIO’であった。The yield of the obtained viscous material was 70 g, and the weight average molecular weight was 7.
It was 4 XIO'.
(M−3)
マクロモノマ−(MB)の合成例4:M−42−クロロ
フェニルメタクリレート95g、下記構造(1)の単量
体5g、チオグリコール酸4g及びトルエン200 g
の混合溶液を、窒素気流下温度70°Cに加温した。
A、lB、N、 1.5gを加え5時間反応し、更にA
、1.B、N、 0.5gを加え4時間反応した。次
にグリシジルメタクリレート12.4g、 N、Nジメ
チルドデシルアミン1.0g及びも−ブチルハイドロキ
ノン1.5gを加え温度110 ’Cで8時間反応した
。冷却後この反応混合物をP−トルエンスルホン酸3g
、90volχテトラヒドロフラン水溶液100dに溶
液に加え、温度30〜35°Cで1時間撹拌した。(M-3) Synthesis example 4 of macromonomer (MB): 95 g of M-42-chlorophenyl methacrylate, 5 g of monomer of the following structure (1), 4 g of thioglycolic acid, and 200 g of toluene.
The mixed solution was heated to a temperature of 70°C under a nitrogen stream.
Add 1.5 g of A, 1B, and N, react for 5 hours, and then add A
, 1. 0.5 g of B and N were added and reacted for 4 hours. Next, 12.4 g of glycidyl methacrylate, 1.0 g of N,N dimethyldodecylamine, and 1.5 g of butylhydroquinone were added and reacted at a temperature of 110'C for 8 hours. After cooling, the reaction mixture was mixed with 3 g of P-toluenesulfonic acid.
The mixture was added to 100 d of a 90 vol x tetrahydrofuran aqueous solution and stirred at a temperature of 30 to 35°C for 1 hour.
水/エタノール[(1/3)容積地)の混合溶液21中
に、上記混合物を再沈し、デカンテーションで沈澱物を
補集した。この沈澱物をテトラヒドロフラン200+d
に溶解しn−ヘキサン21中に再沈し、粉末58gを得
た0重量平均分子量は7.6 X 10’であった。The above mixture was reprecipitated into a mixed solution 21 of water/ethanol ((1/3 volume)), and the precipitate was collected by decantation. This precipitate was mixed with 200+ d of tetrahydrofuran.
The powder was dissolved in and reprecipitated in n-hexane 21 to obtain 58 g of powder, which had a zero weight average molecular weight of 7.6 x 10'.
単量体(1)
H3
Hx
(M
CH!
マクロモノマー(MB)の合成例5:M−52.6−シ
クロロフエニルメタクリレー)95g、 3− (2’
−二トロペンジルオキシスルホニル)フロビルメタクリ
レ−) 5g、)ルエン150g及びイソプロピルアル
コール50gの混合溶液を1素%流下に温度80℃に加
温した。 2.2’−アゾビス(2−シアノ吉草酸)
(略称: A、CJ、)5.0 gを加え5時間反応し
、更にA、C,V、 1.0gを加えて4時間反応した
。冷却後、メタノール21中にこの反応物を再沈し、粉
末を濾葉し、減圧乾燥した。Monomer (1) H3 Hx (M CH! Synthesis example 5 of macromonomer (MB): M-52.6-cyclophenyl methacrylate) 95 g, 3- (2'
A mixed solution of 150 g of toluene and 50 g of isopropyl alcohol was heated to a temperature of 80° C. under a flow rate of 1%. 2.2'-azobis(2-cyanovaleric acid)
(Abbreviation: A, CJ,) 5.0 g was added and reacted for 5 hours, and further 1.0 g of A, C, V was added and reacted for 4 hours. After cooling, the reaction product was reprecipitated into methanol 21, filtered, and dried under reduced pressure.
上記粉末50gグリシジルメタクリレート14g1N、
N−ジメチルトシルアミンQ、6g、 t−ブチルハイ
ドロキノン1.0g及びトルエン100gの混合物を温
度110℃で10時間撹拌した。室温に冷却後80Wの
高圧水銀灯にて、この混合物を攪拌下に1時間光照射し
た。その後反応混合物をメタノールll中に再沈し、粉
末を濾葉・減圧乾燥した。収量34gで重量平均分子量
?、3 X 10’であった。The above powder 50g glycidyl methacrylate 14g 1N,
A mixture of 6 g of N-dimethyltosylamine Q, 1.0 g of t-butylhydroquinone, and 100 g of toluene was stirred at a temperature of 110° C. for 10 hours. After cooling to room temperature, the mixture was irradiated with light for 1 hour under stirring using an 80 W high-pressure mercury lamp. Thereafter, the reaction mixture was reprecipitated into 1 liter of methanol, and the powder was dried under reduced pressure using a filter. Yield 34g and weight average molecular weight? , 3 x 10'.
(M−5)
本発明の樹脂〔B〕の合成例1 : (B−1)ベンジ
ルメタクリレート80g1マクロモノマー(MB)の合
成例2の化合物(M−2) 20g及びトルエン100
gの混合溶液を、窒素気流下に温度75°Cに加温した
。 1.1’−アゾビス(シクロヘキサン−1−カルボ
シアニド)(略称^、B、C,C,)0.8 gを加え
4時間反応し、更に^、1.B、N、 0.5gを加え
3時間反応した。(M-5) Synthesis Example 1 of the resin [B] of the present invention: (B-1) 80 g of benzyl methacrylate 1 20 g of the compound (M-2) of Synthesis Example 2 of the macromonomer (MB) and 100 g of toluene
The mixed solution of g was heated to a temperature of 75°C under a nitrogen stream. 1. Add 0.8 g of 1'-azobis(cyclohexane-1-carbocyanide) (abbreviation ^, B, C, C,), react for 4 hours, and then add ^, 1. 0.5 g of B and N were added and reacted for 3 hours.
得られた共重合体の〜は1.OXIO’であった。~ of the obtained copolymer is 1. It was OXIO'.
本発明の樹脂CB)の合成例2:(B−2)2−クロロ
フェニルメタクリレート70g、マクロモノマー(問)
の合成例1の化合物(M−1) 30g、チオグリコー
ル酸o、’yg及びトルエン150gの混合溶液を窒素
気流下に温度80″Cに加温した。 A、B、C,C,
0,5gを加え5時間反応し、後にA、B、C,C,0
,3gを加え3時間、更にA、B、C,C,0,2gを
加え3時間反応した。Synthesis example 2 of resin CB) of the present invention: (B-2) 70 g of 2-chlorophenyl methacrylate, macromonomer (question)
A mixed solution of 30 g of compound (M-1) of Synthesis Example 1, thioglycolic acid o,'yg, and 150 g of toluene was heated to a temperature of 80''C under a nitrogen stream. A, B, C, C,
0.5g was added and reacted for 5 hours, and then A, B, C, C, 0
, 3 g was added thereto, and 0.2 g of A, B, C, and C were further added and reacted for 3 hours.
得られた共重合体の〜は9.2 X 10’であった。~ of the obtained copolymer was 9.2 x 10'.
CB−2)
本発明の樹脂CB)の合成例3 : [B−33工チル
メタクリレート60g、マクロモノマー(MB)の合成
例4の化合物: (M−4) 25g、メチルアクリレ
ート15g及びトルエン150gの混合溶液を窒素気流
下温度75℃に加温した。 A、C,V、0.5gを加
え5時間反応し更に^、C,v、 0.3gを加え4時
間反応した。得られた共重合体の〜は1.l×104で
あった。CB-2) Synthesis Example 3 of the resin CB) of the present invention: [B-33 60 g of methyl methacrylate, the compound of Synthesis Example 4 of macromonomer (MB): (M-4) 25 g, 15 g of methyl acrylate and 150 g of toluene The mixed solution was heated to 75° C. under a nitrogen stream. 0.5 g of A, C, and V were added and reacted for 5 hours, and 0.3 g of ^, C, and V were added and reacted for 4 hours. ~ of the obtained copolymer is 1. It was 1×104.
(B−3)
本発明の樹脂[B]の合成例4〜11 : [8−41
〜[B−111樹脂CB]の合成例1と同様にして、下
記表4に相当するメタクリレートとマクロモノマーを用
いて、各樹脂〔B〕を合成した。(B-3) Synthesis examples 4 to 11 of resin [B] of the present invention: [8-41
~ Each resin [B] was synthesized in the same manner as in Synthesis Example 1 of [B-111 Resin CB] using methacrylates and macromonomers corresponding to Table 4 below.
本発明の樹脂[B]の合成例12〜19 : [B−1
2]〜[B49]樹脂CB−2]の合成例2と同様にし
て、メタクリレート、マクロモノマーメルカプト化合物
を各々代えて下記表−5の樹脂〔B〕を各々合成した。Synthesis Examples 12 to 19 of resin [B] of the present invention: [B-1
2] to [B49] Resin CB-2] Resin [B] shown in Table 5 below was synthesized in the same manner as in Synthesis Example 2 of Resin CB-2] by changing the methacrylate and the macromonomer mercapto compound.
各樹脂の一一は9×104〜1.I X 10’であっ
た。The size of each resin is 9 x 104~1. It was I x 10'.
本発明の樹脂[B]の合成例20〜27 : [B−2
01〜[11−27]樹脂〔B〕の合成例3と同様にし
て、メタクリレート、マクロモノマー及びアゾビス系化
合物を各々代えて、下記表−6の樹脂〔B〕を各々合成
した。Synthesis examples 20 to 27 of resin [B] of the present invention: [B-2
01 to [11-27] Resin [B] shown in Table 6 below was synthesized in the same manner as Synthesis Example 3 of Resin [B] by changing the methacrylate, macromonomer, and azobis-based compound.
各樹脂CB)のFlw−は、9.5 XIO’〜1.5
XIO’であった。Flw- of each resin CB) is 9.5 XIO' to 1.5
It was XIO'.
実施例1〜2及び比較例A−D
実施例1
樹脂〔A〕の合成例8で製造した樹脂(A−8)6g(
固形分量として)、樹脂CB]の合成例3で製造した樹
脂(B−3)34g(固形分量として)酸化亜鉛200
g、下記構造のシアニン色素〔A〕0.018 g 、
サリチル酸0.40 g及びトルエン300gの混合物
をボールミル中で3時間分散して、感光層形成物を調製
し、これを導電処理した紙に、乾燥付着量が25g/n
fとなる様に、ワイヤーバーで塗布し、110℃で30
秒間乾燥し、ついで暗所で20℃65%RHの条件下で
24時間放置することにより、電子写真感光材料を作製
した。Examples 1 to 2 and Comparative Examples A to D Example 1 6 g of the resin (A-8) produced in Synthesis Example 8 of Resin [A] (
34 g (as solid content) of resin (B-3) produced in Synthesis Example 3 of Resin CB] (as solid content) 200 zinc oxide
g, cyanine dye [A] with the following structure: 0.018 g,
A photosensitive layer-forming product was prepared by dispersing a mixture of 0.40 g of salicylic acid and 300 g of toluene in a ball mill for 3 hours, and this was applied to conductive-treated paper with a dry adhesion amount of 25 g/n.
Apply with a wire bar so that f
An electrophotographic light-sensitive material was prepared by drying for a second and then standing in a dark place at 20° C. and 65% RH for 24 hours.
シアニン色素〔A〕
実施例2
実施例1において、樹脂(A−8)6gの代わりに樹脂
(A−1)6gを用いた他は、実施例1と同様に操作し
て、電子写真感光材料を作製した。Cyanine dye [A] Example 2 An electrophotographic light-sensitive material was produced in the same manner as in Example 1, except that 6 g of resin (A-1) was used instead of 6 g of resin (A-8) in Example 1. was created.
比較例A
結着樹脂として、下記樹脂(R−1)6g及び下記樹脂
(R−2)34gを用いる以外は実施例1と同様の操作
で電子写真感光材料Aを製造した。Comparative Example A Electrophotographic material A was produced in the same manner as in Example 1, except that 6 g of the following resin (R-1) and 34 g of the following resin (R-2) were used as the binder resin.
樹脂(R−1)
COOCJs Cool
〜:6.5×104 (重量組成比〕樹脂(
R−2)
H
COOC112
〜:5xio’
比較例B
結着樹脂として、下記樹脂(R−3)6g及び下記樹脂
[R−4]34gを用いる以外は実施例1と同様の操作
で電子写真感光材料Bを製造した。Resin (R-1) COOCJs Cool ~: 6.5 x 104 (weight composition ratio) Resin (
R-2) H COOC112 ~:5xio' Comparative Example B Electrophotographic exposure was carried out in the same manner as in Example 1, except that 6 g of the following resin (R-3) and 34 g of the following resin [R-4] were used as the binder resin. Material B was produced.
樹脂(R−3)
C00CJs
(エチルメタクリレート/β−メルカプトプロピオン酸
)仕込み重量比(9515)wtル: 6×104
樹脂[R−4)
〜:1.2 XIO’
これらの感光材料の皮膜性(表面の平滑度)、膜強度、
静電特性、撮像性及び環境条件を30℃。Resin (R-3) C00CJs (ethyl methacrylate/β-mercaptopropionic acid) charge weight ratio (9515) wt: 6×104 Resin [R-4) ~: 1.2 XIO' Film properties of these photosensitive materials ( surface smoothness), film strength,
Electrostatic properties, imaging performance, and environmental conditions at 30°C.
80%RHとした時の静電特性撮像体を調べた。The electrostatic characteristics of the image pickup body at 80% RH were investigated.
更に、これらの感光材料をオフセントマスター用原版と
して用いた時の光at性の不感脂化性(不感脂化処理後
の光導電層の水との接触角で表わす)及び印刷性(地汚
れ、耐刷性等)を調べた。Furthermore, when these photosensitive materials are used as original plates for offset masters, the photoat desensitization property (represented by the contact angle with water of the photoconductive layer after desensitization treatment) and printability (background smearing) , printing durability, etc.).
以上の結果をまとめて、表−7に示す。The above results are summarized in Table 7.
表−7に示した評価項目の実施の態様は以下の通りであ
る。The implementation aspects of the evaluation items shown in Table 7 are as follows.
注1)光導電層の平滑性:
得られた感光材料は、べ・ンク平滑度試験II(熊谷理
工■製)を用い、空気容量1 ccの条件にて、その平
滑度(sec/cc)を測定した。Note 1) Smoothness of the photoconductive layer: The obtained photosensitive material was evaluated for its smoothness (sec/cc) using Benck Smoothness Test II (manufactured by Kumagai Riko) under the condition of an air volume of 1 cc. was measured.
注2)光導電層の機械的強度:
得られた感光材料表面をヘイトン−14型表面性試験材
(新菜化学■製)を用いて荷重60g/cdのものでエ
メリー紙(11000)で1000回繰り返し探り摩耗
粉を取り除き感光層の重量減少から残膜率(%)を求め
機械的強度とした。Note 2) Mechanical strength of the photoconductive layer: The surface of the photosensitive material obtained was tested with emery paper (11000) at a load of 60 g/cd using Hayton-14 type surface test material (manufactured by Niina Kagaku ■). The remaining film rate (%) was determined from the weight loss of the photosensitive layer by repeatedly removing abrasion powder and using it as mechanical strength.
注3)静電特性:
温度20°C165%RHの暗室中で、各感光材料にペ
ーパーアナライザー(川口電機■製ペー1< −アナラ
イザー5P−428型)を用いて一6kVで20秒間コ
ロナ放電をさせた後、10秒間放置し、この時の表面電
位■1゜を測定した0次いでそのまま暗中で180秒間
静置した後の電位VIIOを測定し、180秒間暗減衰
させた後の電位の保持性、即ち、暗減衰保持率[DRR
(χ)を(V+*o/V+o)X100(%)で求めた
。Note 3) Electrostatic properties: In a dark room at a temperature of 20°C and 165% RH, each photosensitive material was subjected to corona discharge at -6 kV for 20 seconds using a paper analyzer (Paper Analyzer 5P-428 model manufactured by Kawaguchi Electric). After that, the surface potential was left to stand for 10 seconds, and the surface potential at this time was measured. , that is, the dark decay retention rate [DRR
(χ) was determined by (V+*o/V+o)X100(%).
又コロナ放電により光導電層表面を一400■に帯電さ
せた後、波長780n−の単色光で照射し、表面電位(
V+。)が1/lOに減衰するまでの時間を求め、これ
から露光量E I/l@ (erg / cj)を算出
する。After the surface of the photoconductive layer is charged to -400 nm by corona discharge, it is irradiated with monochromatic light with a wavelength of 780 nm to increase the surface potential (
V+. ) is attenuated to 1/lO, and the exposure amount E I/l@(erg/cj) is calculated from this.
又表面電位(V+。)が1/100に減衰するまでの時
間ヲ求To、コレから露光量E+z+oe (erg/
cj)を算出する。In addition, the time required for the surface potential (V+) to attenuate to 1/100 is calculated from To, and the exposure amount E+z+oe (erg/
cj).
4)撮像性: 各感光材料を以下の環境条件で1昼夜放置した。4) Imaging performance: Each photosensitive material was left for one day and night under the following environmental conditions.
次に一3kVで帯電し、光源として2.0鵬−出力のガ
リウムーアルミニウムーヒ素半導体レーザー(発振波長
750n■)を用いて、感光材料表面上で、45erg
/cjの照射量下、ピッチ25−及びスキャニング速度
300m/secのスピード露光後、液体現像側として
、ELP−T (富士写真フィルム■製)を用いて現
像し、定着することで得られた複写画像(カプリ、画像
の画質)を目視評価した。Next, the surface of the photosensitive material was charged at -3 kV, and a 45 erg
After exposure at a pitch of 25 and a scanning speed of 300 m/sec under an irradiation dose of /cj, a copy obtained by developing and fixing using ELP-T (manufactured by Fuji Photo Film ■) as a liquid developer side. Images (capri, image quality) were visually evaluated.
層像時の環境条件は20℃65%RHと30°C80%
RHHで実施した。The environmental conditions during layer imaging were 20°C, 65% RH and 30°C, 80%.
It was carried out at RHH.
注5)水との接触角:
各感光材料を不感脂化処理液ELP−EX (富士写真
フィルム■製)を蒸留水で2倍に希釈した溶液を用いて
、エツチングプロセンサーに1回通して光導tN面を不
感脂化処理した後、これに蒸留水2p!の水滴を乗せ、
形成された水との接触角をゴニオメータ−で測定する。Note 5) Contact angle with water: Each photosensitive material was passed through an etching prosensor once using a solution prepared by diluting the desensitizing liquid ELP-EX (manufactured by Fuji Photo Film) twice with distilled water. After desensitizing the light guide tN surface, add 2p of distilled water to it! Place the water droplets on the
The formed contact angle with water is measured with a goniometer.
注6)耐刷性
各感光材料を上記注4)と同条件で製版してトナー画像
を形成し、上記注5)と同条件で不感脂化処理し、これ
をオフセットマスターとして、オフセット印刷機(桜井
製作所■製オリバー52型)にかけ、印刷物の非画像部
の地汚れ及び画像部の画質に問題が生じないで印刷でき
る枚数を示す(印刷枚数が多い程、耐刷性が良好なこと
を表わす)。Note 6) Printing durability Each photosensitive material is plate-made under the same conditions as Note 4) above to form a toner image, desensitized under the same conditions as Note 5) above, and used as an offset master in an offset printing machine. (Oliver Model 52, manufactured by Sakurai Manufacturing Co., Ltd.), indicates the number of sheets that can be printed without causing problems with background stains in the non-image areas and image quality of the image areas (the higher the number of prints, the better the printing durability. ).
表−7に示す様に従来公知の樹脂゛を用いた比較例の静
電特性は環境条件の変動による変化は小さいもののり、
R,R,El/l’0及びEl/+1111自身の値が
低かった。Aの場合はBよりも更に緒特性が不満足なも
のとなった。As shown in Table 7, the electrostatic properties of comparative examples using conventionally known resins showed only small changes due to changes in environmental conditions.
The values of R, R, El/l'0 and El/+1111 themselves were low. In the case of A, the mechanical properties were even more unsatisfactory than in B.
これにより、低出力の半導体レーザー光によるスキャニ
ング露光方式で撮像した場合の撮像性は、複写画像の低
下が見られた。As a result, when an image was captured using a scanning exposure method using low-power semiconductor laser light, the image capture performance of the copied image was degraded.
即ち、低出力の光源による光照射量の制約あるいはスキ
ャニング露光方式による露光時間の間中の未露光部(画
像部分)の電位減衰が、実際の複写画像の画質低下(例
えばD6の低下、細線・文字等のカスレ発生等)をもた
らした、又半導体レーザー光が低出力となり、光照射量
が制約されてくると露光後の残留電位が重要な問題とな
り、実際の撮像性において、非画像部の地力ブリとなっ
て現われる。これは、静電特性のE17.。。と対応し
、この値が小さい程好ましく、比較例A、Bは、未だ不
充分であり、複写画像においても本撮像条件の様な場合
には、地力ブリの発生が見られた。In other words, limitations on the amount of light irradiation due to a low-output light source or potential attenuation of unexposed areas (image areas) during the exposure time due to the scanning exposure method may cause a decrease in the image quality of the actual copied image (for example, a decrease in D6, fine lines, etc.). Furthermore, as the output of semiconductor laser light becomes low and the amount of light irradiation is restricted, the residual potential after exposure becomes an important problem, and in actual imaging performance, the residual potential in non-image areas becomes It appears as a yellowtail. This is due to the electrostatic characteristics E17. . . Correspondingly, the smaller this value is, the more preferable it is, and Comparative Examples A and B are still unsatisfactory, and even in the copied images, under the actual imaging conditions, ground force blur was observed.
しかし、本発明のいずれの感光材料も、静電特性、撮像
性ともに良好であった。更に、本発明の感光材料の感光
層の膜強度は充分であった。However, all of the photosensitive materials of the present invention had good electrostatic properties and good imaging properties. Furthermore, the film strength of the photosensitive layer of the photosensitive material of the present invention was sufficient.
次にこれら製版後の感光体をオフセントマスター原版と
して用いた場合は、不感脂化処理液による不感脂化は、
いずれの場合も地力ブリのない非画像部分の水との接触
各が10度以下と小さく、充分に親水化されていた。し
かし、実際に大型の印1i4Ilに相当する印刷条件で
印刷した場合、比較例Aは、製版後の複写画像が充分で
ないこと、感光層の強度が不足すること等から実際の印
刷物として、鮮明な画質の得られるものは1000枚程
度であった。又、感光層の強度の増加及び複写画像の向
上した比較例Bでも画像の再現性が不満なことから30
00枚程度で印刷物の印刷atが劣化してしまった。−
力木発明の場合には、製版の環境条件にかかわらず、地
汚れのない鮮明な画質の印刷物が6000枚〜8000
枚得られた。Next, when the photoconductor after plate making is used as an offset master original plate, desensitization with a desensitization treatment liquid is as follows:
In all cases, the contact with water in the non-image area, which was free of burrs, was as small as 10 degrees or less, and was sufficiently hydrophilized. However, when actually printed under the printing conditions corresponding to the large-sized mark 1i4Il, Comparative Example A did not produce a clear image as an actual printed product due to the insufficient copy image after plate making and the lack of strength of the photosensitive layer. Only about 1,000 sheets of image quality could be obtained. In addition, even in Comparative Example B, which increased the strength of the photosensitive layer and improved the copied image, the reproducibility of the image was unsatisfactory.
The printing at of the printed matter deteriorated after about 00 sheets. −
In the case of the strength wood invention, 6,000 to 8,000 prints with clear image quality without background stains can be produced regardless of the environmental conditions of plate making.
I got one.
以上から、本発明の感光材料は、光導電層の平滑性、1
1強度、静電特性及び印刷性の全ての点において良好な
ものであった。From the above, the photosensitive material of the present invention has a smoothness of the photoconductive layer of 1
1. It was good in all aspects of strength, electrostatic properties, and printability.
実施例3〜22
実施例1において樹脂(A−8)6g及び樹脂(B−3
)34gの代わりに下記表−8の樹脂〔A〕を各々6g
、樹脂〔B〕を各々34g用い、又、シアニン色素[A
) 0.018 gの代わりに、下記構造のシアニン色
素(B ) 0.018 gを用いた他は、実施例1と
同様に操作して、各感光材料を作製した。Examples 3 to 22 In Example 1, 6 g of resin (A-8) and resin (B-3
) 6g each of resin [A] shown in Table 8 below instead of 34g
, resin [B] were used in an amount of 34 g each, and cyanine dye [A] was used.
) Each photosensitive material was produced in the same manner as in Example 1, except that 0.018 g of cyanine dye (B) having the following structure was used instead of 0.018 g.
シアニン色素rB)
表−8に示すように、本発明では優れた結果が得られた
。また、樹脂〔A〕が、特定の置換基を含有するメタク
リレート成分を重合体成分として含有する場合には、静
電特性が特に向上する。又オフセントマスター原版とし
て印刷した所いずれも8000枚以上印刷できた。Cyanine dye rB) As shown in Table 8, excellent results were obtained in the present invention. Furthermore, when the resin [A] contains a methacrylate component containing a specific substituent as a polymer component, the electrostatic properties are particularly improved. In addition, we were able to print over 8,000 copies in all of the locations where we printed as off-cent master master plates.
実施例23〜36
実施例1において樹脂(A−8)6g及び樹脂CB−3
)34gの代わりに下記表−9の樹脂[A)を各々6g
、樹脂〔B〕を各々34g用い、又シアニン色素[A)
0.018 gの代わりに、下記構造のメチン色素(
C)0.016 gを用いた他は、実施例1と同様に操
作して、各感光材料を作製した。Examples 23 to 36 In Example 1, 6 g of resin (A-8) and resin CB-3
) Instead of 34g, add 6g each of resin [A] shown in Table 9 below.
, using 34 g each of resin [B], and cyanine dye [A].
Instead of 0.018 g, a methine dye with the following structure (
C) Each photosensitive material was produced in the same manner as in Example 1 except that 0.016 g was used.
メチン色素(C)
表
実施例1と同様にして各特性を測定した。各感光材料の
平滑性及び膜強度は実施例1の試料とほぼ同等の特性を
示した。Methine dye (C) Table Each characteristic was measured in the same manner as in Example 1. The smoothness and film strength of each light-sensitive material showed properties almost equivalent to those of the sample of Example 1.
本発明の各感光材料は、いずれも帯電性、暗電荷保持率
、光感度に優れ、実際の複写画像も高温高温の(30℃
80%RH)の過酷な条件においても、地力ブリの発生
のない鮮明な画像を得た。又、オフセットマスター原版
として印刷すると6000〜8000枚印刷できた。Each of the photosensitive materials of the present invention has excellent chargeability, dark charge retention, and photosensitivity, and the actual reproduced images are also produced at high temperatures (30°C).
Even under the harsh conditions of 80% RH), clear images with no soil burr were obtained. Moreover, when printed as an offset master original plate, 6000 to 8000 sheets could be printed.
実施例37〜40
結着樹脂として、下記表−10に記した樹脂〔A)6.
5g及び樹脂〔B〕33.5g、酸化亜鉛200g、ロ
ーズベンガル0.05g、ブロムフェノールブルー0.
03g、ウラニン0.02g、無水フタール酸0.3g
及びトルエン240gの混合物をボールミル中で4時間
分散した。これを導電処理した紙に、乾燥付着量25g
/rrfとなる様にワイヤーバーで塗布し110°Cで
30秒間加熱した0次いで20℃、65%RHの条件下
で24時間放置することにより電子写真感光材料を作製
した。Examples 37-40 As the binder resin, the resins listed in Table 10 below [A) 6.
5g and resin [B] 33.5g, zinc oxide 200g, rose bengal 0.05g, bromophenol blue 0.
03g, uranine 0.02g, phthalic anhydride 0.3g
A mixture of 240 g of toluene and 240 g of toluene was dispersed in a ball mill for 4 hours. A dry amount of 25g of this was applied to conductive treated paper.
An electrophotographic light-sensitive material was prepared by coating the film with a wire bar so that the coating composition had a temperature of /rrf, heating it at 110°C for 30 seconds, and then leaving it for 24 hours at 20°C and 65% RH.
表−10
静電特性は、(30°C180%IIIH)の条件下で
の測定値。Table 10 Electrostatic properties are measured values under the conditions of (30°C, 180% IIIH).
本発明の感光材料は、いずれも帯電性、暗電荷保持率、
光感度に優れ、実際の複写画像も高温・高湿の(30℃
−80%RH)の過酷な条件においても、地力プリの発
生のない、鮮明な画像を与えた。The photosensitive material of the present invention has chargeability, dark charge retention,
It has excellent light sensitivity, and the actual copied images can be used even in high temperature and high humidity conditions (30℃).
Even under harsh conditions (-80% RH), it provided clear images with no formation of soil pressure.
更に、これをオフセットマスターの原版として用いて印
刷した所、表−10の耐刷枚数の所でも鮮明な画質の印
刷物を得た。Further, when this was printed using as an original plate for an offset master, prints with clear image quality were obtained even at the number of prints shown in Table 10.
但し、静電特性における、El/l。はコロナ放電によ
り光導電層表面を一4O0vに帯電させた後、該光導電
層表面を照度2.0ルッ−クスの可視光で照射し、表面
電位(V+。)が1710に減衰するまでの時間を求め
、これから露光量El/I。(ルックス・秒)を算出し
た。However, in terms of electrostatic properties, El/l. After the surface of the photoconductive layer was charged to -400V by corona discharge, the surface of the photoconductive layer was irradiated with visible light at an illuminance of 2.0 lux until the surface potential (V+) attenuated to 1710V. Find the time and use it to determine the exposure amount El/I. (looks/seconds) was calculated.
又、感光材料の製版は、全自動製版機ELP404V(
富士写真フィルム■製)でELP−Tをトナーとして用
いて、トナー画像を形成した。In addition, plate making of photosensitive materials is carried out using a fully automatic plate making machine ELP404V (
A toner image was formed using ELP-T (manufactured by Fuji Photo Film ■) as a toner.
(発明の効果)
本発明によれば、優れた静電特性及び機械的強度を有す
る電子写真感光体を得ることができる。(Effects of the Invention) According to the present invention, an electrophotographic photoreceptor having excellent electrostatic properties and mechanical strength can be obtained.
(ほか3名)(3 others)
Claims (2)
光導電層を有する電子写真感光体において、該結着樹脂
が、下記に示される樹脂〔A〕の少なくとも1種と樹脂
〔B〕の少なくとも1種とを含有して成る事を特徴とす
る電子写真感光体。 樹脂〔A〕: 下記一般式( I )で示される重量平均分子量1×10
^3〜2×10^4のマクロモノマー(MA)の少なく
とも1種を重合成分として含有し、且つ重合体主鎖の片
末端にのみ、−PO_3H_2基、−SO_3H基、−
COOH基及び▲数式、化学式、表等があります▼{R
_1は炭化水素基又は−OR_0(R_0は炭化水素基
を示す)基を表わす}基から選ばれる少なくとも1つの
酸性基を結合して成る重量平均分子量1.0×10^3
〜2.0×10^4のグラフト共重合体。 一般式( I ) ▲数式、化学式、表等があります▼ 〔式( I )中、a_1及びa_2は、互いに同じでも
異なってもよく、各々水素原子、ハロゲン原子、シアノ
基、炭素数1〜8の炭化水素基、−COO−Z又は炭素
数1〜8の炭化水素基を介した−COO−Z(Zは炭素
数1〜18の炭化水素基を表わす)を表わす。 Xは、−COO−、−OCO−、▲数式、化学式、表等
があります▼、 ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼(l_1、l_2は1〜3の整数を示
す)、 −CO−、▲数式、化学式、表等があります▼(P_1
は水素原子又は炭素数1〜12の炭化水素基を表わす)
、−CONHCOH−、−CONHCOO−、−O−、
▲数式、化学式、表等があります▼又は−SO_2−を
表わす。 YはXと−O−とを連結する基を表わす。 〔〕内は繰り返し単位を表わし、nは1〜3の整数を表
わす。nが2以上のときは、〔〕内のWは少なくとも隣
りの〔〕内のWと異なる基を表わす。 Wは、▲数式、化学式、表等があります▼又は▲数式、
化学式、表等があります▼を表わす (r_1及びr_2は、互いに同じでも異なってもよく
、各々水素原子又はアルキル基を表わす)。 R_1_1は水素原子又は炭化水素基を表わす。〕結着
樹脂〔B〕: 下記一般式(IVa)及び(IVb)で示される重合体成分
のうちの少なくとも1種と−COOH基、−PO_3H
_2基、−SO_3H基、−OH基、▲数式、化学式、
表等があります▼(R_2は前記R_1と同一の内容を
表わす)基、−CHO基及び環状酸無水物含有基から選
ばれる少なくとも1つの極性基を含有する成分を少なく
とも1種含有する重合体成分の少なくとも1種とを含有
する重合体主鎖の一方の末端にのみ下記一般式(III)
で示される重合性二重結合基を結合して成る重量平均分
子量2×10^4以下の一官能性マクロモノマー(MB
)と下記一般式(V)で示されるモノマーとから少なく
とも成る重量平均分子量5×10^4〜1×10^6の
共重合体。 一般式(III) ▲数式、化学式、表等があります▼ 式(III)中、X_0は−COO−、−OCO−、−C
H_2OCO−、−CH_2COO−、−O−、−SO
_2−、−CO−、−CONHCOO−、−CONHC
ONH−、▲数式、化学式、表等があります▼、▲数式
、化学式、表等があります▼又は▲数式、化学式、表等
があります▼を表わす(ここでR_3_1は水素原子又
は炭化水素基を表わす)。 c_1、c_2は互いに同じでも異なってもよく、各々
水素原子、ハロゲン原子、シアノ基、炭化水素基、−C
OO−Z_1又は炭化水素を介した−COO−Z_1(
Z_1は各々水素原子又は置換されてもよい炭化水素基
を示す)を表わす。 一般式(IVa) ▲数式、化学式、表等があります▼ 一般式(IVb) ▲数式、化学式、表等があります▼ 式(IVa)又は(IVb)中、X_1は式(III)中のX
_0と同一の内容を表わす。Q_1は、炭素数1〜18
の脂肪族基又は炭素数6〜12の芳香族基を表わす。 d_1、d_2は、互いに同じでも、異なってもよく、
式(III)中のc_1、c_2と同一の内容を表わす。 Q_0は−CN、−CONH_2又は▲数式、化学式、
表等があります▼を表わし、Tは水素原子、ハロゲン原
子、アルコキシ基又は−COOZ_2(Z_2はアルキ
ル基、アラルキル基又はアリール基を示す)を表わす。 一般式(V) ▲数式、化学式、表等があります▼ 式(V)中、V_2は、式(IVa)中のV_1と同一の
内容を表わし、Q_2は、式(IVa)中のQ_1と同一
の内容を表わす。e_1、e_2は互いに同じでも異な
ってもよく、式(III)中のc_1、c_2と同一の内
容を表わす。(1) In an electrophotographic photoreceptor having a photoconductive layer containing at least an inorganic photoconductor and a binder resin, the binder resin includes at least one of the following resins [A] and resin [B]. An electrophotographic photoreceptor comprising at least one of the following. Resin [A]: Weight average molecular weight 1×10 represented by the following general formula (I)
Contains at least one type of macromonomer (MA) of ^3 to 2 x 10^4 as a polymerization component, and -PO_3H_2 group, -SO_3H group, - only at one end of the polymer main chain.
There are COOH groups and ▲mathematical formulas, chemical formulas, tables, etc.▼{R
_1 represents a hydrocarbon group or -OR_0 (R_0 represents a hydrocarbon group) group} group, weight average molecular weight 1.0 x 10^3 formed by bonding at least one acidic group selected from
~2.0 x 10^4 graft copolymer. General formula (I) ▲ Numerical formulas, chemical formulas, tables, etc. represents a hydrocarbon group, -COO-Z, or -COO-Z via a hydrocarbon group having 1 to 8 carbon atoms (Z represents a hydrocarbon group having 1 to 18 carbon atoms). X is -COO-, -OCO-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲Mathematical formulas, chemical formulas,
There are tables, etc. ▼ (l_1 and l_2 indicate integers from 1 to 3), -CO-, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (P_1
represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms)
, -CONHCOH-, -CONHCOO-, -O-,
▲There are mathematical formulas, chemical formulas, tables, etc.▼ or -SO_2-. Y represents a group connecting X and -O-. [ ] represents a repeating unit, and n represents an integer from 1 to 3. When n is 2 or more, W in [ ] represents a group different from at least the adjacent W in [ ]. W has ▲mathematical formula, chemical formula, table, etc.▼or ▲mathematical formula,
There are chemical formulas, tables, etc. Represents ▼ (r_1 and r_2 may be the same or different and each represents a hydrogen atom or an alkyl group). R_1_1 represents a hydrogen atom or a hydrocarbon group. [Binder resin [B]: At least one of the polymer components represented by the following general formulas (IVa) and (IVb), -COOH group, -PO_3H
_2 group, -SO_3H group, -OH group, ▲ mathematical formula, chemical formula,
There are tables, etc. ▼ Polymer component containing at least one component containing at least one polar group selected from (R_2 represents the same content as R_1 above) group, -CHO group, and cyclic acid anhydride-containing group The following general formula (III) is present only at one end of the polymer main chain containing at least one type of
A monofunctional macromonomer having a weight average molecular weight of 2×10^4 or less (MB
) and a monomer represented by the following general formula (V), a copolymer having a weight average molecular weight of 5 x 10^4 to 1 x 10^6. General formula (III) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In formula (III), X_0 is -COO-, -OCO-, -C
H_2OCO-, -CH_2COO-, -O-, -SO
_2-, -CO-, -CONHCOO-, -CONHC
ONH-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (Here, R_3_1 represents a hydrogen atom or a hydrocarbon group. ). c_1 and c_2 may be the same or different, and each represents a hydrogen atom, a halogen atom, a cyano group, a hydrocarbon group, -C
OO-Z_1 or -COO-Z_1 via hydrocarbon (
Z_1 each represents a hydrogen atom or a hydrocarbon group which may be substituted. General formula (IVa) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ General formula (IVb) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ In formula (IVa) or (IVb), X_1 is X in formula (III)
Represents the same content as _0. Q_1 is carbon number 1-18
represents an aliphatic group or an aromatic group having 6 to 12 carbon atoms. d_1 and d_2 may be the same or different from each other,
It represents the same content as c_1 and c_2 in formula (III). Q_0 is -CN, -CONH_2 or ▲ mathematical formula, chemical formula,
▼ represents a hydrogen atom, a halogen atom, an alkoxy group, or -COOZ_2 (Z_2 represents an alkyl group, an aralkyl group, or an aryl group). General formula (V) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In formula (V), V_2 represents the same content as V_1 in formula (IVa), and Q_2 is the same as Q_1 in formula (IVa). represents the content of e_1 and e_2 may be the same or different, and represent the same contents as c_1 and c_2 in formula (III).
3H基、−COOH基、−OH基、▲数式、化学式、表
等があります▼基(R_3は請求項(1)記載のR_1
と同一の内容を表わす)および環状酸無水物含有基から
選択される少なくとも1種の極性基を該共重合体の重合
体主鎖部の末端に結合して成る樹脂である請求項(1)
記載の電子写真感光体。(2) The resin [B] has -PO_3H_2 groups, -SO_
3H group, -COOH group, -OH group, ▲mathematical formula, chemical formula, table, etc.▼ group (R_3 is R_1 described in claim (1)
Claim (1) is a resin in which at least one polar group selected from cyclic acid anhydride-containing groups and cyclic acid anhydride-containing groups is bonded to the end of the main chain of the copolymer.
The electrophotographic photoreceptor described above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12402490A JPH0420970A (en) | 1990-05-16 | 1990-05-16 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12402490A JPH0420970A (en) | 1990-05-16 | 1990-05-16 | Electrophotographic sensitive body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0420970A true JPH0420970A (en) | 1992-01-24 |
Family
ID=14875146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12402490A Pending JPH0420970A (en) | 1990-05-16 | 1990-05-16 | Electrophotographic sensitive body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0420970A (en) |
-
1990
- 1990-05-16 JP JP12402490A patent/JPH0420970A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2597160B2 (en) | Electrophotographic photoreceptor | |
| JP2623153B2 (en) | Electrophotographic photoreceptor | |
| JP2647718B2 (en) | Electrophotographic lithographic printing original plate | |
| JP2592314B2 (en) | Electrophotographic photoreceptor | |
| JPH0467151A (en) | Electrophotographic planographic printing plate material | |
| JPH0353257A (en) | Electrophotographic sensitive body | |
| JP2640141B2 (en) | Electrophotographic photoreceptor | |
| JP2655355B2 (en) | Electrophotographic photoreceptor | |
| JPH02304451A (en) | Electrophotographic sensitive body | |
| JP2670884B2 (en) | Electrophotographic photoreceptor | |
| JP2630488B2 (en) | Lithographic printing plate | |
| JPH02247656A (en) | Electrophotographic sensitive body | |
| JP2597161B2 (en) | Electrophotographic photoreceptor | |
| JP2676645B2 (en) | Electrophotographic photoreceptor | |
| JP2684435B2 (en) | Electrophotographic photoreceptor | |
| JP2520711B2 (en) | Electrophotographic photoreceptor | |
| JPH0296766A (en) | Electrophotographic sensitive body | |
| JP2640140B2 (en) | Electrophotographic photoreceptor | |
| JPH0264547A (en) | Electrophotographic sensitive body | |
| JP3219842B2 (en) | Electrophotographic photoreceptor | |
| US5104759A (en) | Electrophotographic light-sensitive material | |
| JPH0420968A (en) | Electrophotographic sensitive body | |
| JPH02272560A (en) | Electrophotographic sensitive body | |
| JPH02272558A (en) | Electrophotographic sensitive body | |
| JPH04358156A (en) | Electrophotographic sensitive body |